JP7801335B2 - 拡張現実感計測学ツールのための照明システム - Google Patents

拡張現実感計測学ツールのための照明システム

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Publication number
JP7801335B2
JP7801335B2 JP2023530644A JP2023530644A JP7801335B2 JP 7801335 B2 JP7801335 B2 JP 7801335B2 JP 2023530644 A JP2023530644 A JP 2023530644A JP 2023530644 A JP2023530644 A JP 2023530644A JP 7801335 B2 JP7801335 B2 JP 7801335B2
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JP
Japan
Prior art keywords
optical device
light
operable
measurement system
pattern
Prior art date
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JP2023530644A
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English (en)
Japanese (ja)
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JP2023552094A5 (https=
JP2023552094A (ja
Inventor
ヤンヤン スン，
ジンシン フー，
和也 大東
ルドヴィーク ゴデット，
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Applied Materials Inc
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Applied Materials Inc
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Publication of JP2023552094A5 publication Critical patent/JP2023552094A5/ja
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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0257—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
    • G01M11/0264—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested by using targets or reference patterns
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0081—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for altering, e.g. enlarging, the entrance or exit pupil
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/017—Head mounted
    • G02B27/0172—Head mounted characterised by optical features
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/30—Collimators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/62—Optical apparatus specially adapted for adjusting optical elements during the assembly of optical systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
    • G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
    • G02B6/0033—Means for improving the coupling-out of light from the light guide
    • G02B6/0035—Means for improving the coupling-out of light from the light guide provided on the surface of the light guide or in the bulk of it
    • G02B6/0038—Linear indentations or grooves, e.g. arc-shaped grooves or meandering grooves, extending over the full length or width of the light guide
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/26—Optical coupling means
    • G02B6/30—Optical coupling means for use between fibre and thin-film device
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/42—Coupling light guides with opto-electronic elements
    • G02B6/4201—Packages, e.g. shape, construction, internal or external details
    • G02B6/4204—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms
    • G02B6/4206—Optical features
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/56—Cameras or camera modules comprising electronic image sensors; Control thereof provided with illuminating means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/0101—Head-up displays characterised by optical features
    • G02B2027/011—Head-up displays characterised by optical features comprising device for correcting geometrical aberrations, distortion
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/10—Image acquisition modality
    • G06T2207/10141—Special mode during image acquisition
    • G06T2207/10152—Varying illumination
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30168—Image quality inspection
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30204—Marker

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Geometry (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Quality & Reliability (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP2023530644A 2020-11-24 2021-11-23 拡張現実感計測学ツールのための照明システム Active JP7801335B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US202063117576P 2020-11-24 2020-11-24
US63/117,576 2020-11-24
US202163184398P 2021-05-05 2021-05-05
US63/184,398 2021-05-05
PCT/US2021/060576 WO2022115457A1 (en) 2020-11-24 2021-11-23 Illumination system for ar metrology tool

Publications (3)

Publication Number Publication Date
JP2023552094A JP2023552094A (ja) 2023-12-14
JP2023552094A5 JP2023552094A5 (https=) 2024-11-29
JP7801335B2 true JP7801335B2 (ja) 2026-01-16

Family

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Family Applications (1)

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JP2023530644A Active JP7801335B2 (ja) 2020-11-24 2021-11-23 拡張現実感計測学ツールのための照明システム

Country Status (6)

Country Link
US (2) US11988574B2 (https=)
EP (1) EP4251977A4 (https=)
JP (1) JP7801335B2 (https=)
KR (1) KR20230112133A (https=)
TW (1) TW202227877A (https=)
WO (1) WO2022115457A1 (https=)

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US12326667B2 (en) * 2022-12-15 2025-06-10 Applied Materials, Inc. Combination of inline metrology and on tool metrology for advanced packaging
DE102022134863B4 (de) * 2022-12-27 2024-09-05 ASMPT GmbH & Co. KG Kamera-Beleuchtungsvorrichtung mit einem gemeinsamen Linsenarray für verschiedene Beleuchtungsstrukturen
CN120693506A (zh) * 2022-12-30 2025-09-23 欧普菲有限公司 用于测试光学元件的方法和设备
US20250053099A1 (en) * 2023-08-10 2025-02-13 Applied Materials, Inc. Asymmetric metrology tool for reflective waveguide
CN121816493A (zh) * 2023-08-24 2026-04-07 应用材料公司 用于紧凑型光学计量系统的镜折叠照明
WO2025147256A1 (en) * 2024-01-04 2025-07-10 Applied Materials, Inc. Optical property measurement
EP4624890A1 (en) 2024-03-25 2025-10-01 Trioptics GmbH Optical testing device and method of operating an optical testing device

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JP2001274941A (ja) 2000-03-27 2001-10-05 Seiko Epson Corp 画像読取システムの検査装置および検査方法
JP2003274087A (ja) 2002-03-13 2003-09-26 Seiko Epson Corp 画像読み取り装置のｍｔｆ検査方法
JP2010164988A (ja) 2002-03-21 2010-07-29 Lumus Ltd 光導体光学装置
JP2009516862A (ja) 2005-11-21 2009-04-23 マイクロビジョン，インク． 像誘導基板を有するディスプレイ
JP2008256671A (ja) 2006-12-05 2008-10-23 Hoya Corp フォトマスクの検査装置、フォトマスクの検査方法、液晶装置製造用フォトマスクの製造方法及びパターン転写方法
JP2008298932A (ja) 2007-05-30 2008-12-11 Hoya Corp フォトマスクの検査方法、フォトマスクの製造方法、電子部品の製造方法及びテストマスク
US20120015460A1 (en) 2010-07-16 2012-01-19 Azores Corp. System and Method for Estimating Field Curvature
JP2015529347A (ja) 2012-09-11 2015-10-05 カール ツァイス マイクロスコピー ゲーエムベーハーＣａｒｌ Ｚｅｉｓｓ Ｍｉｃｒｏｓｃｏｐｙ Ｇｍｂｈ 光学系構成および光学顕微鏡
JP2015175967A (ja) 2014-03-14 2015-10-05 ソニー株式会社 光学装置及びその組立方法、ホログラム回折格子、表示装置並びにアライメント装置
JP2016085426A (ja) 2014-10-29 2016-05-19 セイコーエプソン株式会社 光学素子、電気光学装置、装着型表示装置および光学素子の製造方法
CN111033326A (zh) 2017-08-18 2020-04-17 株式会社Lg化学 制造具有多个图案区域的模块的方法、根据该方法的具有多个图案区域的模块以及制造衍射光栅模块或衍射光栅模块用模具的方法
JP2020067664A (ja) 2018-10-26 2020-04-30 ヴァイアヴィ・ソリューションズ・インコーポレイテッドＶｉａｖｉ Ｓｏｌｕｔｉｏｎｓ Ｉｎｃ． 光学素子及び光学系
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US20200333534A1 (en) 2019-04-19 2020-10-22 Salvo Technologies Inc. Optical targeting device

Also Published As

Publication number Publication date
US20220163423A1 (en) 2022-05-26
EP4251977A4 (en) 2024-10-16
EP4251977A1 (en) 2023-10-04
US11988574B2 (en) 2024-05-21
TW202227877A (zh) 2022-07-16
WO2022115457A1 (en) 2022-06-02
US20240385075A1 (en) 2024-11-21
KR20230112133A (ko) 2023-07-26
JP2023552094A (ja) 2023-12-14

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