JPH01131277A - Cyanine compound - Google Patents
Cyanine compoundInfo
- Publication number
- JPH01131277A JPH01131277A JP63196631A JP19663188A JPH01131277A JP H01131277 A JPH01131277 A JP H01131277A JP 63196631 A JP63196631 A JP 63196631A JP 19663188 A JP19663188 A JP 19663188A JP H01131277 A JPH01131277 A JP H01131277A
- Authority
- JP
- Japan
- Prior art keywords
- group
- compound
- lower alkyl
- general formula
- production example
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 Cyanine compound Chemical class 0.000 title claims description 32
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 24
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 13
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 8
- 230000002378 acidificating effect Effects 0.000 claims abstract description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 14
- 125000001424 substituent group Chemical group 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 abstract description 61
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract description 5
- 239000004065 semiconductor Substances 0.000 abstract description 5
- 229910052714 tellurium Inorganic materials 0.000 abstract description 5
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 abstract description 5
- 229910010272 inorganic material Inorganic materials 0.000 abstract description 4
- 239000011147 inorganic material Substances 0.000 abstract description 4
- 230000003287 optical effect Effects 0.000 abstract description 4
- 150000003839 salts Chemical class 0.000 abstract description 4
- 238000006482 condensation reaction Methods 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 3
- 238000004040 coloring Methods 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 38
- 238000004519 manufacturing process Methods 0.000 description 26
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 20
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 15
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 14
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
- 239000000975 dye Substances 0.000 description 9
- 239000000203 mixture Substances 0.000 description 7
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 238000002844 melting Methods 0.000 description 6
- 230000008018 melting Effects 0.000 description 6
- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical compound [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 5
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine group Chemical group N1=CCC2=CC=CC=C12 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 4
- 229940126062 Compound A Drugs 0.000 description 4
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 4
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 4
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 4
- 150000007524 organic acids Chemical class 0.000 description 4
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000002168 alkylating agent Substances 0.000 description 3
- 229940100198 alkylating agent Drugs 0.000 description 3
- 235000014113 dietary fatty acids Nutrition 0.000 description 3
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 3
- 239000000194 fatty acid Substances 0.000 description 3
- 229930195729 fatty acid Natural products 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 235000011056 potassium acetate Nutrition 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 2
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 2
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 2
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 2
- XHCWDDGZFBAXRT-UHFFFAOYSA-N 3-bromo-3-methylbutan-2-one Chemical compound CC(=O)C(C)(C)Br XHCWDDGZFBAXRT-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000005526 alkyl sulfate group Chemical group 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 125000005228 aryl sulfonate group Chemical group 0.000 description 2
- 230000008033 biological extinction Effects 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- VSGNNIFQASZAOI-UHFFFAOYSA-L calcium acetate Chemical compound [Ca+2].CC([O-])=O.CC([O-])=O VSGNNIFQASZAOI-UHFFFAOYSA-L 0.000 description 2
- 239000001639 calcium acetate Substances 0.000 description 2
- 235000011092 calcium acetate Nutrition 0.000 description 2
- 229960005147 calcium acetate Drugs 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 229940117389 dichlorobenzene Drugs 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 2
- 235000005985 organic acids Nutrition 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 239000001632 sodium acetate Substances 0.000 description 2
- 235000017281 sodium acetate Nutrition 0.000 description 2
- 238000005292 vacuum distillation Methods 0.000 description 2
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 1
- 125000000229 (C1-C4)alkoxy group Chemical group 0.000 description 1
- MPPPKRYCTPRNTB-UHFFFAOYSA-N 1-bromobutane Chemical compound CCCCBr MPPPKRYCTPRNTB-UHFFFAOYSA-N 0.000 description 1
- CYNYIHKIEHGYOZ-UHFFFAOYSA-N 1-bromopropane Chemical compound CCCBr CYNYIHKIEHGYOZ-UHFFFAOYSA-N 0.000 description 1
- VFWCMGCRMGJXDK-UHFFFAOYSA-N 1-chlorobutane Chemical compound CCCCCl VFWCMGCRMGJXDK-UHFFFAOYSA-N 0.000 description 1
- 125000004066 1-hydroxyethyl group Chemical group [H]OC([H])([*])C([H])([H])[H] 0.000 description 1
- MEKOFIRRDATTAG-UHFFFAOYSA-N 2,2,5,8-tetramethyl-3,4-dihydrochromen-6-ol Chemical compound C1CC(C)(C)OC2=C1C(C)=C(O)C=C2C MEKOFIRRDATTAG-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-M 2-methylbenzenesulfonate Chemical compound CC1=CC=CC=C1S([O-])(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-M 0.000 description 1
- QOXOZONBQWIKDA-UHFFFAOYSA-N 3-hydroxypropyl Chemical group [CH2]CCO QOXOZONBQWIKDA-UHFFFAOYSA-N 0.000 description 1
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 235000010893 Bischofia javanica Nutrition 0.000 description 1
- 240000005220 Bischofia javanica Species 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Chemical class 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 150000004996 alkyl benzenes Chemical class 0.000 description 1
- 125000002490 anilino group Chemical class [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- RDHPKYGYEGBMSE-UHFFFAOYSA-N bromoethane Chemical compound CCBr RDHPKYGYEGBMSE-UHFFFAOYSA-N 0.000 description 1
- YHASWHZGWUONAO-UHFFFAOYSA-N butanoyl butanoate Chemical compound CCCC(=O)OC(=O)CCC YHASWHZGWUONAO-UHFFFAOYSA-N 0.000 description 1
- XOXVXYRAFRSTIM-UHFFFAOYSA-N butyl phenylmethanesulfonate Chemical compound CCCCOS(=O)(=O)CC1=CC=CC=C1 XOXVXYRAFRSTIM-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 150000008050 dialkyl sulfates Chemical class 0.000 description 1
- DENRZWYUOJLTMF-UHFFFAOYSA-N diethyl sulfate Chemical compound CCOS(=O)(=O)OCC DENRZWYUOJLTMF-UHFFFAOYSA-N 0.000 description 1
- 229940008406 diethyl sulfate Drugs 0.000 description 1
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 description 1
- 125000006222 dimethylaminomethyl group Chemical group [H]C([H])([H])N(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000005745 ethoxymethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])* 0.000 description 1
- VRZVPALEJCLXPR-UHFFFAOYSA-N ethyl 4-methylbenzenesulfonate Chemical compound CCOS(=O)(=O)C1=CC=C(C)C=C1 VRZVPALEJCLXPR-UHFFFAOYSA-N 0.000 description 1
- ANNNGOUEZBONHD-UHFFFAOYSA-N ethyl phenylmethanesulfonate Chemical compound CCOS(=O)(=O)CC1=CC=CC=C1 ANNNGOUEZBONHD-UHFFFAOYSA-N 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- HVTICUPFWKNHNG-UHFFFAOYSA-N iodoethane Chemical compound CCI HVTICUPFWKNHNG-UHFFFAOYSA-N 0.000 description 1
- 229940035429 isobutyl alcohol Drugs 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- VUQUOGPMUUJORT-UHFFFAOYSA-N methyl 4-methylbenzenesulfonate Chemical compound COS(=O)(=O)C1=CC=C(C)C=C1 VUQUOGPMUUJORT-UHFFFAOYSA-N 0.000 description 1
- 125000006533 methyl amino methyl group Chemical group [H]N(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- SNMVRZFUUCLYTO-UHFFFAOYSA-N n-propyl chloride Chemical compound CCCCl SNMVRZFUUCLYTO-UHFFFAOYSA-N 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229960004109 potassium acetate Drugs 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- BWILYWWHXDGKQA-UHFFFAOYSA-M potassium propanoate Chemical compound [K+].CCC([O-])=O BWILYWWHXDGKQA-UHFFFAOYSA-M 0.000 description 1
- 239000004331 potassium propionate Substances 0.000 description 1
- 235000010332 potassium propionate Nutrition 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- VPMPNXOWJXJXOQ-UHFFFAOYSA-N propan-2-yl phenylmethanesulfonate Chemical compound CC(C)OS(=O)(=O)CC1=CC=CC=C1 VPMPNXOWJXJXOQ-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- WYVAMUWZEOHJOQ-UHFFFAOYSA-N propionic anhydride Chemical compound CCC(=O)OC(=O)CC WYVAMUWZEOHJOQ-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- DTOFWENHXCPOJZ-UHFFFAOYSA-N propyl phenylmethanesulfonate Chemical compound CCCOS(=O)(=O)CC1=CC=CC=C1 DTOFWENHXCPOJZ-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229960004249 sodium acetate Drugs 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- JXKPEJDQGNYQSM-UHFFFAOYSA-M sodium propionate Chemical compound [Na+].CCC([O-])=O JXKPEJDQGNYQSM-UHFFFAOYSA-M 0.000 description 1
- 239000004324 sodium propionate Substances 0.000 description 1
- 235000010334 sodium propionate Nutrition 0.000 description 1
- 229960003212 sodium propionate Drugs 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【発明の詳細な説明】 産業上の利用分野 本発、明は、新規なシアニン系化合物に関する。[Detailed description of the invention] Industrial applications The present invention relates to a novel cyanine compound.
従来の技術及びその問題点
一従来、半導体レーザ用無機系記録媒体としては、テル
ルを主体とする材料を記録層とするものが大半を占めて
いる。然るに、テルル系材料には、有毒であること、耐
食性に乏しいこと、高価であること、高密度化が図れな
いこと等の難があり、このようなテルル系無機材料に替
わる有機性色素の開発が行なわれつつある。BACKGROUND TECHNOLOGY AND PROBLEMS 1 Conventionally, most inorganic recording media for semiconductor lasers have recording layers made of tellurium-based materials. However, tellurium-based materials have problems such as being toxic, having poor corrosion resistance, being expensive, and not being able to achieve high density.Therefore, there is a need to develop organic pigments to replace these tellurium-based inorganic materials. is being carried out.
記録媒体としての有機色素に要求される重要な特性は、
以下の通りである。The important properties required of organic dyes as recording media are:
It is as follows.
(1)700〜900nm付近の近赤外光を強く吸収し
、その熱エネルギーによって溶融、昇華、分解等の形状
変化を伴うものであること。(1) It must strongly absorb near-infrared light in the vicinity of 700 to 900 nm, and undergo shape changes such as melting, sublimation, and decomposition due to its thermal energy.
(2)再生時の信号検出のため、色素膜は光を強く反射
することが望ましいこと。(2) For signal detection during reproduction, it is desirable that the dye film strongly reflect light.
(3)記録層は湿式のコーティング法により形成される
ので、溶剤に対して良好な溶解性を有すること、。(3) Since the recording layer is formed by a wet coating method, it should have good solubility in solvents.
(4)記録後の形状安定性や保存性に優れ、再生光によ
る劣化がなく、実用的には10年以上の保存に耐えるも
のであること。(4) It should have excellent shape stability and storage stability after recording, be free from deterioration due to reproduction light, and practically be able to withstand storage for 10 years or more.
有機性色素は、上記無機材料に比し、低毒性であり、耐
食性に優れ、安価であり、高密度化を図れるという利点
を有するものの、上記(1)〜(4)の特性のうち、特
に上記(2)の特性を満足する有機性色素は未だ見い出
されていない。Compared to the above inorganic materials, organic dyes have the advantages of low toxicity, excellent corrosion resistance, low cost, and the ability to achieve high density, but among the above characteristics (1) to (4), An organic dye satisfying the property (2) above has not yet been found.
問題点を解決するための手段
本発明の一つの目的は、半導体レーザ用光デイスク記録
媒体の有機近赤外吸収色素として好適に使用され得るシ
アニン系化合物を提供することにある。Means for Solving the Problems One object of the present invention is to provide a cyanine compound that can be suitably used as an organic near-infrared absorbing dye in an optical disk recording medium for a semiconductor laser.
本発明の他の一つの目的は、半導体レーザ用光デイスク
記録媒体の有機近赤外吸収色素として要求される上記(
1)〜(4)の特性を備えたシアニン系化合物を提供す
ることにある。Another object of the present invention is to provide the above-mentioned (
An object of the present invention is to provide a cyanine compound having the properties 1) to (4).
本発、明の他の一つの目的は、テルル系無機材料に匹敵
する程の高い反射率を有するシアニン系化合物を提供す
ることにある。Another object of the present invention is to provide a cyanine-based compound having a reflectance as high as that of tellurium-based inorganic materials.
本発明の他の一つの目的は、溶剤溶解性にも極めて良好
なシアニン系化合物を提供することにある。Another object of the present invention is to provide a cyanine compound having extremely good solvent solubility.
本発明のシアニン系化合物は、文献未記載の新規化合物
であって、下記一般式(1)で表わされる。The cyanine compound of the present invention is a novel compound that has not been described in any literature, and is represented by the following general formula (1).
〔式中Xは−NR2R3基(ここでR2及びR3は、同
−又は異なって水素原子、低級アルキル基又はヒドロキ
シ低級アルキル基)又は低級アルコキシ基を示す。Yは
水素原子、
−NR,R5基(ここでR4及びR5は、同−又は、異
なって水素原子、低級アルキル基又はヒドロキシ低級ア
ルキル基)、低級アルキル基又は低級アルコキシ基を示
す。R1は置換基を有することのある低級アルキル基を
示す。Zは酸性残基を示す。但しYが水素原子である場
合、Xは低級アルコキシ基であってはならない。〕〕開
開昭59−85791公報に、本発明の化合物に類似す
る化合物として下記化学式で示される化合物(以下「化
合物A」という)が開示されている。[In the formula, X represents a -NR2R3 group (where R2 and R3 are the same or different and are a hydrogen atom, a lower alkyl group or a hydroxy lower alkyl group) or a lower alkoxy group. Y represents a hydrogen atom, a -NR, R5 group (where R4 and R5 are the same or different and are a hydrogen atom, a lower alkyl group or a hydroxy lower alkyl group), a lower alkyl group or a lower alkoxy group. R1 represents a lower alkyl group that may have a substituent. Z represents an acidic residue. However, when Y is a hydrogen atom, X must not be a lower alkoxy group. ]] JP-A-59-85791 discloses a compound represented by the following chemical formula (hereinafter referred to as "compound A") as a compound similar to the compound of the present invention.
しかしながら、化合物Aは溶剤溶解性が良好ではなく8
、また化合物Aを用いた色素膜は光反射率が低く、従っ
て化合物Aは半導体レーザ用光デイスク記録媒体の有機
近赤外吸収色素として好適に使用され得るものではない
。However, compound A does not have good solvent solubility.
Furthermore, a dye film using Compound A has a low light reflectance, and therefore Compound A cannot be suitably used as an organic near-infrared absorbing dye in an optical disk recording medium for a semiconductor laser.
上記一般式(1)において、X、YSR,、R2、R3
、R4、R5及びZで示される各基は、具体的にはそれ
ぞれ以下の通りである。In the above general formula (1), X, YSR,, R2, R3
, R4, R5 and Z are as follows.
低級アルキル基としては、例えばメチル、エチル、n−
プロピル、イソプロピル、n−ブチル、イソブチル、t
ert−ブチル基等の炭素数1〜4のアルキル基を例示
できる。Examples of lower alkyl groups include methyl, ethyl, n-
Propyl, isopropyl, n-butyl, isobutyl, t
Examples include alkyl groups having 1 to 4 carbon atoms such as ert-butyl group.
ヒドロキシ低級アルキル基としては、ヒドロキシメチル
、1−ヒドロキシエチル、2−ヒドロキジエチル、3−
ヒドロキシプロピル、4−ヒドロキシブチル、2−ヒド
ロキシ−2,2−ジメチルエチル、2−ヒドロキシ−1
−メチルエチル、3−ヒドロキシ−1−メチルプロピル
基等のヒドロキシ基が1個置換した炭素数1〜4の低級
アルキル基を例示できる。Examples of hydroxy lower alkyl groups include hydroxymethyl, 1-hydroxyethyl, 2-hydroxydiethyl, 3-
Hydroxypropyl, 4-hydroxybutyl, 2-hydroxy-2,2-dimethylethyl, 2-hydroxy-1
Examples include lower alkyl groups having 1 to 4 carbon atoms substituted with one hydroxy group such as -methylethyl and 3-hydroxy-1-methylpropyl groups.
低級アルコキシ基としては、メトキシ、エトキシ、n−
プロポキシ、イソプロポキシ、n−ブトキシ、tert
−ブトキシ基等の炭素数1〜4のアルコキシ基を例示で
きる。Lower alkoxy groups include methoxy, ethoxy, n-
propoxy, isopropoxy, n-butoxy, tert
Examples include alkoxy groups having 1 to 4 carbon atoms such as -butoxy group.
−NR2R3基及び−NR4R5基としては、アミノ、
N、N−ジメチルアミノ、N、N−ジエチルアミノ、N
−エチル−N−(2−ヒドロキシエチル)アミノ、N、
N−ビス(ヒドロキシメチル)アミノ、N、N−ビス(
ヒドロキシエチル)アミノ、N−メチル−N−エチルア
ミノ、N−メチル−N−n−プロピルアミノ、N−メチ
ル−N−n−ブチルアミノ基等を例示できる。-NR2R3 group and -NR4R5 group include amino,
N, N-dimethylamino, N, N-diethylamino, N
-ethyl-N-(2-hydroxyethyl)amino, N,
N-bis(hydroxymethyl)amino, N,N-bis(
Examples include hydroxyethyl)amino, N-methyl-N-ethylamino, N-methyl-Nn-propylamino, and N-methyl-Nn-butylamino groups.
置換基を有することのある低級アルキル基としては、前
記炭素数1〜4のアルキル基の他、メトキシメチル、エ
トキシメチル、2−メトキシエチル、2−ヒドロキシエ
チル、2−エトキシエチル、2− (n−ブトキシ)エ
チル、n−ブトキシメチル、−1(CH2) n SO
3Na (nは1〜4の整数である) 、−(CH2)
COONa (nは1〜4の整数である)、メチ
ルアミノメチル、ジメチルアミノメチル、アセトキシメ
チル、メトキシカルボニルメチル基等の置換基としてC
1−4アルコキシ基、水酸基、スルホン酸基、カルボキ
シ基’ (C1−4アルキル)アミノ基、アセトキシ
基及び(C1−4アルコキシ)カルボニル基からなる群
から選ばれた基を少なくとも1個有することのある炭素
数1〜4のアルキル基を例示できる。Examples of lower alkyl groups that may have a substituent include methoxymethyl, ethoxymethyl, 2-methoxyethyl, 2-hydroxyethyl, 2-ethoxyethyl, 2-(n -butoxy)ethyl, n-butoxymethyl, -1(CH2) n SO
3Na (n is an integer from 1 to 4), -(CH2)
COONa (n is an integer of 1 to 4), C as a substituent of methylaminomethyl, dimethylaminomethyl, acetoxymethyl, methoxycarbonylmethyl group, etc.
1-4 alkoxy group, hydroxyl group, sulfonic acid group, carboxy group' (C1-4 alkyl) amino group, acetoxy group and (C1-4 alkoxy) carbonyl group having at least one group. Examples include certain alkyl groups having 1 to 4 carbon atoms.
Zとしては、ハロゲン原子、アルキル硫酸塩残基、アリ
ールスルホン酸塩残基、バークロレート残基、テトラフ
ルオロボレート残基、アリールカルボン酸残基等を例示
できる。Zがハロゲン原子である場合、Z″″の具体例
としてはCQ−1Br−1I−1F−等を例示できる。Examples of Z include a halogen atom, an alkyl sulfate residue, an aryl sulfonate residue, a barchlorate residue, a tetrafluoroborate residue, an aryl carboxylic acid residue, and the like. When Z is a halogen atom, specific examples of Z″″ include CQ-1Br-1I-1F- and the like.
Zがアルキル硫酸塩残基である場合、Z−の具体例とし
てはCHa S 0a−1C2H5SO4−1n−C,
3R7SO4”、n−C4H95O4−等を例示できる
。Zがアリールスルホン酸塩残基でCH30S O3−
等を例示できる。Zがバークロレート残基である場合、
Z′″の具体例としてはCC04−等を例示できる。Z
がテトラフルオロボレート残基である場合、2″″の具
体例としてはBF4−等を例示できる。またZがアリー
ルカルボン酸残基である場合、Z′″の具体例としては
(Σcoo−等を例示できる。When Z is an alkyl sulfate residue, specific examples of Z- include CHa S 0a-1C2H5SO4-1n-C,
3R7SO4", n-C4H95O4-, etc. Z is an arylsulfonate residue and CH30S O3-
etc. can be exemplified. When Z is a barchlorate residue,
As a specific example of Z''', CC04- etc. can be given.Z
When is a tetrafluoroborate residue, specific examples of 2'' include BF4- and the like. When Z is an arylcarboxylic acid residue, specific examples of Z''' include (Σcoo-).
本発明の化合物の中でも、特にXが低級アルコキシ基、
Yが低級アルコキシ基、R1が低級アルキル基又は低級
アルコキシ低級アルキル基、Zがハロゲン原子又はバー
クロレート残基である化合物が好適である。またYはイ
ンドレニン環の6位又は7位、特に6位に置換している
化合物が好ましい。Among the compounds of the present invention, in particular, X is a lower alkoxy group,
Compounds in which Y is a lower alkoxy group, R1 is a lower alkyl group or a lower alkoxy-lower alkyl group, and Z is a halogen atom or a barchlorate residue are preferred. Further, Y is preferably a compound substituted at the 6-position or 7-position, particularly at the 6-position, of the indolenine ring.
上記−殺伐(1)で表わされる本発明の化合物は、種、
々の方法により製造され得るが、その好ましい方法を示
せば例えば下記に示す方法に従い容易に製造される。The compound of the present invention represented by the above-killing (1) is a species,
Although it can be produced by various methods, it can be easily produced according to the preferred method, for example, shown below.
即ち、本発明の化合物は、
〔式中X、YSR,及びZは前記に同じ。〕で表わされ
るインドレニウム塩に式
%式%(3)
で表わされる公知のβ−アニリノ−アクロレイン−アニ
ル塩酸塩を縮合反応させることにより製造される。That is, the compound of the present invention has the following formula: [wherein X, YSR, and Z are the same as above. It is produced by subjecting an indolenium salt represented by the formula % to a condensation reaction with a known β-anilino-acrolein-anil hydrochloride represented by the formula % (3).
上記縮合反応は、脂肪酸塩の存在下、脱水性有機酸中に
て行なわれる。脂肪酸塩としては、例えば酢酸ナトリウ
ム、酢酸カリウム、酢酸カルシウム、プロピオン酸ナト
リウム、プロピオン酸カリウム等、を挙げることができ
、これは一般式(2)の化合物1モル当り、通常0.
5〜3モル程度、好ましくは1〜2モル程度用いられる
。また脱水性有機酸としては、例えば無水酢酸、無水プ
ロピオン酸、無水酪酸、γ−ブチロラクトン等が挙げら
れる。斯かる脱水性有機酸は、一般式(2)の化合物1
モル当り、通常10〜100モル程度、好ましくは20
〜50モル程度用いられる。一般式(2)の化合物と一
般式(3)の化合物との使用割合は、通常前者に対して
後者を0.2〜1.5倍モル程度、好ましくは0.4〜
0.7倍モル程度とするのがよい。上記反応は、通常5
0〜150°C程度、好ましくは100〜140℃で好
適に進行し、一般に10〜60分程度で該反応は完結す
る。The above condensation reaction is carried out in a dehydrated organic acid in the presence of a fatty acid salt. Examples of fatty acid salts include sodium acetate, potassium acetate, calcium acetate, sodium propionate, potassium propionate, etc., which are usually used in an amount of 0.0000 per mole of the compound of general formula (2).
It is used in an amount of about 5 to 3 moles, preferably about 1 to 2 moles. Examples of dehydrating organic acids include acetic anhydride, propionic anhydride, butyric anhydride, and γ-butyrolactone. Such a dehydrating organic acid is compound 1 of general formula (2)
Per mole, usually about 10 to 100 moles, preferably 20
About 50 moles are used. The ratio of the compound of general formula (2) and the compound of general formula (3) to be used is usually about 0.2 to 1.5 times the former by mole, preferably 0.4 to 1.5 times the latter by mole.
It is preferable to set it to about 0.7 times the mole. The above reaction usually involves 5
The reaction proceeds suitably at about 0 to 150°C, preferably 100 to 140°C, and is generally completed in about 10 to 60 minutes.
上記一般式(2)のインドレニウム塩(一般式(2a)
及び一般式(2b)の化合物)は、文献未記載の新規化
合物を包含しており、該塩は例えば下記、に示す方法に
従い製造される。Indolenium salt of the above general formula (2) (general formula (2a)
and the compound of general formula (2b)) include novel compounds that have not been described in literature, and the salts thereof are produced, for example, according to the method shown below.
R1
(2a)
R1
R1
(2b)
〔式中21はバークロレート残基及びテトラフルオロボ
レート残基以外の酸性残基、Z2はバークロレート残基
又はテトラフルオロボレート残基を示す。X、Y及びR
1は前記に同じ。〕一般式(4)で表わされる公知のア
ニリン誘導体と式、(5)で表わされる公知の3−ブロ
モ−3−メチル−2−ブタノンとの反応は、脱酸剤の存
在下に行なわれる。脱酸剤としては、例えばピリジン、
トリエチルアミン、トリーn−プロピルアミン、トリー
n−ブチルアミン等の第3級アミン、炭酸ナトリウム、
炭酸カリウム、炭酸カルシウム等の炭酸アルカリ金属塩
、酢酸ナトリウム、酢酸カリウム、酢酸カルシウム等の
酢酸アルカリ金属塩等等が挙げられ、これらは一般式(
4)の化合物に対して通常0.3〜5倍モル程度、好ま
しくは0.5〜1.5倍モル程度用いられる。化合物(
4)と化合物(5)との使用割合としては、通常前者に
対して後者を0.3〜5倍モル量程度、好ましくは0.
5〜1.5倍モル量程度とするのがよい。該反応は、
通常常温〜200℃程度、好ましくは50〜150℃程
度で行なわれ、二股に数時間〜25時間程度、好ましく
は5〜15時間程度で完結する。R1 (2a) R1 R1 (2b) [In the formula, 21 represents an acidic residue other than a verchlorate residue or a tetrafluoroborate residue, and Z2 represents a verchlorate residue or a tetrafluoroborate residue. X, Y and R
1 is the same as above. ] The reaction between the known aniline derivative represented by the general formula (4) and the known 3-bromo-3-methyl-2-butanone represented by the formula (5) is carried out in the presence of a deoxidizing agent. Examples of deoxidizers include pyridine,
Tertiary amines such as triethylamine, tri-n-propylamine, tri-n-butylamine, sodium carbonate,
Examples include alkali metal carbonates such as potassium carbonate and calcium carbonate, alkali metal salts of acetate such as sodium acetate, potassium acetate, and calcium acetate, and these have the general formula (
It is usually used in an amount of about 0.3 to 5 times the mole, preferably about 0.5 to 1.5 times the mole of the compound (4). Compound(
The ratio of 4) and compound (5) to be used is usually about 0.3 to 5 times the molar amount of the latter to the former, preferably 0.3 to 5 times the molar amount of the latter.
The amount is preferably about 5 to 1.5 times the molar amount. The reaction is
It is usually carried out at room temperature to about 200°C, preferably about 50 to 150°C, and is completed in about several hours to about 25 hours, preferably about 5 to 15 hours.
一般1式(2a)で表わされる化合物は、一般式(6)
で表わされるインドレニン誘導体にアルキル化剤を作用
させることにより製造される。アルキル化剤としては、
例えばトルエンスルホン酸メチル、トルエンスルホン酸
エチル、トルエンスルホン酸n−プロピル、トルエンス
ルホン酸イソプロピル、トルエンスルホン酸n−ブチル
等のアルキルトルエンスルホネート、臭化エチル、臭化
n−プロピル、臭化n−ブチル、沃化エチル、コウカn
−プロピル、塩化n−プロピル、塩化n−ブチル等のハ
ロゲン化アルキル、ジメチル硫酸、ジエチル硫酸等の硫
酸ジアルキル、酸とエポキシ化合物との混合物(例えば
塩酸、硫酸等の無機酸や酢酸、プロピオン酸等の有機酸
等とエチレンオキサイド、プロピレンオキサイド等との
混合物)等が挙げられる。化合物(6)1モルに対する
アルキル化剤の使用量は、通常0.3〜5倍モル量程度
、好ましくは0.5〜2倍モル量程度とするのがよい、
。該反応は、無溶媒下又はトルエン、キシレン等のアル
キルベンゼン、n−オクタン、n−デカン、シクロヘキ
サン、デカリン等の脂肪族炭化水素類、ベンゼン、ナフ
タリン、テトラリン等の芳香族炭化水素類、トリクロル
エタン、テトラクロルエタン、クロルベンゼン、ジクロ
ルベンゼン等のハロゲン化炭化水素類等の溶媒中にて行
なわれる。該反応は、通常室温〜200℃程度、好まし
くは50〜150℃程度で行なわれ、一般に2〜30時
間程度、好ましくは3〜15時間程度で終了する。The compound represented by general formula 1 (2a) is represented by general formula (6)
It is produced by treating the indolenine derivative represented by the formula with an alkylating agent. As an alkylating agent,
For example, alkyltoluenesulfonates such as methyl toluenesulfonate, ethyl toluenesulfonate, n-propyl toluenesulfonate, isopropyl toluenesulfonate, n-butyl toluenesulfonate, ethyl bromide, n-propyl bromide, n-butyl bromide. , ethyl iodide, koka n
- Alkyl halides such as propyl, n-propyl chloride, n-butyl chloride, dialkyl sulfates such as dimethyl sulfate and diethyl sulfate, mixtures of acids and epoxy compounds (e.g. inorganic acids such as hydrochloric acid and sulfuric acid, acetic acid, propionic acid, etc.) (mixtures of organic acids, etc. with ethylene oxide, propylene oxide, etc.). The amount of alkylating agent used per 1 mole of compound (6) is usually about 0.3 to 5 times the molar amount, preferably about 0.5 to 2 times the molar amount.
. The reaction is carried out without a solvent or with alkylbenzenes such as toluene and xylene, aliphatic hydrocarbons such as n-octane, n-decane, cyclohexane, and decalin, aromatic hydrocarbons such as benzene, naphthalene, and tetralin, trichloroethane, It is carried out in a solvent such as halogenated hydrocarbons such as tetrachloroethane, chlorobenzene, dichlorobenzene, etc. The reaction is usually carried out at room temperature to about 200°C, preferably about 50 to 150°C, and is generally completed in about 2 to 30 hours, preferably about 3 to 15 hours.
一般式(7)で表わされる化合物は、化合物(2a)を
適当な溶媒、例えば水中にてアルカリで処理することに
より製造される。用いられるアルカリとしては、従来公
知のものをいずれも使用でき、例えば水酸化ナトリウム
、水酸化カリウム等が挙げられる。アルカリの使用量と
しては、化合物(2a)1モル当り、通常1〜20倍モ
ル量程度、4.好ましくは1〜5倍モル量程度とするの
がよい。また溶媒の使用量7としては、化合物(2a)
1モル当り、通常2〜100倍モル量程度、好ましくは
2〜20倍モル量程度とするのがよい。上記反応は、通
常0〜150℃程度、好ましくは0〜100℃程度で行
なわれ、一般に数十分〜10時間程度、好ましくは1〜
5時間程度で終了する。The compound represented by general formula (7) is produced by treating compound (2a) with an alkali in a suitable solvent, such as water. As the alkali to be used, any conventionally known alkali can be used, such as sodium hydroxide, potassium hydroxide, and the like. The amount of alkali to be used is usually about 1 to 20 times the molar amount per mole of compound (2a); 4. Preferably, the amount is about 1 to 5 times the molar amount. In addition, as the usage amount 7 of the solvent, compound (2a)
The amount per mole is usually about 2 to 100 times the molar amount, preferably about 2 to 20 times the molar amount. The above reaction is usually carried out at about 0 to 150°C, preferably about 0 to 100°C, and generally for about several tens of minutes to 10 hours, preferably about 1 to 100°C.
It will be completed in about 5 hours.
一般式(2b)で表わされる化合物は、化合物(7)に
一般式(8)で表わされる化合物をメタノール、エタノ
ール、n−プロピルアルコール、イソプロピルアルコー
ル、n−ブタノール、イソブチルアルコール、tert
−ブチルアルコール等のアルコール類、ベンゼン、トル
エン、キシレン、n−オクタン、n−デカン、シクロヘ
キサン、デカリン、トリクロルエタン、テトラクロルエ
タン、クロルベンゼン、ジクロルベンゼン等の炭化水素
類等の適当な溶媒中で反応させることにより製造される
。化合物(7)と化合物(8)との使用割合とし、では
、通常前者に対して後者を0.3〜10倍モル量程度、
好ましくは0.5〜3倍モル量程度とするのがよい。該
反応は、0〜70℃程度で行なわれ、一般に10分〜3
時間程度で完結する。The compound represented by the general formula (2b) is prepared by adding a compound represented by the general formula (8) to the compound (7) in methanol, ethanol, n-propyl alcohol, isopropyl alcohol, n-butanol, isobutyl alcohol, tert.
- In an appropriate solvent such as alcohols such as butyl alcohol, hydrocarbons such as benzene, toluene, xylene, n-octane, n-decane, cyclohexane, decalin, trichloroethane, tetrachloroethane, chlorobenzene, dichlorobenzene, etc. It is produced by reacting with The usage ratio of compound (7) and compound (8) is usually about 0.3 to 10 times the molar amount of the latter to the former.
Preferably, the amount is about 0.5 to 3 times the molar amount. The reaction is carried out at a temperature of about 0 to 70°C, and generally takes 10 minutes to 30 minutes.
It will be completed in about an hour.
斯くして得られる本発明の化合物は、慣用の単離精製手
段、例えば再結晶、カラム分離等により反応混合物から
容易に単離、精製される。The compound of the present invention thus obtained can be easily isolated and purified from the reaction mixture by conventional isolation and purification means, such as recrystallization and column separation.
発明の効果
上記一般式(1)で表わされる本発明の化合物は、メタ
ノール、エタノール、ジアセトンアルコール辱のアルコ
ール、ジクロルメタン、ジクロルエタン等の脂肪酸ハロ
ゲン化炭化水素等の有機溶剤に良好な溶解性を示し、6
70〜750nm!、:極大吸収波長があり、高いモル
吸光係数を有している。また、半導体レーザ用光デイス
ク記録媒体として用いる場合、再生レーザ光(780n
m)による光反射率が極めて高く、特に利用価値が高゛
いもの、である。Effects of the Invention The compound of the present invention represented by the above general formula (1) exhibits good solubility in organic solvents such as alcohols such as methanol, ethanol, diacetone alcohol, and fatty acid halogenated hydrocarbons such as dichloromethane and dichloroethane. ,6
70-750nm! , : Has a maximum absorption wavelength and has a high molar extinction coefficient. In addition, when used as an optical disk recording medium for semiconductor laser, reproduction laser light (780n
m) has an extremely high light reflectance and is of particularly high utility value.
実 施 例
以下に化合物(2)の製造例を参考例として掲げ、次に
本発明の化合物の製造例を掲げる。EXAMPLES Below, a production example of compound (2) is listed as a reference example, and then a production example of the compound of the present invention is listed.
参考例
2.4−ジメトキシアニリン15.36g、3−ブロモ
−3−メチル−2−ブタノン16.06g及びピリジン
8.0gの混合物を50〜55℃で5時間反応させ、更
に還流下7時間反応させた。Reference Example 2. A mixture of 15.36 g of 4-dimethoxyaniline, 16.06 g of 3-bromo-3-methyl-2-butanone, and 8.0 g of pyridine was reacted at 50 to 55°C for 5 hours, and further reacted under reflux for 7 hours. I let it happen.
反応終了後、水70m1に投入し、ジクロルメタン30
或で抽出し、溶媒を除去後、真空蒸留により2.3.3
−)ジメチル−5,7−シメトキシインドレニン12.
0gを得た。After the reaction is complete, pour into 70ml of water and add 30ml of dichloromethane.
After extraction and removal of the solvent, 2.3.3 is extracted by vacuum distillation.
-) dimethyl-5,7-simethoxyindolenine 12.
Obtained 0g.
沸点125−130℃/ 2〜3 mmHg上記で得ら
れた2、3.3−)ジメチル−5゜7−シメトキシイン
ドレニン10.96g、p−トルエンスルホン酸エチル
11.OOg及びトルエン60脱の混合物を還流下に8
時間反応させた。Boiling point 125-130°C/2-3 mmHg 10.96 g of 2,3.3-)dimethyl-5°7-simethoxyindolenine obtained above, ethyl p-toluenesulfonate 11. A mixture of 60 g of OOg and toluene was refluxed to 8
Allowed time to react.
反応路、了後、水50或で1−エチル−2,3,3−ト
リメチル−5,7−シメトキシインドレニウム・トルエ
ンスルホネートを抽出した。After the reaction was completed, 1-ethyl-2,3,3-trimethyl-5,7-simethoxyindolenium toluenesulfonate was extracted with 50 g of water.
この抽出液に20%NaOH20gを加え、70°Cで
3時間反応後、トルエン30w2で抽出した。トルエン
を留去後、真空蒸留により、1−エチル−2−メチレン
−3,3−ジメチル−5,7−シメトキシインドリン6
.00gを得た。20g of 20% NaOH was added to this extract, and after reacting at 70°C for 3 hours, the mixture was extracted with 30w2 of toluene. After distilling off toluene, 1-ethyl-2-methylene-3,3-dimethyl-5,7-simethoxyindoline 6 was obtained by vacuum distillation.
.. 00g was obtained.
沸点122−129℃/3〜4mmHg上記で得られた
1−エチル−2−メチレン−3゜3−ジメチル−5,7
−シメトキシインドリン4.95g及びイソプロパツー
ル60mQの混合物中へ、20℃以下で70%HCQO
a 2.87gを加えた。室温で1時間攪拌後、5℃以
下に冷却した。析出する結晶を炉別、洗浄後乾燥して、
1−エチル−2,3,3−)ジメチル−5,7−シメト
キシインドレニウム・バークロレート6.54gを得た
。Boiling point 122-129℃/3-4mmHg 1-ethyl-2-methylene-3゜3-dimethyl-5,7 obtained above
- 70% HCQO into a mixture of 4.95 g of cymethoxyindoline and 60 mQ of isopropanol at below 20°C.
a 2.87g was added. After stirring at room temperature for 1 hour, the mixture was cooled to below 5°C. The precipitated crystals are separated in a furnace, washed and dried,
6.54 g of 1-ethyl-2,3,3-)dimethyl-5,7-simethoxyindolenium verchlorate was obtained.
融0点225.5−226.5°C 製造例1 。Melting point 225.5-226.5°C Production example 1.
一般式(2)の化合物(X=N、N−ジメチルアミノ基
、Y=水素原子、R,=メチル基、Z″′=CQ04″
’)4.75g、β−アニリノ−アクロレイン−アニル
塩酸塩1.94g及び酢酸カリウム2.5gを無水酢酸
60IIII2に加え、10分間還流した後、水350
m12へ投入した。析出した結晶を炉別、水洗後、メタ
ノールで再結晶して、−殺伐(1)の化合物[X=N、
N−ジメチルアミノ基、Y=水素原子、R,=メチル基
、2−=CΩ04”’)3.44gを得た。この化合物
の融点、吸収最大波長(λmax )及びモル吸光係数
(ε)は以下の通りである。Compound of general formula (2) (X=N, N-dimethylamino group, Y=hydrogen atom, R,=methyl group, Z″′=CQ04″
') 4.75 g, β-anilino-acrolein-anil hydrochloride 1.94 g and potassium acetate 2.5 g were added to acetic anhydride 60III2, and after refluxing for 10 minutes, water 350 g
I put it into m12. The precipitated crystals were separated in a furnace, washed with water, and then recrystallized with methanol to form the compound of -Sakuhatsu (1) [X=N,
3.44 g of N-dimethylamino group, Y=hydrogen atom, R,=methyl group, 2-=CΩ04''') was obtained.The melting point, maximum absorption wavelength (λmax), and molar extinction coefficient (ε) of this compound were It is as follows.
融点:219−221℃
λmax : 732nm (ジアセトンアルコール)
ε: 2.30X105cl’
製造例2
一般0式(2)の化合物[X=N、N−ジメチルアミノ
基、Y=水素原子、R3=エチル基、Z−=C・QO4
’−34,96gを用い、製造例1と同様にして一般式
(1)の化合物[X=N、N−ジメチルアミノ基、Y−
水素原子、R,=エチル基、Z−=CQOa−]3.8
0gを得た。Melting point: 219-221°C λmax: 732nm (Diacetone alcohol)
ε: 2.30X105cl' Production Example 2 Compound of general formula (2) [X=N, N-dimethylamino group, Y=hydrogen atom, R3=ethyl group, Z-=C・QO4
'-34,96g, the compound of general formula (1) [X=N, N-dimethylamino group, Y-
Hydrogen atom, R,=ethyl group, Z-=CQOa-]3.8
Obtained 0g.
融点:195−200°C
λmax : 728nm (メタノール)ε: 2
. 34 X 105cm”
製造例3
一般式(2)の化合物(X=メトキシ基、Y=メトキシ
基(インドレニン環の7位、以下同じ)、R,=エチル
基、Z−テCQOa −〕5.22gを用い、製造例1
と同様にして一般式(1)の化合物(X=メトキシ基、
Y=メトキシ基(7位)、R,=エチル基、Z−=CQ
Oa−〕4.21gを得た。Melting point: 195-200°C λmax: 728nm (methanol) ε: 2
.. 34 x 105 cm" Production Example 3 Compound of general formula (2) (X = methoxy group, Y = methoxy group (7th position of indolenine ring, same hereinafter), R, = ethyl group, Z-teCQOa -]5. Production example 1 using 22g
Similarly, the compound of general formula (1) (X=methoxy group,
Y=methoxy group (7th position), R,=ethyl group, Z-=CQ
4.21 g of Oa-] was obtained.
融点: 250−252℃
λm躯: 693nm (ジアセトンアルコール)ε:
1.84 X 105am”
製造例4
一般式(2)の化合物(X=エトキシ基、Y=エトキシ
(7位)、R1=エチル基、2−=CQOA−3を用い
、製造例1と同様にして一般式(1)の化合物(X=エ
トキシ基、Y=エトキシ(7位)、RI=エチル基、Z
−=Ca04−3を得た。Melting point: 250-252℃ λm body: 693nm (Diacetone alcohol) ε:
1.84 The compound of general formula (1) (X = ethoxy group, Y = ethoxy (7th position), RI = ethyl group, Z
-=Ca04-3 was obtained.
λmax : 698nm (ジクロルメタン)ε:
1.72X105cm−1
適当な一般式(2)の化合物を用い、上記製造例1と同
様にして、製造例5〜22の化合物を得た。λmax: 698 nm (dichloromethane) ε:
1.72×10 5 cm −1 Compounds of Production Examples 5 to 22 were obtained in the same manner as in Production Example 1 above using an appropriate compound of general formula (2).
製造例5
一般式(1)の化合物[X=N、N−ジメチルアミノ基
、Y=メチル基(7位)、RI=メチル基、Z−=CQ
O4−)
λmax : 737nm (ジアセトンアルコール)
ε: 2.20XIO5cm”
製造例6
一般式(1)の化合物(X=N、N−ジメチルアミノ基
、Y=メトキシ基(7位)、R+=エチル基、Z−=C
Q’″〕
λwax : 747nm (ジアセトンアルコール)
E : 2.28X 105cm−’
製造例7
一般式(1)の化合物(X=N、N−ジエチルアミノ基
、Y−水素原子、R,=エチル基、Z−=C2Hs 8
04−)
λmax : 735nm (ジアセトンアルコール)
ε: 2.IOXIO5cm”
製造例8
一般式(1)の化合物[X=N−エチル−N−(2−ヒ
ドロキシエチル)アミノ基、Y=水素原子、R,=エチ
ル基、2−=
λmax : 735nm (ジアセトンアルコール
)ε: 2. 10XIO5c「1
製造例9
一般式(1)の化合物(X=メトキシ基、Y=メトキシ
基(6位)、R1=メトキシメチル基、λmax :
702nm (ジアセトンアルコール)ε: 1.60
X105cm−1
製造例1〇
一般式(1)の化合物(X=メトキシ基、Y=メチル基
(7位)、Rr=2−ヒドロキシエチル基、Z″″=C
QO4−)
λmax : 679nm (ジアセトンアルコール)
ε: 1.84 x 105cm−’
製造例11
一般式(1)の化合物(X=メトキシ基、Y=メチル基
(7位) 、R+ =2−メトキシエチル基1.z−=
cQo4−〕
λmax : 679nm (ジアセトンアルコール
)ε: 1.85X105cm−1
製造例12
一般式(1)の化合物(X=メトキシ基、Y=メチル基
(6位) 、R+ =n−プロピル基、Z−=I−3
λwax : 683nm (ジアセトンアルコール)
ε: 1. 74 x 105cm”
製造例13
一般式(1)の化合物(X=エトキシ基、Y=メチル基
(7位)、RI=エチル基、2−=BF4−)
λmax : 681 nm (ジクロルエタン)ε
: 1. 75X105cm”
製造例14
一般式(1)の化合物CX=n−プロポキシ基、Y=メ
チル基(7位)、R1=エチル基、Z−=CJO4−)
λmax : 683nm (ジアセトンアルコール)
ε: 1.63X105cm”
製造例15
一般式(1)の化合物[X=メトキシ基、Y=エチル基
(7位)、RI=エチル基、2−=CQO4−〕
λmax : 681nm (ジアセトンアルコール)
ε: 1.82X105cm”
製造例16
一般式(1)の化合物[X=メトキシ基、Y=イソプロ
ピル基(7位)、RI=メチル基、Z−=I−)
λmax : 681nm (ジアセトンアルコール
)ε: 1.62X105Cm”
製造例17
一般式(1)の化合物(X=メトキシ基、Y=メトキシ
基(6位) 、R1=n−ブチル基、Z−=1−)
λmax : 703nm (ジアセトンアルコール
)ε: 1.62X105cm−1
製造例18
一般式(1)の化合物(X=ニアミノ、Y=水素原子、
R1=1−F−ル基、Z−=CQOalλmax :
730nm (ジアセトンアルコール)E : 2.
30X 105cm−’製造例19
一般式(1)の化合物[X=N、N−ビス(ヒドロキシ
メチル)アミノ基、Y=水素原子、R,=エチル基、Z
′″二CQO4−〕λmax : 734nm (ジ
アセトンアルコール)ε : 2. 13x 1 O5
Cm”製造例2〇
一般式(1)の化合物[X=メトキシ基、Y=メトキシ
基(6位) 、R,=n−ブチル基、Z″’=CI20
4−:]
λmix : 699nm (ジクロロメタン)ε:
1.61X105cm−’
製造例21
一般式(1)の化合物(X=メトキシ基、Y=メトキシ
基(7位) 、R,=アセトキシエチル基、Z”’=C
QO4−)
λmax : 693nm (ジアセトンアルコール)
ε: 1.75X105cm−’
製造例22
一般式(1)の化合物(X=メトキシ基、Y=メトキシ
基(7位)、RI =メトキシエチル基、Z−=1−)
λmax : 695nm (ジアセトンアルコール
)ε : 1.80X105cm”
反射率測定試験
下記第1表に示す各種シアニン系色素をジクロルメタン
に20g/Qとなるように溶解し、これをアクリル板に
スピンコーターを用いて1500rpm、で、膜厚が6
00〜700人となるように塗布し、乾燥した。780
nmの波長における上記アクリル板の基板面側からの反
射率を測定した。Production Example 5 Compound of general formula (1) [X=N, N-dimethylamino group, Y=methyl group (7th position), RI=methyl group, Z-=CQ
O4-) λmax: 737 nm (Diacetone alcohol)
ε: 2.20XIO5cm" Production Example 6 Compound of general formula (1) (X=N, N-dimethylamino group, Y=methoxy group (7th position), R+=ethyl group, Z-=C
Q'''] λwax: 747nm (Diacetone alcohol)
E: 2.28X 105cm-' Production Example 7 Compound of general formula (1) (X=N, N-diethylamino group, Y-hydrogen atom, R,=ethyl group, Z-=C2Hs 8
04-) λmax: 735nm (Diacetone alcohol)
ε: 2. IOXIO5cm" Production Example 8 Compound of general formula (1) [X=N-ethyl-N-(2-hydroxyethyl)amino group, Y=hydrogen atom, R,=ethyl group, 2-=λmax: 735 nm (diacetone Alcohol) ε: 2. 10XIO5c"1 Production Example 9 Compound of general formula (1) (X = methoxy group, Y = methoxy group (6th position), R1 = methoxymethyl group, λmax:
702nm (Diacetone alcohol) ε: 1.60
X105cm-1 Production Example 1〇Compound of general formula (1) (X=methoxy group, Y=methyl group (7th position), Rr=2-hydroxyethyl group, Z″″=C
QO4-) λmax: 679nm (Diacetone alcohol)
ε: 1.84 x 105 cm-' Production Example 11 Compound of general formula (1) (X = methoxy group, Y = methyl group (7th position), R+ = 2-methoxyethyl group 1.z-=
cQo4-] λmax: 679 nm (Diacetone alcohol) ε: 1.85X105 cm-1 Production Example 12 Compound of general formula (1) (X = methoxy group, Y = methyl group (6th position), R+ = n-propyl group, Z-=I-3 λwax: 683nm (Diacetone alcohol)
ε: 1. 74 x 105 cm" Production Example 13 Compound of general formula (1) (X = ethoxy group, Y = methyl group (7th position), RI = ethyl group, 2- = BF4-) λmax: 681 nm (dichloroethane) ε
: 1. 75X105cm” Production Example 14 Compound of general formula (1) CX = n-propoxy group, Y = methyl group (7th position), R1 = ethyl group, Z- = CJO4-) λmax: 683 nm (Diacetone alcohol)
ε: 1.63X105cm" Production Example 15 Compound of general formula (1) [X = methoxy group, Y = ethyl group (7th position), RI = ethyl group, 2-=CQO4-] λmax: 681 nm (Diacetone alcohol)
ε: 1.82X105cm" Production Example 16 Compound of general formula (1) [X = methoxy group, Y = isopropyl group (7th position), RI = methyl group, Z- = I-) λmax: 681 nm (diacetone alcohol) ε: 1.62X105Cm" Production Example 17 Compound of general formula (1) (X = methoxy group, Y = methoxy group (6th position), R1 = n-butyl group, Z- = 1-) λmax: 703 nm (Diacetone Alcohol) ε: 1.62X105cm-1 Production Example 18 Compound of general formula (1) (X = Niamino, Y = Hydrogen atom,
R1=1-F-ru group, Z-=CQOalλmax:
730nm (Diacetone Alcohol) E: 2.
30X 105cm-' Production Example 19 Compound of general formula (1) [X=N, N-bis(hydroxymethyl)amino group, Y=hydrogen atom, R,=ethyl group, Z
'''2CQO4-]λmax: 734nm (Diacetone alcohol) ε: 2. 13x 1 O5
Cm" Production Example 20 Compound of general formula (1) [X = methoxy group, Y = methoxy group (6th position), R, = n-butyl group, Z"' = CI20
4-:] λmix: 699 nm (dichloromethane) ε:
1.61X105cm-' Production Example 21 Compound of general formula (1) (X = methoxy group, Y = methoxy group (7th position), R, = acetoxyethyl group, Z"' = C
QO4-) λmax: 693nm (Diacetone alcohol)
ε: 1.75X105 cm-' Production Example 22 Compound of general formula (1) (X = methoxy group, Y = methoxy group (7th position), RI = methoxyethyl group, Z- = 1-) λmax: 695 nm (Diacetone Alcohol) ε: 1.80 x 105 cm” Reflectance measurement test Various cyanine dyes shown in Table 1 below were dissolved in dichloromethane at a concentration of 20 g/Q, and coated on an acrylic plate at 1500 rpm using a spin coater. Thickness is 6
It was coated to give a coating of 0.00 to 700 people and dried. 780
The reflectance of the acrylic plate from the substrate surface side at a wavelength of nm was measured.
結果を下記第1表に示す。The results are shown in Table 1 below.
第1表
溶剤溶解性試験
下記第2表に示す各種シアニン系色素をメタノールに溶
解し、室温における溶解度を測定した。Table 1 Solvent Solubility Test Various cyanine dyes shown in Table 2 below were dissolved in methanol and their solubility at room temperature was measured.
結果を下記第2表に示す。The results are shown in Table 2 below.
第2表 (以 上)Table 2 (that's all)
Claims (1)
3は、同一又は異なって水素原子、低級アルキル基又は
ヒドロキシ低級アルキル基)又は低級アルコキシ基を示
す。Yは水素原子、−NR_4R_5基(ここでR_4
及びR_5は、同一又は異なって水素原子、低級アルキ
ル基又はヒドロキシ低級アルキル基)、低級アルキル基
又は低級アルコキシ基を示す。R_1は置換基を有する
ことのある低級アルキル基を示す。Zは酸性残基を示す
。但しYが水素原子である場合、Xは低級アルコキシ基
であってはならない。〕 で表わされるシアニン系化合物。(1) General formula ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ [In the formula, X is -NR_2R_3 group (here R_2 and R_
3 is the same or different and represents a hydrogen atom, a lower alkyl group, a hydroxy lower alkyl group) or a lower alkoxy group. Y is a hydrogen atom, -NR_4R_5 group (here R_4
and R_5 are the same or different and represent a hydrogen atom, a lower alkyl group or a hydroxy lower alkyl group), a lower alkyl group, or a lower alkoxy group. R_1 represents a lower alkyl group that may have a substituent. Z represents an acidic residue. However, when Y is a hydrogen atom, X must not be a lower alkoxy group. ] A cyanine compound represented by
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63196631A JPH01131277A (en) | 1987-08-07 | 1988-08-05 | Cyanine compound |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19890887 | 1987-08-07 | ||
JP62-198908 | 1987-08-07 | ||
JP63196631A JPH01131277A (en) | 1987-08-07 | 1988-08-05 | Cyanine compound |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01131277A true JPH01131277A (en) | 1989-05-24 |
Family
ID=26509877
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63196631A Pending JPH01131277A (en) | 1987-08-07 | 1988-08-05 | Cyanine compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01131277A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USRE39105E1 (en) | 1999-06-21 | 2006-05-23 | Yamamoto Chemicals, Inc. | Polymethine compounds, method of producing same, and use thereof |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6440388A (en) * | 1987-08-05 | 1989-02-10 | Taiyo Yuden Kk | Optical data recording medium for compact disc |
-
1988
- 1988-08-05 JP JP63196631A patent/JPH01131277A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6440388A (en) * | 1987-08-05 | 1989-02-10 | Taiyo Yuden Kk | Optical data recording medium for compact disc |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USRE39105E1 (en) | 1999-06-21 | 2006-05-23 | Yamamoto Chemicals, Inc. | Polymethine compounds, method of producing same, and use thereof |
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