JPH01160827U - - Google Patents
Info
- Publication number
- JPH01160827U JPH01160827U JP4920488U JP4920488U JPH01160827U JP H01160827 U JPH01160827 U JP H01160827U JP 4920488 U JP4920488 U JP 4920488U JP 4920488 U JP4920488 U JP 4920488U JP H01160827 U JPH01160827 U JP H01160827U
- Authority
- JP
- Japan
- Prior art keywords
- reaction tube
- boat
- pressure cvd
- long enough
- nozzle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004518 low pressure chemical vapour deposition Methods 0.000 claims 2
- 235000012431 wafers Nutrition 0.000 claims 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4920488U JPH01160827U (sv) | 1988-04-11 | 1988-04-11 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4920488U JPH01160827U (sv) | 1988-04-11 | 1988-04-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01160827U true JPH01160827U (sv) | 1989-11-08 |
Family
ID=31275320
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4920488U Pending JPH01160827U (sv) | 1988-04-11 | 1988-04-11 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01160827U (sv) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020017729A (ja) * | 2018-07-24 | 2020-01-30 | エルジー エレクトロニクス インコーポレイティド | 太陽電池用蒸着装備及びこれを用いた蒸着方法 |
-
1988
- 1988-04-11 JP JP4920488U patent/JPH01160827U/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020017729A (ja) * | 2018-07-24 | 2020-01-30 | エルジー エレクトロニクス インコーポレイティド | 太陽電池用蒸着装備及びこれを用いた蒸着方法 |
US10971646B2 (en) | 2018-07-24 | 2021-04-06 | Lg Electronics Inc. | Chemical vapor deposition equipment for solar cell and deposition method thereof |