JP7486480B2 - 表示装置および電子機器 - Google Patents
表示装置および電子機器 Download PDFInfo
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- JP7486480B2 JP7486480B2 JP2021523124A JP2021523124A JP7486480B2 JP 7486480 B2 JP7486480 B2 JP 7486480B2 JP 2021523124 A JP2021523124 A JP 2021523124A JP 2021523124 A JP2021523124 A JP 2021523124A JP 7486480 B2 JP7486480 B2 JP 7486480B2
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- electrode
- capacitor
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Images
Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
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- G—PHYSICS
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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Description
図2A、図2Bは、キャパシタの構成を説明する図である。
図3A、図3Bは、キャパシタの構成を説明する図である。
図4A乃至図4Cは、画素回路を説明する図である。
図5は、画素回路を説明する図である。
図6は、画素回路の動作を説明するタイミングチャートである。
図7Aは、画素回路を説明する図である。図7Bは、キャパシタの構成を説明する図である。
図8A、図8Bは、画素回路を説明する図である。
図9は、画素回路を説明する図である。
図10は、画素回路を説明する図である。
図11は、画素回路を説明する図である。
図12A、図12Bは、画素レイアウトを説明する図である。
図13A、図13Bは、画素レイアウトを説明する図である。
図14A、図14Bは、画素レイアウトを説明する図である。
図15A乃至図15Cは、画素レイアウトを説明する図である。
図16A、図16Bは、画素レイアウトを説明する図である。
図17A、図17Bは、画素レイアウトを説明する図である。
図18A、図18Bは、画素レイアウトを説明する図である。
図19は、表示装置を説明する図である。
図20A乃至図20Cは、表示装置を説明する図である。
図21A、図21Bは、タッチパネルを説明する図である。
図22A、図22Bは、表示装置を説明する図である。
図23は、表示装置を説明する図である。
図24A、図24Bは、表示装置を説明する図である。
図25A、図25Bは、表示装置を説明する図である。
図26A乃至図26Eは、表示装置を説明する図である。
図27A乃至図27Cは、トランジスタを説明する図である。
図28A乃至図28Cは、トランジスタを説明する図である。
図29A、図29Bは、トランジスタを説明する図である。
図30A乃至図30Fは、電子機器を説明する図である。
本実施の形態では、本発明の一態様である表示装置について、図面を参照して説明する。
本実施の形態では、液晶デバイスを用いた表示装置の構成例と、発光デバイスを用いた表示装置の構成例について説明する。なお、本実施の形態においては、実施の形態1で説明した表示装置の要素、動作および機能の説明は省略する。
本実施の形態では、上記実施の形態に示した各トランジスタに置き換えて用いることのできるトランジスタの一例について、図面を用いて説明する。
図27Aは、ボトムゲート型のトランジスタの一種であるチャネル保護型のトランジスタ810のチャネル長方向の断面図である。図27Aにおいて、トランジスタ810は基板771上に形成されている。また、トランジスタ810は、基板771上に絶縁層772を介して電極746を有する。また、電極746上に絶縁層726を介して半導体層742を有する。電極746はゲート電極として機能できる。絶縁層726はゲート絶縁層として機能できる。
図28Aに例示するトランジスタ842は、トップゲート型のトランジスタの1つである。電極744aおよび電極744bは、絶縁層728および絶縁層729に形成した開口部において半導体層742と電気的に接続する。
本発明の一態様に係る表示装置を用いることができる電子機器として、表示機器、パーソナルコンピュータ、記録媒体を備えた画像記憶装置または画像再生装置、携帯電話、携帯型を含むゲーム機、携帯データ端末、電子書籍端末、ビデオカメラ、デジタルスチルカメラ等のカメラ、ゴーグル型ディスプレイ(ヘッドマウントディスプレイ)、ナビゲーションシステム、音響再生装置(カーオーディオ、デジタルオーディオプレイヤー等)、複写機、ファクシミリ、プリンタ、プリンタ複合機、現金自動預け入れ払い機(ATM)、自動販売機などが挙げられる。これら電子機器の具体例を図30A乃至図30Fに示す。
Claims (8)
- 第1のキャパシタと、第2のキャパシタと、表示素子と、を画素に有し、
前記第1のキャパシタおよび前記第2のキャパシタは、前記表示素子と電気的に接続され、
前記第1のキャパシタは、第1の導電層、第1の誘電体層、第2の導電層が当該順序で積層された構成を有し、
前記第2のキャパシタは、前記第2の導電層、第2の誘電体層、第3の導電層が当該順序で積層された構成を有し、
前記第1のキャパシタと、前記第2のキャパシタは、互いに重なる領域を有し、
前記画素は、さらに第1のトランジスタと、第2のトランジスタと、第3のトランジスタと、を有し、
前記第1のトランジスタのソースまたはドレインの一方は、前記第2の導電層と電気的に接続され、
前記第2のトランジスタのソースまたはドレインの一方および前記第3のトランジスタのソースまたはドレインの一方は、前記第3の導電層と電気的に接続される、表示装置。 - 請求項1において、
前記第2のキャパシタは、前記第1のキャパシタよりも容量値が大きい、表示装置。 - 請求項1又は2において、
前記画素は、前記表示素子として発光素子を有し、
前記画素は、さらに第4のトランジスタと、第5のトランジスタと、を有し
前記第4のトランジスタのゲートは、前記第2の導電層と電気的に接続され、
前記第4のトランジスタのソースまたはドレインの一方、前記第5のトランジスタのソースまたはドレインの一方、および前記発光素子の一方の電極は、前記第1の導電層と電気的に接続される、表示装置。 - 請求項1乃至3のいずれか一項において、
前記画素は、前記表示素子として液晶素子を有し、
前記液晶素子の一方の電極は、前記第2の導電層と電気的に接続される、表示装置。 - 請求項1乃至4のいずれか一項において、
前記第1のトランジスタ乃至前記第3のトランジスタは、チャネル形成領域に金属酸化物を有する、表示装置。 - 請求項1乃至5のいずれか一項において、
前記第2の導電層は、金属酸化物を有する、表示装置。 - 請求項5又は6において、
前記金属酸化物は、Inと、Znと、M(MはAl、Ti、Ga、Ge、Sn、Y、Zr、La、Ce、NdまたはHf)と、を有する、表示装置。 - 請求項1乃至7のいずれか一項に記載の表示装置と、カメラと、を有し、
前記カメラで撮像した画像を前記表示装置で表示する、電子機器。
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Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040183978A1 (en) | 2003-03-20 | 2004-09-23 | Hun Jeoung | Array substrate for in-plane switching liquid crystal display device and method of fabricating the same |
JP2006186320A (ja) | 2004-12-03 | 2006-07-13 | Semiconductor Energy Lab Co Ltd | 半導体装置及びその作製方法、並びに表示装置 |
JP2007123861A (ja) | 2005-09-29 | 2007-05-17 | Semiconductor Energy Lab Co Ltd | 半導体装置及びその作製方法 |
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US20240248355A1 (en) | 2024-07-25 |
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US20220252949A1 (en) | 2022-08-11 |
JPWO2020240329A1 (ja) | 2020-12-03 |
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KR20220013390A (ko) | 2022-02-04 |
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