JPH01119064U - - Google Patents
Info
- Publication number
- JPH01119064U JPH01119064U JP1121788U JP1121788U JPH01119064U JP H01119064 U JPH01119064 U JP H01119064U JP 1121788 U JP1121788 U JP 1121788U JP 1121788 U JP1121788 U JP 1121788U JP H01119064 U JPH01119064 U JP H01119064U
- Authority
- JP
- Japan
- Prior art keywords
- molecular beam
- substrate
- beam source
- opening
- crystal growth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 4
- 239000013078 crystal Substances 0.000 claims description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Description
第1図は本考案の1具体例の分子線結晶成長装
置の概念図である。
1:成長室、2:液体窒素シユラウド、3:基
板、4:マニピユレータ、5:分子線源、6:シ
ヤツター、7:遮蔽板。
FIG. 1 is a conceptual diagram of a molecular beam crystal growth apparatus as a specific example of the present invention. 1: growth chamber, 2: liquid nitrogen shroud, 3: substrate, 4: manipulator, 5: molecular beam source, 6: shutter, 7: shielding plate.
Claims (1)
する分子線源と、分子線源の前方に設けたシヤツ
ターとを有する分子線結晶成長装置において、基
板に向かう分子線束用の開口を有する遮蔽板を成
長室のシユラウドに結合し、該開口上にシヤツタ
ーを移動することにより、分子線源からの蒸気を
完全に遮断するようにしたことを特徴とする分子
線結晶成長装置。 A shield having an opening for a molecular beam directed toward the substrate in a molecular beam crystal growth apparatus having a growth chamber containing a substrate, a molecular beam source disposed facing the substrate, and a shutter provided in front of the molecular beam source. 1. A molecular beam crystal growth apparatus characterized in that a plate is connected to a shroud of a growth chamber and a shutter is moved above the opening to completely shut off vapor from a molecular beam source.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1121788U JPH01119064U (en) | 1988-02-01 | 1988-02-01 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1121788U JPH01119064U (en) | 1988-02-01 | 1988-02-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01119064U true JPH01119064U (en) | 1989-08-11 |
Family
ID=31219576
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1121788U Pending JPH01119064U (en) | 1988-02-01 | 1988-02-01 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01119064U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01239085A (en) * | 1988-03-18 | 1989-09-25 | Fujitsu Ltd | Gas source mbe apparatus |
-
1988
- 1988-02-01 JP JP1121788U patent/JPH01119064U/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01239085A (en) * | 1988-03-18 | 1989-09-25 | Fujitsu Ltd | Gas source mbe apparatus |
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