JPH0111728Y2 - - Google Patents
Info
- Publication number
- JPH0111728Y2 JPH0111728Y2 JP13470586U JP13470586U JPH0111728Y2 JP H0111728 Y2 JPH0111728 Y2 JP H0111728Y2 JP 13470586 U JP13470586 U JP 13470586U JP 13470586 U JP13470586 U JP 13470586U JP H0111728 Y2 JPH0111728 Y2 JP H0111728Y2
- Authority
- JP
- Japan
- Prior art keywords
- plated
- plating liquid
- mounting body
- plating
- suction pipe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007747 plating Methods 0.000 claims description 44
- 239000007788 liquid Substances 0.000 claims description 29
- 238000009713 electroplating Methods 0.000 claims description 6
- 239000004020 conductor Substances 0.000 claims description 3
- 230000000694 effects Effects 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 229910001369 Brass Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
Landscapes
- Electroplating Methods And Accessories (AREA)
Description
【考案の詳細な説明】
(産業上の利用分野)
本考案はメツキ液を吸引循環させる機構を備え
た電気メツキ装置に関する。[Detailed Description of the Invention] (Industrial Application Field) The present invention relates to an electroplating device equipped with a mechanism for sucking and circulating plating liquid.
(従来の技術及び考案が解決しようとする問題
点)
従来の電気メツキ装置においては、被メツキ物
を支持するために特別な治具を必要とし、また治
具による被メツキ物の固定作業は大変面倒なもの
であつた。(Problems to be solved by conventional techniques and ideas) Conventional electroplating equipment requires a special jig to support the object to be plated, and the work of fixing the object to be plated using the jig is difficult. It was a hassle.
その上、被メツキ物が治具から脱落する虞れが
あり、かゝる場合にはメツキ不良品となる不具合
があつた。 In addition, there is a risk that the plated object may fall off the jig, and in such a case, there is a problem that the plated product will be defective.
更に、メツキ液組成を均一ならしめるため従来
はメツキ液の撹拌を行なつていたが、均一化のた
めには未だ不充分であつた。 Furthermore, in order to make the composition of the plating solution uniform, stirring of the plating solution has conventionally been carried out, but this is still insufficient to achieve uniformity.
本考案は上記の点に鑑みなされたもので、被メ
ツキ物の保持が容易で且つメツキ液組成の均一化
を図ることができる電気メツキ装置を提供するこ
とを目的とする。 The present invention has been developed in view of the above points, and an object of the present invention is to provide an electroplating device that can easily hold objects to be plated and can uniformize the composition of the plating solution.
(問題点を解決するための手段)
本考案の電気メツキ装置は、吸引パイプよりメ
ツキ槽内のメツキ液を吸引し、この吸引したメツ
キ液を再びメツキ槽内に供給してメツキ液を循環
させるメツキ液循環機構と、被メツキ物を載置で
きるように構成され、その底部が吸引パイプの先
端開口部に臨むように設けられると共に該底部に
多数の貫通孔が設けられてなる被メツキ物載置体
と、該載置体を支持する支持機構と、上記載置体
を陰極に接続し、該載置体の上方に対向して設け
た電極板を陽極に接続してなる通電機構とから構
成されることを特徴とするものである。(Means for solving the problem) The electroplating device of the present invention sucks the plating liquid in the plating tank through the suction pipe, and supplies the sucked plating liquid into the plating tank again to circulate the plating liquid. The plating liquid circulation mechanism and the object to be plated are configured to be able to place the object to be plated, and the bottom thereof faces the opening at the tip of the suction pipe, and the bottom is provided with a number of through holes. A mounting body, a support mechanism for supporting the mounting body, and an energizing mechanism configured by connecting the mounting body to a cathode and connecting an electrode plate facing above the mounting body to an anode. It is characterized by being configured.
(実施例)
第1図において1はメツキ槽、2はメツキ液循
環槽で、それらは接続パイプ3を介して相互に連
通している。メツキ槽1内にはメツキ液4が入れ
られると共に、このメツキ液4を吸引するための
吸引パイプ5が設置される。吸引パイプ5の一端
はメツキ槽1内に位置し、その後端には上方に向
つて拡がつた膨径部6が形成され、また吸引パイ
プ5の他端はメツキ液循環槽2上に設けた吸引パ
イプ7に連結されている。8はモーターである。(Example) In FIG. 1, 1 is a plating tank, 2 is a plating liquid circulation tank, and they communicate with each other via a connecting pipe 3. A plating liquid 4 is placed in the plating tank 1, and a suction pipe 5 for sucking the plating liquid 4 is installed. One end of the suction pipe 5 is located within the plating tank 1, and a bulging portion 6 expanding upward is formed at the rear end, and the other end of the suction pipe 5 is provided above the plating liquid circulation tank 2. It is connected to a suction pipe 7. 8 is a motor.
更に吸引パイプ7には送出パイプ9が連結さ
れ、該パイプ9の先端部はメツキ液循環槽2内に
位置して臨んでいる。 Further, a delivery pipe 9 is connected to the suction pipe 7, and the tip of the pipe 9 is located in and facing the plating liquid circulation tank 2.
吸引パイプ7の駆動により、メツキ槽1内のメ
ツキ液は吸引パイプ5の先端開口部5aより吸引
され、吸引パイプ5内を通り、更に送出パイプ9
を経てメツキ液循環槽2内に送出される。該循環
槽2内に送出されたメツキ液は接続パイプ3を通
つて再びメツキ槽1内に流れ込み、このようにし
てメツキ液は吸引循環されて均一な液組成が保持
できるようにされている。 By driving the suction pipe 7, the plating liquid in the plating tank 1 is sucked through the opening 5a at the tip of the suction pipe 5, passes through the suction pipe 5, and then passes through the delivery pipe 9.
The plating liquid is then sent into the plating liquid circulation tank 2. The plating liquid sent into the circulation tank 2 flows into the plating tank 1 again through the connecting pipe 3, and in this way, the plating liquid is suctioned and circulated to maintain a uniform liquid composition.
吸引パイプ5及び送出パイプ9は例えば塩化ビ
ニル樹脂等の合成樹脂から構成される。 The suction pipe 5 and the delivery pipe 9 are made of synthetic resin such as vinyl chloride resin.
10は被メツキ物を載置する被メツキ物載置体
で、通常は第4図に示すように籠状に構成され
る。上記載置体10の底部には多数の貫通孔11
が設けられるが、この貫通孔11を有する載置体
底部は、金属板に小孔を穿設したものでも或いは
金網でもよい。貫通孔11の大きさは被メツキ物
の大きさにより適宜変更できる。 Reference numeral 10 denotes an object mounting body on which an object to be plated is placed, and is usually constructed in the shape of a basket as shown in FIG. A large number of through holes 11 are provided at the bottom of the mounting body 10.
However, the bottom of the mounting body having the through hole 11 may be a metal plate with small holes or a wire mesh. The size of the through hole 11 can be changed as appropriate depending on the size of the object to be plated.
上記載置体10は2本の吊下杆12を有し、該
吊下杆12の先端は鉤形になつていて、この鉤形
先端部12aが支持フレーム13の係止凹部14
(第2図)に係止し、以て第4図に示すように被
メツキ物載置体10は支持フレーム13に吊下支
持されるようになつている。 The mounting body 10 has two hanging rods 12, each of which has a hook-shaped tip.
(FIG. 2), so that the object to be plated 10 is suspended and supported by the support frame 13 as shown in FIG.
上記載置体10は、支持フレーム13に吊下支
持された状態で、その底部が吸引パイプの先端開
口部5aに臨むようにして該開口部5a上に設置
される。 The above-mentioned mounting body 10 is suspended and supported by the support frame 13 and is installed above the opening 5a of the suction pipe so that the bottom thereof faces the opening 5a at the tip of the suction pipe.
上記載置体10は銅、真鍮等の導電性材料から
なり、必要に応じて任意の箇所に絶縁コーテイン
グを施すことができる。 The above-mentioned mounting body 10 is made of a conductive material such as copper or brass, and an insulating coating can be applied to arbitrary parts as necessary.
第2図に示すように、2本の陰極導通杆15が
支持フレーム13に連結され、また1本の陽極導
通杆16が支持フレーム13とは電気的に絶縁さ
れた状態で該支持フレーム13の挿通孔17を通
つて下方に延びており、その先端には電極板18
が連結され、該電極板は被メツキ物載置体10の
上方に対向して臨むように設けられている。 As shown in FIG. 2, two cathode conduction rods 15 are connected to the support frame 13, and one anode conduction rod 16 is electrically insulated from the support frame 13. It extends downward through the insertion hole 17, and has an electrode plate 18 at its tip.
are connected to each other, and the electrode plate is provided so as to face above the object to be plated 10.
支持フレーム13、陰極導通杆15、陽極導通
杆16は銅、真鍮等の導電性材料からなり、電極
板18としては通常、鉛板が用いられる。陽極導
通杆16が支持フレーム13と接触する部分(挿
通孔17内に挿通される部分及びその付近の部
分)には絶縁材19(例えば樹脂パイプ)が被覆
される。 The support frame 13, the cathode conducting rod 15, and the anode conducting rod 16 are made of a conductive material such as copper or brass, and as the electrode plate 18, a lead plate is usually used. The portion where the anode conduction rod 16 contacts the support frame 13 (the portion inserted into the insertion hole 17 and the portion around it) is covered with an insulating material 19 (for example, a resin pipe).
陰極導通杆15は陰極に接続され、それにより
被メツキ物載置体10は支持フレーム13を介し
て陰極に荷電される。一方、陽極導通杆16は陽
極に接続され、それにより電極板18は陽極に荷
電される。 The cathode conducting rod 15 is connected to a cathode, so that the object to be plated 10 is charged to the cathode via the support frame 13. On the other hand, the anode conduction rod 16 is connected to the anode, and thereby the electrode plate 18 is charged to the anode.
陽極導通杆16及び陰極導通杆15は吊下棒2
0に吊下支持されるが、この場合、短絡を防止す
るため吊下棒20に絶縁材が被覆される。吊下棒
20を電極バーとして構成することも可能である
が、その場合、陽極と陰極との接点を別にして短
絡を防止することが必要である。 The anode conduction rod 16 and the cathode conduction rod 15 are the hanging rods 2
In this case, the hanging rod 20 is coated with an insulating material to prevent short circuits. It is also possible to configure the hanging rod 20 as an electrode bar, but in that case it is necessary to separate the contact points between the anode and cathode to prevent short circuits.
吊下棒20は横方向に長尺なもので、その両端
がメツキ槽1の上端部に固定される。 The hanging rod 20 is elongated in the horizontal direction, and both ends thereof are fixed to the upper end of the plating tank 1.
吊下棒20の両端に、タイマー付上下カソード
ロツカー21を設けて、吊下棒20を上下動させ
るように構成することも可能である。 It is also possible to provide upper and lower cathode lockers 21 with timers at both ends of the hanging rod 20 so as to move the hanging rod 20 up and down.
本考案装置に適用されるメツキ液としてはクロ
ムメツキ液等、従来公知のメツキ液が可能であ
る。 As the plating liquid that can be applied to the apparatus of the present invention, conventionally known plating liquids such as chrome plating liquid can be used.
(作用)
第3図に示すように、被メツキ物載置体10内
に被メツキ物22を載置し、吸引ポンプ7によ
り、メツキ液を吸引循環させ、通電すると、載置
体10に接した被メツキ物22は陰極に荷電さ
れ、陽極に荷電された電極板18との間で電気メ
ツキが施される。(Function) As shown in FIG. 3, when the object 22 to be plated is placed in the object mounting body 10 and the plating liquid is sucked and circulated by the suction pump 7, the mounting body 10 is contacted. The object 22 to be plated is charged as a cathode, and electroplated between it and the electrode plate 18 that is charged as an anode.
ここにおいて、吸引パイプによる吸引力が吸引
パイプ5内に及ぼされるが、メツキ液は載置体1
0の貫通孔11を通つて吸引パイプ5内に入り込
み、吸引循環される。この吸引力及び、該吸引力
によつてメツキ液が吸引パイプの先端開口部5a
に流れ込むときの液圧により被メツキ物22は下
方に押さえ付けられ、それにより被メツキ物は載
置体10内において所定位置に固定される。 Here, the suction force by the suction pipe is applied to the inside of the suction pipe 5, but the plating liquid is applied to the mounting body 1.
It enters into the suction pipe 5 through the through hole 11 of No. 0, and is sucked and circulated. This suction force and the plating liquid are applied to the tip opening 5a of the suction pipe.
The object to be plated 22 is pressed downward by the hydraulic pressure flowing into the container 10, thereby fixing the object to be plated at a predetermined position within the mounting body 10.
またタイマー付上下カソードロツカー21を設
けた場合は、吊下棒20を上下動させることがで
き、それにより、吊下された載置体10が上下動
し、その上下動に伴い被メツキ物22が自動的に
位置を変え、タイマーによるその繰返しで均一に
メツキを施すことができる。 In addition, when the upper and lower cathode lockers 21 with timers are provided, the hanging rod 20 can be moved up and down, thereby the suspended mounting body 10 is moved up and down, and the object to be plated is moved up and down along with the up and down movement. 22 automatically changes its position, and plating can be done uniformly by repeating this process using a timer.
(考案の効果)
本考案によれば、メツキ液を吸引循環するの
で、吸引力と液体流入圧とによつて被メツキ物を
位置固定することができ、その結果、従来のよう
に特別な治具を用いて被メツキ物を支持固定する
必要がなく、その治具による固定作業の煩雑さを
解消できる効果がある。(Effects of the invention) According to the invention, since the plating liquid is sucked and circulated, the object to be plated can be fixed in position by the suction force and the liquid inflow pressure. There is no need to use a tool to support and fix the object to be plated, and this has the effect of eliminating the complexity of fixing work using the jig.
また治具からの被メツキ物の脱落という問題も
なく、メツキ不良品の発生を防止し、製品歩留り
を向上できる効果がある。 In addition, there is no problem of objects to be plated falling off from the jig, and there is an effect that generation of defective plated products can be prevented and product yield can be improved.
更に、メツキ液を吸引循環するので、従来の撹
拌装置は不要となり、しかもこの吸引循環によつ
て、撹拌の場合よりもメツキ液組成を充分に均一
ならしめることができる利点がある。 Furthermore, since the plating solution is circulated by suction, a conventional stirring device is not required, and this suction circulation has the advantage that the composition of the plating solution can be made more uniform than in the case of stirring.
図面は本考案の実施例を示すもので、第1図は
本考案装置の縦断面図、第2図は被メツキ物載置
体の支持機構を示す斜視図、第3図は被メツキ物
載置体を吸引パイプの先端開口部上に設置した状
態を示す縦断面図、第4図は上記載置体の吊下支
持状態を示す斜視図である。
1はメツキ槽、4はメツキ液、5は吸引パイ
プ、5aは先端開口部、10は被メツキ物載置
体、11は貫通孔、18は電極板、22は被メツ
キ物。
The drawings show an embodiment of the present invention, in which Fig. 1 is a longitudinal sectional view of the device of the present invention, Fig. 2 is a perspective view showing the support mechanism of the object mounting body to be plated, and Fig. 3 is a perspective view showing the support mechanism of the object mounting body to be plated. FIG. 4 is a vertical cross-sectional view showing a state where the mounting body is installed on the tip opening of the suction pipe, and FIG. 4 is a perspective view showing the above-mentioned mounting body in a suspended and supported state. 1 is a plating tank, 4 is a plating liquid, 5 is a suction pipe, 5a is a tip opening, 10 is a plated object mounting body, 11 is a through hole, 18 is an electrode plate, and 22 is a plated object.
Claims (1)
し、この吸引したメツキ液を再びメツキ槽内に
供給してメツキ液を循環させるメツキ液循環機
構と、被メツキ物を載置できるように構成さ
れ、その底部が吸引パイプの先端開口部に臨む
ように設けられると共に該底部に多数の貫通孔
が設けられてなる被メツキ物載置体と、該載置
体を支持する支持機構と、上記載置体を陰極に
接続し、該載置体の上方に対向して設けた電極
板を陽極に接続してなる通電機構とから構成さ
れることを特徴とする電気メツキ装置。 (2) 被メツキ物載置体は導電性の材料からなり、
支持フレームに吊下支持される実用新案登録請
求の範囲第1項記載の電気メツキ装置。[Scope of Claim for Utility Model Registration] (1) A plating liquid circulation mechanism that sucks plating liquid in a plating tank through a suction pipe and supplies the sucked plating liquid to the plating tank again to circulate the plating liquid, and An object-to-be-plated object mounting body configured to be able to place an object to be plated, the bottom of which faces the opening at the tip of a suction pipe, and a number of through holes provided in the bottom; The device is characterized by being composed of a support mechanism that supports the body, and an energization mechanism that connects the above-mentioned mounting body to a cathode and connects an electrode plate provided above and facing the mounting body to an anode. Electroplating equipment. (2) The object to be plated is made of conductive material,
The electroplating device according to claim 1, which is suspended and supported by a support frame.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13470586U JPH0111728Y2 (en) | 1986-09-02 | 1986-09-02 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13470586U JPH0111728Y2 (en) | 1986-09-02 | 1986-09-02 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6342160U JPS6342160U (en) | 1988-03-19 |
JPH0111728Y2 true JPH0111728Y2 (en) | 1989-04-06 |
Family
ID=31036194
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13470586U Expired JPH0111728Y2 (en) | 1986-09-02 | 1986-09-02 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0111728Y2 (en) |
-
1986
- 1986-09-02 JP JP13470586U patent/JPH0111728Y2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS6342160U (en) | 1988-03-19 |
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