JP7515885B2 - 定量分析装置、方法およびプログラムならびに製造管理システム - Google Patents

定量分析装置、方法およびプログラムならびに製造管理システム Download PDF

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Publication number
JP7515885B2
JP7515885B2 JP2021094383A JP2021094383A JP7515885B2 JP 7515885 B2 JP7515885 B2 JP 7515885B2 JP 2021094383 A JP2021094383 A JP 2021094383A JP 2021094383 A JP2021094383 A JP 2021094383A JP 7515885 B2 JP7515885 B2 JP 7515885B2
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test component
calibration curve
sample
scale factor
ray diffraction
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JP2022186254A5 (https=
JP2022186254A (ja
Inventor
貴大 葛巻
哲也 小澤
実希 笠利
章宏 姫田
敦司 大渕
貴之 紺谷
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Rigaku Corp
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Rigaku Corp
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Priority to JP2021094383A priority Critical patent/JP7515885B2/ja
Priority to CN202210578178.9A priority patent/CN115436406A/zh
Priority to DE102022113192.0A priority patent/DE102022113192A1/de
Priority to US17/831,188 priority patent/US12174131B2/en
Publication of JP2022186254A publication Critical patent/JP2022186254A/ja
Publication of JP2022186254A5 publication Critical patent/JP2022186254A5/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/2055—Analysing diffraction patterns
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q50/00—Information and communication technology [ICT] specially adapted for implementation of business processes of specific business sectors, e.g. utilities or tourism
    • G06Q50/04—Manufacturing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/05—Investigating materials by wave or particle radiation by diffraction, scatter or reflection
    • G01N2223/056—Investigating materials by wave or particle radiation by diffraction, scatter or reflection diffraction
    • G01N2223/0566—Investigating materials by wave or particle radiation by diffraction, scatter or reflection diffraction analysing diffraction pattern
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/306—Accessories, mechanical or electrical features computer control

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  • Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Biochemistry (AREA)
  • Business, Economics & Management (AREA)
  • Engineering & Computer Science (AREA)
  • Economics (AREA)
  • Manufacturing & Machinery (AREA)
  • Human Resources & Organizations (AREA)
  • Marketing (AREA)
  • Primary Health Care (AREA)
  • Strategic Management (AREA)
  • Tourism & Hospitality (AREA)
  • General Business, Economics & Management (AREA)
  • Theoretical Computer Science (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2021094383A 2021-06-04 2021-06-04 定量分析装置、方法およびプログラムならびに製造管理システム Active JP7515885B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2021094383A JP7515885B2 (ja) 2021-06-04 2021-06-04 定量分析装置、方法およびプログラムならびに製造管理システム
CN202210578178.9A CN115436406A (zh) 2021-06-04 2022-05-24 定量分析装置、方法以及程序和制造管理系统
DE102022113192.0A DE102022113192A1 (de) 2021-06-04 2022-05-25 Vorrichtung, verfahren und programm zur quantitativen analyse und herstellungssteuerungssystem
US17/831,188 US12174131B2 (en) 2021-06-04 2022-06-02 Quantitative analysis apparatus, method and program and manufacturing control system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2021094383A JP7515885B2 (ja) 2021-06-04 2021-06-04 定量分析装置、方法およびプログラムならびに製造管理システム

Publications (3)

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JP2022186254A JP2022186254A (ja) 2022-12-15
JP2022186254A5 JP2022186254A5 (https=) 2023-09-04
JP7515885B2 true JP7515885B2 (ja) 2024-07-16

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US (1) US12174131B2 (https=)
JP (1) JP7515885B2 (https=)
CN (1) CN115436406A (https=)
DE (1) DE102022113192A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7833174B2 (ja) * 2022-03-02 2026-03-19 株式会社リガク 混合物の回折パターン分析装置、方法、プログラム及び情報記憶媒体

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005214891A (ja) 2004-01-30 2005-08-11 Mitsubishi Materials Corp セメントの品質予測方法およびセメントの製造管理システム
JP2008241442A (ja) 2007-03-27 2008-10-09 Sumitomo Osaka Cement Co Ltd セメントクリンカ中のｃ３ａおよびｃ４ａｆ含量の決定方法
JP2013068555A (ja) 2011-09-26 2013-04-18 Rigaku Corp Ｘ線回折測定データの解析方法
US20140110590A1 (en) 2012-10-22 2014-04-24 Troxler Electronic Laboratories, Inc. Conveyor system and measuring device for determining water content of a construction material
JP2016166866A (ja) 2015-03-03 2016-09-15 太平洋セメント株式会社 多成分系混合セメントの定量分析方法、および多成分系混合セメントの製造管理システム
WO2019031019A1 (ja) 2017-08-09 2019-02-14 株式会社リガク 結晶相定量分析装置、結晶相定量分析方法、及び結晶相定量分析プログラム

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5259199B2 (ja) 2008-01-15 2013-08-07 株式会社リガク Ｘ線回折定量分析方法、ｘ線回折定量分析装置、アスベストのｘ線回折定量分析方法及びアスベストのｘ線回折定量分析装置
JP7052249B2 (ja) 2017-08-08 2022-04-12 株式会社リコー 画像形成装置、液体を吐出する装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005214891A (ja) 2004-01-30 2005-08-11 Mitsubishi Materials Corp セメントの品質予測方法およびセメントの製造管理システム
JP2008241442A (ja) 2007-03-27 2008-10-09 Sumitomo Osaka Cement Co Ltd セメントクリンカ中のｃ３ａおよびｃ４ａｆ含量の決定方法
JP2013068555A (ja) 2011-09-26 2013-04-18 Rigaku Corp Ｘ線回折測定データの解析方法
US20140110590A1 (en) 2012-10-22 2014-04-24 Troxler Electronic Laboratories, Inc. Conveyor system and measuring device for determining water content of a construction material
JP2016166866A (ja) 2015-03-03 2016-09-15 太平洋セメント株式会社 多成分系混合セメントの定量分析方法、および多成分系混合セメントの製造管理システム
WO2019031019A1 (ja) 2017-08-09 2019-02-14 株式会社リガク 結晶相定量分析装置、結晶相定量分析方法、及び結晶相定量分析プログラム

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US20220390394A1 (en) 2022-12-08
US12174131B2 (en) 2024-12-24
JP2022186254A (ja) 2022-12-15
CN115436406A (zh) 2022-12-06
DE102022113192A1 (de) 2022-12-08

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