JP7438323B2 - Ledアレイ - Google Patents
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- JP7438323B2 JP7438323B2 JP2022503482A JP2022503482A JP7438323B2 JP 7438323 B2 JP7438323 B2 JP 7438323B2 JP 2022503482 A JP2022503482 A JP 2022503482A JP 2022503482 A JP2022503482 A JP 2022503482A JP 7438323 B2 JP7438323 B2 JP 7438323B2
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- 239000004065 semiconductor Substances 0.000 claims description 54
- 239000000463 material Substances 0.000 claims description 32
- 238000000034 method Methods 0.000 claims description 29
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 239000010410 layer Substances 0.000 description 181
- 238000005530 etching Methods 0.000 description 13
- 229910002704 AlGaN Inorganic materials 0.000 description 11
- 230000000694 effects Effects 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 229910052594 sapphire Inorganic materials 0.000 description 6
- 239000010980 sapphire Substances 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000003491 array Methods 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 4
- 239000002800 charge carrier Substances 0.000 description 4
- 239000003989 dielectric material Substances 0.000 description 4
- 229910052738 indium Inorganic materials 0.000 description 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 238000001312 dry etching Methods 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 230000037230 mobility Effects 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
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- 238000000151 deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
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- 238000000605 extraction Methods 0.000 description 2
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- 238000000465 moulding Methods 0.000 description 2
- 239000004038 photonic crystal Substances 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 230000005533 two-dimensional electron gas Effects 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- 229910001020 Au alloy Inorganic materials 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
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- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/15—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission
- H01L27/153—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars
- H01L27/156—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars two-dimensional arrays
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/08—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a plurality of light emitting regions, e.g. laterally discontinuous light emitting layer or photoluminescent region integrated within the semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
- H01L33/46—Reflective coating, e.g. dielectric Bragg reflector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0062—Processes for devices with an active region comprising only III-V compounds
- H01L33/0075—Processes for devices with an active region comprising only III-V compounds comprising nitride compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/10—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a light reflecting structure, e.g. semiconductor Bragg reflector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/16—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous
- H01L33/18—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous within the light emitting region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/58—Optical field-shaping elements
- H01L33/60—Reflective elements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0062—Processes for devices with an active region comprising only III-V compounds
- H01L33/0066—Processes for devices with an active region comprising only III-V compounds with a substrate not being a III-V compound
- H01L33/007—Processes for devices with an active region comprising only III-V compounds with a substrate not being a III-V compound comprising nitride compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/16—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
- H01L33/32—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table containing nitrogen
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Led Devices (AREA)
Description
方法またはLEDアレイは、任意の作動可能な組み合わせで、付随する図面を参照して今から説明される本発明の好ましい実施形態の任意の1つまたは複数の特徴をさらに含み得る。
Claims (15)
- 発光ダイオード(LED)アレイを製造する方法であって、半導体材料の複数の層を形成するステップと、前記複数の層を覆う誘電マスク層を形成するステップであって、前記誘電マスク層は、前記誘電マスク層を貫通する孔のアレイを有し、各孔は、半導体材料の前記複数の層のうちの1つの層の区域を露出させる、ステップと、前記孔の各々の中で、ある波長の範囲にわたって光を発光するように配置構成されるLED構造を成長させるステップと、を含み、前記複数の層のうちの少なくとも一部は、前記波長の範囲の少なくとも一部の光を反射させるように配置構成される分布ブラッグ反射器(DBR)を形成し、
前記半導体材料の前記複数の層のうち、前記DBRを形成する層の上に形成された上側半導体層の各区域が露出され、
前記LED構造は、露出された前記上側半導体層の前記各区域の上で成長される、方法。 - 前記複数の層のうちの少なくとも前記上側半導体層は、前記LED構造のうちの少なくとも一部をともに接続する電気的コンタクトを形成する、請求項1に記載の方法。
- 前記電気的コンタクトは、前記DBRと前記誘電層との間に形成される、請求項2に記載の方法。
- 前記電気的コンタクトは、ドープされた半導体材料により形成される、請求項2または3に記載の方法。
- 前記DBRを形成するステップは、少なくとも2つの対の層を形成するステップであって、各々の対は、第1の材料の第1の層と、第2の材料の第2の層とを含む、ステップを含む、請求項1から4のいずれか一項に記載の方法。
- 各々の対の層のうちの一方は、ドープされた半導体材料により形成され、前記ドープされた半導体材料の多孔性を増大するために電気化学的にエッチングされる、請求項5に記載の方法。
- 各々の対の層のうちの他方は、アンドープ半導体材料により形成される、請求項6に記載の方法。
- 複数の半導体層と、前記半導体層の上方に広がり、LED構造のアレイを有する、誘電層とを含むLEDアレイであって、前記LED構造は、前記誘電層を貫通して延び、ある波長の範囲にわたって光を発光するように配置構成され、前記複数の層のうちの少なくとも一部は、前記波長の範囲の少なくとも一部の光を反射させるように配置構成される分布ブラッグ反射器(DBR)を形成し、
前記誘電層は、前記誘電層を貫通する孔のアレイを有し、各孔は、前記複数の半導体層のうちの1つの層の区域を露出させ、
前記複数の半導体層のうち、前記DBRを形成する半導体層の上に形成された上側半導体層の各区域が露出され、
前記LED構造は、前記孔の各々の中において、露出された前記上側半導体層の前記各区域の上に形成される、LEDアレイ。 - 前記複数の層のうちの少なくとも前記上側半導体層は、前記LED構造のうちの少なくとも一部をともに接続する電気的コンタクト層を形成する、請求項8に記載のLEDアレイ。
- 前記電気的コンタクト層は、前記DBRと前記誘電層との間にある、請求項9に記載のLEDアレイ。
- 前記コンタクト層の上に形成される電極をさらに含む、請求項9または10に記載のLEDアレイ。
- 前記電気的コンタクトは、ドープされた半導体材料を含む、請求項9から11のいずれか一項に記載のLEDアレイ。
- 前記DBRは、少なくとも2つの対の層を含み、各々の対は、第1の材料の第1の層と、第2の材料の第2の層とを含む、請求項8から12のいずれか一項に記載のLEDアレイ。
- 各々の対の層のうちの一方は、ドープされた半導体材料であって、前記ドープされた半導体材料の多孔性を増大するために電気化学的にエッチングされた、ドープされた半導体材料から形成される、請求項13に記載のLEDアレイ。
- 各々の対の層のうちの他方は、アンドープ半導体材料により形成される、請求項14に記載のLEDアレイ。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2024019309A JP2024056843A (ja) | 2019-07-19 | 2024-02-13 | Ledアレイ |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1910352.2 | 2019-07-19 | ||
GBGB1910352.2A GB201910352D0 (en) | 2019-07-19 | 2019-07-19 | LED Arrays |
PCT/EP2020/069917 WO2021013642A1 (en) | 2019-07-19 | 2020-07-14 | Led arrays |
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JP2024019309A Division JP2024056843A (ja) | 2019-07-19 | 2024-02-13 | Ledアレイ |
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JP2022541558A JP2022541558A (ja) | 2022-09-26 |
JP7438323B2 true JP7438323B2 (ja) | 2024-02-26 |
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JP2022503482A Active JP7438323B2 (ja) | 2019-07-19 | 2020-07-14 | Ledアレイ |
JP2024019309A Pending JP2024056843A (ja) | 2019-07-19 | 2024-02-13 | Ledアレイ |
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Country Status (6)
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US (1) | US20220278165A1 (ja) |
EP (1) | EP4000106A1 (ja) |
JP (2) | JP7438323B2 (ja) |
CN (1) | CN114521296A (ja) |
GB (1) | GB201910352D0 (ja) |
WO (1) | WO2021013642A1 (ja) |
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US11652188B2 (en) * | 2019-10-28 | 2023-05-16 | Unm Rainforest Innovations | Method of fabricating broad-band lattice-matched omnidirectional distributed Bragg reflectors using random nanoporous structures |
KR20210065670A (ko) * | 2019-11-27 | 2021-06-04 | 연세대학교 산학협력단 | 마이크로 구조체 어레이 및 그 제조 방법, 마이크로 발광 다이오드 및 그 제조 방법과 표시 장치 |
US20220208848A1 (en) * | 2020-12-30 | 2022-06-30 | Facebook Technologies, Llc | Engineered wafer with selective porosification for multi-color light emission |
DE102021134107A1 (de) * | 2021-12-21 | 2023-06-22 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Verfahren zum herstellen von mikro-halbleiter-leuchtdioden-strukturen und halbleiter-leuchtdiode |
CN117153961B (zh) * | 2023-10-31 | 2024-02-13 | 季华实验室 | HEMT驱动MicroLED一体化背板及其制作方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2007035936A (ja) | 2005-07-27 | 2007-02-08 | Nippon Telegr & Teleph Corp <Ntt> | 半導体発光素子 |
WO2019063957A1 (en) | 2017-09-27 | 2019-04-04 | Cambridge Enterprise Ltd | METHOD FOR MAKING POROUS MATERIAL AND SEMICONDUCTOR STRUCTURE |
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WO2011162715A1 (en) * | 2010-06-24 | 2011-12-29 | Glo Ab | Substrate with buffer layer for oriented nanowire growth |
KR102425935B1 (ko) * | 2014-09-30 | 2022-07-27 | 예일 유니버시티 | GaN 수직 마이크로캐비티 표면 방출 레이저(VCSEL)를 위한 방법 |
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2019
- 2019-07-19 GB GBGB1910352.2A patent/GB201910352D0/en not_active Ceased
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2020
- 2020-07-14 US US17/597,699 patent/US20220278165A1/en active Pending
- 2020-07-14 WO PCT/EP2020/069917 patent/WO2021013642A1/en unknown
- 2020-07-14 EP EP20753678.0A patent/EP4000106A1/en active Pending
- 2020-07-14 JP JP2022503482A patent/JP7438323B2/ja active Active
- 2020-07-14 CN CN202080067170.5A patent/CN114521296A/zh active Pending
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- 2024-02-13 JP JP2024019309A patent/JP2024056843A/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2007035936A (ja) | 2005-07-27 | 2007-02-08 | Nippon Telegr & Teleph Corp <Ntt> | 半導体発光素子 |
WO2019063957A1 (en) | 2017-09-27 | 2019-04-04 | Cambridge Enterprise Ltd | METHOD FOR MAKING POROUS MATERIAL AND SEMICONDUCTOR STRUCTURE |
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Publication number | Publication date |
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US20220278165A1 (en) | 2022-09-01 |
JP2022541558A (ja) | 2022-09-26 |
JP2024056843A (ja) | 2024-04-23 |
EP4000106A1 (en) | 2022-05-25 |
WO2021013642A1 (en) | 2021-01-28 |
CN114521296A (zh) | 2022-05-20 |
GB201910352D0 (en) | 2019-09-04 |
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