JPH01201604A - Production of color filter - Google Patents

Production of color filter

Info

Publication number
JPH01201604A
JPH01201604A JP63027180A JP2718088A JPH01201604A JP H01201604 A JPH01201604 A JP H01201604A JP 63027180 A JP63027180 A JP 63027180A JP 2718088 A JP2718088 A JP 2718088A JP H01201604 A JPH01201604 A JP H01201604A
Authority
JP
Japan
Prior art keywords
acid
resist
color filter
pattern
glass substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63027180A
Other languages
Japanese (ja)
Inventor
Yoichi Noda
洋一 野田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP63027180A priority Critical patent/JPH01201604A/en
Publication of JPH01201604A publication Critical patent/JPH01201604A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To decrease stripping stages by using a resist to be used at the time of forming a light shielding frame consisting of a metallic layer to be corroded by an acid as it is as an acid resistant material to cover the light shielding frame without stripping said resist after pattern formation. CONSTITUTION:A nickel layer 2 is first formed by electroless plating on a glass substrate 1. The positive type resist 3 prepd. by adding naphthoquinone diazide to a novolak resin is then coated as the acid resistant material on a glass substrate formed with the nickel layer 2 and is then dried, exposed and developed to form the prescribed pattern. The glass substrate 1 is calcined by heating the same in order to intensify the adhesion of the positive type resist. The pattern of the nickel layer 2 is formed on this substrate by immersing the substrate into an acid mixture composed of nitric acid, phosphoric acid, sulfuric acid, and acetic acid and dissolving the nickel of the region which is not covered by the position type resist. The resist is usable as it is as the acid resistant material without stripping the same even after the pattern information in such a case.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、カラー液晶表示体の構成要素であり、かつ液
晶に電圧を加える画素領域以外の領域の光を遮りフント
ラストを向上するための遮光枠を有するカラーフィルタ
ーの製造方法に関するものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention is a component of a color liquid crystal display, and is a component of a color liquid crystal display for blocking light in an area other than a pixel area where a voltage is applied to the liquid crystal to improve fundust. The present invention relates to a method of manufacturing a color filter having a light-shielding frame.

〔従来の技術〕[Conventional technology]

従来、カラー液晶表示体のカラーフィルターの遮光枠は
、金@届もしくは着色層の重ね合わせによって形成して
いる。このうち着色層の重ね合わせは、製造が容易であ
る一方、遮光性が十分でないという問題点を存する。ま
た金属層の場合には遮光性に優れる一方、製造コストが
上昇するという問題点を育する。
Conventionally, the light-shielding frame of a color filter of a color liquid crystal display is formed by overlapping gold or colored layers. Among these, the overlapping of colored layers is easy to manufacture, but has the problem of insufficient light-shielding properties. Further, in the case of a metal layer, although it has excellent light-shielding properties, it has the problem of increasing manufacturing costs.

そこで、遮光性を重視する場合には金属層の遮光枠を用
いることになる。この金属層の形成方法としてはメツキ
やスパッタ、真空蒸着等の真空成膜があるが、量産性や
コスト面から見てニッケルの無電解メツキが最も望まし
い。
Therefore, when emphasis is placed on light-shielding properties, a light-shielding frame made of a metal layer is used. Methods for forming this metal layer include plating, sputtering, and vacuum film formation such as vacuum evaporation, but electroless plating of nickel is most desirable in terms of mass productivity and cost.

また、カラーフィルターの製造方法は、現在のところフ
ォトリソグラフィーと染色による方式、電蓄方式、印刷
方式の3つが一般的であり、その中でも高彩度、高解像
度といった特徴からフォトリソグラフィーと染色による
方式が広〈実施されている。
Currently, there are three common methods for producing color filters: photolithography and dyeing, electric storage, and printing. Among these, photolithography and dyeing is widely used because of its characteristics such as high saturation and high resolution. <It has been implemented.

フォトリングラフイーと染色による方法は、染色性と光
硬化性を併せ持つ樹脂を基板上に塗膜して乾燥し、露光
アスクを用いて所定の領域に紫外線を照射したのち、こ
れを現像液に浸漬して非架橋部を溶解してパターンを形
成し、さらに加熱によってこれを硬化させる。このよう
にして形成したパターンを染色液中に浸漬して着色し、
さらに防染を行なう。赤、緑、青の三色から成るカラー
フィルターを形成するには、以上の一連の工程を三すイ
クル繰り返す。
The method using photophosphorography and dyeing involves coating a resin that has both dyeing and photocuring properties on a substrate, drying it, irradiating a predetermined area with ultraviolet light using an exposure mask, and then applying it to a developer. A pattern is formed by dipping to dissolve the non-crosslinked portions, and the pattern is further cured by heating. The pattern thus formed is immersed in a dyeing solution to be colored.
Furthermore, perform resist dyeing. To form a color filter consisting of red, green, and blue, the above series of steps is repeated three times.

ところで防染を行なう方法には、染料分子を通さない透
明膜で着色層を覆う方法とタンニン酸と酒石酸アンチモ
リラムカリウム水溶液に浸漬して防染処理を行なう方法
があるが、製造コスト面からは後者が育利である。
By the way, there are two methods of resist dyeing: one is to cover the colored layer with a transparent film that does not allow dye molecules to pass through, and the other is to perform resist dyeing by immersing it in an aqueous solution of tannic acid and antimolyrum potassium tartrate. The latter is Ikuri.

以上をまとめると、遮光枠の十分な遮光性と高彩度、高
解像度を育し、かつ製造コストの上昇をおさえるには、
無電解メツキによるニッケルから成る遮光枠とタンニン
酸と酒石酸アンチ皐すウムカリウムによる防染処理を用
いたフォトリングラフイーと染色方式による着色層の組
み合わせが望ましい。
To summarize the above, in order to develop sufficient light-shielding properties, high color saturation, and high resolution of the light-shielding frame, and to suppress the increase in manufacturing costs,
It is desirable to combine a light-shielding frame made of nickel by electroless plating, photophosphorography using anti-staining treatment with tannic acid and potassium tartrate, and a colored layer by a dyeing method.

〔発明が解決しようとする課題〕 しかし、この場合、タンニン酸と酒石酸アンチモリラム
カリウム水溶液は強酸性とする必要があるため、これに
ニッケル遮光枠の形成されたガラス基板を浸漬した場合
、ニッケルが酸によって腐食され遮光枠が不均一に変色
したり、剥離したりするという問題点を存する。そこで
本発明の目的は、強酸に浸漬してもニッケル遮光枠が腐
食されないカラーフィルターの製造方法を提供すること
にある。
[Problem to be solved by the invention] However, in this case, the tannic acid and antimolylum potassium tartrate aqueous solution needs to be strongly acidic, so when the glass substrate with the nickel light-shielding frame is immersed in it, the nickel There is a problem in that the light-shielding frame becomes unevenly discolored or peels off due to corrosion by the acid. SUMMARY OF THE INVENTION An object of the present invention is to provide a method for manufacturing a color filter in which the nickel light-shielding frame is not corroded even when immersed in a strong acid.

〔課題を解決するための手段〕[Means to solve the problem]

本発明によるカラーフィルターの製造方法は、酸によっ
て腐食される金属層から成る遮光枠上に耐酸性物質が積
層されているカラーフィルターの製造方法において、前
記金T14Bをパターン形成する除用いるレジストを、
パターン形成後も剥離せず、そのまま前記酸性物質とし
て用いることを特徴とする。
A method for manufacturing a color filter according to the present invention includes a method for manufacturing a color filter in which an acid-resistant material is laminated on a light-shielding frame made of a metal layer that is corroded by acid.
It is characterized in that it does not peel off even after pattern formation and can be used as the acidic substance as it is.

〔実施例〕〔Example〕

本発明によるカラーフィルターの製造方法を以下に述べ
る。
A method for manufacturing a color filter according to the present invention will be described below.

まず、ガラス基板上に無電解メツキにより100λ〜1
oooo人の厚みのニッケル層を形成する。
First, 100λ~1 by electroless plating on a glass substrate.
Form a nickel layer oooo thick.

次にニッケル層の形成されたガラス基板上に耐酸性物質
としてノボラック樹脂にナフトキノンジアジドを添加し
たポジ型レジストを塗膜し、乾燥し、露光、現像を行な
い所定のパターンを形成する。耐酸性物質の種類は特に
制限されず、ポリイソプレン環化物などの環化ゴムにビ
スアジド化合物を添加したネガ型レジストやポリイミド
などを用いることができる。ポジ型レジストをパターン
形成したガラス基板は、ポジ型レジストの密着を強化さ
せるために100〜150@Cの熱を加えてこれを焼成
し、硝酸、リン酸、硫酸、酢酸から成る混酸に浸漬し、
ポジ型レジストに覆われていな〜)領域のニッケルを溶
解して、ニッケル層のパターン形成を行なう。
Next, a positive resist consisting of novolac resin and naphthoquinone diazide added as an acid-resistant material is coated on the glass substrate on which the nickel layer is formed, dried, exposed, and developed to form a predetermined pattern. The type of acid-resistant substance is not particularly limited, and a negative resist made by adding a bisazide compound to a cyclized rubber such as a polyisoprene cyclized product, polyimide, or the like can be used. The glass substrate on which the positive resist has been patterned is baked by applying heat of 100 to 150 C to strengthen the adhesion of the positive resist, and then immersed in a mixed acid consisting of nitric acid, phosphoric acid, sulfuric acid, and acetic acid. ,
The nickel in the areas not covered by the positive resist is dissolved to form a pattern of the nickel layer.

ポジ型レジストの膜厚としては0.1〜5μmが適当で
あり、これより薄いと耐酸性が十分得られず、これより
厚いと解像度が低下するといった問題が生ずる。これに
よって第1図(a)に示す、ニッケル層から成る遮光枠
がポジ型レジストで覆われた構造が形成される。
The appropriate film thickness of the positive resist is 0.1 to 5 μm; if it is thinner than this, sufficient acid resistance cannot be obtained, and if it is thicker than this, there will be problems such as a decrease in resolution. As a result, a structure shown in FIG. 1(a) in which a light-shielding frame made of a nickel layer is covered with a positive resist is formed.

次にこの上にフォトリソグラフィーと染色によってカラ
ーフィルター層を形成する方法を説明する。カラーフィ
ルター層の材料としてパターン形成を行なうための光硬
化性と染色性が必要である。その2つの性質を併せ持つ
物質として、ゼラチン、カゼイン、グリユーなどの天然
物や、カチオン性基を含育する重合性単量体に由来する
構成単位を有する重合体から成る合成物があげられる。
Next, a method of forming a color filter layer thereon by photolithography and dyeing will be explained. The material for the color filter layer must have photocurability and dyeability for pattern formation. Substances that have both of these properties include natural products such as gelatin, casein, and grue, and synthetic products made of polymers having constitutional units derived from polymerizable monomers containing cationic groups.

合成物としては、JDSシリーズ(日本合成ゴム社!!
り RWI 01 (ta水7 yイン’r ミh )
&社製)、R102、R833(以上日本化薬社製)が
実用化されている。上記のいずれかのカラーフィルター
層の材料をニッケル層から成る遮光枠をポジ型レジスト
で覆ったガラス基板上に塗布し、乾燥させる。また、カ
ラーフィルターの材料とガラス基板もしくはポジ型レジ
ストの密着が悪い場合には、カラーフィルター材料塗布
前に中間層を形成する場合もある。塗布膜を乾燥した後
、露光マスクを介してこれに紫外線を照射し、所定の領
域のみ架橋させて、現像によって未架橋部を溶解しカラ
ーフィルター材料をパターン形成する。そして、さらに
加熱を行ない、下層との密着を強化する。このようなフ
ォトリソグラフィーによってカラーフィルター材料層を
形成したガラス基板を染色液に浸漬して、着色する。染
色液は、0゜工〜fOwt%の染料を含む水溶液を10
〜100′″Cに保ったもので、場合によっては酸が添
加される。このようにして着色を行なった後、タンニン
酸の酸性水溶液と酒石酸アンチモリラムカリウムの酸性
水溶液に順次浸漬および水洗することによって固着処理
を行なう。それぞれの水溶液は必要に応じて加温されて
いる。
As a synthetic product, JDS series (Japan Synthetic Rubber Co., Ltd.!!
ri RWI 01 (ta water 7 yin'r mih)
& Co.), R102, and R833 (all made by Nippon Kayaku Co., Ltd.) have been put into practical use. Any of the above materials for the color filter layer is applied onto a glass substrate on which a light-shielding frame made of a nickel layer is covered with a positive resist, and dried. Furthermore, if the adhesion between the color filter material and the glass substrate or positive resist is poor, an intermediate layer may be formed before applying the color filter material. After drying the coating film, it is irradiated with ultraviolet rays through an exposure mask to crosslink only predetermined areas, and the uncrosslinked areas are dissolved by development to form a pattern of color filter material. Then, heating is further performed to strengthen the adhesion with the lower layer. A glass substrate on which a color filter material layer is formed by such photolithography is immersed in a dyeing liquid to be colored. The dyeing solution is an aqueous solution containing a dye of 0° to 10% by weight.
It is maintained at ~100'''C, and acid is added in some cases. After coloring in this way, it is sequentially immersed in an acidic aqueous solution of tannic acid and an acidic aqueous solution of antimolyrum potassium tartrate, and washed with water. The fixing process is performed by heating each aqueous solution as necessary.

第1図(b)に示すような赤、緑、青の三色から成るカ
ラーフィルターを製造する場合には、以上述べたカラー
フィルター材料の性膜から固着処理に至る一連の工程を
それぞれの色に応じた染色液を使って三回繰り返すこと
により製造することができる。
When manufacturing a color filter consisting of three colors of red, green, and blue as shown in Figure 1 (b), the series of steps from the above-mentioned color filter material coating to fixing treatment are performed for each color. It can be manufactured by repeating the process three times using the appropriate staining solution.

その工程の中で、固着処理においてカラーフィルター材
料中へ酸性水溶液が浸透するが、ニッケルから成る遮光
枠は、ポジ型レジストで覆われているため、酸によって
腐食することがない。
During the fixing process, an acidic aqueous solution penetrates into the color filter material, but the nickel light-shielding frame is covered with a positive resist, so it will not be corroded by the acid.

〔発明の効果〕〔Effect of the invention〕

以上述べたように本発明によれば、酸によって腐食され
る金属層から成る遮光枠を形成する際、用いるレジスト
をパターン形成後に?す離せずそのまま遮光枠を覆う耐
酸性物質として用いることによって、通常の工程に対し
てII+ 111工程を減らす一方、酸によって腐食さ
れる金属層から成る遮光枠上に耐酸性物質を積層して耐
酸性を付加したカラーフィルターを製造することができ
るという効果を佇する。
As described above, according to the present invention, when forming a light-shielding frame made of a metal layer that is corroded by acid, the resist used is changed after pattern formation. By using it as an acid-resistant material that covers the light-shielding frame without removing it, the number of II+111 steps is reduced compared to the normal process. It has the effect of being able to manufacture color filters with added characteristics.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(a)、(b)は、本発明によるカラーフィルタ
ーの製造工程を示す図。 第2図は従来のカラーフィルターの断面図。 1・・・ガラス基板 2・・・ニッケル遮光枠 3・・・耐酸性レジスト 4R・・・赤色に染色されたカラーフィルター材料 4G・・・緑色に染色されたカラーフィルター材料 4B・・・青色に染色されたカラーフィルター材料 以  上 出願人 セイコーエプソン株式会社
FIGS. 1(a) and 1(b) are diagrams showing the manufacturing process of a color filter according to the present invention. Figure 2 is a cross-sectional view of a conventional color filter. 1... Glass substrate 2... Nickel light-shielding frame 3... Acid-resistant resist 4R... Color filter material dyed red 4G... Color filter material dyed green 4B... Blue Dyeed color filter materials and above Applicant: Seiko Epson Corporation

Claims (1)

【特許請求の範囲】[Claims] 酸によって腐食される金属層から成る遮光枠上に耐酸性
物質が積層されているカラーフィルターの製造方法にお
いて、前記金属層をパターン形成する際に用いるレジス
トを、パターン形成後も剥離せず、そのまま前記耐酸性
物質として用いることを特徴とするカラーフィルターの
製造方法。
In a method for manufacturing a color filter in which an acid-resistant material is laminated on a light-shielding frame made of a metal layer that is corroded by acid, the resist used to pattern the metal layer is left as it is without being peeled off even after the pattern is formed. A method for producing a color filter, characterized in that it is used as the acid-resistant substance.
JP63027180A 1988-02-08 1988-02-08 Production of color filter Pending JPH01201604A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63027180A JPH01201604A (en) 1988-02-08 1988-02-08 Production of color filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63027180A JPH01201604A (en) 1988-02-08 1988-02-08 Production of color filter

Publications (1)

Publication Number Publication Date
JPH01201604A true JPH01201604A (en) 1989-08-14

Family

ID=12213880

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63027180A Pending JPH01201604A (en) 1988-02-08 1988-02-08 Production of color filter

Country Status (1)

Country Link
JP (1) JPH01201604A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006227295A (en) * 2005-02-17 2006-08-31 Toppan Printing Co Ltd Color filter, color filter substrate, and liquid crystal display device using the substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006227295A (en) * 2005-02-17 2006-08-31 Toppan Printing Co Ltd Color filter, color filter substrate, and liquid crystal display device using the substrate

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