JPH01117041A - Electromagnetic levitation type cross conveying equipment in vacuum - Google Patents
Electromagnetic levitation type cross conveying equipment in vacuumInfo
- Publication number
- JPH01117041A JPH01117041A JP62273915A JP27391587A JPH01117041A JP H01117041 A JPH01117041 A JP H01117041A JP 62273915 A JP62273915 A JP 62273915A JP 27391587 A JP27391587 A JP 27391587A JP H01117041 A JPH01117041 A JP H01117041A
- Authority
- JP
- Japan
- Prior art keywords
- workpiece
- linear motor
- movable element
- movable segment
- stand
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005339 levitation Methods 0.000 title claims description 5
- 230000003028 elevating effect Effects 0.000 claims description 3
- 239000000428 dust Substances 0.000 abstract description 6
- 235000012431 wafers Nutrition 0.000 abstract description 5
- 230000032258 transport Effects 0.000 description 16
- 238000004544 sputter deposition Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000010276 construction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
Landscapes
- Non-Mechanical Conveyors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、真空中に於いてシリコンウェハ等のワークに
スパッタリング等の処理を施すべく交差方向にワー２り
を搬送する磁気浮上式の搬送装置に関する。Detailed Description of the Invention (Industrial Application Field) The present invention relates to a magnetically levitated transport system that transports two workpieces in a transverse direction in order to perform sputtering or other processing on a workpiece such as a silicon wafer in a vacuum. Regarding equipment.
（従来の技術）
従来、真空中でワークを一方向とこれに交差する方向と
に順次搬送し１．該ワークにエツチング、スパッタリン
グ等の処理を順次施すことが行なわれており、その搬送
手段として、ベルト搬送装置やマグネットカップリング
式直線導入装置、ベロー式直線マニピュレータ装置等を
組合せたものが知られている。しかし乍らこれらの装置
はいずれも摺動部分を有するためダスト粒子の発生が多
く、ワークを汚染し勝ちである。(Prior Art) Conventionally, a workpiece is sequentially conveyed in one direction and a direction crossing this direction in a vacuum.1. Processes such as etching and sputtering are sequentially applied to the workpiece, and known means of conveying the work include a combination of a belt conveying device, a magnetic coupling type linear introduction device, a bellows type linear manipulator device, etc. There is. However, since all of these devices have sliding parts, they generate a lot of dust particles, which tend to contaminate the workpiece.
（発明が解決しようとする問題点）
搬送装置として磁気浮上式のリニアモータを使用すれば
非接触式の搬送を行なえ、ダストの発生を少なくするこ
とが出来るが、リニアモータはワークの搬送経路に沿っ
て浮上用の固定子を配置しなければならず、ワークの搬
送経路が交差する個所での固定子の配置が困難で交差部
に於ける可動子の走行制御が容易でない。(Problem to be solved by the invention) If a magnetically levitated linear motor is used as a transport device, non-contact transport can be performed and dust generation can be reduced. A floating stator must be placed along the workpiece, making it difficult to place the stator at a location where the workpiece conveyance paths intersect, making it difficult to control the travel of the movable element at the intersection.
本発明は真空中でリニアモータによりワークを交差した
搬送経路で搬送する場合の前記問題点を解決することを
目的とする。An object of the present invention is to solve the above-mentioned problems when a workpiece is transported by a linear motor in a vacuum using intersecting transport paths.
（問題点を解決するための手段）
本発明では、真空中を直線的な長い第１ワーク搬送経路
と、これに交差する直線的な第２ワーク搬送経路に沿っ
てワークを搬送するものに於いて、第１ワーク搬送経路
に沿って設けたリニアモータの固定子により磁気浮上さ
れて往復動する可動子を備えた第１リニアモータと、前
記第２ワーク搬送経路に設けたリニアモータの固定子に
より磁気浮上され且つ前記第１リニアモータの可動子の
上方を交差して移動されるリニアモータの可動子を備え
た第２リニアモータとを設備し、該第１リニアモータの
可動子にその上面と前記第２リニアモータの可動子の先
端部及びワーク昇降台が介在し得る間隔を有するワーク
保持台を設け、該第１リニアモータと第２リニアモータ
の各可動子の交差部の側方に、前記ワーク昇降台をワー
ク保持台の上方位置まで昇降させてワークを各可動子間
で受け渡しする昇降駆動装置を設けることにより前記問
題点を解決するようにした。(Means for Solving the Problems) In the present invention, a workpiece is transported in a vacuum along a long linear first workpiece transporting path and a linear second workpiece transporting path that intersects with the first workpiece transporting path. a first linear motor including a movable element that is magnetically levitated and reciprocated by a stator of the linear motor provided along the first workpiece transfer path; and a stator of the linear motor provided along the second workpiece transfer path. a second linear motor having a movable element of the linear motor that is magnetically levitated and moved across the movable element of the first linear motor; and a work holding table having an interval that allows the distal end of the movable element of the second linear motor and the work lifting table to be interposed therebetween, and on the side of the intersection of each of the movable elements of the first linear motor and the second linear motor. The above-mentioned problem is solved by providing an elevating drive device that raises and lowers the work lifting table to a position above the work holding table and transfers the work between the movable elements.
（作 用）
第１リニアモータの可動子を磁気浮上させ、該可動子の
上方の保持台にワークが載置されると、固定子により走
行制御されて第１ワーク搬送経路に沿い該可動子がワー
クを第２ワーク搬送経路と交差する位置にまで搬送する
。ワークがこの交差部に到着すると昇降装置によりワー
ク昇降台が下方から上昇し、該保持台上のワークを該ワ
ーク昇降台で受取り、該ワーク保持台よりも高い位置に
まで上昇する。(Function) When the movable element of the first linear motor is magnetically levitated and a workpiece is placed on the holding table above the movable element, the movable element is controlled to travel by the stator and moves along the first workpiece conveyance path. transports the workpiece to a position intersecting the second workpiece transport path. When the workpiece arrives at this intersection, the workpiece lifting platform is raised from below by the lifting device, the workpiece on the holding table is received by the workpiece lifting table, and the workpiece is raised to a higher position than the workpiece holding table.
次いで第１リニアモータの可動子が移動し、ワーク昇降
台を降下させるとその降下の途中に於いてワーク昇降台
のワークが第２リニアモータの可動子に移し変えられ、
該第２リニアモータの固定子により走行制御されてその
可動子が第２ワーク搬送経路に沿いワークを搬送する。Next, the movable element of the first linear motor moves to lower the workpiece lifting platform, and during the descent, the workpiece on the workpiece lifting platform is transferred to the movable element of the second linear motor,
Traveling is controlled by the stator of the second linear motor, and the movable element conveys the workpiece along the second workpiece conveyance path.
該第１リニアモータ及び第２リニアモータの各可動子は
夫々の固定子により制御されて往復移動し、交差部に於
いて昇降装置を適時昇降作動させることにより、ワーク
を第１ワーク搬送経路から第２ワーク搬送経路を往復搬
送し、更に第１ワーク搬送経路から元の位置へ或は他の
位置へと搬送することが出来、搬送のための摺動部は昇
降装置にしか存在しないので真空中へのダストの発生も
少なくなる。Each movable element of the first linear motor and the second linear motor reciprocates under the control of their respective stators, and the workpiece is moved from the first workpiece transport path by operating the lifting device at the intersection in a timely manner. The workpiece can be transported back and forth through the second workpiece transport path, and then transported from the first workpiece transport path to the original position or to another position, and since the sliding part for transport is only present in the lifting device, vacuum is not required. There is also less dust generated inside.
（実施例）
本発明の実施例を図面に基づき説明すると、第１図に於
いて符号（１）は内部を真空ポンプにより真空排気され
た真空室を示し、該真空室（１）にハ外部ヘシリコンウ
エハ等のワーク（２）を出し入れするためのロード室（
３）とアンロード室（４）及び該ワーク（２）にスパッ
タリング、スパッタエツチング等の処理を施すための幾
つかの処理室（５） （５）が設けられる。該ワーク（
２）はロード室（３）からアンロード室（４）へ向う直
線的な比較的長い第１ワーク搬送経路（６）と、これに
交差してロード室（３）、アンロード室〈４）、各処理
室（５） （５）へ夫々向かう数本の直線的な第２ワー
ク搬送経路（７） （７）に沿って搬送され、図示の例
ではロード室（３）のワーク（２）は処理室（５） （
５）を順次巡ってアンロード室（４）へと運ばれる。(Embodiment) An embodiment of the present invention will be described based on the drawings. In FIG. A loading chamber for loading and unloading workpieces (2) such as silicon wafers (
3), an unloading chamber (4), and several processing chambers (5) (5) for subjecting the workpiece (2) to treatments such as sputtering and sputter etching. The work (
2) is a relatively long linear first work transfer path (6) going from the loading chamber (3) to the unloading chamber (4), and the loading chamber (3) and unloading chamber (4) that intersect with this. , the workpieces (2) in the load chamber (3) are transported along several linear second workpiece transport paths (7) (7) heading towards the respective processing chambers (5) (5), respectively. is the processing room (5) (
5) and then transported to the unloading room (4).
（８）は第１ワーク搬送経路（６）に沿ってワーク（２
）を搬送する第１リニアモータ、（９） （９）は第２
ワーク搬送経路（７） （７）に沿ってワークを搬送す
る第２リニアモータで、第１リニアモータ（８）は第２
図のような固定子（１０と可動子（１１）で構成され、
該固定子（ＩＧは第１ワーク搬送経路（６）に沿い間隔
を存して２個設けるようにし、該可動子ａ１）は各固定
子（ＩＧの上面及び両側と覆うチャンネル形の断面形状
の長尺体で構成するようにした。また各第２リニアモー
タ（９）は固定子■と可動子０３で構成され、該可動子
ａ３は第１リニアモータ（８）の可動子（１１）の上方
で交差するようにその固定子ａ３により出没される。(8) The workpiece (2) is moved along the first workpiece transport path (6).
), (9) (9) is the second linear motor that conveys the
The second linear motor transports the work along the work transport path (7) (7), and the first linear motor (8)
It consists of a stator (10) and a mover (11) as shown in the figure,
Two stators (IG) are provided at intervals along the first workpiece conveyance path (6), and the mover a1 has a channel-shaped cross-sectional shape that covers the top and both sides of each stator (IG). Each second linear motor (9) is composed of a stator (1) and a mover 03, and the mover a3 is the same as the mover (11) of the first linear motor (8). The stator a3 appears and retracts so as to intersect above.
尚、図示してはないが、第１リニアモータ（８）の固定
子（ＩＯの中には、浮上用コイルと、固定子（ＩＯと可
動子（＋１）の上下方向のギャップを検出して上下のギ
ャップが均一となるように浮上用コイルを制御する上下
方向ギャップセンサとが設けられ、更に可動子ａ′Ｄを
固定子０（１１に沿って往復移動させるための駆動用コ
イルが設けられる。また、第２リニアモータも第１リニ
アモータと同じ原理で浮上、駆動される。Although not shown in the figure, there is a levitation coil in the stator (IO) of the first linear motor (8), and a vertical gap between the stator (IO and mover (+1) is detected. A vertical gap sensor is provided for controlling the levitation coil so that the vertical gap is uniform, and a driving coil for reciprocating the movable element a'D along the stator 0 (11) is provided. Further, the second linear motor is also levitated and driven by the same principle as the first linear motor.
ワーク（２）は第１リニアモータ（８）及び第２リニア
モータ（９）の各可動子（＋１） ａｇに交互に載せら
れて搬送されるが、両回動子（ＩＣＧ３の交差部の具体
的構成は第２図及び第３図示の如くであり、第１リニア
モータ（８）の可動子（＋１）の上面にこれと間隔ａΦ
を有する片持ち形でフォーク状のワーク保持台（′１９
を設け、該間隔ｑΦをその側方から第２リニアモータ（
９）の可動子（１３１のフォーク状に分岐した先端部ａ
ｅと、該ワーク保持台ａ９及び該先端部（ＩＧのフォー
クに衝突しないようなフォーク状のワーク昇降台（１７
１とを介入し得る程度の長さとし、該ワーク昇降台Ｃｌ
７１は両回動子ＣＩ′Ｄ０３の交差部の側方に真空室（
１）の外部から導入した上下動するピストン杆からなる
昇降駆動装置ａのにより該ワーク保持台（＋５１の上方
の位置まで昇降されるようにした。尚、実施例では３個
のワーク保持台（１５ａ）（１５ｂ） （１５ｃ）を等
間隔で可動子（＋１）上に設けるようにした。The workpiece (2) is conveyed while being placed alternately on each movable element (+1) ag of the first linear motor (8) and the second linear motor (9). The construction is as shown in Figures 2 and 3, and there is a space aΦ on the upper surface of the mover (+1) of the first linear motor (8).
A cantilevered, fork-shaped work holding table ('19
and the second linear motor (
9) Mover (131 fork-shaped branched tip a)
e, the work holding table a9 and the tip (a fork-shaped work lifting table (17) that does not collide with the fork of the IG).
1 and the workpiece lifting platform Cl is long enough to be able to intervene.
71 is a vacuum chamber (
The workpiece holding table (+51) is raised and lowered by an elevating drive device a consisting of a vertically moving piston rod introduced from the outside of the workpiece holding table (1). 15a), (15b), and (15c) are provided on the mover (+1) at equal intervals.
その作動を第１図示のような４本の第２ワーク搬送経路
（Ｄを備え、各搬送経路（７）に沿って４本の第２リニ
アモータ（９ａ） （９ｂ） （９ｃ） （９ｄ）と４
個のワーク昇降台（１７ａ）（１７ｂ）（１７ｃ）（１
７ｄ）を設けた場合につき説明するに、まずロード室（
３）にワーク（２）が用意されると第２リニアモータ（
９ａ）の可動子（１３が前進してそのフォーク状の先端
部（ｌＧでワーク（２）を受取り、第１ワーク搬送経路
（６）との交差部にまで後退する。ここでワーク昇降台
（１７ａ）が上昇して該可動子ａ３の先端部ａｅ上のワ
ーク（２）を受取り、第１リニアモータ（８）のワーク
保持台１１５）よりも高い位置までワーク（２）を持ち
上げる。次いで第１リニアモータ（８）の可動子（Ｉｖ
が前進移動してそのワーク保持台（１５ａ）が該ワーク
昇降台（１７ａ）の下方に位置すると、ワーク昇降台（
１７ａ）が降下し、その途中でワーク（２）をワーク保
持台（１５ａ）に渡す。続いて第１リニアモータ（８）
の可動子（Ｉｎが後退移動してそのワーク保持台（１５
ａ＞が次の第２リニアモータ（９ｂ）の可動子ａ３の上
方に位置すると、ワーク昇降台（１７ｂ）がワーク保持
台（１５ａ）上のワーク（２）を受取って上昇し、この
あと第１リニアモータ（８）の可動子（＋１）が再び前
進してそのワーク保持台（１５ａ）がワーク昇降台（１
７ｂ）の上方から去るとワーク昇降台（１７ｂ）が降下
し、待機する第２リニアモータ（９ｂ）の可動子（ｌ■
の先端部ｑＯにワーク（２）を渡す。該第２リニアモー
タ（９ｂ）の可動子０３は該ワーク（２）を前方の処理
室（５）に運び込み、これにスパッタリング等の処理が
施されると再びワーク昇降台（１７ｂ）の上方へ戻る。The operation is performed by four second workpiece conveyance paths (D) as shown in the first diagram, and four second linear motors (9a) (9b) (9c) (9d) along each conveyance path (7). and 4
Work lifting platform (17a) (17b) (17c) (1
7d) is provided, first, the load chamber (
3) When the workpiece (2) is prepared, the second linear motor (
The mover (13) of the mover (9a) moves forward, receives the workpiece (2) at its fork-shaped tip (lG), and retreats to the intersection with the first workpiece conveyance path (6). 17a) rises to receive the workpiece (2) on the tip end ae of the movable element a3, and lifts the workpiece (2) to a position higher than the workpiece holding table 115) of the first linear motor (8). Movable element (Iv) of 1 linear motor (8)
When the workpiece lifting table (15a) moves forward and is located below the workpiece lifting table (17a), the workpiece lifting table (15a) is positioned below the workpiece lifting table (17a).
17a) descends and transfers the workpiece (2) to the workpiece holding table (15a) on the way. Next, the first linear motor (8)
The movable element (In) moves backward and its work holding table (15
a> is located above the next movable element a3 of the second linear motor (9b), the work lifting table (17b) receives the work (2) on the work holding table (15a) and ascends, and then The mover (+1) of the 1 linear motor (8) moves forward again, and the workpiece holding table (15a) moves to the workpiece lifting table (15a).
7b), the work lifting platform (17b) lowers and the standby movable element (l) of the second linear motor (9b)
Pass the workpiece (2) to the tip qO. The movable element 03 of the second linear motor (9b) transports the workpiece (2) to the processing chamber (5) in front, and after the workpiece is subjected to sputtering or other processing, it is moved again above the workpiece lifting platform (17b). return.
次いで該ワーク昇降台（１７ｂ）が上昇して該ワーク（
２）が上方へ持ち上げられると、第１リニアモータ（８
）の可動子ＣＩｔ）が再び前進し、隣りのワーク保持台
（１５ｂ）が上昇したワーク昇降台（１７ｂ）の下方に
位置したとき該ワーク昇降台（１７ｂ）が降下し、その
降下の途中で該ワーク保持台（１５ｂ）にワーク（２）
を渡す。このあと第１リニアモータ（８）の可動子Ｃ１
１）は後退移動し、これによりワーク保持台（１５ｂ）
が隣りのワーク昇降台（１７ｃ）に位置すると、前記と
同様のワーク（２）の受け渡し作動を行ない、更に該ワ
ーク（２）が次のワーク保持台（１５ｃ）に載せられて
最後のワーク昇降台（１７ｄ）上に位置するとロード室
（３）に於けるときと逆の順序で各リニアモータ（８）
（９ｄ）及びワーク昇降台（１７ｄ）が作動し、アンロ
ード室（４）に処理済みのワーク（２〉が取り出される
。Next, the workpiece lifting platform (17b) rises and lifts the workpiece (
2) is lifted upward, the first linear motor (8
) moves forward again, and when the adjacent workpiece holding table (15b) is located below the raised workpiece lifting table (17b), the workpiece lifting table (17b) descends, and during its descent, Workpiece (2) is placed on the workpiece holding table (15b).
give. After this, the mover C1 of the first linear motor (8)
1) moves backward, and as a result, the workpiece holding table (15b)
When the workpiece is placed on the adjacent workpiece lifting table (17c), the same workpiece (2) transfer operation as described above is carried out, and the workpiece (2) is further placed on the next workpiece holding table (15c) and the final workpiece is lifted and lowered. When placed on the stand (17d), each linear motor (8) is placed in the reverse order as in the load chamber (3).
(9d) and the work lifting platform (17d) are operated, and the processed work (2) is taken out to the unloading chamber (4).
（発明の効果）
以上のように本発明に於いては、真空中で交差する第１
ワーク搬送経路と第２ワーク搬送経路とに沿って互いに
可動子が交差する第１リニアモータと第２リニアモータ
を設け、該第１リニアモータの可動子上にその上面に対
し第２リニアモータの可動子の先端部及び昇降駆動装置
により昇降されるワーク昇降台が介在する間隔を存して
ワーク保持台を設けるようにしたので、真空中に於いて
交差する経路に従いワークを磁気浮上により搬送出来、
その構成も比較的簡単で摺動する部分は昇降駆動装置の
みであるのでダストの発生も少なくクリーンな真空状態
が得られる等の効果がある。(Effect of the invention) As described above, in the present invention, the first
A first linear motor and a second linear motor are provided whose movable elements intersect with each other along a workpiece conveyance path and a second workpiece conveyance path, and a movable element of the second linear motor is provided on the movable element of the first linear motor with respect to its upper surface. Since the workpiece holding table is provided with a gap between the tip of the movable element and the workpiece lifting table that is raised and lowered by the lifting drive device, the workpiece can be transported by magnetic levitation along the intersecting paths in a vacuum. ,
Its structure is relatively simple, and the only sliding part is the lift drive device, so it produces less dust and has the advantage of providing a clean vacuum state.
第１図は本発明の実施例の平面線図、第２図は第１図の
■−■線部分の拡大断面図、第３図は第１及び第２リニ
アモータの可動子の交差部の拡大平面図である。
（１）・・・真空室
（２）・・・ワーク
（６）・・・第１ワーク搬送経路
（７）・・・第２ワーク搬送経路
（８）・・・第１リニアモータ
（９） （９ａ） （９ｂ） （９ｃ） （９ｄ）−第
２リニアモータＧＧ ０２１・・・固定子
ａ■（１３１・・・可動子
（ＩΦ・・・間隔
（ｌＳ （１５ａ）（１５ｂ）（１５ｃ）−ワーク保持
台（ｌＧ・・・先端部Fig. 1 is a plan view of an embodiment of the present invention, Fig. 2 is an enlarged sectional view of the section taken along line ■-■ in Fig. 1, and Fig. 3 is an intersection of the movers of the first and second linear motors. FIG. (1)...Vacuum chamber (2)...Workpiece (6)...First workpiece transfer path (7)...Second workpiece transfer path (8)...First linear motor (9) (9a) (9b) (9c) (9d) - Second linear motor GG 021...Stator a■ (131...Mover (IΦ...Interval (lS (15a) (15b) (15c) - Workpiece holding stand (lG...tip part
Claims (1)
交差する直線的な第２ワーク搬送経路に沿ってワークを
搬送するものに於いて、第１ワーク搬送経路に沿って設
けたリニアモータの固定子により磁気浮上されて往復動
する可動子を備えた第１リニアモータと、前記第２ワー
ク搬送経路に設けたリニアモータの固定子により磁気浮
上され且つ前記第１リニアモータの可動子の上方を交差
して移動されるリニアモータの可動子を備えた第２リニ
アモータとを設備し、該第１リニアモータの可動子にそ
の上面と前記第２リニアモータの可動子の先端部及びワ
ーク昇降台が介在し得る間隔を有するワーク保持台を設
け、該第１リニアモータと第２リニアモータの各可動子
の交差部の側方に、前記ワーク昇降台をワーク保持台の
上方位置まで昇降させてワークを各可動子間で受け渡し
する昇降駆動装置を設けたことを特徴とする真空中に於
ける磁気浮上式交差搬送装置。A linear motor provided along the first workpiece conveyance path in a device that conveys the workpiece along a long linear first workpiece conveyance path in a vacuum and a linear second workpiece conveyance path that intersects the first workpiece conveyance path. a first linear motor having a movable element that is magnetically levitated by a stator and reciprocated; and a movable element of the first linear motor that is magnetically levitated by the stator of the linear motor provided on the second workpiece conveyance path. A second linear motor is provided with a movable element of the linear motor that is moved crosswise above, and the movable element of the first linear motor is provided with an upper surface thereof, a tip of the movable element of the second linear motor, and a workpiece. A workpiece holding table having an interval that allows the interposition of a lifting table is provided, and the workpiece lifting table is raised and lowered to a position above the workpiece holding table on the side of the intersection of each movable element of the first linear motor and the second linear motor. 1. A magnetic levitation type cross conveyance device in a vacuum, characterized by being provided with an elevating drive device that transfers a workpiece between movable elements.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27391587A JP2552886B2 (en) | 1987-10-29 | 1987-10-29 | Magnetically levitated crossing conveyor in vacuum |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27391587A JP2552886B2 (en) | 1987-10-29 | 1987-10-29 | Magnetically levitated crossing conveyor in vacuum |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01117041A true JPH01117041A (en) | 1989-05-09 |
| JP2552886B2 JP2552886B2 (en) | 1996-11-13 |
Family
ID=17534342
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27391587A Expired - Lifetime JP2552886B2 (en) | 1987-10-29 | 1987-10-29 | Magnetically levitated crossing conveyor in vacuum |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2552886B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0440033U (en) * | 1990-08-04 | 1992-04-06 | ||
| JPH05152266A (en) * | 1991-11-26 | 1993-06-18 | Dainippon Screen Mfg Co Ltd | Substrate carrier equipment |
| WO1994026640A1 (en) * | 1993-05-07 | 1994-11-24 | Miller Kenneth C | Wafer transport device |
| JPH09321119A (en) * | 1996-05-27 | 1997-12-12 | Ind Technol Res Inst | Semiconductor module type manufacturing unit system |
-
1987
- 1987-10-29 JP JP27391587A patent/JP2552886B2/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0440033U (en) * | 1990-08-04 | 1992-04-06 | ||
| JPH05152266A (en) * | 1991-11-26 | 1993-06-18 | Dainippon Screen Mfg Co Ltd | Substrate carrier equipment |
| WO1994026640A1 (en) * | 1993-05-07 | 1994-11-24 | Miller Kenneth C | Wafer transport device |
| JPH09321119A (en) * | 1996-05-27 | 1997-12-12 | Ind Technol Res Inst | Semiconductor module type manufacturing unit system |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2552886B2 (en) | 1996-11-13 |
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