JPH01140817U - - Google Patents
Info
- Publication number
- JPH01140817U JPH01140817U JP3784288U JP3784288U JPH01140817U JP H01140817 U JPH01140817 U JP H01140817U JP 3784288 U JP3784288 U JP 3784288U JP 3784288 U JP3784288 U JP 3784288U JP H01140817 U JPH01140817 U JP H01140817U
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- foreign matter
- exposure apparatus
- inspection mechanism
- loading section
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007689 inspection Methods 0.000 claims description 2
- 230000001681 protective effect Effects 0.000 claims 1
- 230000003287 optical effect Effects 0.000 description 3
- 238000005286 illumination Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
Description
第１図は本考案の実施例１の断面図、第２図は
本考案の実施例２の断面図、第３図は従来のフオ
トマスク異物検査機構付露光装置の平面構成図で
ある。
１……フオトマスク、２ａ，２ｂ，２ｃ，２ｄ
……光ビーム投光器、３ａ，３ｂ，３ｃ，３ｄ，
３ｅ，３ｆ……光電検出素子、４ａ，４ｂ，４ｃ
，４ｄ……光ビーム、５ａ，５ｂ，５ｃ，５ｄ，
５ｅ，５ｆ……フオトマスク上に付着した異物か
らの散乱光、６……照明光学部、７……フオトマ
スク装填部、８……投影光学部、９……ウエーハ
、１０……ウエーハステージ、１１……架台、１
２……照明光学部支持部。
FIG. 1 is a sectional view of Embodiment 1 of the present invention, FIG. 2 is a sectional view of Embodiment 2 of the present invention, and FIG. 3 is a plan configuration diagram of a conventional exposure apparatus with a photomask foreign matter inspection mechanism. 1...Photomask, 2a, 2b, 2c, 2d
...Light beam projector, 3a, 3b, 3c, 3d,
3e, 3f...photoelectric detection element, 4a, 4b, 4c
, 4d...Light beam, 5a, 5b, 5c, 5d,
5e, 5f...Scattered light from foreign matter adhering to the photomask, 6...Illumination optical section, 7...Photomask loading section, 8...Projection optical section, 9...Wafer, 10...Wafer stage, 11... ... mount, 1
2...Illumination optical part support part.
Claims (1)
マスクの表面と裏面及びフオトマスク用保護膜面
の異物付着の有無を検査する異物検査機構を装備
したことを特徴とする露光装置。 An exposure apparatus characterized in that a photomask loading section inside the exposure apparatus is equipped with a foreign matter inspection mechanism for inspecting the presence or absence of foreign matter adhering to the front and back surfaces of the photomask and the surface of a protective film for the photomask.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3784288U JPH01140817U (en) | 1988-03-23 | 1988-03-23 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3784288U JPH01140817U (en) | 1988-03-23 | 1988-03-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01140817U true JPH01140817U (en) | 1989-09-27 |
Family
ID=31264416
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3784288U Pending JPH01140817U (en) | 1988-03-23 | 1988-03-23 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01140817U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017021249A (en) * | 2015-07-13 | 2017-01-26 | 株式会社東芝 | Particle measurement mask |
-
1988
- 1988-03-23 JP JP3784288U patent/JPH01140817U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017021249A (en) * | 2015-07-13 | 2017-01-26 | 株式会社東芝 | Particle measurement mask |