JPH01146525U - - Google Patents

Info

Publication number
JPH01146525U
JPH01146525U JP4185388U JP4185388U JPH01146525U JP H01146525 U JPH01146525 U JP H01146525U JP 4185388 U JP4185388 U JP 4185388U JP 4185388 U JP4185388 U JP 4185388U JP H01146525 U JPH01146525 U JP H01146525U
Authority
JP
Japan
Prior art keywords
wafer
resist
light
guide fiber
light guide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4185388U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4185388U priority Critical patent/JPH01146525U/ja
Publication of JPH01146525U publication Critical patent/JPH01146525U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの考案におけるウエハ周辺露光装置
の一実施例の主要部の概略構成を示す斜視図、第
2図aは第1図における導光フアイバの出射部の
側断面図、同図bは同図aのX―Xにおける断面
図、第3図は半導体ウエハに塗布されたレジスト
に光を照射する場合の斜視図、第4図a,bは第
3図の方法で露光するための光照射の状態を示す
図、第5図は導光フアイバの出射部先端にレンズ
を設けてウエハ周辺を露光する状態を示した図で
ある。 図中、1:ウエハ、5:搬送ベルト、6:処理
ステージ、7:オリフラ部検出搬送アーム、8:
導光フアイバ、8a:出射部、10:ローダ、1
0′:アンローダ、27:投影レンズ、H:スポ
ツト光照射装置。
FIG. 1 is a perspective view showing a schematic configuration of the main parts of an embodiment of the wafer peripheral exposure apparatus in this invention, FIG. 2a is a side sectional view of the output part of the light guide fiber in FIG. 3 is a perspective view of irradiating light onto a resist coated on a semiconductor wafer, and FIGS. 4 a and b are sectional views taken along line X--X in Figure 3. FIG. 5 is a diagram showing a state of irradiation, and shows a state in which a lens is provided at the tip of the emission part of a light guide fiber to expose the periphery of a wafer. In the figure, 1: wafer, 5: transport belt, 6: processing stage, 7: orientation flat detection transport arm, 8:
Light guide fiber, 8a: Output section, 10: Loader, 1
0': unloader, 27: projection lens, H: spot light irradiation device.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] レジストの塗布されたウエハを搬送する搬送機
構と、搬送されたウエハを所定位置に位置決めす
る位置決め機構と、ウエハを載置するための昇降
かつ回転可能な処理テーブルと、ウエハ周辺部に
スポツト光を照射するスポツト光照射機構とより
なり、前記スポツト光照射機構は、水銀ランプか
らの光を導く導光フアイバを有し、この導光フア
イバの出射側には少なくとも1つのレンズが設け
られ、該レンズの全ての光学面に、前記レジスト
の感光露光波長の光を透過する反射防止膜を設け
たことを特徴とするウエハ周辺露光装置。
A transport mechanism that transports the wafer coated with resist, a positioning mechanism that positions the transported wafer at a predetermined position, a processing table that can be raised and lowered and rotated to place the wafer, and a spot light that illuminates the periphery of the wafer. The spot light irradiation mechanism includes a light guide fiber that guides light from a mercury lamp, and at least one lens is provided on the output side of the light guide fiber, A wafer peripheral exposure apparatus characterized in that an antireflection film that transmits light having a photosensitive exposure wavelength of the resist is provided on all optical surfaces of the resist.
JP4185388U 1988-03-31 1988-03-31 Pending JPH01146525U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4185388U JPH01146525U (en) 1988-03-31 1988-03-31

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4185388U JPH01146525U (en) 1988-03-31 1988-03-31

Publications (1)

Publication Number Publication Date
JPH01146525U true JPH01146525U (en) 1989-10-09

Family

ID=31268279

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4185388U Pending JPH01146525U (en) 1988-03-31 1988-03-31

Country Status (1)

Country Link
JP (1) JPH01146525U (en)

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