JP7453312B2 - 3次元ビームを形成するx線源 - Google Patents
3次元ビームを形成するx線源 Download PDFInfo
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- JP7453312B2 JP7453312B2 JP2022169632A JP2022169632A JP7453312B2 JP 7453312 B2 JP7453312 B2 JP 7453312B2 JP 2022169632 A JP2022169632 A JP 2022169632A JP 2022169632 A JP2022169632 A JP 2022169632A JP 7453312 B2 JP7453312 B2 JP 7453312B2
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- 229910052750 molybdenum Inorganic materials 0.000 claims description 8
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 8
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- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 230000001225 therapeutic effect Effects 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
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- 239000012780 transparent material Substances 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 230000005461 Bremsstrahlung Effects 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910001313 Cobalt-iron alloy Inorganic materials 0.000 description 1
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/14—Arrangements for concentrating, focusing, or directing the cathode ray
- H01J35/153—Spot position control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/14—Arrangements for concentrating, focusing, or directing the cathode ray
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/24—Tubes wherein the point of impact of the cathode ray on the anode or anticathode is movable relative to the surface thereof
- H01J35/30—Tubes wherein the point of impact of the cathode ray on the anode or anticathode is movable relative to the surface thereof by deflection of the cathode ray
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/16—Vessels; Containers; Shields associated therewith
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/32—Tubes wherein the X-rays are produced at or near the end of the tube or a part thereof which tube or part has a small cross-section to facilitate introduction into a small hole or cavity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2235/00—X-ray tubes
- H01J2235/08—Targets (anodes) and X-ray converters
- H01J2235/086—Target geometry
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2235/00—X-ray tubes
- H01J2235/16—Vessels
- H01J2235/165—Shielding arrangements
- H01J2235/166—Shielding arrangements against electromagnetic radiation
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- X-Ray Techniques (AREA)
- Radiation-Therapy Devices (AREA)
Description
本出願は、2017年3月31日に出願された米国仮特許出願第62/479,455号の利益を主張し、その全体が参照により本明細書に組み込まれる。
Claims (17)
- 電子ビームを生成するステップ;
前記電子ビームの経路に平面ターゲット要素ウエハを配置し、前記平面ターゲット要素ウエハは前記電子ビームの経路の方向に対して角度のある第1の平面に配置されるステップ;
前記電子ビームと前記平面ターゲット要素ウエハのターゲット層との相互作用の結果としてX線放射を生成するステップ;
前記X線放射を、前記平面ターゲット要素ウエハの面から延びる複数の壁要素を含むビーム遮蔽と相互作用させ、前記複数の壁要素の各壁要素は、
(i)前記平面ターゲット要素ウエハの中心から前記平面ターゲット要素ウエハの周縁またはその近傍の各点に向かう外側へ放射方向に、前記平面ターゲット要素ウエハに隣接して延びる第1の表面を含み、
(ii)前記壁要素が前記第1の平面に直交する第2の平面に配置されるように、前記平面ターゲット要素ウエハの面から延び出す平面構造を含み、および
(iii)前記平面ターゲット要素ウエハの中心で、前記複数の壁要素のうち他の全てに隣接するステップ;
前記電子ビームが前記ターゲット層と交差する位置を選択的に制御することにより、前記X線放射のビーム形状およびビーム方向のうち少なくとも1つを可変に制御するステップ;および
前記ターゲット層が配置された基板層を用いて、前記ターゲット層から離散する熱エネルギーの移動を促進するステップ
を含む、X線光子を生成する方法。 - 前記可変に制御するステップにおいて、前記X線放射は、複数の異なる方向に選択的に変化できかつ向けることができる、3次元形状および最大強度を含む、請求項1に記載の方法。
- 前記基板層は、ダイヤモンド、ベリリウム、アルミニウム、サファイア、およびセラミックのうちの少なくとも1つを含むように選択される、請求項1に記載の方法。
- 次の(i)から(iii)により、第1および第2のX線ビームセグメントを同時に形成することをさらに含む、請求項1に記載の方法:
(i)前記平面ターゲット要素ウエハの異なる第1および第2のターゲットセグメントに、前記電子ビームを相互作用させ、
(ii)前記ビーム遮蔽の壁要素の第1の対に、前記第1のターゲットセグメントに関連付けられた前記X線放射の第1の部分を相互作用させ、および
(iii)前記ビーム遮蔽の壁要素の前記第1の対とは異なる第2の対に、前記X線放射の第2の部分を相互作用させる。 - 前記ターゲット層は、前記基板層に配置されたスパッタ材料である、請求項1に記載の方法。
- モリブデン、金、およびタングステンからなる群より選ばれる材料から前記ターゲット層を形成するステップをさらに含む、請求項1に記載の方法。
- X線光子を透過する材料から前記基板層を形成することにより、前記平面ターゲット要素ウエハの反対側の主面から離れて延びる方向にX線光子の発光を促進するステップをさらに含む、請求項1に記載の方法。
- 電子ビームを生成するステップ;
前記電子ビームの経路に平面ターゲット要素ウエハを配置し、前記平面ターゲット要素ウエハは前記電子ビームの経路の方向に対して角度のある第1の平面に配置されるステップ;
前記電子ビームと前記平面ターゲット要素ウエハのターゲット層との相互作用の結果としてX線光子を生成するステップ;
前記X線光子を、前記平面ターゲット要素ウエハの面から延びる複数の壁要素を含むビーム遮蔽と相互作用させ、前記複数の壁要素の各壁要素は、
(i)前記平面ターゲット要素ウエハの中心から前記平面ターゲット要素ウエハの周縁またはその近傍の各点に向かう外側へ放射方向に、前記平面ターゲット要素ウエハに隣接して延びる第1の表面を含み、
(ii)前記壁要素が前記第1の平面に直交する第2の平面に配置されるように、前記平面ターゲット要素ウエハの面から延び出す平面構造を含み、および
(iii)前記平面ターゲット要素ウエハの中心で、前記複数の壁要素のうち他の全てに隣接するステップ;
前記電子ビームが前記ターゲット層と交差する位置を選択的に制御することにより、前記X線光子により形成されるビーム形状およびビーム方向のうち少なくとも1つを可変に制御するステップ;および
前記ターゲット層が配置された、ダイヤモンドで形成された基板層を用いて、前記ターゲット層から離散する熱エネルギーの移動を促進するステップ
を含む、X線光子を生成する方法。 - ターゲット層および基板層を含み、電子ビームの経路の方向に対して角度のある第1の平面に配置される平面ウエハ;
高い原子数を持つ元素から構成される前記ターゲット層;
X線光子を透過し、前記ターゲット層を支持するように配置された基板層;および
前記平面ウエハの面から延びる複数の壁要素を含み、前記複数の壁要素の各壁要素は、
(i)前記平面ウエハの中心から前記平面ウエハの周縁またはその近傍の各点に向かう外側へ放射方向に、前記平面ウエハに隣接して延びる第1の表面を含み、
(ii)前記壁要素が前記第1の平面に直交する第2の平面に配置されるように、前記平面ウエハの面から延び出す平面構造を含み、および
(iii)前記平面ウエハの中心で、前記複数の壁要素のうち他の全てに隣接するビーム遮蔽
を含み、
前記基板層は、前記ターゲット層から離散する熱エネルギーの移動を促進するための高い熱伝導率を持つ材料から構成され、前記ビーム遮蔽は、複数の異なる場所で前記ターゲット層と交差する前記電子ビームに応答して、前記ターゲット層により生成されたX線ビームの形状および方向のうち少なくとも1つの可変な制御を促進するために配置された、X線ターゲット。 - 前記高い原子数は21以上である、請求項9に記載のX線ターゲット。
- 前記ターゲット層は、モリブデン、金、およびタングステンからなる群より選ばれる材料から構成される、請求項10に記載のX線ターゲット。
- 前記基板層は、ベリリウム、アルミニウム、サファイア、セラミック、およびダイヤモンドからなる群より選ばれる材料から形成される、請求項9に記載のX線ターゲット。
- 前記基板層が300~500μmの厚さを有する、請求項9に記載のX線ターゲット。
- 前記ターゲット層が2~50μmの厚さを有する、請求項9に記載のX線ターゲット。
- ターゲット層および基板層を含み、電子ビームの経路の方向に対して角度のある第1の平面に配置される平面ウエハ;
21より大きい原子数を持つ元素から構成される前記ターゲット層;
ダイヤモンドから構成された前記基板層;および
前記平面ウエハの面から延びる複数の壁要素を含み、前記複数の壁要素の各壁要素は、
(i)前記平面ウエハの中心から前記平面ウエハの周縁またはその近傍の各点に向かう外側へ放射方向に、前記平面ウエハに隣接して延びる第1の表面を含み、
(ii)前記壁要素が前記第1の平面に直交する第2の平面に配置されるように、前記平面ウエハの面から延び出す平面構造を含み、および
(iii)前記平面ウエハの中心で、前記複数の壁要素のうち他の全てに隣接するビーム遮蔽
を含み、
前記基板層は、前記ターゲット層を支持し、前記ターゲット層から離散する熱エネルギーの移動を促進するように配置され、前記ビーム遮蔽は、前記電子ビームが前記ターゲット層と交差する場所に応答する前記ターゲット層により生成されたX線ビームの形状および方向のうち少なくとも1つの可変な制御を促進するように配置された、X線ターゲット。 - 前記基板層が300~500μmの厚さを有する、請求項15に記載のターゲット。
- 前記ターゲット層が2~50μmの厚さを有する、請求項16に記載のターゲット。
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JP2024034091A JP2024075614A (ja) | 2017-03-31 | 2024-03-06 | 3次元ビームを形成するx線源 |
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US201762479455P | 2017-03-31 | 2017-03-31 | |
US62/479,455 | 2017-03-31 | ||
PCT/US2018/025438 WO2018183873A1 (en) | 2017-03-31 | 2018-03-30 | Three-dimensional beam forming x-ray source |
JP2019554337A JP7170979B2 (ja) | 2017-03-31 | 2018-03-30 | 3次元ビームを形成するx線源 |
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US (2) | US10607802B2 (ja) |
EP (1) | EP3544678A4 (ja) |
JP (3) | JP7170979B2 (ja) |
KR (1) | KR102488780B1 (ja) |
CN (1) | CN110382047B (ja) |
BR (1) | BR112019020536A2 (ja) |
CA (2) | CA3209805A1 (ja) |
IL (2) | IL310828A (ja) |
MX (1) | MX2019011738A (ja) |
RU (1) | RU2019130556A (ja) |
WO (1) | WO2018183873A1 (ja) |
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EP3544678A1 (en) | 2019-10-02 |
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