JP7395165B1 - Water supply control system, water supply control method, and water supply control program - Google Patents

Water supply control system, water supply control method, and water supply control program Download PDF

Info

Publication number
JP7395165B1
JP7395165B1 JP2023114592A JP2023114592A JP7395165B1 JP 7395165 B1 JP7395165 B1 JP 7395165B1 JP 2023114592 A JP2023114592 A JP 2023114592A JP 2023114592 A JP2023114592 A JP 2023114592A JP 7395165 B1 JP7395165 B1 JP 7395165B1
Authority
JP
Japan
Prior art keywords
leaf
moisture
irrigation
water supply
measured value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2023114592A
Other languages
Japanese (ja)
Inventor
学 藤井
翔平 豊永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cultivera
Original Assignee
Cultivera
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cultivera filed Critical Cultivera
Priority to JP2023114592A priority Critical patent/JP7395165B1/en
Application granted granted Critical
Publication of JP7395165B1 publication Critical patent/JP7395165B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Cultivation Of Plants (AREA)

Abstract

【課題】葉からの蒸散を円滑化し、植物にとって最適な栽培環境を効率よく整えることが可能な給水制御システム等を提供する。【解決手段】葉温を計測する葉温センサ1と、葉Lの水分量を計測する葉水分センサ2と、植物PLを支持する固形培地204内に潅水する地中潅水装置4と、葉温センサ1および葉水分センサ2の計測値に基づいて地中潅水装置4の動作を制御する制御装置7とを備え、制御装置7は、葉温センサ1の計測値が葉温上限値Tth以上であり、かつ、葉温センサ1の計測値の上昇速度が上限葉温上昇速度Vuth以上となった際に地中潅水装置4を動作させて固形培地204内への潅水を開始させ、葉水分センサ2の計測値が第一葉水分下限値Whth1を超過した際に地中潅水装置4の動作を停止させて固形培地204内への潅水を終了させる。【選択図】図1[Problem] To provide a water supply control system, etc. that can smooth transpiration from leaves and efficiently prepare an optimal cultivation environment for plants. [Solution] A leaf temperature sensor 1 that measures leaf temperature, a leaf moisture sensor 2 that measures the moisture content of leaves L, an underground irrigation device 4 that sprinkles water into a solid medium 204 that supports plants PL, and a leaf temperature sensor 1 that measures leaf temperature. The control device 7 controls the operation of the underground irrigation system 4 based on the measured values of the sensor 1 and the leaf moisture sensor 2. When the rate of increase in the measured value of the leaf temperature sensor 1 is equal to or higher than the upper limit leaf temperature increase rate Vuth, the underground irrigation device 4 is operated to start irrigation into the solid medium 204, and the leaf moisture sensor When the measured value of No. 2 exceeds the first leaf moisture lower limit value Whth1, the operation of the underground irrigation device 4 is stopped and irrigation into the solid culture medium 204 is ended. [Selection diagram] Figure 1

Description

本発明は植物への給水を制御する給水制御システム、給水制御方法、および給水制御プログラムに関する。 The present invention relates to a water supply control system, a water supply control method, and a water supply control program for controlling water supply to plants.

従来、例えばハウス内において特に作物等の植物を栽培する際には、植物を健康に保って収穫物の品質向上や収穫量の最大化を図るべく、潅水量、環境温湿度、日射量、地温等の環境条件を制御することが行われている。そして近年は植物自身の状態をセンシングし、植物自身の状態に基づいて植物を最適な状態に保つようにハウス内の環境条件を制御するようになってきている。 Traditionally, when growing plants, especially crops, in greenhouses, the amount of watering, environmental temperature and humidity, amount of sunlight, and soil temperature have been adjusted in order to keep the plants healthy, improve the quality of the harvest, and maximize the yield. Efforts are being made to control environmental conditions such as: In recent years, the state of the plants themselves has been sensed, and the environmental conditions within the greenhouse have been controlled to keep the plants in optimal conditions based on the state of the plants themselves.

ここで特許文献1には、植物自身の状態を示す指標の一つである葉温をセンシングし、葉温に基づいて植物の育成環境を調整することで葉温を制御し、収穫量の増大を図った技術が記載されている。葉温が高すぎると光合成の効率が低下してしまうため、葉温は植物自身の状態を示す指標として非常に重要である。 Here, Patent Document 1 discloses that leaf temperature, which is one of the indicators indicating the state of the plant itself, is sensed, and the leaf temperature is controlled by adjusting the growing environment of the plant based on the leaf temperature, thereby increasing the yield. The technology aimed at achieving this is described. If the leaf temperature is too high, the efficiency of photosynthesis decreases, so leaf temperature is extremely important as an indicator of the state of the plant itself.

特許第6886656号公報Patent No. 6886656

ところで特許文献1にも記載されているように、植物の葉には気孔が設けられている。植物はこの気孔から水分を放出する際の気化熱によって葉を冷却し、葉温をできるだけ一定に保つ機能を備えているため、通常では葉温が上昇し過ぎることはない。しかしながら例えば真夏等の高温環境下においては葉に照射される紫外線も多く、葉が高温になり易いため葉からの蒸散量や蒸散スピードが高まる。この結果、葉からの蒸散量や蒸散スピードに対して葉への水分供給が追い付かなくなり、蒸散の気化熱によって葉を十分に冷却することができなくなってしまう可能性がある。 By the way, as described in Patent Document 1, leaves of plants are provided with stomata. Plants have the ability to cool their leaves using the heat of evaporation when water is released from their stomata, keeping the leaf temperature as constant as possible, so normally the leaf temperature does not rise too much. However, in high-temperature environments such as midsummer, leaves are irradiated with a large amount of ultraviolet rays, and the leaves tend to reach high temperatures, which increases the amount and speed of transpiration from the leaves. As a result, the water supply to the leaves may not be able to keep up with the amount and speed of transpiration from the leaves, and the leaves may not be able to be sufficiently cooled by the heat of vaporization from transpiration.

そこで本発明は、葉からの蒸散を円滑化し、植物にとって最適な栽培環境を効率よく整えることが可能な給水制御システム、給水制御方法、および給水制御プログラムを提供する。 Therefore, the present invention provides a water supply control system, a water supply control method, and a water supply control program that can smooth transpiration from leaves and efficiently prepare an optimal cultivation environment for plants.

本発明の一態様に係る給水制御システムは、植物への給水を制御する給水制御システムであって、前記植物の葉温を計測する葉温センサと、前記植物の葉の水分量を計測する葉水分センサと、前記植物を支持する固形培地内に潅水する地中潅水装置と、前記葉温センサおよび前記葉水分センサの計測値に基づいて、前記地中潅水装置の動作を制御する制御装置と、を備え、前記制御装置は、前記葉温センサの計測値が所定の葉温上限値以上であり、かつ、該葉温センサの計測値の上昇速度が所定の上限葉温上昇速度以上となった際、前記地中潅水装置を動作させて前記固形培地内への潅水を開始させる地中潅水開始指令部と、前記地中潅水装置を動作させた後に、前記葉水分センサの計測値が所定の第一葉水分下限値を超過した際、前記地中潅水装置の動作を停止させて前記固形培地内への潅水を終了させる地中潅水終了指令部と、を有する。 A water supply control system according to one aspect of the present invention is a water supply control system that controls water supply to plants, and includes a leaf temperature sensor that measures the leaf temperature of the plants, and a leaf temperature sensor that measures the water content of the leaves of the plants. a moisture sensor; an underground irrigation device that irrigate the solid medium supporting the plants; and a control device that controls the operation of the underground irrigation device based on the measured values of the leaf temperature sensor and the leaf moisture sensor. , the control device is configured such that the measured value of the leaf temperature sensor is equal to or higher than a predetermined upper limit of leaf temperature, and the rate of increase of the measured value of the leaf temperature sensor is equal to or higher than the predetermined upper limit of leaf temperature increase rate. an underground irrigation start command unit that operates the underground irrigation device to start irrigation into the solid culture medium; and after operating the underground irrigation device, the measured value of the leaf moisture sensor is an underground irrigation termination command unit that stops the operation of the underground irrigation device and terminates irrigation into the solid medium when the first lower limit of leaf moisture exceeds the first leaf moisture lower limit value.

上記潅水制御システムは、前記固形培地の表面に潅水する地表潅水装置をさらに備え、前記制御装置は、前記地中潅水装置を動作させた後に、前記葉水分センサの計測値が所定の開始側第二葉水分下限値以下であり、かつ、前記葉水分センサの計測値の減少速度が所定の第一上限葉水分減少速度以上となった際、前記地表潅水装置を動作させて前記固形培地の表面への潅水を開始させる地表潅水開始指令部と、前記地表潅水装置を動作させた後に、前記葉水分センサの計測値が所定の終了側第二葉水分下限値を超過した際、前記地表潅水装置の動作を停止させて前記固形培地の表面への潅水を終了させる地表潅水終了指令部と、をさらに有してもよい。 The above-mentioned irrigation control system further includes a surface irrigation device that irrigations the surface of the solid medium, and the control device is configured to control the water supply system so that the measured value of the leaf moisture sensor reaches a predetermined starting side after operating the underground irrigation device. When the leaf moisture is below the two leaf moisture lower limits and the rate of decrease in the measured value of the leaf moisture sensor is equal to or higher than the first predetermined upper limit rate of decrease in leaf moisture, the surface irrigation device is operated to a ground irrigation start command unit that starts irrigation to the ground irrigation device; and after operating the ground irrigation device, when the measured value of the leaf moisture sensor exceeds a predetermined end-side second leaf moisture lower limit value, the ground irrigation device It may further include a surface irrigation termination command unit that stops the operation of the solid culture medium and terminates irrigation to the surface of the solid culture medium.

上記潅水制御システムでは、前記地表潅水装置は、前記植物の近傍となる株元へ潅水を行うようにしてもよい。 In the above-mentioned irrigation control system, the above-mentioned surface irrigation device may perform irrigation to the base of a plant near the above-mentioned plant.

上記潅水制御システムでは、前記地表潅水装置は、前記地中潅水装置よりも、単位時間当たりの給水量が小さくなっていてもよい。 In the above-mentioned irrigation control system, the surface irrigation device may have a smaller water supply amount per unit time than the underground irrigation device.

上記潅水制御システムは、前記植物の葉へミスト状の水分を供給するミスト供給装置をさらに備え、前記制御装置は、前記地表潅水装置を動作させた後に、前記葉水分センサの計測値が所定の開始側第三葉水分下限値以下であり、かつ、前記葉水分センサの計測値の減少速度が前記第一上限葉水分減少速度よりも大きな第二上限葉水分減少速度以上となった際、前記ミスト供給装置を動作させて前記葉へのミスト供給を開始させるミスト供給開始指令部と、前記ミスト供給装置を動作させた後に、前記葉水分センサの計測値が所定の終了側第三葉水分下限値を超過した際、前記ミスト供給装置の動作を停止させて前記葉へのミスト供給を終了させるミスト供給終了指令部と、をさらに有してもよい。 The irrigation control system further includes a mist supply device that supplies mist-like moisture to the leaves of the plant, and the control device is configured such that after operating the surface irrigation device, the measurement value of the leaf moisture sensor is set to a predetermined value. is below the third lower limit of leaf moisture on the starting side, and when the rate of decrease in the measured value of the leaf moisture sensor is equal to or higher than the second upper limit rate of decrease in leaf moisture, which is greater than the first limit rate of decrease in leaf moisture, a mist supply start command unit that operates a mist supply device to start supplying mist to the leaves; and after operating the mist supply device, the measured value of the leaf moisture sensor is a predetermined end-side third leaf moisture lower limit. The apparatus may further include a mist supply termination command section that stops the operation of the mist supply device to terminate the mist supply to the leaves when the value exceeds the value.

上記潅水制御システムは、前記植物の葉へミスト状の水分を供給するミスト供給装置をさらに備え、前記制御装置は、前記地中潅水装置を動作させた後に、前記葉水分センサの計測値が所定の開始側第三葉水分下限値以下であり、かつ、前記葉水分センサの計測値の減少速度が上限葉水分減少速度以上となった際、前記ミスト供給装置を動作させて前記葉へのミスト供給を開始させるミスト供給開始指令部と、前記ミスト供給装置を動作させた後に、前記葉水分センサの計測値が所定の終了側第三葉水分下限値を超過した際、前記ミスト供給装置の動作を停止させて前記葉へのミスト供給を終了させるミスト供給終了指令部と、をさらに有してもよい。 The irrigation control system further includes a mist supply device that supplies mist-like moisture to the leaves of the plant, and the control device is configured such that after operating the underground irrigation device, the measurement value of the leaf moisture sensor is set to a predetermined value. is below the third leaf moisture lower limit on the starting side, and when the decreasing rate of the measured value of the leaf moisture sensor is equal to or higher than the upper limit leaf moisture decreasing rate, the mist supply device is operated to spray mist onto the leaves. a mist supply start command unit that starts supply; and an operation of the mist supply device when the measured value of the leaf moisture sensor exceeds a predetermined end-side third leaf moisture lower limit value after the mist supply device is operated. The apparatus may further include a mist supply termination command section that stops the mist supply to the leaves and terminates the mist supply to the leaves.

上記潅水制御システムは、前記固形培地の水分量を計測する培地水分センサをさらに備え、前記制御装置は、前記葉温センサの計測値が所定の葉温下限値以上であり、かつ、該葉温センサの計測値の上昇速度が所定の基準葉温増加速度以上となった際、前記地中潅水装置を動作させる前に、前記固形培地の水分量の下限値となる所定の培地水分下限値を増加させる培地水分変更部をさらに有し、前記地中潅水開始指令部は、前記培地水分センサの計測値が、増加後の前記培地水分下限値以下となっている際に、前記地中潅水装置を動作させて前記固形培地内への潅水を開始させてもよい。


The above-mentioned irrigation control system further includes a medium moisture sensor that measures the moisture content of the solid medium, and the control device is configured such that the measured value of the leaf temperature sensor is equal to or higher than a predetermined leaf temperature lower limit value, and the leaf temperature When the rate of increase in the measured value of the sensor exceeds a predetermined reference leaf temperature increase rate, a predetermined medium moisture lower limit value, which is the lower limit value of the moisture content of the solid medium, is set before operating the underground irrigation device. The underground irrigation start command unit further includes a medium moisture change unit that increases the medium moisture content, and the underground irrigation start command unit controls the underground irrigation device when the measured value of the medium moisture sensor is equal to or lower than the medium moisture lower limit value after the increase. may be operated to start watering into the solid medium.


本発明の一態様に係る給水制御方法は、植物への給水を制御する給水制御方法であって、前記植物の葉温を計測する葉温センサの計測値が所定の葉温上限値以上であり、かつ、該葉温センサの計測値の上昇速度が所定の上限葉温上昇速度以上となった際、前記植物を支持する固形培地内への潅水を開始する地中潅水開始ステップと、前記固形培地内への潅水の開始後に、前記植物の葉の水分量を計測する葉水分センサの計測値が所定の葉水分下限値を超過した際、前記固形培地内への潅水を終了する地中潅水終了ステップと、を含む。 A water supply control method according to one aspect of the present invention is a water supply control method for controlling water supply to plants, in which a measured value of a leaf temperature sensor that measures leaf temperature of the plant is equal to or higher than a predetermined leaf temperature upper limit value. and an underground irrigation starting step of starting watering into the solid medium supporting the plant when the rate of increase in the measured value of the leaf temperature sensor exceeds a predetermined upper limit rate of increase in leaf temperature; Underground irrigation that terminates watering into the solid medium when the measured value of a leaf moisture sensor that measures the amount of water in the leaves of the plant exceeds a predetermined lower limit of leaf moisture after the start of watering into the solid medium. and a termination step.

本発明の一態様に係る給水制御プログラムは、植物への給水を制御するために、計算機を、前記植物の葉温を計測する葉温センサの計測値が所定の葉温上限値以上であり、かつ、該葉温センサの計測値の上昇速度が所定の上限葉温上昇速度以上となった際、前記植物を支持する固形培地内への潅水を開始させる地中潅水開始手段、および前記固形培地内への潅水の開始後に、前記植物の葉の水分量を計測する葉水分センサの計測値が所定の葉水分下限値を超過した際、前記固形培地内への潅水を終了させる地中潅水終了手段、として機能させる。 A water supply control program according to one aspect of the present invention, in order to control water supply to plants, a computer is configured to perform a water supply control program when a measured value of a leaf temperature sensor that measures leaf temperature of the plant is equal to or higher than a predetermined leaf temperature upper limit; and an underground irrigation start means for starting watering into a solid medium supporting the plant when the rate of increase in the measured value of the leaf temperature sensor exceeds a predetermined upper limit rate of increase in leaf temperature, and the solid medium After the start of watering into the solid medium, when the measured value of a leaf moisture sensor that measures the water content of the leaves of the plant exceeds a predetermined lower limit of leaf water, the watering into the solid medium is ended. Function as a means.

上記の給水制御システム等によれば、葉からの蒸散を円滑化し、植物にとって最適な栽培環境を効率よく整えることが可能となる。 According to the water supply control system and the like described above, it is possible to smooth transpiration from leaves and efficiently create an optimal cultivation environment for plants.

本発明の実施形態に係る給水制御システムの全体概要図である。なお説明の便宜のため栽培ベッドを縦断面図で示している。。1 is an overall schematic diagram of a water supply control system according to an embodiment of the present invention. Note that for convenience of explanation, the cultivation bed is shown in a longitudinal cross-sectional view. . 上記給水制御システムにおける制御装置のハードウェア構成図である。It is a hardware block diagram of the control device in the above-mentioned water supply control system. 上記給水制御システムにおける制御装置の機能ブロック図である。It is a functional block diagram of a control device in the above-mentioned water supply control system. 上記給水制御システムにおける制御フローを示すフローチャートである。It is a flow chart which shows the control flow in the above-mentioned water supply control system.

(全体構成)
図1に示すように給水制御システム100は、植物PLに対する給水を制御する装置である。本実施形態において給水制御システム100は、栽培ベッド201、および栽培ベッド201の底部に設けられた保水マット202、保水マット202上に載置された複数の栽培容器203、および各々の栽培容器203に収容された固形培地204(「土壌」であってもよい。以下、単に培地と呼称する)によって構成された栽培装置200に設けられている。栽培装置200は例えばハウス内や植物工場内等、栽培環境の調整が可能な場所に設置される。なお上述した栽培装置200は一例であって、その構成は適宜変更可能である。
(overall structure)
As shown in FIG. 1, the water supply control system 100 is a device that controls water supply to plants PL. In the present embodiment, the water supply control system 100 controls a cultivation bed 201, a water retention mat 202 provided at the bottom of the cultivation bed 201, a plurality of cultivation containers 203 placed on the water retention mat 202, and each cultivation container 203. The cultivation device 200 is provided with a solid culture medium 204 (which may be "soil", hereinafter simply referred to as a culture medium) contained therein. The cultivation device 200 is installed in a place where the cultivation environment can be adjusted, such as in a greenhouse or a plant factory. In addition, the cultivation apparatus 200 mentioned above is an example, Comprising: The structure can be changed suitably.

各々の栽培容器203の底には底孔203aが設けられ、底孔203aを通じて栽培容器203の内から外に伸びる根Rを通じて、保水マット202からの水分(水や養液)が培地204に供給されるようになっている。すなわち本実施形態では、詳しく後述する給水制御システム100の地中潅水装置4によって、培地204の底面204bから培地204内に潅水されるようになってる。 A bottom hole 203a is provided at the bottom of each cultivation container 203, and moisture (water and nutrient solution) from the water retention mat 202 is supplied to the culture medium 204 through the roots R extending from the inside of the cultivation container 203 to the outside through the bottom hole 203a. It is now possible to do so. That is, in this embodiment, water is applied into the culture medium 204 from the bottom surface 204b of the culture medium 204 by the underground irrigation device 4 of the water supply control system 100, which will be described in detail later.

(給水制御システム)
次に給水制御システム100について説明する。
給水制御システム100は、植物PLの葉Lの葉表面の温度(以下、葉温)を計測する葉温センサ1と、葉Lの水分量(以下、葉水分量)を計測する葉水分センサ2と、培地204の水分量(以下、培地水分量)を計測する培地水分センサ3と、培地204中に潅水する地中潅水装置4と、培地204の表面(上面)204aに潅水する地表潅水装置5と、葉Lへミストを供給(噴霧)するミスト供給装置6と、各センサ1、2、3の計測値に基づいて地中潅水装置4、地表潅水装置5、ミスト供給装置6の動作を制御する制御装置7とを備えている。
(Water supply control system)
Next, the water supply control system 100 will be explained.
The water supply control system 100 includes a leaf temperature sensor 1 that measures the temperature of the leaf surface of a leaf L of a plant PL (hereinafter referred to as leaf temperature), and a leaf moisture sensor 2 that measures the water content of the leaf L (hereinafter referred to as leaf water content). , a medium moisture sensor 3 that measures the moisture content of the medium 204 (hereinafter referred to as medium moisture content), an underground irrigation device 4 that sprinkles water into the culture medium 204, and a surface irrigation device that sprinkles water on the surface (upper surface) 204a of the culture medium 204. 5, a mist supply device 6 that supplies (sprays) mist to the leaves L, and operations of the underground irrigation device 4, surface irrigation device 5, and mist supply device 6 based on the measured values of each sensor 1, 2, and 3. A control device 7 is provided.

なお給水制御システム100はさらにポンプ8を備え、ポンプ8によって不図示の給水源から地中潅水装置4、地表潅水装置5、およびミスト供給装置6に水分を供給するようになっている。 The water supply control system 100 further includes a pump 8, which supplies water to the underground irrigation system 4, the surface irrigation system 5, and the mist supply system 6 from a water supply source (not shown).

(センサ)
葉温センサ1は特に限定されるものではないが、例えば赤外線を感知する放射温度センサや、サーミスタ温度センサ等のセンサ装置が好適に使用される。葉温センサ1は、常時(例えば30秒~1分毎)に計測を行うようになっている。葉温センサ1は栽培容器203毎に設けられている。
(sensor)
Although the leaf temperature sensor 1 is not particularly limited, for example, a sensor device such as a radiation temperature sensor that senses infrared rays or a thermistor temperature sensor is preferably used. The leaf temperature sensor 1 is configured to take measurements at all times (for example, every 30 seconds to 1 minute). Leaf temperature sensor 1 is provided for each cultivation container 203.

葉水分センサ2は特に限定されるものではないが、例えば近赤外線を葉Lに照射して反射量から葉水分量を算出する照射型のセンサ装置等が好適に使用される。また葉水分センサ2は、葉を撮像した画像から葉Lの萎れ状態を判定し、判定された萎れ状態に基づいて葉水分量を算出するようなセンサ装置としてもよい。葉水分センサ2は、常時(例えば30秒~1分毎)に計測を行うようになっている。葉水分センサ2は栽培容器203毎に設けられている。葉水分センサ2は植物PLの成長点近傍に設置されるとよい。 Although the leaf moisture sensor 2 is not particularly limited, for example, an irradiation type sensor device that irradiates the leaf L with near infrared rays and calculates the leaf moisture content from the amount of reflection is preferably used. Further, the leaf moisture sensor 2 may be a sensor device that determines the wilting state of the leaf L from an image of the leaf and calculates the leaf water content based on the determined wilting state. The leaf moisture sensor 2 is configured to perform measurements at all times (for example, every 30 seconds to 1 minute). Leaf moisture sensor 2 is provided for each cultivation container 203. The leaf moisture sensor 2 is preferably installed near the growth point of the plant PL.

培地水分センサ3は特に限定されるものではないが、培地204に表面204aから差し込まれ、培地204の抵抗値や誘電率等から培地204の含水率を算出可能なセンサ装置が好適に使用される。培地水分センサ3は、常時(例えば30秒~1分毎)に計測を行うようになっている。培地水分センサ3は栽培容器203毎に設けられている。 Although the medium moisture sensor 3 is not particularly limited, a sensor device that is inserted into the medium 204 from the surface 204a and is capable of calculating the moisture content of the medium 204 from the resistance value, dielectric constant, etc. of the medium 204 is preferably used. . The culture medium moisture sensor 3 is configured to perform measurements at all times (for example, every 30 seconds to 1 minute). The culture medium moisture sensor 3 is provided for each cultivation container 203.

(地中潅水装置)
地中潅水装置4は、保水マット202に給水することで、上述のように保水マット202を介して培地204の底面204bから培地204内に潅水する装置である。具体的に地中潅水装置4は、ポンプ8に接続されて給水口4aと、ポンプ8と給水口4aとの間に設けられた電磁弁4bとを有している。
(underground irrigation system)
The underground irrigation device 4 is a device that supplies water to the water retention mat 202 to irrigate the inside of the culture medium 204 from the bottom surface 204b of the culture medium 204 via the water retention mat 202 as described above. Specifically, the underground irrigation system 4 includes a water supply port 4a connected to the pump 8, and an electromagnetic valve 4b provided between the pump 8 and the water supply port 4a.

(地表潅水装置)
地表潅水装置5は、培地204の表面(上面)204aに潅水を行う装置である。地表潅水装置5は、植物PLの近傍となる株元、すなわち植物PLの根(毛細根)Rが多く存在する領域へ潅水を行う。具体的に地表潅水装置5は、株元に点滴による給水を行う給水ノズル5aと、給水ノズル5aとポンプ8との間に設けられた電磁弁5bとを有し、栽培容器203毎に設けられている。
(Surface irrigation equipment)
The ground irrigation device 5 is a device that irrigations the surface (upper surface) 204a of the culture medium 204. The ground watering device 5 performs watering to the plant base near the plant PL, that is, to a region where many roots (capillary roots) R of the plant PL exist. Specifically, the ground irrigation device 5 includes a water supply nozzle 5a that supplies water to the plant by drip, and an electromagnetic valve 5b provided between the water supply nozzle 5a and the pump 8. ing.

地表潅水装置5は、例えば秒単位で点滴のように、分単位のインターバルで潅水を行うことが可能となっている。また地表潅水装置5は、地中潅水装置4よりも単位時間当たりの給水量が小さくなっており、20〔ml/分〕程度の吐出量で潅水を行う。なお地表潅水装置5による潅水時間や潅水量の制御を、詳しく後述する制御装置7で行ってもよいし、制御装置7とは別に設けた不図示の制御装置で行ってもよい。 The ground irrigation device 5 is capable of performing irrigation at intervals of minutes, such as by dripping every second. Moreover, the surface irrigation device 5 has a smaller water supply amount per unit time than the underground irrigation device 4, and performs irrigation with a discharge amount of about 20 [ml/min]. The irrigation time and amount of irrigation by the surface irrigation device 5 may be controlled by a control device 7, which will be described in detail later, or by a control device (not shown) provided separately from the control device 7.

(ミスト供給装置)
ミスト供給装置6は、葉Lに向けてミスト状の水分を噴霧して供給する装置である。具体的にミスト供給装置6は、水分を噴霧する噴霧ノズル6aと、噴霧ノズル6aとポンプ8との間に設けられた電磁弁6bとを有し、栽培容器203毎に設けられている。
(Mist supply device)
The mist supply device 6 is a device that sprays and supplies mist-like moisture toward the leaves L. Specifically, the mist supply device 6 includes a spray nozzle 6a that sprays water, and an electromagnetic valve 6b provided between the spray nozzle 6a and the pump 8, and is provided for each cultivation container 203.

ミスト供給装置6から噴霧されるミストの粒径はできるだけ小さいことが好ましく、粒径は10〔μm〕~100〔μm〕、好ましくは70〔μm〕以下であるとよい。また噴霧の時間は、葉Lの濡れ具合を検知するセンサ(不図示)の計測結果に基づいて、葉Lの表面から水分が流れ落ちずに葉Lの表面に水分が留まる程度の量の水分を噴霧した後、葉Lの表面の水分が蒸発するまで噴霧を停止するようにミスト供給装置6の動作制御が行われる。すなわちミスト供給装置6は、地表潅水装置5と同様に間欠的に(例えば10秒~20秒程度の噴霧時間で)動作するようになっている。なおミスト供給装置6による噴霧時間、噴霧量の制御は詳しく後述する制御装置7で行ってもよいし、制御装置7とは別に設けた不図示の制御装置で行ってもよい。なお植物PL近傍の雰囲気湿度が所定値以下となった際にミスト噴霧を行うように間欠動作制御を行ってもよいし、葉温が所定値以下となった際にミスト噴霧を停止するように間欠動作制御を行ってもよい。 The particle size of the mist sprayed from the mist supply device 6 is preferably as small as possible, and the particle size is preferably 10 [μm] to 100 [μm], preferably 70 [μm] or less. The spraying time is determined based on the measurement results of a sensor (not shown) that detects the wetness of the leaves L.The spraying time is determined based on the measurement results of a sensor (not shown) that detects the wetness of the leaves L. After spraying, the operation of the mist supply device 6 is controlled so as to stop spraying until the water on the surface of the leaves L evaporates. That is, the mist supply device 6 is designed to operate intermittently (for example, with a spraying time of about 10 seconds to 20 seconds) like the surface irrigation device 5. The spray time and spray amount by the mist supply device 6 may be controlled by a control device 7, which will be described in detail later, or by a control device (not shown) provided separately from the control device 7. Note that intermittent operation control may be performed to perform mist spraying when the atmospheric humidity near the plant PL falls below a predetermined value, or to stop mist spraying when the leaf temperature falls below a predetermined value. Intermittent operation control may also be performed.

(制御装置)
図2に示すように制御装置7は計算機70を有し、計算機70は、CPU(Central Processing Unit)700と、ROM(Read Only Memory)やRAM(Random Access Memory)などのメモリ710と、HDD(Hard Disk Drive)やSSD(Solid State Drive)などの不揮発性の記憶装置720と、電源装置730と、入力インターフェース740と、出力インターフェース750と、これらを接続するバス配線760とを有している。CPU700は中央演算処理装置であって後述する給水制御プログラムを実行する。メモリ710はCPU700の作業領域や記憶領域として使用され、記憶装置720はCPU700で実行されるオペレーティングシステムやプログラム等を記憶している。
(Control device)
As shown in FIG. 2, the control device 7 has a computer 70, and the computer 70 includes a CPU (Central Processing Unit) 700, a memory 710 such as a ROM (Read Only Memory) or a RAM (Random Access Memory), and an HDD ( The device includes a nonvolatile storage device 720 such as a hard disk drive (hard disk drive) or a solid state drive (SSD), a power supply device 730, an input interface 740, an output interface 750, and a bus wiring 760 that connects these. The CPU 700 is a central processing unit and executes a water supply control program to be described later. The memory 710 is used as a work area and storage area for the CPU 700, and the storage device 720 stores an operating system, programs, etc. executed by the CPU 700.

そして図3に示すように制御装置7の計算機70は、葉温判定部71と、葉温上昇速度判定部72と、培地水分量下限調整部73と、調整後培地水分量判定部74と、地中潅水開始指令部75と、第一葉水分量判定部76と、地中潅水終了指令部77と、第一葉水分量減少速度判定部78と、開始側第二葉水分量判定部79と、地表潅水開始指令部80と、終了側第二葉水分量判定部81と、地表潅水終了指令部82と、第二葉水分量減少速度判定部83と、開始側第三葉水分量判定部84と、ミスト供給開始指令部85と、終了側第三葉水分量判定部86と、ミスト供給終了指令部87とを有している。 As shown in FIG. 3, the computer 70 of the control device 7 includes a leaf temperature determination section 71, a leaf temperature increase rate determination section 72, a medium moisture content lower limit adjustment section 73, an adjusted medium moisture content determination section 74, Underground irrigation start command unit 75, first leaf water content determination unit 76, underground irrigation end command unit 77, first leaf water content reduction rate determination unit 78, and second leaf water content determination unit on the starting side 79 , a surface irrigation start command section 80, a second leaf moisture content determination section 81 on the end side, a surface irrigation end command section 82, a second leaf moisture reduction rate determination section 83, and a third leaf moisture content determination section on the start side. 84 , a mist supply start command section 85 , an end-side third leaf moisture content determination section 86 , and a mist supply end command section 87 .

葉温判定部71は、葉温センサ1の計測値が所定の葉温上限値Tth〔℃〕以上となっているか否かを判定する。葉温上限値Tthは、植物の種類等に応じて適宜設定される数値であり、例えば植物PLがトマトであれば、葉Lに萎れが生じないと考えられる上限値である13〔℃〕に設定される。 The leaf temperature determination unit 71 determines whether the measured value of the leaf temperature sensor 1 is equal to or higher than a predetermined leaf temperature upper limit value T th [° C.]. The leaf temperature upper limit T th is a numerical value that is appropriately set depending on the type of plant, etc. For example, if the plant PL is a tomato, the upper limit value is 13 [°C] at which it is considered that the leaves L will not wilt. is set to

葉温上昇速度判定部72は、葉温センサ1の計測値の上昇速度が所定の上限葉温上昇速度Vuth〔℃/秒〕以上となっているか否かを判定する。 The leaf temperature increase rate determining unit 72 determines whether the rate of increase in the measured value of the leaf temperature sensor 1 is equal to or higher than a predetermined upper limit leaf temperature increase rate V uth [° C./sec].

培地水分量下限調整部73は、培地水分量の下限値となる所定の培地水分下限値Wmthを調整する。すなわち培地水分量下限調整部73は、後述する制御フローの通り所定条件下においての培地水分下限値Wmthを増加させ、または、減少させる。 The medium moisture content lower limit adjustment section 73 adjusts a predetermined medium moisture lower limit value W mth that is the lower limit value of the culture medium moisture content. That is, the medium moisture content lower limit adjustment unit 73 increases or decreases the medium moisture lower limit value W mth under predetermined conditions as per the control flow described below.

調整後培地水分量判定部74は、培地水分センサ3の計測値が、培地水分量下限調整部73によって増加させられた後の培地水分下限値Wmth以下となっているか否かを判定する。 The adjusted culture medium moisture content determination unit 74 determines whether the measured value of the culture medium moisture sensor 3 is equal to or less than the culture medium moisture lower limit value W mth after being increased by the culture medium moisture content lower limit adjustment unit 73.

地中潅水開始指令部75は、葉温センサ1の計測値が葉温上限値Tth以上であり、かつ、葉温センサ1の計測値の上昇速度が上限葉温上昇速度Vuth以上となった際、地中潅水装置4の電磁弁4bを開放することで地中潅水装置4を動作させて保水マット202に向けて給水し、保水マット202を介して培地204の底面204bから培地204内への潅水を開始させる。 The underground irrigation start command unit 75 determines that the measured value of the leaf temperature sensor 1 is equal to or higher than the leaf temperature upper limit value T th and the rate of increase in the measured value of the leaf temperature sensor 1 is equal to or higher than the upper limit leaf temperature increase rate V th . At this time, by opening the solenoid valve 4b of the underground irrigation system 4, the underground irrigation system 4 is operated to supply water to the water retention mat 202, and water is supplied from the bottom surface 204b of the culture medium 204 into the culture medium 204 through the water retention mat 202. Start watering.

第一葉水分量判定部76は、葉水分センサ2の計測値が所定の第一葉水分下限値Whth1以下となっているか否かを判定する。 The first leaf moisture determination unit 76 determines whether the measured value of the leaf moisture sensor 2 is equal to or less than a predetermined first lower limit value W hth1 of leaf moisture.

地中潅水終了指令部77は、葉水分センサ2の計測値が第一葉水分下限値Whth1を超過した際、地中潅水装置4の電磁弁4bを閉塞して地中潅水装置4の動作を停止させて培地204内への潅水を終了させる。 When the measured value of the leaf moisture sensor 2 exceeds the first leaf moisture lower limit W hth1 , the underground irrigation end command unit 77 closes the solenoid valve 4b of the underground irrigation device 4 and stops the operation of the underground irrigation device 4. is stopped to complete watering into the culture medium 204.

第一葉水分量減少速度判定部78は、葉水分センサ2の計測値の減少速度が所定の第一上限葉水分減少速度Vdth1〔℃/秒〕以上となっているか否かを判定する。 The first leaf water content decreasing rate determination unit 78 determines whether the decreasing rate of the measured value of the leaf moisture sensor 2 is equal to or higher than a predetermined first upper limit leaf moisture decreasing rate V dth1 [° C./sec].

開始側第二葉水分量判定部79は、葉水分センサ2の計測値が所定の開始側第二葉水分下限値Whth2s以下となっているか否かを判定する。 The start-side second leaf moisture content determination unit 79 determines whether the measured value of the leaf moisture sensor 2 is less than or equal to a predetermined start-side second leaf moisture lower limit value W hth2s .

地表潅水開始指令部80は、地中潅水装置4を動作させた後に、葉水分センサ2の計測値が開始側第二葉水分下限値Whth2s以下であり、かつ、葉水分センサ2の計測値の減少速度が第一上限葉水分減少速度Vdth1以上となった際、地表潅水装置5の電磁弁5bを開放することで地表潅水装置5を動作させて培地204の表面204aへの潅水を開始させる。 After operating the underground irrigation device 4, the surface irrigation start command unit 80 determines that the measured value of the leaf moisture sensor 2 is equal to or lower than the start-side second leaf moisture lower limit value W hth2s , and that the measured value of the leaf moisture sensor 2 is When the rate of decrease becomes equal to or higher than the first upper limit leaf moisture decrease rate V dth1 , the solenoid valve 5b of the surface irrigation device 5 is opened to operate the surface irrigation device 5 and start watering the surface 204a of the culture medium 204. let

終了側第二葉水分量判定部81は、地表潅水装置5を動作させた後に、葉水分センサ2の計測値が所定の終了側第二葉水分下限値Whth2e以下となっているか否かを判定する。 The end-side second leaf moisture content determining unit 81 determines whether the measured value of the leaf moisture sensor 2 is equal to or less than a predetermined end-side second leaf moisture lower limit value W hth2e after operating the ground irrigation device 5. judge.

地表潅水終了指令部82は、地表潅水装置5を動作させた後に、葉水分センサ2の計測値が終了側第二葉水分下限値Whth2eを超過した際、地表潅水装置5の電磁弁5bを閉塞することで地表潅水装置5の動作を停止させて培地204の表面204aへの潅水を終了させる。 When the measured value of the leaf moisture sensor 2 exceeds the end-side second leaf moisture lower limit W hth2e after operating the ground irrigation device 5, the ground irrigation termination command unit 82 activates the solenoid valve 5b of the ground irrigation device 5. By blocking it, the operation of the surface irrigation device 5 is stopped and the irrigation to the surface 204a of the culture medium 204 is completed.

第二葉水分量減少速度判定部83は、葉水分センサ2の計測値の減少速度が第一上限葉水分減少速度Vdth1よりも大きな第二上限葉水分減少速度Vdth2以上となっているか否かを判定する。 The second leaf water content reduction rate determination unit 83 determines whether the reduction rate of the measured value of the leaf moisture sensor 2 is equal to or higher than the second upper limit leaf water content reduction rate V dth2 , which is greater than the first upper limit leaf moisture reduction rate V dth1 . Determine whether

開始側第三葉水分量判定部84は、葉水分センサ2の計測値が所定の開始側第三葉水分下限値Whth3s以下となっているか否かを判定する。 The starting side third leaf moisture content determination unit 84 determines whether the measured value of the leaf moisture sensor 2 is equal to or less than a predetermined starting side third leaf moisture lower limit value W hth3s .

ミスト供給開始指令部85は、地表潅水装置5を動作させた後に、葉水分センサ2の計測値が開始側第三葉水分下限値Whth3s以下であり、かつ、葉水分センサ2の計測値の減少速度が第二上限葉水分減少速度Vdth2以上となった際、ミスト供給装置6の電磁弁6bを開放することでミスト供給装置6を動作させて葉Lへのミスト供給を開始させる。 After operating the ground irrigation device 5, the mist supply start command unit 85 determines that the measured value of the leaf moisture sensor 2 is equal to or lower than the third leaf moisture lower limit W hth3s on the start side, and that the measured value of the leaf moisture sensor 2 is When the reduction rate becomes equal to or higher than the second upper limit leaf moisture reduction rate V dth2 , the solenoid valve 6b of the mist supply device 6 is opened to operate the mist supply device 6 and start supplying mist to the leaves L.

終了側第三葉水分量判定部86は、ミスト供給装置6を動作させた後に、葉水分センサ2の計測値が所定の終了側第三葉水分下限値Whth3e以下となっているか否かを判定する。 After operating the mist supply device 6, the end-side third leaf moisture determination unit 86 determines whether the measured value of the leaf moisture sensor 2 is equal to or less than a predetermined end-side third leaf moisture lower limit W hth3e . judge.

ミスト供給終了指令部87は、ミスト供給装置6を動作させた後に、葉水分センサ2の計測値が終了側第三葉水分下限値Whth3eを超過した際、ミスト供給装置6の電磁弁6bを閉塞することでミスト供給装置6の動作を停止させて葉Lへのミスト供給を終了させる The mist supply end command unit 87 controls the solenoid valve 6b of the mist supply device 6 when the measured value of the leaf moisture sensor 2 exceeds the end-side third leaf moisture lower limit W hth3e after operating the mist supply device 6. By blocking the mist supply device 6, the operation of the mist supply device 6 is stopped and the mist supply to the leaves L is ended.

次に図4を参照して、給水制御プログラム(給水制御方法)のフローについて説明する。
以下の説明では「葉温」、「葉水分量」、および「培地水分量」はいずれもセンサ1,2、3の計測値を示す。また以下の制御フローは栽培容器203毎に並行して実行される。
まずステップS1を実行し、葉温が葉温上限値Tth以上となっているか否かを判定する。葉温が葉温上限値Tth以上となっている場合、「YES」と判定されてステップS2に進む。一方で葉温が葉温上限値Tth未満となっている場合には「NO」と判定されてステップS1に戻る。
なおステップS1で「NO」と判定された場合は「平常時」となる。この「平常時」においては地中潅水装置4を適宜動作させるとともに、培地水分センサ3の計測値、およびポンプ8からの吐出量を不図示のセンサで常時監視し、培地水分量を最適な状態に保つようにしている。一方ステップS1で「YES」と判定された場合は「非常時」となって以下のフローで制御が進行する。
Next, with reference to FIG. 4, the flow of the water supply control program (water supply control method) will be described.
In the following explanation, "leaf temperature", "leaf moisture content", and "medium moisture content" all indicate the measured values of sensors 1, 2, and 3. Further, the following control flow is executed in parallel for each cultivation container 203.
First, step S1 is executed to determine whether the leaf temperature is equal to or higher than the leaf temperature upper limit value Tth . If the leaf temperature is equal to or higher than the leaf temperature upper limit value Tth , the determination is "YES" and the process proceeds to step S2. On the other hand, if the leaf temperature is less than the leaf temperature upper limit Tth , the determination is "NO" and the process returns to step S1.
Note that if the determination in step S1 is "NO", the state is "normal". During this "normal time", the underground irrigation system 4 is operated as appropriate, and the measured value of the culture medium moisture sensor 3 and the discharge amount from the pump 8 are constantly monitored by a sensor (not shown) to maintain the moisture content of the culture medium in an optimal state. I try to keep it that way. On the other hand, if the determination in step S1 is "YES", it is an "emergency" and the control proceeds according to the flow below.

ステップS2では、ステップS1で「YES」と判定された場合において葉温の上昇速度が上限葉温上昇速度Vuth以上となっているか否かを判定する。葉温の上昇速度が上限葉温上昇速度Vuth以上となっている場合、「YES」と判定されてステップS3に進む。一方で葉温の上昇速度が上限葉温上昇速度Vuth未満となっている場合には「NO」と判定されてステップS1に戻る。 In step S2, if the determination is YES in step S1, it is determined whether the rate of increase in leaf temperature is equal to or higher than the upper limit rate of increase in leaf temperature V uth . If the rate of increase in leaf temperature is equal to or higher than the upper limit rate of increase in leaf temperature V uth , the determination is "YES" and the process proceeds to step S3. On the other hand, if the rate of increase in leaf temperature is less than the upper limit rate of increase in leaf temperature V uth , the determination is "NO" and the process returns to step S1.

ステップS3では、ステップS2で「YES」と判定された場合において、培地水分下限値Wmthを増加させる。例えば本実施形態の給水制御プログラムが動作しない平常時において培地204の体積含水率(VWC)が仮に48である場合には、ステップS3において体積含水率(VWC)を例えば49~50程度まで増加させる。すなわちステップS3では体積含水率(VWC)を平常時の値に比べて例えば1~3程度増加させる。 In step S3, when the determination is "YES" in step S2, the medium moisture lower limit value W mth is increased. For example, if the volumetric water content (VWC) of the culture medium 204 is 48 in normal times when the water supply control program of this embodiment is not operating, the volumetric water content (VWC) is increased to, for example, about 49 to 50 in step S3. . That is, in step S3, the volumetric water content (VWC) is increased, for example, by about 1 to 3 compared to the normal value.

その後ステップS4を実行する。ステップS4では、培地水分量がステップS3において増加させられた後の培地水分下限値Wmth以下となっているか否かを判定する。培地水分量が増加後の培地水分下限値Wmth以下となっている場合、「YES」と判定されてステップS5に進む。一方で、培地水分量が増加後の培地水分下限値Wmthを超過している場合には「NO」と判定されてステップS1に戻る。なお本実施形態のステップS4では、複数の栽培容器203のうちの少なくとも一つの栽培容器203の培地水分量が培地水分下限値Wmth以下となっている場合、「YES」と判定されるようになっている。 After that, step S4 is executed. In step S4, it is determined whether the culture medium moisture content is equal to or less than the lower limit W mth of culture medium moisture after being increased in step S3. If the medium water content is equal to or less than the lower limit W mth of medium water content after the increase, the determination is "YES" and the process proceeds to step S5. On the other hand, if the medium moisture content exceeds the increased medium moisture lower limit value W mth , the determination is "NO" and the process returns to step S1. In addition, in step S4 of this embodiment, when the culture medium moisture content of at least one cultivation container 203 among the plurality of cultivation containers 203 is equal to or less than the culture medium moisture lower limit value W mth , the determination is made as "YES". It has become.

ステップS5では、ステップS4で「YES」と判定された場合において、地中潅水装置4を動作させて地中潅水を開始させる。 In step S5, when the determination is "YES" in step S4, the underground irrigation device 4 is operated to start underground irrigation.

次にステップS6を実行する。ステップS6では、葉水分量が第一葉水分下限値Whth1以下となっているか否かを判定する。葉水分量が第一葉水分下限値Whth1以下となっている場合、「YES」と判定されてステップS7に進む。一方で葉水分量が第一葉水分下限値Whth1を超過している場合には、「NO」と判定されてステップS61に進む。なお本実施形態のステップS6では、すべての栽培容器203における植物PLの葉水分量が第一葉水分下限値Whth1を超過している場合に、「NO」と判定されるようになっている。 Next, step S6 is executed. In step S6, it is determined whether the leaf water content is less than or equal to the first leaf water lower limit W hth1 . If the leaf water content is less than or equal to the first leaf water lower limit W hth1 , the determination is "YES" and the process proceeds to step S7. On the other hand, if the leaf moisture content exceeds the first leaf moisture lower limit W hth1 , the determination is "NO" and the process proceeds to step S61. In addition, in step S6 of this embodiment, when the leaf moisture content of the plants PL in all the cultivation containers 203 exceeds the first leaf moisture lower limit value W hth1 , the determination is "NO". .

ステップS61では、ステップS6で「NO」と判定された場合において、地中潅水装置4の動作を停止させて地中潅水を終了させる。その後、ステップS62に進み、培地水分下限値Wmthを減少させて平常値(例えば体積含水率(VWC)が48)に復帰させる。 In step S61, when the determination in step S6 is "NO", the operation of the underground irrigation device 4 is stopped to end the underground irrigation. Thereafter, the process proceeds to step S62, where the medium moisture lower limit value W mth is decreased to return to a normal value (for example, volumetric water content (VWC) is 48).

ステップS7では、葉水分量の減少速度が、第一上限葉水分減少速度Vdth1以上となっているか否かを判定する。葉水分量の減少速度が、第一上限葉水分減少速度Vdth1以上となっている場合、「YES」と判定されてステップS8に進む。一方で葉水分量の減少速度が、第一上限葉水分減少速度Vdth1未満となっている場合、「NO」と判定されてステップS6に戻る。 In step S7, it is determined whether the rate of decrease in leaf water content is equal to or higher than the first upper limit rate of decrease in leaf moisture Vdth1 . If the rate of decrease in leaf water content is equal to or higher than the first upper limit rate of decrease in leaf moisture V dth1 , the determination is "YES" and the process proceeds to step S8. On the other hand, if the rate of decrease in leaf water content is less than the first upper limit rate of decrease in leaf moisture Vdth1 , the determination is "NO" and the process returns to step S6.

ステップS8では、葉水分量が、開始側第二葉水分下限値Whth2s以下となっているか否かを判定する。葉水分量が、開始側第二葉水分下限値Whth2s以下となっている場合、「YES」と判定されてステップS9に進む。一方で葉水分量が、開始側第二葉水分下限値Whth2sを超過している場合、「NO」と判定されてステップS6に戻る。ここで開始側第二葉水分下限値Whth2sは、第一葉水分下限値Whth1と同値であってもよいし、第一葉水分下限値Whth1よりも小さな値としてもよい。 In step S8, it is determined whether the leaf water content is less than or equal to the starting second leaf water lower limit W hth2s . If the leaf water content is less than or equal to the starting second leaf water lower limit value W hth2s , the determination is "YES" and the process proceeds to step S9. On the other hand, if the leaf moisture content exceeds the starting second leaf moisture lower limit value W hth2s , the determination is "NO" and the process returns to step S6. Here, the second leaf moisture lower limit value W hth2s on the starting side may be the same value as the first leaf moisture lower limit value W hth1 , or may be a value smaller than the first leaf moisture lower limit value W hth1 .

ステップS9では、ステップS8で「YES」と判定された場合において、地表潅水装置5を動作させて地表潅水を開始させる。 In step S9, if the determination in step S8 is "YES", the ground irrigation device 5 is operated to start ground irrigation.

その後ステップS10を実行する。ステップS10では、葉水分量が、終了側第二葉水分下限値Whth2e以下となっているか否かを判定する。葉水分量が、終了側第二葉水分下限値Whth2e以下となっている場合、「YES」と判定されてステップS11に進む。一方で葉水分量が、終了側第二葉水分下限値Whth2eを超過している場合、「NO」と判定されてステップS101に進む。ここで終了側第二葉水分下限値Whth2eは、開始側第二葉水分下限値Whth2sと同値であってもよいし、チャタリング回避のため開始側第二葉水分下限値Whth2sよりも大きな値としてもよい。 After that, step S10 is executed. In step S10, it is determined whether the leaf moisture content is equal to or less than the end-side second leaf moisture lower limit W hth2e . If the leaf water content is less than or equal to the end-side second leaf water lower limit value W hth2e , the determination is "YES" and the process proceeds to step S11. On the other hand, if the leaf moisture content exceeds the end-side second leaf moisture lower limit W hth2e , the determination is "NO" and the process proceeds to step S101. Here, the end-side second leaf moisture lower limit value W hth2e may be the same value as the start-side second leaf moisture lower limit value W hth2s , or may be larger than the start-side second leaf moisture lower limit value W hth2s to avoid chattering. May be used as a value.

ステップS101では、ステップS10で「NO」と判定された場合において、地表潅水装置5の動作を停止させて地表潅水を終了させ、その後ステップS6に戻る。 In step S101, if the determination in step S10 is "NO", the operation of the ground irrigation device 5 is stopped to end the ground irrigation, and then the process returns to step S6.

ステップS11では、葉水分量の減少速度が、第二上限葉水分減少速度Vdth2以上となっているか否かを判定する。葉水分量の減少速度が、第二上限葉水分減少速度Vdth2以上となっている場合、「YES」と判定されて、ステップS12に進む。一方で葉水分量の減少速度が、第二上限葉水分減少速度Vdth2未満となっている場合には、「NO」と判定されてステップS10に戻る。 In step S11, it is determined whether the rate of decrease in leaf water content is equal to or higher than the second upper limit rate of decrease in leaf moisture Vdth2 . If the rate of decrease in leaf water content is equal to or higher than the second upper limit rate of decrease in leaf moisture V dth2 , the determination is "YES" and the process proceeds to step S12. On the other hand, if the rate of decrease in leaf water content is less than the second upper limit rate of decrease in leaf moisture Vdth2 , the determination is "NO" and the process returns to step S10.

ステップS12では、ステップS11で「YES」と判定された場合において、葉水分量が、開始側第三葉水分下限値Whth3s以下となっているか否かを判定する。葉水分量が、開始側第三葉水分下限値Whth3s以下となっている場合、「YES」と判定されてステップS13に進む。一方で葉水分量が、開始側第三葉水分下限値Whth3sを超過している場合、「NO」と判定されてステップS10に戻る。ここで開始側第三葉水分下限値Whth3sは、開始側第二葉水分下限値Whth2sと同値であってもよいし、開始側第二葉水分下限値Whth2sよりも小さな値としてもよい。 In step S12, when it is determined as "YES" in step S11, it is determined whether or not the leaf water content is equal to or lower than the starting third leaf moisture lower limit W hth3s . If the leaf water content is less than or equal to the starting third leaf water lower limit W hth3s , the determination is "YES" and the process proceeds to step S13. On the other hand, if the leaf moisture content exceeds the starting third leaf moisture lower limit W hth3s , the determination is "NO" and the process returns to step S10. Here, the starting side third leaf moisture lower limit value W hth3s may be the same value as the starting side second leaf moisture lower limit value W hth2s , or may be a value smaller than the starting side second leaf moisture lower limit value W hth2s . .

ステップS13では、ステップS12で「YES」と判定された場合において、ミスト供給装置6を動作させてミスト供給(噴霧)を開始させる。 In step S13, when the determination is "YES" in step S12, the mist supply device 6 is operated to start mist supply (spraying).

その後、ステップS14を実行する。ステップS14では、葉水分量が、終了側第三葉水分下限値Whth3e以下となっているか否かを判定する。葉水分量が、終了側第三葉水分下限値Whth3e以下となっている場合、「YES」と判定されてステップS14を繰り返す。一方で葉水分量が、終了側第三葉水分下限値Whth3eを超過している場合、「NO」と判定されてステップS15に進む。ここで終了側第三葉水分下限値Whth3eは、開始側第三葉水分下限値Whth3sと同値であってもよいし、チャタリング回避のため開始側第三葉水分下限値Whth3sよりも大きな値としてもよい。 After that, step S14 is executed. In step S14, it is determined whether the leaf water content is equal to or less than the end-side third leaf water lower limit W hth3e . If the leaf water content is equal to or less than the end-side third leaf water lower limit W hth3e , the determination is "YES" and step S14 is repeated. On the other hand, if the leaf moisture content exceeds the end-side third leaf moisture lower limit value W hth3e , the determination is "NO" and the process proceeds to step S15. Here, the end side third leaf moisture lower limit value W hth3e may be the same value as the start side third leaf moisture lower limit value W hth3s , or may be larger than the start side third leaf moisture lower limit value W hth3s to avoid chattering. May be used as a value.

ステップS15では、ステップS14で「NO」と判定された場合において、ミスト供給装置6の動作を停止させてミスト供給(噴霧)を終了させ、その後ステップS10に戻る。 In step S15, when the determination is "NO" in step S14, the operation of the mist supply device 6 is stopped to end the mist supply (spraying), and then the process returns to step S10.

(作用効果)
以上説明した本実施形態の給水制御システム100によれば、葉温が葉温上限値Tth以上となって葉Lからの蒸散が多い状態において、葉温の上昇速度が上限葉温上昇速度Vuth以上となった際には、葉Lからの蒸散量および蒸散スピードに対して葉Lへの水分供給が遅れて葉水分量が不足していると考えられ、緊急時となる。この際、本実施形態では地中潅水装置4を動作させることができるので、緊急時において培地水分量を増加させ、葉Lへ十分に水分供給を行うことができる。よって葉Lからの蒸散を円滑化して葉温を一定に保つようにでき、植物にとって最適な栽培環境を効率よく整えることが可能となる。
(effect)
According to the water supply control system 100 of the present embodiment described above, in a state where the leaf temperature is equal to or higher than the leaf temperature upper limit value T th and transpiration from the leaves L is large, the leaf temperature increase rate is the upper limit leaf temperature increase rate V When the amount exceeds uth , it is considered that the water supply to the leaves L is delayed with respect to the amount of transpiration and the transpiration speed from the leaves L, and the amount of water in the leaves is insufficient, resulting in an emergency situation. At this time, in the present embodiment, the underground irrigation device 4 can be operated, so that the moisture content of the medium can be increased in an emergency, and the leaves L can be sufficiently supplied with moisture. Therefore, transpiration from the leaves L can be facilitated to keep the leaf temperature constant, and it is possible to efficiently create an optimal cultivation environment for the plants.

また本実施形態では、地中潅水装置4を動作させる前に、培地水分量の下限値となる培地水分下限値Wmthを増加させることで、平常時に比べて緊急時には植物PLへの水分ストレスを緩和できる。したがって培地水分量を平常時に比べて多い状態に保つことができ、葉Lへの水分供給を十分に行い、葉Lからの蒸散を促すことができる。 In addition, in this embodiment, before operating the underground irrigation device 4, by increasing the lower limit value W mth of culture medium moisture, which is the lower limit value of the culture medium moisture content, water stress on the plants PL is reduced in emergency compared to normal times. It can be alleviated. Therefore, the moisture content of the medium can be maintained at a higher level than normal, and moisture can be sufficiently supplied to the leaves L to promote transpiration from the leaves L.

また地中潅水装置4を動作させた後に、依然として葉水分量が開始側第二葉水分下限値Whth2s以下の低い状態にあり、葉水分量が第一上限葉水分減少速度Vdth1以上の大きな減少速度で減少している場合には、地中潅水だけでは葉Lへの水分供給が間に合っていない、すなわち、培地水分量の回復と葉水分量の回復にタイムラグが生じていることになる。この場合、地表潅水装置5を動作させて培地204の表面204aに潅水を行うことで根Rからの水分吸収を促して葉水分量を早期に増加させることができ、上記タイムラグを小さくでき、葉Lからの蒸散をさらに円滑化できる。本実施実施形態では、特に毛細根が多く存在する領域となる株元へ地表潅水することで、根からの水分吸収の速度をさらに速めることができる。 In addition, after operating the underground irrigation system 4, the leaf water content is still in a low state below the starting side second leaf water lower limit value W hth2s , and the leaf water content is in a large state where the leaf water content is higher than the first upper limit leaf water water reduction rate V dth1 . If it is decreasing at a decreasing rate, underground irrigation alone is not enough to supply moisture to the leaves L, that is, there is a time lag between the recovery of the medium moisture content and the recovery of the leaf moisture content. In this case, by operating the surface watering device 5 to irrigate the surface 204a of the culture medium 204, water absorption from the roots R can be promoted to increase the leaf water content at an early stage, and the above-mentioned time lag can be reduced. The transpiration from L can be further smoothed. In this embodiment, the speed of water absorption from the roots can be further increased by watering the ground surface to the base of the plant, which is a region where a large number of capillary roots are present.

さらには、地表潅水装置5が点滴のようにして潅水を行うことで、地中潅水装置よりも単位時間当たりの給水量が小さくなっている。よって培地水分量が過多となることを回避しつつ、培地水分量の回復と葉水分量の回復とのタイムラグを小さくすることができる。 Furthermore, since the surface irrigation device 5 performs irrigation in a drip-like manner, the amount of water supplied per unit time is smaller than that of the underground irrigation device. Therefore, the time lag between the recovery of the medium moisture content and the recovery of the leaf moisture content can be reduced while avoiding the medium moisture content from becoming excessive.

また本実施形態では地表潅水装置5を動作させた後、依然として葉水分量が開始側第三葉水分下限値Whth3s以下の低い状態にあり、葉水分量が第二上限葉水分減少速度Vdth2以上の大きな減少速度で減少している場合には、地中潅水および地表潅水だけでは葉Lへの水分供給が間に合っていないことになる。この場合、ミスト供給装置6を動作させて葉Lにミスト噴霧を行うことで葉Lからの水分吸収を促し、葉Lからの蒸散をさらに円滑化できる。また葉Lに向けてダイレクトにミスト噴霧を行うことで、葉温を低下させることもできる。 Further, in this embodiment, after operating the ground irrigation device 5, the leaf water content is still in a low state below the starting side third leaf water lower limit W hth3s , and the leaf water content is lower than the second upper limit leaf water reduction rate V dth2. If the amount is decreasing at such a large rate, it means that the water supply to the leaves L is not enough with underground irrigation and surface irrigation alone. In this case, by operating the mist supply device 6 to spray mist onto the leaves L, water absorption from the leaves L can be promoted and transpiration from the leaves L can be further facilitated. Moreover, by spraying mist directly toward the leaves L, the leaf temperature can also be lowered.

以上、本発明の実施形態について図面を参照して詳述したが、上記実施形態おける各構成及びそれらの組み合わせ等は一例であり、本発明の趣旨から逸脱しない範囲内で、構成の付加、省略、置換、およびその他の変更が可能である。また、本発明は実施形態によって限定されることはなく、特許請求の範囲によってのみ限定される。 The embodiments of the present invention have been described above in detail with reference to the drawings, but each configuration and combination thereof in the above embodiments are merely examples, and additions and omissions of configurations may be made without departing from the spirit of the present invention. , substitutions, and other changes are possible. Furthermore, the present invention is not limited by the embodiments, but only by the claims.

例えば、地中潅水装置4を動作させた後に、地表潅水装置5ではなくミスト供給装置6を動作させてもよく、地中潅水装置4→ミスト供給装置6→地表潅水装置5の順で動作させてもよい。さらには、地中潅水装置4を動作させた後に、ミスト供給装置6および地表潅水装置5を同時に動作させてもよい。 For example, after operating the underground irrigation device 4, the mist supply device 6 may be operated instead of the surface irrigation device 5, and the order of operation is the underground irrigation device 4 → the mist supply device 6 → the surface irrigation device 5. You can. Furthermore, after operating the underground irrigation device 4, the mist supply device 6 and the surface irrigation device 5 may be operated simultaneously.

また培地204の温度を一定に保つように温調装置を設けてもよい。
さらには、葉温が葉温上限値Tth以上となった際には、遮光カーテンによって植物PLへの入射光を遮るようにしてもよい。
Further, a temperature control device may be provided to keep the temperature of the culture medium 204 constant.
Furthermore, when the leaf temperature becomes equal to or higher than the leaf temperature upper limit value T th , a light shielding curtain may be used to block the light incident on the plant PL.

また給水制御プログラムを実行する際の判定基準となる上述した各所定値を、植物PLの種類に応じて適宜、制御装置7において事前設定(事前選択)可能としてもよい。 Further, each of the above-mentioned predetermined values, which serve as a criterion when executing the water supply control program, may be set in advance (pre-selected) in the control device 7 as appropriate depending on the type of plant PL.

また上述の実施形態の地中潅水装置4は、培地204の底面204bから培地204内に潅水を行うようにしているが、特に底面204bからの潅水に限定されず、少なくとも培地204の表面204a以外の位置から培地204内に潅水するような装置であればよい。 In addition, although the underground irrigation device 4 of the above-described embodiment performs irrigation into the culture medium 204 from the bottom surface 204b of the culture medium 204, it is not particularly limited to irrigation from the bottom surface 204b, and at least other than the surface 204a of the culture medium 204. Any device that can irrigate the culture medium 204 from the position shown in FIG.

また、地中潅水装置4は複数の栽培容器203毎に個別に設けてもよい。すなわち例えば、各々の栽培容器203の近傍に給水口4aを設けてもよい。この場合、上記制御フローのステップS4においても、栽培容器203毎に並行して培地水分量の判定が可能となる。 Further, the underground irrigation device 4 may be provided individually for each of the plurality of cultivation containers 203. That is, for example, a water supply port 4a may be provided near each cultivation container 203. In this case, also in step S4 of the control flow described above, it is possible to determine the moisture content of the culture medium in parallel for each cultivation container 203.

本発明の給水制御システム等によれば、葉からの蒸散を円滑化し、植物にとって最適な栽培環境を効率よく整えることが可能となる。 According to the water supply control system and the like of the present invention, it is possible to smooth transpiration from leaves and efficiently create an optimal cultivation environment for plants.

1…葉温センサ
2…葉水分センサ
3…培地水分センサ
4…地中潅水装置
5…地表潅水装置
6…ミスト供給装置
7…制御装置
70…計算機
71…葉温判定部
72…葉温上昇速度判定部
73…培地水分量下限調整部
74…調整後培地水分量判定部
75…地中潅水開始指令部
76…第一葉水分量判定部
77…地中潅水終了指令部
78…第一葉水分量減少速度判定部
79…開始側第二葉水分量判定部
80…地表潅水開始指令部
81…終了側第二葉水分量判定部
82…地表潅水終了指令部
83…第二葉水分量減少速度判定部
84…開始側第三葉水分量判定部
85…ミスト供給開始指令部
86…終了側第三葉水分量判定部
87…ミスト供給終了指令部
100…給水制御システム
204…固形培地
L…葉
PL…植物
R…根
th…葉温上限値
dth1…第一上限葉水分減少速度
dth2…第二上限葉水分減少速度
uth…上限葉温上昇速度
hth1…第一葉水分下限値
hth2s…開始側第二葉水分下限値
hth2e…終了側第二葉水分下限値
hth3s…開始側第三葉水分下限値
hth3e…終了側第三葉水分下限値
mth…培地水分下限値
1...Leaf temperature sensor 2...Leaf moisture sensor 3...Medium moisture sensor 4...Underground irrigation device 5...Surface irrigation device 6...Mist supply device 7...Control device 70...Computer 71...Leaf temperature determination section 72...Leaf temperature rise rate Determination unit 73...Medium moisture content lower limit adjustment unit 74...Adjusted medium moisture content determination unit 75...Underground irrigation start command unit 76...First leaf moisture content determination unit 77...Underground irrigation end command unit 78...First leaf moisture Volume reduction speed determining unit 79...Starting side second leaf water content determining unit 80...Ground surface irrigation start command unit 81...Ending side second leaf water content determining unit 82...Ground irrigation end command unit 83...Second leaf water content decreasing speed Determination unit 84...Starting side third leaf moisture content determination unit 85...Mist supply start commanding unit 86...Ending side third leaf moisture content determination unit 87...Mist supply end commanding unit 100...Water supply control system 204...Solid medium L...Leaf PL...Plant R...Root T th ...Upper limit of leaf temperature V dth1 ...First upper limit rate of decrease in leaf moisture V dth2 ...Second upper limit rate of decrease in leaf moisture V uth ...Upper limit rate of increase in leaf temperature W hth1 ...Lowest limit of leaf moisture W hth2s ... Lower limit of second leaf moisture on the starting side W hth2e ... Lower limit of second leaf moisture on the ending side W hth3s ... Lower limit of third leaf moisture on the starting side W hth3e ... Lower limit of third leaf moisture on the ending side W mth ... Lower limit of medium moisture value

Claims (9)

植物への給水を制御する給水制御システムであって、
前記植物の葉温を計測する葉温センサと、
前記植物の葉の水分量を計測する葉水分センサと、
前記植物を支持する固形培地内に潅水する地中潅水装置と、
前記葉温センサおよび前記葉水分センサの計測値に基づいて、前記地中潅水装置の動作を制御する制御装置と、
を備え、
前記制御装置は、
前記葉温センサの計測値が所定の葉温上限値以上であり、かつ、該葉温センサの計測値の上昇速度が所定の上限葉温上昇速度以上となった際、前記地中潅水装置を動作させて前記固形培地内への潅水を開始させる地中潅水開始指令部と、
前記地中潅水装置を動作させた後に、前記葉水分センサの計測値が所定の第一葉水分下限値を超過した際、前記地中潅水装置の動作を停止させて前記固形培地内への潅水を終了させる地中潅水終了指令部と、
を有する給水制御システム。
A water supply control system that controls water supply to plants,
a leaf temperature sensor that measures the leaf temperature of the plant;
a leaf moisture sensor that measures the moisture content of leaves of the plant;
an underground irrigation device for irrigating into a solid medium that supports the plants;
a control device that controls the operation of the underground irrigation system based on the measured values of the leaf temperature sensor and the leaf moisture sensor;
Equipped with
The control device includes:
When the measured value of the leaf temperature sensor is equal to or higher than a predetermined leaf temperature upper limit value, and the rate of increase in the measured value of the leaf temperature sensor is equal to or higher than the predetermined upper limit leaf temperature increase rate, the underground irrigation device is operated. an underground irrigation start command unit that operates to start irrigation into the solid medium;
After operating the underground irrigation device, when the measured value of the leaf moisture sensor exceeds a predetermined first lower limit of leaf moisture, the operation of the underground irrigation device is stopped and water is irrigated into the solid medium. an underground irrigation termination command unit that terminates the
Water supply control system with.
前記固形培地の表面に潅水する地表潅水装置をさらに備え、
前記制御装置は、
前記地中潅水装置を動作させた後に、前記葉水分センサの計測値が所定の開始側第二葉水分下限値以下であり、かつ、前記葉水分センサの計測値の減少速度が所定の第一上限葉水分減少速度以上となった際、前記地表潅水装置を動作させて前記固形培地の表面への潅水を開始させる地表潅水開始指令部と、
前記地表潅水装置を動作させた後に、前記葉水分センサの計測値が所定の終了側第二葉水分下限値を超過した際、前記地表潅水装置の動作を停止させて前記固形培地の表面への潅水を終了させる地表潅水終了指令部と、
をさらに有する請求項1に記載の給水制御システム。
Further comprising a surface irrigation device for irrigation on the surface of the solid medium,
The control device includes:
After operating the underground irrigation system, the measured value of the leaf moisture sensor is equal to or lower than the predetermined second leaf moisture lower limit on the starting side, and the rate of decrease of the measured value of the leaf moisture sensor is equal to or lower than the predetermined first lower limit value. a surface irrigation start command unit that operates the surface irrigation device to start irrigation to the surface of the solid medium when the upper limit leaf moisture reduction rate is exceeded;
After operating the ground irrigation device, when the measured value of the leaf moisture sensor exceeds a predetermined end-side second leaf moisture lower limit, the operation of the ground irrigation device is stopped and water is applied to the surface of the solid medium. a surface irrigation termination command unit that terminates irrigation;
The water supply control system according to claim 1, further comprising:
前記地表潅水装置は、前記植物の近傍となる株元へ潅水を行う請求項2に記載の給水制御システム。 3. The water supply control system according to claim 2, wherein the ground irrigation device irrigations a plant base near the plant. 前記地表潅水装置は、前記地中潅水装置よりも、単位時間当たりの給水量が小さくなっている請求項2または3に記載の給水制御システム。 The water supply control system according to claim 2 or 3, wherein the surface irrigation device has a smaller water supply amount per unit time than the underground irrigation device. 前記植物の葉へミスト状の水分を供給するミスト供給装置をさらに備え、
前記制御装置は、
前記地表潅水装置を動作させた後に、前記葉水分センサの計測値が所定の開始側第三葉水分下限値以下であり、かつ、前記葉水分センサの計測値の減少速度が前記第一上限葉水分減少速度よりも大きな第二上限葉水分減少速度以上となった際、前記ミスト供給装置を動作させて前記葉へのミスト供給を開始させるミスト供給開始指令部と、
前記ミスト供給装置を動作させた後に、前記葉水分センサの計測値が所定の終了側第三葉水分下限値を超過した際、前記ミスト供給装置の動作を停止させて前記葉へのミスト供給を終了させるミスト供給終了指令部と、
をさらに有する請求項2に記載の給水制御システム。
further comprising a mist supply device that supplies mist-like moisture to the leaves of the plant,
The control device includes:
After operating the ground irrigation device, the measured value of the leaf moisture sensor is equal to or lower than the predetermined starting third leaf moisture lower limit, and the rate of decrease of the measured value of the leaf moisture sensor is equal to or lower than the first upper limit leaf moisture. a mist supply start command unit that operates the mist supply device to start supplying mist to the leaves when the moisture decrease rate reaches a second upper limit, which is higher than the moisture decrease rate;
After operating the mist supply device, when the measured value of the leaf moisture sensor exceeds a predetermined end-side third leaf moisture lower limit value, the operation of the mist supply device is stopped and the mist supply to the leaves is stopped. a mist supply termination command unit to terminate the mist supply;
The water supply control system according to claim 2, further comprising:
前記植物の葉へミスト状の水分を供給するミスト供給装置をさらに備え、
前記制御装置は、
前記地中潅水装置を動作させた後に、前記葉水分センサの計測値が所定の開始側第三葉水分下限値以下であり、かつ、前記葉水分センサの計測値の減少速度が上限葉水分減少速度以上となった際、前記ミスト供給装置を動作させて前記葉へのミスト供給を開始させるミスト供給開始指令部と、
前記ミスト供給装置を動作させた後に、前記葉水分センサの計測値が所定の終了側第三葉水分下限値を超過した際、前記ミスト供給装置の動作を停止させて前記葉へのミスト供給を終了させるミスト供給終了指令部と、
をさらに有する請求項1に記載の給水制御システム。
further comprising a mist supply device that supplies mist-like moisture to the leaves of the plant,
The control device includes:
After operating the underground irrigation device, the measured value of the leaf moisture sensor is equal to or lower than the predetermined starting third leaf moisture lower limit, and the rate of decrease of the measured value of the leaf moisture sensor is the upper limit leaf moisture reduction. a mist supply start command unit that operates the mist supply device to start supplying mist to the leaves when the speed exceeds the speed;
After operating the mist supply device, when the measured value of the leaf moisture sensor exceeds a predetermined end-side third leaf moisture lower limit value, the operation of the mist supply device is stopped and the mist supply to the leaves is stopped. a mist supply termination command unit to terminate the mist supply;
The water supply control system according to claim 1, further comprising:
前記固形培地の水分量を計測する培地水分センサをさらに備え、
前記制御装置は、前記葉温センサの計測値が所定の葉温下限値以上であり、かつ、該葉温センサの計測値の上昇速度が所定の基準葉温増加速度以上となった際、前記地中潅水装置を動作させる前に、前記固形培地の水分量の下限値となる所定の培地水分下限値を増加させる培地水分変更部をさらに有し、
前記地中潅水開始指令部は、前記培地水分センサの計測値が、増加後の前記培地水分下限値以下となっている際に、前記地中潅水装置を動作させて前記固形培地内への潅水を開始させる請求項1、2、5、および6のいずれか一項に記載の給水制御システム。
Further comprising a medium moisture sensor that measures the moisture content of the solid medium,
When the measured value of the leaf temperature sensor is equal to or higher than a predetermined leaf temperature lower limit value, and the rate of increase in the measured value of the leaf temperature sensor is equal to or higher than a predetermined reference leaf temperature increase rate, the control device The method further includes a medium moisture changing unit that increases a predetermined medium moisture lower limit value, which is a lower limit value of the moisture content of the solid medium, before operating the underground irrigation system;
The underground irrigation start command unit operates the underground irrigation device to irrigate the solid culture medium when the measured value of the culture medium moisture sensor is equal to or less than the increased medium moisture lower limit value. The water supply control system according to any one of claims 1, 2, 5, and 6, wherein the water supply control system starts the water supply control system.
植物への給水を制御する給水制御方法であって、
前記植物の葉温を計測する葉温センサの計測値が所定の葉温上限値以上であり、かつ、該葉温センサの計測値の上昇速度が所定の上限葉温上昇速度以上となった際、前記植物を支持する固形培地内への潅水を開始する地中潅水開始ステップと、
前記固形培地内への潅水の開始後に、前記植物の葉の水分量を計測する葉水分センサの計測値が所定の葉水分下限値を超過した際、前記固形培地内への潅水を終了する地中潅水終了ステップと、
を含む給水制御方法。
A water supply control method for controlling water supply to plants, the method comprising:
When the measured value of the leaf temperature sensor that measures the leaf temperature of the plant is equal to or higher than a predetermined leaf temperature upper limit, and the rate of increase in the measured value of the leaf temperature sensor is equal to or higher than the predetermined upper limit leaf temperature increase rate. , a subsurface irrigation initiation step of initiating irrigation into a solid medium supporting the plants;
After the start of watering into the solid medium, when the measured value of a leaf moisture sensor that measures the amount of water in the leaves of the plant exceeds a predetermined lower limit of leaf moisture, the watering into the solid medium is stopped. medium irrigation end step;
water supply control methods including;
植物への給水を制御するために、計算機を
前記植物の葉温を計測する葉温センサの計測値が所定の葉温上限値以上であり、かつ、該葉温センサの計測値の上昇速度が所定の上限葉温上昇速度以上となった際、前記植物を支持する固形培地内への潅水を開始させる地中潅水開始手段、および
前記固形培地内への潅水の開始後に、前記植物の葉の水分量を計測する葉水分センサの計測値が所定の葉水分下限値を超過した際、前記固形培地内への潅水を終了させる地中潅水終了手段、
として機能させるための給水制御プログラム。
In order to control water supply to plants, a computer is used to determine whether the measured value of a leaf temperature sensor that measures the leaf temperature of the plant is equal to or higher than a predetermined leaf temperature upper limit, and the rate of increase in the measured value of the leaf temperature sensor is underground irrigation starting means for starting watering into a solid medium that supports the plant when the rate of increase in leaf temperature reaches a predetermined upper limit; underground irrigation termination means for terminating irrigation into the solid medium when a measured value of a leaf moisture sensor that measures moisture content exceeds a predetermined lower limit of leaf moisture;
A water supply control program to function as a water supply control program.
JP2023114592A 2023-07-12 2023-07-12 Water supply control system, water supply control method, and water supply control program Active JP7395165B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023114592A JP7395165B1 (en) 2023-07-12 2023-07-12 Water supply control system, water supply control method, and water supply control program

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2023114592A JP7395165B1 (en) 2023-07-12 2023-07-12 Water supply control system, water supply control method, and water supply control program

Publications (1)

Publication Number Publication Date
JP7395165B1 true JP7395165B1 (en) 2023-12-11

Family

ID=89117084

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023114592A Active JP7395165B1 (en) 2023-07-12 2023-07-12 Water supply control system, water supply control method, and water supply control program

Country Status (1)

Country Link
JP (1) JP7395165B1 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104542197A (en) 2015-01-06 2015-04-29 中国农业大学 Wireless intelligent control system and method for alternative irrigating
JP2019017350A (en) 2017-07-20 2019-02-07 国立大学法人京都大学 Plant raising system, plant raising method, and program for plant raising system
CN110999767A (en) 2019-12-09 2020-04-14 海南云脉物联科技有限公司 Intelligent irrigation control management system
WO2022040756A1 (en) 2020-08-28 2022-03-03 Rubicon Research Pty Ltd Refill point or target deficit for crop irrigation

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104542197A (en) 2015-01-06 2015-04-29 中国农业大学 Wireless intelligent control system and method for alternative irrigating
JP2019017350A (en) 2017-07-20 2019-02-07 国立大学法人京都大学 Plant raising system, plant raising method, and program for plant raising system
CN110999767A (en) 2019-12-09 2020-04-14 海南云脉物联科技有限公司 Intelligent irrigation control management system
WO2022040756A1 (en) 2020-08-28 2022-03-03 Rubicon Research Pty Ltd Refill point or target deficit for crop irrigation

Similar Documents

Publication Publication Date Title
US10716266B2 (en) Agricultural house
US10349588B2 (en) Hydroponic apparatus
CA2983903C (en) Hydroponic cultivation apparatus
JP6306384B2 (en) Method for controlling irrigation supply in plant cultivation and controller thereof
JP4982823B2 (en) Water management method in fruit cultivation
US20160183488A1 (en) Hydroponic cultivation apparatus and hydroponic cultivation method
JPH09294462A (en) Apparatus for raising cutting seedling
WO2014122703A1 (en) Hydroponics apparatus and hydroponics method
JP2007252234A (en) Method for cultivating plant and system for controlling automatic plant cultivation
US20210360886A1 (en) Controlling Plant Growth Conditions
Rifky et al. Development and evaluation of an automated irrigation system for ordinary agriculture farm
RO130957A2 (en) Automated plant for drip- and/or microspray-irrigation and fertigation
JP7395165B1 (en) Water supply control system, water supply control method, and water supply control program
CA3122061A1 (en) Vertical hydroponically plant-growing tower system
Grigas et al. Hydroponic devices for green fodder production: a review
JP2017221150A (en) Plant cultivation device and irrigation control method
EP3106025B1 (en) Method of indoor mushroom cultivation
KR102086211B1 (en) Improved open-field experimental warming and timer using precipitatin manipulation system
Blom-Zandstra et al. Infrared thermometry for early detection of drought stress in Chrysanthemum
JP7315217B2 (en) Cultivation support system, controller and control method
Heisey et al. Automation of an intermittent overhead irrigation frost protection system for an apple orchard
JP5999595B2 (en) Irrigation control device and irrigation control method
JP5334188B2 (en) Cultivated plant local water droplet discharge device and cultivated plant local water droplet discharge method
CN209030730U (en) A kind of intelligence planting greenhouse
KR20210129905A (en) Nutrient solution providing system for water culture and method for controlling a water level of the nutrient solution

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20230713

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20230713

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20230919

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20230921

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20231114

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20231120

R150 Certificate of patent or registration of utility model

Ref document number: 7395165

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150