JPH01154630U - - Google Patents
Info
- Publication number
- JPH01154630U JPH01154630U JP5199388U JP5199388U JPH01154630U JP H01154630 U JPH01154630 U JP H01154630U JP 5199388 U JP5199388 U JP 5199388U JP 5199388 U JP5199388 U JP 5199388U JP H01154630 U JPH01154630 U JP H01154630U
- Authority
- JP
- Japan
- Prior art keywords
- reaction chamber
- dry etching
- vacuum
- vacuum reaction
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- 238000001312 dry etching Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 1
- 238000005530 etching Methods 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5199388U JPH01154630U (fr) | 1988-04-18 | 1988-04-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5199388U JPH01154630U (fr) | 1988-04-18 | 1988-04-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01154630U true JPH01154630U (fr) | 1989-10-24 |
Family
ID=31278006
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5199388U Pending JPH01154630U (fr) | 1988-04-18 | 1988-04-18 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01154630U (fr) |
-
1988
- 1988-04-18 JP JP5199388U patent/JPH01154630U/ja active Pending