JPH01197400A - Production of sic whisker - Google Patents
Production of sic whiskerInfo
- Publication number
- JPH01197400A JPH01197400A JP1915488A JP1915488A JPH01197400A JP H01197400 A JPH01197400 A JP H01197400A JP 1915488 A JP1915488 A JP 1915488A JP 1915488 A JP1915488 A JP 1915488A JP H01197400 A JPH01197400 A JP H01197400A
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- gas
- temp
- heating zone
- furnace
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 238000006243 chemical reaction Methods 0.000 claims abstract description 33
- 238000010438 heat treatment Methods 0.000 claims abstract description 25
- 239000002994 raw material Substances 0.000 claims abstract description 15
- 239000003054 catalyst Substances 0.000 claims abstract description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 6
- 239000010703 silicon Substances 0.000 claims abstract description 6
- 239000012298 atmosphere Substances 0.000 claims description 5
- 239000003575 carbonaceous material Substances 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 3
- 239000007789 gas Substances 0.000 abstract description 33
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052799 carbon Inorganic materials 0.000 abstract description 3
- 239000000741 silica gel Substances 0.000 abstract description 3
- 229910002027 silica gel Inorganic materials 0.000 abstract description 3
- 239000000377 silicon dioxide Substances 0.000 abstract description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- 239000006004 Quartz sand Substances 0.000 abstract 1
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 238000000034 method Methods 0.000 description 15
- 230000000694 effects Effects 0.000 description 10
- 230000002411 adverse Effects 0.000 description 5
- 239000007795 chemical reaction product Substances 0.000 description 5
- 239000012071 phase Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- 238000010924 continuous production Methods 0.000 description 3
- 239000006229 carbon black Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 238000010532 solid phase synthesis reaction Methods 0.000 description 2
- 229910021580 Cobalt(II) chloride Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000012779 reinforcing material Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、金属、プラスチック、セラミックスなどの複
合強化材として有用なSiCウィスカーの製造方法に関
し、とくに真直性に優れた高品位のSICウィスカーを
収率よく生成させる方法に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for producing SiC whiskers useful as composite reinforcing materials for metals, plastics, ceramics, etc. The present invention relates to a method for producing the product with good yield.
(従来の技術)
SiCウィスカーの製造技術は、気相系の原料を用いる
方法と固相原料を用いる方法に大別されるが、前者の気
相法は原料物質が高価で収率が悪いという問題点があり
、そのうえハンドリングの面から工程の連続化が難しい
ため現在のところ生産方法として確立していない。(Prior art) SiC whisker manufacturing technology can be broadly divided into methods using gas-phase raw materials and methods using solid-phase raw materials, but the former gas-phase method uses expensive raw materials and has poor yields. This method has not been established as a production method at present because there are problems and it is difficult to make the process continuous due to handling issues.
一方、固相法には固定炉を用いるバッチ方式のほかに連
続的な製造技術も提案されている。例えば、ルツボなど
の密閉反応容器に原料物質を充填して加熱炉内を順次連
続的に移動させる方法、あるいは回転床機構を備える開
放系の反応加熱帯域に原料物質を連続的に供給する方法
(特公表昭58−502096>が知られており気相法
に比べて実用性に優れていることが認められている。On the other hand, in addition to the batch method using a fixed furnace, continuous manufacturing techniques have also been proposed for the solid phase method. For example, a method of filling a closed reaction container such as a crucible with a raw material and moving it sequentially and continuously in a heating furnace, or a method of continuously supplying a raw material to an open reaction heating zone equipped with a rotating bed mechanism ( Japanese Patent Publication No. 58-502096> is known and is recognized to be superior in practicality compared to the gas phase method.
上側の固相法による連続製造技術の中では、ルツボなど
の密閉反応容器を用いる方法(以下「密閉系」という)
よりも開放系の反応加熱帯域を利用する方法(以下「開
放系」という)の方が連続生産の面で設備的、工程的に
有利である。ところが、開放系においては雰囲気ガスの
影響で得られるSiCウィスカーの性状ならびに生成収
率を減退させることがある。Among the continuous manufacturing technologies using the solid-phase method mentioned above, there is a method using a closed reaction container such as a crucible (hereinafter referred to as "closed system").
A method using an open reaction heating zone (hereinafter referred to as "open system") is more advantageous in terms of continuous production in terms of equipment and process. However, in an open system, the properties and production yield of SiC whiskers obtained may deteriorate due to the influence of atmospheric gas.
通常、SiCウィスカーの生成は反応環境を非酸化性も
しくは還元性の雰囲気に保持する必要があり、このため
に反応炉内にN2 、Ar 、Co。Normally, the generation of SiC whiskers requires keeping the reaction environment in a non-oxidizing or reducing atmosphere, and for this purpose, N2, Ar, and Co are added to the reactor.
H2等のガスを導入する手段が講じられている。Measures have been taken to introduce gas such as H2.
この際、密閉系ではルツボなどの反応容器の内部が反応
生成ガスによって充満されるため導入するガス成分の影
響を受けることはないが、開放系の場合には反応加熱帯
域に導入ガスが接触することでSiCウィスカーの生成
が阻害されたり真直性が損なわれるなどの現象を伴う。At this time, in a closed system, the interior of the reaction vessel such as a crucible is filled with the reaction product gas, so it is not affected by the introduced gas components, but in an open system, the introduced gas comes into contact with the reaction heating zone. This is accompanied by phenomena such as inhibition of SiC whisker generation and loss of straightness.
この現象はとくに炉内にN2ガスを導入するケースで顕
著に発生することが確認された。It has been confirmed that this phenomenon occurs particularly when N2 gas is introduced into the furnace.
N2は炉内雰囲気を保持するガス成分としては、取扱い
、価格等の点で最適であり、上記課題が解決されれば開
放系によるSiCウィスカーの連続製法が大きく改善さ
れることになる。N2 is optimal as a gas component for maintaining the furnace atmosphere in terms of handling, price, etc., and if the above problems are solved, the continuous production method of SiC whiskers using an open system will be greatly improved.
発明者は開放系において生じる雰囲気ガスの悪影響につ
き鋭意研究を重ねた結果、この原因は原料から発生する
反応生成ガスの平衡状態が雰囲気ガスによって乱される
ため、反応析出してくるウィスカーの生長に悪影響を与
えていることを知り、更にN2ガス雰囲気の場合には、
上記影響のみならず、N2ガスが反応加熱帯域にある原
料物質のうち、Si成分と先行的に反応を起して、ウィ
スカーの生長に悪影響を及ぼすことを解明して、本発明
に至った。As a result of extensive research into the adverse effects of atmospheric gases that occur in open systems, the inventor found that the cause of this is that the equilibrium state of the reaction product gas generated from the raw materials is disturbed by the atmospheric gas, which leads to the growth of the whiskers that are precipitated by the reaction. If you know that it is having an adverse effect and are in a N2 gas atmosphere,
In addition to the above-mentioned effects, it has been found that N2 gas causes a preliminary reaction with the Si component of the raw materials in the reaction heating zone, which adversely affects the growth of whiskers, leading to the present invention.
すなわち、本発明によるSiCウィスカーの製造方法は
、けい素源原料、炭材および触媒からなる原料物質を開
放系の反応加熱帯域(1500〜17006C)に連続
的に供給してSiCウィスカーを生成させる方法におい
て、雰囲気ガスとして用いるN2ガスを前記反応加熱帯
域と接触しない状態で10cm/分以下の流速により導
入するとともに、1200〜1400℃の加熱段階を1
0℃/分以上の昇温速度に設定することを構成的特徴と
する。That is, the method for producing SiC whiskers according to the present invention is a method of producing SiC whiskers by continuously supplying a raw material consisting of a silicon source material, a carbonaceous material, and a catalyst to an open reaction heating zone (1500 to 17006 C). In this step, N2 gas used as an atmospheric gas was introduced at a flow rate of 10 cm/min or less without contacting the reaction heating zone, and a heating step of 1200 to 1400°C was performed.
A structural feature is that the temperature increase rate is set to 0° C./min or more.
開放系によるSiCウィスカーの連続製造をおこなう装
置として例えば図示のような反応炉(1)が用いられる
が、本発明の第1の要件であるN2ガスを反応加熱帯域
と接触しない状態で導入する手段は、ヒータ一部(2)
とベルトコンベヤー(3)により区画される反応加熱帯
域(A)の上面にN2流域分離板(4)を介設して炉内
に導入したN2ガスが反応加熱帯域(A)と接触せずに
炉外に排出するように設計される。For example, a reactor (1) as shown in the figure is used as an apparatus for continuous production of SiC whiskers in an open system, but the first requirement of the present invention is a means for introducing N2 gas without contacting the reaction heating zone. is part of the heater (2)
A N2 region separation plate (4) is interposed on the upper surface of the reaction heating zone (A), which is divided by a belt conveyor (3), so that the N2 gas introduced into the furnace does not come into contact with the reaction heating zone (A). Designed to be discharged outside the furnace.
しかし、開放系の場合には反応加熱帯域(A)が常に反
応生成ガスで充満している状態を保持することができな
い関係で、上記した第1の要件のみではN2雰囲気の悪
影響を完全に払拭することはできない。However, in the case of an open system, it is not possible to maintain a state in which the reaction heating zone (A) is always filled with the reaction product gas, so the above-mentioned first requirement alone cannot completely eliminate the adverse effects of the N2 atmosphere. I can't.
このための解決手段として、1200〜1400″Cの
加熱段階を10℃/分以上の、〕激な昇温速度に設定す
る第3の要件が必要となる。また、反応生成ガスの平衡
状態を安定に保つために、反応炉内におけるN2ガスの
流速を10am/分以下に設定する第2の要件が必要と
なる。As a solution to this, the third requirement is to set the heating stage of 1200 to 1400"C at a rapid temperature increase rate of 10°C/min or more. Also, the equilibrium state of the reaction product gas is In order to maintain stability, the second requirement is to set the flow rate of N2 gas in the reactor to 10 am/min or less.
上記した3つの要件を適用することによって、N2雰囲
気ガスによる障害なしにSiCウィスカーの生成を円滑
に進行させることができる。これらの効果を一層改善し
、反応を容易にするために触媒としてFe + Niま
たはCoの水溶性化合物を用い、これをけい素源に対し
5〜25重量%の範囲で介在させることが望ましい。By applying the above three requirements, the generation of SiC whiskers can proceed smoothly without interference from N2 atmospheric gas. In order to further improve these effects and facilitate the reaction, it is desirable to use a water-soluble compound of Fe + Ni or Co as a catalyst in an amount of 5 to 25% by weight based on the silicon source.
なお、本発明に供される原料物質は、けい素源原料とし
てけい砂、けい石、シリカゲルなどの5t02含有粉末
が、炭材としてカーボンブラック、コークス粉、黒鉛粉
などが、また触媒となるFe。The raw materials used in the present invention include 5t02-containing powder such as silica sand, silica stone, and silica gel as a silicon source material, carbon black, coke powder, graphite powder, etc. as a carbon material, and Fe as a catalyst. .
NiまたはCoの水溶性化合物としては例えばFeC1
2・4H20,Ni (NO3)2 ・6H20゜C
oCl2 ・6H20などが好適に用いられる。As a water-soluble compound of Ni or Co, for example, FeCl
2・4H20, Ni (NO3)2 ・6H20°C
oCl2.6H20 and the like are preferably used.
本発明の構成に基づき、N2ガスを反応加熱帯域と接触
させないように導入する第1の要件とN2ガスの流速を
101/分以下に設定する第2の要件と、1200〜1
400℃の加熱段階をlO℃/分以上の分湯上度に設定
する第3の要件により、N2雰囲気ガスを利用する際に
生じる悪影響を尽く除去することが可能となる。Based on the configuration of the present invention, the first requirement is to introduce N2 gas so as not to contact the reaction heating zone, the second requirement is to set the flow rate of N2 gas to 101/min or less, and 1200 to 1/min.
The third requirement of setting the heating stage at 400° C. to a heating rate of 10° C./min or more makes it possible to completely eliminate the adverse effects that occur when using N2 atmosphere gas.
このうち第2の要件による作用としては、まずSiCウ
ィスカーは原料物質同志が反応し、気相を経て生成する
と言われている。この反応系において発生する反応生成
ガスの平衡状態を安定に保つためにN2ガスの流速を1
0cn /分収下に抑えている。As for the action according to the second requirement, it is said that SiC whiskers are first generated through a reaction between raw materials and a gas phase. In order to keep the equilibrium state of the reaction product gas generated in this reaction system stable, the flow rate of N2 gas was reduced to 1.
The yield is kept below 0cn/min.
第2の要件による作用は次のように考えられる。The effect of the second requirement can be considered as follows.
つまりN2ガスとSi源との反応は熱力学的にみてSi
Cウィスカーの生成温度(1500〜1700’ C)
より低温の1250〜1400℃で生じることが確認さ
れているが、第2の要件でこの温度段階の昇温が急速化
し、この作用によって窒化反応が効果的に抑制されSi
Cウィスカーの円滑な生成と真直性付与の実現がもたら
される。In other words, the reaction between N2 gas and Si source is thermodynamically
C whisker formation temperature (1500-1700'C)
It has been confirmed that this occurs at a lower temperature of 1250 to 1400°C, but the second requirement accelerates the temperature rise at this temperature stage, and this action effectively suppresses the nitriding reaction and increases the Si
This results in smooth generation of C whiskers and imparting straightness.
これらの作用は、触媒にFe、NiまたはG。These effects can be achieved by using Fe, Ni or G as a catalyst.
の水溶性化合物を用いてSi源に対し3.0〜6.0重
量%の範囲で供用することにより一層促進される。This can be further promoted by using a water-soluble compound in an amount of 3.0 to 6.0% by weight based on the Si source.
5.0%のGo C12・6H20を含有するシリカゲ
ルを100メツシユ以下に粉砕してSt源原料とし、こ
れに炭材としてカーボンブラック〔“5EAS75H”
東海カーボン(株)製〕を1:1.2の重量比で配合し
、十分均一となるまで混合してかさ密度0−1 g /
ccの原料物質を調製した。Silica gel containing 5.0% Go C12.6H20 was ground to 100 mesh or less to use as a St source raw material, and carbon black ["5EAS75H"] was added as a carbon material to this.
(manufactured by Tokai Carbon Co., Ltd.) at a weight ratio of 1:1.2 and mixed until sufficiently homogeneous to achieve a bulk density of 0-1 g/
A raw material for cc was prepared.
図示構造の反応炉を用い、リザーブタンク(5)に貯蔵
した原料物質をフィーダー(6)から走行するベルトコ
ンベヤー(3)上に連続的に供給した。炉内に介設した
N2流域分離板の上方にN2ガスを5am/分の流速で
導入し、ヒータ一部(2)の負荷条件とベルトコンベヤ
ー(3)の速度を制御することにより反応加熱帯域(A
)における1200〜1400’ Cの昇温速度を30
℃/分に設定し1500〜1700℃の反応温度に保持
してSiCウィスカーの生成をおこなった。Using a reactor having the structure shown, raw materials stored in a reserve tank (5) were continuously supplied from a feeder (6) onto a running belt conveyor (3). N2 gas is introduced at a flow rate of 5 am/min above the N2 region separator plate installed in the furnace, and the reaction heating zone is controlled by controlling the load condition of the heater part (2) and the speed of the belt conveyor (3). (A
) at 1200-1400'C heating rate at 30
The reaction temperature was set at 1500 to 1700° C. and SiC whiskers were generated.
比較のために、N2流域分離板(4)を介設しない反応
炉を用い、導入ガス二N2 (流速203/分) 、1
200〜1400℃の昇温速度:5℃/分、触媒: C
o C12・6 N205.0重量%(対Si源)の製
造条件例く比較例1〉、同型の反応炉を用い、導入ガス
:Ar(流速20cm/分)、1200〜1400℃の
昇温速度:5℃/分、触媒:CoCl2・6H205,
0重量%(対Si源)の製造条件例く比較例2〉を適用
してそれぞれSiCウィスカーの生成をおこなった。For comparison, a reactor without the N2 region separator (4) was used, and the introduced gas was 2N2 (flow rate 203/min), 1
Temperature increase rate from 200 to 1400°C: 5°C/min, catalyst: C
o C12.6 N205.0% by weight (relative to Si source) manufacturing conditions Example Comparative Example 1> Using the same type of reactor, introduced gas: Ar (flow rate 20 cm/min), temperature increase rate of 1200 to 1400°C :5℃/min, catalyst: CoCl2・6H205,
SiC whiskers were produced by applying the manufacturing conditions of 0% by weight (based on the Si source), such as Comparative Example 2.
これら3例により得られたSiCウィスカーの性状なら
びに収率を対比して下表に示した。The properties and yields of SiC whiskers obtained in these three examples are compared and shown in the table below.
表示の結果から、本発明の実施例は比較例1゜2に比べ
得られたSiCウィスカーの性状ならびに収率ともに大
きく改善されていることが認められた。From the results shown, it was recognized that the properties and yield of the SiC whiskers obtained in the examples of the present invention were greatly improved compared to Comparative Example 1.2.
本発明によれば、取扱いが容易で安価なN2を雰囲気ガ
スとして開放系手段により高品質性状のSiCウィスカ
ーを収率よく連続生産することができるから、産業的に
寄与するところ大である。According to the present invention, it is possible to continuously produce high-quality SiC whiskers with high yield by open system means using N2, which is easy to handle and inexpensive, as an atmosphere gas, and therefore it makes a great contribution to industry.
図は本発明に用いられるSiCウィスカーの製造装置を
例示した断面図である。
(1)・・・反応炉 (2)・・・ヒータ一部
(3)・・・ベルトコンベヤー
(4)・・・N2流域分離板 (A)・・・反応加熱帯
域特許出願人 東海カーボン株式会社The figure is a cross-sectional view illustrating an SiC whisker manufacturing apparatus used in the present invention. (1) Reaction furnace (2) Part of the heater (3) Belt conveyor (4) N2 basin separation plate (A) Reaction heating zone Patent applicant Tokai Carbon Co., Ltd. company
Claims (1)
開放系の反応加熱帯域(1500〜1700℃)に連続
的に供給してSiCウィスカーを生成させる方法におい
て、雰囲気ガスとして用いるN_2ガスを前記反応加熱
帯域と接触しない状態で10cm/分以下の流速により
導入するとともに、120〜1400℃の加熱段階を1
0℃/分以上の昇温速度に設定することを特徴とするS
iCウィスカーの製造方法。 2、触媒にFe、NiまたはCoの水溶性化合物を用い
、これをけい素源に対し5.0〜25重量%の範囲で介
在させる請求項1記載のSiCウィスカーの製造方法。[Claims] 1. In a method for producing SiC whiskers by continuously supplying a raw material consisting of a silicon source material, a carbonaceous material, and a catalyst to an open reaction heating zone (1500 to 1700°C), the atmosphere N_2 gas used as a gas is introduced at a flow rate of 10 cm/min or less without contacting the reaction heating zone, and a heating step of 120 to 1400°C is performed.
S characterized by setting the temperature increase rate to 0°C/min or more
Method for producing iC whiskers. 2. The method for producing SiC whiskers according to claim 1, wherein a water-soluble compound of Fe, Ni or Co is used as a catalyst in an amount of 5.0 to 25% by weight based on the silicon source.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1915488A JPH01197400A (en) | 1988-01-29 | 1988-01-29 | Production of sic whisker |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1915488A JPH01197400A (en) | 1988-01-29 | 1988-01-29 | Production of sic whisker |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01197400A true JPH01197400A (en) | 1989-08-09 |
Family
ID=11991502
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1915488A Pending JPH01197400A (en) | 1988-01-29 | 1988-01-29 | Production of sic whisker |
Country Status (1)
Country | Link |
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JP (1) | JPH01197400A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5404836A (en) * | 1989-02-03 | 1995-04-11 | Milewski; John V. | Method and apparatus for continuous controlled production of single crystal whiskers |
-
1988
- 1988-01-29 JP JP1915488A patent/JPH01197400A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5404836A (en) * | 1989-02-03 | 1995-04-11 | Milewski; John V. | Method and apparatus for continuous controlled production of single crystal whiskers |
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