JPH01123813A - Diluent for radiation-curable resin - Google Patents
Diluent for radiation-curable resinInfo
- Publication number
- JPH01123813A JPH01123813A JP28278387A JP28278387A JPH01123813A JP H01123813 A JPH01123813 A JP H01123813A JP 28278387 A JP28278387 A JP 28278387A JP 28278387 A JP28278387 A JP 28278387A JP H01123813 A JPH01123813 A JP H01123813A
- Authority
- JP
- Japan
- Prior art keywords
- diluent
- compound
- meth
- radiation
- acrylic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003085 diluting agent Substances 0.000 title claims abstract description 15
- 239000011347 resin Substances 0.000 title claims abstract description 15
- 229920005989 resin Polymers 0.000 title claims abstract description 15
- 150000001875 compounds Chemical class 0.000 claims abstract description 26
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims abstract description 9
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract description 11
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract description 8
- 239000002253 acid Substances 0.000 abstract description 5
- 239000003054 catalyst Substances 0.000 abstract description 4
- 239000011248 coating agent Substances 0.000 abstract description 4
- 238000000576 coating method Methods 0.000 abstract description 4
- 150000002440 hydroxy compounds Chemical class 0.000 abstract description 4
- 125000005907 alkyl ester group Chemical group 0.000 abstract description 3
- 239000003112 inhibitor Substances 0.000 abstract description 2
- 239000002904 solvent Substances 0.000 abstract description 2
- 125000004430 oxygen atom Chemical group O* 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 18
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 15
- 238000006243 chemical reaction Methods 0.000 description 15
- 238000001723 curing Methods 0.000 description 13
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- -1 nonylphenoxy Chemical group 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 238000007259 addition reaction Methods 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- DNNVYYADPRBILB-UHFFFAOYSA-N 2-[2-(2-hydroxyethoxy)ethoxy]ethanol;propane-1,2,3-triol Chemical compound OCC(O)CO.OCCOCCOCCO DNNVYYADPRBILB-UHFFFAOYSA-N 0.000 description 4
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 125000002947 alkylene group Chemical group 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000007127 saponification reaction Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 150000001252 acrylic acid derivatives Polymers 0.000 description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 3
- 229910052794 bromium Inorganic materials 0.000 description 3
- 125000004386 diacrylate group Chemical group 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- 238000005886 esterification reaction Methods 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 239000000600 sorbitol Substances 0.000 description 3
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 206010040880 Skin irritation Diseases 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 238000004587 chromatography analysis Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000032050 esterification Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 238000006386 neutralization reaction Methods 0.000 description 2
- 235000011007 phosphoric acid Nutrition 0.000 description 2
- 238000003847 radiation curing Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 230000036556 skin irritation Effects 0.000 description 2
- 231100000475 skin irritation Toxicity 0.000 description 2
- 238000005809 transesterification reaction Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- WHOZNOZYMBRCBL-OUKQBFOZSA-N (2E)-2-Tetradecenal Chemical compound CCCCCCCCCCC\C=C\C=O WHOZNOZYMBRCBL-OUKQBFOZSA-N 0.000 description 1
- CDMBUXRRDMFKBB-UHFFFAOYSA-N 2-(2-hydroxyethoxy)ethanol;oxolane Chemical compound C1CCOC1.OCCOCCO CDMBUXRRDMFKBB-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- RZVINYQDSSQUKO-UHFFFAOYSA-N 2-phenoxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC1=CC=CC=C1 RZVINYQDSSQUKO-UHFFFAOYSA-N 0.000 description 1
- LVGFPWDANALGOY-UHFFFAOYSA-N 8-methylnonyl prop-2-enoate Chemical compound CC(C)CCCCCCCOC(=O)C=C LVGFPWDANALGOY-UHFFFAOYSA-N 0.000 description 1
- 229940126062 Compound A Drugs 0.000 description 1
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 1
- 229930006000 Sucrose Natural products 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 230000036760 body temperature Effects 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229940105990 diglycerin Drugs 0.000 description 1
- GPLRAVKSCUXZTP-UHFFFAOYSA-N diglycerol Chemical compound OCC(O)COCC(O)CO GPLRAVKSCUXZTP-UHFFFAOYSA-N 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- MDYPDLBFDATSCF-UHFFFAOYSA-N nonyl prop-2-enoate Chemical compound CCCCCCCCCOC(=O)C=C MDYPDLBFDATSCF-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229940059574 pentaerithrityl Drugs 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229940044654 phenolsulfonic acid Drugs 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920001281 polyalkylene Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920005906 polyester polyol Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920005650 polypropylene glycol diacrylate Polymers 0.000 description 1
- ULWHHBHJGPPBCO-UHFFFAOYSA-N propane-1,1-diol Chemical compound CCC(O)O ULWHHBHJGPPBCO-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000012264 purified product Substances 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
Landscapes
- Macromonomer-Based Addition Polymer (AREA)
- Polymerisation Methods In General (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分Yf)
本発明は、オリゴマー類を含有する放射線硬化樹脂用稀
釈剤に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Yf) The present invention relates to a diluent for radiation-curable resins containing oligomers.
(従来の技術)
従来から放射線′硬化樹脂用稀釈剤として使用されてい
るアクリル酸エステル類には1例えばテトラヒドゴフル
フリルアクリレート、2−フェノキシエチルアクリレー
ト、ノニルフェノキシポリエトキシ化アクリレート、エ
チルセロソルブアクリレート、ノニルアクリレート、イ
ソデシルアクリレートなどのモノアクリレート類、1.
6−ヘキサンジオールジアクリレート、ポリエチレング
リコールジアクリレート、ポリプロピレングリコールジ
アクリレート、ビスフェノールAポリエトキシ化ジアク
リレートなどのジアクリレート類、トリメチロールプロ
パントリアクリレート、ペンタエリスリトールトリアク
リレート、トリメチロールプロパンポリプロポキシ化ト
リアクリレートなどのトリアクリレート類、ジペンタエ
リスリトールへキサアクリレートなどのマルチアクリレ
ート類が知られている。(Prior Art) Acrylic esters conventionally used as diluents for radiation-cured resins include, for example, tetrahydrogofurfuryl acrylate, 2-phenoxyethyl acrylate, nonylphenoxy polyethoxylated acrylate, ethyl cellosolve acrylate, Monoacrylates such as nonyl acrylate and isodecyl acrylate; 1.
Diacrylates such as 6-hexanediol diacrylate, polyethylene glycol diacrylate, polypropylene glycol diacrylate, bisphenol A polyethoxylated diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, trimethylolpropane polypropoxylated triacrylate, etc. Multiacrylates such as triacrylates and dipentaerythritol hexaacrylate are known.
(従来の技術の欠点)
従来から、放射線硬化樹脂用稀釈剤として使用されてい
るアクリル酸エステルにあっては、放射線硬化用稀釈剤
として必要な性能、即ち低粘度。(Disadvantages of the Prior Art) Acrylic esters conventionally used as diluents for radiation-curing resins have the performance required as a diluent for radiation-curing resins, that is, low viscosity.
低皮膚刺激株、硬化速度が早く硬化収縮が少ないなどの
性能を満足させ得るものは少なく、又実用レベルにて使
用し得る価格をも満足させるものも少ない。There are few products that can satisfy the performance requirements such as low skin irritation, fast curing speed, and little curing shrinkage, and there are also few products that can be used at a price that can be used on a practical level.
例えば、最も汎用的に使用され得るものとして、トリメ
チロールプロパントリアクリレートが知られている0本
化合物は低粘度、硬化速度の点では問題無いが、皮膚刺
激性が強く、又硬化速度6は早いものの硬化させた後の
樹脂は硬化収縮が大きく、硬化樹脂の伸びも少なく樹脂
の一成分として使用し得るものの、主要な原料とはなり
にくいという問題点があった。For example, trimethylolpropane triacrylate is known as the most widely used compound.Although this compound has low viscosity and no problems in terms of curing speed, it is highly irritating to the skin and has a fast curing speed of 6. The resin after curing has a large curing shrinkage, and the cured resin has little elongation, so although it can be used as a component of the resin, it has the problem that it is difficult to use as a main raw material.
(欠点を解決するための手段)
本発明は、このような従来の問題点に刃口してなされた
ものである。すなわち、ポリアルキレンエーテル構造の
硬化速度の早い点を利用し、その語導体につき鋭意検討
を加えた結果、
下記−・紋穴(1)で示され、かつ式中の(メタ)アク
リロイル基1個当りの分子量[(全分子M)/((メタ
)アクリロイル基個数)]が150〜360である化合
物[以下一般式(1)で示される化合物という]を必須
成分として含有することを特徴とする放射線硬化樹脂用
稀釈剤を提供するに至ったものである。(Means for Solving the Disadvantages) The present invention has been made to address these conventional problems. In other words, by taking advantage of the fast curing speed of the polyalkylene ether structure, and as a result of intensive study on its conductor, we found that: It is characterized by containing as an essential component a compound having a molecular weight [(total molecules M)/(number of (meth)acryloyl groups)] of 150 to 360 [hereinafter referred to as a compound represented by general formula (1)]. This has led to the provision of a diluent for radiation-cured resins.
・・・・ (1)
[手段を構成する要件]
本発明の放射線硬化樹脂用!tl訳剤として使用する一
般式(1)で示される化合物は、(多価)ヒドロキシ化
合物とアクリル酸又はアクリル酸低級アルキルエステル
とのエステル化反応又はエステル交換反応によって得ら
れる化合物で、かつ(メタ)アクリロイル基1個当りの
分子量[(全分子量)/((メタ)アクリロイル大側1
!!> ]が150〜360の化合物である。... (1) [Requirements constituting the means] For the radiation-curable resin of the present invention! The compound represented by the general formula (1) used as a tl translator is a compound obtained by an esterification reaction or transesterification reaction between a (polyhydric) hydroxy compound and acrylic acid or lower alkyl acrylic ester, and (meth) ) Molecular weight per acryloyl group [(total molecular weight)/((meth)acryloyl large side 1
! ! > ] is 150 to 360.
−・紋穴(1)で示される化合物の(メタ)アクリロイ
ル基1個当りの分子量[(全分子量)/((メタ)アク
リロイル基個数)]が150〜360の範囲にある場合
、硬化速度は実用使用レベルからの要求を充分満たすも
のであり、さらにその構造は塗膜物性の改良に大きく寄
与するものである。- If the molecular weight per (meth)acryloyl group [(total molecular weight)/(number of (meth)acryloyl groups)] of the compound represented by pattern hole (1) is in the range of 150 to 360, the curing speed is It sufficiently satisfies the requirements from a practical use level, and furthermore, its structure greatly contributes to improving the physical properties of the coating film.
エステル化又はエステル交換は公知の方法、すなわち酸
又は塩基触媒の存在下、共沸溶媒中、正合禁止剤含有条
件下で行い、その後触媒及び溶奴を除去するものである
。Esterification or transesterification is carried out by a known method, ie, in the presence of an acid or base catalyst, in an azeotropic solvent, under conditions containing a formalization inhibitor, and then the catalyst and molten core are removed.
前記(多価)ヒドロキシ化合物としては、例えば(多価
)アルコール、(多価)アルキルフェノール又はエチレ
ングリコールにエチレンオキサイドを付加反応させ、さ
らにプロピレンオキサイドを付加反応させて得た化合物
が挙げられる。Examples of the (polyhydric) hydroxy compound include compounds obtained by subjecting a (polyhydric) alcohol, (polyhydric) alkylphenol, or ethylene glycol to an addition reaction with ethylene oxide, and further with propylene oxide.
ココでいう(多価)アルコール又は(多価)フェノール
としては、メタノール、エタノール、イソプロピルアル
コール、フェノール、プロパンジオール、ブタンジオー
ル、ビスフェノールA、ネオペンチルグリコール、トリ
メチロールプロパン、グリセリン、トリメチロールエタ
ン、ペンタエリスリトール、ジペンタエリスリトール、
ジグリセリン、ンルビトール、シュークローズなどが挙
げられる。The (polyhydric) alcohols or (polyhydric) phenols mentioned here include methanol, ethanol, isopropyl alcohol, phenol, propanediol, butanediol, bisphenol A, neopentyl glycol, trimethylolpropane, glycerin, trimethylolethane, penta Erythritol, dipentaerythritol,
Examples include diglycerin, nrubitol, and sucrose.
また前記(多価)アルコール、(多価)アルキルフェノ
ール又はエチレングリコールに、エチレンオキサイド、
プロピレンオキサイドを付加させる場合、酸又は塩基性
触媒の存在下で常法に従って行なうものであるが、好ま
しくは分子量分布を狭くする為に、エチレンオキサイド
を付加反応させた後蒸留し純度を高めた後、プロピレン
オキサイドを付加反応させるものである。In addition, ethylene oxide,
When propylene oxide is added, it is carried out in the presence of an acid or basic catalyst according to a conventional method. Preferably, in order to narrow the molecular weight distribution, ethylene oxide is added and then distilled to increase purity. , propylene oxide is subjected to an addition reaction.
尚、本発明の一般式(1)で示される化合物の類似物質
として、下記の構造を有する化合物(以下化合物−イと
いう)が挙げられるが、この化合物−イと本発明の一般
式(1)で示される化合物との差異は、工業的製法の立
場からの純度、及び高純度物を得る為の難易度の茂異で
あり、本発明の一般式(1)で示される化合物が、それ
らの点で優れている。Incidentally, as a similar substance to the compound represented by the general formula (1) of the present invention, there may be mentioned a compound having the following structure (hereinafter referred to as compound-a). The difference from the compound represented by the general formula (1) of the present invention is the purity from the standpoint of industrial production method and the degree of difficulty in obtaining a highly purified product. Excellent in that respect.
・・・・ (イ)
即ち高純度であることは、より低分子量の副生物を含ま
ないことであり、一般に低分子fil(メタ)アクリル
酸エステルは皮膚刺激性が高いため、高純度になる程、
皮膚刺激性は低くなる。(a) In other words, high purity means that it does not contain by-products with lower molecular weight, and in general, low molecular weight fil (meth)acrylic acid esters are highly irritating to the skin, so high purity is required. Cheng,
Skin irritation is reduced.
特にアルキレンオキサイドの付加は逐次反応であり1分
子量分布を生じることは公知であり、多くの副生物がで
きやすい背景がある。In particular, it is known that the addition of alkylene oxide is a sequential reaction and produces a monomolecular weight distribution, and there is a background in which many by-products are likely to be produced.
一般に(メタ)アクリル酸エステル化後の化合物は不安
定であり、蒸留精製しにくいことにより中間体の段階で
蒸留精製し、純度を高めるのが普通である。In general, the compound after (meth)acrylic acid esterification is unstable and difficult to purify by distillation, so it is common to refine it by distillation at the intermediate stage to increase its purity.
但し本発明の一般式(1)で丞される化合物の場合、前
述の如くアルキレンオキサイドの付加であり、分子量分
布が広くなり、純度の向上は困難である。そこで、より
高純度化するために2段階のアルキレンオキサイドの付
加反応を行なうものであるが、1段付加の段階にて蒸留
精製することが得策である。However, in the case of the compound represented by the general formula (1) of the present invention, as mentioned above, it is an addition of alkylene oxide, and the molecular weight distribution becomes wide, making it difficult to improve the purity. Therefore, in order to achieve higher purity, a two-stage alkylene oxide addition reaction is carried out, but it is advisable to carry out distillation purification in the first addition stage.
以上を加味して本発明の一般式(1)で示される化合物
と化合物−イを比較してみると下記の事が言える。When the compound represented by the general formula (1) of the present invention is compared with Compound A in consideration of the above, the following can be said.
例えばROHにエチレンオキサイドを反応後、蒸留精製
し、そコテ得られるRo+CH2CH20+n−Hにプ
ロピレンオキサイドを反応させる、いわゆる本発明(7
)[料の場合、RO+ CHz CH20hm−HのO
Hは1級OHであり、さらにプロピレンオキサイドを反
応させて主としてできる
R′
■
R−0+ CH2(:R20チn−+C■2 (HO+
m−H(1) DHは2級OHであり、その反応性の差
異により、プロピレンオキサイド付加後のRO+CI
20H20+n−Hの残存は、プロピレンオキサイドを
1.15モル/ RO+ CH2−−CH20)+1−
81モル反応させることにより、殆ど雰となる。For example, the so-called present invention (7
) [In case of RO+ CHz CH20hm-H O
H is primary OH, and R' ■ R-0+ CH2 (:R20CHn-+C■2 (HO+
m-H(1) DH is a secondary OH, and due to the difference in its reactivity, RO+CI after addition of propylene oxide
The remaining 20H20+n-H is 1.15 mol of propylene oxide/RO+ CH2--CH20)+1-
By reacting 81 moles, almost all of the atmosphere is obtained.
ところが、RO)lにプロピレンオキサイドを反応させ
た後、エチレンオキサイドを反応させる化合物−イの原
料の場合、
プロピレンオキサイドを反応させてできるR ′
R1) + CH2G)10)m−Hを例え蒸留精製し
たとしてもR′
R−0+ CH2CHO+鵬−HのOHが2級OHであ
り、そのものにエチレンオキサイドを反応させてできる
R′
R−0÷CH2(:HO+m −+ cHz CH20
+n−H(1) OHは1級OHであり、アルキレンオ
キサイドの付加反応性は。However, in the case of the raw material for compound -i, in which RO)l is reacted with propylene oxide and then ethylene oxide, R'R1) + CH2G)10)m-H, which is produced by reacting propylene oxide, is distilled and purified by analogy. Even so, the OH of R' R-0+ CH2CHO + Peng-H is secondary OH, and R' R-0 ÷ CH2 (: HO + m − + cHz CH20
+n-H(1) OH is primary OH, and the addition reactivity of alkylene oxide is.
1級OH〉2級OHである事より、2段目のエチレンオ
キサイド反応後の残存
R′
R−0+ CH2CHOテ■−H量を零にする為には、
エチレンオキサイドが
R′
2.0モル/ R−0−f CH2CHO)鳳−H1モ
ルが必要であり、この場合、極めて分子量分布は広くな
ってしまうという欠点を有する。Since primary OH>secondary OH, in order to reduce the amount of R'R-0+ CH2CHOTE■-H remaining after the second stage ethylene oxide reaction to zero,
Ethylene oxide requires 2.0 moles of R'/1 mole of R-0-f CH2CHO), which has the disadvantage that the molecular weight distribution becomes extremely broad.
結果として、化合物−イは平均分子量が大となり、かつ
分子量分布も広く、放射線での硬化速度が遅くなり好ま
しくない。As a result, Compound-I has a large average molecular weight and a wide molecular weight distribution, which is undesirable because the curing speed with radiation is slow.
本発明に従う放射線硬化樹脂は、オリゴマー、稀釈剤(
稀釈モノマー)、各種添加剤1例えば、顔料、艶消し剤
、ワックス、必要ならば、光重合開始剤の配合からなり
、放射線として紫外線、電子線、プラズマ、X線、γ線
などの照射により、硬化するものであり、本発明稀釈剤
は、上記配合中の稀釈剤又は稀釈モノマーとして使用さ
れるものである。The radiation-curable resin according to the present invention includes oligomers, diluents (
diluent monomer), various additives 1, such as pigments, matting agents, wax, and if necessary, a photopolymerization initiator, and by irradiation with radiation such as ultraviolet rays, electron beams, plasma, X-rays, and γ-rays. The diluent of the present invention is used as a diluent or diluent monomer in the above formulation.
又、ここでいラオリゴマーとは、例えばウレタン反応に
よってできるウレタン(メタ)アクリレート、エポキシ
化合物と(メタ)アクリル酸又は活性水素含有(メタ)
アクリル酸エステルとの反応によってできるエポキシア
クリレート、ポリエステルポリオールとアクリル酸又は
アクリル酸低級アルキルエステルとの反応によってでき
るポリエステルアクリレート等であり1本発明化合物は
そのいずれとの組み合わせにおいても使用することがで
きる。In addition, the term oligomer used here refers to, for example, urethane (meth)acrylate produced by a urethane reaction, an epoxy compound and (meth)acrylic acid, or an active hydrogen-containing (meth)acrylate.
Epoxy acrylates produced by reaction with acrylic esters, polyester acrylates produced by reaction of polyester polyols with acrylic acid or acrylic acid lower alkyl esters, etc. The compound of the present invention can be used in combination with any of them.
(発明の効果)
本発明の一般式(1)で示される化合物は、放射線硬化
樹脂用祷釈剤として放射線硬化樹脂の−成分として用い
られるものであり、従来知られている本発明化合物の類
似化合物、例えばポリエチレンオキサイド付加物の(メ
タ)アクリル酸エステルと比較して実用使用上、硬化速
度が早く、かつ塗膜の硬化収縮が少なく、さらに塗膜物
性例えば硬化膜の伸びが著しく向上する等、優れた効果
を付与するものである。(Effects of the Invention) The compound represented by the general formula (1) of the present invention is used as a component of radiation-curable resins as a diluent for radiation-curable resins, and is similar to the conventionally known compounds of the present invention. Compared to compounds such as (meth)acrylic acid esters of polyethylene oxide adducts, in practical use, the curing speed is faster, the cure shrinkage of the coating film is less, and the physical properties of the coating film, such as the elongation of the cured film, are significantly improved. , which provides excellent effects.
(実施例)
以下に実施例を記すが1本発明は以下の実施例に限定さ
れるものではない。(Example) Examples will be described below, but the present invention is not limited to the following examples.
尚、実施例中、部及び%は、重量基準である。In the examples, parts and percentages are based on weight.
(合成例1)
2−ヒドロキシエチルフェニルエーテル276g(2m
o立)、ソヂウムメチラート(28%メタノール溶液
)Igを500m立容オートクレーブに入れ、80℃に
加熱し、50mmHgにて脱メタノールする0次いで1
30℃に加熱し、プロピレンオキサイド140 g (
2、41m o n )を徐々に添加し反応せしめる0
反応時の温度は135±5°Cに保つ、その際のオート
クレーブ圧力は。(Synthesis Example 1) 276 g (2 m
Place Ig of sodium methylate (28% methanol solution) in a 500 m cubic volume autoclave, heat to 80°C, and remove methanol at 50 mmHg.
Heat to 30°C and add 140 g of propylene oxide (
2,41 m o n ) was gradually added and reacted.
The temperature during the reaction was maintained at 135±5°C, and the autoclave pressure at that time was:
最高4 k g / Cm 2になる様にする。Set it to a maximum of 4kg/cm2.
反応後、正りん酸を用い、反応液を中和する。中和後の
反応液のP)1を6.5〜7.5・になる様に調整する
。中和に必要な正りん酸量は0.3gであった。ここに
得られた2−ヒドロキシエチルフェニルエーテルのプロ
ピレンオキサイド付加物の収量は416gであった。After the reaction, the reaction solution is neutralized using phosphoric acid. Adjust P)1 of the reaction solution after neutralization to 6.5 to 7.5. The amount of orthophosphoric acid required for neutralization was 0.3 g. The yield of the propylene oxide adduct of 2-hydroxyethylphenyl ether thus obtained was 416 g.
これをガスクロマトグラフ分析したところ、未反応2−
ヒドロキシエチルフェニルエーテルの残存は認められな
かった。When this was analyzed by gas chromatography, unreacted 2-
No residual hydroxyethylphenyl ether was observed.
又、ヒドロキシル価は270であった。Moreover, the hydroxyl value was 270.
次に得られた2−ヒドロキシエチルフェニルエーテルの
プロピレンオキサイド付加体208gを1文ガラスフラ
スコに入れ、さらにトルエン300g、p−)ルエンス
ルホン酸6g、ハイドロキノン0.5g、 メタクリル
酸103gを添加し、空気を吹き込みながら加熱反応せ
しめた。Next, 208 g of the obtained propylene oxide adduct of 2-hydroxyethyl phenyl ether was placed in a glass flask, and 300 g of toluene, 6 g of p-)luenesulfonic acid, 0.5 g of hydroquinone, and 103 g of methacrylic acid were added. The reaction was carried out by heating while blowing.
反応にて生じた水は系外に除去した。Water generated in the reaction was removed from the system.
反応温度は110〜120°Cで1反応終了時の脱水量
は18.6gであった。The reaction temperature was 110 to 120°C, and the amount of dehydrated water at the end of one reaction was 18.6 g.
反応後、アルカリ水洗、再度水洗後、上層のトルエン層
を分離し、トルエンを蒸留留去し、下記式で示される2
−ヒドロキシエチルフェニルエーテルのプロピレンオキ
サイド付属体メタクリル酸エステル235g (収率8
5%)を得た。After the reaction, after washing with alkaline water and washing again with water, the upper toluene layer was separated, and the toluene was distilled off to obtain 2, which is represented by the following formula.
- 235 g of propylene oxide adduct methacrylic acid ester of hydroxyethylphenyl ether (yield: 8
5%).
得られた化合物の粘度は15cp(25°C) であり
、ケン化価204であった。The obtained compound had a viscosity of 15 cp (25°C) and a saponification value of 204.
式
%式%)
ジエチレングリコール212g (2moJ1)用いる
以外は、合成例(1)と同様にしブチレンオキサイド3
37 g (4、68m o n )を、体温に付加反
応せしめた。その収量は547gであり、残存するジエ
チレングリコールはガスクロマトグラフ分析より、認め
られなかった。又、ヒドロキシル価は409であった。butylene oxide 3
37 g (4.68 m on) was added to body temperature. The yield was 547 g, and no residual diethylene glycol was detected by gas chromatographic analysis. Moreover, the hydroxyl value was 409.
次に得られたジエチレングリコール・ブチレンオキサイ
ド付加体274g、ベンゼン300g、フェノールスル
ホンM10g、ハイドロキノン0゜8g、アクリル酸1
80gを1文ガラスフラスコに入れ空気を吹き込みなが
ら反応温度80〜90℃にて反応させ、合成例(1)と
同様に精製し、下記式で示されるジエチレングリコール
・ブチレンオキサイド付加体争アクリル酸エステル33
6g(収量88%)を得た。Next, 274 g of the diethylene glycol/butylene oxide adduct obtained, 300 g of benzene, 10 g of phenolsulfone M, 0.8 g of hydroquinone, 1 g of acrylic acid.
80g was placed in a glass flask and reacted at a reaction temperature of 80-90°C while blowing air, and purified in the same manner as in Synthesis Example (1) to obtain diethylene glycol-butylene oxide adduct acrylic ester 33 shown by the following formula.
6 g (88% yield) was obtained.
得られた化合物の粘度は20cp(25℃)であり、ケ
ン化価293、臭素価83.5であった。The obtained compound had a viscosity of 20 cp (25°C), a saponification number of 293, and a bromine number of 83.5.
式
%式%
グリセリントリエチレングリコールエーテJしく才り密
蒸留品、純度99.0%)224g(1m。Formula % Formula % Glycerin triethylene glycol ether J Shikari distilled product, purity 99.0%) 224g (1m).
!;L)を用いる以外は合成例(1)と同様にし、プロ
ピレンオキサイド260g(3,6mo文)を徐々に付
加反応せしめた。その収量は483gであり、残存する
グリセリントリエチレングリコールはガスクロマトグラ
フ分析より認められなかった。又、ヒドロキシル価は3
48であった。! ;L) was carried out in the same manner as in Synthesis Example (1), and 260 g (3.6 mo) of propylene oxide was gradually subjected to an addition reaction. The yield was 483 g, and no residual glycerin triethylene glycol was detected by gas chromatographic analysis. Also, the hydroxyl value is 3
It was 48.
次に得られたグリセリン−トリエチレングリコールエー
テル・プロピレンオキサイド付加体300g、ベンゼン
300g、P−)ルエンスルホン酸10g、ハイドロキ
ノン1.0g、アクリル酸175gをl交ガラスフラス
コに入れ、同様に反応せしめた。Next, 300 g of the obtained glycerin-triethylene glycol ether propylene oxide adduct, 300 g of benzene, 10 g of P-)luenesulfonic acid, 1.0 g of hydroquinone, and 175 g of acrylic acid were placed in a glass flask and reacted in the same manner. .
合成例′(1)と同様に精製し、下記式で示されるグリ
セリントリエチレングリコールエーテルφプロピレンオ
キサイド付加体アクリル酸エステル340g (収率8
5%)を得た。Purified in the same manner as in Synthesis Example '(1), 340 g of glycerin triethylene glycol ether φ propylene oxide adduct acrylic ester represented by the following formula (yield: 8
5%).
得られた化合物の粘度は25cp (25°C)であり
、ケン化価261、臭素価74であった。The obtained compound had a viscosity of 25 cp (25°C), a saponification number of 261, and a bromine number of 74.
履 五 十 112 + 鳳 、 =
4.48(合成例4)
ンルビトール争ポリ(n=10)エチレングリコールエ
ーテル(未蒸留品、ヒドロキシル価541)311g
(0,5moJl)を用いる以外は合成例(1)と同様
にしプロピレンオキサイド244g (4,2moi)
を徐々に付加反応せしめた。その収量は552gであっ
た。またソルビトールφポリ(n= 10)エチレング
リコールエーテルプロピレンオキサイド付加体のヒドロ
キシル価は303であった。Fifty 112 + Otori, =
4.48 (Synthesis Example 4) Nrubitol poly(n=10) ethylene glycol ether (undistilled product, hydroxyl value 541) 311 g
Propylene oxide 244g (4.2moi) was prepared in the same manner as in Synthesis Example (1) except for using (0.5moJl).
were subjected to gradual addition reactions. The yield was 552g. Further, the hydroxyl value of the sorbitol φ poly(n=10) ethylene glycol ether propylene oxide adduct was 303.
次に(りられたソルビトール会ポリ(n=10)エチレ
ングリコールエーテルプロピレンオキサイド付加体33
3g、ベンゼン300g、フェノールスルホン酸log
、ハイドロキノン2g、アクリル酸168gを1文ガラ
スフラスコに入れ、同様に反応せしめた。Next, (sorbitol-based poly(n=10) ethylene glycol ether propylene oxide adduct 33
3g, benzene 300g, phenolsulfonic acid log
, 2 g of hydroquinone, and 168 g of acrylic acid were placed in a glass flask and reacted in the same manner.
合成例(1)と同様に精製し、下記式で示されるソルビ
トール・ポリ(n= l O)エチレングリコールエー
テルプロピレンオキサイド付加体アクリル酸エステル3
57g (収率83%)を得た。Sorbitol poly(n=lO) ethylene glycol ether propylene oxide adduct acrylic ester 3 was purified in the same manner as in Synthesis Example (1) and shown by the following formula.
57 g (yield: 83%) was obtained.
得られた化合物の粘度は35cp(25°C)であり、
ケン化価234、臭素価66.5であった。The viscosity of the obtained compound was 35 cp (25 °C),
The saponification number was 234 and the bromine number was 66.5.
式
%式%
履 1 +m 2 +m s
=8.4(実施例1〜5)
合成例1〜4にて合成した(メタ)アクリル酸エステル
を第1表に示す処決にて塗料をつくり、放射&a硬化を
行なった。Formula % Formula % 1 + m 2 + m s
=8.4 (Examples 1 to 5) Paints were prepared from the (meth)acrylic acid esters synthesized in Synthesis Examples 1 to 4 according to the treatments shown in Table 1, and radiation & a curing was performed.
その硬化速度、硬化物の物性を第1表に示す。Table 1 shows the curing speed and physical properties of the cured product.
実施例(1)と比較例(1)、実施例(2)と比較例(
2)とは構造上類似しており、対比から明らかなように
、本発明物質は硬化速度が早く、硬化物の伸びも良好で
あることが認められる。Example (1) and Comparative Example (1), Example (2) and Comparative Example (
It is structurally similar to 2), and as is clear from the comparison, it is recognized that the material of the present invention has a fast curing speed and good elongation of the cured product.
Claims (1)
ロイル基1個当りの分子量[(全分子量)/((メタ)
アクリロイル基個数)]が150〜360である化合物
を必須成分として含有することを特徴とする放射線硬化
樹脂用稀釈剤。 ▲数式、化学式、表等があります▼・・・・(1) 〔式中、Rは−O−又は▲数式、化学式、表等がありま
す▼である。▲数式、化学式、表等があります▼におい
てR_1は炭素数1〜20の炭化水素基であり、OはR
_1を構成する炭素とエーテル結合する酸素を意味し、
qは1〜8の数で、かつpと対応する数である。nは1
〜3の数、mは1〜3の数、pは1〜8の数である。R
′はCH_3又はC_2H_5であり、R″はH又はC
H_3である。〕[Scope of Claims] Molecular weight per (meth)acryloyl group represented by the following general formula (1) [(total molecular weight)/((meth)
A diluent for radiation-curable resins, which contains as an essential component a compound having an acryloyl group number of 150 to 360. ▲There are mathematical formulas, chemical formulas, tables, etc.▼...(1) [In the formula, R is -O- or ▲There are mathematical formulas, chemical formulas, tables, etc.▼. ▲There are mathematical formulas, chemical formulas, tables, etc.▼, R_1 is a hydrocarbon group having 1 to 20 carbon atoms, and O is R
means the oxygen that forms an ether bond with the carbon that constitutes _1,
q is a number from 1 to 8 and corresponds to p. n is 1
-3, m is a number from 1 to 3, and p is a number from 1 to 8. R
' is CH_3 or C_2H_5, R″ is H or C
It is H_3. ]
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28278387A JPH0730139B2 (en) | 1987-11-09 | 1987-11-09 | Radiation curing resin diluent |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28278387A JPH0730139B2 (en) | 1987-11-09 | 1987-11-09 | Radiation curing resin diluent |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01123813A true JPH01123813A (en) | 1989-05-16 |
JPH0730139B2 JPH0730139B2 (en) | 1995-04-05 |
Family
ID=17657024
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP28278387A Expired - Fee Related JPH0730139B2 (en) | 1987-11-09 | 1987-11-09 | Radiation curing resin diluent |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0730139B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001010920A1 (en) * | 1999-08-06 | 2001-02-15 | Kao Corporation | Process for producing (meth)acrylic acid polymer |
WO2001014438A1 (en) | 1999-08-23 | 2001-03-01 | Kao Corporation | Process for the production of (meth)acrylic polymers |
-
1987
- 1987-11-09 JP JP28278387A patent/JPH0730139B2/en not_active Expired - Fee Related
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001010920A1 (en) * | 1999-08-06 | 2001-02-15 | Kao Corporation | Process for producing (meth)acrylic acid polymer |
WO2001014438A1 (en) | 1999-08-23 | 2001-03-01 | Kao Corporation | Process for the production of (meth)acrylic polymers |
US6673885B1 (en) | 1999-08-23 | 2004-01-06 | Kao Corporation | Process for the production of (meth)acrylic polymers |
JP4137445B2 (en) * | 1999-08-23 | 2008-08-20 | 花王株式会社 | Method for producing (meth) acrylic acid polymer |
Also Published As
Publication number | Publication date |
---|---|
JPH0730139B2 (en) | 1995-04-05 |
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