JP7400382B2 - Electro-optical devices and electronic equipment - Google Patents

Description

The present invention relates to an electro-optical device and an electronic device.

2. Description of the Related Art Electronic devices such as projectors generally use electro-optical devices such as liquid crystal devices that can change optical characteristics for each pixel. Patent Document 1 discloses a liquid crystal device having an upper substrate, a lower substrate, and a liquid crystal layer sandwiched between these two substrates. The two substrates are bonded together using a resin sealing member. The liquid crystal layer is sealed with a seal member.

Furthermore, the liquid crystal device described in Patent Document 1 includes a columnar spacer for adjusting the gap between the two substrates. The spacer is arranged within the display area, inside the seal member, or outside the seal member.

JP2004-93844A

If a columnar spacer is placed within the display area, there is a risk that the contrast will decrease. If a columnar spacer is not placed within the display area but placed outside or inside the sealing member in order to prevent a decrease in contrast, the center portion of the substrate will easily bend. As a result, the gap between the two substrates varies. Further, if the spacer is columnar, the mechanical strength of the spacer is insufficient, and as a result, it is difficult to make the gap between the substrates uniform. For this reason, there is a possibility that display quality may deteriorate.

One aspect of the electro-optical device of the present invention includes a first substrate, a second substrate facing the first substrate, an electro-optic layer disposed between the first substrate and the second substrate, and a resin. a frame-shaped sealing member containing a material, disposed between the first substrate and the second substrate, and surrounding the electro-optic layer in a plan view; and a frame-shaped sealing member containing an inorganic material, the first substrate and the second substrate. a first spacer that defines a distance between the electrode, the first inorganic material film disposed between the electrode and the first spacer, and the first inorganic material a first light-shielding film disposed between the material film and the first spacer; and a light-shielding partition disposed inside the sealing member in plan view and spaced apart from the sealing member . The first spacer is arranged between the sealing member and the display area in a plan view, spaced apart from the sealing member, and extends along an outer edge of the display area and overlaps with the parting part in the plan view. placed in position.

FIG. 1 is a cross-sectional view of an electro-optical device according to a first embodiment. FIG. 3 is an equivalent circuit diagram showing the electrical configuration of the element substrate. It is a sectional view showing a first spacer and a second spacer. It is a top view which shows a 1st spacer and a 2nd spacer. FIG. 3 is a cross-sectional view for explaining a method of forming an inorganic material film, a light shielding film, and an insulating layer. FIG. 3 is a cross-sectional view for explaining a method of forming a first spacer and a second spacer. FIG. 3 is a cross-sectional view for explaining a method of forming a light-shielding film. FIG. 3 is a cross-sectional view for explaining a method of forming an inorganic material film. FIG. 7 is a cross-sectional view showing a part of an electro-optical device according to a second embodiment. 10 is a plan view showing a first spacer, a second spacer, and a third spacer shown in FIG. 9. FIG. It is a top view which shows arrangement|positioning of the 1st spacer and the sealing member in a modification. It is a sectional view showing a first spacer and a second spacer in a modified example. 1 is a perspective view showing a personal computer that is an example of an electronic device. FIG. 1 is a plan view showing a smartphone, which is an example of an electronic device. FIG. 1 is a schematic diagram showing a projector that is an example of an electronic device.

Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings. In the drawings, the dimensions or scale of each part may differ from the actual size, and some parts are shown schematically to facilitate understanding. Further, the scope of the present invention is not limited to these forms unless there is a statement that specifically limits the present invention in the following description.

1. Electro-Optical Device As an example of the electro-optical device of the present invention, an active matrix liquid crystal device will be described as an example.

1A. First embodiment 1A-1. Basic Configuration FIG. 1 is a sectional view of an electro-optical device according to a first embodiment. Note that in FIG. 1, illustration of the counter substrate 4 is omitted. Further, in the following description, for convenience of explanation, the X-axis, Y-axis, and Z-axis, which are orthogonal to each other, will be used as appropriate. Further, one direction along the X axis is referred to as the X1 direction, and a direction opposite to the X1 direction is referred to as the X2 direction. Similarly, one direction along the Y axis is referred to as the Y1 direction, and the direction opposite to the Y1 direction is referred to as the Y2 direction. One direction along the Z axis is referred to as the Z1 direction, and the direction opposite to the Z1 direction is referred to as the Z2 direction.

The electro-optical device 100 shown in FIG. 1 is a transmissive liquid crystal device. As shown in FIG. 1, the electro-optical device 100 includes a light-transmitting element substrate 2, a light-transmitting counter substrate 4, a first spacer 51, a second spacer 52, and a frame-shaped sealing member. 8 and a liquid crystal layer 9. The liquid crystal layer 9 is an example of an "electro-optic layer". The first spacer 51 is an example of a "spacer". The seal member 8 is arranged between the element substrate 2 and the counter substrate 4. The liquid crystal layer 9 is arranged within a region surrounded by the element substrate 2, the counter substrate 4, and the seal member 8. The element substrate 2, liquid crystal layer 9, and counter substrate 4 are arranged along the Z axis. The direction in which the element substrate 2 and the counter substrate 4 overlap coincides with the Z1 direction or the Z2 direction. Hereinafter, viewing from the Z1 direction or the Z2 direction will be referred to as "planar view."

In the electro-optical device 100 of this embodiment, light is incident on, for example, the element substrate 2, transmitted through the liquid crystal layer 9, and emitted from the counter substrate 4. Note that the light may be incident on the counter substrate 4, transmitted through the liquid crystal layer 9, and emitted from the element substrate 2. The light is visible light. "Translucency" means transparency to visible light, and preferably means that the transmittance of visible light is 50% or more. The light-shielding property means the light-shielding property against visible light, and preferably means that the visible light transmittance is less than 50%, more preferably 10% or less.

As shown in FIG. 1, the element substrate 2 includes a first base material 21, a wiring layer 22, a plurality of pixel electrodes 26, a plurality of dummy pixel electrodes 26d, and a first alignment film 29. The first base material 21, the wiring layer 22, the plurality of pixel electrodes 26, and the first alignment film 29 are arranged in this order. The first alignment film 29 is located closest to the liquid crystal layer 9 side. The pixel electrode 26 is an example of one of the "pair of electrodes." The structure composed of the first base material 21 and the wiring layer 22 is an example of one of the "pair of substrates". Note that the example of one of the "pair of substrates" is not limited to this.

The first base material 21 is composed of a flat plate having translucency and insulation properties. The material of the first base material 21 is, for example, glass or quartz. Although not shown, the wiring layer 22 includes a plurality of insulating films that are transparent and insulating. The material of each insulating film is, for example, an inorganic material containing silicon such as silicon oxide and silicon oxynitride. Furthermore, a plurality of transistors 23 are arranged in the wiring layer 22 . Each pixel electrode 26 has translucency. The material of each pixel electrode 26 is, for example, a transparent conductive material such as ITO (Indium Tin Oxide) or IZO (Indium Zinc Oxide). Although not shown, the plurality of dummy pixel electrodes 26d are arranged so as to surround the plurality of pixel electrodes 26 in plan view. Each dummy pixel electrode 26d is an electrode that does not contribute to displaying an image. Further, the first alignment film 29 is located closest to the liquid crystal layer 9 in the element substrate 2, and aligns the liquid crystal molecules of the liquid crystal layer 9. The material of the first alignment film 29 is, for example, polyimide and silicon oxide.

As shown in FIG. 1, the counter substrate 4 is spaced apart from the element substrate 2. The counter substrate 4 includes a second base material 41 , an insulating film 42 , a parting portion 43 , a common electrode 44 , and a second alignment film 46 . The second base material 41, the insulating film 42, the common electrode 44, and the second alignment film 46 are arranged in this order. The second alignment film 46 is located closest to the liquid crystal layer 9 side. The common electrode 44 is the other example of the "pair of electrodes". The structure composed of the second base material 41 and the insulating film 42 is the other example of the "pair of substrates". Note that the other example of the "pair of substrates" is not limited to this.

The surface of the second base material 41 is parallel to the XY plane. Each of the insulating film 42, the common electrode 44, and the second alignment film 46 overlaps almost the entire area of the second base material 41 in a plan view. The second base material 41 is composed of a flat plate having translucency and insulation properties. The material of the second base material 41 is, for example, glass or quartz. The material of the insulating film 42 is, for example, a silicon-based inorganic material, such as silicon oxide, having light-transmitting and insulating properties. A frame-shaped parting portion 43 is arranged within the insulating film 42 . The parting portion 43 is made of a metal material or the like that has light blocking properties. The common electrode 44 is electrically connected to the element substrate 2 via a conduction electrode (not shown). For example, a fixed potential is applied to the common electrode 44. The material of the common electrode 44 is, for example, a transparent conductive material such as ITO or IZO. The second alignment film 46 aligns the liquid crystal molecules of the liquid crystal layer 9. The material of the second alignment film 46 is, for example, polyimide and silicon oxide.

As shown in FIG. 1, the first spacer 51 is arranged between the common electrode 44 and the element substrate 2. Similarly, the second spacer 52 is arranged between the common electrode 44 and the element substrate 2. Each of the first spacer 51 and the second spacer 52 defines the distance between the element substrate 2 and the counter substrate 4.

The seal member 8 is formed using, for example, an adhesive containing various curable resin materials such as epoxy resin. The seal member 8 may include a gap material. The gap material is, for example, a fiber made of an inorganic material such as glass or a bead made of an inorganic material such as glass. The seal member 8 is disposed between the element substrate 2 and the counter substrate 4, and bonds the element substrate 2 and the counter substrate 4 together.

Liquid crystal layer 9 includes liquid crystal molecules having positive or negative dielectric anisotropy. The liquid crystal layer 9 is sandwiched between the element substrate 2 and the counter substrate 4 such that the liquid crystal molecules are in contact with both the first alignment film 29 and the second alignment film 46. The liquid crystal layer 9 is arranged between the plurality of pixel electrodes 26 and the common electrode 44, and its optical characteristics change depending on the electric field. Specifically, the orientation of liquid crystal molecules in the liquid crystal layer 9 changes depending on the voltage applied to the liquid crystal layer 9.

Although the electro-optical device 100 shown in FIG. 1 has a rectangular shape in plan view, the shape is not limited to this, and may be circular, for example. Further, the electro-optical device 100 has a display area A10 for displaying an image and a peripheral area A20. Although not shown, the peripheral area A20 surrounds the display area A10 in plan view. The display area A10 has a plurality of pixels P arranged in a matrix. A plurality of pixel electrodes 26 are arranged in the display area A10. The plurality of pixel electrodes 26 are arranged one-to-one in the plurality of pixels P. The aforementioned partition section 43 surrounds the display area A10 in plan view. The parting section 43 can prevent unnecessary stray light from entering the display area A10. Furthermore, the peripheral area A20 has a dummy pixel area A21. A plurality of dummy pixel electrodes 26d are arranged in the dummy pixel area A21. The dummy pixel area A21 surrounds the display area A10 in plan view.

1A-2. Electrical Configuration FIG. 2 is an equivalent circuit diagram showing the electrical configuration of the element substrate 2. As shown in FIG. As shown in FIG. 2, the element substrate 2 includes a plurality of transistors 23, n scanning lines 244, m data lines 246, n capacitor lines 245, and a plurality of storage capacitors 240. . Further, although not shown, the element substrate 2 includes a scanning line drive circuit 11 and a data line drive circuit 12. The n scanning lines 244, the m data lines 246, the n capacitor lines 245, the plurality of storage capacitors 240, the scanning line drive circuit 11, and the data line drive circuit 12 are arranged in the wiring layer 22 of FIG. . Note that each of n and m is an integer of 2 or more. Further, the plurality of transistors 23 are arranged one-to-one on the plurality of pixel electrodes 26. Each transistor 23 is, for example, a TFT that functions as a switching element. Each transistor 23 includes a gate, a source, and a drain.

Each of the n scanning lines 244 extends along the X-axis, and the n scanning lines 244 are arranged at regular intervals along the Y-axis. Each of the n scanning lines 244 is electrically connected to the respective gates of some transistors 23 among all the transistors 23. Further, the n scanning lines 244 are electrically connected to the scanning line drive circuit 11. Scanning signals G1, G2, . . . , and Gn are supplied line-sequentially from the scanning line drive circuit 11 to the 1 to n scanning lines 244.

Each of the m data lines 246 extends along the Y-axis, and the m data lines 246 are arranged at regular intervals along the X-axis. Each of the m data lines 246 is electrically connected to the respective sources of some transistors 23 among all the transistors 23. Furthermore, the m data lines 246 are electrically connected to the data line drive circuit 12. Image signals S1, S2, . . . , and Sm are supplied in parallel from the data line drive circuit 12 to the 1 to m data lines 246.

The n scanning lines 244 and the m data lines 246 are insulated from each other and form a lattice shape in plan view. A region surrounded by two adjacent scanning lines 244 and two adjacent data lines 246 corresponds to a pixel P. Each pixel electrode 26 is electrically connected to the drain of the corresponding transistor 23.

Each of the n capacitive lines 245 extends along the X-axis, and the n capacitive lines 245 are arranged at regular intervals along the Y-axis. Further, the n capacitor lines 245 are insulated from the m data lines 246 and the n scan lines 244, and are formed apart from them. A fixed potential, such as a ground potential, is applied to each capacitor line 245, for example. Further, each of the n capacitor lines 245 is electrically connected to some of all the storage capacitors 240. The plurality of storage capacitors 240 are electrically connected to the plurality of pixel electrodes 26 on a one-to-one basis. Furthermore, the plurality of storage capacitors 240 are electrically connected to the drains of the plurality of transistors 23 on a one-to-one basis. Each storage capacitor 240 is a capacitive element for holding the potential of the pixel electrode 26.

When the scanning signals G1, G2, . . . , and Gn are sequentially activated and n scanning lines 244 are sequentially selected, the transistor 23 connected to the selected scanning line 244 is turned on. Then, image signals S1, S2, ..., and Sm of sizes corresponding to the gradation to be displayed are taken in through the m data lines 246 to the pixel P corresponding to the selected scanning line 244, and the pixel applied to electrode 26. As a result, a voltage corresponding to the gradation to be displayed is applied to the liquid crystal capacitor formed between each pixel electrode 26 and the common electrode 44 shown in FIG. 1, and the liquid crystal molecules are aligned according to the applied voltage. changes. Further, the applied voltage is held by the storage capacitor 240. Light is modulated by such changes in the orientation of liquid crystal molecules, making it possible to display gradations.

1A-3. Structure of the first spacer 51, the second spacer 52, and their vicinity FIG. 3 is a cross-sectional view showing the first spacer 51 and the second spacer 52. As shown in FIG. 3, each of the first spacer 51 and the second spacer 52 is arranged between the common electrode 44 and the second alignment film 46. Further, the counter substrate 4 includes inorganic material films 501a and 501b, light shielding films 502a and 502b, and a coating layer 45. Each element will be explained below.

As shown in FIG. 3, the inorganic material film 501a is arranged between the first spacer 51 and the common electrode 44. The inorganic material film 501b is arranged between the second spacer 52 and the common electrode 44. Each of the inorganic material films 501a and 501b contacts the common electrode 44. Each of the inorganic material films 501a and 501b is made of an inorganic material. Specifically, each material of the inorganic material films 501a and 501b is different from the material of the common electrode 44. Specifically, each material includes, for example, silicon oxide such as silicon dioxide, or silicon oxynitride.

The light shielding film 502a is arranged between the inorganic material film 501a and the common electrode 44, and is in contact with the inorganic material film 501a. The light shielding film 502b is arranged between the inorganic material film 501b and the common electrode 44, and is in contact with the inorganic material film 501b. Each of the light shielding films 502a and 502b has a light shielding property and is made of, for example, an inorganic material. The materials of the light shielding films 502a and 502b are different from the materials of the first spacer 51 and the second spacer 52. Examples of the materials include metals such as titanium nitride (TiN), and silicon nitride (SiN). In addition, since the material of the light shielding films 502a and 502b is silicon nitride, deterioration of the liquid crystal layer 9 due to penetration of metal into the liquid crystal layer 9 is suppressed. Therefore, the life of the electro-optical device 100 can be extended.

Further, due to the presence of the above-mentioned inorganic material film 501a, the light shielding film 502a does not come into contact with the common electrode 44. Similarly, the presence of the inorganic material film 501b prevents the light shielding film 502b from coming into contact with the common electrode 44. Since the inorganic material film 501a contains silicon oxide or silicon oxynitride as described above, even if the light-shielding film 502a contains metal, the crystallinity of the pixel electrode 26 can be suppressed from changing due to the influence of the light-shielding film 502a. I can do it. The same applies to the inorganic material film 501b.

Coat layer 45 is disposed on common electrode 44 and is in contact with common electrode 44 . Coat layer 45 covers first spacer 51 and second spacer 52. Further, the coat layer 45 covers each side wall of the inorganic material films 501a and 501b and each side wall of the light shielding films 502a and 502b. The material of the coat layer 45 is, for example, an inorganic material containing silicon such as silicon oxide and silicon oxynitride.

A second alignment film 46 is arranged on the coat layer 45 . The second alignment film 46 contacts the coat layer 45 . The second alignment film 46 contacts the element substrate 2. Further, by disposing the coat layer 45 under the second alignment film 46, it is possible to suppress the formation of a portion of the common electrode 44 that is not covered with the second alignment film 46. Therefore, the presence of the coat layer 45 can improve the uniformity of the second alignment film 46. In particular, by using the same material for the coat layer 45 and the second alignment film 46, the uniformity effect can be enhanced. Further, since the coating layer 45 covers the side walls of each of the light shielding films 502a and 502b, even if each of the light shielding films 502a and 502b contains metal, deterioration of the liquid crystal layer 9 due to metal entering the liquid crystal layer 9 is prevented. suppressed. Therefore, the life of the electro-optical device 100 can be extended.

Note that any one of the inorganic material film 501a, the inorganic material film 501b, the light shielding film 502a, the light shielding film 502b, and the coat layer 45 may be omitted. Further, in this embodiment, the coat layer 45 and the second alignment film 46 only need to be disposed at least on the plurality of common electrodes 44 . Therefore, the coat layer 45 and the first alignment film 29 do not need to cover the first spacer 51 and the second spacer 52, respectively. In this case, each of the first spacer 51 and the second spacer 52 may directly contact the element substrate 2.

As shown in FIG. 3, each of the first spacer 51 and the second spacer 52 protrudes from the common electrode 44 toward the element substrate 2 in the Z2 direction. Each of the first spacer 51 and the second spacer 52 defines the distance between the element substrate 2 and the counter substrate 4. Specifically, each of the first spacer 51 and the second spacer 52 defines the distance between the plurality of pixel electrodes 26 and the common electrode 44. From another perspective, each of the first spacer 51 and the second spacer 52 defines the thickness of the liquid crystal layer 9.

As described above, each of the first spacer 51 and the second spacer 52 is arranged on the counter substrate 4. Specifically, each of the first spacer 51 and the second spacer 52 is arranged between the common electrode 44 and the coat layer 45. By disposing the first spacer 51 on the opposing substrate 4, the first spacer 51 can be formed more easily than in the case where it is disposed on the element substrate 2, and the plurality of electrodes included in the element substrate 2 are not damaged. The risk of this occurring can be reduced. Note that the same applies to the second spacer 52.

The first spacer 51 includes an inorganic material. In particular, the first spacer 51 is preferably made of an inorganic material and preferably does not contain a resin material. By not including a resin material, the possibility that a resin component will enter into the liquid crystal layer 9 is avoided. Therefore, it is possible to prevent malfunctions such as malfunctions due to organic contamination. Furthermore, since the first spacer 51 is made of an inorganic material, the dimensional accuracy of the first spacer 51 can be improved compared to a case where the first spacer 51 is made of an organic material, and dimensional changes over time are less likely to occur. I can do it. Therefore, the distance between the element substrate 2 and the counter substrate 4 can be stabilized over a long period of time.

The second spacer 52 is preferably made of the same material as the first spacer 51. Therefore, it is preferable that the second spacer 52 contains an inorganic material. By using the same material, the first spacer 51 and the second spacer 52 can be easily formed at once. Furthermore, by forming the second spacer 52 with an inorganic material, the dimensional accuracy of the second spacer 52 can be improved, and dimensional changes over time can be made less likely to occur.

Specifically, the material of the first spacer 51 is preferably silicon oxide or silicon oxynitride. By including silicon oxide or silicon oxynitride, the first spacer 51 with high dimensional accuracy can be easily manufactured by, for example, dry etching. Moreover, among the inorganic materials, silicon oxide is more preferable. By using silicon oxide, the first spacer 51 can be manufactured particularly easily and with high dimensional accuracy. Similarly, the material of the second spacer 52 is preferably silicon oxide or silicon oxynitride, and more preferably silicon oxide. By using such a material, the second spacer 52 can be manufactured particularly easily and with high dimensional accuracy.

Note that each of the first spacer 51 and the second spacer 52 may be formed of multiple layers. In this case, the plurality of layers may be made of different materials or may be made of the same material. Therefore, the first spacer 51 may include multiple types of inorganic materials. Further, the second spacer 52 may include multiple types of materials.

FIG. 4 is a plan view showing the first spacer 51 and the second spacer 52. In FIG. 4, for convenience, each of the first spacer 51 and the second spacer 52 is marked with a diagonal line pattern, and the seal member 8 is marked with a dot pattern.

As shown in FIG. 4, each of the first spacer 51 and the second spacer 52 extends along the outer edge of the display area A10 in plan view. In FIG. 4, each of the first spacer 51 and the second spacer 52 has a rectangular frame shape when viewed from above. Note that each of the first spacer 51 and the second spacer 52 may be, for example, a polygon other than a quadrangle, or a circle. Furthermore, in the illustrated example, the shape of the first spacer 51 in a plan view, the shape of the second spacer 52 in a plan view, and the shape of the outer edge of the display area A10 in a plan view are similar; You don't have to.

The first spacer 51 is located inside the second spacer 52 in plan view and is spaced apart from the second spacer 52. Each of the first spacer 51 and the second spacer 52 is located outside the display area A10 in plan view. Therefore, although not shown, each of the first spacer 51 and the second spacer 52 surrounds the plurality of pixel electrodes 26 in plan view. Further, in the example shown in FIG. 4, each of the first spacer 51 and the second spacer 52 is located outside the dummy pixel area A21 in plan view. Note that the first spacer 51 may overlap the dummy pixel area A21 in plan view.

More specifically, the first spacer 51 is arranged between the display area A10 and the seal member 8 in plan view. On the other hand, the second spacer 52 is arranged outside the seal member 8 in plan view. Due to the presence of the first spacer 51 disposed at such a location, the center of the counter substrate 4 or the center of the element substrate 2 is Deflection is suppressed. This is because the first spacer 51 is arranged inside the second spacer 52. Therefore, the presence of the first spacer 51 suppresses variation in the distance between the element substrate 2 and the counter substrate 4. Furthermore, as described above, the first spacer 51 and the second spacer 52 are not arranged within the display area A10. Therefore, the possibility that the contrast will deteriorate due to the presence of the first spacer 51 and the second spacer 52 is avoided. Furthermore, since the first spacer 51 is not disposed within the seal member 8, the possibility that the sealing function of the seal member 8 will deteriorate is avoided. For this reason, deterioration in display quality can be suppressed.

As shown in FIG. 4, the first spacer 51 is not in contact with the seal member 8, and a space S11 exists between the first spacer 51 and the seal member 8. On the other hand, the second spacer 52 contacts the seal member 8. The presence of the space S11 suppresses contact between the liquid crystal layer 9 and the seal member 8. Therefore, it is possible to suppress the possibility that the uniformity of the optical characteristics at the outer periphery of the liquid crystal layer 9 will deteriorate due to contact between the liquid crystal layer 9 and the sealing member 8.

The first spacer 51 is divided into multiple parts. Specifically, the first spacer 51 has a plurality of walls 515. Each wall portion 515 is a wall-shaped portion extending along the outer edge of the display area A10 in plan view. The plurality of wall portions 515 are spaced apart from each other and lined up along the outer edge of the display area A10 in plan view. Although not shown in FIG. 4, each wall portion 515 protrudes from the common electrode 44 toward the element substrate 2. Although not shown, each of the above-mentioned inorganic material film 501a and light shielding film 502a is divided into a plurality of parts similarly to the first spacer 51.

Since the first spacer 51 has the wall-like wall portion 515 extending along the outer edge of the display area A10 in a plan view, the mechanical strength of the first spacer 51 is improved compared to the case where the first spacer 51 is composed of a columnar member. It can increase the physical strength. Therefore, compared to the case where only the second spacer 52 is present without the first spacer 51, warping of the counter substrate 4 or the element substrate 2 over time is suppressed. Therefore, it is possible to make it difficult for the distance between the element substrate 2 and the counter substrate 4 to change over time. Therefore, deterioration in display quality can be suppressed for a long period of time. Further, since the first spacer 51 is present, the seal member 8 does not need to include a gap material.

As shown in FIG. 4, the first spacer 51 is provided with a plurality of ventilation holes 510. Each vent hole 510 is an orifice that allows gas to flow from the liquid crystal layer 9 toward the seal member 8 . Moreover, each ventilation hole 510 is a gap formed by two adjacent wall parts 515. Therefore, it can be said that the plurality of ventilation holes 510 are gaps that divide the first spacer 51 into a plurality of wall parts 515. The plurality of ventilation holes 510 are spaced apart from each other and lined up along the outer edge of the display area A10 in plan view.

Here, the liquid crystal layer 9 is formed by spreading the liquid crystal material between the element substrate 2 and the counter substrate 4 when bonding the element substrate 2 and the counter substrate 4 together. At this time, it is desired that the liquid crystal material spread uniformly to every corner of the display area A10 without any air bubbles being mixed in. Since the first spacer 51 has the plurality of ventilation holes 510, the liquid crystal material can be spread more efficiently over the entire display area A10 than in the case where the first spacer 51 does not have the plurality of ventilation holes 510. Therefore, a homogeneous liquid crystal layer 9 can be formed over the entire display area A10. Further, since the first spacer 51 has the plurality of ventilation holes 510, the flow of the liquid crystal material from the center to the outer edge of the display area A10 is prevented from being obstructed by the first spacer 51. Therefore, the occurrence or deterioration of so-called corner stains can be suppressed. Furthermore, as described above, the space S11 exists. For this reason, by being able to spread the liquid crystal material, air bubbles that have reached the outer edge of the display area A10 are suppressed from entering the sealing member 8. As a result, deterioration of sealing properties is suppressed.

The plurality of ventilation holes 510 have a plurality of first ventilation holes 511 and a plurality of second ventilation holes 512. Here, the outer edge of the display area A10 in plan view has a plurality of corners a1 and a plurality of sides a2. The plurality of first ventilation holes 511 are arranged in one-to-one correspondence with the plurality of corners a1. Further, the plurality of second ventilation holes 512 are arranged corresponding to the plurality of sides a2. Specifically, in the illustrated example, five second ventilation holes 512 are arranged on one side a2 along the Y-axis. Eight second ventilation holes 512 are arranged for one side a2 along the X-axis. Note that the number of second ventilation holes 512 arranged for one side a2 is not limited to the illustrated example, and is arbitrary.

Since the first spacer 51 has the plurality of first ventilation holes 511 and the plurality of second ventilation holes 512, the liquid crystal material can be efficiently spread from the center to the outer edge of the display area A10. In particular, the presence of the plurality of first ventilation holes 511 suppresses air bubbles from accumulating at the corner a1 of the display area A10. Therefore, deterioration in display quality at corner a1 is suppressed.

Note that the plurality of ventilation holes 510 may or may not be lined up at equal intervals. Further, the plurality of wall portions 515 described above may or may not be lined up at equal intervals.

The ratio of the plurality of ventilation holes 510 to the first spacer 51 is lower than the ratio of the portion of the first spacer 51 excluding the plurality of ventilation holes 510, that is, the ratio of the plurality of wall portions 515. For this reason, the distance between the element substrate 2 and the counter substrate 4 is less prone to change in dimension over time than when the proportion occupied by the plurality of ventilation holes 510 is higher than the proportion occupied by the plurality of walls 515. be able to. Further, the liquid crystal material can be spread more efficiently from the center to the outer edge of the display area A10.

Specifically, the ratio of the plurality of ventilation holes 510 to the first spacer 51 is not particularly limited, but is preferably 1% or more and 20% or less, and more preferably 5% or more and 10% or less. By being within this range, it is possible to make it difficult for the distance between the element substrate 2 and the counter substrate 4 to change in dimension over time, and to particularly improve the homogeneity of the liquid crystal layer 9.

The cross-sectional area of the first ventilation hole 511 is larger than the cross-sectional area of the second ventilation hole 512. From another perspective, the distance between the two wall portions 515 forming the first ventilation hole 511 is greater than the distance between the two wall portions 515 forming the second ventilation hole 512. Since the cross-sectional area of the first air hole 511 is larger than the cross-sectional area of the second air hole 512, the liquid crystal material can be made to flow particularly efficiently toward the corner a1 of the display area A10, compared to a case where the cross-sectional area is smaller. Therefore, the accumulation of air bubbles at the corner a1 of the display area A10 is further suppressed. Therefore, deterioration in display quality at corner a1 is further suppressed.

Note that the above-mentioned "cross-sectional area" is the area in a cross-section cut along a plane including the Z-axis. Further, the cross-sectional areas of the plurality of first ventilation holes 511 may be equal to each other or may be different from each other. Similarly, the cross-sectional areas of the plurality of second ventilation holes 512 may be equal to each other or may be different from each other. Furthermore, the areas of the plurality of wall portions 515 in plan view may be equal to each other or may be different from each other.

Further, as described above, the second spacer 52 is arranged outside the seal member 8 in plan view. Therefore, the sealing member 8 is arranged between the first spacer 51 and the second spacer 52. Further, the second spacer 52 has a frame shape extending along the outer edge of the display area A10 in plan view. The presence of the second spacer 52 makes it particularly difficult for the distance between the element substrate 2 and the counter substrate 4 to change over time, compared to the case where the second spacer 52 is not present. Further, by disposing the second spacer 52 on the outside of the seal member 8, it is possible to suppress the possibility that external moisture will enter the seal member 8. Therefore, the risk of moisture entering the display area A10 through the seal member 8 can be suppressed. Therefore, problems in the electro-optical device 100 due to the influence of the moisture are suppressed.

The second spacer 52, unlike the first spacer 51, has a frame shape without a through hole. Since the second spacer 52 is not provided with a through hole, the risk of moisture entering the seal member 8 can be particularly effectively suppressed. Note that the second spacer 52 may have a through hole.

1A-4. Method of manufacturing first spacer 51 and second spacer 52 Hereinafter, a method of manufacturing first spacer 51 and second spacer 52, and a method of manufacturing elements related to first spacer 51 or second spacer 52 will be described. FIG. 5 is a cross-sectional view for explaining a method of forming the inorganic material film 501x, the light shielding film 502x, and the insulating layer 50x.

First, as shown in FIG. 5, an inorganic material film 501x is formed on the common electrode 44. The common electrode 44 is formed by a PVD (physical vapor deposition) method or the like. The inorganic material film 501x becomes inorganic material films 501a and 502b through a later process. The material of the inorganic material film 501x is, for example, silicon oxide or silicon oxynitride. The inorganic material film 501x is formed by, for example, a plasma CVD (chemical vapor deposition) method.

Next, a light shielding film 502x is formed on the inorganic material film 501x. The light shielding film 502x becomes two light shielding films 502a and 502b through a later process. The material of the light shielding film 502x includes, for example, metal such as titanium nitride or silicon nitride. The light shielding film 502x is formed by, for example, a sputtering method or a vapor deposition method.

Next, an insulating layer 50x containing an inorganic material is formed on the light shielding film 502x. The insulating layer 50x becomes the first spacer 51 and the second spacer 52 through a later process. The insulating layer 50x is formed by, for example, a plasma CVD method. Specifically, for example, the insulating layer 50x is preferably silicon oxide or silicon oxynitride, and more preferably silicon oxide. By containing silicon nitride and silicon oxynitride, the first spacer 51 with high dimensional accuracy and the second spacer 52 with high dimensional accuracy can be easily manufactured.

FIG. 6 is a cross-sectional view for explaining a method of forming the first spacer 51 and the second spacer 52. Next, by patterning the insulating layer 50x shown in FIG. 5 by dry etching or the like, a first spacer 51 and a second spacer 52 are formed as shown in FIG. When the insulating layer 50x contains silicon oxide or silicon oxynitride, the etching gas used in the dry etching is, for example, a fluorocarbon-based gas such as methane tetrafluoride (CF ₄ ) and cyclobutane octafluoride (C ₄ F ₈ ). Examples include gas. Moreover, by using dry etching, the dimensional accuracy of each of the first spacer 51 and the second spacer 52 can be improved compared to the case where wet etching is used. Further, by providing the light shielding film 502x made of a material different from the inorganic material film 501x, it is possible to suppress damage to the common electrode 44 during the dry etching.

By this method, the first spacer 51 and the second spacer 52 can be manufactured particularly easily and reliably. Further, in manufacturing the first spacer 51 and the second spacer 52, damage to the common electrode 44 can be particularly effectively suppressed.

FIG. 7 is a cross-sectional view for explaining a method of forming the light shielding film 502x. Next, by removing a portion of the light shielding film 502x shown in FIG. 6, the light shielding films 502a and 502b are formed as shown in FIG. For example, chemical dry etching is used for this removal. By using chemical dry etching, damage to the common electrode 44 can be suppressed. For example, when the light shielding film 502x is made of titanium nitride, the chemical dry etching uses an etching gas containing tetrafluoromethane (CF ₄ ) and oxygen (O ₂ ).

FIG. 8 is a cross-sectional view for explaining a method of forming inorganic material films 501a and 501b. Next, by removing a part of the inorganic material film 501x shown in FIG. 7, 501a and 501b are formed as shown in FIG. For example, wet etching is used for this removal. By using wet etching, damage to the common electrode 44 can be suppressed compared to when dry etching is used. In the wet etching, a fluorine-based etching solution such as BHF (buffered hydrofluoric acid) or DHF (diluted hydrofluoric acid) is used.

Further, although not shown, after each of the first spacer 51 and the second spacer 52 is formed, the coat layer 45 is formed to cover each of the first spacer 51 and the second spacer 52. The coat layer 45 is formed by, for example, an ALD (Atomic Layer Deposition) method. In forming the coat layer 45, the surface of the common electrode 44 is appropriately arranged obliquely with respect to the vapor deposition source. Thereby, the coating layer 45 can be suitably formed not only on the surface of the common electrode 44 but also on each surface of the first spacer 51 and the second spacer 52. The coat layer 45 is formed of an inorganic material containing silicon, for example. In particular, by forming the coating layer 45 from silicon oxide such as silicon dioxide, a homogeneous and sufficiently thin coating layer 45 can be formed by the ALD method.

Although not shown, after the coat layer 45 is formed, a film containing silicon oxide or the like is formed on the coat layer 45 by, for example, a CVD method or an ALD method. Then, the second alignment film 46 is formed by subjecting the film to a rubbing process. By forming the second alignment film 46 on the coat layer 45, the adhesion of the second alignment film 46 to each of the common electrode 44, the first spacer 51, and the second spacer 52 is improved compared to the case where the coat layer 45 is not provided. can be increased. In order to improve adhesion, it is particularly preferable that the coat layer 45 and the second alignment film 46 contain the same material. Note that in forming the second alignment film 46, similarly to the formation of the coat layer 45, the surface of the common electrode 44 is appropriately arranged obliquely with respect to the vapor deposition source.

After the second alignment film 46 is formed, the counter substrate 4 is bonded to the element substrate 2, which is formed using, for example, a known technique, via the seal member 8. At this time, a liquid crystal material is supplied between the element substrate 2, the counter substrate 4, and the seal member 8, and the liquid crystal material is spread out between the element substrate 2 and the counter substrate 4. As a result, a liquid crystal layer 9 is formed. In this way, the electro-optical device 100 shown in FIGS. 1 and 2 can be manufactured.

1B. Second Embodiment A second embodiment will be described. In each of the following examples, for elements whose functions are similar to those in the first embodiment, the reference numerals used in the description of the first embodiment will be used, and detailed descriptions of each will be omitted as appropriate.

FIG. 9 is a cross-sectional view showing a part of an electro-optical device 100A according to the second embodiment. FIG. 10 is a plan view showing the first spacer 51, second spacer 52, and third spacer 53 shown in FIG. In FIG. 10, for convenience, the third spacer 53 is marked with a diagonal pattern. The electro-optical device 100A differs from the electro-optical device 100 in the first embodiment in that it includes a third spacer 53.

The third spacer 53 shown in FIGS. 9 and 10 is the same as the second spacer 52 except for a different arrangement. Therefore, the third spacer 53 defines the distance between the element substrate 2 and the counter substrate 4 together with the first spacer 51 and the second spacer 52. Further, an inorganic material film 501c and a light shielding film 502c are arranged between the third spacer 53 and the common electrode 44. The inorganic material film 501c is the same as the inorganic material film 501b except for the arrangement. The light shielding film 502c is the same as the light shielding film 502b except for the arrangement.

As shown in FIG. 10, like the second spacer 52, the third spacer 53 extends along the outer edge of the display area A10 in plan view. The shape of the third spacer 53 in plan view is a rectangular frame shape, similar to the shape of the second spacer 52 in plan view. In the illustrated example, the shape of the third spacer 53 in plan view, the shape of second spacer 52 in plan view, the shape of first spacer 51 in plan view, and the outer edge of display area A10 in plan view Although the shapes are similar, they do not have to be similar.

The third spacer 53 is located outside the display area A10 in plan view. The third spacer 53 is located between the first spacer 51 and the second spacer 52 in plan view, and is spaced apart from each of the first spacer 51 and the second spacer 52. Further, the third spacer 53 is located between the first spacer 51 and the seal member 8 in plan view. The presence of the third spacer 53 suppresses contact between the liquid crystal layer 9 and the seal member 8 compared to the case where the third spacer 53 is not present. Therefore, it is possible to suppress the possibility that the uniformity of the optical characteristics at the outer periphery of the liquid crystal layer 9 will deteriorate due to contact between the liquid crystal layer 9 and the sealing member 8.

Further, the third spacer 53 and the first spacer 51 are arranged with a space S12 in between. Therefore, the liquid crystal material can be spread more efficiently from the center to the outer edge of the display area A10. Furthermore, the presence of the space S12 prevents the air bubbles from entering the sealing member 8 and, as a result, deteriorating the sealing properties.

The third spacer 53 contacts the seal member 8. The third spacer 53 functions as a member that defines the width of the sealing member 8 together with the first spacer 51.

Similarly to the electro-optical device 100 of the first embodiment, the electro-optical device 100A of the second embodiment described above can also suppress deterioration in display quality.

1C. Modifications The embodiments illustrated above can be modified in various ways. Specific modifications that can be applied to the above-described embodiments are illustrated below. Two or more aspects arbitrarily selected from the examples below may be combined as appropriate to the extent that they do not contradict each other.

In the first embodiment described above, the first spacer 51 is not in contact with the seal member 8, but the first spacer 51 may be in contact with the seal member 8. For example, there is an example shown in FIG. FIG. 11 is a plan view showing the arrangement of the first spacer 51 and the seal member 8 in a modified example. As shown in FIG. 11, the seal member 8 contacts the first spacer 51 and the second spacer 52. The first spacer 51 and the second spacer 52 function as members that define the width of the seal member 8. Note that when the first spacer 51 contacts the seal member 8, it is preferable that the seal member 8 includes a gap material. By including the gap material, it is possible to prevent bubbles that have reached the outer edge of the display area A10 from passing through the plurality of ventilation holes 510 and entering the sealing member 8.

In the first embodiment described above, the contact surface of the element substrate 2 with the second alignment film 46 is a flat surface, but it does not have to be a flat surface. For example, the example shown in FIG. 12 is given. FIG. 12 is a sectional view showing a first spacer 51 and a second spacer 52 in a modified example. The element substrate 2 has a recess 201 in which a part of the first spacer 51 is arranged, and a recess 202 in which a part of the second spacer 52 is arranged. The presence of the recess 201 makes it possible to suppress displacement of the first spacer 51 in the XY plane. Similarly, the presence of the recess 202 can suppress displacement of the second spacer 52 in the XY plane. Although not shown, the element substrate 2 may have a recess in which a portion of the third spacer 53 is disposed.

In each of the embodiments described above, the first spacer 51 has a plurality of first ventilation holes 511 and a plurality of second ventilation holes 512, but the plurality of first ventilation holes 511 or the plurality of second ventilation holes 512 are omitted. You can.

In each of the embodiments described above, the first spacer 51 has a plurality of walls 515, but the plurality of walls 515 may be integrated. That is, the first spacer 51 may be composed of one frame-shaped member. In this case, for example, the first spacer 51 may have a plurality of ventilation holes that are not divided and are formed by recesses. The recessed portion is configured to allow gas to flow from the liquid crystal layer 9 toward the sealing member 8 .

In each of the embodiments described above, each side a2 of the outer edge of the display area A10 is a straight line, but may be a curved line.

In each of the embodiments described above, the cross-sectional area of each first air hole 511 is larger than the cross-sectional area of each second air hole 512, but it may be smaller. Further, the cross-sectional area of some of the plurality of second ventilation holes 512 is smaller than the cross-sectional area of each of the first ventilation holes 511, and the remaining of the plurality of second ventilation holes 512 is smaller than the cross-sectional area of each of the first ventilation holes 511. It may be larger than the cross-sectional area of 511.

In each of the embodiments described above, the ratio of the plurality of ventilation holes 510 to the first spacer 51 is smaller than the ratio of the plurality of wall parts 515, but may be larger.

In each of the embodiments described above, the second spacer 52 is present, but the second spacer 52 may be omitted.

In each of the embodiments described above, the first spacer 51, the second spacer 52, and the third spacer 53 are each arranged on the opposing substrate 4, but they may be arranged on the element substrate 2.

In the above embodiment, the transistor 23 is a TFT, but the transistor 23 is not limited to a TFT, and may be a MOSFET (metal-oxide-semiconductor field-effect transistor), for example.

Although the electro-optical device 100 of an active matrix type is illustrated in the above-described embodiment, the driving method of the electro-optical device is not limited thereto, and may be, for example, a passive matrix type.
In the embodiment described above, an electro-optical device 100 is exemplified in which the alignment state of liquid crystal molecules is controlled by applying a vertical electric field in a direction substantially perpendicular to the substrate surfaces of a pair of substrates to the liquid crystal layer 9. Although not limited to this, the electro-optical device method is such that a pixel electrode and a common electrode are arranged on the element substrate side, and a transverse electric field (including a fringe electric field) in a direction approximately parallel to the substrate surfaces of a pair of substrates is applied to a liquid crystal layer. 9 may be applied to control the alignment state of liquid crystal molecules.

2. Electronic Device The electro-optical device 100 can be used in various electronic devices.

FIG. 13 is a perspective view showing a personal computer 2000, which is an example of an electronic device. The personal computer 2000 includes an electro-optical device 100 that displays various images, a main body section 2010 in which a power switch 2001 and a keyboard 2002 are installed, and a control section 2003. The control unit 2003 includes, for example, a processor and a memory, and controls the operation of the electro-optical device 100.

FIG. 14 is a plan view showing a smartphone 3000, which is an example of an electronic device. The smartphone 3000 includes an operation button 3001, an electro-optical device 100 that displays various images, and a control unit 3002. The screen content displayed on the electro-optical device 100 is changed in accordance with the operation of the operation button 3001. The control unit 3002 includes, for example, a processor and a memory, and controls the operation of the electro-optical device 100.

FIG. 15 is a schematic diagram showing a projector that is an example of an electronic device. The projection display device 4000 is, for example, a three-panel projector. The electro-optical device 1r is an electro-optical device 100 corresponding to a red display color, the electro-optical device 1g is an electro-optical device 100 corresponding to a green display color, and the electro-optical device 1b is an electro-optical device 100 corresponding to a blue display color. This is an electro-optical device 100 corresponding to. That is, the projection display device 4000 includes three electro-optical devices 1r, 1g, and 1b corresponding to red, green, and blue display colors, respectively. The control unit 4005 includes, for example, a processor and a memory, and controls the operation of the electro-optical device 100.

The illumination optical system 4001 supplies the red component r of the light emitted from the illumination device 4002, which is a light source, to the electro-optical device 1r, the green component g to the electro-optical device 1g, and the blue component b to the electro-optical device 1b. supply to. Each of the electro-optical devices 1r, 1g, and 1b functions as a light modulator such as a light valve that modulates each monochromatic light supplied from the illumination optical system 4001 according to a displayed image. A projection optical system 4003 combines the light emitted from each electro-optical device 1r, 1g, and 1b and projects the combined light onto a projection surface 4004.

The above electronic device includes the electro-optical device 100 described above and a control section 2003, 3002, or 4005. As described above, according to the electro-optical device 100, deterioration in display quality is suppressed. Therefore, the display quality of the personal computer 2000, smartphone 3000, or projection display device 4000 can be improved.

Note that electronic devices to which the electro-optical device of the present invention is applied are not limited to the exemplified devices, but include, for example, PDAs (Personal Digital Assistants), digital still cameras, televisions, video cameras, car navigation devices, and in-vehicle devices. Examples include displays, electronic notebooks, electronic paper, calculators, word processors, workstations, videophones, and POS (Point of Sale) terminals. Further, examples of electronic devices to which the present invention is applied include printers, scanners, copiers, video players, devices equipped with touch panels, and the like.

Although the present invention has been described above based on the preferred embodiments, the present invention is not limited to the above-described embodiments. Further, the configuration of each part of the present invention can be replaced with any configuration that performs the same function as in the above-described embodiment, or any configuration can be added.

Further, in the above description, a liquid crystal device was described as an example of the electro-optical device of the present invention, but the electro-optical device of the present invention is not limited to this. For example, the electro-optical device of the present invention can be applied to an image sensor, etc. Further, the present invention can also be applied to an electrophoretic display panel using microcapsules containing a colored liquid and white particles dispersed in the liquid, in the same manner as in the above-described embodiments.

2...Element substrate, 4...Counter substrate, 8...Sealing member, 9...Liquid crystal layer, 11...Scanning line drive circuit, 12...Data line drive circuit, 21...First base material, 22...Wiring layer, 23...Transistor, 26... Pixel electrode, 26d... Dummy pixel electrode, 29... First alignment film, 41... Second base material, 42... Insulating film, 43... Parting part, 44... Common electrode, 45... Coating layer, 46... Second orientation Film, 50x...Insulating layer, 51...First spacer, 52...Second spacer, 53...Third spacer, 100...Electro-optical device, 100A...Electro-optical device, 240...Storage capacitor, 244...Scanning line, 245...Capacitor Line, 246...Data line, 501a...Inorganic material film, 501b...Inorganic material film, 501c...Inorganic material film, 501x...Inorganic material film, 502a... Light shielding film, 502b... Light shielding film, 502c... Light shielding film, 502x... Light shielding film , 510... ventilation hole, 511... first ventilation hole, 512... second ventilation hole, 515... wall, A10... display area, A20... peripheral area, A21... dummy pixel area, P... pixel, S11... space, S12 ...space, a1...corner, a2...side.

Claims (9)

a first substrate;
a second substrate facing the first substrate;
an electro-optic layer disposed between the first substrate and the second substrate;
a frame-shaped sealing member containing a resin material, disposed between the first substrate and the second substrate, and surrounding the electro-optic layer in plan view;
a first spacer containing an inorganic material and defining a distance between the first substrate and the second substrate,
The first substrate includes an electrode, a first inorganic material film disposed between the electrode and the first spacer, and a first inorganic material film disposed between the first inorganic material film and the first spacer. comprising a light-shielding film and a light-shielding parting portion disposed inside the sealing member in a plan view and spaced apart from the sealing member;
The first spacer is disposed between the seal member and the display area in a plan view, spaced apart from the seal member, and is located along an outer edge of the display area and overlaps with the parting part in the plan view. An electro-optical device characterized in that: The electro-optical device according to claim 1, wherein the first spacer has a plurality of ventilation holes arranged along an outer edge of the display area. The outer edge of the display area in plan view has a corner and a side,
3. The electro-optical device according to claim 2 , wherein the plurality of ventilation holes includes a first ventilation hole arranged corresponding to the corner and a second ventilation hole arranged corresponding to the side. The electro-optical device according to claim 3 , wherein a cross-sectional area of the first vent hole is larger than a cross-sectional area of the second vent hole. 5. The electro-optic device according to claim 2 , wherein a ratio of the plurality of ventilation holes to the first spacer is lower than a ratio of a portion of the first spacer excluding the plurality of ventilation holes. Device. further comprising a second spacer extending along an outer edge of the display area in plan view,
The electro-optical device according to any one of claims 1 to 5 , wherein the sealing member is arranged between the first spacer and the second spacer. further comprising a third spacer extending along an outer edge of the display area in plan view,
the third spacer is arranged between the first spacer and the sealing member,
The electro-optical device according to claim 6 , wherein the first spacer and the third spacer are arranged with a space in between. The electro-optical device according to claim 1 , wherein the first spacer includes silicon oxide or silicon oxynitride. The electro-optical device according to any one of claims 1 to 8 ,
An electronic device comprising: a control section that controls the operation of the electro-optical device.

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