JP7433954B2 - レーザ干渉装置 - Google Patents

レーザ干渉装置 Download PDF

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Publication number
JP7433954B2
JP7433954B2 JP2020020561A JP2020020561A JP7433954B2 JP 7433954 B2 JP7433954 B2 JP 7433954B2 JP 2020020561 A JP2020020561 A JP 2020020561A JP 2020020561 A JP2020020561 A JP 2020020561A JP 7433954 B2 JP7433954 B2 JP 7433954B2
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Japan
Prior art keywords
light
measurement
light guide
guide section
path
Prior art date
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Application number
JP2020020561A
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English (en)
Japanese (ja)
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JP2021124483A5 (enExample
JP2021124483A (ja
Inventor
雄一郎 横山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitutoyo Corp
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Mitutoyo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Mitutoyo Corp filed Critical Mitutoyo Corp
Priority to JP2020020561A priority Critical patent/JP7433954B2/ja
Priority to US17/160,992 priority patent/US11378386B2/en
Publication of JP2021124483A publication Critical patent/JP2021124483A/ja
Publication of JP2021124483A5 publication Critical patent/JP2021124483A5/ja
Application granted granted Critical
Publication of JP7433954B2 publication Critical patent/JP7433954B2/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/026—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness by measuring distance between sensor and object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02049—Interferometers characterised by particular mechanical design details
    • G01B9/02052—Protecting, e.g. shock absorbing, arrangements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B5/00—Measuring arrangements characterised by the use of mechanical techniques
    • G01B5/0011—Arrangements for eliminating or compensation of measuring errors due to temperature or weight
    • G01B5/0014—Arrangements for eliminating or compensation of measuring errors due to temperature or weight due to temperature
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02019—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different points on same face of object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02021—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different faces of object, e.g. opposite faces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02049—Interferometers characterised by particular mechanical design details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
    • G02B27/285—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining comprising arrays of elements, e.g. microprisms

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
JP2020020561A 2020-02-10 2020-02-10 レーザ干渉装置 Active JP7433954B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2020020561A JP7433954B2 (ja) 2020-02-10 2020-02-10 レーザ干渉装置
US17/160,992 US11378386B2 (en) 2020-02-10 2021-01-28 Laser interference device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020020561A JP7433954B2 (ja) 2020-02-10 2020-02-10 レーザ干渉装置

Publications (3)

Publication Number Publication Date
JP2021124483A JP2021124483A (ja) 2021-08-30
JP2021124483A5 JP2021124483A5 (enExample) 2023-02-17
JP7433954B2 true JP7433954B2 (ja) 2024-02-20

Family

ID=77177055

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020020561A Active JP7433954B2 (ja) 2020-02-10 2020-02-10 レーザ干渉装置

Country Status (2)

Country Link
US (1) US11378386B2 (enExample)
JP (1) JP7433954B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023100358A (ja) * 2022-01-06 2023-07-19 株式会社ミツトヨ レーザ干渉装置
CN115752831A (zh) * 2022-11-25 2023-03-07 合肥维信诺科技有限公司 一种应力测量装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002510794A (ja) 1998-04-04 2002-04-09 ドクトル・ヨハネス・ハイデンハイン・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング 位置測定装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3471239A (en) * 1966-01-10 1969-10-07 Singer General Precision Interferometric apparatus
JPH08304721A (ja) * 1995-05-10 1996-11-22 Nikon Corp 走査光学装置
EP1031868B1 (de) * 1999-02-26 2003-05-14 Dr. Johannes Heidenhain GmbH Kompensierter Parallel-Strahlteiler mit zwei Platten sowie Interferometer
JP3400393B2 (ja) 1999-10-13 2003-04-28 株式会社ミツトヨ レーザ干渉装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002510794A (ja) 1998-04-04 2002-04-09 ドクトル・ヨハネス・ハイデンハイン・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング 位置測定装置

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US11378386B2 (en) 2022-07-05
US20210247176A1 (en) 2021-08-12
JP2021124483A (ja) 2021-08-30

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