JPH01149836A - Production of prepreg for heat-resistant laminated board - Google Patents
Production of prepreg for heat-resistant laminated boardInfo
- Publication number
- JPH01149836A JPH01149836A JP30894787A JP30894787A JPH01149836A JP H01149836 A JPH01149836 A JP H01149836A JP 30894787 A JP30894787 A JP 30894787A JP 30894787 A JP30894787 A JP 30894787A JP H01149836 A JPH01149836 A JP H01149836A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- prepreg
- bisimide
- resin composition
- aminophenol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 10
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 39
- 150000004984 aromatic diamines Chemical class 0.000 claims abstract description 15
- 238000007259 addition reaction Methods 0.000 claims abstract description 13
- 150000001875 compounds Chemical class 0.000 claims abstract description 13
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000011342 resin composition Substances 0.000 claims abstract description 11
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 9
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 8
- 238000001035 drying Methods 0.000 claims abstract description 5
- 150000001990 dicarboxylic acid derivatives Chemical class 0.000 claims abstract 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims 3
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 239000000047 product Substances 0.000 abstract description 6
- 239000011248 coating agent Substances 0.000 abstract description 3
- 238000000576 coating method Methods 0.000 abstract description 3
- 239000000758 substrate Substances 0.000 abstract description 3
- 238000010438 heat treatment Methods 0.000 abstract description 2
- 239000000203 mixture Substances 0.000 abstract description 2
- 238000013329 compounding Methods 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid group Chemical group C(\C=C/C(=O)O)(=O)O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 21
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 20
- 239000011976 maleic acid Substances 0.000 description 20
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 20
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 12
- 239000002966 varnish Substances 0.000 description 12
- 150000001991 dicarboxylic acids Chemical class 0.000 description 10
- 239000002904 solvent Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 4
- CWLKGDAVCFYWJK-UHFFFAOYSA-N 3-aminophenol Chemical compound NC1=CC=CC(O)=C1 CWLKGDAVCFYWJK-UHFFFAOYSA-N 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 239000009719 polyimide resin Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 229940018563 3-aminophenol Drugs 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical group CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- BLFLLBZGZJTVJG-UHFFFAOYSA-N benzocaine Chemical compound CCOC(=O)C1=CC=C(N)C=C1 BLFLLBZGZJTVJG-UHFFFAOYSA-N 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- ZMXYNJXDULEQCK-UHFFFAOYSA-N 2-amino-p-cresol Chemical compound CC1=CC=C(O)C(N)=C1 ZMXYNJXDULEQCK-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- NWIVYGKSHSJHEF-UHFFFAOYSA-N 4-[(4-amino-3,5-diethylphenyl)methyl]-2,6-diethylaniline Chemical compound CCC1=C(N)C(CC)=CC(CC=2C=C(CC)C(N)=C(CC)C=2)=C1 NWIVYGKSHSJHEF-UHFFFAOYSA-N 0.000 description 1
- QJENIOQDYXRGLF-UHFFFAOYSA-N 4-[(4-amino-3-ethyl-5-methylphenyl)methyl]-2-ethyl-6-methylaniline Chemical compound CC1=C(N)C(CC)=CC(CC=2C=C(CC)C(N)=C(C)C=2)=C1 QJENIOQDYXRGLF-UHFFFAOYSA-N 0.000 description 1
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229960004050 aminobenzoic acid Drugs 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical group OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000002993 cycloalkylene group Chemical group 0.000 description 1
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical group OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- -1 methyl ethyl Chemical group 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
Abstract
Description
【発明の詳細な説明】
[発明の目的]
(産業上の利用分野)
本発明は、耐熱性、耐湿性、保存安定性に優れた耐熱性
積層板用プリプレグの製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Field of Application) The present invention relates to a method for producing a heat-resistant laminate prepreg having excellent heat resistance, moisture resistance, and storage stability.
(従来の技術)
近年、電子機器の発達は目覚ましく、銅張積層板の使用
も多種多用となり、かつ優れた特性のものが要求されて
いる。 とりわけ、配線の高密度化に伴って配線板の多
層化、スルーホールの小径化が進み、ドリル加工時のス
ミア発生が少ないなど、加工性の良好な銅張積層板が要
求されている。(Prior Art) In recent years, the development of electronic devices has been remarkable, and copper-clad laminates have been used in a wide variety of ways, and excellent characteristics are required. In particular, with the increase in wiring density, wiring boards are becoming more multi-layered and through-holes are becoming smaller in diameter, so there is a demand for copper-clad laminates with good workability, such as less smearing during drilling.
一方、生産性の向上、低コスト化の要請に伴い、配線板
の実装工程でホットエアーレベラーやりフローハンダ付
は等ますます厳しい加工条件が加えられている。 これ
らの中で基板である銅張積層板の耐熱性、耐湿性はこれ
まで以上に優れたものが求められるようになってきた。On the other hand, with the demand for improved productivity and lower costs, increasingly strict processing conditions are being added to the wiring board mounting process, such as hot air levelers and flow soldering. Among these, copper-clad laminates serving as substrates are required to have better heat resistance and moisture resistance than ever before.
これらの要求を満たすために、一般に銅張積層板用と
して広く用いられているエポキシ樹脂に代わって、近年
、付加反応型のポリイミド樹脂か利用されるようになっ
てきている。 このポリイミド樹脂を銅張積層板用プリ
プレグに用いた場合、ドリル加工時のスミアの発生がほ
とんどゼロになり、また、加工工程や長期試験での耐熱
性が格段に改良される。In order to meet these demands, addition reaction type polyimide resins have recently come to be used instead of epoxy resins, which are generally widely used for copper-clad laminates. When this polyimide resin is used in prepreg for copper-clad laminates, the occurrence of smear during drilling becomes almost zero, and the heat resistance during processing and long-term tests is significantly improved.
しかしながら、従来用いられてきた付加反応型のポリイ
ミド樹脂は以下に述べるような種々の問題があった。However, conventionally used addition reaction type polyimide resins have had various problems as described below.
不飽和ジカルボン酸のN、N’−ビスイミドとジアミノ
ジフェニルメタンとを反応させたものは、積層板用とし
て優れたものであるが、反面、ジアミノジェニルメタン
は反応性が高く、ワニスやプリプレグの可使時間が短い
という問題がある。The product obtained by reacting the unsaturated dicarboxylic acid N,N'-bisimide with diaminodiphenylmethane is excellent for use in laminates, but on the other hand, diaminogenylmethane is highly reactive and is not suitable for use in varnishes and prepregs. There is a problem that the usage time is short.
不飽和ジカルボン酸のN、N’−ビスイミドとアミノフ
ェノールとを反応成分とするものは、積層板用としてバ
ランスのとれた特性を示し加工性も優れているが、耐湿
性に難点があり、例えば得られたプリプレグや積層板の
長期保存には、吸湿に格別の注意を払わなければならな
い。 また、不飽和ジカルボン酸のN、N′−ビスイミ
ドとアミノ安息香酸とを反応させたものは、積層板用と
して好適であるが、低沸点溶媒に対して溶解性が悪く、
ガラス布等への塗布に難点かあり、さらに樹脂溶液の保
存にも注意しなければならない等の問題があった。Products containing N,N'-bisimide, an unsaturated dicarboxylic acid, and aminophenol as reaction components exhibit well-balanced properties and excellent processability for use in laminates, but have drawbacks in moisture resistance, such as For long-term storage of the obtained prepregs and laminates, special attention must be paid to moisture absorption. In addition, a product prepared by reacting N,N'-bisimide of an unsaturated dicarboxylic acid with aminobenzoic acid is suitable for use in laminates, but it has poor solubility in low boiling point solvents.
There were problems in that it was difficult to apply it to glass cloth, etc., and that care had to be taken in storing the resin solution.
(発明が解決しようとする問題点)
本発明は、前述した問題点を解消するためになされたも
ので、耐熱性、耐湿性、樹脂溶液やプリプレグの保存安
定性、低沸点溶媒に対する溶解性に優れた、スミア発生
の少ない耐熱性積層板用プリプレグの製造方法を提供し
ようとするものである。(Problems to be Solved by the Invention) The present invention has been made in order to solve the above-mentioned problems, and has improved heat resistance, moisture resistance, storage stability of resin solutions and prepregs, and solubility in low boiling point solvents. The present invention aims to provide an excellent method for producing prepreg for heat-resistant laminates that causes less smearing.
[発明の構成]
(問題点を解決するための手段)
本発明の耐熱性積層板用プリプレグの製造方法は、
(A)−数式
(但し、式中R1は少なくとも2個の炭素原子を有する
2価の基、R2は炭素原子間の二重結合を含む2価の基
を表す)で示される不飽和ジカルボン酸のN、N’−ビ
スイミド化合物、
(B)−数式
(但し、式中R3は水素原子、ハロゲン原子又はアルキ
ル基を表す)で示されるアミノフェノール、(C)−数
式
(但し、式中R4、R5、RG 、R7は同−又は異な
るアルキル基を表す)で示される芳香族ジアミン
からなる付加反応物を必須成分とする樹脂組成物を、基
材に塗布含浸後乾燥させることを特徴とするものである
。 そして、付加反応物が(A)のN、N′−とスイミ
ド化合物1モルに対し、(B)のアミノフェノールと(
C)の芳香族ジアミンとの合計量[(B)+ (C)コ
をO51〜1.0モル配合するものである。[Structure of the Invention] (Means for Solving the Problems) The method for producing a prepreg for heat-resistant laminates of the present invention is based on the following formula: (A) - Formula (wherein R1 has at least two carbon atoms a N,N'-bisimide compound of an unsaturated dicarboxylic acid represented by the formula (B) (where R3 is a divalent group containing a double bond between carbon atoms); (represents a hydrogen atom, a halogen atom or an alkyl group), an aromatic diamine represented by the formula (C) (wherein R4, R5, RG, and R7 represent the same or different alkyl groups) This method is characterized by coating a base material with a resin composition containing an addition reaction product as an essential component, impregnating the base material with the resin composition, and then drying the resin composition. Then, the addition reaction product is (B) aminophenol and (
The total amount of C) and the aromatic diamine [(B) + (C) is O51 to 1.0 mol.
以下本発明を説明する。The present invention will be explained below.
まず(A)のN、N′−ビスイミド化合物と(B)のア
ミノフェノールと(C)芳香族ジアミンを反応させて付
加反応物を得、次いでこれを必須成分として樹脂組成物
を得る。 (A)不飽和ジカルボン酸のN、N′−ビ
スイミド化合物としては、次の一般式を有するものを使
用する。First, the N,N'-bisimide compound (A), the aminophenol (B), and the aromatic diamine (C) are reacted to obtain an addition reaction product, and then a resin composition is obtained using this as an essential component. (A) As the N,N'-bisimide compound of unsaturated dicarboxylic acid, one having the following general formula is used.
但し、式中R1は少なくとも2個の炭素原子を有する2
価の基、R2は炭素原子間の二重結合を含む2価の基を
示す。 即ち、R1としては、直鎖状もしくは分岐状の
アルキレン基、炭素原子5〜6個の環をもつシクロアル
キレン基、酸素、窒素または硫黄原子のうち少なくとも
1個を含む複素環式基、ベンゼン基または多環式芳香
族をはじめ、−NHCO−、−NR” −+ −s i
R8R9−もしくは−502−などにより結合された
複数個のベンゼン基や脂環式基などを挙げることができ
る。However, in the formula, R1 is 2 having at least 2 carbon atoms.
The valent group R2 represents a divalent group containing a double bond between carbon atoms. That is, R1 is a linear or branched alkylene group, a cycloalkylene group having a ring of 5 to 6 carbon atoms, a heterocyclic group containing at least one of oxygen, nitrogen, or sulfur atoms, and a benzene group. or polycyclic aromatic, -NHCO-, -NR" -+ -s i
Examples include multiple benzene groups and alicyclic groups bonded by R8R9- or -502-.
但し、R8,R9は炭素数1〜4のアルキル基、炭素数
5〜6個の環をもつシクロアルキル基、ベンゼン基を示
す。However, R8 and R9 represent an alkyl group having 1 to 4 carbon atoms, a cycloalkyl group having a ring having 5 to 6 carbon atoms, or a benzene group.
またR2、つまり炭素原子間の二重結合を含む2価の基
としては、例えばマレイン酸残基、シトラコン酸残基、
テトラヒドロフタル酸残基等が挙けられる。Further, R2, that is, a divalent group containing a double bond between carbon atoms, includes, for example, a maleic acid residue, a citraconic acid residue,
Examples include tetrahydrophthalic acid residues.
従って、上述したR1およびR2の条件を満たす不飽和
ジカルボン酸のN、N′−ビスイミド化合物としては、
具体的には次のようなものがあり、これらは各々1種又
は2種以上の混合系で使用することができる。 マレイ
ン酸N、 N′−4,4′−ジフェニルメタンビスイミ
ド、マレイン9N、N’−4,4′−ジフェニルエーテ
ルビスイミド、マレイン酸N、N′−パラフェニレンビ
スイミド、マレイン酸N、N′−ベンジジンビスイミド
、マレイン酸N、N′−メタキシレンビスイミド、マレ
イン酸N。Therefore, as the N,N'-bisimide compound of unsaturated dicarboxylic acid that satisfies the above-mentioned conditions of R1 and R2,
Specifically, there are the following, and each of these can be used alone or in a mixed system of two or more. Maleic acid N, N'-4,4'-diphenylmethane bisimide, maleic acid 9N, N'-4,4'-diphenyl ether bisimide, maleic acid N, N'-paraphenylene bisimide, maleic acid N, N'- Benzidine bisimide, N maleic acid, N'-methaxylene bisimide, N maleic acid.
N′−1,5−ナフタレン−ビスイミド、マレイン酸N
。N'-1,5-naphthalene-bisimide, maleic acid N
.
N′−4,4′−ジフェニルスルホン−ビスイミド、マ
レイン酸N、 N′−2,2′−4,4′−ジメチレン
−シクロヘキサン−ビスイミド、マレイン酸N、N′−
4゜4′−ジシクロヘキシル−メタンビスイミド、マレ
イン酸N、 N′−4,4′−ジフェニルシクロヘキサ
ン−ビスイミド、マレイン酸N、 N′−4,4′−ジ
フェニル−フェニルアミン−ビスイミド、マレイン酸N
、 N′−4,4′−ジフェニル−ジフェニルシラン−
ビスイミド、マレイン酸N、 N′−4,4′−ジフェ
ニル硫黄−ビスイミド、マレイン酸N、 N′−2,2
′−(4,4′−ジフェニル)−プロパン−ビスイミド
、マレイン酸N、N′−メタフェニレン−ビスイミド、
マレイン酸N、N′−3,3′−(N、N′−メタフェ
ニレン−ビスベンツアミド)ビスイミドなどがある。N'-4,4'-diphenylsulfone-bisimide, N maleic acid, N'-2,2'-4,4'-dimethylene-cyclohexane-bisimide, N maleic acid, N'-
4゜4'-dicyclohexyl-methane bisimide, maleic acid N, N'-4,4'-diphenylcyclohexane-bisimide, maleic acid N, N'-4,4'-diphenyl-phenylamine-bisimide, maleic acid N
, N'-4,4'-diphenyl-diphenylsilane-
Bisimide, maleic acid N, N'-4,4'-diphenyl sulfur-bisimide, maleic acid N, N'-2,2
'-(4,4'-diphenyl)-propane-bisimide, N maleic acid, N'-metaphenylene-bisimide,
Examples include maleic acid N, N'-3,3'-(N, N'-metaphenylene-bisbenzamide) bisimide.
本発明に用いる(B)アミノフェノールとしては、次の
一般式を有するものを用いる。As the aminophenol (B) used in the present invention, one having the following general formula is used.
−9=
但し、式中R3は水素原子、ハロゲン原子又はアルキル
基を表す。 これらの具体的な化合物としては、次のも
のが挙げられ、これらは単独又は2種以上混合して使用
する。 0−アミノフェノール、l−アミノフェノール
、p−アミノフェノール、2−アミノ−4−タロロフェ
ノール、2−アミノ−4−メチルフェノール等がある。-9= However, in the formula, R3 represents a hydrogen atom, a halogen atom, or an alkyl group. Specific examples of these compounds include the following, which may be used alone or in combination of two or more. Examples include 0-aminophenol, l-aminophenol, p-aminophenol, 2-amino-4-talolophenol, and 2-amino-4-methylphenol.
本発明に用いる(C)芳香族ジアミンとしては、次の一
般式を有する芳香族ジアミンを使用する。As the aromatic diamine (C) used in the present invention, an aromatic diamine having the following general formula is used.
但し、式中、R’ 、R5,R6,R’は同−又は異な
るアルキル基を表すもので具体的な化合物としては、例
えば4.4′−ジアミノ−3,3′、5.5′−テトジ
プロピルジフェニルメタン、4,4′−ジアミノ−3,
3′−ジエチル−5,5′−ジプロピルジフェニルメタ
ン、4.4′−ジアミノ−3,3′−ジエチル−5,5
′−ジメチルジフェニルメタン、4,4′−ジアミノ−
3,3’ 、5.5′−テトラエチルジフェニルメタン
等が挙げられ、これらは単独又は2種以上混合して使用
する。However, in the formula, R', R5, R6, and R' represent the same or different alkyl groups, and specific examples include 4,4'-diamino-3,3', 5,5'- Tetodipropyldiphenylmethane, 4,4'-diamino-3,
3'-diethyl-5,5'-dipropyldiphenylmethane, 4,4'-diamino-3,3'-diethyl-5,5
'-dimethyldiphenylmethane, 4,4'-diamino-
Examples include 3,3', 5,5'-tetraethyldiphenylmethane, which may be used alone or in combination of two or more.
前述した(A)不飽和ジカルボン酸のN、N’−ビスイ
ミド化合物と(B)アミノフェノールと(C)芳香族ジ
アミンを無溶剤もしくは不活性溶媒中で加熱反応させて
付加反応物を製造する。An addition reaction product is produced by heat-reacting the aforementioned (A) N,N'-bisimide compound of unsaturated dicarboxylic acid, (B) aminophenol, and (C) aromatic diamine in a solvent-free or inert solvent.
これら3成分の配合割合は、不飽和ジカルボン酸のN、
N′−ビスイミド化合物1モルに対し、アミノフェノー
ルと芳香族ジアミンとの合計量を0.1〜1.0モル配
合することが望ましい。 その割合が0.1モル未満で
は反応が進まず耐熱性、靭性等の特性が低下し、また1
、0モルを超えると未反応のアミンが残留し、耐熱性か
著しく低下して好ましくない。 3成分の配合順序や
反応温度、溶媒は適宜選択することができ、特に限定さ
れるものではない。The blending ratio of these three components is N of the unsaturated dicarboxylic acid,
It is desirable that the total amount of aminophenol and aromatic diamine be blended in a range of 0.1 to 1.0 mol per 1 mol of the N'-bisimide compound. If the proportion is less than 0.1 mol, the reaction will not proceed and properties such as heat resistance and toughness will deteriorate;
If the amount exceeds 0 mole, unreacted amine will remain and the heat resistance will drop significantly, which is not preferable. The order of blending the three components, the reaction temperature, and the solvent can be selected as appropriate and are not particularly limited.
以下、代表的な製造工程を例にあげて説明する。Hereinafter, a typical manufacturing process will be explained as an example.
反応容器内に不飽和ジカルボン酸のN、N′−ビスイミ
ド化合物とアミノフェノールと芳香族ジアミンとを所定
の割合で仕込み、100〜200℃に加熱して内容物を
熔融し、所定の粘度、キュアタイムまで反応を進める。N,N'-bisimide compounds of unsaturated dicarboxylic acids, aminophenols, and aromatic diamines are charged into a reaction vessel in a predetermined ratio, and the contents are melted by heating to 100 to 200°C to achieve a predetermined viscosity and cure. Proceed with the reaction until the time is up.
この反応物をアセトン。This reaction product is acetone.
メチルエチルゲトン、ジオキサン、テトラヒドロフラン
、ジメチルホルムアミド(DMF)などの溶媒に溶解し
て積層板用として好適な特性を有する樹脂溶液を製造す
ることができる。 また、最初から溶媒を使用すること
もできる。 例えば、反応容器中に、不飽和ジカルボン
酸のN、N′−ビスイミド化合物とアミノフェノールと
芳香族ジアミンとをジオキサンと共に仕込み、ジオキサ
ンを還流させながら所定の粘度、キュアタイムまで反応
し、その後DMF等の溶媒を加えて冷却すれば積層板用
の樹脂溶液を製造することができる。A resin solution having properties suitable for a laminate can be produced by dissolving it in a solvent such as methyl ethyl getone, dioxane, tetrahydrofuran, or dimethyl formamide (DMF). It is also possible to use a solvent from the beginning. For example, an N,N'-bisimide compound of an unsaturated dicarboxylic acid, an aminophenol, and an aromatic diamine are charged together with dioxane into a reaction vessel, and the dioxane is refluxed to a predetermined viscosity and cure time, and then DMF, etc. By adding a solvent and cooling, a resin solution for a laminate can be produced.
こうして調製された付加反応物は、用途に応じて種々の
添加剤や充填剤を配合し樹脂組成物とすることができる
。 例えば、硬化速度の調整のなめイミダゾール等の触
媒、接着性付与のなめカップリング剤を配合することが
できる。 また難燃性付与のなめ難燃剤、無機充填剤を
適宜配合することができる。The addition reaction product thus prepared can be made into a resin composition by blending various additives and fillers depending on the purpose. For example, a catalyst such as diagonal imidazole for adjusting the curing rate and a diagonal coupling agent for imparting adhesive properties can be blended. Further, a flame retardant and an inorganic filler that impart flame retardancy may be appropriately blended.
以上のようにして製造した樹脂組成物を、ガラス布、ガ
ラス不織布などの基材に塗布含浸した後乾燥塔内で10
0〜200°Cの温度範囲内で乾燥し、耐熱性積層板用
プリプレグを製造することができる。The resin composition produced as described above was coated and impregnated on a base material such as glass cloth or glass nonwoven fabric, and then dried in a drying tower for 10 minutes.
It can be dried within a temperature range of 0 to 200°C to produce a prepreg for a heat-resistant laminate.
このプリプレグは、所定の方法で加熱加圧され、積層板
、銅張積層板または印刷配線板の製造に使用することが
できる。This prepreg is heated and pressed by a predetermined method and can be used for manufacturing a laminate, a copper-clad laminate, or a printed wiring board.
(作用)
芳香族ジアミンとして前述した潜在性を有する特定のジ
アミンを使用することによってワニスやプリプレグの可
使時間を改良し、かつ低沸点溶媒に対しても溶解性が改
良される。 そして付加反応型特有の優れた加工性をも
保持し、耐熱性に優れたプリプレグを製造するとか可能
となる。(Function) By using the specific diamine having the aforementioned latent properties as the aromatic diamine, the pot life of varnishes and prepregs is improved, and the solubility in low boiling point solvents is also improved. It also maintains the excellent processability characteristic of the addition reaction type, making it possible to produce prepregs with excellent heat resistance.
(実施例) 次に、本発明を実施例によって具体的に説明する。(Example) Next, the present invention will be specifically explained using examples.
実施例 1
攪拌機と温度計を備えたフラスコ中に、マレイン酸N、
N′−4,4′−ジフェニルメタンビスイミド358
gと2−アミノ−4−り四ロフェノール45 gと4゜
4′−ジアミノ−3,3′−ジメチル−5,5′−ジエ
チルジフェニルメタン30qを仕込み、撹拌しながら加
熱する。 100℃を超えると次第に溶解をはじめ、
褐色の液体となる。 この液体を120℃に昇温して1
時間攪拌した。 こうして完全にビスマレイミドにアミ
ノフェノール、芳香族ジアミンを付加反応さぜた後、ジ
オキサン、DMFで溶解して50%溶液とし、攪拌して
−様なワニスとした。 次に、厚さ 180μmのガラ
ス織布に、調製したワニスを塗布・含浸し、160℃の
温度で乾燥して樹脂分43重量%のプリプレグを製造し
た。 このプリプレグ4枚と厚さ70μmの@箔2枚を
用い、170℃の温度、40kg/ cm’の圧力で9
0分間加熱加圧一体に成形して板厚0.9mmの銅張積
層板をつくった。Example 1 In a flask equipped with a stirrer and a thermometer, maleic acid N,
N'-4,4'-diphenylmethane bisimide 358
g, 45 g of 2-amino-4-di-tetraphenol, and 30 q of 4°4'-diamino-3,3'-dimethyl-5,5'-diethyldiphenylmethane were charged and heated while stirring. When the temperature exceeds 100℃, it gradually begins to dissolve,
It becomes a brown liquid. This liquid was heated to 120℃ and
Stir for hours. After complete addition reaction of aminophenol and aromatic diamine to bismaleimide in this manner, the mixture was dissolved in dioxane and DMF to make a 50% solution, and stirred to form a -like varnish. Next, a glass woven fabric having a thickness of 180 μm was coated and impregnated with the prepared varnish, and dried at a temperature of 160° C. to produce a prepreg having a resin content of 43% by weight. Using 4 sheets of this prepreg and 2 sheets of @ foil with a thickness of 70 μm, a temperature of 170°C and a pressure of 40 kg/cm'
A copper clad laminate with a thickness of 0.9 mm was produced by integrally molding the product under heat and pressure for 0 minutes.
この組頭積層板に内層回路を形成した後、その表裏にそ
れぞれプリプレグ2枚ずつを重ね合わせ、更に上下面に
厚さ18μmの銅箔を1枚ずつ重ね合わせて4層板を作
成した。 得られた4層板について緒特性を試験したの
で、第1表に示したが、耐熱性、耐湿性に優れており、
本発明の効果が確認された。 また、プリプレグについ
て保管時の可使時間を評価したが、第1表に示しなとう
り保存安定性に良いことがわかった。After forming an inner layer circuit on this head laminate, two sheets of prepreg were stacked on each of the front and back sides, and one sheet of copper foil with a thickness of 18 μm was stacked on the top and bottom surfaces to create a four-layer board. The properties of the obtained four-layer board were tested and are shown in Table 1, and it was found to have excellent heat resistance and moisture resistance.
The effects of the present invention were confirmed. In addition, the prepreg was evaluated for its pot life during storage and was found to have good storage stability as shown in Table 1.
実施例 2
マレイン酸N、 N′−4,4′−ジフェニルメタンビ
スイミド358QとO−アミンフェノール16 gと
4,4′ジアミノ−3,3′、5.5′−テトラエチル
ジフェニルメタン50gをフラスコに仕込み実施例1と
同様にしてワニスを製造した。 このワニスを用いて実
施例1とすべて同一の条件で1リプレグ、4層板を作成
した。 また同様にして緒特性を試験しなので、その結
果を第1表に示したが、耐熱性、耐湿性に優れており、
本発明の効果か確認された。Example 2 Maleic acid N, N'-4,4'-diphenylmethane bisimide 358Q and O-amine phenol 16 g.
A varnish was prepared in the same manner as in Example 1 by charging 50 g of 4,4'diamino-3,3',5,5'-tetraethyldiphenylmethane into a flask. Using this varnish, a 1-repreg, 4-layer board was produced under the same conditions as in Example 1. We also tested the properties of the cord in the same way, and the results are shown in Table 1. It has excellent heat resistance and moisture resistance.
The effect of the present invention was confirmed.
またプリプレグについて保管時の可使時間を評価したが
、第1表に示しなとおり保存安定性も良いことがわかっ
た。The prepreg was also evaluated for pot life during storage, and as shown in Table 1, it was found to have good storage stability.
実施例 3
マレイン酸N、 N’−4,4′−ジフェニルメタンビ
スイミド358gとm−アミノフェノール45 (lと
4.4′−ジアミノ−3,3′−ジエチル−5,5′
−ジプロピルジフェニルメタン30 (lをフラスコに
仕込み実施例1と同様にしてワニスを製造した。 この
ワニスを用いて実施例1とすべて同一の条件でプリプレ
グ、4層板をつくった。 また同様にして緒特性を試験
したので、その結果を第1表に示したが、耐熱性、耐湿
性に優れており、本発明の効果が確認された。Example 3 358 g of maleic acid N, N'-4,4'-diphenylmethane bisimide and 45 (l) of m-aminophenol and 4,4'-diamino-3,3'-diethyl-5,5'
A varnish was produced in the same manner as in Example 1 by charging 30 liters of -dipropyldiphenylmethane into a flask. Using this varnish, a prepreg and a four-layer board were produced under the same conditions as in Example 1. Also, in the same manner as in Example 1. The results are shown in Table 1, and the heat resistance and moisture resistance were excellent, confirming the effects of the present invention.
またプリプレグについて、保管時の可使時間を評価した
が、第1表に示しなとおり保存安定性も良いことかわか
った。The prepreg was also evaluated for pot life during storage, and as shown in Table 1, it was found to have good storage stability.
比較例 1
マレイン酸N、 N′−4,4’−ジフェニルメタンビ
スイミド358g とm−アミンフェノール45 Qと
p−アミノ安息香酸エチルエステル、11 (]をフラ
スコに仕込み、実施例1と同様にしてワニスを製造した
。Comparative Example 1 358 g of maleic acid N, N'-4,4'-diphenylmethane bisimide, m-amine phenol 45 Q, and p-aminobenzoic acid ethyl ester, 11 () were placed in a flask and treated in the same manner as in Example 1. Manufactured varnish.
このワニスを用いて実施例1とすべて同一の条件でプリ
プレグ、4層板を作成しな。 また、同様にして緒特性
を試験したのて、その結果を第1表に示しな。Using this varnish, a prepreg and 4-layer board was prepared under all the same conditions as in Example 1. In addition, the characteristics of the wires were tested in the same manner, and the results are shown in Table 1.
比較例 2
マレインilN、 N′−4,4’−ジフェニルメタン
ビスイミド358Qとm−アミノフェノール33 gと
4.4′−ジアミノジフェニルメタン35 gをフラ
スコに仕込み、実施例1と同様にしてワニスを製造した
。Comparative Example 2 Malein ilN, N'-4,4'-diphenylmethane bisimide 358Q, m-aminophenol 33 g, and 4,4'-diaminodiphenylmethane 35 g were charged into a flask, and a varnish was produced in the same manner as in Example 1. did.
このワニスを用いて実施例1とすべて同一の条件でプリ
プレグ、4層板をつくった。 また同様にして緒特性を
試験したので、その結果を第1表に示した。Using this varnish, a prepreg and four-layer board was made under the same conditions as in Example 1. In addition, the properties of the fibers were tested in the same manner, and the results are shown in Table 1.
第1表 *1 : J I S−6481によって測定。Table 1 *1: Measured by JII S-6481.
*2 :酸化銅処理の行われた内層銀箔とプリプレグ層
との引剥し強さを測定。*2: Measurement of the peel strength between the inner silver foil treated with copper oxide and the prepreg layer.
*3:外層銀箔をエツチング除去したサンプルについて
パーコール硬度計<934−1型)で測定。*3: Measured using a Percoll hardness tester (Model 934-1) on a sample with the outer silver foil removed by etching.
*4: 4層板サンプルを2枚重ねて、0.9n+m径
のドリルを用いて穴開けを行った時に内層銀箔にスミア
が発生するまでのヒツト数を測定。*4: Measure the number of hits until smear occurs on the inner layer silver foil when two 4-layer board samples are stacked and holes are drilled using a 0.9n+m diameter drill.
*5:25×25111fflに切断した銅箔付サンプ
ルを300℃の半田浴に20分間浮かべた時のフクロの
状況を評価した。*5: A sample with copper foil cut into 25×25111ffl was floated in a solder bath at 300° C. for 20 minutes, and the state of the bag was evaluated.
○印・・・良好、フクロの発生なし
×印・・・フクロの発生あり
*6:外層銀箔をエツチング除去したサンプルを、PC
T 121℃、2気圧で5時間処理後、260℃の半田
浴に30秒間浸漬した時のフクロの状況を評価した。○ mark: Good, no bags are formed. × mark: Bags are formed.
T After processing at 121°C and 2 atm for 5 hours, the condition of the bag was evaluated when it was immersed in a 260°C solder bath for 30 seconds.
○印・・・良好、フクロの発生なし
= 19−
×印・・・フクロの発生あり
[発明の効果]
以上の説明および第1表から明らかなように、本発明の
耐熱性積層板用プリプレグの製造方法によれば、耐熱性
、耐湿性、樹脂溶液やプリプレグの保存安定性、低沸点
溶媒に対する溶解性に優れた、スミア発生の少ないプリ
プレグが得られる。○ mark: good, no flakes = 19 - x mark: flakes occur [Effects of the invention] As is clear from the above explanation and Table 1, the heat-resistant laminate prepreg of the present invention According to the manufacturing method, a prepreg with excellent heat resistance, moisture resistance, storage stability of resin solutions and prepregs, and solubility in low boiling point solvents and less smear generation can be obtained.
Claims (1)
る2価の基、R^2は炭素原子間の二重結合を含む2価
の基を表す)で示される不飽和ジカルボン酸のN,N′
−ビスイミド化合物、 (B)一般式 ▲数式、化学式、表等があります▼ (但し、式中R^3は水素原子、ハロゲン原子又はアル
キル基を表す)で示されるアミ ノフェノール、 (C)一般式 ▲数式、化学式、表等があります▼ (但し、式中R^4、R^5、R^6、R^7は同一又
は異なるアルキル基を表す)で示される芳香族ジアミン
、 からなる付加反応物を必須成分とする樹脂組成物を、基
材に塗布含浸後乾燥させることを特徴とする耐熱性積層
板用プリプレグの製造方法。 2 付加反応物が、(A)のN,N′−ビスイミド化合
物1モルに対し、(B)のアミノフェノールと(C)の
芳香族ジアミンとの合計量[(B)+(C)]を0.1
〜1.0モル配合する特許請求の範囲第1項記載の耐熱
性積層板用プリプレグの製造方法。[Claims] 1 (A) General formula ▲ Numerical formula, chemical formula, table, etc. ▼ (However, in the formula, R^1 is a divalent group having at least 2 carbon atoms, and R^2 is a carbon atom. N, N' of an unsaturated dicarboxylic acid represented by (representing a divalent group containing a double bond between)
- Bisimide compound, (B) General formula ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (However, in the formula, R^3 represents a hydrogen atom, a halogen atom or an alkyl group), (C) General formula ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (However, in the formula, R^4, R^5, R^6, R^7 represent the same or different alkyl groups), an addition reaction consisting of an aromatic diamine, 1. A method for producing a prepreg for a heat-resistant laminate, which comprises applying and impregnating a resin composition, which has a resin composition as an essential component, onto a base material and then drying the resin composition. 2 The addition reaction product is the total amount of aminophenol (B) and aromatic diamine (C) [(B) + (C)] per mol of N,N'-bisimide compound (A). 0.1
The method for producing a prepreg for a heat-resistant laminate according to claim 1, wherein the amount is blended by 1.0 mol.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30894787A JPH07119300B2 (en) | 1987-12-07 | 1987-12-07 | Method for manufacturing prepreg for heat-resistant laminated plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30894787A JPH07119300B2 (en) | 1987-12-07 | 1987-12-07 | Method for manufacturing prepreg for heat-resistant laminated plate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01149836A true JPH01149836A (en) | 1989-06-12 |
JPH07119300B2 JPH07119300B2 (en) | 1995-12-20 |
Family
ID=17987169
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP30894787A Expired - Fee Related JPH07119300B2 (en) | 1987-12-07 | 1987-12-07 | Method for manufacturing prepreg for heat-resistant laminated plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH07119300B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2414694A (en) * | 2003-03-27 | 2005-12-07 | Honda Motor Co Ltd | Method of applying protective layer forming material |
JP2012255059A (en) * | 2011-06-07 | 2012-12-27 | Sumitomo Bakelite Co Ltd | Resin composition, prepreg, laminate, resin sheet, printed wiring board and semiconductor device |
JP2013035934A (en) * | 2011-08-08 | 2013-02-21 | Sumitomo Bakelite Co Ltd | Resin composition, prepreg, laminated sheet, resin sheet, printed wiring board, and semiconductor device |
CN111635616A (en) * | 2019-03-01 | 2020-09-08 | 广东生益科技股份有限公司 | Halogen-free flame-retardant thermosetting resin composition, prepreg for printed circuit, and metal-clad laminate |
-
1987
- 1987-12-07 JP JP30894787A patent/JPH07119300B2/en not_active Expired - Fee Related
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2414694A (en) * | 2003-03-27 | 2005-12-07 | Honda Motor Co Ltd | Method of applying protective layer forming material |
GB2414694B (en) * | 2003-03-27 | 2007-01-31 | Honda Motor Co Ltd | Method of applying protective layer forming material |
JP2012255059A (en) * | 2011-06-07 | 2012-12-27 | Sumitomo Bakelite Co Ltd | Resin composition, prepreg, laminate, resin sheet, printed wiring board and semiconductor device |
JP2013035934A (en) * | 2011-08-08 | 2013-02-21 | Sumitomo Bakelite Co Ltd | Resin composition, prepreg, laminated sheet, resin sheet, printed wiring board, and semiconductor device |
CN111635616A (en) * | 2019-03-01 | 2020-09-08 | 广东生益科技股份有限公司 | Halogen-free flame-retardant thermosetting resin composition, prepreg for printed circuit, and metal-clad laminate |
CN111635616B (en) * | 2019-03-01 | 2021-07-30 | 广东生益科技股份有限公司 | Halogen-free flame-retardant thermosetting resin composition, prepreg for printed circuit, and metal-clad laminate |
Also Published As
Publication number | Publication date |
---|---|
JPH07119300B2 (en) | 1995-12-20 |
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