JPH0114775B2 - - Google Patents
Info
- Publication number
- JPH0114775B2 JPH0114775B2 JP58121037A JP12103783A JPH0114775B2 JP H0114775 B2 JPH0114775 B2 JP H0114775B2 JP 58121037 A JP58121037 A JP 58121037A JP 12103783 A JP12103783 A JP 12103783A JP H0114775 B2 JPH0114775 B2 JP H0114775B2
- Authority
- JP
- Japan
- Prior art keywords
- cooking
- carbide
- nitride
- base material
- boride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010411 cooking Methods 0.000 claims description 38
- 239000000463 material Substances 0.000 claims description 17
- 150000004767 nitrides Chemical class 0.000 claims description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- 229910000838 Al alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 239000002131 composite material Substances 0.000 claims description 3
- 239000007769 metal material Substances 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 229910000640 Fe alloy Inorganic materials 0.000 claims description 2
- 229910000990 Ni alloy Inorganic materials 0.000 claims description 2
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 230000000737 periodic effect Effects 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 229910052580 B4C Inorganic materials 0.000 claims 1
- 229910052582 BN Inorganic materials 0.000 claims 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 239000010953 base metal Substances 0.000 claims 1
- 238000000034 method Methods 0.000 description 18
- 239000011247 coating layer Substances 0.000 description 8
- 230000007797 corrosion Effects 0.000 description 7
- 238000005260 corrosion Methods 0.000 description 7
- 239000010410 layer Substances 0.000 description 6
- 239000004809 Teflon Substances 0.000 description 5
- 229920006362 Teflon® Polymers 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 239000011651 chromium Substances 0.000 description 5
- 230000006378 damage Effects 0.000 description 4
- 238000005240 physical vapour deposition Methods 0.000 description 4
- 229910001220 stainless steel Inorganic materials 0.000 description 4
- 239000010935 stainless steel Substances 0.000 description 4
- 241000467686 Eschscholzia lobbii Species 0.000 description 3
- 238000005524 ceramic coating Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 150000001247 metal acetylides Chemical class 0.000 description 3
- 229910039444 MoC Inorganic materials 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
- 229910026551 ZrC Inorganic materials 0.000 description 2
- OTCHGXYCWNXDOA-UHFFFAOYSA-N [C].[Zr] Chemical compound [C].[Zr] OTCHGXYCWNXDOA-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- -1 hafnium nitride Chemical class 0.000 description 2
- WHJFNYXPKGDKBB-UHFFFAOYSA-N hafnium;methane Chemical compound C.[Hf] WHJFNYXPKGDKBB-UHFFFAOYSA-N 0.000 description 2
- UNASZPQZIFZUSI-UHFFFAOYSA-N methylidyneniobium Chemical compound [Nb]#C UNASZPQZIFZUSI-UHFFFAOYSA-N 0.000 description 2
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 2
- 229910003468 tantalcarbide Inorganic materials 0.000 description 2
- INZDTEICWPZYJM-UHFFFAOYSA-N 1-(chloromethyl)-4-[4-(chloromethyl)phenyl]benzene Chemical compound C1=CC(CCl)=CC=C1C1=CC=C(CCl)C=C1 INZDTEICWPZYJM-UHFFFAOYSA-N 0.000 description 1
- OFEAOSSMQHGXMM-UHFFFAOYSA-N 12007-10-2 Chemical compound [W].[W]=[B] OFEAOSSMQHGXMM-UHFFFAOYSA-N 0.000 description 1
- QIJNJJZPYXGIQM-UHFFFAOYSA-N 1lambda4,2lambda4-dimolybdacyclopropa-1,2,3-triene Chemical compound [Mo]=C=[Mo] QIJNJJZPYXGIQM-UHFFFAOYSA-N 0.000 description 1
- 229910018134 Al-Mg Inorganic materials 0.000 description 1
- 229910018131 Al-Mn Inorganic materials 0.000 description 1
- 229910018125 Al-Si Inorganic materials 0.000 description 1
- 229910018467 Al—Mg Inorganic materials 0.000 description 1
- 229910018461 Al—Mn Inorganic materials 0.000 description 1
- 229910018520 Al—Si Inorganic materials 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 229910015425 Mo2B5 Inorganic materials 0.000 description 1
- 229910015421 Mo2N Inorganic materials 0.000 description 1
- 229910000792 Monel Inorganic materials 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- LRTTZMZPZHBOPO-UHFFFAOYSA-N [B].[B].[Hf] Chemical compound [B].[B].[Hf] LRTTZMZPZHBOPO-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- CXOWYMLTGOFURZ-UHFFFAOYSA-N azanylidynechromium Chemical compound [Cr]#N CXOWYMLTGOFURZ-UHFFFAOYSA-N 0.000 description 1
- GPBUGPUPKAGMDK-UHFFFAOYSA-N azanylidynemolybdenum Chemical compound [Mo]#N GPBUGPUPKAGMDK-UHFFFAOYSA-N 0.000 description 1
- CFJRGWXELQQLSA-UHFFFAOYSA-N azanylidyneniobium Chemical compound [Nb]#N CFJRGWXELQQLSA-UHFFFAOYSA-N 0.000 description 1
- SKKMWRVAJNPLFY-UHFFFAOYSA-N azanylidynevanadium Chemical compound [V]#N SKKMWRVAJNPLFY-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- LGLOITKZTDVGOE-UHFFFAOYSA-N boranylidynemolybdenum Chemical compound [Mo]#B LGLOITKZTDVGOE-UHFFFAOYSA-N 0.000 description 1
- VDZMENNHPJNJPP-UHFFFAOYSA-N boranylidyneniobium Chemical compound [Nb]#B VDZMENNHPJNJPP-UHFFFAOYSA-N 0.000 description 1
- XTDAIYZKROTZLD-UHFFFAOYSA-N boranylidynetantalum Chemical compound [Ta]#B XTDAIYZKROTZLD-UHFFFAOYSA-N 0.000 description 1
- LAROCDZIZGIQGR-UHFFFAOYSA-N boron;vanadium Chemical compound B#[V]#B LAROCDZIZGIQGR-UHFFFAOYSA-N 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 210000000991 chicken egg Anatomy 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- UFGZSIPAQKLCGR-UHFFFAOYSA-N chromium carbide Chemical compound [Cr]#C[Cr]C#[Cr] UFGZSIPAQKLCGR-UHFFFAOYSA-N 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 235000013601 eggs Nutrition 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000010574 gas phase reaction Methods 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000013535 sea water Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000012258 stirred mixture Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910003470 tongbaite Inorganic materials 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Cookers (AREA)
- Physical Vapour Deposition (AREA)
Description
〔発明の技術分野〕
本発明は加熱調理に用いる調理具に関し、更に
詳しくは、外傷がつきにくく、こげつきがなく、
耐食性にも優れた調理面を有する調理具に関す
る。
〔発明の技術的背景とその問題点〕
ホツトプレートやフライパンなど加熱調理に用
いる調理具には、一般にステンレス鋼や銅、アル
ミニウムなどの金属又は合金材料がそのまま用い
られている。
ところで、加熱調理に用いる調理具において
は、それが可燃性であつてはならないことは当然
のこととして、その調理面で調理材料がこげつか
ないこと、食用油や各種調味料を用いるので調理
面がそれらに対する耐食性に優れること、また、
調理材料をフライがえしなどによりかき混ぜたと
き調理面に外傷がつかないこと、などの要件を必
要とする。
このようなことから、現在では、金属材料の基
材の調理面にテフロンを焼付け加工した調理具が
広く出まわつている。
この調理具は、テフロンの効果によつて、こげ
つき防止、耐食性の確保という点ではたしかに有
用である。しかしながら、テフロンはその分解温
度が310〜320℃と比較的低く、しかも軟質である
ため外傷がつき易すいという欠点を有している。
そのため、テフロンの欠点を補完し上記した要
件を満足する調理面を有する調理具の開発が強く
望まれている。
〔発明の目的〕
本発明は、従来の調理具が有していた欠点を解
消し、調理にとつて極めて有用な調理面を有する
調理具の提供を目的とする。
〔発明の概要〕
セラミツクスのコーテイング層は一般にその硬
度が高いという事実に本発明者は着目し、各種の
セラミツクスコーテイング層に関し、そのこげつ
き防止能、耐食性をも検討することによつて本発
明の調理具を開発するに到つた。
すなわち、本発明の調理具は、基材が金属材料
から成つていて、該基材の調理面が周期律表ａ
族、ａ族、ａ族に属するいずれかの元素の窒
化物、炭化物、ホウ化物のいずれかの層；ケイ
素、ホウ素の窒化物、炭化物のいずれかの層；又
はそれらの複合層のいずれかによつて、２〜5μ
ｍの厚さに被覆されていることを特徴とする。
本発明の調理具の基材は、その表面に後述する
窒化物、炭化物、ホウ化物又はそれらの複合層を
コーテイングできる金属材料であれば何であつて
もよい。具体的には、鉄若しくはステンレスな
どの鉄合金；ニツケル若しくはモネルなどのニ
ツケル合金；銅若しくは黄銅、キユブロニツケ
ルなどの銅合金と；又は、アルミニウム若しく
はAl−Mg系、Al−Si系、Al−Mn系などのアル
ミニウム合金； 〜の組み合せによるクラ
ツド材が好ましい。
本発明の調理具の製造に当つては、まず、これ
ら上記の材料で予め調理具の外形を機械加工して
おき、その調理面に以下のようにしてセラミツク
スコーテイングを施す。
用いるセラミツクスとしては、周期律表ａ
族、ａ族若しくはａ族に属するいずれかの元
素の窒化物、炭化物又はホウ化物のいずれか又は
Si若しくはＢの炭化物、窒化物である。
窒化物としては、例えば窒化チタン（TiN）、
窒化ジルコニウム（ZrN）、窒化ハフニウム
（HfN）、窒化バナジウム（VN）、窒化ニオブ
（NbN）、窒化タンタル（TaN）、窒化クロム
（CrN、Cr2N）、窒化モリブデン（Mo2N、
MoN）、窒化タングステン（W2N、WN2、
W2N3）、窒化ケイ素（Si3N4）、窒化ホウ素
（BN）があげられ；炭化物としては、炭化チタ
ン（TiC）、炭化ジルコニウム（ZrC）、炭化ハフ
ニウム（HfC）、炭化バナジウム（VC）、炭化ニ
オブ（NbC）、炭化タンタル（TaC）、炭化クロ
ム（Cr3C2、Cr7C3、Cr23C6）、炭化モリブデン
（Mo2C、MoC）、炭化タングステン（W2C、
WC）、炭化ケイ素（SiC）、炭化ホウ素（B4C）
があげられ；ホウ化物としては、ホウ化チタン
（TiB2）、ホウ化ジルコニウム（ZrB2）、ホウ化ハ
フニウム（HfB2）、ホウ化バナジウム（VB2）ホ
ウ化ニオブ（NbB、Nb3B4、NbB2）、ホウ化タ
ンタル（Ta2B、TaB、Ta3B4）、ホウ化クロム
（Cr3B2、CrB）、ホウ化モリブデン（Mo2B、
MoB、Mo2B5）、ホウ化タングステン（W2B、
WB、W2B5）があげられる。これらセラミツク
スのうち、被覆層が比較的容易に形成できる。入
手し易すいなどの点からして、窒化物は好まし
い。とくにTiNは好ましい。
これらコーテイング層の形成は、薄膜形成法と
して常用されている、物理的蒸着法（PVD法）、
化学的蒸着法（CVD法）、物理化学的蒸着法
（PCVD法）のいずれかの方法を適用して行なわ
れる。すなわち、窒化物のコーテイング層を例に
とつた場合、PVD法は基材を陰極とし、N2又は
N2＋H2の低圧（0.01Torr）（400℃〜600℃位）
雰囲気中で被覆すべき金属を蒸気にしてこれを電
気的に被覆する方法である。また、CVD法は、
加熱炉中（1000℃位）で常圧（大気圧）のN2又
はN2＋H2に被覆すべき金属元素のハロゲン化物
の蒸気の混合ガスを熱化学的反応で被覆する方法
である。PCVD法はCVD法とPVD法の中間的手
法で原料ガスはCVDと同様であり、被覆処理は
電気的（放電）に行なうもので、一般に数Torr
の低圧、400〜600℃の温度の雰囲気中で行なうと
いう方法である。とくに、CVD法は処理温度が
高く基材が完全に軟化してしまうのであまり好ま
しくない。PCVD法は、耐摩耗性に優れ緻密構造
のコーテイング層が得られること、コーテイング
層と基材との密着性が良好であること成膜操作も
比較的簡単であること、などの点からして好まし
い方法である。
しかしながら、基材の表面がアルミニウム若し
くはアルミニウム合金、Cu若しくはCu合金で構
成されている場合、又は、クラツドのときにそれ
ら金属若しくは合金が表面に形成されている場
合、これらにPCVD法を適用すると、その気相反
応の結果腐食性のガス（例えば塩酸ガス）が発生
してこれが基材を腐食し真黒にして美感を損ね商
品価値を落すので避けるべきである。また、の
クラツド材の場合、の場合と同様の理由で銅若
しくは銅合金の側にPCVD法を適用することは避
けるべきである。
セラミツクス層の厚みは２〜5μｍとし、厚す
ぎると調理時に基材との間に生ずる熱応力によつ
て剥離現象が起きやすくなる。
〔発明の実施例〕
ステンレス鋼のフライパンとテフロン加工を施
したフライパンを２種類用意した。ステンレス鋼
のフライパンの調理面に表に示した条件でPCVD
法を適用して各種のセラミツクスをコーテイング
した。コーテイング層の厚みは約2μｍであつた。
ついで、以下のような方法により、２個のフラ
イパンの調理面の各性能を評価した。
こげつき防止について：フライパンを火にかけ、
その調理面に、鶏卵１個と大さじ３杯の砂糖を
よくかきまぜたものを流し込んで卵焼きをつく
り、そのときのこげつきの程度を肉眼観察し
た。◎：優、〇：良、×：不良の３段階で評価
した。
外傷について：フライパンを火にかけ、その調理
面をフライパンがえしで意図的に複数回引騒い
て、そのときの擦過傷の有無を肉眼観察した。
耐食性について：３％食塩水（海水と同程度）中
にフライパンの半分を浸漬し、その境界面の腐
食程度を肉眼観察した。〇：良、×：不良の２
段階で評価した。
以下の結果を一括して表に示した。
[Technical Field of the Invention] The present invention relates to cooking utensils used for heating cooking, and more specifically, cooking utensils that are resistant to external damage, non-stick,
The present invention relates to a cooking utensil having a cooking surface with excellent corrosion resistance. [Technical background of the invention and its problems] Cooking utensils used for heating cooking, such as hot plates and frying pans, generally use metals or alloy materials such as stainless steel, copper, and aluminum as they are. By the way, it goes without saying that cooking utensils used for heated cooking must not be flammable, and that cooking materials should not burn on the cooking surface. has excellent corrosion resistance against them, and
Requirements such as preventing damage to the cooking surface when stirring cooking ingredients by frying, etc. are required. For this reason, cooking utensils in which Teflon is baked onto the cooking surface of a metal base material are now widely available. This cooking utensil is certainly useful in terms of preventing sticking and ensuring corrosion resistance due to the effects of Teflon. However, Teflon has the disadvantage that its decomposition temperature is relatively low at 310 to 320° C., and it is soft and easily damaged. Therefore, there is a strong desire to develop a cooking utensil that has a cooking surface that compensates for the shortcomings of Teflon and satisfies the above requirements. [Object of the Invention] An object of the present invention is to provide a cooking utensil that eliminates the drawbacks of conventional cooking utensils and has a cooking surface that is extremely useful for cooking. [Summary of the Invention] The present inventor has focused on the fact that ceramic coating layers generally have high hardness, and has developed the cooking method of the present invention by examining the anti-sticking ability and corrosion resistance of various ceramic coating layers. We have now developed a tool. That is, in the cooking utensil of the present invention, the base material is made of a metal material, and the cooking surface of the base material is a
Any layer of nitride, carbide, or boride of any element belonging to group A, group a, or group a; any layer of nitride or carbide of silicon or boron; or any composite layer thereof. Therefore, 2 to 5μ
It is characterized by being coated with a thickness of m. The base material of the cooking utensil of the present invention may be any metal material as long as its surface can be coated with a nitride, carbide, boride, or a composite layer thereof, which will be described later. Specifically, iron or iron alloys such as stainless steel; nickel alloys such as nickel or monel; copper or copper alloys such as brass and Kyubron nickel; or aluminum or Al-Mg, Al-Si, and Al-Mn systems. Aluminum alloys such as; Preferred are clad materials made of a combination of. In manufacturing the cooking utensil of the present invention, the outer shape of the cooking utensil is first machined using the above-mentioned materials, and then ceramic coating is applied to the cooking surface in the following manner. The ceramics to be used include periodic table a
Any of the nitrides, carbides, or borides of any element belonging to Group A or Group A, or
These are carbides and nitrides of Si or B. Examples of nitrides include titanium nitride (TiN),
Zirconium nitride (ZrN), hafnium nitride (HfN), vanadium nitride (VN), niobium nitride (NbN), tantalum nitride (TaN), chromium nitride (CrN, Cr2N ), molybdenum nitride ( Mo2N ,
MoN), tungsten nitride ( W2N , WN2 ,
Examples of carbides include titanium carbide ( TiC ), zirconium carbide (ZrC) , hafnium carbide (HfC) , and vanadium carbide ( VC). ), niobium carbide (NbC), tantalum carbide (TaC), chromium carbide (Cr 3 C 2 , Cr 7 C 3 , Cr 23 C 6 ), molybdenum carbide (Mo 2 C, MoC), tungsten carbide (W 2 C,
WC), silicon carbide (SiC), boron carbide (B 4 C)
Examples of borides include titanium boride (TiB 2 ), zirconium boride (ZrB 2 ), hafnium boride (HfB 2 ), vanadium boride (VB 2 ), niobium boride (NbB, Nb 3 B 4 , NbB 2 ), tantalum boride (Ta 2 B, TaB, Ta 3 B 4 ), chromium boride (Cr 3 B 2 , CrB), molybdenum boride (Mo 2 B,
MoB, Mo2B5 ), tungsten boride ( W2B ,
WB, W 2 B 5 ). Of these ceramics, a coating layer can be formed relatively easily. Nitrides are preferred from the viewpoint of easy availability. TiN is particularly preferred. These coating layers can be formed by physical vapor deposition (PVD), which is commonly used as a thin film formation method.
This is done by applying either a chemical vapor deposition method (CVD method) or a physicochemical vapor deposition method (PCVD method). In other words, taking a nitride coating layer as an example, the PVD method uses the base material as a cathode and uses N2 or
Low pressure of N 2 + H 2 (0.01Torr) (400℃~600℃)
This is a method of electrically coating the metal to be coated by turning it into vapor in an atmosphere. In addition, the CVD method
This is a method in which a mixed gas of a vapor of a halide of a metal element to be coated is coated with N 2 or N 2 + H 2 at normal pressure (atmospheric pressure) in a heating furnace (approximately 1000°C) through a thermochemical reaction. The PCVD method is an intermediate method between the CVD method and the PVD method.The raw material gas is the same as that of CVD, and the coating process is performed electrically (discharge), and is generally several Torr.
This method is carried out in an atmosphere at a low pressure of 400 to 600°C. In particular, the CVD method is not very preferable because the processing temperature is high and the base material is completely softened. The PCVD method has advantages such as being able to obtain a coating layer with excellent wear resistance and a dense structure, good adhesion between the coating layer and the base material, and relatively simple film-forming operations. This is the preferred method. However, when the surface of the base material is composed of aluminum or aluminum alloy, Cu or Cu alloy, or when these metals or alloys are formed on the surface when cladding, applying the PCVD method to these As a result of the gas phase reaction, a corrosive gas (for example, hydrochloric acid gas) is generated, which corrodes the base material and turns it black, impairing its aesthetic appearance and lowering its commercial value, so it should be avoided. In addition, in the case of clad materials, it is necessary to avoid applying the PCVD method to the copper or copper alloy side for the same reason as in the case of . The thickness of the ceramic layer is 2 to 5 μm; if it is too thick, peeling may easily occur due to thermal stress generated between the ceramic layer and the base material during cooking. [Embodiment of the Invention] Two types of frying pans, one made of stainless steel and the other treated with Teflon, were prepared. PCVD on the cooking surface of a stainless steel frying pan under the conditions shown in the table.
The method was applied to coat various ceramics. The thickness of the coating layer was approximately 2 μm. Next, the performance of the cooking surfaces of the two frying pans was evaluated using the following methods. To prevent sticking: Heat the frying pan,
A well-stirred mixture of one chicken egg and three tablespoons of sugar was poured onto the cooking surface to make fried eggs, and the degree of burntness was observed with the naked eye. Evaluation was made in three stages: ◎: excellent, ◯: good, and ×: poor. Regarding external injuries: A frying pan was set on fire, and the cooking surface of the frying pan was intentionally agitated several times with a spatula, and the presence or absence of any abrasions at that time was observed with the naked eye. Regarding corrosion resistance: Half of the frying pan was immersed in 3% saline (same level as seawater), and the degree of corrosion at the interface was visually observed. 〇: Good, ×: Bad 2
Evaluated in stages. The following results are collectively shown in the table.
以上の結果から明らかなように、本発明の調理
具は、調理面でこげつきもなく、外傷もつかず、
耐食性も優れていて、その工業的価値は極めて大
である。
As is clear from the above results, the cooking utensil of the present invention does not cause burning or damage on the cooking surface.
It also has excellent corrosion resistance, and its industrial value is extremely large.
Claims (1)
理面が周期律表ａ族、ａ族、ａ族に属する
いずれかの元素の窒化物、炭化物、ホウ化物のい
ずれかの層；ケイ素、ホウ素の窒化物、炭化物の
いずれかの層；又はそれらの複合層のいずれかに
よつて、２〜5μｍの厚さに被覆されていること
を特徴とする調理具。 ２ 該基材金属が、鉄若しくは鉄合金、ニツケル
若しくはニツケル合金、アルミニウム若しくはア
ルミニウム合金、銅若しくは銅合金、又は、前記
いずれかの金属若しくは合金の組み合せによるク
ラツド材のいずれかである特許請求の範囲第１項
記載の調理具。[Scope of Claims] 1. The base material is made of a metal material, and the cooking surface of the base material is made of a nitride, carbide, or boride of any element belonging to group a, group a, or group a of the periodic table. a layer of silicon, boron nitride, or carbide; or a composite layer thereof to a thickness of 2 to 5 μm. . 2 Claims in which the base metal is iron or an iron alloy, nickel or a nickel alloy, aluminum or an aluminum alloy, copper or a copper alloy, or a clad material made of a combination of any of the above metals or alloys. The cooking utensil described in item 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12103783A JPS6014831A (en) | 1983-07-05 | 1983-07-05 | Cooking utensil |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12103783A JPS6014831A (en) | 1983-07-05 | 1983-07-05 | Cooking utensil |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6014831A JPS6014831A (en) | 1985-01-25 |
| JPH0114775B2 true JPH0114775B2 (en) | 1989-03-14 |
Family
ID=14801251
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12103783A Granted JPS6014831A (en) | 1983-07-05 | 1983-07-05 | Cooking utensil |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6014831A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009526586A (en) * | 2006-02-13 | 2009-07-23 | セブ ソシエテ アノニム | Easy-to-clean cooking surface |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61154830U (en) * | 1985-03-18 | 1986-09-25 | ||
| JPS62102721A (en) * | 1985-10-31 | 1987-05-13 | 株式会社東芝 | Hot plate |
| JPS6343334A (en) * | 1986-08-08 | 1988-02-24 | Nec Corp | Method of mounting semiconductor element |
| JPH0191727A (en) * | 1987-10-02 | 1989-04-11 | Marine Benchiyaa Kk | Artificial fish |
| WO1992000032A1 (en) * | 1990-06-29 | 1992-01-09 | Niigata Engineering Co., Ltd. | Method of forming titanium nitride coating and pan made by this method |
| JPH0551945U (en) * | 1991-12-12 | 1993-07-09 | 株式会社新潟鉄工所 | Cooking pots |
| US5443455A (en) * | 1993-07-27 | 1995-08-22 | Target Therapeutics, Inc. | Guidewire and method of pretreating metal surfaces for subsequent polymer coating |
| US7093340B2 (en) * | 1997-12-16 | 2006-08-22 | All-Clad Metalcrafters Llc | Stick resistant ceramic coating for cookware |
| FR2807071B1 (en) * | 2000-03-28 | 2002-11-15 | Dja Dodane Jean Et Associes | CERAMO-METALLIC ANTI-ADHESIVE COATING FOR CULINARY UTENSILS |
| US6942935B2 (en) * | 2003-03-24 | 2005-09-13 | National Material Ip | Foodware with a tarnish-resistant ceramic coating and method of making |
| FR2998464B1 (en) * | 2012-11-26 | 2015-05-22 | Seb Sa | COOKING DEVICE HAVING AN EASY-TO-CLEAN COOKING SURFACE WITH SCRATCH RESISTANCE |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4918604A (en) * | 1972-06-05 | 1974-02-19 |
-
1983
- 1983-07-05 JP JP12103783A patent/JPS6014831A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4918604A (en) * | 1972-06-05 | 1974-02-19 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009526586A (en) * | 2006-02-13 | 2009-07-23 | セブ ソシエテ アノニム | Easy-to-clean cooking surface |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6014831A (en) | 1985-01-25 |
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