JPH0113092B2 - - Google Patents

Info

Publication number
JPH0113092B2
JPH0113092B2 JP19054481A JP19054481A JPH0113092B2 JP H0113092 B2 JPH0113092 B2 JP H0113092B2 JP 19054481 A JP19054481 A JP 19054481A JP 19054481 A JP19054481 A JP 19054481A JP H0113092 B2 JPH0113092 B2 JP H0113092B2
Authority
JP
Japan
Prior art keywords
water
soluble
photoresist
diazo
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP19054481A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57146247A (en
Inventor
Shingo Watabe
Takeo Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP19054481A priority Critical patent/JPS57146247A/ja
Publication of JPS57146247A publication Critical patent/JPS57146247A/ja
Publication of JPH0113092B2 publication Critical patent/JPH0113092B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP19054481A 1981-11-30 1981-11-30 Water-soluble photoresist Granted JPS57146247A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19054481A JPS57146247A (en) 1981-11-30 1981-11-30 Water-soluble photoresist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19054481A JPS57146247A (en) 1981-11-30 1981-11-30 Water-soluble photoresist

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP13979880A Division JPS5765644A (en) 1980-10-08 1980-10-08 Forming method for pattern

Publications (2)

Publication Number Publication Date
JPS57146247A JPS57146247A (en) 1982-09-09
JPH0113092B2 true JPH0113092B2 (enrdf_load_stackoverflow) 1989-03-03

Family

ID=16259842

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19054481A Granted JPS57146247A (en) 1981-11-30 1981-11-30 Water-soluble photoresist

Country Status (1)

Country Link
JP (1) JPS57146247A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0363504A1 (en) * 1988-10-10 1990-04-18 Dräger Nederland B.V. Method of providing a substrate with a layer comprising a polyvinylbased hydrogel and a biochemically active material
KR980010618A (ko) * 1996-07-16 1998-04-30 손욱 포토레지스트 조성물

Also Published As

Publication number Publication date
JPS57146247A (en) 1982-09-09

Similar Documents

Publication Publication Date Title
US4506006A (en) Process for preparing relief images in imaged irradiated light-sensitive material having acid-cleavable compound by hot air treatment, overall irradiation and alkaline development
US3574617A (en) Novel photosensitive coating systems
US4340657A (en) Novel radiation-sensitive articles
GB2038801A (en) O-naphthoquinonediazides and their use in photosensitive compositions
DE1109521B (de) Lichtempfindliche Schichten fuer die Herstellung von Druckformen
DE1120273B (de) Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen
JPH038532B2 (enrdf_load_stackoverflow)
JPS6130253B2 (enrdf_load_stackoverflow)
GB2108986A (en) Photopolymerisable composition for producing screen printing stencils
JPS64687B2 (enrdf_load_stackoverflow)
US4526854A (en) Photoresist composition with water soluble bisazide and diazo compound
US4647519A (en) Negative-working photoresist method of making rear-projection television screen viewing surface
US4501806A (en) Method for forming pattern and photoresist used therein
US4491629A (en) Water soluble photoresist composition with bisazide, diazo, polymer and silane
KR910001866B1 (ko) 칼라수상관의 인광스크린 제조방법 및 그 감광성 내식막 조성물
JPH0113092B2 (enrdf_load_stackoverflow)
US4019907A (en) Photosensitive azido color-forming element
US5948592A (en) Water-soluble photoresist composition
EP0135234B1 (en) A negative-working photoresist composition for use on a polymethyl methacrylate surface
JP3507219B2 (ja) ネガ型レジスト組成物及びパターン形成方法
JP4259714B2 (ja) 感放射線性組成物用現像液
KR840004822A (ko) 칼라 음극선관용 감광막 조성물 및 흡광매트릭스 형성방법
US4735880A (en) Photosensitive composition and pattern forming process using same
US5173382A (en) Photosensitive composition containing water-soluble binder and aromatic diazonium chromate forming fluorescent screens employing same
JPS5979249A (ja) パタ−ン形成方法