JPH0195725U - - Google Patents
Info
- Publication number
- JPH0195725U JPH0195725U JP19217687U JP19217687U JPH0195725U JP H0195725 U JPH0195725 U JP H0195725U JP 19217687 U JP19217687 U JP 19217687U JP 19217687 U JP19217687 U JP 19217687U JP H0195725 U JPH0195725 U JP H0195725U
- Authority
- JP
- Japan
- Prior art keywords
- plasma cvd
- cvd apparatus
- reaction chamber
- seals
- sealing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 238000007789 sealing Methods 0.000 claims description 2
- 238000000354 decomposition reaction Methods 0.000 claims 1
- 239000002994 raw material Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19217687U JPH0195725U (fr) | 1987-12-17 | 1987-12-17 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19217687U JPH0195725U (fr) | 1987-12-17 | 1987-12-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0195725U true JPH0195725U (fr) | 1989-06-26 |
Family
ID=31483049
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19217687U Pending JPH0195725U (fr) | 1987-12-17 | 1987-12-17 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0195725U (fr) |
-
1987
- 1987-12-17 JP JP19217687U patent/JPH0195725U/ja active Pending