JPH01112037U - - Google Patents

Description

[Brief explanation of the drawing]

Fig. 1 is a schematic diagram showing an embodiment of the exposure apparatus in this invention, Fig. 2a is a side sectional view of the output part of the light guide fiber in Fig.
-A cross-sectional view at X, Figure 3 is a perspective view when UV light is irradiated to the resist coated on a semiconductor wafer, and Figures 4a and b are states in which light irradiation is performed for exposure using the method shown in Figure 3. Figures 5a and 5b are diagrams for explaining the exposure shape of UV light irradiation on the wafer peripheral area 1b, and Figure 6a is a diagram showing the UV light when irradiating the wafer using a conventional light guide fiber. Figure b is a diagram showing the relationship between the irradiation intensity and the irradiation distance of the light guiding fiber in figure a. In the figure, 6-1: lamp, 6-2: elliptical condenser mirror,
6-3: Plane reflector, 6-4: Shutter, 6-5
: Filter, 6: Lamp, 7: Incident side metal fitting, 8: Light guide fiber, 9: Optical fiber bundle, 10: Flexible tube, 1
1: Output side metal fitting, 12: Lens unit.

Claims (1)

[Scope of utility model registration request] A short-arc discharge lamp, an elliptical condensing mirror that condenses light from the discharge lamp, and an input end located at the condensing position of the light condensed by this elliptical condenser mirror, and an output part that is approximately rectangular. 1. An exposure apparatus comprising: light guide fibers bundled into a shape; and an imaging lens disposed near an exit portion of the light guide fibers.