JP7412357B2 - 光学的配置とレーザシステム - Google Patents
光学的配置とレーザシステム Download PDFInfo
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- JP7412357B2 JP7412357B2 JP2020568302A JP2020568302A JP7412357B2 JP 7412357 B2 JP7412357 B2 JP 7412357B2 JP 2020568302 A JP2020568302 A JP 2020568302A JP 2020568302 A JP2020568302 A JP 2020568302A JP 7412357 B2 JP7412357 B2 JP 7412357B2
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- 230000003287 optical effect Effects 0.000 title claims description 146
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/006—Systems in which light light is reflected on a plurality of parallel surfaces, e.g. louvre mirrors, total internal reflection [TIR] lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
- B23K26/0608—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams in the same heat affected zone [HAZ]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0643—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising mirrors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0648—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/073—Shaping the laser spot
- B23K26/0738—Shaping the laser spot into a linear shape
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/14—Beam splitting or combining systems operating by reflection only
- G02B27/145—Beam splitting or combining systems operating by reflection only having sequential partially reflecting surfaces
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0972—Prisms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/0988—Diaphragms, spatial filters, masks for removing or filtering a part of the beam
Description
Claims (11)
- 入射レーザ光(20)を、伝搬方向(z)に沿って伝搬する線状の出射光(28,40)であって作業平面(42)において、線(x)の方向に沿って延びる線状のビーム断面を有する出射光(28,40)に変換するための光学的配置(32)であって、
入射レーザビーム(20)が入射する入射開口(50)、及び開口長手方向(58)に沿って延びる出射開口(52)を有する再形成光学ユニット(22)であって、前記入射開口(50)を通って入射した入射レーザ光(20)を、前記出射開口(52)を通って出射されるビームパケット(24)に変換する再形成光学ユニット(22)と、
前記ビームパケット(24)を線状の出射ビーム(40)に変換するように設計され、前記ビームパケット(24)の異なるビームセグメント(56a~56f)が、線(x)の方向に沿って相互混合され、且つ重畳される均質化光学ユニット(26)と、
を有し、
前記開口長手方向(58)が、伝搬方向(z)を中心に前記線(x)の方向に対して回転角(α)だけ回転しており、
前記回転角(α)は、前記線(x)の方向と前記伝搬方向(z)に垂直な軸(y)によって形成される平面内に存在し、
前記回転角(α)は、前記均質化光学ユニット(26)を通過し、前記線(x)の方向に対して交差して重ね合わされることで形成された、前記ビームセグメント(56a~56f)に基づいて生じる出射光(28)の強度曲線の側面(76)の前記軸(y)に沿った勾配に影響を及ぼすように調整されることを特徴とする
光学的配置(32)。 - 前記回転角(α)は0度より大きく90度未満である、請求項1に記載の光学的配置(32)。
- 前記再形成光学ユニット(22)のために調整可能な保持装置(60)が設けられ、ここで、前記保持装置(60)は、前記回転角(α)が調整可能なように設計されている請求項1又は請求項2に記載の光学的配置(32)。
- 前記再形成光学ユニット(22)は、高い空間コヒーレンスを有する入射レーザビーム(20)が前記入射開口(50)から入射すると、前記出射開口(52)から出射するビームパケット(24)の空間コヒーレンスが十分に減少し、インコヒーレントとなる請求項1~3の何れか1項に記載の光学的配置(32)。
- 前記再形成光学ユニット(22)は、入射レーザビーム(20)の隣接するビームセグメントが前記再形成光学ユニット(22)を通過する際にビームパケット(24)のビームセグメント(56a~56c)に再配置されるように設計され、ここで、前記ビームパケット(24)の隣接するビームセグメントは、前記再形成光学ユニット(22)を通過する際に異なる光路を通過して前記ビームパケット(24)の空間コヒーレンスが減少し、インコヒーレントとなる請求項1~4の何れか1項に記載の光学的配置(32)。
- 前記再形成光学ユニットは、モノリシックなプレート状の透明材料(44)から形成され、前記透明材料(44)は、プレートの前面(46)の領域と、前記前面(46)と実質的に平行に延在するプレートの後面(48)の領域とを有し、前記プレートの前面(46)の領域は、前記入射開口(50)を提供し、前記プレートの後面(48)の領域は、前記出射開口(52)を提供し、前記再形成光学ユニット(22)は、前記入射開口(50)を通って結合した後の入射レーザビーム(20)のビームセグメント(54a~54c)を、前記プレートの前面(46)及び前記プレートの後面(48)の反射によって前記出射開口(52)に導くように設計されている請求項5に記載の光学的配置(32)。
- 前記出射開口(52)は、長方形であって、長方形の長辺が、前記開口長手方向(58)に平行に延在していることを特徴とする、請求項1~6の何れか1項に記載の光学的配置(32)。
- 前記出射開口(52)は、台形又は多角形又は帯状又は自由形状に延在し、好ましい長手方向が前記開口長手方向(58)に平行に延在する、請求項1~6のいずれか1項に記載の光学的配置(32)。
- 前記均質化光学ユニット(26)は、前記線(x)の方向に対して垂直であり、前記作業平面(42)内又は前記作業平面(42)からオフセットされた焦点面内の伝搬方向(z)に対して垂直である軸(y)に関して、前記ビームパケット(24)を集束及び/又は光学的に結像する横方向光学ユニット(66)を備える、請求項1~8の何れか1項に記載の光学的配置(32)。
- 前記均質化光学ユニット(26)は、前記線(x)の方向に垂直かつ前記伝搬方向(z)に垂直な軸(y)に関して高空間周波数をフィルタリングする光学ローパスフィルタ(74)を備えることを特徴とする請求項1~9の何れか1項に記載の光学的配置(32)。
- ビーム断面が線状の強度プロファイル(I)を有する強度分布(L)を備えるビームを発生させるためのレーザシステム(10)であって、
レーザビーム(16)を放射するためのレーザ光源(14)と、
入射開口(50)に向かう入射レーザビーム(30)がレーザ光源(14)によって供給されるように配置された請求項1~10の何れか1項に記載の光学的配置(32)と、を備えるレーザシステム(10)。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102018115126.8A DE102018115126B4 (de) | 2018-06-22 | 2018-06-22 | Optische Anordnung zur Umwandlung eines Eingangslaserstahls in einen linienartigen Ausgangsstrahl sowie Lasersystem mit einer solchen optischen Anordnung |
DE102018115126.8 | 2018-06-22 | ||
PCT/EP2019/064581 WO2019243042A1 (de) | 2018-06-22 | 2019-06-05 | Optische anordnung und lasersystem |
Publications (2)
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JP2021527845A JP2021527845A (ja) | 2021-10-14 |
JP7412357B2 true JP7412357B2 (ja) | 2024-01-12 |
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JP2020568302A Active JP7412357B2 (ja) | 2018-06-22 | 2019-06-05 | 光学的配置とレーザシステム |
Country Status (7)
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US (1) | US11536979B2 (ja) |
JP (1) | JP7412357B2 (ja) |
KR (1) | KR20210023973A (ja) |
CN (1) | CN112424666B (ja) |
DE (1) | DE102018115126B4 (ja) |
TW (1) | TWI778270B (ja) |
WO (1) | WO2019243042A1 (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
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DE102020108647A1 (de) * | 2020-03-30 | 2021-09-30 | Trumpf Laser- Und Systemtechnik Gmbh | Optische Anordnung und Lasersystem |
DE102020108648A1 (de) * | 2020-03-30 | 2021-09-30 | Trumpf Laser- Und Systemtechnik Gmbh | Optische Anordnung und Lasersystem |
DE102020122484B4 (de) | 2020-08-27 | 2022-03-24 | Trumpf Laser- Und Systemtechnik Gmbh | Strahltransformator |
DE102020126267A1 (de) | 2020-10-07 | 2022-04-07 | Trumpf Laser- Und Systemtechnik Gmbh | Vorrichtung zum Erzeugen einer Laserlinie auf einer Arbeitsebene |
DE102021133903A1 (de) | 2021-12-20 | 2023-06-22 | Trumpf Laser- Und Systemtechnik Gmbh | Vorrichtung zum Erzeugen einer definierten Laserlinie auf einer Arbeitsebene |
DE102022105342A1 (de) | 2022-03-08 | 2023-09-14 | Trumpf Laser- Und Systemtechnik Gmbh | Vorrichtung zum Erzeugen einer definierten Laserlinie auf einer Arbeitsebene |
DE102022108300A1 (de) | 2022-04-06 | 2023-10-12 | Trumpf Laser- Und Systemtechnik Gmbh | Vorrichtung zum Erzeugen einer definierten Laserlinie auf einer Arbeitsebene |
DE102022118491A1 (de) | 2022-07-25 | 2024-01-25 | Trumpf Laser- Und Systemtechnik Gmbh | Optische Anordnung zur Umwandlung eines Eingangslaserstrahls in einen linienartigen Ausgangsstrahls |
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KR20050091488A (ko) * | 2004-03-12 | 2005-09-15 | 주식회사 유피케미칼 | 세라믹 또는 금속박막 증착용 전구체 화합물 및 그제조방법 |
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DE102006018504A1 (de) * | 2006-04-21 | 2007-10-25 | Carl Zeiss Laser Optics Gmbh | Anordnung zum Herstellen einer randscharfen Beleuchtungslinie sowie Anordnung zum Erhöhen der Asymmetrie des Strahlparameterproduktes |
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2018
- 2018-06-22 DE DE102018115126.8A patent/DE102018115126B4/de active Active
-
2019
- 2019-06-05 WO PCT/EP2019/064581 patent/WO2019243042A1/de active Application Filing
- 2019-06-05 KR KR1020217000207A patent/KR20210023973A/ko unknown
- 2019-06-05 CN CN201980039150.4A patent/CN112424666B/zh active Active
- 2019-06-05 JP JP2020568302A patent/JP7412357B2/ja active Active
- 2019-06-05 US US17/253,664 patent/US11536979B2/en active Active
- 2019-06-17 TW TW108120931A patent/TWI778270B/zh active
Patent Citations (2)
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CN102313915A (zh) | 2011-09-06 | 2012-01-11 | 山西飞虹激光科技有限公司 | 用于匀化半导体激光器阵列光束质量的光学元件和系统 |
US20170176758A1 (en) | 2015-12-18 | 2017-06-22 | Nlight, Inc. | Reverse interleaving for laser line generators |
Also Published As
Publication number | Publication date |
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WO2019243042A1 (de) | 2019-12-26 |
DE102018115126A1 (de) | 2019-12-24 |
CN112424666B (zh) | 2024-01-02 |
TW202000354A (zh) | 2020-01-01 |
DE102018115126B4 (de) | 2020-02-13 |
US20210255466A1 (en) | 2021-08-19 |
CN112424666A (zh) | 2021-02-26 |
JP2021527845A (ja) | 2021-10-14 |
TWI778270B (zh) | 2022-09-21 |
KR20210023973A (ko) | 2021-03-04 |
US11536979B2 (en) | 2022-12-27 |
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