JP804H - Method of forming conductive coating - Google Patents
Method of forming conductive coatingInfo
- Publication number
- JP804H JP804H JP804H JP 804 H JP804 H JP 804H JP 804 H JP804 H JP 804H
- Authority
- JP
- Japan
- Prior art keywords
- sncl
- glass substrate
- film
- alcohol
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000011248 coating agent Substances 0.000 title claims description 19
- 238000000576 coating method Methods 0.000 title claims description 19
- 238000000034 method Methods 0.000 title claims description 12
- 239000011521 glass Substances 0.000 claims description 30
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 16
- 229910017855 NH 4 F Inorganic materials 0.000 claims description 15
- 150000003606 tin compounds Chemical class 0.000 claims description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- 238000005507 spraying Methods 0.000 claims description 10
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 7
- 229910001887 tin oxide Inorganic materials 0.000 claims description 7
- 150000002222 fluorine compounds Chemical class 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 27
- 239000000243 solution Substances 0.000 description 10
- 239000005357 flat glass Substances 0.000 description 7
- 239000011259 mixed solution Substances 0.000 description 7
- 229910006404 SnO 2 Inorganic materials 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000007921 spray Substances 0.000 description 6
- 239000000460 chlorine Substances 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- KVBCYCWRDBDGBG-UHFFFAOYSA-N azane;dihydrofluoride Chemical compound [NH4+].F.[F-] KVBCYCWRDBDGBG-UHFFFAOYSA-N 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000005057 refrigeration Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はヘイズ(曇り)のない低抵抗で高赤外線反射率
を有するフッ素ドープ酸化錫(SnO2(F))の導電被
膜の形成方法に関する。すなわち、本発明による被膜は
着色がほとんどなくあくまでも透過性と外観上に優れる
とともに赤外領域での反射率が高く、かつ良好な導電性
を兼ね備えて、しかも優れた硬度と化学的機械的耐久性
を有しているので、その特性を利用して種々の分野に広
く採用され得るものである。すなわち、通常の板ガラス
基板表面上に被膜して、例えば、建築、自動車、航空機
および船舶あるいは冷凍シヨーケースの防曇窓ガラスま
たは、熱線反射透明窓ガラスに、また太陽熱集熱器のカ
バーガラスやオーブンのドアガラスに、さらに液晶電気
光学デイスプレイ等の電気電子機器部品に等、多方面で
実用され得るものである。
〔従来の技術〕
従来、酸化錫被膜を形成する際、被膜にヘイズの発生す
る原因として、錫化合物中の塩素ガラスがガラス中のア
ルカリと反応してNaClを形成することによるものと
考えられており、ヘイズのない酸化錫被膜を形成する方
法として、例えば、(C4H9)2Sn(CH3CO
O)2等の無塩素系の錫化合物を用い、ドーピング剤と
してCF3COOH等を用いる方法(特公昭53−25
331号公報)が知られている。また、比較的低温のガ
ラス基板温度で低抵抗の被膜が得られる方法として、錫
化合物としてSnCl4を用いる方法(A.BHARD
WAJ等「FLUORINE−DOPED SnO2
FILMS FOR SOLAR CELL APPL
ICATION」Solar Cells.5(198
1−1982)P.39−49)が知られている。
〔発明が解決しようとする問題点〕
前述の特公昭53−25331号公報に記載されている
方法においては、ヘイズのない酸化錫被膜が得られる
が、600℃以下のガラス基板の温度において被膜を形
成させると、低抵抗、高赤外反射率の被膜が得られ難い
し、また600℃以上の高い温度のガラス基板に被膜を
形成させると、抵抗値、赤外反射率等の特性は改善され
るが、ガラスに歪、反り等が発生して良好な製品が得ら
れ難いものであり、また前述の公知の刊行物に記載の方
法においては、スプレーする混合溶液が不安定であり錫
の沈溺等も発生しやすく、スプレー時にその装置自体の
腐食および分解ガスによる周囲設備も激しい腐食を起
し、通常のソーダ石灰ガラスを基板として用いた際には
SiO2等のアンダーコートなしではヘイズがきつく生
じて製品となり難いものであって、通常の板ガラス基板
であればSiO2等のアンダーコーテイングが透視性お
よび外観上から必須条件であるものであり、さらに抵抗
値についても低い値を得られるもののより一層低い抵抗
値の被膜を求められているなかでは満足し得ないもので
もある。
〔問題点を解決するための手段〕
本発明は、前述の問題点に着目してなしたものであっ
て、SiO2等のアンダーコートなしで、500〜60
0℃の高温のガラス基板表面上に、〔(C4H9)Sn
Cl、/(C4H9)SnCl3+(アルコール+
水)〕=20〜50%3〔NH4F/(C4H9)Sn
Cl3+(アルコール+水)〕=0.01〜0.05、
ならびに〔H2O/アルコール+H2O〕=10〜90
%でなる(C4H9)SnCl3、水、アルコールおよ
びNH4Fの混合溶液を噴霧して、フッ素ドープ酸化錫
の導電被膜を形成するようにしたものであり、ヘイズの
ない、より低抵抗で高赤外線反射率を有する酸化錫被膜
を得る形成方法を提供するものである。
本発明において、(C4H9)SnCl3はSnCl4
に比較して噴霧時の設備等への腐食が少なく、上述の混
合溶液中でも安定であり、被膜のヘイズの発生もなく、
また他の有機錫化合物よりも被膜の抵抗値がより低いも
のとなるものである。
NH4Fは酸性弗化アンモニウムでもよい。また他のフ
ッ素化合物と比較して少量の添加量でよいものであり、
(C4H9)SnCl3とNH4Fとの組合せにより、
(C4H9)SnCl3は塩素を有する化合物にもかか
わらず、NH4Fのフッ素の作用により被膜のヘイズの
発生を防止できるものである。
水およびアルコールは、溶剤として用いるものであり、
水はNH4Fを溶解させるために加えるものである。ア
ルコールとしてはCH3OH、C2H5OH等が用いら
れる。水およびアルコールの混合割合は、適宜調製して
用いることができ、水のみの場合では噴霧時にガラス基
板を急激に冷却し、ガラスの割れ等を発生し、また、ヘ
イズの発生等外観上好ましくない。また、アルコールの
みの場合ではNH4Fの溶解性、被膜の成長速度、噴霧
蒸気の燃焼等好ましくない。
本発明において、ガラス基板の温度としては500〜6
00℃であって、500℃未満では低抵抗、高赤外反射
率の被膜が得られ難い、また600℃を超えるとガラス
基板に歪、反り等が生じる。
また、混合溶液における量的範囲はつぎのようになるも
のである。
1)〔(C4H9)SnCl3/(C4H9)SnCl
3+(アルコール+水)〕=20〜50%
すなわち、20%未満では溶媒(アルコール+水)の割
合が高くなり、基板の温度の低下等で効率的な被膜形成
が難しいし、50%を超えると(C4H9)SnCl3
の割合が高くなり、被膜のムラが発生し不均質な膜とな
る。
2)〔NH4F/(C4H9)SnCl3+(アルコー
ル+水)〕=0.01〜0.05
すなわち、0.01未満あるいは0.05を超えると低
抵抗が徐々に高くなり、範囲外のはずれ方が多くなると
極端に高くなる。
3)〔H2O/アルコール+H2O〕=10〜90%
すなわち、10%未満ではNH4Fの溶解性が下がり、
被膜の生成速度が遅くなり、90%を超えるとスプレー
時ガラス基板の温度が急激に低下することとなり、ガラ
ス基板の割れを誘発することがあるものである。
またさらに膜厚としては4000〜10000Åが好ま
しい。4000Å未満では被膜のギラつく干渉色が発生
しやすく、10000Åを超えると性能上膜厚効果が少
なくコストアップにつながるものであり、赤外線反射率
の面からは5000Å程度がより好ましいものである。
〔作用〕
前述したとおりの本発明の被膜形成方法によって、特定
量とした(C4H9)SnCl3等を用いることによ
り、前記本発明の混合溶液中で沈澱等の問題もなく安定
したものとなり、噴霧上のトラブルもなく、均一な膜を
形成し得るとともに、スプレー装置および周囲設備等の
腐食も軽減されるものとなり、しかも低抵抗も他の有機
錫化合物に比してより低い膜が得られるものである。さ
らに、塩素を有する錫化合物でありながらヘイズの発生
を起こすこともないものとなり、略無色で、透視性に優
れ、外観上も適度の光沢と平滑性をほぼ保持し得るもの
であり、また熱線反射率も高く、可視域の透過率もほぼ
自動車窓ガラスに採用し得る程度のものとなる特徴を有
するものである。
上述に加えて、噴霧時にガラス基板を急冷することがな
いのでガラスの割れ等も発生せず、被膜の成長速度も早
く、フッ素化合物の添加量も少量で有効に働き、付着強
度も充分にあるものとなり、歩留および品質上も良好な
ものとなるものである。
〔実施例〕
以下本発明の実施例を説明する。
(実施例1)
充分脱脂洗浄された300mmx300mmの大きさで厚さ
3mmのソーダ石灰ガラスをガラス基板として用い、加熱
炉にて540℃、560℃、590℃にそれぞれ板温を
上昇した後、30mm/secのスピードで移送されるガラ
ス基板表面上に、約3kg/cm2のエアの噴霧溶液を微細
化しスプレーする方式の自動スプレーガンを用いて下記
の錫化合物溶液とフッ素化合物を混合した溶液を3cc/
secの量でスプレーガンと板ガラスの距離約30cmから
噴霧してSnO2(F)膜を形成させた。膜厚は約600
0Åを得た。
錫化合物溶液
(C4H9)SnCl335wt%、C2H5OH35
wt%、H2O30wt%
フッ素化合物
NH4F/錫化合物溶液=0.01、0.02、0.0
3、0.04
以上のような方法で得られたSnO2(F)膜の比抵抗を
測定し、その測定結果を第1図に示した。
(実施例2)
ガラス基板および噴霧条件は実施例1と同様とし、ガラ
ス基板の温度は540℃、560℃、590℃について
錫化合物溶液は不変で(C4H9)SnCl335wt
%、C2H5OH35wt%、H2O30wt%とし、
フッ素化合物のみNH4F/錫化合物溶液=0.03と
一定とし、各設定温度で被膜を形成させ、SnO2(F)
膜を有するガラス基板を製造した。
これをサンプルとして光学特性を測定し、それを分光曲
線として第2図に示した。
(比較例)
ガラス基板および噴霧条件は実施例1と同様とし、ガラ
ス基板の温度は540℃、560℃、590℃および6
10℃について、混合溶液として次のものに用いて噴霧
した。
1)(CH3)2SnCl235wt%、C2H5OH
25wt%、H2O40wt%
NH4F/((CH3)2SnCl2+C2H5OH+
H2O)=2/100
2)(C4H9)2Sn(CH3COO)235wt
%、CCl3CH335wt%、CF3COOH30w
t%
ガラス基板表面上に得られたSnO2(F)膜の比抵抗を
測定し、それを第3図に示した。
〔発明の効果〕
第1図より明らかなように、(NH4F/錫化合物溶
液)x100が1〜4%で、しかもガラス基板の温度が
540〜590℃の間で高い温度の方が比抵抗をより下
げ、しかもその間でそれぞれ最小値をもつことを見出
し、しかも第2図では光学特性として、ガラス基板の温
度によって同一の本発明の混合溶液を噴霧し被膜を形成
しても、赤外領域での反射率に影響を与え、可視領域で
の透過率がほぼ同一ではあるが約70%を得て、自動車
の窓ガラス等にも使用しうることが確認できた。なお、
数値的には、比抵抗が4〜7x10-4Ωcm、赤外線反射
率が約80〜87%(10μmにおいて)である。
さらに第3図では、本発明における混合溶液中の(C4
H9)SnCl3と他の有機錫化合物との比較による一
例を示すものであり、実施例1が7〜4x10-4Ωcmで
あるのに対し、比較例1および2では、18〜9x10
-4Ωcmであり、明らかに比抵抗へ与える影響に大きな差
があることがわかるものである。
以上のように、本発明によれば、SiO2等のプレコー
トなしで、ヘイズのない低抵抗、高赤外反射率の被膜が
得られ、導電性材料、赤外線反射材料として用いること
ができるし、また比較的低温のガラス基板で被膜が容易
に形成できるという顕著な作用効果を奏するものであ
る。TECHNICAL FIELD The present invention relates to a method for forming a conductive film of fluorine-doped tin oxide (SnO 2 (F)) having no haze, low resistance, and high infrared reflectance. . That is, the coating film according to the present invention has almost no coloring, is excellent in transparency and appearance, has a high reflectance in the infrared region, and has good conductivity, and has excellent hardness and chemical mechanical durability. Therefore, it can be widely adopted in various fields by utilizing its characteristics. That is, by coating on the surface of a normal plate glass substrate, for example, anti-fog window glass of construction, automobiles, aircraft and ships or refrigeration canisters, or heat-reflecting transparent window glass, and cover glass of a solar heat collector or oven. It can be put to practical use in various fields such as door glass and parts for electric and electronic devices such as liquid crystal electro-optical displays. [Prior Art] Conventionally, when forming a tin oxide film, it is believed that the cause of haze in the film is that the chlorine glass in the tin compound reacts with the alkali in the glass to form NaCl. As a method for forming a tin oxide coating film free from haze, for example, (C 4 H 9 ) 2 Sn (CH 3 CO
O) 2 and other chlorine-free tin compounds and CF 3 COOH or the like as a doping agent (Japanese Patent Publication No. 53-25).
No. 331) is known. Further, as a method for obtaining a coating having a low resistance at a relatively low glass substrate temperature, a method using SnCl 4 as a tin compound (A. BHARD
WAJ et al. “FLUORINE-DOPED SnO 2
FILEMS FOR SOLAR CELL APPL
ICATION "Solar Cells. 5 (198
1-182) P. 39-49) are known. [Problems to be Solved by the Invention] In the method described in Japanese Patent Publication No. 53-25331, a tin oxide coating film free from haze can be obtained, but the coating film is formed at a glass substrate temperature of 600 ° C. or lower. When formed, it is difficult to obtain a coating having low resistance and high infrared reflectance, and when a coating is formed on a glass substrate having a high temperature of 600 ° C or higher, characteristics such as resistance value and infrared reflectance are improved. However, it is difficult to obtain a good product due to distortion, warpage, etc. of the glass, and in the method described in the above-mentioned known publication, the mixed solution to be sprayed is unstable and tin deposition etc. also likely to occur, ambient equipment due to corrosion and decomposition gas of the device itself during spraying also cause severe corrosion, f is when using conventional soda-lime glass as the substrate without undercoat such as SiO 2 Be one's hardly becomes tightly occur products are those when the conventional flat glass substrate under Cote queuing such as SiO 2 is an essential condition from the perspective of and appearance, to obtain a value lower for more resistance However, there is a demand for a coating having a lower resistance value, which is not satisfactory. [Means for Solving Problems] The present invention has been made by paying attention to the above problems, and is 500 to 60 without an undercoat such as SiO 2.
[(C 4 H 9 ) Sn is formed on the surface of the glass substrate at a high temperature of 0 ° C.
Cl, / (C 4 H 9 ) SnCl 3 + ( alcohol +
Water)] = 20 to 50% 3 [NH 4 F / (C 4 H 9 ) Sn
Cl 3 + (alcohol + water)] = 0.01 to 0.05,
And [H 2 O / alcohol + H 2 O] = 10 to 90
% Of (C 4 H 9 ) SnCl 3 , water, alcohol and NH 4 F are sprayed to form a conductive film of fluorine-doped tin oxide. Provided is a method for forming a tin oxide coating film having resistance and high infrared reflectance. In the present invention, (C 4 H 9 ) SnCl 3 is SnCl 4
Corrosion to equipment and the like during spraying is less than that, is stable even in the above mixed solution, and does not cause haze of the coating film.
Further, the resistance value of the film is lower than that of other organic tin compounds. NH 4 F may be ammonium acid fluoride. Also, it is possible to add a small amount as compared with other fluorine compounds,
With the combination of (C 4 H 9 ) SnCl 3 and NH 4 F,
(C 4 H 9 ) SnCl 3 can prevent the generation of haze in the coating film by the action of the fluorine of NH 4 F, despite the compound having chlorine. Water and alcohol are used as solvents,
Water is added to dissolve NH 4 F. CH 3 OH, C 2 H 5 OH or the like is used as the alcohol. The mixing ratio of water and alcohol can be appropriately adjusted and used, and in the case of only water, the glass substrate is rapidly cooled at the time of spraying, glass breakage or the like is generated, and appearance is not preferable such as generation of haze. . Further, in the case of only alcohol, the solubility of NH 4 F, the growth rate of the film, the combustion of spray vapor, etc. are not preferable. In the present invention, the temperature of the glass substrate is 500 to 6
If the temperature is 00 ° C. and is lower than 500 ° C., it is difficult to obtain a coating having low resistance and high infrared reflectance, and if it is higher than 600 ° C., the glass substrate is distorted or warped. The quantitative range of the mixed solution is as follows. 1) [(C 4 H 9 ) SnCl 3 / (C 4 H 9 ) SnCl
3 + (alcohol + water)] = 20-50% At below 20%, the higher the proportion of the solvent (alcohol + water), to efficient film formation is difficult in such as reduction of the temperature of the substrate, 50% Beyond (C 4 H 9 ) SnCl 3
Is increased, and unevenness of the coating occurs, resulting in an inhomogeneous film. 2) [NH 4 F / (C 4 H 9 ) SnCl 3 + (alcohol + water)] = 0.01 to 0.05 That is, if less than 0.01 or more than 0.05, the low resistance gradually increases. , It becomes extremely high as the number of deviations outside the range increases. 3) [H 2 O / alcohol + H 2 O] = 10 to 90%, that is, if it is less than 10%, the solubility of NH 4 F decreases,
The rate of film formation slows down, and if it exceeds 90%, the temperature of the glass substrate during spraying will suddenly drop, which may cause cracking of the glass substrate. Further, the film thickness is preferably 4000 to 10000Å. If it is less than 4000 Å, a glaring interference color is liable to occur, and if it exceeds 10,000 Å, the film thickness effect is small in terms of performance, leading to cost increase. From the viewpoint of infrared reflectance, about 5000 Å is more preferable. [Operation] By using the specified amount of (C 4 H 9 ) SnCl 3 or the like by the method for forming a film of the present invention as described above, a stable solution without problems such as precipitation in the mixed solution of the present invention can be obtained. As a result, a uniform film can be formed without any trouble in spraying, corrosion of the spray device and surrounding equipment can be reduced, and a low resistance film lower than other organic tin compounds can be obtained. Is what you get. Furthermore, although it is a tin compound containing chlorine, it does not cause haze, is almost colorless, has excellent transparency, and can almost maintain an appropriate gloss and smoothness in terms of appearance. It has characteristics that it has a high reflectance and a transmittance in the visible range that is almost applicable to automobile window glass. In addition to the above, since the glass substrate is not rapidly cooled during spraying, glass breakage, etc. do not occur, the growth rate of the coating is fast, the addition amount of the fluorine compound is small, and it works effectively, and the adhesive strength is sufficient. In addition, the yield and quality are good. [Examples] Examples of the present invention will be described below. Example 1 Soda lime glass having a size of 300 mm × 300 mm and a thickness of 3 mm, which had been sufficiently degreased and washed, was used as a glass substrate, and the plate temperature was raised to 540 ° C., 560 ° C. and 590 ° C. in a heating furnace, and then 30 mm. On the surface of the glass substrate, which is transferred at a speed of 1 / sec, a solution of the following tin compound solution and fluorine compound is mixed using an automatic spray gun that atomizes and sprays a spray solution of about 3 kg / cm 2 of air. 3cc /
A SnO 2 (F) film was formed by spraying at a distance of about 30 cm between the spray gun and the plate glass in an amount of sec. The film thickness is about 600
I got 0Å. Tin compound solution (C 4 H 9 ) SnCl 3 35 wt%, C 2 H 5 OH35
wt%, H 2 O 30 wt% Fluorine compound NH 4 F / tin compound solution = 0.01, 0.02, 0.0
3, 0.04 The specific resistance of the SnO 2 (F) film obtained by the above method was measured, and the measurement result is shown in FIG. (Example 2) The glass substrate and the spraying conditions were the same as in Example 1, and the temperature of the glass substrate was 540 ° C, 560 ° C, and 590 ° C, and the tin compound solution was unchanged (C 4 H 9 ) SnCl 3 35 wt.
%, C 2 H 5 OH 35 wt%, H 2 O 30 wt%,
Only the fluorine compound was kept constant at NH 4 F / tin compound solution = 0.03, and a film was formed at each set temperature. SnO 2 (F)
A glass substrate having a film was manufactured. Using this as a sample, the optical characteristics were measured and shown as a spectral curve in FIG. (Comparative Example) The glass substrate and the spraying conditions were the same as in Example 1, and the temperature of the glass substrate was 540 ° C, 560 ° C, 590 ° C and 6 ° C.
About 10 ° C., it was sprayed using the following as a mixed solution. 1) (CH 3 ) 2 SnCl 2 35 wt%, C 2 H 5 OH
25 wt%, H 2 O 40 wt% NH 4 F / ((CH 3 ) 2 SnCl 2 + C 2 H 5 OH +
H 2 O) = 2/100 2) (C 4 H 9) 2 Sn (CH 3 COO) 2 35wt
%, CCl 3 CH 3 35 wt%, CF 3 COOH 30w
The specific resistance of the SnO 2 (F) film obtained on the surface of the t% glass substrate was measured, and it is shown in FIG. [Effects of the Invention] As is clear from FIG. 1, (NH 4 F / tin compound solution) × 100 is 1 to 4%, and the temperature of the glass substrate is higher between 540 and 590 ° C. It was found that the resistance was further lowered, and that each had a minimum value between them. Moreover, in FIG. 2, even if the same mixed solution of the present invention was sprayed to form a coating film depending on the temperature of the glass substrate, an infrared characteristic was found. It affects the reflectance in the region, and the transmittance in the visible region is about the same, but about 70% was obtained, and it could be confirmed that it can be used for window glass of automobiles. In addition,
Numerically, the specific resistance is 4 to 7 × 10 −4 Ωcm, and the infrared reflectance is about 80 to 87% (at 10 μm). Further, in FIG. 3, (C 4 in the mixed solution in the present invention is shown.
H 9 ) SnCl 3 and another organotin compound are shown as an example by comparison, and in Example 1 is 7 to 4 × 10 −4 Ω · cm, in Comparative Examples 1 and 2, 18 to 9 × 10
It is -4 Ωcm, and it is clear that there is a large difference in the effect on the specific resistance. As described above, according to the present invention, a haze-free low resistance film having high infrared reflectance can be obtained without precoating of SiO 2 or the like, and can be used as a conductive material or an infrared reflecting material, Further, it has a remarkable effect that a coating can be easily formed on a glass substrate at a relatively low temperature.
【図面の簡単な説明】
第1図は本発明の一実施例であって(NH4F/錫化合
物溶液)x100およびガラス基板の温度が比抵抗に及
ばす影響を示し、第2図は本発明の一実施例でのガラス
基板の温度が透過率と反射率に与える影響を示し、第3
図は本発明で(C4H9)SnCl3を採用した効果を
示すものである。BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is an example of the present invention, showing the effect of (NH 4 F / tin compound solution) × 100 and the temperature of the glass substrate on the specific resistance, and FIG. The influence of the temperature of the glass substrate on the transmittance and the reflectance in one embodiment of the invention is shown.
The figure shows the effect of using (C 4 H 9 ) SnCl 3 in the present invention.
Claims (1)
素化合物を含有する溶液を噴霧して、フッ素ドープ酸化
錫被膜を形成する方法において、前記ガラス基板の温度
が500〜600℃であって、しかも前記溶液として
(C4H9)SnCl3、水、アルコールおよびNH4
Fの混合物を用いるとともに、その量的範囲が、〔(C
4H9)SnCl3/(C4H9)SnCl3+(アル
コール+水)〕=20〜50%、〔NH4F/(C4H
9)SnCl3+(アルコール+水)〕=0.01〜
0.05、ならびに〔H2O/アルコール+H2O〕=
10〜90%であることを特徴とする導電被膜の形成方
法。1. A method for forming a fluorine-doped tin oxide film by spraying a solution containing a tin compound and a fluorine compound on a glass surface at high temperature. At a temperature of 500 to 600 ° C., and as the solution, (C 4 H 9 ) SnCl 3 , water, alcohol and NH 4
A mixture of F is used, and its quantitative range is [(C
4 H 9) SnCl 3 / ( C 4 H 9) SnCl 3 + ( alcohol + water)] = 20-50%, [NH 4 F / (C 4 H
9 ) SnCl 3 + (alcohol + water)] = 0.01-
0.05, and [H 2 O / alcohol + H 2 O] =
The method for forming a conductive coating is characterized by 10 to 90%.
Family
ID=
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