JP2023552094A5 - - Google Patents

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Publication number
JP2023552094A5
JP2023552094A5 JP2023530644A JP2023530644A JP2023552094A5 JP 2023552094 A5 JP2023552094 A5 JP 2023552094A5 JP 2023530644 A JP2023530644 A JP 2023530644A JP 2023530644 A JP2023530644 A JP 2023530644A JP 2023552094 A5 JP2023552094 A5 JP 2023552094A5
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JP
Japan
Prior art keywords
optical device
measurement system
optical
optical engine
pattern
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JP2023530644A
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English (en)
Japanese (ja)
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JP7801335B2 (ja
JP2023552094A (ja
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Priority claimed from PCT/US2021/060576 external-priority patent/WO2022115457A1/en
Publication of JP2023552094A publication Critical patent/JP2023552094A/ja
Publication of JP2023552094A5 publication Critical patent/JP2023552094A5/ja
Application granted granted Critical
Publication of JP7801335B2 publication Critical patent/JP7801335B2/ja
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JP2023530644A 2020-11-24 2021-11-23 拡張現実感計測学ツールのための照明システム Active JP7801335B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US202063117576P 2020-11-24 2020-11-24
US63/117,576 2020-11-24
US202163184398P 2021-05-05 2021-05-05
US63/184,398 2021-05-05
PCT/US2021/060576 WO2022115457A1 (en) 2020-11-24 2021-11-23 Illumination system for ar metrology tool

Publications (3)

Publication Number Publication Date
JP2023552094A JP2023552094A (ja) 2023-12-14
JP2023552094A5 true JP2023552094A5 (https=) 2024-11-29
JP7801335B2 JP7801335B2 (ja) 2026-01-16

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ID=81658094

Family Applications (1)

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JP2023530644A Active JP7801335B2 (ja) 2020-11-24 2021-11-23 拡張現実感計測学ツールのための照明システム

Country Status (6)

Country Link
US (2) US11988574B2 (https=)
EP (1) EP4251977A4 (https=)
JP (1) JP7801335B2 (https=)
KR (1) KR20230112133A (https=)
TW (1) TW202227877A (https=)
WO (1) WO2022115457A1 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12326667B2 (en) * 2022-12-15 2025-06-10 Applied Materials, Inc. Combination of inline metrology and on tool metrology for advanced packaging
DE102022134863B4 (de) * 2022-12-27 2024-09-05 ASMPT GmbH & Co. KG Kamera-Beleuchtungsvorrichtung mit einem gemeinsamen Linsenarray für verschiedene Beleuchtungsstrukturen
CN120693506A (zh) * 2022-12-30 2025-09-23 欧普菲有限公司 用于测试光学元件的方法和设备
US20250053099A1 (en) * 2023-08-10 2025-02-13 Applied Materials, Inc. Asymmetric metrology tool for reflective waveguide
CN121816493A (zh) * 2023-08-24 2026-04-07 应用材料公司 用于紧凑型光学计量系统的镜折叠照明
WO2025147256A1 (en) * 2024-01-04 2025-07-10 Applied Materials, Inc. Optical property measurement
EP4624890A1 (en) 2024-03-25 2025-10-01 Trioptics GmbH Optical testing device and method of operating an optical testing device

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0968705A (ja) * 1995-08-31 1997-03-11 Dainippon Printing Co Ltd アライメントマークとアライメント方法
JPH11133309A (ja) * 1997-10-29 1999-05-21 Nippon Telegr & Teleph Corp <Ntt> 顕微鏡装置、寸法測定方法及びその装置
JP2001274941A (ja) * 2000-03-27 2001-10-05 Seiko Epson Corp 画像読取システムの検査装置および検査方法
JP2003075295A (ja) * 2001-09-03 2003-03-12 Seiko Epson Corp レンズの評価方法およびレンズ評価装置
JP2003274087A (ja) * 2002-03-13 2003-09-26 Seiko Epson Corp 画像読み取り装置のｍｔｆ検査方法
IL148804A (en) * 2002-03-21 2007-02-11 Yaacov Amitai Optical device
JP2006527372A (ja) 2003-06-11 2006-11-30 ソルヴィジョン 感度及びダイナミックレンジを増大させた３ｄ及び２ｄ測定システム及びその方法
US7382356B2 (en) 2003-09-15 2008-06-03 Sharper Image Corp. Input unit for games and musical keyboards
DE602005023740D1 (de) * 2004-06-18 2010-11-04 Nippon Kogaku Kk Belichtungsvorrichtung und belichtungsverfahren
US20070171328A1 (en) * 2005-11-21 2007-07-26 Freeman Mark O Substrate-guided display
TWI407248B (zh) * 2006-12-05 2013-09-01 Ｈｏｙａ股份有限公司 光罩之檢查裝置、光罩之檢查方法、液晶裝置製造用光罩之製造方法以及圖案轉印方法
JP2008249921A (ja) * 2007-03-30 2008-10-16 Advanced Mask Inspection Technology Kk レチクル欠陥検査装置およびレチクル欠陥検査方法
JP5064116B2 (ja) * 2007-05-30 2012-10-31 Ｈｏｙａ株式会社 フォトマスクの検査方法、フォトマスクの製造方法及び電子部品の製造方法
US8406859B2 (en) * 2008-08-10 2013-03-26 Board Of Regents, The University Of Texas System Digital light processing hyperspectral imaging apparatus
SG10201505017PA (en) 2010-07-16 2015-08-28 Azores And Rudolph Technologies Inc Projection system with metrology
US8760624B2 (en) * 2010-07-16 2014-06-24 Rudolph Technologies, Inc. System and method for estimating field curvature
US8994918B2 (en) * 2010-10-21 2015-03-31 Nikon Corporation Apparatus and methods for measuring thermally induced reticle distortion
DE102012017920B4 (de) * 2012-09-11 2023-11-30 Carl Zeiss Microscopy Gmbh Optikanordnung und Lichtmikroskop
KR102059026B1 (ko) * 2012-11-26 2019-12-26 삼성디스플레이 주식회사 표시 기판의 얼라인 장치 및 방법
JP6201836B2 (ja) * 2014-03-14 2017-09-27 ソニー株式会社 光学装置及びその組立方法、ホログラム回折格子、表示装置並びにアライメント装置
JP6417589B2 (ja) * 2014-10-29 2018-11-07 セイコーエプソン株式会社 光学素子、電気光学装置、装着型表示装置および光学素子の製造方法
JP6459082B2 (ja) * 2014-12-24 2019-01-30 株式会社ニコン 計測装置及び計測方法、露光装置及び露光方法、並びにデバイス製造方法
JP6895451B2 (ja) * 2016-03-24 2021-06-30 ディジレンズ インコーポレイテッド 偏光選択ホログラフィー導波管デバイスを提供するための方法および装置
US10768404B2 (en) * 2017-03-22 2020-09-08 Mitutoyo Corporation Modulation monitoring system for use with an imaging system that includes a high speed periodically modulated variable focal length lens
KR102077614B1 (ko) * 2017-08-18 2020-02-17 주식회사 엘지화학 복수 패턴 영역을 가지는 모듈의 제조방법, 그 제조방법에 따른 복수 패턴 영역을 가지는 모듈, 및 회절격자모듈 또는 회절격자모듈용 몰드의 제조방법
US11314174B2 (en) * 2017-09-11 2022-04-26 Asml Netherlands B.V. Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method
US12092836B2 (en) * 2018-10-26 2024-09-17 Viavi Solutions Inc. Optical element and optical system
JP7786946B2 (ja) 2018-11-07 2025-12-16 アプライド マテリアルズ インコーポレイテッド 導波計測のための方法及び装置
JP2020122930A (ja) * 2019-01-31 2020-08-13 キヤノン株式会社 計測装置、露光装置及び物品の製造方法
US11567263B2 (en) * 2019-04-19 2023-01-31 Ase Sailing, Inc. Optical targeting device
DK3789809T3 (da) * 2019-09-03 2026-03-23 Asml Netherlands Bv Anordning til kollimering af bredbåndsstråling
US20220335649A1 (en) * 2019-10-30 2022-10-20 Hewlett-Packard Development Company, L.P. Camera pose determinations with depth
US11496988B2 (en) 2019-12-16 2022-11-08 Qualcomm Incorporated Signaling details for PRS stitching for positioning in a wireless network

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