JPH01168854A - Transparent sheet coated with antireflection film containing metal film - Google Patents
Transparent sheet coated with antireflection film containing metal filmInfo
- Publication number
- JPH01168854A JPH01168854A JP62325720A JP32572087A JPH01168854A JP H01168854 A JPH01168854 A JP H01168854A JP 62325720 A JP62325720 A JP 62325720A JP 32572087 A JP32572087 A JP 32572087A JP H01168854 A JPH01168854 A JP H01168854A
- Authority
- JP
- Japan
- Prior art keywords
- refractive index
- layer
- refractive
- index
- oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 22
- 239000002184 metal Substances 0.000 title claims abstract description 22
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 11
- 239000000956 alloy Substances 0.000 claims abstract description 11
- 239000000758 substrate Substances 0.000 claims abstract description 11
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims abstract description 8
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910001220 stainless steel Inorganic materials 0.000 claims abstract description 4
- 239000010935 stainless steel Substances 0.000 claims abstract description 4
- 230000003287 optical effect Effects 0.000 claims description 19
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
- 229910052777 Praseodymium Inorganic materials 0.000 claims description 8
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 8
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 claims description 8
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 7
- 229910003437 indium oxide Inorganic materials 0.000 claims description 6
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 6
- 229910001887 tin oxide Inorganic materials 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 239000011651 chromium Substances 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- 239000005083 Zinc sulfide Substances 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910052984 zinc sulfide Inorganic materials 0.000 claims description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 2
- 239000000853 adhesive Substances 0.000 claims description 2
- 230000001070 adhesive effect Effects 0.000 claims description 2
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 2
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- 229910001936 tantalum oxide Inorganic materials 0.000 claims description 2
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 2
- 229910000599 Cr alloy Inorganic materials 0.000 claims 1
- 239000000788 chromium alloy Substances 0.000 claims 1
- 230000008018 melting Effects 0.000 claims 1
- 238000002844 melting Methods 0.000 claims 1
- 239000011521 glass Substances 0.000 abstract description 20
- 239000012788 optical film Substances 0.000 abstract description 6
- 238000001771 vacuum deposition Methods 0.000 abstract description 2
- 238000001579 optical reflectometry Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 27
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 238000002834 transmittance Methods 0.000 description 8
- 238000009125 cardiac resynchronization therapy Methods 0.000 description 5
- 229910001092 metal group alloy Inorganic materials 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- -1 Alternatively Chemical compound 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910000623 nickel–chromium alloy Inorganic materials 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
Landscapes
- Surface Treatment Of Optical Elements (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野コ
本発明は、透明基板の光の反射を低減する反射防止膜付
着透明板、特に光を吸収する金属層、または金属合金層
を有する多層反射防止膜付着透明板に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a transparent plate coated with an anti-reflection film for reducing light reflection on a transparent substrate, particularly a multilayer reflective film having a metal layer or a metal alloy layer that absorbs light. This invention relates to a transparent plate with a protective film attached.
［従来の技術］
従来、光を吸収する金属層を有する多層反射防止膜付着
透明板として、透明基板の一方の面に誂電体のみからな
る多層反射防止膜を形成し、もう一方の面に透過率が３
０％〜８０％となるような厚みの光吸収のある金属層を
形成したものが特開昭６２−５８２０２で公知である。[Prior Art] Conventionally, as a transparent plate with a multilayer antireflection coating having a metal layer that absorbs light, a multilayer antireflection coating consisting only of dielectric material is formed on one side of a transparent substrate, and a multilayer antireflection coating is formed on the other side. Transmittance is 3
A method in which a metal layer with light absorption is formed with a thickness of 0% to 80% is known from JP-A-62-58202.
この金属層を有する多層反射防止膜付着透明板は多層反
射防止膜により透明板の反射率を下げると共に金属層に
より光を吸収して透明基板の透過率を調整しようとする
ものである。This transparent plate with a multilayer antireflection coating having a metal layer is intended to lower the reflectance of the transparent plate by the multilayer antireflection coating and to adjust the transmittance of the transparent substrate by absorbing light by the metal layer.
［発明が解決しようとする問題点］
しかしながら、このような金属層を有する多層反射防止
膜付着透明板は透明基板表面に付着した多層反射防止膜
により、その表面反射は極めて小さくすることができる
が、透明基体のもう一方の面と金属層との界面の反射等
により、該透明板全体の反射率を約１％程度にしか低下
できず、この金属層を有する多層反射防止膜付着透明板
をＣＲＴ等のガラス製デイスプレィに貼付けて使用する
場合でも、その全体の視感度反射率を０．６％程度にま
でしか下げることができなかった。[Problems to be Solved by the Invention] However, in the case of such a transparent plate with a multilayer antireflection coating having a metal layer, the surface reflection can be made extremely small due to the multilayer antireflection coating attached to the surface of the transparent substrate. However, due to reflections at the interface between the other surface of the transparent substrate and the metal layer, the reflectance of the entire transparent plate can be reduced to only about 1%. Even when used by pasting it on a glass display such as a CRT, the overall visibility reflectance could only be reduced to about 0.6%.
［問題を解決するための手段］
この発明は、このような従来の問題点を解決すべくなさ
れたもので有り、透明板全体の反射率を極めて小さくし
た反射防止膜付着透明板を提供することを目的としたも
のである。[Means for Solving the Problems] The present invention has been made to solve these conventional problems, and it is an object of the present invention to provide a transparent plate coated with an anti-reflection film in which the reflectance of the entire transparent plate is extremely small. The purpose is to
この目的を達成するために、この発明は屈折率が１．４
０〜１．７０の透明基板の表面に光の反射を防止するた
めの反射防止膜を付着した透明板において、該反射防止
膜が２．００〜２．４０の屈折率で、且つ０．３０×λ
０／４〜０．５０×λ０／４（λＯは中心波長、以下同
じ）の光学膜厚の第１の高屈折率誘電体層と、１．３７
〜１゜５０の屈折率で、且つ１．４０×λ０／４〜１゜
体層と３５Ａ〜９０Ａの膜厚のチタン、クロム、ジルコ
ニウム、モリブデン、ニッケル、ニッケル・クロム合金
、及びステンレスのいずれか一つの金属層または合金層
と、２．００〜２．４０の屈折率で、且つ０．０３×λ
Ｏ／４〜０．８０×λ０／４の光学膜厚の第２の低屈折
率誘電体層と、１．３７〜１．５０の屈折率で、且つ０
．８ｘλ０／４〜１．２×λ０／４の光学膜厚の第２の
低屈折率誘電体層とからなり、該各層が該透明基板表面
から順次形成されている。To achieve this objective, the present invention has a refractive index of 1.4.
A transparent plate having an antireflection film attached to the surface of a transparent substrate having a refractive index of 0 to 1.70 to prevent reflection of light, wherein the antireflection film has a refractive index of 2.00 to 2.40 and a refractive index of 0.30. ×λ
A first high refractive index dielectric layer with an optical thickness of 0/4 to 0.50×λ0/4 (λO is the center wavelength, the same applies hereinafter), and 1.37
Any of titanium, chromium, zirconium, molybdenum, nickel, nickel-chromium alloy, and stainless steel with a refractive index of ~1°50, a 1.40×λ0/4~1° body layer, and a film thickness of 35A to 90A. one metal layer or alloy layer, with a refractive index of 2.00 to 2.40, and 0.03×λ
a second low refractive index dielectric layer with an optical thickness of O/4 to 0.80×λ0/4, a refractive index of 1.37 to 1.50, and 0
．． and a second low refractive index dielectric layer having an optical thickness of 8xλ0/4 to 1.2xλ0/4, and each layer is formed sequentially from the surface of the transparent substrate.
本発明において、屈折率が１．４０〜１．７０の透明基
板としては通常ガラス板、または合成樹脂板が用いられ
る。合成樹脂板としてはアクリル樹脂板、ポリカーボネ
イト樹脂板、またはポリスチレン樹脂板が好んで用いら
れる。In the present invention, a glass plate or a synthetic resin plate is usually used as the transparent substrate having a refractive index of 1.40 to 1.70. As the synthetic resin plate, an acrylic resin plate, a polycarbonate resin plate, or a polystyrene resin plate is preferably used.
また、本発明において前記第１及び第２の高屈折率誘電
体層として、酸化チタン（Ｔｉ０２）、酸化タンタル（
Ｔａ２０５ ） 、酸化ジルコニウム（Ｚｒ０２）、チ
タン酸プラセオジム（ＰｒＴｉＯ３）、酸化ハフニウム
（Ｈｆ０２）、硫化亜鉛（ＺｎＳ） 、酸化スズ（Ｓｎ
０２）、酸化インジウム（Ｉｎ２０３）、及び酸化イン
ジウムと酸化スズとの混合物（ＩＴＯ）のいずれかを用
いることができる。Further, in the present invention, the first and second high refractive index dielectric layers may be titanium oxide (Ti02), tantalum oxide (
Ta205), zirconium oxide (Zr02), praseodymium titanate (PrTiO3), hafnium oxide (Hf02), zinc sulfide (ZnS), tin oxide (Sn
02), indium oxide (In203), and a mixture of indium oxide and tin oxide (ITO) can be used.
酸化インジウムと酸化スズとの混合物としては酸化イン
ジウムと酸化スズとの重量比が９５＝５の割合のものを
用いるのが好ましい。It is preferable to use a mixture of indium oxide and tin oxide in which the weight ratio of indium oxide to tin oxide is 95=5.
更にまた、本発明において前記第１及び第２の低屈折率
誘電体層としてフッ化マグネシウム（ＭｇＦ２ ） 、
または酸化シリコン（Ｓｉ０２）のいずれかを用いるこ
とができる。Furthermore, in the present invention, the first and second low refractive index dielectric layers include magnesium fluoride (MgF2),
Alternatively, silicon oxide (Si02) can be used.
［作 用］
このような反射防止膜中に光吸収のある金属層または合
金層を組入れた本発明においては透明板に入射する光は
無論、透明板の裏面での反射光がこの金属層、または合
金層で吸収減衰されるため、反射防止膜付着透明板全体
の反射光は小さくなる。[Function] In the present invention, in which a light-absorbing metal layer or alloy layer is incorporated into such an antireflection film, not only light incident on the transparent plate but also light reflected on the back surface of the transparent plate is absorbed by the metal layer, Alternatively, since the light is absorbed and attenuated by the alloy layer, the amount of light reflected from the entire transparent plate coated with the antireflection film becomes small.
［実施例１］ 以下、本発明の実施例を図面を引用して説明する。[Example 1] Embodiments of the present invention will be described below with reference to the drawings.
第１図において、１は屈折率が１．５１のガラス板であ
って、ガラス板１の表面に反射防止膜７が形成されてい
る。反射防止膜７はガラス板１の表面から順次屈折率が
２．４０で、光学膜厚が０．０８９４×λ０／４（但し
λＯ＝５０４ｎｍｓ以下同じ）の酸化チタン層２と屈折
率が１．３７で、光学膜厚が１．７２５３×λ０／４の
フッ化マグネシウム層３と、膜厚が７ＯＡのステンレス
（７２重量％のニッケルと、１６重量％のクロムと、８
重量％の鉄との合金）層４と、屈折率が２゜４０で、光
学膜厚が０．８９５８×λ０／４の酸化チタン層５と、
屈折率が１．３７で、光学膜厚が１．０９３８×λ０／
４のフッ化マグネシウム層６とからなり、各層はガラス
板１面上に順次真空蒸着法を用いて形成された。In FIG. 1, 1 is a glass plate having a refractive index of 1.51, and an antireflection film 7 is formed on the surface of the glass plate 1. The anti-reflection film 7 has a refractive index of 2.40 from the surface of the glass plate 1, and a titanium oxide layer 2 with an optical thickness of 0.0894×λ0/4 (the same below λO=504 nm) and a refractive index of 1.40. 37, a magnesium fluoride layer 3 with an optical thickness of 1.7253×λ0/4, a stainless steel layer with a thickness of 7OA (72% by weight of nickel, 16% by weight of chromium, 8% by weight)
a titanium oxide layer 5 with a refractive index of 2°40 and an optical thickness of 0.8958×λ0/4,
The refractive index is 1.37 and the optical film thickness is 1.0938×λ0/
4 magnesium fluoride layers 6, each layer was sequentially formed on one glass plate using a vacuum evaporation method.
反射防止膜７を形成したガラス板１のガラス面側をガラ
スと同じ程度の屈折率を有する接着剤を用いて、ＣＲＴ
のフェースプレートに接着してガラス面側の反射をなく
した。このときの反射防止膜付着ガラス板の反射特性を
第２図に、透過率特性を第３図に、視感度反射率及び視
感度透過率を第１表に夫々示した。The glass surface side of the glass plate 1 on which the anti-reflection film 7 has been formed is attached to a CRT using an adhesive having a refractive index similar to that of the glass.
Glued to the face plate of the camera to eliminate reflections on the glass side. The reflection characteristics of the glass plate to which the antireflection film was attached are shown in FIG. 2, the transmittance characteristics are shown in FIG. 3, and the luminous reflectance and luminous transmittance are shown in Table 1, respectively.
第１表
なお、従来例においては視感度反射率が０．６５％、視
感度透過率が８０％のものしか得られなかった。Table 1 Note that in the conventional example, only a luminous reflectance of 0.65% and a luminous transmittance of 80% were obtained.
Ｃ実施例２コ
第１図に示したと同様な構成の反射防止膜付着ガラス板
であって、反射防止膜７の多層膜を以下の如くした。C Example 2 A glass plate having an anti-reflection film attached thereto had the same structure as shown in FIG. 1, and the multilayer film of the anti-reflection film 7 was made as follows.
すなわち、反射防止膜７は屈折率が２．１５で、光学膜
厚が０．０３８４×λＯ／４のチタン酸プラセオジム層
２と、屈折率が１．３７で、光学膜厚が１．７３３８×
λ０／４）のフッ化マグネシウム層３と、膜厚が５０Ａ
のチタン層４と、屈折率が２．１５で、光学膜厚が０．
７２０３×λ０／４のチタン酸プラセオジム層５と、屈
折率が１．３７で、光学膜厚が１．１１７５×λ０／４
のフッ化マグネシウム層６とからなり、これらの層はガ
ラス板１上に順次真空蒸着法により形成された。このよ
うにして得られた反射防止膜付着ガラス板を実施例１と
同様にして光学特性を測定したところ第１表に示したと
おり視感度反射率が０．１０％、視感度透過率が５５％
であった。That is, the antireflection film 7 has a praseodymium titanate layer 2 with a refractive index of 2.15 and an optical thickness of 0.0384×λO/4, and a praseodymium titanate layer 2 with a refractive index of 1.37 and an optical thickness of 1.7338×
λ0/4) magnesium fluoride layer 3 with a film thickness of 50A
The titanium layer 4 has a refractive index of 2.15 and an optical thickness of 0.
The praseodymium titanate layer 5 has a size of 7203×λ0/4, a refractive index of 1.37, and an optical thickness of 1.1175×λ0/4.
and a magnesium fluoride layer 6, and these layers were successively formed on the glass plate 1 by vacuum evaporation. The optical properties of the thus obtained anti-reflection coated glass plate were measured in the same manner as in Example 1. As shown in Table 1, the luminous reflectance was 0.10% and the luminous transmittance was 55. %
Met.
［実施例３コ
第１図に示したと同様な構成の反射防止膜付着ガラス板
であって、反射防止膜７の多層膜を以下の如くした。[Example 3] A glass plate having an antireflection film attached thereto had the same structure as shown in FIG. 1, and the multilayer film of the antireflection film 7 was made as follows.
すなわち、反射防止膜７は屈折率が２．１５で、光学膜
厚が０．２４８３×λ０／４のチタン酸プラセオジム層
２と、屈折率が１．３７で、光学膜厚が１．５３５５×
λ０／４のフッ化マグネシウム層３と、膜厚が３８犬の
Ｎ１（９０重量％）とＣｒ （１０重量％）との合金層
４と、屈折率が２゜１５で、光学膜厚が０．０３８３×
λ０／４のチタン酸プラセオジム層５と、屈折率１．３
７で、光学膜厚が０．９３６９×λ０／４のフッ化マグ
ネシウム層６とからなり、これらの届はガラス板１上に
順次真空蒸着法により形成された。That is, the antireflection film 7 has a praseodymium titanate layer 2 with a refractive index of 2.15 and an optical thickness of 0.2483×λ0/4, and a praseodymium titanate layer 2 with a refractive index of 1.37 and an optical thickness of 1.5355×
A magnesium fluoride layer 3 with a thickness of λ0/4, an alloy layer 4 of N1 (90% by weight) and Cr (10% by weight) with a film thickness of 38 mm, a refractive index of 2°15, and an optical film thickness of 0. .0383×
Praseodymium titanate layer 5 of λ0/4 and refractive index of 1.3
7 and a magnesium fluoride layer 6 having an optical thickness of 0.9369×λ0/4, these layers were sequentially formed on the glass plate 1 by vacuum evaporation.
このようにして得られた反射防止膜付着ガラス板を実施
例１と同様にして光学特性を測定したところ、第１表に
示したとおり、視感度反射率が０゜１５％、視感度透過
率が６５％であった。The optical properties of the thus obtained anti-reflection coated glass plate were measured in the same manner as in Example 1, and as shown in Table 1, the luminous reflectance was 0°15%, and the luminous transmittance was 0°15%. was 65%.
［発明の効果コ
以上のように本発明の反射防止膜付着透明板は反射防止
膜中に光吸収のある金属層、または合金層を組入れるこ
とにより、ＣＲＴ等の反射防止板として使用した場合に
視感度反射率をきわめて小さくすることができる。[Effects of the Invention] As described above, the transparent plate coated with an anti-reflection film of the present invention can be used as an anti-reflection plate for CRTs etc. by incorporating a light-absorbing metal layer or alloy layer into the anti-reflection film. Visibility reflectance can be made extremely small.
従って、ＣＲＴの画面が見やすくなり、更に光吸収の金
属層、または合金属によりＣＲＴの蛍光面に入射する光
が吸収されてコントラストがよ（なる。また前記金属層
または合金層をアースすることにより、前記透明板に帯
電防止機能を付与することができる。Therefore, the screen of the CRT becomes easier to see, and the light that is incident on the fluorescent screen of the CRT is absorbed by the light-absorbing metal layer or metal alloy, resulting in improved contrast.Also, by grounding the metal layer or alloy layer, , the transparent plate can be provided with an antistatic function.
図面は本発明の実施例を示すものであって、第１図は反
射防止膜付着透明板の断面図、第２図は反射防止膜付着
透明板の反射特性、第３図はその透過率特性である。
１：透明板、２：第１の高屈折率誘電体層、３：第１の
低屈折率誘電体層
４：金属層または合金層
５：第２の高屈折率誘電体層
６：第２の低屈折率誘電体層、７：反射防止膜第１図The drawings show examples of the present invention, in which Fig. 1 is a cross-sectional view of a transparent plate coated with an anti-reflection film, Fig. 2 shows the reflection characteristics of the transparent plate coated with the anti-reflection film, and Fig. 3 shows its transmittance characteristics. It is. 1: Transparent plate, 2: First high refractive index dielectric layer, 3: First low refractive index dielectric layer 4: Metal layer or alloy layer 5: Second high refractive index dielectric layer 6: Second Low refractive index dielectric layer, 7: Anti-reflection coating Figure 1
Claims (3)
光の反射を防止するための反射防止膜を付着した透明板
において、該反射防止膜が２．００〜２．４０の屈折率
で、且つ０．３０×λ＿０／４〜０．５０×λ＿０／４
（λ＿０は中心波長、以下同じ）の光学膜厚の第１の高
屈折率誘電体層と、１０３７〜１．５０の屈折率で、且
つ１．４０×λ＿０／４〜１．８０×λ＿０／４の光学
膜厚の第２の低屈折率融電体層と、３５Å〜９０Åの膜
厚のチタン、クロム、ジルコニウム、モリブデン、ニッ
ケル、ニッケル、クロム合金、及びステンレスのいずれ
か一つの金属層または合金層と、２．００〜２．４０の
屈折率で、且つ０．０３×λ＿０／４〜０．８０×λ＿
０／４の光学膜厚の第２の高屈折率誘電体層と、１．３
７〜１．５０の屈折率で、且つ０．８×λ＿０／４〜１
．２×λ＿０／４の光学膜厚の第２の低屈折率誘電体層
とからなり、該各層が該透明基板表面から順次形成され
てなる金属膜を含む反射防止膜付着透明板。(1) A transparent plate having an antireflection film attached to the surface of a transparent substrate having a refractive index of 1.40 to 1.70 to prevent reflection of light, the antireflection film having a refractive index of 2.00 to 2.40. refractive index, and 0.30×λ_0/4 to 0.50×λ_0/4
(λ_0 is the center wavelength, the same applies hereinafter), the first high refractive index dielectric layer has an optical thickness of 1037 to 1.50, and has a refractive index of 1.40×λ_0/4 to 1.80×λ_0/ a second low refractive index melting layer with an optical thickness of 4, and a metal layer of any one of titanium, chromium, zirconium, molybdenum, nickel, nickel, chromium alloy, and stainless steel with a thickness of 35 Å to 90 Å, or alloy layer and a refractive index of 2.00 to 2.40, and 0.03×λ_0/4 to 0.80×λ_
a second high refractive index dielectric layer with an optical thickness of 0/4;
With a refractive index of 7 to 1.50, and 0.8×λ_0/4 to 1
．． and a second low refractive index dielectric layer having an optical thickness of 2×λ_0/4, each of which includes a metal film formed sequentially from the surface of the transparent substrate, with an antireflection film attached thereto.
ン、酸化タンタル、酸化ジルコニウム、チタン酸プラセ
オジム、酸化ハフニウム、硫化亜鉛、酸化スズ、酸化イ
ンジウム、及び酸化インジウムと酸化スズとの混合物（
ＩＴＯ）のいずれかである特許請求の範囲第１項に記載
の金属膜を含む反射防止膜付着透明板。(2) The first and second high refractive index dielectric layers are made of titanium oxide, tantalum oxide, zirconium oxide, praseodymium titanate, hafnium oxide, zinc sulfide, tin oxide, indium oxide, and combinations of indium oxide and tin oxide. blend(
An anti-reflection film-attached transparent plate comprising the metal film according to claim 1, which is any one of ITO and ITO.
グネシウム、または酸化シリコンのいずれかである特許
請求の範囲第１項または第２項に記載の金属膜を含む反
射防止膜付着透明板。(3) An antireflection film containing a metal film according to claim 1 or 2, wherein the first and second low refractive index dielectric layers are either magnesium fluoride or silicon oxide. Adhesive transparent plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62325720A JPH01168854A (en) | 1987-12-23 | 1987-12-23 | Transparent sheet coated with antireflection film containing metal film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62325720A JPH01168854A (en) | 1987-12-23 | 1987-12-23 | Transparent sheet coated with antireflection film containing metal film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01168854A true JPH01168854A (en) | 1989-07-04 |
Family
ID=18179935
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62325720A Pending JPH01168854A (en) | 1987-12-23 | 1987-12-23 | Transparent sheet coated with antireflection film containing metal film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01168854A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8693099B2 (en) | 2006-07-28 | 2014-04-08 | Japan Display West Inc. | Antireflection film |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54134451A (en) * | 1978-04-11 | 1979-10-18 | Mamiya Camera | Multilayer reflection preventive film |
| JPS6149387A (en) * | 1984-08-13 | 1986-03-11 | ジーメンス、アクチエンゲゼルシヤフト | Device for connecting plural insulated leads |
-
1987
- 1987-12-23 JP JP62325720A patent/JPH01168854A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54134451A (en) * | 1978-04-11 | 1979-10-18 | Mamiya Camera | Multilayer reflection preventive film |
| JPS6149387A (en) * | 1984-08-13 | 1986-03-11 | ジーメンス、アクチエンゲゼルシヤフト | Device for connecting plural insulated leads |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8693099B2 (en) | 2006-07-28 | 2014-04-08 | Japan Display West Inc. | Antireflection film |
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