JPH01147349A - Detecting method for solid particle in transparent thin film - Google Patents

Detecting method for solid particle in transparent thin film

Info

Publication number
JPH01147349A
JPH01147349A JP30560387A JP30560387A JPH01147349A JP H01147349 A JPH01147349 A JP H01147349A JP 30560387 A JP30560387 A JP 30560387A JP 30560387 A JP30560387 A JP 30560387A JP H01147349 A JPH01147349 A JP H01147349A
Authority
JP
Japan
Prior art keywords
light
minimum value
image
shield plate
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP30560387A
Other languages
Japanese (ja)
Inventor
Yukio Matsuyama
松山 幸雄
Hitoshi Kubota
仁志 窪田
Chie Yamanaka
山中 千絵
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP30560387A priority Critical patent/JPH01147349A/en
Publication of JPH01147349A publication Critical patent/JPH01147349A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/94Investigating contamination, e.g. dust

Abstract

PURPOSE:To detect all solid particles without generating artificial defect by composing an image for comparative inspection of images of an element which are picked up while dark visual field lighting is performed in plural directions, and comparing formed images of two elements with each other. CONSTITUTION:Light from a light source 10 illuminates a wafer 23 to be inspected through a lens 11, a light shield plate 12, a reflecting mirror 13, and the periphery of an objective 14. Its reflected light forms its image on a TV camera 16 through the lens part of the objective 14, the reflecting mirror 13, and an image forming lens 15. While the light shield plate 31 of the light shield plate 12 is put in the optical path and while the light shield plate 32 is put in the optical path, the same element is picked up by the TV camera 16 and a smaller signal between two video signals is stored in a memory 20 through an A/D converter 17 and a minimum value composing circuit 19. The minimum value composing circuit 19 calculates minimum values for other elements similarly. The output of the minimum value composing circuit 19 and the image output stored in the memory 20 are inputted to an absolute value arithmetic circuit 21 to calculate the absolute value of the difference, thereby detecting a defect through a binarizing circuit 22.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、コンピュータ用磁気ディスクに使用する薄膜
磁気ヘッドのような透明保11こ慣われた素子の外観検
査方法(こ係り、特lこ透明保護狭巾に混入された塊状
粒子の検出に好適な外観検査方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for inspecting the appearance of transparent elements such as thin-film magnetic heads used in magnetic disks for computers. The present invention relates to a visual inspection method suitable for detecting lump particles mixed into a transparent protective narrow width.

〔従来の技術〕[Conventional technology]

本発明に最も近い従来技術として、通常の暗視野照明−
こよる透明薄膜中の塊状粒子検出法について説明する。
As the prior art closest to the present invention, ordinary dark field illumination -
This method of detecting bulk particles in a transparent thin film will be explained.

第6図は薄膜國気ヘッドの部分断面図で、コイル導体1
.絶縁層2.磁性体4および透明&a膜3より構成され
ている。保ル膜中lこ塊状粒子5a、5bが存在すると
、有効な& k k r。
Figure 6 is a partial cross-sectional view of the thin film head, showing the coil conductor 1.
.. Insulating layer 2. It is composed of a magnetic material 4 and a transparent &a film 3. The presence of lumpy particles 5a, 5b in the retaining film results in effective & k k r.

厚さかうすくなってしまいオ、子の信頼性か低下する。The thickness becomes thinner and the reliability of the child decreases.

また、塊状粒子5bが保護膜表面に存在しており、ディ
スク使用時番ここの塊状粒子かティスフ面に落下すると
装置の破損あるいはテ〜りの消失等重大な事故を引き起
こすため、廠Mな恢介が心安である。第6図に示すよう
に塊状粒子5a。
In addition, the lumpy particles 5b are present on the surface of the protective film, and if the lumpy particles fall onto the surface during use of the disk, it will cause serious accidents such as damage to the device or loss of tape. I feel safe. As shown in FIG. 6, lump particles 5a.

5bは不規則な形状を有しているため、暗視野で照明す
ることにより明視野照明では検出できない透明な材質で
あってもその界面で光が散乱され、明るく検出すること
かできる。暗視野照明により得られる像には上記塊状粒
子による散乱光と、素子をe4成するパターンの傾fi
+部(例えは磁性体4の#!fP+部41,42)から
の正反射光およびパターンエツジからの散乱光か含まれ
る0そこで同一形状を有する2つの素子を暗視野照明で
撮像し、比較することにより、保l!!腹中の塊状粒子
を画像間の不一致部分として検出することができる。
Since 5b has an irregular shape, by illuminating it with dark field, even if it is a transparent material that cannot be detected with bright field illumination, light is scattered at the interface and it can be detected brightly. The image obtained by dark-field illumination includes the scattered light by the above-mentioned lumpy particles and the inclination fi of the pattern forming the element e4.
The specularly reflected light from the + part (for example, the #!fP+ parts 41 and 42 of the magnetic material 4) and the scattered light from the pattern edge are included. Therefore, two elements having the same shape are imaged with dark field illumination and compared. By doing so, you can maintain! ! A lumpy particle in the abdomen can be detected as a discrepancy between images.

なお半導体ウェハ上に付着した塊状粒子(異物)を検出
する方法としては、レーザでウエノ・を斜方から照明し
、その散乱光を検出する方法がt#開昭第55−997
35号に述べられている。
A method for detecting lumpy particles (foreign matter) attached to a semiconductor wafer is to illuminate the wafer obliquely with a laser and detect the scattered light.
It is stated in No. 35.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

暗視野照明で同一形状の2つの素子を撮像し、比較する
ことにより透明薄膜中の塊状粒子を検出する従来の方法
では、第7図に示すようにパターンの傾斜部分41の上
に存在する塊状粒子5Cは検出が困難となる欠潰かある
。すなわち塊状粒子5cからの散乱光の強度は、塊状粒
子下部に存在するパターン傾斜部41からの正反射光強
度に比べ微弱であり、塊状も子5Cからの散乱光とパタ
ーン傾斜部41から(/J正反射光を同時Iこ検出し、
2つの素子の比較により塊状粒子(/Jみを検出するこ
とは困難である。
In the conventional method of detecting lump particles in a transparent thin film by imaging two elements of the same shape with dark field illumination and comparing them, the lump particles existing on the sloped part 41 of the pattern are detected as shown in FIG. Particle 5C has some defects that make it difficult to detect. That is, the intensity of the scattered light from the lumpy particles 5c is weaker than the intensity of specularly reflected light from the pattern slope portion 41 located below the lump particles, and the scattered light from the lump particles 5C and the pattern slope portion 41 (/ Detects specularly reflected light at the same time,
It is difficult to detect lumpy particles (/J) by comparing two elements.

また、パターン傾斜部41は、その製造70セスの微妙
な条件変動により各素子毎に傾斜角度や高さlこばらつ
きがあり、暗視野照明を行った場合、正反射光強度は各
素子毎に大きく異ったものとなる。このため、暗視野照
明で2つの素子を撮像し比較すると、パターン傾斜部で
不一致が生じ多数の擬似欠陥を発生してしまう。
In addition, the pattern slope portion 41 has variations in slope angle and height for each element due to subtle fluctuations in conditions during the 70 process of manufacturing, and when dark field illumination is performed, the specularly reflected light intensity varies for each element. It will be very different. For this reason, when two elements are imaged using dark field illumination and compared, mismatches occur in the sloped portions of the patterns, resulting in a large number of false defects.

本発明の目的は、上記従来技術の問題点を解決し、透明
薄膜中の塊状粒子を、擬似欠陥を発生することなく高い
信頼性で検出する方法を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to solve the problems of the prior art described above and to provide a method for detecting massive particles in a transparent thin film with high reliability without generating false defects.

〔問題点を解決するための手段〕[Means for solving problems]

上記目的を達成するため、本発明では、素子を暗視野照
明する際に周囲すべての方向から同時に照明するのでは
なく、相異なる複数の方向から暗視野照明を行う手段を
設け、各方向からの照明毎に素子を撮像し、得られた複
数の画像を合成して比1/9検査用の新しい画像を作成
し、この作成した画像同志を2つの素子間で比較するよ
うにした点に特徴がある。比較検査用の画像は、各方向
からの照明毎に撮像して得た複数の画像の、対応する画
素毎に最小値を選択することにより作成する。
In order to achieve the above object, the present invention provides means for performing dark field illumination from a plurality of different directions, instead of illuminating the device from all directions simultaneously when performing dark field illumination of the element. The feature is that the device is imaged for each illumination, the multiple images obtained are combined to create a new image for 1/9 ratio inspection, and the created images are compared between the two devices. There is. The image for comparison inspection is created by selecting the minimum value for each corresponding pixel of a plurality of images obtained by capturing each illumination from each direction.

〔作用〕[Effect]

透明薄膜中の塊状粒子は暗視野照明の方向lこ拘らすそ
の散乱光を検出することができるが、ノくターンの傾斜
部は、ある一定方向からの暗視野照明lこ対する正反射
光しか検出することができない。
Agglomerated particles in a transparent thin film can detect their scattered light regardless of the direction of dark-field illumination, but the sloped part of the turn can only detect specularly reflected light from dark-field illumination from a certain direction. Unable to detect.

このため、相異なる方向から暗視野照明して撮像した複
数Q】画像には、同一の塊状粒子からの散乱光が共通に
含まれるが、パターン傾斜部からの正反射光は共通(こ
は宮まれす、それぞれに異なったパターン傾斜部からの
正反射光のみが検出されている。そこで、相異なる被数
の方向から暗視野照明して撮像した6数の画像(こ対し
、対応する画素毎に最小値をm算して作成した比較検査
用の新たな画像ζこは、パターン傾斜部からの正反射光
は含まれず、塊状粒子からの散乱光および−くターンエ
ツジからの散乱光のみが営まれる0このようにして得た
比較検査用の画像同志を、本米同−形状を廟する2つ0
〕素子間で比較することにより、ノ(ターン傾8+部上
に存在する塊状粒子を含め、すべての塊状粒子を擬似欠
陥を発生することなく検出することができる。
Therefore, multiple Q] images taken with dark-field illumination from different directions commonly include scattered light from the same lumpy particles, but specularly reflected light from the pattern slope is common (this is Rarely, only specularly reflected light from different pattern slopes is detected.Therefore, six images were taken using dark-field illumination from different directions of the decimals (in contrast, for each corresponding pixel, A new image ζ for comparison inspection created by calculating the minimum value of The images for comparison inspection obtained in this way are compared to two images with the same shape.
] By comparing between the elements, all lump particles, including the lump particles present on the turn inclination 8+ portion, can be detected without generating pseudo defects.

〔実施例〕〔Example〕

以下、本発明の一実施例を第1因および第2図により説
明する。第1図は本発明の一実施例の撫成図である。光
源10から出た光はコンデンサレンズ遮光板趣光板12
1反射に15. @視野用対物レンズ14の周囲を通っ
て被検査ウェハ・23を照明する。被検査ウェハ23か
らの反射光は暗視野用対・物レンズ14のレンズ部分、
反射鏡15(周囲のみ鏡で中央は光が透過する)を透過
した後結像レンズ15iこよりTV左カメラ6上に結像
する。遮光板12は第2図1こ示す如く2種類の遮光板
31.52を有しており、31a、32aが光を透過し
、Bib、32bが貼光するようζこなっているため、
第1図をこおいて遮光板12を上下に動かすことにより
暗視野照明方向を−j図中で左右に切換えることができ
る。
Hereinafter, one embodiment of the present invention will be explained with reference to the first factor and FIG. FIG. 1 is a schematic diagram of an embodiment of the present invention. The light emitted from the light source 10 passes through the condenser lens light shielding plate 12
15 per reflection. @The wafer 23 to be inspected is illuminated through the periphery of the viewing objective lens 14. The reflected light from the wafer to be inspected 23 is transmitted to the lens portion of the dark field objective lens 14,
After passing through a reflecting mirror 15 (only the periphery is a mirror and light passes through the center), an image is formed on the TV left camera 6 through an imaging lens 15i. The light shielding plate 12 has two types of light shielding plates 31 and 52 as shown in FIG.
By moving the light-shielding plate 12 up and down with reference to FIG. 1, the dark field illumination direction can be switched to the left and right in the -j diagram.

以下lこ本実施?1J(1)動作を説明する。ます遮光
板31を光路に挿入した状態で被検貞ウェハ23上の1
つの素子をT Vカメラ16で撮像しその出力をA/D
変換器17でテイジタル量に変換した後メモリ18に記
憶する。次1c趣光板12を移動し迦光板62を光路に
挿入した状態で先お同一の素子を1゛Vカメラ16で撮
像しその出力をA/D変換器17でディジタルち)に7
Jk:、擲する。こ01時A/D変換器17Q〕出力に
同期して、先にメモリ18に記憶しておいた画像を耽出
し、A/D変換器17の出力とともに最小値合成回路1
91こ入力する。最小値合成回路19は入力される2つ
の映像信号の小さい方の信号を常に出力するようFζな
っており、その出力はメモリ20Eこ記憶される。X−
Y・θステージ24を移腔し、−j様の手順で被検査ウ
ェハ23上(/J本米同−形状を有する他の素子を撮像
する。該他の素子に対して撮像した2枚の画像からも最
小値合成回路19により最小値を演算する。この時最小
値合成回路19の出力に同期して、先にメモリ201こ
記憶しておいた画像を読出し、最小値合成回路19の出
力とともに差の絶対値演算回路21に入力する。差の絶
対値演算回路21で2つの入力信号の差の絶対値を演算
し、その出力を2値化回路22により適当なしきい佃T
hで2値化することにより、欠陥すなわち被検査ウェハ
23上の透明保膿展に混入された塊状粒子か検出できる
Is this book implemented below? 1J(1) The operation will be explained. 1 on the wafer 23 to be inspected with the light shielding plate 31 inserted into the optical path.
The two elements are imaged by the TV camera 16 and the output is A/D.
After being converted into a digital quantity by a converter 17, it is stored in a memory 18. Next, with the optical plate 12 moved and the optical plate 62 inserted into the optical path, the same element was imaged with the 1゛V camera 16, and the output was digitalized with the A/D converter 17.
Jk:, I'll throw it. At this time, in synchronization with the output of the A/D converter 17Q, the image previously stored in the memory 18 is displayed, and together with the output of the A/D converter 17, the minimum value synthesis circuit 1
Enter 91. The minimum value synthesis circuit 19 is designed to always output the smaller of the two input video signals, and its output is stored in the memory 20E. X-
The Y/θ stage 24 is moved, and another element having the same shape is imaged on the wafer 23 to be inspected (/J) using the same procedure as in J. The minimum value is also calculated from the image by the minimum value synthesis circuit 19. At this time, in synchronization with the output of the minimum value synthesis circuit 19, the image previously stored in the memory 201 is read out and the output of the minimum value synthesis circuit 19 is calculated. The difference absolute value calculation circuit 21 calculates the absolute value of the difference between the two input signals, and the output is converted to an appropriate threshold T by the binarization circuit 22.
By binarizing with h, it is possible to detect a defect, that is, a lump particle mixed in the transparent suppurative spread on the wafer 23 to be inspected.

第3図は最小値合成回路19の一徊成?11を示す。Is Fig. 3 one step of the minimum value synthesis circuit 19? 11 is shown.

2つQ」入力信号を比較器41およびマルチプレクサ4
2(/J両方に入力する。2つの入力子ぎ号の大小関係
(こより比較器の出力が10“あるいは1“に切替り、
マルチプレクサカ)らは常(こ2つの入力信号の小さい
方のイぎ号が出力される。
2 Q' input signals to comparator 41 and multiplexer 4
2 (Input to both /J. The magnitude relationship of the two input keys (this causes the output of the comparator to switch to 10" or 1",
The multiplexer always outputs the smaller signal of these two input signals.

第4図は本発明の他の実施例の構成図である。FIG. 4 is a block diagram of another embodiment of the present invention.

異なる波長帯域で相異なる方向から同時に暗視野照明を
行い、各波長帯域毎にTV右カメラ検出することにより
、異なる方向から照明した複数の画像を同時に検出する
ことかできる。これを実現するため暗視野光路lこ挿入
T6遮光板33は第5図Iこ示す構成とする。同図にお
い−C35cは元を透過しない遮光部、65aは長波長
帯域の光(赤色光)力みを透過し、他の波長光を反射す
る色フィルタ。
By simultaneously performing dark-field illumination from different directions in different wavelength bands and detecting the TV right camera for each wavelength band, it is possible to simultaneously detect a plurality of images illuminated from different directions. In order to realize this, the dark field optical path insertion T6 light shielding plate 33 is constructed as shown in FIG. In the figure, -C35c is a light shielding part that does not transmit the original light, and 65a is a color filter that transmits light in a long wavelength band (red light) and reflects light of other wavelengths.

易すは短波長帯域の光(青色光)のみを透過し、他の波
長光を反射する色フィルタである。また2つの波長帯域
を分離して検出するため、第4図に示す構成図において
検出光路中にダイクロイックミラー34ヲ挿入している
。夕゛イクロツクミラー34は赤色光を透過し、青色光
を反射するものを使用する。2台U、J T Vカメラ
16a、16bで検出した画像を最小値合成回路19f
こ入力する。最小値合成回路以降の構成は第1図tこ示
した実M例と同一である。不実流例では、照明方向の鼾
なる2枚(/J面画像同時に検出できるため、検査時間
の短縮ができるO 〔発明の効果〕 以上説明したようlこ、本発明によれば、透明薄膜中の
塊状粒子をその存在塾所に拘らず、擬似欠陥を発生する
ことなく高い信頼度で検出できるため、製品の信頼性向
上に顕著な効果がある。
It is a color filter that only transmits light in a short wavelength band (blue light) and reflects light of other wavelengths. Furthermore, in order to separate and detect two wavelength bands, a dichroic mirror 34 is inserted in the detection optical path in the configuration diagram shown in FIG. The evening clock mirror 34 is one that transmits red light and reflects blue light. The images detected by the two U and J TV cameras 16a and 16b are combined into a minimum value synthesis circuit 19f.
Enter this. The configuration after the minimum value synthesis circuit is the same as the actual M example shown in FIG. In the case of a false flow, two images (/J plane images) in the illumination direction can be detected simultaneously, so the inspection time can be shortened. [Effects of the Invention] As explained above, according to the present invention, This method has a remarkable effect on improving the reliability of products because it is possible to detect lumpy particles with high reliability without generating false defects, regardless of where they are present.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実8例の構成図、第2図は第1図に
示す遮光板を示す図、第3図は本発明による塊状粒子検
出方法の一実施例1こ用いる最小値合成回路CIJ輌成
図、第4図は本発明の他CIJ実M例の構成図、第5図
は第4図に示す遮光板を示す1第6因および第7図は薄
膜磁気ヘッドの部分断面図である。 12・・・遮光板     13・・・反射棟14・・
・暗視野用対物レンズ 16・・・TV右カメラ  19・・・最小値合成回路
35・・・遮光板     41川比較器42・・・マ
ルチプレクサ \、 代理人 弁理士 小 川 勝 男 閉1凹 粥2図 46図 〒4図 鞘5図 閑6図 47図 2絶線層   5ユJ j丸状粒子
Fig. 1 is a block diagram of 8 examples of the present invention, Fig. 2 is a diagram showing the light shielding plate shown in Fig. 1, and Fig. 3 is an example 1 of the method for detecting lump particles according to the present invention. Figure 4 is a configuration diagram of an actual CIJ example in addition to the present invention; Figure 5 shows the light shielding plate shown in Figure 4; Figure 6 shows the part of the thin film magnetic head; FIG. 12... Light shielding plate 13... Reflection ridge 14...
・Dark field objective lens 16... TV right camera 19... Minimum value synthesis circuit 35... Light shielding plate 41 River comparator 42... Multiplexer\, Agent Patent attorney Masaru Ogawa 2 Figure 46 Figure 4 Figure Sheath 5 Figure Blank 6 Figure 47 Figure 2 Disconnected layer 5 U J j Round particle

Claims (1)

【特許請求の範囲】[Claims] 1、暗視野照明手段により相異なる複数の方向から暗視
野照明を施こし、各方向からの照明毎に撮像手段により
画像を撮像し、撮像した複数の画像の対応する画素毎に
演算手段により最小値を演算し、この演算結果を2個の
素子間で比較手段により比較し、透明薄膜で保護された
素子の保護膜中に混入した塊状粒子を検出することを特
徴とした透明薄膜中の塊状粒子検出方法。
1. Apply dark-field illumination from a plurality of different directions using a dark-field illumination means, take an image using an imaging means for each illumination from each direction, and use a calculation means to calculate the minimum value for each corresponding pixel of the plurality of images taken. A lumpy particle in a transparent thin film is characterized in that a value is calculated and the calculated result is compared between two elements by a comparison means to detect lumpy particles mixed into the protective film of an element protected by a transparent thin film. Particle detection method.
JP30560387A 1987-12-04 1987-12-04 Detecting method for solid particle in transparent thin film Pending JPH01147349A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30560387A JPH01147349A (en) 1987-12-04 1987-12-04 Detecting method for solid particle in transparent thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30560387A JPH01147349A (en) 1987-12-04 1987-12-04 Detecting method for solid particle in transparent thin film

Publications (1)

Publication Number Publication Date
JPH01147349A true JPH01147349A (en) 1989-06-09

Family

ID=17947134

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30560387A Pending JPH01147349A (en) 1987-12-04 1987-12-04 Detecting method for solid particle in transparent thin film

Country Status (1)

Country Link
JP (1) JPH01147349A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009099142A1 (en) * 2008-02-06 2009-08-13 Nikon Corporation Surface inspecting apparatus and surface inspecting method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009099142A1 (en) * 2008-02-06 2009-08-13 Nikon Corporation Surface inspecting apparatus and surface inspecting method
US8223328B2 (en) 2008-02-06 2012-07-17 Nikon Corporation Surface inspecting apparatus and surface inspecting method
JP5500427B2 (en) * 2008-02-06 2014-05-21 株式会社ニコン Surface inspection apparatus and surface inspection method

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