JP7676201B2 - 波面計測装置、波面計測方法、並びに、光学系および光学素子の製造方法 - Google Patents

波面計測装置、波面計測方法、並びに、光学系および光学素子の製造方法 Download PDF

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JP7676201B2
JP7676201B2 JP2021065697A JP2021065697A JP7676201B2 JP 7676201 B2 JP7676201 B2 JP 7676201B2 JP 2021065697 A JP2021065697 A JP 2021065697A JP 2021065697 A JP2021065697 A JP 2021065697A JP 7676201 B2 JP7676201 B2 JP 7676201B2
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light
wavefront
optical system
measuring device
unit
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JP2022161124A (ja
JP2022161124A5 (https=
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智洋 杉本
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Canon Inc
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Canon Inc
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JP2021065697A 2021-04-08 2021-04-08 波面計測装置、波面計測方法、並びに、光学系および光学素子の製造方法 Active JP7676201B2 (ja)

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JP2022161124A5 JP2022161124A5 (https=) 2024-04-08
JP7676201B2 true JP7676201B2 (ja) 2025-05-14

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US12498293B2 (en) * 2023-03-20 2025-12-16 Mloptic Corp. Multi-configurable wavefront tester

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002162317A (ja) 2000-11-28 2002-06-07 Mitsubishi Electric Corp 波面計測装置
JP2003322590A (ja) 2002-04-30 2003-11-14 Canon Inc 面形状測定装置
JP2006030016A (ja) 2004-07-16 2006-02-02 Nikon Corp 波面収差測定装置の校正方法、波面収差測定方法、波面収差測定装置、投影光学系の製造方法、投影光学系、投影露光装置の製造方法、投影露光装置、マイクロデバイスの製造方法、及びマイクロデバイス
JP2008277632A (ja) 2007-05-01 2008-11-13 Canon Inc 測定方法、測定装置、露光装置及びデバイス製造方法
WO2012132930A1 (ja) 2011-03-31 2012-10-04 富士フイルム株式会社 レンズ測定装置
JP2019100724A (ja) 2017-11-28 2019-06-24 キヤノン株式会社 計測方法、調整方法、光学素子の製造方法、プログラム、計測装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002162317A (ja) 2000-11-28 2002-06-07 Mitsubishi Electric Corp 波面計測装置
JP2003322590A (ja) 2002-04-30 2003-11-14 Canon Inc 面形状測定装置
JP2006030016A (ja) 2004-07-16 2006-02-02 Nikon Corp 波面収差測定装置の校正方法、波面収差測定方法、波面収差測定装置、投影光学系の製造方法、投影光学系、投影露光装置の製造方法、投影露光装置、マイクロデバイスの製造方法、及びマイクロデバイス
JP2008277632A (ja) 2007-05-01 2008-11-13 Canon Inc 測定方法、測定装置、露光装置及びデバイス製造方法
WO2012132930A1 (ja) 2011-03-31 2012-10-04 富士フイルム株式会社 レンズ測定装置
JP2019100724A (ja) 2017-11-28 2019-06-24 キヤノン株式会社 計測方法、調整方法、光学素子の製造方法、プログラム、計測装置

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