JPH01139620A - Production of novel thin filmy polymer - Google Patents
Production of novel thin filmy polymerInfo
- Publication number
- JPH01139620A JPH01139620A JP29878287A JP29878287A JPH01139620A JP H01139620 A JPH01139620 A JP H01139620A JP 29878287 A JP29878287 A JP 29878287A JP 29878287 A JP29878287 A JP 29878287A JP H01139620 A JPH01139620 A JP H01139620A
- Authority
- JP
- Japan
- Prior art keywords
- film
- polymer
- light
- formula
- saturated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000642 polymer Polymers 0.000 title claims abstract description 17
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 230000001186 cumulative effect Effects 0.000 claims abstract description 12
- 230000001678 irradiating effect Effects 0.000 claims abstract description 6
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 5
- 238000002156 mixing Methods 0.000 claims abstract description 3
- AAFXQFIGKBLKMC-KQQUZDAGSA-N (e)-3-[4-[(e)-2-carboxyethenyl]phenyl]prop-2-enoic acid Chemical compound OC(=O)\C=C\C1=CC=C(\C=C\C(O)=O)C=C1 AAFXQFIGKBLKMC-KQQUZDAGSA-N 0.000 claims description 6
- 150000002148 esters Chemical class 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 5
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 229920006395 saturated elastomer Polymers 0.000 claims 2
- 150000001298 alcohols Chemical class 0.000 claims 1
- 235000014113 dietary fatty acids Nutrition 0.000 claims 1
- 229930195729 fatty acid Natural products 0.000 claims 1
- 239000000194 fatty acid Substances 0.000 claims 1
- 150000004665 fatty acids Chemical class 0.000 claims 1
- 150000004671 saturated fatty acids Chemical class 0.000 abstract description 3
- AAFXQFIGKBLKMC-UHFFFAOYSA-N 3-[4-(2-carboxyethenyl)phenyl]prop-2-enoic acid Chemical compound OC(=O)C=CC1=CC=C(C=CC(O)=O)C=C1 AAFXQFIGKBLKMC-UHFFFAOYSA-N 0.000 abstract 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract 2
- 239000010408 film Substances 0.000 description 39
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 16
- 239000000243 solution Substances 0.000 description 11
- 239000010409 thin film Substances 0.000 description 11
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- 238000010521 absorption reaction Methods 0.000 description 8
- 239000002253 acid Substances 0.000 description 8
- YKYOUMDCQGMQQO-UHFFFAOYSA-L cadmium dichloride Chemical compound Cl[Cd]Cl YKYOUMDCQGMQQO-UHFFFAOYSA-L 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 7
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000002835 absorbance Methods 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000001953 recrystallisation Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000000862 absorption spectrum Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 125000001165 hydrophobic group Chemical group 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 238000001393 microlithography Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- GLDOVTGHNKAZLK-UHFFFAOYSA-N octadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCCCO GLDOVTGHNKAZLK-UHFFFAOYSA-N 0.000 description 2
- -1 p-fluorinated diacrylic acid diester Chemical class 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000002211 ultraviolet spectrum Methods 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- 238000012644 addition polymerization Methods 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 229940114081 cinnamate Drugs 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- GOQYKNQRPGWPLP-UHFFFAOYSA-N n-heptadecyl alcohol Natural products CCCCCCCCCCCCCCCCCO GOQYKNQRPGWPLP-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
Landscapes
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は新規な薄膜状重合体及びその製造方法に関する
ものである。さらに詳しくいえば、本発明は、架橋剤や
感光性材料、電子デバイスの作製、ミクロリソグラフィ
ーにおける電子線レジスト材料などとして有用な光反応
性薄膜を作製し、それに光照射をすることにより重合体
薄膜を容易に製造する方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a novel thin film polymer and a method for producing the same. More specifically, the present invention produces a photoreactive thin film useful as a crosslinking agent, a photosensitive material, the production of electronic devices, an electron beam resist material in microlithography, etc., and then irradiates it with light to form a polymer thin film. The present invention relates to a method for easily manufacturing.
ｐ−フ二二レンジアクリル酸の誘導体は結晶状態で光に
より重合し、結晶性ポリマーを生成する特異的な物質で
あるが結晶あるいは粉沫としての取り扱いが一般的であ
り加工が鰭かしく、薄膜状で利用する電子デバンスなど
への利用は困蕪であった。一般に一定の厚さ、一定の分
子配列を持った薄膜の作製方法としてはラングミュア−
ブロジェット法がある。この方法を用いて薄膜を作製す
るには分子内に単分子膜の形成可能な分子内に親木基と
疎水基を持った両親媒性化合物でなければならない、従
って、電子デバイスなどに利用出来る薄膜状重合体をラ
ングミュアープロジエツト法により郁ｉをるには、重合
性官能基を持った両親媒性化合物を用いなければならな
い。Derivatives of p-phenyl diacrylic acid are unique substances that can be polymerized by light in a crystalline state to produce crystalline polymers, but they are generally handled as crystals or powders and are difficult to process, making it difficult to form thin films. It has been difficult to use it for electronic device devices used in other situations. In general, Langmuir
There is the Blodget method. In order to create a thin film using this method, it must be an amphipathic compound that has a parent group and a hydrophobic group within the molecule that can form a monolayer, and therefore can be used for electronic devices etc. In order to produce a thin film polymer by the Langmuir-Prodjet method, an amphiphilic compound having a polymerizable functional group must be used.
官能基を持った両親媒性化合物の合成は必ずしも容易で
はなく、また化合物によっては単分子膜の形成が可能で
ない。Synthesizing amphiphilic compounds with functional groups is not always easy, and depending on the compound, it is not possible to form a monomolecular film.
そこで合成が容品で光反応性結晶であるｐ−フ二二レン
ジアクリル酸誘導体を用いて薄膜を作製することを試み
た結果、一般式
％式％（１）
（式中のＲは炭素数７−１８の飽和アルキル基である。Therefore, we attempted to create a thin film using a p-phenyl diacrylic acid derivative, which is easy to synthesize and is a photoreactive crystal.As a result, we found the general formula % formula % (1) (where R is the number of carbon atoms). 7-18 saturated alkyl group.
）で表わされる長鎖アルキルエステル基を持っｐ−フ二
二レしジアクリル酸ジエステルは適当な両親媒性化合物
と混合することによって、単分子膜の形成が可能であり
、その単分子膜は石英板などの基板に累積できることを
見い出し、本発明を完成するに至った。) It is possible to form a monomolecular film by mixing p-fluorinated diacrylic acid diester with a long-chain alkyl ester group with a suitable amphiphilic compound, and the monomolecular film can be formed on quartz. They discovered that it can be accumulated on substrates such as plates, and completed the present invention.
すなわち、本発明、は、一般式
で表わされる重合体、及びこのものを、前記一般式（１
）で表わされるｐ−フェニレンジアクリル酸ジアルキル
エステルとアラキシン酸などの両親媒性化合物との混合
累積膜に光を照射することによって製造する方法を提供
するものである。That is, the present invention provides a polymer represented by the general formula, and a polymer represented by the general formula (1).
The present invention provides a method for producing a mixed cumulative film of p-phenylene diacrylic acid dialkyl ester represented by () and an amphiphilic compound such as alaxic acid by irradiating light.
本発明において単量体として用いるｐ−フェニレンジア
クリル酸ジアルキルエステルは、一般式（１）で示され
る構造を有し、式中のＲは炭素数７−１８の飽和アルキ
ル基である。このものは分子内に疎水基を有するが、親
木基がないので単分子膜を形成しないが、このものと飽
和脂肪酸あるいは飽和アルコール（炭素数１５〜２０）
と混合すると水面上や塩化カドミウム水溶液などの液面
上で安定な単分子膜を形成する。この単分子膜の形成は
、表面圧−占有面積曲線から容易に確認することが出来
る。The p-phenylene diacrylic acid dialkyl ester used as a monomer in the present invention has a structure represented by general formula (1), in which R is a saturated alkyl group having 7 to 18 carbon atoms. Although this substance has a hydrophobic group in its molecule, it does not form a monomolecular film because it does not have a parent group.
When mixed with, it forms a stable monomolecular film on the surface of water or liquids such as cadmium chloride aqueous solutions. Formation of this monomolecular film can be easily confirmed from the surface pressure-occupied area curve.
光反応性薄膜を作製するには、まずｐ−フェニレンジア
クリル酸ジアルキルエステルとアラキシン酸などの飽和
脂肪酸をモル比１：５〜１：１の割合でクロロホルム溶
液などの有機溶媒に溶解したのち、この溶液を蒸留水や
塩化カドミウム水溶液などの液面上に徐々に滴下して、
該液面上にｐ−フェニレンジアクリル酸ジアルキルエス
テルとアラキシン酸から成る単分子膜を形成させ、次い
でこの単分子膜を石英板などの基板上に移しとる操作を
繰り返る。このように作製した混合累積膜に光照射を行
なうと附加重合が起こり薄膜状の重合体が得られる。こ
の際の累積膜は、結晶状態のように特定の分子配列構造
を有し、光により容易に反応する０例えば、４層以上累
積した膜は、２８０ｎｒｎに吸収極大を有しており、キ
セノンランプなどで光照射することにより、二重結合間
で反応が起り、この吸収極大の吸光度は減少する。この
光照射した薄膜はゲルバーミエーシ目ンクロマトグラフ
ィーにより分子量を測定した結果、分子量１．０００〜
１０，０００位の重合体であり、赤外吸収スペクトル、
紫外吸収スペクトルからシクロブタン環を主鎖に有する
構造であることが確認された。この重合体はクロロホル
ム、テトラヒドロフランなどの有機溶媒に可溶であるが
長時間照射すると膜は一般の有機溶媒に不溶となる。To prepare a photoreactive thin film, first, p-phenylene diacrylic acid dialkyl ester and saturated fatty acid such as araxic acid are dissolved in an organic solvent such as a chloroform solution at a molar ratio of 1:5 to 1:1. Gradually drop this solution onto the surface of a liquid such as distilled water or cadmium chloride aqueous solution,
The operation of forming a monomolecular film of p-phenylene diacrylic acid dialkyl ester and araxic acid on the liquid surface, and then transferring this monomolecular film onto a substrate such as a quartz plate is repeated. When the mixed cumulative film thus prepared is irradiated with light, addition polymerization occurs and a thin film-like polymer is obtained. The accumulated film in this case has a specific molecular arrangement structure like a crystalline state and reacts easily to light.For example, a film with four or more accumulated layers has an absorption maximum at 280nrn, and the By irradiating it with light, a reaction occurs between the double bonds, and the absorbance at the maximum absorption decreases. The molecular weight of this light-irradiated thin film was measured by gel vermiacetic chromatography, and the molecular weight was 1.000 to 1.000.
It is a polymer at position 10,000, and its infrared absorption spectrum,
It was confirmed from the ultraviolet absorption spectrum that the structure had a cyclobutane ring in the main chain. This polymer is soluble in organic solvents such as chloroform and tetrahydrofuran, but if irradiated for a long time, the film becomes insoluble in common organic solvents.
本発明の重合体は、単量体としてｐ−フェニレンジアク
リル酸ジアルキルエステルを用い、その累積膜に光を照
射して得られた薄膜状のものであって、主鎖にシクロブ
タン環を末端にケイ皮酸エステル残基を有している。こ
の薄膜状重合体はその機械的強度において、低分子有機
化合物の累積膜と比較するとすぐれており、電子デバイ
スの作製に適している。また、光反応性累積膜は、その
光照射過程における化学的、物理的変化を活がして、ミ
クロリソグラフィーにおけるレジスト材料などとして利
用可能である。The polymer of the present invention is a thin film obtained by using p-phenylene diacrylic acid dialkyl ester as a monomer and irradiating the cumulative film with light, and has a cyclobutane ring at the end of the main chain. Contains cinnamate ester residues. This thin film polymer has superior mechanical strength compared to cumulative films of low-molecular organic compounds, and is suitable for manufacturing electronic devices. Further, the photoreactive cumulative film can be used as a resist material in microlithography by taking advantage of chemical and physical changes during the light irradiation process.
実施例 次に実施例により本発明をさらに詳細に説明する。Example Next, the present invention will be explained in more detail with reference to Examples.
実施例１
ヘキサンから数回再結晶により精製したｐ−フ二二レン
ジアクリル酸ジーｎ−デジルエステルのクロロホルム溶
液（１０−’Ｍ ）とステアリルアルコールのクロロホ
ルム溶液（１０−３Ｍ）をモル比１：５の割合で混合す
る。この溶液をラウダ社製フィルムバランス装置を用い
て、濃度１０−”Ｍの塩化カドミウム水溶液（ｐＨ５，
３）の液面上に徐々に滴下して展開し、単分子膜を形成
させた。この際、ｐ−フ二二レンジアクリル酸ジーｎ−
デシルエステルとアラキシン酸の混合系の表面圧−占有
面積曲線から２０〜３０ｄｙｎ ／ｃｍで固体凝縮膜の
存在が確認されたので、該装置を２５ｄｙｎ ／ｃｍに
設定して、単分子膜を形成させた。Example 1 A chloroform solution (10-'M) of di-n-decyl p-phenyl diacrylate purified by recrystallization several times from hexane and a chloroform solution (10-3M) of stearyl alcohol were mixed in a molar ratio of 1: Mix in 5 parts. This solution was mixed with a cadmium chloride aqueous solution (pH 5,
3) was gradually dropped onto the liquid surface and spread to form a monomolecular film. At this time, p-phenyl diacrylic acid di-n-
The presence of a solid condensed film at 20-30 dyn/cm was confirmed from the surface pressure-occupied area curve of the mixed system of decyl ester and alaxic acid, so the device was set at 25 dyn/cm to form a monomolecular film. Ta.
次に、このようにして形成された単分子膜を垂直浸せき
法により石英板に移しとり、単分子膜１０層から成る累
積膜を作製した。この累積膜は、２８０ｎｍの波長域に
紫外スペクトルの吸収極大を有し、これにキセノンラン
プを用いて１０分間光照射すると、二重結合間で反応が
起り、この吸収極大の吸光度は減少した。５分間光照射
後の累積膜をテトラヒドロフランに溶解し、ゲルパーミ
ェーションクロマトグラフィーで分子量を調べてみると
２層３量体である。この低重合体に３００ｎｍ以上の光
を更に長時間照射すると吸収極大は消失し、膜は一般の
有Ｊａ溶媒に不溶となる。Next, the monomolecular film thus formed was transferred to a quartz plate by a vertical dipping method to produce a cumulative film consisting of 10 monomolecular films. This cumulative film had an absorption maximum in the ultraviolet spectrum in the wavelength range of 280 nm, and when it was irradiated with light for 10 minutes using a xenon lamp, a reaction occurred between the double bonds and the absorbance at this absorption maximum decreased. The accumulated film after 5 minutes of light irradiation was dissolved in tetrahydrofuran, and the molecular weight was examined by gel permeation chromatography, and it was found to be a two-layer trimer. When this low polymer is irradiated with light of 300 nm or more for a longer period of time, the absorption maximum disappears and the film becomes insoluble in general Ja-containing solvents.
実施例２
ヘキサンから数回再結晶により精製したｐ−フ二二レし
ジアクリル酸ジーｎ−ドデシルエステルのクロロホルム
溶液（１０−３Ｍ）とアラキシン酸のクロロホルム溶液
（１０−３Ｍ ）をモル比１：３の割合で混合する。こ
の溶液をラウダ社製フィルムバランス装置を用いて、濃
度１０−３Ｍの塩化カドミウム水溶液（ｐＨ５，３）の
液面上に徐々に滴下して展開し、単分子膜を形成させた
。この際、ｐ−フ二二レンジアクリル酸ジーｎ−ドデシ
ルエステルとアラキシン酸の混合系の表面圧−占有面積
曲線から２０〜３０ｄｙｎ ／ｃｍで固体凝縮膜の存在
が確認されたので、該装装置を２５ｄｙｎ／ｃｍに設定
して、単分子膜を形成させた。Example 2 A chloroform solution (10-3M) of di-n-dodecyl p-phenyl diacrylate purified by recrystallization several times from hexane and a chloroform solution (10-3M) of alaxic acid were mixed in a molar ratio of 1: Mix at a ratio of 3. Using a Lauda film balance device, this solution was gradually dropped onto the surface of a cadmium chloride aqueous solution (pH 5.3) with a concentration of 10 −3 M to form a monomolecular film. At this time, the presence of a solid condensation film at 20 to 30 dyn/cm was confirmed from the surface pressure-occupied area curve of the mixed system of p-phenyl diacrylic acid di-n-dodecyl ester and araxic acid. was set at 25 dyn/cm to form a monomolecular film.
次に、このようにして形成された単分子膜を垂直浸せき
法により石英板に移しとり、単分子膜１０層から成る累
積膜を作製した。この累積膜は、紫外スペクトルにおい
て２８０ｎｍに吸収極大を有し、これにキセノンランプ
を用いて１０分間光照射すると、二重結合間で反応が起
り、この吸収極大の吸光度は減少した。５分間光照射後
の累積膜をテトラヒドロフランに溶解しゲルパーミェー
ションクロマトグラフィーで分子量を調べてみると分子
量１，０００〜２，０００である。この低重合体に３０
０ｎｍ以上の光を更に長時間照射すると吸収極大は消失
し、千
膜は一般の有機溶媒に会溶となる。Next, the monomolecular film thus formed was transferred to a quartz plate by a vertical dipping method to produce a cumulative film consisting of 10 monomolecular films. This cumulative film had an absorption maximum at 280 nm in the ultraviolet spectrum, and when it was irradiated with light for 10 minutes using a xenon lamp, a reaction occurred between the double bonds and the absorbance at this absorption maximum decreased. The accumulated film after 5 minutes of light irradiation was dissolved in tetrahydrofuran and the molecular weight was examined by gel permeation chromatography, and the molecular weight was found to be 1,000 to 2,000. 30 to this low polymer
When irradiated with light of 0 nm or more for a longer period of time, the absorption maximum disappears and the film becomes soluble in common organic solvents.
実施例３
ヘキサンから再結晶により精製したｐ−フ二二レンジア
クリル酸ジーｎ−テトラデシルエステルのクロロホルム
溶液（１０−３Ｍ ’）とアラキシン酸クロロホルム溶
液（１０−’Ｍ ）をモル比１：５で混合する。この溶
液をフィルムバランス装置を用いて再蒸留水の水面上に
徐々に滴下して展開し単分子膜を形成させた。この際、
該化合物の表面圧−占有面積曲線から２０〜３０６ｙｎ
／ｃｍで固体凝縮膜の存在が確認されたので、該装置を
２５ｄｙｎ ／ｃｍに設定して、単分子膜を形成させた
。Example 3 A chloroform solution (10-3 M') of p-phinidiacrylic acid di-n-tetradecyl ester purified by recrystallization from hexane and a chloroform solution (10-'M) of alaxic acid were mixed in a molar ratio of 1:5. Mix with This solution was gradually dropped onto the surface of redistilled water using a film balance device and spread to form a monomolecular film. On this occasion,
From the surface pressure-occupied area curve of the compound, 20 to 306 yn
Since the presence of a solid condensed film was confirmed at 25 dyn/cm, the apparatus was set at 25 dyn/cm to form a monomolecular film.
Claims (1)
エステルと飽和脂肪酸又は飽和アルコールを混合するこ
とにより作製した累積膜に光を照射することを特徴とす
る一般式 ▲数式、化学式、表等があります▼ （式中のＲは炭素数７−１８の飽和アルキル基である。 ）で表わされる重合体の製造方法。[Claims] A p-phenylene diacrylic acid dialkyl ester represented by the general formula ▲ Numerical formulas, chemical formulas, tables, etc. ▼ (R in the formula is a saturated alkyl group having 7 to 18 carbon atoms) and a saturated A general formula characterized by irradiating light onto a cumulative film made by mixing fatty acids or saturated alcohols ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (R in the formula is a saturated alkyl group with 7 to 18 carbon atoms) A method for producing a polymer represented by
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29878287A JPH01139620A (en) | 1987-11-26 | 1987-11-26 | Production of novel thin filmy polymer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29878287A JPH01139620A (en) | 1987-11-26 | 1987-11-26 | Production of novel thin filmy polymer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01139620A true JPH01139620A (en) | 1989-06-01 |
| JPH0422930B2 JPH0422930B2 (en) | 1992-04-20 |
Family
ID=17864148
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29878287A Granted JPH01139620A (en) | 1987-11-26 | 1987-11-26 | Production of novel thin filmy polymer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01139620A (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61257947A (en) * | 1985-05-10 | 1986-11-15 | Agency Of Ind Science & Technol | Novel low polymer and production thereof |
-
1987
- 1987-11-26 JP JP29878287A patent/JPH01139620A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61257947A (en) * | 1985-05-10 | 1986-11-15 | Agency Of Ind Science & Technol | Novel low polymer and production thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0422930B2 (en) | 1992-04-20 |
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