JPH01125722A - Substrate driving device - Google Patents
Substrate driving deviceInfo
- Publication number
- JPH01125722A JPH01125722A JP62283260A JP28326087A JPH01125722A JP H01125722 A JPH01125722 A JP H01125722A JP 62283260 A JP62283260 A JP 62283260A JP 28326087 A JP28326087 A JP 28326087A JP H01125722 A JPH01125722 A JP H01125722A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- motor
- vacuum
- target
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 46
- 239000010409 thin film Substances 0.000 claims abstract description 13
- 239000010408 film Substances 0.000 abstract description 12
- 238000001704 evaporation Methods 0.000 abstract description 4
- 230000008020 evaporation Effects 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract description 3
- 230000032258 transport Effects 0.000 description 8
- 238000004544 sputter deposition Methods 0.000 description 6
- 238000000151 deposition Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、蒸着法、スパッタリングなどによシ、薄膜を
基板の表面に被着する真空薄膜形成装置に係り、特に、
薄膜を均一に被着するのに好適な基板駆動装置に関する
。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a vacuum thin film forming apparatus for depositing a thin film on the surface of a substrate by vapor deposition, sputtering, etc.
The present invention relates to a substrate driving device suitable for uniformly depositing a thin film.
従来、蒸着法あるいはスパッタリング法によシ、基板の
表面に薄ＰＩＸを被着する際、薄膜を均一にするために
基板を回転させる方法については、刊行物、「薄膜作成
の基礎（日刊工業新聞社９発行）１０９頁から１１１頁
」に論じられている。Conventionally, when depositing thin PIX on the surface of a substrate using evaporation or sputtering methods, the method of rotating the substrate to make the thin film uniform is described in the publication ``Fundamentals of Thin Film Creation (Nikkan Kogyo Shimbun)''. (Published by Publishing Company 9), pp. 109 to 111.
また、複数の真空室を持ち、基板を真空室から真空室へ
順次搬送して多層または単層の薄膜を能率良く形成する
蒸着装置、スパッタ装置が従来から知られている。Furthermore, evaporation apparatuses and sputtering apparatuses have been known that have a plurality of vacuum chambers and that efficiently form multilayer or single-layer thin films by sequentially transporting a substrate from one vacuum chamber to another.
上記従来技術では、真空容器の外部から動力全伝達して
真空容器内の基板を回転していた。この場合、真空容器
の壁の一部に回転軸？設けることとなり、インラインス
パッタ装置の工うに真空土間を基板を搬送する装置では
、基板を回転させるのけ困難であった。In the above-mentioned conventional technology, the entire power is transmitted from outside the vacuum container to rotate the substrate inside the vacuum container. In this case, is the rotating shaft part of the wall of the vacuum container? However, it was difficult to rotate the substrate using an in-line sputtering device that transports the substrate through a vacuum dirt floor.
本発明の目的は、基板を回転させながら移動させること
かできる真空薄膜形成装置を提供することにある。An object of the present invention is to provide a vacuum thin film forming apparatus that can move a substrate while rotating it.
Ｃ問題点を解決するための手段〕
上記目的は、基板を回転させるためのモータをよ
真空中で使用可能なものとし、かつ、上記基板お、びモ
ータを上記基板の回転軸に直角方向に移動させる機構と
、上記モータに電力を供給するための摺動面をもつ電極
（たとえばレール型電極）と。Means for Solving Problem C] The above object is to enable the motor for rotating the substrate to be used in a vacuum, and to rotate the substrate and the motor in a direction perpendicular to the axis of rotation of the substrate. a moving mechanism; and an electrode (for example, a rail-type electrode) having a sliding surface for supplying power to the motor.
それに接する摺動端子を真空容器内に設けることにより
、達成される。This is accomplished by providing a sliding terminal in contact with the vacuum vessel.
真空用モータは、真空外に出た時に冷却効果を高めるた
めにその内部または外部にファンを持つ構造とするのが
好ましい。It is preferable that the vacuum motor has a structure with a fan inside or outside to enhance the cooling effect when the vacuum motor is out of the vacuum.
なお、真空用モータとは、真空中でガスを発生しない材
料のみＫより製作し、真空中でもコイルの過熱が起こら
ないように工夫したモータのことであろう
〔作用〕
本発明では基板を回転させるモータを真空容器内に設け
ることにより、形成される薄膜の膜厚を均一にでき、ま
た、モータおよび基板の搬送により多数の基板に能率良
く薄膜を形成することができる。Incidentally, a vacuum motor is a motor that is manufactured only from K, a material that does not generate gas in a vacuum, and is devised so that the coil does not overheat even in a vacuum. [Function] In the present invention, the substrate is rotated. By providing the motor in the vacuum container, the thickness of the formed thin film can be made uniform, and thin films can be efficiently formed on a large number of substrates by transporting the motor and the substrates.
〔実施例〕
以下１本発明の一実施例を第１図〜第４図により説明す
る。本実施例は、以下に述べるインライン似スパッタ装
置に実施したものである。すなわち、真！２呈が少なく
とも低真空室、中真空室、高真ｇ！室の３呈を有し、か
つ、各室をしゃ断する扉を有するとともに、各室に亘っ
て基板搬送架台を移動するローラを有するものである。[Embodiment] An embodiment of the present invention will be described below with reference to FIGS. 1 to 4. This example was implemented in an in-line-like sputtering apparatus described below. In other words, true! 2. At least low vacuum chamber, medium vacuum chamber, high vacuum chamber! It has three chambers, has a door that shuts off each chamber, and has rollers that move the substrate transport stand across each chamber.
したがって、本装置は各室が真空状態のまま、基板搬送
架台を順次移動することが可能となっている。Therefore, in this apparatus, it is possible to sequentially move the substrate transport stand while each chamber remains in a vacuum state.
上記インライン型スパッタ装置の低真空室の搬送用ロー
ラ４上に基板搬送架台５を乗せたのち低真空室を密閉し
て真空度を一定値まで上げる。ついで、低真空室と中真
空室の間の扉を開きローラ４を駆動して基板搬送架台５
を中真空室へ移動し、さらに、中真空室と高真空室の間
の扉を開きｏ −ラ４′Ｉｋ駆動し、第２図に示す真９
室３内に移動する。After the substrate transport stand 5 is placed on the transport rollers 4 in the low vacuum chamber of the in-line sputtering apparatus, the low vacuum chamber is sealed and the degree of vacuum is raised to a certain value. Next, the door between the low vacuum chamber and the medium vacuum chamber is opened, and the roller 4 is driven to move the substrate transport stand 5.
Move the to the medium vacuum chamber, open the door between the medium vacuum chamber and the high vacuum chamber, drive the o-ra 4'Ik, and move the
Move to room 3.
引き続き基板搬送架台５をローラ４により矢印１４の方
向に一定速度で搬送し、ターゲット電極６に固定したタ
ーゲット７の衆面に生じているプラズマ中を通過させて
、ターゲット７を構成スる物質を基板１の弐面に被着す
る。この間、シャッタ８は開けたままにしておく。また
、この間、基板１は、モータ９および変速ギア１０．１
１により回転する。この時、架台５の搬送移動に伴うモ
ータ９への電力は、真空容器３内に設置した摺動面をも
つレール電極１２および摺動端子１３によシ供給される
。Subsequently, the substrate transport stand 5 is transported at a constant speed in the direction of the arrow 14 by the rollers 4, and the material constituting the target 7 is passed through the plasma generated on the entire surface of the target 7 fixed to the target electrode 6. It is attached to the second surface of the substrate 1. During this time, the shutter 8 is kept open. Also, during this time, the board 1 is connected to the motor 9 and the transmission gear 10.1.
1 rotates. At this time, electric power to the motor 9 accompanying the transport movement of the pedestal 5 is supplied by a rail electrode 12 having a sliding surface and a sliding terminal 13 installed inside the vacuum container 3.
電力供給は架台が真空容器外（あるいは基板を出し入れ
するロードロック呈）に出た時にも可能であるようにす
るのが好ましい。ここで用い几モータは、真空容器外に
出ｆｃ＃に効率良く冷却できるように内部にファンを持
つものとした。モータカバーの外部にファンを待つもの
でも差し支えない。ディスクはモータの軸に直接収り付
けてもよい。It is preferable that power can be supplied even when the pedestal is outside the vacuum container (or in a load lock mode for loading and unloading substrates). The motor used here had a fan inside so that it could be efficiently cooled to fc# outside the vacuum vessel. The fan may be placed outside the motor cover. The disc may also fit directly onto the shaft of the motor.
Ｖ−ルと摺動端子との代わりに低蒸気圧の液体導電体（
たとえば金属）と電極音用いてもよい。A low vapor pressure liquid conductor (
For example, metal) and electrode sounds may be used.
上記の方法で被層した膜の膜厚の測定例を第３図に示す
。直径１３０＋ｗの基板表面に被着した膜の膜厚は、裏
面内の変動幅が１７００±３０人でめる。第４図に、従
来の基板回転しない状態の膜厚分布を示す。裏面内の変
動幅は１２００〜１７００ 人である。以上のように本
発明により、真空度が低下することなく、基板を回転し
均一な膜を作製できる。FIG. 3 shows an example of measuring the thickness of a film coated by the above method. The thickness of the film deposited on the surface of the substrate having a diameter of 130+w has a variation range of 1700±30 people on the back surface. FIG. 4 shows the film thickness distribution in a conventional state where the substrate is not rotated. The range of variation within the back is 1200 to 1700 people. As described above, according to the present invention, a uniform film can be produced by rotating a substrate without reducing the degree of vacuum.
本発明によれば、基板を回転する動力源および電力を供
給する電極を真空容器内に設は基板を回転させるので、
ターゲットや蒸発源を小さくしても均一な膜が得られ、
装置の小型化、低価格化の効果が有る。また、基板を連
続的に搬送できるので薄膜形成の一１率が高い。According to the present invention, since the power source for rotating the substrate and the electrode for supplying electric power are provided in the vacuum container to rotate the substrate,
A uniform film can be obtained even if the target and evaporation source are made smaller.
This has the effect of reducing the size and cost of the device. Furthermore, since the substrate can be conveyed continuously, the rate of thin film formation is high.
本発明は光ディスク、磁気ディスク、光磁気ディスクな
どの記録媒体作製に特に有効であるが、他の用途にもも
ちろん有効である。The present invention is particularly effective for producing recording media such as optical disks, magnetic disks, and magneto-optical disks, but is of course also effective for other uses.
ｙｊＩＥ１図は本発明の一実施例の基板を回転するモー
タおよび電力を供給する電極を示す透視鳥諏図、第２図
は第１図の基板回転部を真空容器内に装着した状態を示
す側断面図、第３図は本発明の−実流側によシ被着した
膜の膜厚分布を示す図、第４図は従来の方法によシ被着
した膜の膜厚分布を示す図である。
１・・・基板、２・・・基板ホルダ、３・・・真空室、
４・・・ａ−ラ、５・・・基板搬送架台、６・・・ター
ゲット電極。
７・・・ターゲット、８・・・シャッタ、９・・・モー
タ、１０・・・変速ギア１．１１・・・変速ギア２．１
２・・・摺動電極、１３・・・摺動端子。
第１因yjIE1 Figure is a perspective view showing the motor that rotates the substrate and the electrodes that supply power according to an embodiment of the present invention, and Figure 2 is a side view showing the substrate rotating part of Figure 1 installed in a vacuum container. 3 is a diagram showing the film thickness distribution of the film deposited on the actual flow side according to the present invention, and FIG. 4 is a diagram showing the film thickness distribution of the film deposited on the conventional method. It is. 1... Substrate, 2... Substrate holder, 3... Vacuum chamber,
4... a-ra, 5... substrate transfer stand, 6... target electrode. 7... Target, 8... Shutter, 9... Motor, 10... Speed change gear 1.11... Speed change gear 2.1
2...Sliding electrode, 13...Sliding terminal. First cause
Claims (1)
において、上記の基板を回転させるためのモータを、真
空中で使用可能なものとし、かつ、上記基板およびモー
タを上記基板の回転軸に直角方向に移動させる機構と、
上記モータに電力を供給する摺動面を持つ電極を真空容
器内に設けたことを特徴とする基板駆動装置。1. In a vacuum thin film forming apparatus that forms a thin film on a substrate in vacuum, the motor for rotating the substrate can be used in vacuum, and the substrate and motor are connected to the rotation axis of the substrate. a mechanism that moves the body in a direction perpendicular to the
A substrate driving device characterized in that an electrode having a sliding surface for supplying electric power to the motor is provided in a vacuum container.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62283260A JPH01125722A (en) | 1987-11-11 | 1987-11-11 | Substrate driving device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62283260A JPH01125722A (en) | 1987-11-11 | 1987-11-11 | Substrate driving device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01125722A true JPH01125722A (en) | 1989-05-18 |
Family
ID=17663150
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62283260A Pending JPH01125722A (en) | 1987-11-11 | 1987-11-11 | Substrate driving device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01125722A (en) |
-
1987
- 1987-11-11 JP JP62283260A patent/JPH01125722A/en active Pending
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