JPH01106558U - - Google Patents

Info

Publication number
JPH01106558U
JPH01106558U JP76888U JP76888U JPH01106558U JP H01106558 U JPH01106558 U JP H01106558U JP 76888 U JP76888 U JP 76888U JP 76888 U JP76888 U JP 76888U JP H01106558 U JPH01106558 U JP H01106558U
Authority
JP
Japan
Prior art keywords
mask
charged particle
particle beam
ground electrode
lithography system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP76888U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP76888U priority Critical patent/JPH01106558U/ja
Publication of JPH01106558U publication Critical patent/JPH01106558U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP76888U 1988-01-07 1988-01-07 Pending JPH01106558U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP76888U JPH01106558U (enrdf_load_stackoverflow) 1988-01-07 1988-01-07

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP76888U JPH01106558U (enrdf_load_stackoverflow) 1988-01-07 1988-01-07

Publications (1)

Publication Number Publication Date
JPH01106558U true JPH01106558U (enrdf_load_stackoverflow) 1989-07-18

Family

ID=31200080

Family Applications (1)

Application Number Title Priority Date Filing Date
JP76888U Pending JPH01106558U (enrdf_load_stackoverflow) 1988-01-07 1988-01-07

Country Status (1)

Country Link
JP (1) JPH01106558U (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009115957A (ja) * 2007-11-05 2009-05-28 Hoya Corp マスクブランク及び転写用マスクの製造方法
JP2018178226A (ja) * 2017-04-19 2018-11-15 ムラテック工業株式会社 表面処理用治具

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009115957A (ja) * 2007-11-05 2009-05-28 Hoya Corp マスクブランク及び転写用マスクの製造方法
TWI479256B (zh) * 2007-11-05 2015-04-01 Hoya Corp 製造空白光罩及轉印光罩之方法
JP2018178226A (ja) * 2017-04-19 2018-11-15 ムラテック工業株式会社 表面処理用治具

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