JPH01165565A - Azamethine compound, production thereof and optical information recording medium using said compound - Google Patents
Azamethine compound, production thereof and optical information recording medium using said compoundInfo
- Publication number
- JPH01165565A JPH01165565A JP62325998A JP32599887A JPH01165565A JP H01165565 A JPH01165565 A JP H01165565A JP 62325998 A JP62325998 A JP 62325998A JP 32599887 A JP32599887 A JP 32599887A JP H01165565 A JPH01165565 A JP H01165565A
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- Prior art keywords
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- chemical formulas
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 30
- 230000003287 optical effect Effects 0.000 title claims abstract description 18
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims abstract description 11
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 10
- 125000005842 heteroatom Chemical group 0.000 claims abstract description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 22
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 22
- 125000005843 halogen group Chemical group 0.000 claims description 15
- 125000005415 substituted alkoxy group Chemical group 0.000 claims description 15
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 8
- 125000003107 substituted aryl group Chemical group 0.000 claims description 8
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 5
- 125000000623 heterocyclic group Chemical group 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims 40
- 125000003277 amino group Chemical group 0.000 claims 3
- 239000010410 layer Substances 0.000 claims 3
- 239000011241 protective layer Substances 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 abstract description 7
- 238000010521 absorption reaction Methods 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 5
- 125000001424 substituent group Chemical group 0.000 abstract 5
- 125000003545 alkoxy group Chemical group 0.000 abstract 3
- 229910052736 halogen Inorganic materials 0.000 abstract 3
- 150000002367 halogens Chemical class 0.000 abstract 3
- JCXJVPUVTGWSNB-UHFFFAOYSA-N Nitrogen dioxide Chemical compound O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 238000000354 decomposition reaction Methods 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 abstract 1
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 10
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 4
- PQNFLJBBNBOBRQ-UHFFFAOYSA-N indane Chemical compound C1=CC=C2CCCC2=C1 PQNFLJBBNBOBRQ-UHFFFAOYSA-N 0.000 description 4
- 230000010355 oscillation Effects 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000001953 recrystallisation Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 238000002835 absorbance Methods 0.000 description 2
- 229960000583 acetic acid Drugs 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- -1 n-C Inorganic materials 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 125000000738 acetamido group Chemical group [H]C([H])([H])C(=O)N([H])[*] 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 239000012362 glacial acetic acid Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- OOYGSFOGFJDDHP-KMCOLRRFSA-N kanamycin A sulfate Chemical group OS(O)(=O)=O.O[C@@H]1[C@@H](O)[C@H](O)[C@@H](CN)O[C@@H]1O[C@H]1[C@H](O)[C@@H](O[C@@H]2[C@@H]([C@@H](N)[C@H](O)[C@@H](CO)O2)O)[C@H](N)C[C@@H]1N OOYGSFOGFJDDHP-KMCOLRRFSA-N 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/12—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms
- C07D295/135—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C255/00—Carboxylic acid nitriles
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D215/00—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
- C07D215/02—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
- C07D215/16—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D215/38—Nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D215/00—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
- C07D215/02—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
- C07D215/16—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D215/38—Nitrogen atoms
- C07D215/40—Nitrogen atoms attached in position 8
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D221/00—Heterocyclic compounds containing six-membered rings having one nitrogen atom as the only ring hetero atom, not provided for by groups C07D211/00 - C07D219/00
- C07D221/02—Heterocyclic compounds containing six-membered rings having one nitrogen atom as the only ring hetero atom, not provided for by groups C07D211/00 - C07D219/00 condensed with carbocyclic rings or ring systems
- C07D221/04—Ortho- or peri-condensed ring systems
- C07D221/06—Ring systems of three rings
- C07D221/10—Aza-phenanthrenes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
- C07D277/02—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings
- C07D277/20—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D277/32—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D277/38—Nitrogen atoms
- C07D277/42—Amino or imino radicals substituted by hydrocarbon or substituted hydrocarbon radicals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/50—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D333/52—Benzo[b]thiophenes; Hydrogenated benzo[b]thiophenes
- C07D333/62—Benzo[b]thiophenes; Hydrogenated benzo[b]thiophenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the hetero ring
- C07D333/66—Nitrogen atoms not forming part of a nitro radical
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
- C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
- C07D409/12—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D417/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00
- C07D417/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings
- C07D417/12—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings linked by a chain containing hetero atoms as chain links
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明は、アザメチン系化合物、その製法及びそれを用
いた光情報記録媒体に関する。DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to an azamethine compound, a method for producing the same, and an optical information recording medium using the same.
〈従来の技術〉
本系統化合物の用途としては、光情報記録媒体用、カラ
ー撮像素子及びカラーデイスプレー用の微細色分解フィ
ルター用などがある。<Prior Art> Applications of this series of compounds include optical information recording media, fine color separation filters for color image sensors and color displays, and the like.
上記分野、特に光記録媒体は媒体と書き込みないし読み
出しヘッドが非接触であるので、記録媒体が摩耗劣化し
ないという特徴をもち、このため、種々の光5己録媒体
の開発研究が行われている。In the above fields, especially optical recording media, since there is no contact between the medium and the writing or reading head, the recording medium does not deteriorate due to wear and tear.For this reason, research and development of various optical recording media are being carried out. .
このような光記録媒体のうち、暗室による現像処理が不
要である等の点で、ヒートモード光記録媒体の開発が活
発になっている。このヒートモードの光記録媒体は、記
録光を熱として利用する光。Among such optical recording media, heat mode optical recording media are being actively developed because they do not require development in a dark room. This heat mode optical recording medium uses recording light as heat.
記録媒体であり、その−例として、レーザー等の記録光
で媒体の一部を融解、除去等して、ピットと称される小
穴を形成して書き込みを行い、このピットにより情報を
記録し、このピットを読み出し光で検出して読み出しを
行うピット形成タイプのものがある。A recording medium, for example, a part of the medium is melted or removed using a recording beam such as a laser to form small holes called pits, and information is recorded through these pits. There is a pit-forming type that detects these pits with readout light and performs readout.
したがって、光記録媒体は、レーザー光のエネルギーを
効率よく吸収する必要があるため、記録に使用する特定
の波長のレーザー光に対する吸収が大きいこと、情報の
再生を正確に行うため、再生に使用する特定の波長のレ
ーザー光に対する反射率が高いことが必要となる。Therefore, optical recording media must absorb the energy of laser light efficiently, so they must have a high absorption of laser light of a specific wavelength used for recording, and in order to reproduce information accurately, It is necessary to have a high reflectance for laser light of a specific wavelength.
このようなビット形成タイプの記録媒体、特にそのうち
、装置を小型化できる半導体レーザーを光源とするもの
においてはこれまで、Teを主体とする材料を記録層と
するものが大半をしめている。Most of such bit-forming type recording media, particularly those using a semiconductor laser as a light source that can miniaturize the device, have a recording layer made of a material mainly composed of Te.
しかし、近年、Te系材料が環境汚染の問題があること
、そしてより高感度化する必要があること、より製造コ
ストを安価にする必要があること等から、Te系にかえ
有機色素を主とした有機系材料の記録層を用いる記録媒
体についての提案や報告が増加している。However, in recent years, Te-based materials have been known to cause environmental pollution problems, as well as the need for higher sensitivity and lower manufacturing costs, so organic dyes have been used instead of Te-based materials. Proposals and reports about recording media using recording layers made of organic materials are increasing.
この有機系材料に用いる色素としては、シアニン系色素
類(例えば特開昭58−114989号公報)、金属錯
体(例えば特開昭58−16888号公報)等が提案さ
れている。As dyes for use in this organic material, cyanine dyes (eg, JP-A-58-114989), metal complexes (eg, JP-A-58-16888), and the like have been proposed.
しかしながら、これらの化合物は薄膜状態での空気中の
保存に対して不安定であるため、種々の安定化方法(例
えば特開昭59−55794号公報)が提案されてふり
、いまなお改良がつづけられている。However, since these compounds are unstable when stored in the air in a thin film state, various stabilization methods have been proposed (for example, Japanese Patent Application Laid-Open No. 59-55794), and improvements are still being made. It is being
またJ、 Chem、 Sac、 Perkin
Trans、 U、 815(1987) に
は下記式(A)で示される化合物が記載されているが、
該化合物は、薄膜状態での吸収及び反射極大波長が、半
導体レーザーの発振波長とずれており、光情報記録媒体
として有用でない。Also J, Chem, Sac, Perkin
Trans, U, 815 (1987) describes a compound represented by the following formula (A),
The absorption and reflection maximum wavelengths of this compound in a thin film state are different from the oscillation wavelength of a semiconductor laser, so that it is not useful as an optical information recording medium.
CCN
、/
しN
(式中、R,、R2=C)I、、 C2)1.、 n−
C,)I、 n−C,H,。CCN , / N (in the formula, R,, R2=C) I,, C2) 1. , n-
C,)I, n-C,H,.
C,)1.叶、 C2H,CN5R,=H,NHAc
)〈発明が解決しようとする問題点〉
本発明は、半導体レーザー光に対する吸収及び反射が太
き(、しかも光、熱等に対して安定な光情報記録媒体を
提供しようとするものである。C,)1. Kano, C2H,CN5R,=H,NHAc
) <Problems to be Solved by the Invention> The present invention aims to provide an optical information recording medium that has strong absorption and reflection of semiconductor laser light (and is stable against light, heat, etc.).
く問題点を解決するための手段)
本発明者らは上記の欠点を改良すべく鋭意検討を行った
結果、下記−最大(1) で示される化合物が安定で
あり、特に記録材料として有用であることを見い出し本
発明を完成するに至った。The present inventors have conducted extensive studies to improve the above-mentioned drawbacks, and have found that the compounds shown in (1) below are stable and particularly useful as recording materials. This discovery led to the completion of the present invention.
を表す。represents.
ここで、R1〜R4はそれぞれ独立して水素原子、置換
されてもよいアルキル基、置換されてもよいアルコキシ
基、ハロゲン原子、ニトロ基、シアノ−NHC−1−C
NH−1−NHCO−1111II
−NHCNH−1−NH3O2−1
−So、NH−1−SO2−1−C−1−OC−2子、
置換されてもよいアルキル基、置換されてもよいアリー
ル基、複素環残基またはシクロヘキシル基を表す。R,
、R6はそれぞれ独立に水素原子、置換されていてもよ
いアルキル基、置換されてもよいアリール基またはシク
ロヘキシル基を表す。Here, R1 to R4 are each independently a hydrogen atom, an optionally substituted alkyl group, an optionally substituted alkoxy group, a halogen atom, a nitro group, a cyano-NHC-1-C
NH-1-NHCO-1111II -NHCNH-1-NH3O2-1 -So, NH-1-SO2-1-C-1-OC-2,
Represents an optionally substituted alkyl group, an optionally substituted aryl group, a heterocyclic residue, or a cyclohexyl group. R,
, R6 each independently represent a hydrogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, or a cyclohexyl group.
また、R3、R6は環を形成していてもよく、さらにヘ
テロ原子を含んで環を形成してもよい。Further, R3 and R6 may form a ring, or may further contain a hetero atom to form a ring.
R1は置換されてもよいアルコキシ基、ヒドロキシ基、
ハロゲン原子、シアノ基又は−QC−R”II
を表し、R”は置換されていてもよいアルキル基を表し
、R6は水素原子、置換されてもよいアルギル基、置換
されてもよいアルコキシ基、ハロゲン原子を表す。Rj
””’R11は水素原子またはアルキル基を表す。〉
本発明の前記一般式<1)で示される化合物は一般式(
IF)
い
(式中、R5−R4はそれぞれ独立して水素原子、置換
されてもよいアルキル基、置換されてもよいアルコキシ
基、ハロゲン原子、ニトロ基、シアノ基、−A−Rまた
は−B・ を表し、−AmはR″
−NHC−1−CNH−1−NHC〇−111II
II
−NHCNH−1−NH3O2−1
−502NH−1502−1−c−1−〇〇−1−OC
O−または一〇〇−を表し、
11 II
OQ
を表わし、R,R’ はそれぞれ独立して、水素原子、
置換されてもよいアルキル基、置換されてもよいアリー
ル基、複素環残基またはシクロヘキシル基を表す。〉
で表される化合物と、一般式(II[)X−N=O、(
I[I)
〈式中、Xは
を表す。R1 is an optionally substituted alkoxy group, hydroxy group,
represents a halogen atom, a cyano group, or -QC-R"II, R" represents an optionally substituted alkyl group, R6 is a hydrogen atom, an optionally substituted argyl group, an optionally substituted alkoxy group, Represents a halogen atom. Rj
""'R11 represents a hydrogen atom or an alkyl group. > The compound represented by the general formula <1) of the present invention is represented by the general formula (
IF) (wherein R5-R4 are each independently a hydrogen atom, an optionally substituted alkyl group, an optionally substituted alkoxy group, a halogen atom, a nitro group, a cyano group, -AR or -B -Am represents R''-NHC-1-CNH-1-NHC〇-111II
II -NHCNH-1-NH3O2-1 -502NH-1502-1-c-1-〇〇-1-OC
represents O- or 100-, represents 11 II OQ, and R and R' each independently represent a hydrogen atom,
Represents an optionally substituted alkyl group, an optionally substituted aryl group, a heterocyclic residue, or a cyclohexyl group. 〉 A compound represented by the general formula (II[)X-N=O, (
I [I) <In the formula, X represents.
ここで、R5、R,はそれぞれ独立に水素原子、置換さ
れていてもよいアルキル基、置換されてもよいアリール
基またはシクロヘキシル基を表す。Here, R5 and R each independently represent a hydrogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, or a cyclohexyl group.
また、RいR6は環を形成していてもよく、さらにヘテ
ロ原子を含んで環を形成してもよい。Further, R6 may form a ring, or may further contain a hetero atom to form a ring.
R1は置換されてもよいアルコキシ基、ヒドロキシ基、
ハロゲン原子、シアン基又は−〇C−R”を表し、R″
は置換されていてもよいアルキル基を表し、R8は水素
原子、置換されてもよいアルキル基、置換されてもよい
アルコキシ基、ノ\ロゲン原子を表す。RIQ〜R12
は水素原子またはアルキル基を表す。)
で表される化合物を縮合反応させることによって製造で
きる。R1 is an optionally substituted alkoxy group, hydroxy group,
Represents a halogen atom, cyan group or -〇C-R'', R''
represents an optionally substituted alkyl group, and R8 represents a hydrogen atom, an optionally substituted alkyl group, an optionally substituted alkoxy group, or a halogen atom. RIQ~R12
represents a hydrogen atom or an alkyl group. ) It can be produced by condensation reaction of the compound represented by.
前記縮合反応は不活性有機溶媒、例えば、メタノール、
エタノール、n−プロパツール、酢酸、無水酢酸、トル
エン、クロロベンゼン、クロロホルム、ジメチルホルム
アミド、N−メチルピロリドン、ジメチルスルホキシド
、スルホラン、アセトニトリル等中において実施される
。The condensation reaction is carried out in an inert organic solvent, such as methanol,
It is carried out in ethanol, n-propertool, acetic acid, acetic anhydride, toluene, chlorobenzene, chloroform, dimethylformamide, N-methylpyrrolidone, dimethylsulfoxide, sulfolane, acetonitrile, and the like.
一般式(II)の化合物及び一般式(III)の化合物
を前記溶媒中で混合し、更に触媒、特にピペリジン、ピ
リジン、トリエチルアミンもしくはピペリジンと氷酢酸
との混合液のような有機塩基を加え、0〜100℃、好
ましくは20〜80℃で0.5〜10時間、好ましくは
1〜5時間反応させる。ついで反応混合物を冷却し、濾
過することで、一般式(I) で示される本発明の化
合物の粗ケーキが得られる。粗ケーキの精製は適当な溶
媒からの再結晶等により行うことができる。A compound of general formula (II) and a compound of general formula (III) are mixed in the above-mentioned solvent, and a catalyst, especially an organic base such as piperidine, pyridine, triethylamine or a mixture of piperidine and glacial acetic acid is added, The reaction is carried out at ~100°C, preferably 20-80°C, for 0.5-10 hours, preferably 1-5 hours. The reaction mixture is then cooled and filtered to obtain a crude cake of the compound of the invention represented by general formula (I). The crude cake can be purified by recrystallization from an appropriate solvent.
〈発明の効果〉
本発明の新規なアザメチン系化合物の薄膜は、700n
m〜850nmの領域に吸収極大波長を有し、また75
0nm〜850nmの領域で高い反射率を有して−する
ため、種々の用途、特に光情報記録媒体として有用であ
る。<Effects of the Invention> The thin film of the novel azamethine compound of the present invention has a thickness of 700 nm.
It has a maximum absorption wavelength in the region of 75 nm to 850 nm, and
Since it has a high reflectance in the range of 0 nm to 850 nm, it is useful for various purposes, especially as an optical information recording medium.
〈実施例〉
以下実施例により具体的説明を行うが、本発明はこれに
限定されるものではない。<Examples> The present invention will be specifically explained below using examples, but the present invention is not limited thereto.
なお、実施例においてスペクトルの測定は島津製作所t
lV−365型分光光度計を用い、基板側より光を照射
して測定を行った。また膜厚測定はティラー、ホブソン
社製タリステップ膜厚計を用いた。In addition, in the examples, the measurement of spectra was carried out by Shimadzu Corporation.
The measurement was performed using a LV-365 spectrophotometer and irradiating light from the substrate side. Further, the film thickness was measured using a Talystep film thickness meter manufactured by Tiller and Hobson.
実施例 1
1.3−ビスジシアノビニルインダン1.50g とで
示される化合物2.50gを無水酢酸4〇−中で混合し
、20〜25℃で5時間撹拌した。そしてこの混合液を
濾過し、水冷メタノールで洗浄し、乾燥した。Example 1 1.50 g of 1.3-bisdicyanovinyl indane and 2.50 g of the compound represented by 1.3-bisdicyanovinyl indane were mixed in 40% of acetic anhydride and stirred at 20 to 25°C for 5 hours. The mixture was then filtered, washed with water-cooled methanol, and dried.
クロロホルムより再結晶し、下記式(2)に示される化
合物の精製ケーキ1.80gが得られた。Recrystallization from chloroform yielded 1.80 g of a purified cake of the compound represented by the following formula (2).
収率67.3%。融点300℃以上。アセトン溶液中の
吸光度は、λmax: 71Qnm、 t: 3.9
5X10’。Yield 67.3%. Melting point 300℃ or higher. The absorbance in the acetone solution is λmax: 71Qnm, t: 3.9
5X10'.
CCN
/
CN
実施例2
1.3−ビスジンアノビニルインダン1.50g とで
示される化合物3.81gを無水酢酸4〇−中で混合し
、21〜25℃で8時間撹拌した。そしてこの混合液を
濾過し、水冷メタノールで洗浄し、乾燥した。CCN/CN Example 2 1.50 g of 1.3-bisdineanovinylindane and 3.81 g of the compound represented by the formula were mixed in 40% of acetic anhydride and stirred at 21 to 25°C for 8 hours. The mixture was then filtered, washed with water-cooled methanol, and dried.
クロロホルムより再結晶し、下記式(4)に示される化
合物の精製ケーキ2.06gが得られた。Recrystallization from chloroform gave 2.06 g of a purified cake of the compound represented by the following formula (4).
収率63.2%。融点247〜249℃。アセトン溶液
中の吸光度は、λmax: 715nm、 g: 4
.61X10’ 。Yield 63.2%. Melting point 247-249°C. The absorbance in the acetone solution is λmax: 715 nm, g: 4
.. 61X10'.
い
実施例3〜45
以下、実施例1又は実施例2と同様の方法によって、以
下の表−1に示す化合物が得られた。Examples 3 to 45 The compounds shown in Table 1 below were obtained in the same manner as in Example 1 or 2.
実施例46
ガラス基板上に実施例1で得られた化合物のトリクロロ
エチレン溶液を2000rpm x 2Qsecの条件
で回転塗布して厚さ800人の記録層を形成し、光情報
記録媒体を作成した。得られた記録媒体の透過率及び反
射率曲線を第1図に示す。Example 46 A trichlorethylene solution of the compound obtained in Example 1 was spin-coated on a glass substrate at 2000 rpm x 2 Qsec to form a recording layer with a thickness of 800 layers, thereby producing an optical information recording medium. The transmittance and reflectance curves of the obtained recording medium are shown in FIG.
この記録媒体に発振波長830nmの半導体レーザーを
用いスポット径1μmとし40mJ/amで照射を行っ
たところ明瞭なスポットの形成が認められた。When this recording medium was irradiated with a semiconductor laser having an oscillation wavelength of 830 nm and a spot diameter of 1 μm at a rate of 40 mJ/am, the formation of a clear spot was observed.
実施例47
ガラス基板上に実施例2で得られた化合物のクロロホル
ム溶液を2000rpm x 20secの条件で回転
塗布して厚さ700人の記録層を形成し、光情報記録媒
体を作成した。得られた記録媒体の透過率及び反射率曲
線を第2図に示す。Example 47 A chloroform solution of the compound obtained in Example 2 was spin-coated on a glass substrate under conditions of 2000 rpm x 20 sec to form a recording layer with a thickness of 700 mm, thereby producing an optical information recording medium. FIG. 2 shows the transmittance and reflectance curves of the obtained recording medium.
この記録媒体に発振波長830nmの半導体レーザーを
用いスポット径1μmとし40mJ/cdで照射を行っ
たところ明瞭なスポットの形成が認められた。When this recording medium was irradiated with a semiconductor laser with an oscillation wavelength of 830 nm and a spot diameter of 1 μm at 40 mJ/cd, the formation of a clear spot was observed.
比較例1 ′
ガラス基板上に下記構造式の化合物のクロロホルム溶液
を2000rpm x 2Qsecの条件で回転塗布し
て厚さ700人の記録層を形成し、光情報記録媒体を作
成した。得られた記録媒体の透過率及び反射率曲線を第
3図に示す。第3図に示される通り、半導体レーザーの
発振波長領域であまり高い反射率を有していない。Comparative Example 1' A chloroform solution of a compound having the following structural formula was spin-coated on a glass substrate at 2000 rpm x 2 Qsec to form a recording layer with a thickness of 700 mm, thereby producing an optical information recording medium. The transmittance and reflectance curves of the obtained recording medium are shown in FIG. As shown in FIG. 3, it does not have a very high reflectance in the oscillation wavelength region of a semiconductor laser.
CCN \7ノ いCCN \7ノ stomach
第1図は実施例46で得られた記録媒体の透過率曲線及
び反射率曲線を示す。
第2図は実施例47で得られた記録媒体の透過率曲線及
び反射率曲線を示す。
第3図は比較例1で得られた記録媒体の透過率曲線及び
反射率曲線を示す。
(%) 第1図
(nm)
(%) 第2図FIG. 1 shows the transmittance curve and reflectance curve of the recording medium obtained in Example 46. FIG. 2 shows the transmittance curve and reflectance curve of the recording medium obtained in Example 47. FIG. 3 shows the transmittance curve and reflectance curve of the recording medium obtained in Comparative Example 1. (%) Figure 1 (nm) (%) Figure 2
Claims (3)
表等があります▼、▲数式、化学式、表等があります▼ を表す。 ここで、R_1〜R_4はそれぞれ独立して水素原子、
置換されてもよいアルキル基、置換されてもよいアルコ
キシ基、ハロゲン原子、ニトロ基、シアノ基、ヒドロキ
シ基、置換されてもよいアミノ基、−A−Rまたは▲数
式、化学式、表等があります▼を表し、−A−は ▲数式、化学式、表等があります▼、▲数式、化学式、
表等があります▼、▲数式、化学式、表等があります▼
、 ▲数式、化学式、表等があります▼、−NHSO_2−
、 −SO_2NH−、−SO_2−、▲数式、化学式、表
等があります▼、▲数式、化学式、表等があります▼、
▲数式、化学式、表等があります▼または▲数式、化学
式、表等があります▼を表し、 ▲数式、化学式、表等があります▼は▲数式、化学式、
表等があります▼または▲数式、化学式、表等がありま
す▼ を表わし、R、R′それぞれ独立して、水素原子、置換
されてもよいアルキル基、置換されてもよいアリール基
、複素環残基またはシクロヘキシル基を表す。R_5、
R_6はそれぞれ独立に水素原子、置換されていてもよ
いアルキル基、置換されてもよいアリール基またはシク
ロヘキシル基を表す。 また、R_5、R_6は環を形成していてもよく、さら
にヘテロ原子を含んで環を形成してもよい。 R_7は置換されてもよいアルコキシ基、ヒドロキシ基
、ハロゲン原子、シアノ基又は▲数式、化学式、表等が
あります▼ を表し、R″は置換されていてもよいアルキル基を表し
、R_8は水素原子、置換されてもよいアルキル基、置
換されてもよいアルコキシ基又はハロゲン原子を表す。 R_9〜R_1_1は水素原子またはアルキル基を表す
。)で表わされるアザメチン系化合物。(1) General formula (I) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(I) (In the formula,
There are tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ Represents. Here, R_1 to R_4 are each independently a hydrogen atom,
There are optionally substituted alkyl groups, optionally substituted alkoxy groups, halogen atoms, nitro groups, cyano groups, hydroxy groups, optionally substituted amino groups, -AR or ▲ mathematical formulas, chemical formulas, tables, etc. ▼ represents ▲, and -A- represents ▲mathematical formulas, chemical formulas, tables, etc.▼, ▲mathematical formulas, chemical formulas,
There are tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼
, ▲There are mathematical formulas, chemical formulas, tables, etc.▼, -NHSO_2-
, -SO_2NH-, -SO_2-, ▲There are mathematical formulas, chemical formulas, tables, etc.▼, ▲There are mathematical formulas, chemical formulas, tables, etc.▼,
▲There are mathematical formulas, chemical formulas, tables, etc.▼ or ▲There are mathematical formulas, chemical formulas, tables, etc.▼.
Tables, etc. ▼ or ▲ Numerical formulas, chemical formulas, tables, etc. ▼ represents a hydrogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, a heterocyclic residue group or cyclohexyl group. R_5,
R_6 each independently represents a hydrogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, or a cyclohexyl group. Furthermore, R_5 and R_6 may form a ring, or may further contain a hetero atom to form a ring. R_7 represents an optionally substituted alkoxy group, hydroxy group, halogen atom, cyano group, or ▲There are numerical formulas, chemical formulas, tables, etc.▼, R'' represents an optionally substituted alkyl group, and R_8 is a hydrogen atom , represents an optionally substituted alkyl group, an optionally substituted alkoxy group, or a halogen atom; R_9 to R_1_1 represent a hydrogen atom or an alkyl group).
置換されてもよいアルキル基、置換されてもよいアルコ
キシ基、ハロゲン原子、ニトロ基、シアノ基、ヒドロキ
シ基、置換されてもよいアミノ基、−A−Rまたは▲数
式、化学式、表等があります▼を表し、−A−は ▲数式、化学式、表等があります▼、▲数式、化学式、
表等があります▼、▲数式、化学式、表等があります▼
、 ▲数式、化学式、表等があります▼、−NHSO_2−
、 −SO_2NH−、−SO_2−、▲数式、化学式、表
等があります▼、▲数式、化学式、表等があります▼、
▲数式、化学式、表等があります▼または▲数式、化学
式、表等があります▼を表し、 ▲数式、化学式、表等があります▼は▲数式、化学式、
表等があります▼または▲数式、化学式、表等がありま
す▼ を表わし、R、R′はそれぞれ独立して、水素原子、置
換されてもよいアルキル基、置換されてもよいアリール
基、複素環残基またはシクロヘキシル基を表す。) で表される化合物と、一般式(III) X−N=O(III) (式中、Xは ▲数式、化学式、表等があります▼、▲数式、化学式、
表等があります▼、▲数式、化学式、表等があります▼ を表す。ここで、R_5、R_6はそれぞれ独立に、水
素原子、置換されていてもよいアルキル基、置換されて
もよいアリール基またはシクロヘキシル基を表す。また
、R_5、R_6は環を形成していてもよく、さらにヘ
テロ原子を含んで環を形成してもよい。 R_7は置換されてもよいアルコキシ基、ヒドロキシ基
、ハロゲン原子、シアノ基又は▲数式、化学式、表等が
あります▼ を表し、R″は置換されていてもよいアルキル基を表し
、R_8は水素原子、置換されてもよいアルキル基、置
換されてもよいアルコキシ基又はハロゲン原子を表す。 R_9〜R_1_1は水素原子またはアルキル基を表す
。)で表される化合物とを反応させることを特徴とする
一般式( I ) ▲数式、化学式、表等があります▼( I ) (式中、X、R_1、R_2、R_3、R_4は前記の
意味を有する)で表わされるアザメチン系化合物の製法
。(2) General formula (II) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(II) (In the formula, R_1 to R_4 are each independently a hydrogen atom,
There are optionally substituted alkyl groups, optionally substituted alkoxy groups, halogen atoms, nitro groups, cyano groups, hydroxy groups, optionally substituted amino groups, -AR or ▲ mathematical formulas, chemical formulas, tables, etc. ▼ represents ▲, and -A- represents ▲mathematical formulas, chemical formulas, tables, etc.▼, ▲mathematical formulas, chemical formulas,
There are tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼
, ▲There are mathematical formulas, chemical formulas, tables, etc.▼, -NHSO_2-
, -SO_2NH-, -SO_2-, ▲There are mathematical formulas, chemical formulas, tables, etc.▼, ▲There are mathematical formulas, chemical formulas, tables, etc.▼,
▲There are mathematical formulas, chemical formulas, tables, etc.▼ or ▲There are mathematical formulas, chemical formulas, tables, etc.▼.
There are tables, etc. ▼ or ▲ There are mathematical formulas, chemical formulas, tables, etc. Represents a residue or a cyclohexyl group. ) and the general formula (III) X-N=O(III) (wherein,
There are tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ Represents. Here, R_5 and R_6 each independently represent a hydrogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, or a cyclohexyl group. Furthermore, R_5 and R_6 may form a ring, or may further contain a hetero atom to form a ring. R_7 represents an optionally substituted alkoxy group, hydroxy group, halogen atom, cyano group, or ▲There are numerical formulas, chemical formulas, tables, etc.▼, R'' represents an optionally substituted alkyl group, and R_8 is a hydrogen atom , represents an optionally substituted alkyl group, an optionally substituted alkoxy group, or a halogen atom; R_9 to R_1_1 represent a hydrogen atom or an alkyl group). Formula (I) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(I) A method for producing an azamethine compound represented by (in the formula, X, R_1, R_2, R_3, R_4 have the above meanings).
け、さらにその上に必要に応じて保護層を設けてなる光
情報記録媒体において、前記記録層が少なくとも下記一
般式( I )で表される化合物を一種以上含むことを特
徴とする光情報記録媒体。 ▲数式、化学式、表等があります▼( I ) (式中、Xは ▲数式、化学式、表等があります▼、▲数式、化学式、
表等があります▼、▲数式、化学式、表等があります▼ を表す。 ここで、R_1〜R_4はそれぞれ独立して水素原子、
置換されてもよいアルキル基、置換されてもよいアルコ
キシ基、ハロゲン原子、ニトロ基、シアノ基、ヒドロキ
シ基、置換されてもよいアミノ基、−A−Rまたは▲数
式、化学式、表等があります▼を表し、−A−は ▲数式、化学式、表等があります▼、▲数式、化学式、
表等があります▼、▲数式、化学式、表等があります▼
、 ▲数式、化学式、表等があります▼、−NHSO_2−
、 −SO_2NH−、−SO_2−、▲数式、化学式、表
等があります▼、▲数式、化学式、表等があります▼、
▲数式、化学式、表等があります▼または▲数式、化学
式、表等があります▼を表し、 ▲数式、化学式、表等があります▼は▲数式、化学式、
表等があります▼または▲数式、化学式、表等がありま
す▼ を表わし、R、R′はそれぞれ独立して、水素原子、置
換されてもよいアルキル基、置換されてもよいアリール
基、複素環残基またはシクロヘキシル基を表す。R_5
、R_6はそれぞれ独立に水素原子、置換されてもよい
アルキル基、置換されてもよいアリール基またはシクロ
ヘキシル基を表す。また、R_5、R_6は環を形成し
ていてもよく、さらにヘテロ原子を含んで環を形成して
もよい。 R_7は置換されてもよいアルコキシ基、ヒドロキシ基
、ハロゲン原子、シアノ基又は▲数式、化学式、表等が
あります▼ を表し、R″は置換されていてもよいアルキル基を表し
、R_8は水素原子、置換されてもよいアルキル基、置
換されてもよいアルコキシ基又はハロゲン原子を表す。 R_9〜R_1_1は水素原子又はアルキル基を表す。 )(3) In an optical information recording medium in which a recording layer is provided on a substrate directly or via an undercoat layer, and a protective layer is further provided thereon as necessary, the recording layer has at least the following general formula (I). An optical information recording medium characterized by containing one or more compounds represented by: ▲There are mathematical formulas, chemical formulas, tables, etc.▼(I) (In the formula,
There are tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ Represents. Here, R_1 to R_4 are each independently a hydrogen atom,
There are optionally substituted alkyl groups, optionally substituted alkoxy groups, halogen atoms, nitro groups, cyano groups, hydroxy groups, optionally substituted amino groups, -AR or ▲ mathematical formulas, chemical formulas, tables, etc. ▼ represents ▲, and -A- represents ▲mathematical formulas, chemical formulas, tables, etc.▼, ▲mathematical formulas, chemical formulas,
There are tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼
, ▲There are mathematical formulas, chemical formulas, tables, etc.▼, -NHSO_2-
, -SO_2NH-, -SO_2-, ▲There are mathematical formulas, chemical formulas, tables, etc.▼, ▲There are mathematical formulas, chemical formulas, tables, etc.▼,
▲There are mathematical formulas, chemical formulas, tables, etc.▼ or ▲There are mathematical formulas, chemical formulas, tables, etc.▼.
There are tables, etc. ▼ or ▲ There are mathematical formulas, chemical formulas, tables, etc. Represents a residue or a cyclohexyl group. R_5
, R_6 each independently represent a hydrogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, or a cyclohexyl group. Furthermore, R_5 and R_6 may form a ring, or may further contain a hetero atom to form a ring. R_7 represents an optionally substituted alkoxy group, hydroxy group, halogen atom, cyano group, or ▲There are numerical formulas, chemical formulas, tables, etc.▼, R'' represents an optionally substituted alkyl group, and R_8 is a hydrogen atom , represents an optionally substituted alkyl group, an optionally substituted alkoxy group, or a halogen atom. R_9 to R_1_1 represent a hydrogen atom or an alkyl group.)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62325998A JPH01165565A (en) | 1987-12-22 | 1987-12-22 | Azamethine compound, production thereof and optical information recording medium using said compound |
US07/179,251 US5028708A (en) | 1987-04-14 | 1988-04-08 | Azamethinyl quinoline derivatives |
DE88303379T DE3883583T2 (en) | 1987-04-14 | 1988-04-14 | Azamethine compounds, process for their preparation and an agent using them for recording optical information. |
EP88303379A EP0287377B1 (en) | 1987-04-14 | 1988-04-14 | Azamethine compounds, process for preparing the same and a medium for recording optical information using such compounds |
US07/383,081 US5061796A (en) | 1987-04-14 | 1989-07-21 | Azamethine compounds |
US07/684,290 US5136054A (en) | 1987-04-14 | 1990-04-12 | Sulfone-containing azamethine compounds |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62325998A JPH01165565A (en) | 1987-12-22 | 1987-12-22 | Azamethine compound, production thereof and optical information recording medium using said compound |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01165565A true JPH01165565A (en) | 1989-06-29 |
Family
ID=18182956
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62325998A Pending JPH01165565A (en) | 1987-04-14 | 1987-12-22 | Azamethine compound, production thereof and optical information recording medium using said compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01165565A (en) |
-
1987
- 1987-12-22 JP JP62325998A patent/JPH01165565A/en active Pending
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