JP7406296B2 - Cleaning equipment and method for cleaning tunnel inner walls - Google Patents

Description

The present invention relates to a cleaning device and a method for cleaning an inner wall surface of a tunnel, and relates to a technique that is effective when applied to repair work on a curved inner wall surface of a tunnel.

Tunnels built on expressways and local roads include tunnels with a rectangular cross section using box culverts, etc., and tunnels with a circular or horseshoe-shaped cross section using curved segments. The former tunnel has a flat ceiling and walls, while the latter tunnel has a curved surface.

After a specified period of time has elapsed since the start of service, tunnels undergo a cleaning process (base treatment) that involves scraping off the deteriorated surface, roughening the surface, and removing the paint film, followed by surface treatment that involves applying a concrete modifier. Construction work is carried out.

As for the cleaning device, a tunnel ceiling surface cleaning device for cleaning a tunnel ceiling surface is known, for example, as described in Patent Document 1 (Japanese Unexamined Patent Publication No. 2017-040103).

JP 2017-040103 Publication

During the cleaning process in tunnel repair work, a truck equipped with a tunnel cleaning device is driven to a cleaning position in the tunnel and stopped, and then the polishing head of the tunnel cleaning device is moved up and down the tunnel cleaning device. The device is raised to a cleaning position on the tunnel inner wall surface, pressed against the tunnel inner wall surface, and then moved (traversed) horizontally along the tunnel inner wall surface, thereby cleaning the tunnel inner wall surface.

The cleaning head is a device for cleaning the inner wall surface of the tunnel, and is supported by a vertical support rod. This support rod is housed within the holding frame in a vertically movable state. The elevating device for elevating and lowering the polishing head is composed of an air cylinder installed within the holding frame. The cylinder rod of this air cylinder is connected to the lower part of the support rod, and the cleaning head is raised and lowered by adjusting the amount of air supplied to the air cylinder.

Such a tunnel cleaning device cleans the tunnel inner wall surface by moving the polishing head (moves horizontally) along the curved tunnel inner wall surface. When it reaches the end of the travel, the cleaning head is moved in a direction away from the tunnel inner wall surface (traversing), the air cylinder is extended, and the cleaning head is raised to move to the next cleaning height. and run on a new grinding line to perform the grinding. The cleaning work is performed by repeating such cleaning by moving the polishing head in the running direction and changing the polishing line by moving it in the transverse direction.

Here, when changing the line, in order to prevent the gap between the two lines, the one that has finished cleaning and the one that will be polished from now on, from becoming unpolished, to avoid creating an area that will not be polished. Stroke management of the air cylinder rod that extends the polishing head is important.

However, it is difficult to accurately control the stroke of the rod by controlling the supply of air to the air cylinder. On the other hand, if the lifting device is configured with a motor instead of an air cylinder, the stroke can be controlled with high precision by controlling the rotation speed of the motor, but it takes a certain amount of time to extend the rod to the required height. Therefore, it is not possible to immediately run the polishing head after traversing and start work on the next polishing line.

The present invention was made from the above-mentioned technical background, and an object of the present invention is to provide a technique that can accurately and quickly change the cleaning height of a cleaning head provided in a tunnel cleaning device. purpose.

In order to solve the above problems, the cleaning device of the present invention according to claim 1 includes a cleaning head for cleaning a curved inner wall surface of a tunnel, a first lifting means for lifting and lowering the cleaning head, and a first lifting device for lifting and lowering the cleaning head. a cleaning device main body equipped with a second elevating means for elevating and lowering the first elevating means; and a first horizontal direction and a first It has a pedestal including a moving means that moves in a second horizontal direction that intersects with the horizontal direction, and a control means that controls the operation of the cleaning device main body and the moving means, and the first elevating means and the moving means. One of the second lifting means is constituted by a pneumatic lifting device that uses an air compressor as a driving source, and the other lifting device is configured by a rotary lifting device that uses a motor as a driving source. The control means causes the moving means to move the main body of the polishing device in the second horizontal direction, which is the running direction, and presses the inner wall surface with the polishing head while moving the cleaning device to a predetermined cleaning line. a traveling step in which the rotary lifting device is extended to a predetermined height and the pneumatic lifting device is contracted by the extension of the rotary lifting device while cleaning; and when the traveling step is completed, the moving means Traverse movement in which the main body of the polishing device is moved in the first horizontal direction, that is, the horizontal direction, and compressed air is supplied to the pneumatic lifting device to move the polishing head to the height of the next cleaning line. The present invention is characterized in that control is executed to perform the cleaning work on the inner wall surface by repeating the steps.

The polishing device of the present invention according to claim 2 is the invention according to claim 1, wherein the cleaning device is provided with a distance sensor for detecting the distance from the mount to the inner wall surface, and the mount is equipped with a distance sensor that detects the distance from the mount to the inner wall surface. The control means further includes a rotating means for rotating the main body along the mounting surface of the polishing device main body, and the control means determines from the detection result of the distance sensor that the cleaning surface of the polishing head is within the mounting surface. The present invention is characterized in that after the rotating means rotates the main body of the cleaning device so as to be parallel to the wall surface, control is executed to perform the cleaning work on the inner wall surface.

A method for polishing a tunnel inner wall surface according to the present invention according to claim 3 includes: a polishing head for polishing a curved inner wall surface of a tunnel; a first elevating means for elevating and lowering the cleaning head; and the first elevating and lowering means. A cleaning device main body equipped with a second elevating means for elevating and lowering the device, and a first horizontal direction in which the main body of the polishing device is mounted and which approaches and moves away from the inner wall surface and in the first horizontal direction. and a gantry having a moving means that moves in a second horizontal direction that intersects with each other, and one of the first elevating means and the second elevating means uses an air compressor as a driving source. A cleaning device is constructed of a pneumatic lifting device in which the other lifting device is a rotary lifting device using a motor as a drive source, and the moving device moves the cleaning device main body to the second While moving in a horizontal running direction and pressing the inner wall surface with the polishing head and cleaning a predetermined polishing line, the rotary lifting device is extended to a predetermined height and the pneumatic lifting device is moved. When the traveling step of retracting the equipment by the extension of the rotary lifting device and the traveling step are completed, the moving means moves the main body of the polishing device in the first horizontal direction, that is, the transverse direction, and The present invention is characterized in that cleaning is performed while repeating a traverse step of supplying compressed air to a pneumatic lifting device and moving the polishing head to the height of the next polishing line.

The tunnel inner wall surface polishing method of the present invention according to claim 4 is the invention according to claim 3, further comprising an elevator for raising and lowering the cleaning device, and in the traversing step, the cleaning height is set to the If the polishing apparatus is not within the extension range of the first elevating means and the second elevating means, the polishing device is raised by the elevating machine.

In the present invention, when the polishing head is moved in the traveling direction to polish the inner wall surface of the tunnel, when the lifting means composed of a rotary lifting device performs a rising operation, the lifting means made of a pneumatic lifting device The elevating means retracts while the air pressure is kept constant. Then, when the polishing head moves in the transverse direction away from the inner wall surface of the tunnel, compressed air for keeping the air pressure constant is supplied from the air compressor to the pneumatic lifting device and it ascends. Therefore, the polishing head attached to the pneumatic lifting device moves up along the tunnel inner wall surface to the next polishing height while remaining pressed against the tunnel inner wall surface.

This makes it possible to accurately and quickly change the cleaning height of the cleaning head provided in the tunnel cleaning device.

(a) is a conceptual diagram showing a tunnel cleaning system equipped with a tunnel cleaning device according to the first embodiment of the present invention, and (b) is a conceptual diagram showing the height of the tunnel cleaning system that constitutes the tunnel cleaning system of Fig. 1(a). FIG. 3 is a conceptual diagram when the deck portion of the work vehicle is raised. FIG. 1 is a front view of a tunnel cleaning device according to a first embodiment of the present invention. FIG. 3 is a side view of the tunnel cleaning device of FIG. 2; FIG. 3 is a plan view of the main surface of a cleaning head provided in the tunnel cleaning device of FIG. 2; (a) is a front view of the main parts of the tunnel cleaning device for explaining the lifting mechanism of the cleaning head of the tunnel cleaning device in FIG. 2, and (b) is a main part of the tunnel cleaning device in FIG. 5(a). FIG. (a) is a front view of the main parts of the tunnel cleaning device with the cleaning head installed at the bottom, and (b) is the tunnel with the cleaning head raised by the first lifting mechanism. (c) is a front view of the main part of the tunnel cleaning apparatus, showing a state in which the cleaning head is raised by the second elevating mechanism. FIG. 4 is a plan view of the pedestal of the tunnel cleaning device of FIGS. 2 and 3. FIG. (a) is a plan view of the base frame of the pedestal in FIG. 7, and (b) is a plan view of the rotation frame and slide frame of the pedestal in FIG. 7. (a) is a cross-sectional view taken along line II in FIG. 7, and (b) is a cross-sectional view taken along line II-II in FIG. FIG. 8 is a plan view of the rotating frame in the pedestal shown in FIG. 7 when the rotating frame is rotating; FIG. 8 is a plan view of the slide frame in the pedestal shown in FIG. 7 when it is slid; 1 is a main circuit block diagram of a control section of a tunnel cleaning device according to a first embodiment of the present invention. FIG. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is an explanatory plan view showing the arrangement of a tunnel cleaning system and a following vehicle system in a tunnel, in which a tunnel cleaning device according to a first embodiment of the present invention is mounted. It is a flowchart showing the flow from the start of cleaning to the end of cleaning by the tunnel cleaning device of the present embodiment. It is a flowchart showing the flow of cleaning work by the tunnel cleaning device of this embodiment. FIG. 2 is an explanatory diagram showing the movement of the pedestal and the cleaning device main body during a part of the flow from the start to the end of the cleaning work by the tunnel cleaning device of the present embodiment. FIG. 17 is an explanatory diagram showing the movement of the pedestal and the cleaning device main body following FIG. 16 during the flow from the start to the end of the cleaning work by the tunnel cleaning device of the present embodiment. FIG. 18 is an explanatory diagram showing the movement of the pedestal and the cleaning device main body following FIG. 17 during the flow from the start to the end of the cleaning work by the tunnel cleaning device of the present embodiment. 19 is an explanatory diagram showing the movement of the pedestal and the cleaning device main body following FIG. 18 during the flow from the start to the end of the cleaning work by the tunnel cleaning device of the present embodiment. FIG. 20 is an explanatory diagram showing the movement of the pedestal and the cleaning device main body following FIG. 19 during the flow from the start to the end of the cleaning work by the tunnel cleaning device of the present embodiment. FIG. 21 is an explanatory diagram showing the movement of the pedestal and the cleaning device main body following FIG. 20 during the flow from the start to the end of the cleaning work by the tunnel cleaning device of the present embodiment. FIG. FIG. 22 is an explanatory diagram showing the movement of the pedestal and the cleaning device main body following FIG. 21 during the flow from the start to the end of the cleaning work by the tunnel cleaning device of the present embodiment. FIG. 23 is an explanatory diagram showing the movement of the pedestal and the cleaning device main body following FIG. 22 during the flow from the start to the end of the cleaning work by the tunnel cleaning device of the present embodiment. FIG. 24 is an explanatory diagram showing the movement of the pedestal and the cleaning device main body following FIG. 23 during the flow from the start to the end of the cleaning work by the tunnel cleaning device of the present embodiment. FIG. 25 is an explanatory diagram showing the movement of the pedestal and the cleaning device main body following FIG. 24 during the flow from the start to the end of the cleaning work by the tunnel cleaning device of the present embodiment. FIG. 26 is an explanatory diagram showing the movement of the pedestal and the cleaning device main body following FIG. 25 during the flow from the start to the end of the cleaning work by the tunnel cleaning device of the present embodiment. FIG. 27 is an explanatory diagram showing the movement of the pedestal and the cleaning device main body following FIG. 26 during the flow from the start to the end of the cleaning work by the tunnel cleaning device of the present embodiment. FIG. 28 is an explanatory diagram showing the movement of the pedestal and the cleaning device main body following FIG. 27 during the flow from the start to the end of the cleaning work by the tunnel cleaning device of the present embodiment. FIG. 29 is an explanatory diagram showing the movement of the pedestal and the cleaning device main body following FIG. 28 during the flow from the start to the end of the cleaning work by the tunnel cleaning device of the present embodiment. 30 is an explanatory diagram showing the movement of the pedestal and the cleaning device main body following FIG. 29 during the flow from the start to the end of the cleaning work by the tunnel cleaning device of the present embodiment. FIG. 31 is an explanatory diagram showing the movement of the pedestal and the cleaning device main body following FIG. 30 during the flow from the start to the end of the cleaning work by the tunnel cleaning device of the present embodiment. FIG. FIG. 32 is an explanatory diagram showing the movement of the pedestal and the cleaning device main body following FIG. 31 during the flow from the start to the end of the cleaning work by the tunnel cleaning device of the present embodiment. FIG. 33 is an explanatory diagram showing the movement of the pedestal and the cleaning device main body following FIG. 32 during the flow from the start to the end of the cleaning work by the tunnel cleaning device of the present embodiment. FIG. 34 is an explanatory diagram showing the movement of the pedestal and the cleaning device main body following FIG. 33 during the flow from the start to the end of the cleaning work by the tunnel cleaning device of the present embodiment. FIG. 35 is an explanatory diagram showing the movement of the pedestal and the cleaning device main body following FIG. 34 during the flow from the start to the end of the cleaning work by the tunnel cleaning device of the present embodiment. FIG. 36 is an explanatory diagram showing the movement of the pedestal and the cleaning device main body following FIG. 35 during the flow from the start to the end of the cleaning work by the tunnel cleaning device of the present embodiment. The movement of the pedestal and the main body of the cleaning device as shown in FIG. 36 when the aerial work vehicle is moved in the extending direction of the tunnel to perform the cleaning work following the completion of the cleaning work by the tunnel cleaning device of this embodiment. FIG. The movement of the pedestal and the main body of the cleaning device as shown in FIG. 36 when the aerial work vehicle is moved inward in the transverse direction of the tunnel to perform the sweeping operation following the completion of the cleaning work by the tunnel cleaning device of this embodiment. FIG. It is an explanatory view showing movement of the 1st elevating/lowering mechanism part and the 2nd elevating/lowering mechanism part at the time of movement of the grinding device body provided in the tunnel cleaning device of this embodiment in the traveling direction. FIG. 2 is an explanatory diagram showing the height position of the cleaning head when the cleaning device main body provided in the tunnel cleaning device of the present embodiment is moved in the transverse direction. FIG. 2 is a conceptual diagram showing a tunnel cleaning system to which a tunnel cleaning device according to a second embodiment of the present invention is attached.

EMBODIMENT OF THE INVENTION Hereinafter, embodiment as an example of this invention will be described in detail based on drawing. In addition, in the drawings for explaining the embodiments, the same components are designated by the same reference numerals in principle, and repeated explanation thereof will be omitted.

(First embodiment)

FIG. 1(a) is a conceptual diagram showing a tunnel cleaning system to which a tunnel cleaning device according to the first embodiment of the present invention is attached, and FIG. 1(b) is the tunnel cleaning system of FIG. 1(a). FIG. 2 is a conceptual diagram when the deck section of the aerial work vehicle that constitutes the vehicle is raised. In addition, in FIGS. 1(a) and 1(b), the lower part of the tunnel cleaning device is also shown through to make the explanation easier to understand.

The tunnel cleaning system (cleaning system) S of the present embodiment is a system capable of cleaning, for example, the inner wall surface WS of a tunnel formed in a curved shape, and is a self-propelled aerial work vehicle (work vehicle ) V, and a tunnel cleaning device (grinding device) 10 mounted on the aerial work vehicle V.

The aerial work vehicle V is a special vehicle that can move the tunnel cleaning device 10 to a predetermined location and set the height of the tunnel cleaning device 10 to a predetermined height. is equipped with a pantograph section (elevator) Vp and a deck section Vb installed above it. The pantograph section Vp is an elevating mechanism section for raising and lowering the deck section Vb, and allows the tunnel cleaning device 10 mounted on the deck section Vb to be set at a predetermined height. It is now possible to perform tunnel cleaning work.

In the aerial work vehicle V shown in FIG. 1, when the tunnel cleaning device 10 is installed, there is no low-frequency shaking and the deflection can be suppressed to about 15 mm, so it can be used as a vehicle equipped with the tunnel cleaning device 10. Applicable. Further, in the case of the aerial work vehicle V shown in FIG. 1, the tunnel cleaning device 10 can be mounted in a stable state, and the tunnel cleaning device 10 can be moved while being elevated on the deck portion Vb on which it is mounted. Therefore, the cleaning work can be carried out efficiently.

The tunnel cleaning device 10 mounted on the deck portion Vb of such an aerial work vehicle V polishes the curved inner wall surface WS of the tunnel by spraying an abrasive (blast) on the curved inner wall surface WS. This is an abrasive injection type polishing device that includes a pedestal 18 and a polishing device main body BE mounted on the pedestal 18. This polishing device main body BE includes, for example, an elevating mechanism section (elevating means) 12, a rod 15 held by the elevating mechanism section 12, and a removably and swingably supported state at the tip of the rod 15. A polishing head 17 is provided.

First, the cleaning head 17 of the tunnel cleaning device 10 of this embodiment will be explained with reference to FIGS. 2 to 4. 2 is a front view of the tunnel cleaning device according to the first embodiment of the present invention, FIG. 3 is a side view of the tunnel cleaning device of FIG. 2, and FIG. 4 is a front view of the tunnel cleaning device of the first embodiment of the present invention. FIG. 3 is a plan view of the main surface of the polishing head.

As shown in FIGS. 2 and 3, the cleaning head 17 of the tunnel cleaning device 10 of the present embodiment is a means for cleaning the inner wall surface WS of the tunnel, and includes a mounting portion 17a and an arm portion 17r. , a rotary actuator 17ra (see FIG. 3), and an air cylinder 17p (see FIG. 3).

The mounting portion 17a of the polishing head 17 includes a mounting base 17a-1, a rotating plate 17a-2, and a back plate 17a-3. The mounting base 17a-1 has a main surface (first surface) facing the inner wall surface WS of the tunnel, and a back surface (second surface) on the back side thereof. As shown in FIGS. 2 to 4, on the main surface of the mounting base 17a-1, there are provided a cleaning machine (grinding section) 17b, casters 17c, a first ring brush 17s-1, and a second ring brush 17s-1. A brush 17s-2 is installed, and two rotating plates 17a-2 are integrally installed with the mounting base 17a-1 at both longitudinal ends of the mounting base 17a-1 on the back side of the mounting base 17a-1. It is erected.

The grinder 17b is an abrasive spraying unit that sprays an abrasive onto the inner wall surface WS of the tunnel in order to grind the degraded portion of the inner wall surface WS. Here, as shown in FIGS. 3 and 4, two cleaning machines 17b are installed, for example. As shown in FIG. 4, each cleaner 17b has, from the inside to the outside, an injection port (injection port) 17b-1, a suction port (suction port) 17b-2, and a first ring. The brushes 17s-1 are arranged concentrically.

The injection port 17b-1 of the grinder 17b is an opening for ejecting the above-described abrasive material, and is formed, for example, in a circular shape in plan view. The diameter of the injection port 17b-1 is, for example, about 80 mm. The planar shape of the injection port 17b-1 is not limited to a circular shape, and can be changed into various shapes such as an ellipse or an ellipse, for example. As shown in FIGS. 2 and 3, a discharge hose (abrasive material supply pipe) 17b-3 for supplying abrasive material to the polishing head 17 is located behind the injection port 17b-1 on the back surface of the mounting base 17a-1. mechanically connected. The abrasive material sent through the discharge hose 17b-3 is injected from the injection port 17b-1 (see FIG. 4) and is sprayed onto the inner wall surface WS of the tunnel.

As shown in FIG. 4, the suction port 17b-2 of the cleaning machine 17b is an opening that sucks under negative pressure the peeled pieces peeled off from the inner wall surface WS of the tunnel during the cleaning process and the abrasive material after being sprayed. , is formed in an annular shape in plan view so as to surround the outer periphery of the injection port 17b-1. Behind the suction port 17b-2 on the back surface of the mounting base 17a-1, there is a suction hose (suction pipe) 17b-4 (see Fig. 2) that flows the peeled pieces and abrasive material sucked from the suction port 17b-2. connected. In addition, in FIG. 3, the illustration of the suction hose 17b-4 is omitted to make the drawing easier to see.

As shown in FIGS. 2 to 4, these two cleaners 17b have their injection ports 17b-1 and suction ports 17b-2 facing the inner wall surface WS of the tunnel. It is installed on the mounting base 17a-1 in a state where it can be moved. Further, as shown in FIG. 4, the two cleaning machines 17b are arranged side by side along the cleaning direction. When looking at the side surface of the mounting base 17a-1 from the left or right side of FIG. (overlapping), but are arranged in a state shifted from each other in a direction intersecting (perpendicular to) the direction in which the cleaning machines 17b and 17b are arranged side by side. The injection width of the abrasive material is set by the positional deviation of the injection ports 17b-1 and 17b-1. In this embodiment, since the overlapping dimension of the injection ports 17b-1 and 17b-1 of the two grinders 17b and 17b is, for example, 40 mm, the abrasive material is applied to the inner wall surface WS of the tunnel. will be sprayed in a width of 120mm (=80mm x 2-40mm). However, these numerical values are merely examples, and the present invention is not restricted to these numerical values.

Note that the number of installed cleaning machines 17b can be freely set, and may be one or three or more. Furthermore, when three or more cleaning machines 17b are provided, the cleaning machines 17b may be arranged in a staggered manner along the direction in which the cleaning machines 17b are arranged side by side, or they may not be arranged in a staggered manner. Furthermore, the cleaning machine 17b may be of a water jet type or the like that cleans the inner wall surface WS of the tunnel with a pressurized water stream, instead of the abrasive injection type as in this embodiment.

Further, as shown in FIGS. 2 to 4, the casters 17c ensure a certain distance between the main surface of the mounting base 17a-1 and the inner wall surface WS of the tunnel during the grinding work, and also ensure that the grinding head 17 along the inner wall surface WS, and as shown in FIG. 4, it is arranged, for example, at the four corners of the main surface of the mounting base 17a-1. During the grinding work, the casters 17c are in contact with the inner wall surface WS of the tunnel, so that the mounting base 17a-1 and the inner wall surface WS of the tunnel are maintained at a constant distance, and as the polishing head 17 moves, the casters 17c are in contact with the inner wall surface WS of the tunnel. 17c rotates along the inner wall surface WS of the tunnel.

The wheel portion of the caster 17c is made of, for example, rubber or plastic such as urethane or nylon. Thereby, when the casters 17c come into contact with the inner wall surface WS, no damage is caused to the inner wall surface WS, and the weight of the casters 17c can be reduced, so that the weight of the polishing head 17 can be reduced. Furthermore, the casters 17c are configured to be rotatable 360° within the main surface of the mounting base 17a-1 (that is, within the grinding surface of the inner wall surface WS). Thereby, the degree of freedom in the moving direction of the polishing head 17 can be improved during cleaning.

Further, each caster 17c is equipped with a load meter SL3 (FIG. 12), which measures the load applied to the caster 17c during the cleaning operation (that is, the load when pressed against the inner wall surface WS of the tunnel). is made possible, and an excessive load exceeding a limit value (for example, 10 N (100 kgf)) is not applied. Note that the number, mounting position, material, etc. of the casters 17c are not limited to those described above, and can be changed in various ways.

Further, as shown in FIG. 4, the first ring brush 17s-1 prevents scattered objects such as peeling pieces and abrasive materials from leaking outward from the main surface of the mounting base 17a-1. It is a shielding member for the purpose, and is formed in an annular shape in a plan view so as to surround the outer periphery of each cleaning machine 17b. Further, as shown in FIGS. 2 to 4, the second ring brush 17s-2 is a shielding member for shielding the above-mentioned scattered objects from leaking outward from the main surface of the mounting base 17a-1, As shown in FIG. 4, it is formed into, for example, a rectangular frame shape in plan view so as to surround the two cleaning machines 17b, 17b. By providing the second ring brush 17s-2 in this way, it is possible to further suppress or prevent the above-mentioned flying objects from leaking to the outside.

The first ring brush 17s-1 and the second ring brush 17s-2 are detachably attached to the mounting base 17a-1. Therefore, if the first ring brush 17s-1 or the second ring brush 17s-2 deteriorates, it is only necessary to replace it. The lifespan of the head 17 is not determined. Note that in FIGS. 2 and 3, in order to make the cleaning machine 17b easier to see, the first ring brush 17s-1 is not shown, and the second ring brush 17s-2 is shown in cross section.

As shown in FIGS. 2 and 3, the above-mentioned back plate 17a-3 is a plate material that mainly fixes the cleaner 17b, and has a main surface facing the back surface of the mounting base 17a-1 and a back surface on the back side thereof. have. This back plate 17a-3 is installed between the two rotating plates 17a-2 at both longitudinal ends of the mounting base 17a-1, with its main surface facing the back surface of the mounting base 17a-1. .

Further, the arm portion 17r described above is a swinging portion that swingably supports the mounting portion 17a, and includes a base plate 17r-1. The base plate 17r-1 has a main surface facing the back surface of the mounting base 17a-1, and a back surface facing the tip end surface of the rod 15 on the back side. On the main surface of the base plate 17r-1, two first support plates 17r-2 extending in a direction perpendicular to the main surface of the base plate 17r-1 are provided at both longitudinal ends of the base plate 17r-1. Two second support plates 17r-3 are provided at the center of the longitudinal direction of the base plate 17r-1 on the back surface of the base plate 17r-1, and extend in a direction perpendicular to the back surface of the base plate 17r-1. is provided.

The two first support plates 17r-2 of the arm portion 17r extend obliquely with respect to the rod 15, and the extending ends of the two first support plates 17r-2 are connected to the two rotating plates of the mounting base 17a-1 described above. It overlaps with 17a-2 in plan view. The first support plate (first swinging part) 17r-2 of this arm part 17r and the rotating plate (first swinging part) 17a-2 of the mounting base 17a-1 pass through them. They are rotatably connected to each other by a fastening member (first swinging portion) 17x-1 provided as shown in FIG. As a result, the attachment portion 17a is attached to the arm portion 17r in a swingable state in the first swing direction PR1 (see FIG. 2).

The rotary actuator 17ra shown in FIG. 3 is a device for controlling the swing angle of the mounting portion 17a in the first swing direction PR1 (see FIG. 2), and is installed on one side of the polishing head 17. has been done. The rotary actuator 17ra is for adjusting the angle of the cleaning head 17 in order to press the cleaning head 17 against the inner wall surface WS of the tunnel at an optimal angle. After pressing, by releasing the rotary actuator 17ra, the cleaning head 17 performs cleaning while swinging along the inner wall surface WS.

Further, as described above, by extending the first support plate 17r-2 of the arm portion 17r in a diagonal direction with respect to the extending direction of the rod 15, the mounting base 17a-1 is placed diagonally upward with respect to the rod 15. is attached to. This makes it possible to press the cleaning surface of the cleaning head 17 with a large force against the inner wall surface WS of the curved tunnel during the cleaning operation.

On the other hand, the tip surfaces of the two second support plates 17r-3 on the back side of the base plate 17r-1 of the arm portion 17r are formed in an arc shape. A convex portion 15-1 formed on the tip end surface of the rod 15 is interposed between the two second support plates 17r-3. The tip end surface of this convex portion 15-1 is also formed in an arc shape. The two second support plates (second swinging part) 17r-3 on the back surface of the base plate 17r-1 and the convex part (second swinging part) 15-1 of the rod 15 are as follows: They are rotatably connected to each other by a fastening member (second swinging portion) 17x-2 (see FIG. 2) provided so as to pass through them. As a result, the polishing head 17 (mounting base 17a-1 and arm portion 17r) moves in a second swing direction PR2 (see FIG. 3) that intersects (orthogonally) with the first swing direction PR1 (see FIG. 2). (see) is attached to the rod 15 in a swingable state. The fastening member 17x-2 that fastens the second support plate 17r-3 of the base plate 17r-1 and the convex portion 15-1 of the rod 15 is removable. By removing it, the polishing head 17 can be removed.

As described above, according to the present embodiment, the polishing head 17 is moved in the first swing direction PR1 (see FIG. 2) and intersecting (orthogonal to) this by following the inner wall surface WS of the tunnel formed in a curved shape. Since it can be swung in the second swiveling direction PR2 (see FIG. 3), even the inner wall surface WS of the tunnel formed in a curved shape can be satisfactorily cleaned.

As shown in FIG. 3, the above-mentioned air cylinder 17p is a member that supports the cleaning machine 17b in a vertically movable state. This air cylinder 17p is attached to the longitudinal center of the support frame 17e, with the tip of the cylinder rod 17p-1 fixed to the back side of the back plate 17a-3. Thereby, the air cylinder 17p is installed to take a reaction force.

Further, for example, two telescopic rods 17d, 17d are installed between both ends of the support frame 17e in the longitudinal direction and the back surface of the mounting base 17a-1. These two telescoping rods 17d, 17d adjust so that appropriate pressure is applied from the air cylinder 17p to the two cleaning machines 17b, and is uniform over the main surfaces of the two cleaning machines 17b. It is adjusted to apply a certain amount of pressure.

Further, as shown in FIG. 4, the two telescopic rods 17d, 17d are arranged diagonally to each other with the air cylinder 17p in the center within the back surface of the mounting base 17a-1. With this arrangement, even the two telescopic rods 17d, 17d can apply sufficient pressure to the two cleaning machines 17b. That is, since only two telescopic rods 17d and 17d are required, the weight of the polishing head 17 can be reduced.

During the cleaning operation, as shown in FIG. 3, when the cylinder rod 17p-1 of the air cylinder 17p is extended, the casters 17c on the main surface of the mounting base 17a-1 are pressed against the inner wall surface WS of the tunnel with appropriate pressure. At the same time, the first ring brush 17s-1 and the second ring brush 17s-2 on the main surface of the mounting base 17a-1 are pressed against the inner wall surface WS with appropriate pressure.

Next, the rod 15 and the lifting mechanism section 12 of the tunnel cleaning device 10 will be explained with reference to FIGS. 2, 3, 5, and 6. 5(a) is a front view of the main part of the tunnel cleaning device for explaining the elevating mechanism of the cleaning head of the tunnel cleaning device shown in FIG. 2, and FIG. 5(b) is a front view of the main part of the tunnel cleaning device shown in FIG. Figure 6(a) is a front view of the main part of the tunnel cleaning equipment with the cleaning head installed at the bottom, and Figure 6(b) is a side view of the main parts of the tunnel cleaning equipment with the cleaning head installed at the bottom. FIG. 6(c) is a front view of the main parts of the tunnel cleaning device showing a state in which the polishing head is raised by the second lifting mechanism. It is a main part front view. In addition, in FIGS. 5 and 6, in order to make the explanation easier to understand, the inside of the lifting mechanism section 12 is shown transparently, and the cylinder of the air cylinder is shown in cross section and hatched. Furthermore, in FIGS. 5 and 6, the pedestal 18 (see FIGS. 2 and 3) is omitted to make the drawings easier to see. Further, in FIG. 5(b), the rotary actuator 17ra (see FIG. 3) is omitted to make the drawing easier to see.

As shown in FIG. 2, the elevating mechanism section 12 includes a first elevating mechanism section (first elevating means) 12a and a second elevating mechanism section (second elevating means) installed next to it. 12b.

As shown in FIG. 5, the first elevating mechanism section 12a includes a hollow holding frame 12af and an air cylinder (pneumatic elevating device) 12ac installed in the hollow in a vertically movable state. There is. The air cylinder 12ac is a pneumatic lifting device that uses an air compressor CP (FIG. 12) as a driving source and moves the cleaning head 17 up and down with compressed air supplied from the air compressor CP, and moves the cylinder rod 12ar up and down. It is set up in an upright position. The tip of the cylinder rod 12ar is mechanically connected to the mounting plate 15f of the rod 15 described above. As a result, as shown in FIG. 6, when the cylinder rod 12ar of the air cylinder 12ac is extended upward, the rod 15 and the polishing head 17 are raised (see FIG. 6(b)), and when the cylinder rod 12ac is retracted downward, the rod 15 and the polishing head 17 are raised. 15 and the polishing head 17 are lowered (see FIG. 6(a)). Note that the lower side of the rod 15 described above is inserted into the hollow of the holding frame 12af. Furthermore, a pair of rollers (not shown) for supporting the side surface of the rod 15 may be provided between the side surface of the rod 15 and the hollow inner surface of the holding frame 12af. Thereby, the rod 15 can be moved up and down while being stabilized by the pair of rollers.

On the other hand, as shown in FIG. 5, the second lifting mechanism 12b includes a hollow holding frame 12bf, a ball screw (rotary lifting device) 12bn installed in the hollow, and a ball screw (rotary lifting device) 12bn installed outside the holding frame 12bf. It is equipped with a screw motor (motor) 12bm. The ball screw 12bn is a rotary lifting device that uses the screw motor 12bm as a drive source to move the cleaning head 17 up and down by moving the air cylinder 12ac itself up and down, and includes a screw shaft 12bn1 and a nut 12bn2. There is.

The screw shaft 12bn1 is installed in an upright state along the vertical direction. The nut 12bn2 is screwed onto the outer periphery of the screw shaft 12bn1 in a vertically movable state. A plurality of balls and circulation parts (deflector, return plate, etc.) that circulate the balls (not shown) are interposed between the screw shaft 12bn1 and the nut 12bn2. Further, the nut 12bn2 is integrally connected to the support portion 12bn3. This support portion 12bn3 is mechanically connected to the air cylinder 12ac so as to support the air cylinder 12ac.

The screw motor 12bm is a driving means for rotating the screw shaft 12bn1 of the ball screw 12bn, and is composed of, for example, an electric motor. Thereby, the weight of the tunnel cleaning device 10 can be reduced, so that the tunnel cleaning device 10 can be easily transported. When the screw shaft 12bn1 is rotated by the screw motor 12bm, the nut 12bn2 moves up and down depending on the direction of rotation. When the nut 12bn2 moves up and down, the air cylinder 12ac also moves up and down. As a result, as shown in FIG. 6, when the screw shaft 12bn1 of the ball screw 12bn is rotated to raise the nut 12bn2, the air cylinder 12ac, the rod 15, and the cleaning head 17 are raised (see FIG. 6(c)). When the screw shaft 12bn1 of the ball screw 12bn is rotated to lower the nut 12bn2, the air cylinder 12ac, the rod 15, and the cleaning head 17 are lowered (see FIG. 6(b)).

By adjusting the height position of the cleaning head 17 using the first lifting mechanism section 12a and the second lifting mechanism section 12b in this way, the casters 17c of the cleaning head 17 can be pressed against the inner wall surface WS of the tunnel. can. Here, if the casters 17c of the polishing head 17 are pressed against the inner wall surface WS only by raising the rod 15, the air cylinder 17p (see FIG. 3) of the polishing head 17 described above can be omitted. However, if the rough height of the polishing head 17 is adjusted by vertically moving the rod 15 and the casters 17c of the polishing head 17 are pressed against the inner wall surface WS of the tunnel by the air cylinder 17p, the height of the polishing head 17 can be adjusted. Since the pressing accuracy can be improved, the cleaning head 17 can be pressed against the inner wall surface WS of the tunnel with more appropriate pressure.

Here, from the viewpoint of only raising and lowering the polishing head 17, the first lifting mechanism part 12a and the second lifting mechanism part 12b may be configured with lifting equipment using a ball screw, a chain, or a hydraulic cylinder, for example. I can do it. Further, as the first elevating mechanism section 12a, the rod 15 itself can be configured to be extendable and retractable, so that not the entire rod 15 but a portion of the rod 15 can be moved up and down. Furthermore, the first elevating mechanism section 12a and the second elevating mechanism section 12b can be configured with air cylinders, for example.

However, by configuring the first elevating mechanism section 12a with an air cylinder 12ac and configuring the second elevating mechanism section 12b with a ball screw 12bn, the cleaning position can be moved from a certain height to a higher one. The movement of the cleaning head 17 (that is, changing the cleaning height of the cleaning head 17) can be performed accurately and quickly.

That is, when the cleaning head 17 is moved in the traveling direction to polish the tunnel inner wall surface with the height of the cleaning head 17 being kept the same, the second elevating mechanism section 12b (ball screw 12bn) is extended. . Since the polishing head 17 at the tip of the cylinder rod 12ar of the first elevating mechanism section 12a (air cylinder 12ac) is pressed against the tunnel inner wall surface WS, the extension of the second elevating mechanism section 12b (ball screw 12bn) The cylinder rod 12ar retreats by that amount, and the first elevating mechanism section 12a (air cylinder 12ac) contracts. At this time, the cylinder rod 12ar retreats and the air corresponding to the reduction in the volume of the cylinder chamber is released to the atmosphere from a relief type pressure reducing valve (or relief valve) not shown, and the air is released into the atmosphere from the first lifting mechanism section 12a (air cylinder 12ac). The air pressure inside is kept constant.

Then, when the cleaning head 17 moves in the transverse direction (that is, the direction away from the tunnel inner wall surface WS) and the air pressure in the first lifting mechanism section 12a (air cylinder 12ac) is about to decrease, the air compressor CP Compressed air for keeping the air pressure constant is supplied from the first lifting mechanism 12a (air cylinder 12ac), and the first lifting mechanism 12a (air cylinder 12ac) rises. Therefore, the polishing head 17 attached to the tip of the first elevating mechanism part 12a remains pressed against the tunnel inner wall surface WS (that is, while the pressing force against the tunnel inner wall surface WS is maintained) and moves inside the tunnel. It ascends along the wall surface WS and moves to the next cleaning height.

This makes it possible to accurately and quickly change the cleaning height of the cleaning head 17 provided in the tunnel cleaning device 10. From this point of view, for example, the first lifting mechanism 12a may be configured with a ball screw, and the second lifting mechanism 12b may be configured with an air cylinder.

Next, the pedestal 18 of the tunnel cleaning device 10 will be explained with reference to FIGS. 2, 3, and 7 to 11. 7 is a plan view of the mount of the tunnel cleaning device in FIG. 2, FIG. 8(a) is a plan view of the base frame of the mount in FIG. 7, and FIG. 8(b) is a rotation frame and slide frame of the mount in FIG. 7. 9(a) is a cross-sectional view taken along line II in FIG. 7, FIG. 9(b) is a cross-sectional view taken along line II-II in FIG. 7, and FIG. 10 is a cross-sectional view taken along line II-II in FIG. FIG. 11 is a plan view of the slide frame in the frame of FIG. 7 when it is slid.

Note that although FIGS. 7, 8, 10, and 11 are plan views, hatching is added to make the drawings easier to see. Further, in FIGS. 7, 8, 10, and 11, the symbol D1 indicates a first horizontal direction intersecting the inner wall surface WS of the tunnel, and the symbol D2 indicates a second horizontal direction along the inner wall surface WS of the tunnel. ing. Further, in FIG. 9, the drawing is simplified for ease of viewing, and illustrations of the traveling frame 18D, the base plate 18E, and the moving means related to their movement are omitted.

As shown in FIGS. 2 and 3, the pedestal 18 for moving the cleaning device main body BE provided in the tunnel cleaning device 10 includes, in order from the bottom, a base frame 18A, a rotating frame 18B, and a slide frame. 18C, a traveling frame 18D, and a base plate 18E.

As shown in FIG. 8A, the base frame 18A is a frame of a base on which the rotating frame 18B, the slide frame 18C, and the running frame 18D are mounted, and is, for example, a metal frame having a rectangular frame shape when viewed from above. It consists of This base frame 18A includes a pair of short frame portions 18A1 extending in the first horizontal direction D1, and a pair of short frame portions 18A1 provided at both longitudinal ends of the pair of short frame portions 18A1 so as to bridge between the pair of short frame portions 18A1. As shown in FIGS. 7 and 8(a), a beam frame portion 18A3 is provided at the longitudinal center of the pair of long frame portions 18A2 so as to bridge between the pair of long frame portions 18A2. and a support portion 18A4 joined near one end in the longitudinal direction of one long frame portion 18A2. As shown in FIGS. 8(a) and 9(a), a rotation bearing portion 18A5 is provided at the longitudinal center of the beam frame portion 18A3 of the base frame 18A (in-plane center of the base frame 18A in plan view). It is being

As shown in FIGS. 2 and 3, a rotating frame 18B is mounted on the base frame 18A via a rotating support 18R. The rotating frame 18B is a frame (rotating body) of a rotating means, and as shown in FIGS. 7 and 8(b), it is composed of, for example, a metal frame that is rectangular in plan view. The rotating frame 18B is provided with a pair of short frame portions 18B1 extending in the first horizontal direction D1 and a pair of short frame portions 18B1 at both longitudinal ends of the pair of short frame portions 18B1 so as to bridge between the pair of short frame portions 18B1. It integrally includes a pair of long frame parts 18B2 and a beam frame part 18B3 provided at the longitudinal center of the pair of long frame parts 18B2 so as to bridge between the pair of long frame parts 18B2. As shown in FIG. 7, FIG. 8(b), and FIG. 9(a), at the longitudinal center of the beam frame portion 18B3 of the rotating frame 18B (in-plane center of the rotating frame 18B in plan view), there is a rotating A shaft portion 18B4 is provided. As shown in FIG. 9(a), this rotation shaft portion 18B4 is fitted into a rotation bearing portion 18A5 of the base frame 18A.

As shown in FIG. 9, the rotating frame 18B is arranged so as to match and overlap the base frame 18A in a plan view when in the normal position. That is, when the rotary frame 18B is in the normal position, the pair of short frame portions 18B1 of the rotary frame 18B are placed on the pair of short frame portions 18A1 of the base frame 18A so that each of the pair of short frame portions 18A1 has a flat surface. They are arranged so that they overlap visually. Further, when the rotating frame 18B is in the normal position, the pair of long frame portions 18B2 of the rotating frame 18B are placed on the pair of long frame portions 18A2 of the base frame 18A, and the respective pairs of long frame portions 18A2 are flat. They are arranged so that they overlap visually.

The rotating frame 18B is mounted on the base frame 18A so as to be rotatable in both forward and reverse directions along the mounting surface of the rotating frame 18B around a rotating shaft portion 18B4. In this embodiment, the weight of the tunnel cleaning device 10 can be reduced by using the base frame 18A and the rotating frame 18B as frames as described above. Therefore, the tunnel cleaning device 10 can be easily transported. In addition, the weight of the rotating frame 18B can be reduced, and the area of contact with the base frame 18A when the rotating frame 18B rotates can be reduced, so the rotating frame 18B can be rotated even more smoothly. be able to. Note that when the rotating frame 18B is rotated, the slide frame 18C, traveling frame 18D, base plate 18E, and the cleaning device main body BE on the rotating frame 18B also rotate together.

Here, in order to grind the inner wall surface WS of the tunnel, when the aerial work vehicle V (see FIG. 1) equipped with the tunnel cleaning device 10 is placed next to the inner wall surface WS of the tunnel, the aerial work vehicle V is It may be arranged slightly obliquely with respect to the inner wall surface WS of the tunnel. In this case, when cleaning the inner wall surface WS of the tunnel, the polishing surface of the cleaning head 17 of the tunnel cleaning device 10 is obliquely inclined with respect to the inner wall surface WS of the tunnel. Therefore, it may become impossible to move the cleaning head 17 while being pressed appropriately, and it may become impossible to perform a good cleaning process on the inner wall surface WS of the tunnel. On the other hand, in the present embodiment, by rotating the rotating frame 18B, the cleaning surface of the cleaning head 17 can be set to be parallel to the inner wall surface WS of the tunnel. Therefore, the cleaning head 17 can be moved while being pressed appropriately against the inner wall surface WS of the tunnel, so that the cleaning process of the inner wall surface WS of the tunnel can be performed satisfactorily.

As shown in FIGS. 7 and 9, a jack 18J is installed near the inner side of one of the short frame parts 18B1 of the rotating frame 18B with its rod part 18J1 directed toward one of the long frame parts 18B2 of the rotating frame 18B. In this state, it is fixed to the support portion 18A4 of the base frame 18A. The jack 18J is a rotating means for rotating the rotating frame 18B, and is composed of, for example, an electric jack. By configuring the jack 18J as an electric jack, the weight of the tunnel cleaning device 10 can be reduced compared to when the jack 18J is configured as a hydraulic jack.

The tip of the rod portion 18J1 of the jack 18J is swingably joined to the inside of one long frame portion 18B2 of the rotating frame 18B. When the motor section 18J2 of the jack 18J is rotated in the forward and reverse directions, the rod section 18J1 expands and contracts along the first horizontal direction D1, and the rotation frame 18B rotates due to the expansion and contraction of the rod section 18J1. It looks like this. In the present embodiment, the rotation angle of the rotation frame 18B is, for example, ±5 degrees, with the fixed position where the rotation frame 18B coincides with and overlaps the base frame 18A being 0 degrees.

For example, as shown in Fig. 10, if the aerial work vehicle V (see Fig. 1) is inclined slightly to the right with respect to the inner wall surface WS of the tunnel (the inner wall surface WS of the tunnel is If the jack 18J is tilted to the left with respect to the device 10), the rod portion 18J1 of the jack 18J is extended by a predetermined length in the direction shown by the arrow A1. Then, the rotary frame 18B is pushed by the rod portion 18J1 of the jack 18J and rotates by a predetermined amount of rotation in the direction shown by arrow A2, and the long frame portion 18B2 of the rotary frame 18B (the cleaning surface of the polishing head 17) ) stops when it becomes almost parallel to the inner wall surface WS of the tunnel.

On the other hand, when returning the rotating frame 18B to its original position, the rod portion 18J1 of the jack 18J is shortened by a predetermined length in the direction shown by arrow A3. Then, the rotating frame 18B is pulled by the jack 18J and rotates by a predetermined amount of rotation in the direction shown by arrow A4 in FIG. 10, and the rotating frame 18B returns to its original position. In addition, when the aerial work vehicle V is inclined slightly to the left with respect to the inner wall surface WS of the tunnel (when the inner wall surface WS of the tunnel is inclined to the right with respect to the tunnel cleaning device 10) ) further reduces the rod portion 18J1 of the jack 18J by a predetermined length in the direction shown by arrow A3. Then, the rotating frame 18B is pulled by the jack 18J and further rotates by a predetermined amount of rotation in the direction shown by the arrow A4 in FIG. ) stops when it becomes almost parallel to the inner wall surface WS of the tunnel.

Further, as shown in FIG. 7, in the rotating frame 18B, distance sensors SL1 and SL2 are installed near both longitudinal ends of the long frame portion 18B2 facing the inner wall surface WS of the tunnel. These distance sensors SL1, SL2 measure the horizontal distance from each distance sensor SL1, SL2 to the inner wall surface WS of the tunnel in order to calculate the amount of rotation of the rotating frame 18B and the amount of movement of the slide frame 18C and base plate 18E. It is a non-contact type sensor used for measurement. That is, when the tunnel cleaning device 10 irradiates the inner wall surface WS of the tunnel with the laser light LL from the light emitting portion of each distance sensor SL1, SL2, the tunnel cleaning device 10 uses the reflected light RL reflected from the inner wall surface WS of the tunnel as the distance sensor SL1. , SL2, it is possible to calculate the distance from each distance sensor SL1, SL2 to the inner wall surface WS of the tunnel, based on the detection information obtained by receiving light with the light receiving section of SL2. Then, it is possible to calculate the parallelism between the tunnel cleaning device 10 and the inner wall surface WS based on the calculation result, and further to calculate the amount of rotation of the rotation frame 18B based on the calculation result. Furthermore, it is possible to calculate the amount of movement of the slide frame 18C and the base plate 18E based on the calculation results of the distances from each distance sensor SL1, SL2 to the inner wall surface WS of the tunnel.

Furthermore, these distance sensors SL1, SL2 also have a function of measuring the distance from each distance sensor SL1, SL2 to the inner wall surface WS in the vertical direction. That is, in the same way as distance measurement in the horizontal direction, the laser beam LL is also emitted in the vertical direction, and based on the detection information obtained from the reflected light, it is measured from each distance sensor SL1, SL2 to the inner wall surface WS in the vertical direction. It is now possible to calculate the distance between

Note that the parallelism between the tunnel cleaning device 10 and the inner wall surface WS is expressed by the inclination angle of the tunnel cleaning device 10 (specifically, for example, the long frame portion 18B2) with respect to the inner wall surface WS of the tunnel in a plan view. Ru. Further, the number of distance sensors SL1 and SL2 is not limited to two, and may be three or more, for example. Moreover, the installation locations of the distance sensors SL1 and SL2 are not limited to the above locations, and can be changed in various ways.

As shown in FIGS. 2 and 3, a slide frame 18C is mounted on the rotation frame 18B via a slide linear guide 18LS. The slide frame 18C is a frame of the moving means, and as shown in FIG. 7, it is composed of, for example, a metal frame that is rectangular in plan view. The slide frame 18C includes a pair of short frame portions 18C1 extending in the first horizontal direction D1, and a pair of short frame portions 18C1 provided at both longitudinal ends of the pair of short frame portions 18C1 so as to bridge between the pair of short frame portions 18C1. It is integrally provided with a long frame portion 18C2. The pair of short frame portions 18C1 of the slide frame 18C are arranged on the pair of short frame portions 18B1 in a state where they overlap the pair of short frame portions 18B1 of the rotating frame 18B in plan view.

As shown in FIGS. 2 and 3, the above-mentioned sliding linear guide 18LS is installed between the pair of short frame portions 18C1 of this slide frame 18C and the pair of short frame portions 18B1 of the rotating frame 18B. ing. This sliding linear guide 18LS includes a guide rail 18LS1 and two blocks 18LS2 provided thereon. As shown in FIG. 2, the guide rail 18LS1 is arranged along the first horizontal direction D1 on the pair of short frame portions 18B1 of the rotating frame 18B. As shown in FIGS. 2 and 3, the block 18LS2 is attached to the guide rail 18LS1. A plurality of balls (not shown) are incorporated inside the block 18LS2, and the rolling of the plurality of balls allows the block 18LS2 to move horizontally along the guide rail 18LS1. As shown in FIG. 2, limit switches 18S1 are installed near both longitudinal ends of the guide rail 18LS1 to limit (prevent) the movement of the block 18LS2.

The block 18LS2 of this slide linear guide 18LS is joined to a pair of short frame portions 18C1 of the slide frame 18C. This allows the slide frame 18C to reciprocate in the first horizontal direction D1 (that is, the direction approaching the inner wall surface WS of the tunnel and the direction away from the inner wall surface WS). In this embodiment, by using the slide frame 18C and the rotating frame 18B as frames as described above, the weight of the tunnel cleaning device 10 can be reduced. Therefore, the tunnel cleaning device 10 can be easily transported. Furthermore, the weight of the slide frame 18C can be reduced, and the area of contact with the rotating frame 18B during movement of the slide frame 18C can be reduced, so the slide frame 18C can be moved even more smoothly. Note that when the slide frame 18C is reciprocated along the first horizontal direction D1, the traveling frame 18D on the slide frame 18C, the base plate 18E, and the cleaning device main body BE are also moved along the first horizontal direction D1. It is designed to move back and forth.

Here, in the tunnel cleaning device studied by the present inventor, since there is no slide frame 18C, in order to press the polishing head against the inner wall surface WS of the tunnel during the polishing process of the inner wall surface WS of the tunnel, By horizontally moving the horizontal movement table provided on the mount of the grinding device, the grinding head is moved close to the inner wall surface WS of the tunnel and placed at one end in the width direction of the loading platform of the aerial work vehicle V (see Fig. 1). There is. For this reason, there is a possibility that the weight will be uneven within the plane of the loading platform of the aerial work vehicle V (see FIG. 1), and the installation stability of the tunnel cleaning device may be impaired. On the other hand, in the present embodiment, the slide frame 18C of the tunnel cleaning device 10 itself can be moved horizontally to bring it close to the inner wall surface WS of the tunnel, so that it can be moved closer to the inner wall surface WS of the tunnel. It is possible to alleviate the unevenness of the weight in the plane of the loading platform, and it is possible to improve the installation stability of the tunnel cleaning device 10.

In addition, if there is no slide frame 18C, when the aerial work vehicle V (see Fig. 1) is placed next to the inner wall surface WS of the tunnel, the position of the aerial work vehicle V may be too close to the inner wall surface WS of the tunnel. If the distance is too far, the vehicle for aerial work V must be moved to make corrections, which reduces work efficiency. Therefore, high accuracy may be required for the stopping position of the vehicle for aerial work V. In contrast, in the present embodiment, even if the position of the aerial work vehicle V is too close to or too far from the inner wall surface WS of the tunnel, the slide frame 18C of the tunnel cleaning device 10 can slide (horizontally move). As a result, the distance between the tunnel cleaning device 10 and the inner wall surface WS of the tunnel can be adjusted without reducing work efficiency, so the accuracy of the stopping position of the aerial work vehicle V can be relaxed.

As shown in FIGS. 7 and 8(b), on the outside of one of the short frame parts 18C1 of the slide frame 18C, near the end of the short frame part 18C1 on the tunnel center side in the longitudinal direction, it is possible to freely rotate in both forward and reverse directions. A motor 18MS is installed. The motor 18MS is a moving means for reciprocating the slide frame 18C along the first horizontal direction D1, and is composed of, for example, an electric motor. By configuring the motor 18MS with an electric motor, the weight of the tunnel cleaning device 10 can be reduced compared to when the motor 18MS is configured with a hydraulic motor.

As shown in FIG. 8(b), inside each of the pair of short frame portions 18C1 of the slide frame 18C, a pair of rotation bearings are provided near the end on the inner wall surface WS side of the tunnel so as to face each other. Sections 18BP1 and 18BP1 are provided. A connecting rod 18CR1 extending along the long frame portion 18C2 of the slide frame 18C is installed between the pair of rotation bearing portions 18BP1, 18BP1 so as to be rotatable about the central axis. . A pair of chain gears 18CG1, 18CG1 is attached to each of the connecting rods 18CR1 near both ends in the longitudinal direction.

On the other hand, a rotating shaft portion of the motor 18MS is arranged on one side of the pair of short frame portions 18C1 of the slide frame 18C near the end on the center side of the tunnel. Further, a rotation bearing portion 18BP2 is provided on the inside of the pair of short frame portions 18C1 of the slide frame 18C, on the other side near the end on the center side of the tunnel (a position facing the rotation shaft portion of the motor 18MS). There is. Between the rotating shaft portion of the motor 18MS and the rotating bearing portion 18BP2, a connecting rod 18CR2 extending along the long frame portion 18C2 of the slide frame 18C is rotatable about the central axis. is set up. One end of this connecting rod 18CR2 is connected to the rotating shaft of the motor 18MS. Therefore, when the rotation shaft of the motor 18MS rotates, the connecting rod 18CR2 also rotates accordingly. A pair of chain gears 18CG2, 18CG2 is attached to each of the connecting rods 18CR2 near both ends in the longitudinal direction.

As shown in FIGS. 8(b) and 9(b), a pair of chains 18SC are endlessly strung across each of the chain gears 18CG1 and 18CG2 near both longitudinal ends of the connecting rods 18CR1 and 18CR2. ing. Each chain 18SC is connected to a short frame portion 18C1 of the slide frame 18C via a connecting body 18SJ that is connected to a part of each chain 18SC. Therefore, when the motor 18MS is rotated, the chain 18SC is rotated, and the connecting body 18SJ joined to the chain 18SC is reciprocated along the first horizontal direction D1, so that the slide frame 18C is moved to the first horizontal direction. It is designed to move back and forth along the direction D1.

For example, as shown in FIG. 11, when the rotating shaft portion of the motor 18MS is rotated by a predetermined rotation amount in the direction shown by the arrow A5, the connecting body 18SJ of the chain 18SC moves a predetermined length in the direction approaching the inner wall surface WS of the tunnel. Therefore, the slide frame 18C (that is, the polishing surface of the polishing head 17) joined to the connecting body 18SJ moves a predetermined length in the direction in which it approaches the inner wall surface WS of the tunnel (in the direction shown by arrow A6). Move and stop.

On the other hand, when the rotating shaft portion of the motor 18MS is rotated by a predetermined rotation amount in the direction shown by the arrow A7 opposite to the arrow A5, the connecting body 18SJ of the chain 18SC is separated from the inner wall surface WS of the tunnel by a predetermined length. Therefore, the slide frame 18C (that is, the polishing surface of the polishing head 17) joined to the connecting body 18SJ is moved a predetermined length in the direction away from the inner wall surface WS of the tunnel (in the direction shown by arrow 8). Move and stop. The amount of movement when the slide frame 18C horizontally moves toward the inner wall surface WS of the tunnel is determined by the distance from each distance sensor SL1, SL2 to the inner wall surface WS of the tunnel measured by the distance sensors SL1, SL2 described above. Set based on

As shown in FIGS. 2 and 3, a traveling frame 18D is mounted on the slide frame 18C via a traveling linear guide 18LL. The traveling frame 18D is a frame (moving body) of a moving means, and as shown in FIG. 7, it is composed of, for example, a metal frame having a rectangular frame shape when viewed from above. This traveling frame 18D includes a pair of long frame portions 18D1 extending in the first horizontal direction D1, and a pair of long frame portions 18D1 provided at both longitudinal ends of the pair of long frame portions 18D1 so as to bridge between the pair of long frame portions 18D1. It is integrally provided with a short frame portion 18D2. The planar dimension of the traveling frame 18D is smaller than the planar dimension of the slide frame 18C described above. The pair of short frame portions 18D2 of the traveling frame 18D are arranged on the pair of long frame portions 18C2 in a state where they overlap the pair of long frame portions 18C2 of the slide frame 18C in plan view.

As shown in FIGS. 2 and 3, the above-mentioned traveling linear guide 18LL is installed between the pair of short frame portions 18D2 of the traveling frame 18D and the pair of long frame portions 18C2 of the slide frame 18C. There is. This traveling linear guide 18LL, like the above-described sliding linear guide 18LS, includes a guide rail 18LL1 and two blocks 18LL2 provided thereon. The guide rail 18LL1 is arranged along the second horizontal direction D2 on a pair of long frame portions 18C2 of the slide frame 18C. Limit switches 18S2 (see FIG. 3) that limit (block) movement of the block 18LL2 are installed near both longitudinal ends of the guide rail 18LL1.

The block 18LL2 of this traveling linear guide 18LL is joined to a pair of short frame portions 18D2 of the traveling frame 18D. This allows the traveling frame 18D to reciprocate along the second horizontal direction D2 (ie, the direction along the inner wall surface WS of the tunnel). In this embodiment, by using the slide frame 18C and the running frame 18D as frames as described above, the weight of the tunnel cleaning device 10 can be reduced. Therefore, the tunnel cleaning device 10 can be easily transported. Further, the weight of the running frame 18D can be reduced, and the contact area with the slide frame 18C during reciprocation of the running frame 18D can be reduced, so that the running frame 18D can be moved even more smoothly.

Further, as shown in FIG. 7, the length of the long frame portion 18C2 along the inner wall surface WS of the tunnel in the slide frame 18C is made longer than the length of the short frame portion 18C1, so that the traveling frame 18D (i.e., the cleaning head 17 ) can be lengthened, so the cleaning distance of the inner wall surface WS of the tunnel can be lengthened. Thereby, the efficiency of the cleaning operation of the tunnel cleaning device 10 can be improved, so that the cleaning operation time can be shortened. Note that when the traveling frame 18D is reciprocated in the second horizontal direction D2, the base plate 18E on the traveling frame 18D and the cleaning device main body BE are also reciprocated in the second horizontal direction D2. .

A motor 18ML that is rotatable in both forward and reverse directions is installed at one end of the traveling frame 18D in the longitudinal direction (first horizontal direction D1). This motor 18ML is a moving means for reciprocating the traveling frame 18D in the second horizontal direction D2, and is composed of, for example, an electric motor. By configuring the motor 18ML with an electric motor, the weight of the tunnel cleaning device 10 can be reduced compared to when the motor 18ML is configured with a hydraulic motor.

As shown in FIGS. 2 and 3, a base plate 18E is mounted on the traveling frame 18D via a traverse linear guide 18LW. As shown in FIG. 7, the base plate 18E is composed of, for example, a substantially square metal plate in plan view, and is a moving means that can move in the longitudinal direction (first horizontal direction D1) of the traveling frame 18D. It is. The planar dimension of the base plate 18E is smaller than the planar dimension of the traveling frame 18D. Both end portions of the base plate 18E in the second horizontal direction D2 are arranged on the pair of long frame portions 18D1, overlapping the pair of long frame portions 18D1 of the traveling frame 18D in plan view.

As shown in FIGS. 2 and 3, the above-mentioned traverse linear guide 18LW is installed between the base plate 18E and the pair of long frame portions 18D1 of the traveling frame 18D. The traverse linear guide 18LW, like the above-described traveling linear guide 18LL, includes a guide rail 18LW1 and two blocks 18LW2 provided thereon. The guide rail 18LW1 is arranged along the first horizontal direction D1 on a pair of long frame portions 18D1 of the traveling frame 18D. Limit switches 18S3 (see FIG. 2) that limit (block) movement of the block 18LW2 are installed near both longitudinal ends of the guide rail 18LW1.

The block 18LW2 of this linear guide for traverse 18LW is joined to the base plate 18E. Thereby, the base plate 18E is installed on the traveling frame 18D in a state where it can freely reciprocate along the first horizontal direction D1 (that is, the direction approaching the inner wall surface WS of the tunnel and the direction away from the inner wall surface WS). ing. In this embodiment, the base plate 18E is formed of a substantially square metal plate, but as described above, the plane dimension of the base plate 18E is smaller than the plane dimension of the traveling frame 18D. It can be made lighter. Therefore, the tunnel cleaning device 10 can be easily transported. Furthermore, the weight of the base plate 18E can be reduced, and the contact area with the traveling frame 18D when the base plate 18E moves back and forth can be reduced, so the base plate 18E can be moved even more smoothly. Note that when the base plate 18E is moved back and forth, the cleaning device main body BE on the base plate 18E is also moved back and forth.

A motor 18MW rotatable in both forward and reverse directions is installed near one corner of the base plate 18E. This motor 18MW is a moving means for reciprocating the base plate 18E in the first horizontal direction D1, and is composed of, for example, an electric motor. By configuring the motor 18MW with an electric motor, the weight of the tunnel cleaning device 10 can be reduced compared to the case where the motor 18MW is configured with a hydraulic motor.

The operations of the pedestal 18, the main body BE of the polishing apparatus, etc. described above can be remotely controlled by an operator using a controller (not shown).

Next, a configuration example of a control section that controls the operation of the tunnel cleaning device 10 will be described with reference to FIG. 12. FIG. 12 is a circuit block diagram of the main part of the control section of the tunnel cleaning device of this embodiment.

The control unit (control means) MC is a control means that controls the operation of the tunnel cleaning device 10, and includes a CPU (Central Processing Unit) 20a, a ROM (Read Only Memory) 20b, and a RAM (Random Access Memory) 20c. , movement control circuits 20d-1, 20d-2, 20d-3, rotation control circuit 20e, detection circuits 20f-1, 20f-2, 20f-3, polishing head angle control circuit 20m, rod extension/contraction. It has a circuit 20n, a cylinder lifting circuit 20p, a display control circuit 20g, an interface 20h, a communication interface 20i, and an EEPROM (Electrically Erasable Programmable ROM) 20j. Each of these parts is electrically connected to the CPU 20a through a bus line 20k, and under the control of the CPU 20a, the operation of each part is executed according to operation data sent from the interface 20h or the communication interface 20i. It has become.

The CPU 20a is electrically connected to the display section DP and the input section IP through the display control circuit 20g and the interface 20h, and can communicate wirelessly with an external wireless communication section CC through the communication interface 20i.

The ROM 20b stores software (control program) for controlling the operation of the tunnel cleaning device 10. The RAM 20c stores various data necessary for the operation of the CPU 20a, and also temporarily stores data received from the input unit IP or the external wireless communication unit CC. Then, the CPU 20a controls the movement control circuits 20d-1, 20d-2, 20d-3, the rotation control circuit 20e, the detection circuits 20f-1, 20f-2, 20f-3, and the polishing head angle according to the control program in the ROM 20b. It controls the operation of each part such as the control circuit 20m, the rod expansion/contraction circuit 20n, the cylinder lifting/lowering circuit 20p, the display control circuit 20g, the interface 20h, and the communication interface 20i.

The movement control circuit 20d-1 transmits a control signal to the motor 18ML based on a command from the CPU 20a, and controls movement of the traveling frame 18D (movement in the second horizontal direction D2). Furthermore, the movement control circuit 20d-2 transmits a control signal to the motor 18MW based on a command from the CPU 20a, and controls the movement of the base plate 18E (movement in the first horizontal direction D1). Furthermore, the movement control circuit 20d-3 transmits a control signal to the motor 18MS based on a command from the CPU 20a, and controls the movement of the slide frame 18C (movement in the first horizontal direction D1). Further, the rotation control circuit 20e transmits a control signal to the jack 18J based on a command from the CPU 20a to control the rotation operation of the rotation frame 18B.

Under the control of the CPU 20a, the detection circuits 20f-1 and 20f-2 emit laser light LL from the light emitting parts of the distance sensors SL1 and SL2 toward the inner wall surface WS, and receive the laser light at the light receiving parts of the distance sensors SL1 and SL2. The analog signal, which has been converted from an optical signal to an electrical signal, is converted into a digital signal and sent to the CPU 20a. In the present embodiment, the CPU 20a calculates the distance from each distance sensor SL1, SL2 to the inner wall surface WS based on the digital signals sent from the detection circuits 20f-1, 20f-2, and uses the calculation results as Based on this, the amount of rotation of the rotation frame 18B and the amount of movement of the slide frame 18C and base plate 18E are calculated. Furthermore, the detection circuit 20f-3 converts the analog signal measured by the load meter SL3 provided on the caster 17c of the polishing head 17 into a digital signal, and transmits the digital signal to the CPU 20a.

The polishing head angle control circuit 20m transmits a control signal to the rotary actuator 17ra based on a command from the CPU 20a, and controls the swing angle of the polishing head 17 in the first swing direction PR1.

The rod expansion/contraction circuit 20n transmits a control signal to the air compressor CP based on a command from the CPU 20a, and controls the amount of expansion/contraction of the cylinder rod 12ar by the air cylinder 12ac.

The cylinder lifting circuit 20p transmits a control signal to the screw motor 12bm based on a command from the CPU 20a, and controls the lifting and lowering of the air cylinder 12ac via the ball screw 12bn.

Various setting data of the tunnel cleaning device 10 and detection data from the distance sensors SL1 and SL2 are recorded in the EEPROM 20j.

As shown in FIG. 13, the tunnel cleaning system S, which is composed of the tunnel cleaning device 10 having the above configuration and the aerial work vehicle V on which the tunnel cleaning device 10 is mounted, is installed on the inner wall of the tunnel. In the cleaning of the WS, a first following vehicle system FS1 and a second following vehicle system FS2 are arranged in tandem with each other. Here, the first following vehicle system FS1 is a system in which a self-propelled transport vehicle is equipped with an air compressor, a blast tank, a hopper tank, etc., and the second following vehicle system FS2 is a self-propellable transport vehicle. This system is equipped with a collection machine, a generator, etc.

A power line L1 for supplying electric power generated by a generator to the tunnel cleaning device 10 is detachably provided between the tunnel cleaning system S and the second following vehicle system FS2. Further, a supply line L2 for supplying abrasive material from the blast tank to the cleaning device main body BE is detachably provided between the tunnel cleaning system S and the first following vehicle system FS1. Furthermore, between the tunnel cleaning system S and the first following vehicle system FS1, and between the first following vehicle system FS1 and the second following vehicle system FS2, there are A collection line L3 is detachably provided for sucking the abrasive material after cleaning and collecting it in a collection machine via a hopper tank.

Then, traffic is regulated in a lane (in the case shown, one lane on one side from the center line CL), and the tunnel cleaning system S, the first following vehicle system FS1, and the second following vehicle system are arranged in tandem. A traveling operation of cleaning the inner wall surface WS is performed over the entire length of the tunnel while moving the FS2 in the extending direction of the tunnel. Next, these three vehicles are moved across the tunnel (in this embodiment, inside the tunnel in the cross direction), and the entire length of the tunnel is similarly cleaned. Such work is repeated to polish the inner wall surface WS of the tunnel in the traffic restricted area.

Next, an example of cleaning the inner wall surface WS of a tunnel by the tunnel cleaning device 10 of this embodiment will be described with reference to FIGS. 1 to 3 and 14 to 40. Here, FIG. 14 is a flowchart showing the flow from the start of cleaning to the end of cleaning by the tunnel cleaning device of this embodiment, and FIG. 15 shows the flow of cleaning work by the tunnel cleaning device of this embodiment. Flowchart, FIGS. 16 to 38 are explanatory diagrams continuously showing a series of steps of the cleaning work, and FIG. 39 is a diagram showing the movement of the cleaning device main body provided in the tunnel cleaning device of this embodiment in the running direction. FIG. 40 is an explanatory diagram showing the movement of the first elevating mechanism section and the second elevating mechanism section in , and FIG. It is an explanatory view showing the height position of a polishing head. In addition, in FIGS. 16 to 38, (a) is an explanatory diagram showing a cross section of the tunnel in the transverse direction, (b) is an explanatory diagram shown in a direction perpendicular to (a), and (c) is an explanatory diagram shown in a plan view. It is an explanatory diagram.

First, the flow up to the start of the cleaning work will be explained using the flowchart of FIG. 14 and FIGS. 16 to 20.

First, as shown in FIG. 16, the aerial work vehicle V is placed in the grinding area (FIG. 14: Step S01). Specifically, with the tunnel cleaning device 10 mounted on the aerial work vehicle V shown in FIG. , transport the tunnel cleaning device 10 to the cleaning area. At this time, the deck portion Vb on which the tunnel cleaning device 10 is mounted is brought into a lowered state. Further, the cleaning head 17 of the tunnel cleaning device 10 is set to the lowest position (see FIG. 6(a)). Thereby, in this embodiment, the tunnel cleaning device 10 can be transported to the cleaning area in a stable state. As shown in FIG. 2, the tunnel cleaning device 10 has a cleaning surface of its cleaning head 17 (a surface facing the inner wall surface WS of the tunnel, and a mounting base 17a on which a cleaning machine 17b and the like are installed). -1 main surface) faces the inner wall surface WS of the tunnel. Moreover, the above-described first horizontal direction D1 intersects the inner wall surface WS of the tunnel, and the second horizontal direction D2 is along the extending direction (running direction) of the tunnel. Note that here, a case is illustrated in which the cleaning surface of the cleaning head 17 of the cleaning device main body BE is inclined with respect to the inner wall surface WS of the tunnel.

Next, the loading platform of the aerial work vehicle V is unfolded (FIG. 14: Step S02), various wiring and piping are connected, and the power is turned on (FIG. 14: Step S03). The operations after the power is turned on, except for the lifting and lowering of the platform (work floor) of the aerial work vehicle V, are executed under the control of the control unit MC described above.

That is, once the power is turned on, as shown in FIG. 17, the main body BE of the polishing device is returned to its origin, the operating origin position is confirmed, and an initial diagnosis of the device is performed (FIG. 14: Step S04).

Next, the cleaning surface of the cleaning head 17 of the cleaning device main body BE is set to be parallel to the inner wall surface WS of the tunnel. That is, the distances from the distance sensors SL1 and SL2 to the inner wall surface WS of the tunnel are measured by the distance sensors SL1 and SL2, and the deviation angle of the aerial work vehicle V with respect to the inner wall surface WS of the tunnel is calculated (FIG. 14: Step S05). Is it necessary to correct the deviation angle of the aerial work vehicle V based on the measured value of each distance (that is, whether the cleaning surface of the cleaning head 17 of the cleaning device main body BE is relative to the inner wall surface WS of the tunnel)? (FIG. 14: Step S06), and further determines whether the deviation angle can be corrected (that is, whether it can be corrected by rotating the rotating frame 18B whose rotation angle is ±5°). (FIG. 14: Step S07). In this embodiment, it is necessary to correct the deviation angle of the aerial work vehicle V, and since the deviation angle can be corrected, as shown in FIG. 18, the rotation frame 18B is rotated to correct the deviation angle. The correction is made so that the cleaning surface of the cleaning head 17 of the cleaning device main body BE is parallel to the inner wall surface WS of the tunnel (FIG. 14: Step S08).

Note that if it is determined in step S06 that no correction is necessary, the process moves to the next step S10. If it is determined in step S07 that correction is not possible, the aerial work vehicle V is repositioned (FIG. 14: step S09), and the process returns to step S04.

Next, the tunnel shape is calculated with reference to the design drawing etc. (FIG. 14: Step S10), and the grinding position P is confirmed (FIG. 14: Step S11).

As a result of the confirmation in step S11, it is determined whether the main body BE of the cleaning device can be installed at the cleaning start position (that is, the cleaning device can be installed by simply adjusting the pedestal 18 while leaving the aerial work vehicle V in the same position. It is determined whether the main body BE can be installed at the cleaning start position (FIG. 14: Step S12). In this embodiment, since the cleaning device main body BE can be installed at the cleaning start position, the ceiling height of the cleaning position P is subsequently calculated (FIG. 14: Step S13). That is, the distance from the distance sensors SL1, SL2 to the inner wall surface WS of the ceiling of the tunnel is measured by irradiating the laser beam LL directly above from the distance sensors SL1, SL2, and the height to the ceiling is calculated. Note that if it is determined in step S12 that the cleaning device main body BE cannot be installed at the cleaning start position, the process moves to step S09 described above, the aerial work vehicle V is repositioned, and the process returns to step S04.

Next, based on the calculated ceiling height of the grinding position P, determine whether it is necessary to raise the loading platform (work floor) of the aerial work vehicle V (that is, whether it is necessary to raise the loading platform (work floor) of the aerial work vehicle V (in other words, even if the loading platform is not raised, the cleaning surface of the polishing head 17 can be (FIG. 14: Step S14). In this embodiment, since it is necessary to raise the loading platform of the aerial work vehicle V, as shown in FIG. (FIG. 14: Step S15). Note that if it is determined in step S14 that it is not necessary to raise the loading platform, the process moves to the next step S16.

Once the loading platform of the aerial work vehicle V has been raised in step S15, the cleaning device main body BE is set to the cleaning position P (FIG. 14: step S16). That is, first, as shown in FIG. 20, the cleaning device main body BE is moved to just below the cleaning position P. Specifically, based on the distance information obtained by the distance sensors SL1 and SL2, the slide frame 18C is slid (horizontally moved) in a direction approaching the inner wall surface WS of the tunnel and stopped at a predetermined position, and the base plate 18E is is moved in a direction approaching the inner wall surface WS of the tunnel, and further, if necessary, the traveling frame 18D is moved in a direction along the inner wall surface WS of the tunnel to move the cleaning device main body BE to just below the cleaning position P. Then, the rotary actuator 17ra swings the mounting portion 17a at a swing angle in a first swing direction PR1 (see FIG. 2) so that the grinding surface of the grinding head 17 is pressed against the inner wall surface WS of the tunnel at an optimal angle. (Tilt angle).

Once the cleaning device main body BE is set to the cleaning position P in step S16, the cleaning operation for the inner wall surface WS of the tunnel is executed (FIG. 14: step S17). That is, by moving the polishing device body BE in the extending direction of the tunnel while spraying the abrasive material from the grinder 17b of the polishing head 17 onto the inner wall surface WS of the tunnel, the degraded portion of the inner wall surface WS of the tunnel is ground. The inner wall surface WS is polished. The details of the operations of the pedestal 18, the main body BE of the grinding device, etc. during the grinding work will be described later.

After the polishing work in step S17 is completed, the next work is confirmed (FIG. 14: step S18). Here, the next work is to move the aerial work vehicle V in the extending direction of the tunnel and perform the cleaning, to move the aerial work vehicle V to the inner side in the transverse direction of the tunnel and perform the cleaning, and the end of cleaning.

In step S18, if the next work is to move the aerial work vehicle V in the extending direction of the tunnel and perform the grinding, the deck portion Vb of the aerial work vehicle V is lowered to lower the loading platform and the ground is polished. Lower the cleaning device main body BE to the initial height (the height before raising the loading platform in step S15) (FIG. 14: Step S19), and then lower the cleaning device main body BE to the origin (FIG. 17(c)). (FIG. 14: Step S20). Then, the aerial work vehicle V is moved forward (or backward) to move to the next work position in the direction in which the tunnel extends (FIG. 14: Step S21). Thereafter, the process moves to step S05 described above, and the subsequent steps are sequentially executed.

Further, in step S18, if the next work is to move the aerial work vehicle V in the extending direction of the tunnel and perform cleaning, the piping and wiring are cut and the moving work process is performed (Fig. 14 :Step S22). That is, the power supply line L1 is provided between the tunnel cleaning system S composed of the tunnel cleaning device 10 and the aerial work vehicle V, the first following vehicle system FS1, and the second following vehicle system FS2. , supply line L2, and recovery line L3 are removed. In addition, the deck part Vb of the aerial work vehicle V is used to lower the loading platform to lower the cleaning device main body BE to the initial height, and the cleaning device main body BE is placed in the transportation position (the position shown in FIG. 16(c)). Moves and stores the cargo platform of the deployed aerial work vehicle V. Then, the aerial work vehicle V is moved inward in the cross direction of the tunnel to the next work position (FIG. 14: Step S23). After that, the process moves to step S01 described above, and the subsequent steps are sequentially executed.

Then, in step S18, if the next work is to finish the cleaning, the piping and wiring are cut, and a work completion process is performed (FIG. 14: step S24). That is, the power line L1, the supply line L2, and the recovery line L3 are removed, and the platform is lowered using the deck section Vb of the aerial work vehicle V to lower the cleaning device main body BE to its original height. Move to the transportation position and store the platform of the unfolded aerial work vehicle V. Then, exit from the construction restricted area.

Here, the cleaning work for the inner wall surface WS of the tunnel in step S17 will be explained using the flowchart of FIG. 15.

To start the cleaning work, first, the cleaning head 17 is pressed against the inner wall surface WS of the tunnel (FIG. 15: Step S17-01). That is, the cleaning head 17, which has been adjusted to an optimal angle with respect to the inner wall surface WS of the tunnel, is raised by the lifting mechanism 12, and the cleaning surface of the cleaning head 17 is pressed against the inner wall surface WS of the tunnel. At this time, the casters 17c of the cleaning surface of the cleaning head 17 are pressed against the inner wall surface WS of the tunnel, but as described above, the polishing head 17 swings to follow the curved shape of the inner wall surface WS of the tunnel. By doing so, the cleaning surface of the cleaning head 17 comes to abut and face the inner wall surface WS of the tunnel in an optimal state.

After the cleaning head 17 is pressed against the inner wall surface WS of the tunnel in step S17-01, the two cleaning machines 17b are pressed by the air cylinder 17p (FIG. 15: step S17-02), and the cleaning machine Abrasive material is injected from 17b (FIG. 15: Step S17-03).

Then, the traveling frame 18D is moved from one end of the slide frame 18C to the other end along the extending direction (running direction) of the tunnel, and the cleaning device main body BE is moved along the extending direction of the tunnel while spraying the abrasive material onto the inner wall surface WS of the tunnel. (traveling step) (FIG. 15: Step S17-04). Thereby, the deteriorated portion of the inner wall surface WS of the tunnel is ground, thereby cleaning the inner wall surface WS. In addition, during the traveling operation, the peeled pieces and abrasive material are sucked from the suction port 17b-2 of the polishing head 17 to prevent the peeled pieces and the abrasive material from leaking to the outside when cleaning the inner wall surface WS of the tunnel. do. In this embodiment, as described above, the first ring brush 17s-1 and the second ring brush 17s-2 of the polishing head 17 serve as walls to prevent peeled pieces and abrasive material from leaking to the outside. There is.

Here, as shown in FIG. 39, in the present embodiment, when the main body BE of the grinding device is moved in the direction in which the tunnel extends for cleaning, the second elevating mechanism section 12b (ball screw 12bn) is Stretch gradually. Since the polishing head 17 attached to the tip of the cylinder rod 12ar of the first elevating mechanism section 12a (air cylinder 12ac) is pressed against the tunnel inner wall surface WS, the second elevating mechanism section 12b (ball screw 12bn) The cylinder rod 12ar retreats by the length of the extension (the length indicated by the symbol h in FIG. 39), and the first elevating mechanism portion 12a (air cylinder 12ac) contracts. Furthermore, when the cylinder rod 12ar retreats, the air corresponding to the reduction in the volume of the cylinder chamber due to the retreat is released into the atmosphere from a relief type pressure reducing valve (or relief valve) not shown, and the air is released into the atmosphere from the first lifting mechanism section 12a (air The air pressure within the cylinder 12ac) is kept constant.

Note that when cleaning the curved tunnel inner wall surface WS while moving the cleaning line inward in the tunnel transverse direction, the difference in height between one cleaning position and the next cleaning position gradually becomes smaller. , the amount of rise of the polishing head 17 during lateral movement (FIG. 15: step S17-10), which will be described later, gradually becomes smaller. Therefore, the amount of expansion of the second elevating mechanism section 12b (ball screw 12bn) during traveling is also gradually reduced accordingly. In this embodiment, the stroke length of the first elevating mechanism section 12a (air cylinder 12ac) during traversing is measured with a stroke meter, and the amount of extension of the second elevating mechanism section 12b (ball screw 12bn) during the next traveling. is set to 3/8 of the measured stroke length. However, the extension ratio to the stroke length is not limited to 3/8, and can be set freely.

When the traveling frame 18D is moved to the other end of the slide frame 18C and the traveling operation for one line is completed (FIG. 15: Step S17-05), the traveling line is the preset final traveling line (that is, the final polishing line) (FIG. 15: Step S17-06).

If it is determined in step S17-06 that it is not the final travel line, is it possible to perform a lateral movement of changing the cleaning height (grinding line) of the cleaning device main body BE by sliding the slide frame 18C inward in the transverse direction of the tunnel? (FIG. 15: Step S17-07). Further, if it is the final travel line in step S17-06, the cleaning operation in step S17 is completed (returns) and the process proceeds to step S18 described above.

Now, if the slide frame 18C is not capable of lateral movement in step S17-07, is it possible to secure the amount of traverse movement with the cleaning device main body BE? It is determined whether a lateral movement of changing the cleaning height (cleaning line) of the cleaning device body BE by moving it inward is possible (FIG. 15: Step S17-08). Furthermore, if the slide frame 18C is capable of lateral movement in step S17-07, the process moves to step S17-09, which will be described later.

If the amount of traverse movement can be secured with the base plate 18E in step S17-08, or if the traverse movement can be achieved with the slide frame 18C in step S17-07, is the polishing height within the extension range of the rod 15? In other words, it is determined whether the polishing head 17 can reach the cleaning position by extending the rod 15 using the lifting mechanism 12 (FIG. 15: Step S17-09). Further, if it is not possible to secure the amount of traversal with the base plate 18E in step S17-08, the cleaning operation in step S17 is ended (return), and the process proceeds to step S18 described above.

If the grinding height is within the extension range of the rod 15 in step S17-09, the grinding device main body BE is operated laterally while the abrasive material is injected, and the rod 15 is moved by the lifting mechanism 12. It is extended (traverse process) (FIG. 15: Step S17-10).

Here, as described above, when the main body BE of the cleaning device is moved in the extending direction of the tunnel to perform cleaning in step S17-04, the second elevating mechanism section 12b (ball screw 12bn) is extended and the cylinder The rod 12ar is moved backward, and the first elevating mechanism section 12a (air cylinder 12ac) is retracted. At this time, as the cylinder rod 12ar retreats, air in the cylinder chamber is released to the atmosphere (not shown), and the air pressure in the first lifting mechanism 12a (air cylinder 12ac) is kept constant.

Therefore, in FIG. 40, when the main body BE of the grinding device moves in the transverse direction by a length L and the air pressure in the first elevating mechanism section 12a (air cylinder 12ac) is about to decrease, the air pressure from the air compressor CP is Compressed air is supplied to keep the temperature constant. As a result, the first elevating mechanism section 12a (air cylinder 12ac) rises, and the polishing head 17 attached to the tip of the first elevating mechanism section 12a remains pressed against the tunnel inner wall surface WS (i.e. , while the pressing force against the tunnel inner wall surface WS is maintained), the line rises along the tunnel inner wall surface WS and the cleaning process is completed by a height H from the cleaning height P1 of the line for the next cleaning. Move to height P2.

Through such an operation, the cleaning height of the cleaning head 17 provided in the tunnel cleaning device is changed accurately and quickly.

Now, in step S17-10, after the lateral movement of the grinding device main body BE is performed and the rod 15 is further extended, the process moves to the aforementioned step S17-04, and the grinding device main body BE is moved into the tunnel for the next line. (running operation) to clean the inner wall surface WS of the tunnel. Further, if the grinding height is not within the extension range of the rod 15 in step S17-09, the injection of the abrasive material is stopped (FIG. 15: step S17-11), and the The pressing is released (FIG. 15: Step S17-12). Then, while performing a lateral movement of the grinding device main body BE, the rod 15 is contracted by the lifting mechanism section 12 (FIG. 15: Step S17-13), and the platform is raised by the deck section Vb of the aerial work vehicle V ( FIG. 15: Step S17-14), the rod 15 is extended again by the lifting mechanism 12 (FIG. 15: Step S17-15), and the process proceeds to step S17-01 described above.

Here, specific movements of the cleaning device main body during the cleaning work on the inner wall surface WS of the tunnel in step S17 will be explained using FIGS. 21 to 38.

As shown in FIG. 20, when the main body BE of the cleaning device is moved to just below the cleaning position P, the cleaning head 17 is pressed against the inner wall surface WS of the tunnel, as shown in FIG. That is, in FIG. 20, the cleaning head 17, which has been adjusted to an optimal angle with respect to the inner wall surface WS of the tunnel, is raised by extending the rod 15, and then the two cleaning machines 17b are moved by the air cylinder 17p. By pressing, the cleaning surface of the cleaning head 17 is pressed against the inner wall surface WS of the tunnel.

Next, the traveling frame 18D is moved at a set speed from one end of the slide frame 18C to the other end along the extending direction (traveling direction) of the tunnel, and as shown in FIG. The cleaning device main body BE is made to run in the extending direction of the tunnel while spraying on the inner wall surface WS of the tunnel, thereby cleaning the inner wall surface WS of the tunnel.

Next, as shown in FIG. 23, the slide frame 18C is slid inward in the tunnel transverse direction, and the cleaning device main body BE is moved inward in the tunnel transverse direction (traverse) to adjust the cleaning height (grinding line). change. Further, the rod 15 is extended to press the cleaning surface of the cleaning head 17 against the tunnel inner wall surface WS of the changed cleaning line. Note that at this time, the abrasive material remains injected.

Next, as shown in FIG. 24, the traveling frame 18D is moved from one end to the other end of the slide frame 18C along the tunnel extension direction (traveling direction) (from one end to the other end in the opposite direction to the case shown in FIG. 22). ) at a set speed, and while jetting abrasive material from the grinder 17b onto the inner wall surface WS of the tunnel, the main body BE of the grinding device is run in the extending direction of the tunnel, thereby grinding the inner wall surface WS of the tunnel. .

Next, as shown in FIG. 25, the slide frame 18C is slid inward in the transverse direction of the tunnel, and while the abrasive material is being injected, the main body BE of the cleaning device is moved (traverse) inward in the transverse direction of the tunnel to increase the cleaning height. (Changing the grinding line). Further, the rod 15 is extended to press the cleaning surface of the cleaning head 17 against the tunnel inner wall surface WS of the changed cleaning line.

Next, as shown in FIG. 26, the running frame 18D is moved from one end of the slide frame 18C to the other end along the tunnel extension direction (running direction) (in the same direction as shown in FIG. 22, in the case shown in FIG. 24). (from one end to the other end in the opposite direction) at a set speed, and the cleaning device main body BE is run in the extending direction of the tunnel while jetting the abrasive material from the cleaning device 17b onto the inner wall surface WS of the tunnel. , the inner wall surface WS of the tunnel is polished.

The inner wall surface WS of the tunnel is polished by repeating the cleaning work by traveling by the traveling frame 18D and changing the polishing line by traversing by the slide frame 18C. If the height of the grinding of the inner wall surface WS of the tunnel reaches a height that cannot be reached by the grinding head 17 even if the rod 15 is extended by the lifting mechanism section 12, as shown in FIG. The jetting of the cleaning device 17b is stopped, the pressing of the cleaning device 17b against the inner wall surface WS of the tunnel is released, the rod 15 is contracted, and the base plate 18E is moved inward in the transverse direction of the tunnel to move the cleaning device main body BE to the slide frame 18C. Move to the inner end of the tunnel. Then, the platform is raised by the deck portion Vb of the aerial work vehicle V.

Next, as shown in FIG. 28, the slide frame 18C is moved inward in the transverse direction of the tunnel, the base plate 18E is moved in a direction approaching the inner wall surface WS of the tunnel, and the cleaning device main body BE is moved to the cleaning position P. Move it directly below. Further, the swing angle (tilt angle) of the first swing direction PR1 of the mounting portion 17a is adjusted so that the grinding surface of the grinding head 17 is pressed against the inner wall surface WS of the tunnel at an optimal angle. .

Then, as shown in FIG. 29, the lifting mechanism 12 extends the rod 15, and the air cylinder 17p presses the cleaning machine 17b to press the cleaning surface of the cleaning head 17 against the inner wall surface WS of the tunnel.

Next, as shown in FIG. 30, the traveling frame 18D is moved at a set speed from one end of the slide frame 18C to the other end along the extending direction (traveling direction) of the tunnel, and the abrasive material is injected from the grinder 17b. The cleaning device main body BE is made to run in the extending direction of the tunnel while spraying on the inner wall surface WS of the tunnel, thereby cleaning the inner wall surface WS of the tunnel.

Next, as shown in FIG. 31, the slide frame 18C is slid inward in the transverse direction of the tunnel, and the cleaning device main body BE is moved (traversed) inward in the tunnel transverse direction while the abrasive material is being injected to increase the cleaning height. (Changing the grinding line). Further, the rod 15 is extended to press the cleaning surface of the cleaning head 17 against the tunnel inner wall surface WS of the changed cleaning line.

Next, as shown in FIG. 32, the traveling frame 18D is moved at a set speed from one end of the slide frame 18C to the other end along the extending direction (traveling direction) of the tunnel, and the abrasive material is injected from the grinder 17b. The cleaning device main body BE is made to run in the extending direction of the tunnel while spraying on the inner wall surface WS of the tunnel, thereby cleaning the inner wall surface WS of the tunnel.

The inner wall surface WS of the tunnel is polished by repeating the cleaning work by traveling by the traveling frame 18D and changing the polishing line by traversing by the slide frame 18C. Then, if the slide frame 18C moves to the limit of sliding inward in the transverse direction of the tunnel (that is, if the slide frame 18C can no longer slide inward in the transverse direction of the tunnel), the base plate 18E is moved inward in the transverse direction of the tunnel, and while the abrasive material is being injected, the main body BE of the grinding device is moved inward in the transverse direction of the tunnel (traverse) to change the grinding height (grinding line). Further, the rod 15 is extended to press the cleaning surface of the cleaning head 17 against the tunnel inner wall surface WS of the changed cleaning line.

Then, as shown in FIG. 34, the traveling frame 18D is moved at a set speed from one end of the slide frame 18C to the other end along the extending direction (traveling direction) of the tunnel, and the abrasive material is injected from the grinder 17b. The cleaning device main body BE is made to run in the extending direction of the tunnel while spraying on the inner wall surface WS of the tunnel, thereby cleaning the inner wall surface WS of the tunnel.

Next, since the slide frame 18C has moved to the inner sliding limit in the transverse direction of the tunnel, the base plate 18E is moved inward in the transverse direction of the tunnel, as shown in FIG. The cleaning device body BE is moved inward in the tunnel crossing direction (traversing) to change the cleaning height (cleaning line). Further, the rod 15 is extended to press the cleaning surface of the cleaning head 17 against the tunnel inner wall surface WS of the changed cleaning line.

The inner wall surface WS of the tunnel is polished by repeating the cleaning work by traveling by the traveling frame 18D and changing the polishing line by traversing by the base plate 18E.

Then, when the base plate 18E reaches the long frame portion 18C2 on the inner side in the tunnel transverse direction and the cleaning device main body BE moves (traverses) to the position where the movement limit in the tunnel transverse direction is reached (see FIG. 35), As shown in FIG. 36, the traveling frame 18D is moved at a set speed from one end of the slide frame 18C to the other end along the tunnel extending direction (running direction), and the cleaning device main body BE is traveling in the tunnel extending direction. Then, perform the cleaning on the last cleaning line.

After completing a series of grinding operations in this way, if the next task is to move the aerial work vehicle V in the direction in which the tunnel extends, then as shown in FIG. Lower the loading platform of the vehicle V to lower the grinding device main body BE to the height at the time of delivery, move the grinding device main body BE to the origin (position shown in Fig. 17(c)), and rotate the slide frame 18C. Move to the reference position of frame 18B. Note that since the grinding work is performed by moving the aerial work vehicle V in the extending direction of the tunnel, the parallelism of the rotating frame 18B to the tunnel inner wall surface WS does not change, so the deviation angle has already been corrected. Rotating frame 18B does not rotate. Then, the aerial work vehicle V is moved forward (or backward), moved to the next work position in the direction in which the tunnel extends, and resumes the cleaning work.

Moreover, if the next work is a cleaning work to be performed by moving the aerial work vehicle V to the inner side in the cross direction of the tunnel, the piping and wiring are cut. Then, as shown in FIG. 38, the loading platform of the aerial work vehicle V is lowered to lower the grinding device main body BE to the height at the time of delivery, and the grinding device main body BE is moved to the transportation position (FIG. 16(c)). ) and store the cargo platform of the deployed aerial work vehicle V. Further, the slide frame 18C is moved to the reference position of the rotating frame 18B, and the rotating frame 18B is rotated to the reference position of the base frame 18A. Then, the aerial work vehicle V is moved inward in the transverse direction of the tunnel to the next work position, and the cleaning work is resumed.

In addition, when the next work is to finish the grinding, the aerial work vehicle V is moved to the inner side in the cross direction of the tunnel and performs the same process as the grinding work, and then exits from the construction restricted area.

As described above, according to the present embodiment, when the cleaning head 17 is moved in the traveling direction to polish the tunnel inner wall surface WS, the second elevating mechanism section 12b composed of the ball screw 12bn performs an upward movement. When this is done, the first elevating mechanism section 12a composed of the air cylinder 12ac contracts while the air pressure is kept constant. Then, when the polishing head 17 moves in the transverse direction away from the tunnel inner wall surface WS, compressed air for keeping the air pressure constant is supplied from the air compressor CP to the air cylinder 12ac and rises. Therefore, the cleaning head 17 attached to the air cylinder 12ac moves upward along the tunnel inner wall surface WS to the next cleaning height while being pressed against the tunnel inner wall surface WS.

This makes it possible to accurately and quickly change the cleaning height of the cleaning head 17 provided in the tunnel cleaning device 10.

(Second embodiment)

FIG. 41 is a conceptual diagram showing a tunnel cleaning system to which the tunnel cleaning device of this embodiment is attached.

In this embodiment, the aerial work vehicle V is different from the first embodiment, but the other configurations are the same. The aerial work vehicle V of the present embodiment has a boom Va provided on the loading platform side, and a deck portion Vb provided at the tip of the boom Va in a state capable of undulation, rotation, and linear expansion and contraction. We are prepared. The tunnel cleaning device 10 is mounted on the deck portion Vb. When cleaning the inner wall surface WS of the tunnel, the boom Va is operated to set the tunnel cleaning device 10 at a predetermined height (the above-mentioned cleaning height positions R1 to R4 (see FIG. 6)).

In the aerial work vehicle V of the present embodiment, the cleaning angle of the cleaning head 17 (the angle for setting the parallelism between the cleaning surface of the cleaning head 17 and the inner wall surface WS of the tunnel) is set to the boom Va. It can be adjusted by the operation of .

Further, the structure of the mount 18 (see FIG. 4) of the tunnel cleaning device 10 is such that the base plate 18E can be moved in the first horizontal direction D1, but cannot be moved in the second horizontal direction D2. Even in this case, the boom Va can move the polishing head 17 in the second horizontal direction D2. Other effects are the same as those of the embodiment described above.

In addition, the aerial work vehicle V may not be such a telescopic boom type, but may be a refracting boom type in which the boom is bent midway, or a lifter type (mast boom type/scissor type) in which the deck portion Vb rises and lowers vertically. .

Although the invention made by the present inventor has been specifically explained based on the embodiments above, the embodiments disclosed in this specification are illustrative in all respects, and are limited to the disclosed technology. isn't it. In other words, the technical scope of the present invention should not be construed in a limited manner based on the description of the embodiments described above, but should be construed solely in accordance with the description of the claims, and the scope of the claims This invention includes techniques equivalent to the techniques described in , and all changes without departing from the gist of the claims.

For example, in the present embodiment, the traveling process (moving the cleaning device main body BE in the traveling direction and pressing the tunnel inner wall surface WS with the polishing head 17 to polish a predetermined cleaning line; A process of extending the lifting mechanism part 12b (ball screw 12bn) to a predetermined height), a traversing process (after the running process, moving the main body BE of the grinding device in the traverse direction, and extending the first lifting mechanism part 12a (air cylinder 12ac) to move the polishing head 17 to the height of the next polishing line by supplying compressed air to the cleaning line 12ac) is executed under the control of the control unit MC, but it is manually executed by the operator's operation. You may also do so.

In addition, in the traveling process, the second elevating mechanism section 12b (ball screw 12bn) is gradually extended to a predetermined height during the entire movement process from the start of the movement of the main body BE to the end of the movement. The elongation to a predetermined height may be completed in the middle of the process.

Further, in the above embodiment, a case has been described in which the distance sensors SL1 and SL2 are installed in the tunnel cleaning device 10, but the installation positions of the distance sensors SL1 and SL2 are not limited to this and can be changed in various ways. For example, the distance sensors SL1 and SL2 may be installed in a part of the aerial work vehicle V. Further, an operator measures the parallelism (inclination angle) between the tunnel cleaning device 10 and the inner wall surface WS of the tunnel in plan view using a measuring device equipped with distance sensors SL1 and SL2, and the measurement results are shown in FIG. The data may be transmitted (recorded) to the EEPROM 20j of the control unit MC through the wireless communication unit CC or input unit IP shown in FIG.

In the above description, the cleaning device of the present invention is configured to perform cleaning by the control means, but it may be a cleaning device that performs cleaning by manual operation by an operator.

10 Tunnel cleaning equipment (grinding equipment)
12 Lifting mechanism section (lifting means)
12a First elevating mechanism section (first elevating means)
12ac air cylinder (lifting equipment)
12b Second elevating mechanism section (second elevating means)
12bm Screw motor 12bn Ball screw (lifting equipment)
15 Rod 17 Grinding head 17a Mounting part 17b Grinding machine (grinding part)
17c Caster 17r Arm part (swinging part)
17r-2 First support plate (first swinging part)
17r-3 Second support plate (second swinging part)
18 Frame 18A Base frame 18B Rotating frame (rotating means)
18C Slide frame (movement means)
18D Traveling frame (transportation means)
18E Base plate (transportation means)
18J Jack 18LL Guide rail 18LW Guide rail BE Grinding device main body D1 First horizontal direction D2 Second horizontal direction MC Control unit (control means)
P Grinding position S Tunnel cleaning system (cleaning system)
SL1, SL2 Distance sensor (sensor)
SL3 Load cell V Aerial work vehicle (work vehicle)
Vb Deck part WS Inner wall surface

Claims (4)

A cleaning device main body comprising a cleaning head for cleaning a curved inner wall surface of a tunnel, a first elevating means for elevating and lowering the cleaning head, and a second elevating means for elevating and lowering the first elevating means;
a pedestal on which the polishing device main body is mounted and is provided with a moving means that moves in a first horizontal direction that approaches and moves away from the inner wall surface and a second horizontal direction that intersects the first horizontal direction;
comprising a control means for controlling the operation of the polishing device main body and the moving means,
One of the first lifting means and the second lifting means is constituted by a pneumatic lifting device using an air compressor as a driving source, and the other lifting means uses a motor as a driving source. It consists of rotary lifting equipment,
The control means includes:
While moving the main body of the polishing device in the running direction, which is the second horizontal direction, with the moving means and pressing the inner wall surface with the polishing head and cleaning a predetermined cleaning line, the rotary a traveling step of extending the lifting device to a predetermined height and contracting the pneumatic lifting device by the amount of extension of the rotary lifting device;
When the traveling step is completed, the moving means moves the main body of the polishing device in the first horizontal direction, that is, the transverse direction, and compressed air is supplied to the pneumatic lifting device to move the cleaning head. a traverse process in which the
repeating the steps to perform a cleaning operation on the inner wall surface;
A grinding device characterized by: a distance sensor that detects a distance from the mount to the inner wall surface;
further comprising a rotation means provided on the pedestal and configured to rotate the polishing device main body along a mounting surface of the polishing device main body;
The control means includes:
Based on the detection result of the distance sensor, it is determined that after the rotating means rotates the main body of the polishing device so that the cleaning surface of the polishing head becomes parallel to the inner wall surface, the inner wall surface is polished. Execute control to perform cleaning work,
The polishing device according to claim 1, characterized in that: A cleaning device main body comprising a cleaning head for cleaning a curved inner wall surface of a tunnel, a first elevating means for elevating and lowering the cleaning head, and a second elevating means for elevating and lowering the first elevating means;
a pedestal on which the polishing device main body is mounted and which is provided with a moving means that moves in a first horizontal direction that approaches and moves away from the inner wall surface and a second horizontal direction that intersects the first horizontal direction; have,
One of the first lifting means and the second lifting means is constituted by a pneumatic lifting device using an air compressor as a driving source, and the other lifting means uses a motor as a driving source. Using a grinding device composed of rotary lifting equipment,
While moving the main body of the polishing device in the running direction, which is the second horizontal direction, with the moving means and pressing the inner wall surface with the polishing head and cleaning a predetermined cleaning line, the rotary a traveling step of extending the lifting device to a predetermined height and contracting the pneumatic lifting device by the amount of extension of the rotary lifting device;
When the traveling step is completed, the moving means moves the main body of the polishing device in the first horizontal direction, that is, the transverse direction, and compressed air is supplied to the pneumatic lifting device to move the cleaning head. a traverse process in which the
Clean while repeating
A method for polishing an inner wall surface of a tunnel. comprising an elevator that raises and lowers the polishing device,
In the traversing step, if the polishing height is not within the extension range of the first elevating means and the second elevating means, raising the polishing device with the elevator;
4. The method for cleaning a tunnel inner wall surface according to claim 3.

Images