JP7346959B2 - Exhaust gas treatment equipment and exhaust gas treatment system - Google Patents

Description

The present invention relates to an exhaust gas treatment device and an exhaust gas treatment system.

Conventionally, an exhaust gas treatment system using exhaust heat of a diesel engine is known (for example, see Patent Document 1).
Patent Document 1 Japanese Patent Application Publication No. 2012-159074

In the exhaust gas treatment system, it is preferable to utilize exhaust heat while desulfurizing the exhaust gas.

In a first aspect of the present invention, an exhaust gas treatment device is provided. The exhaust gas treatment device includes a reaction tower into which exhaust gas is introduced and a liquid for treating the exhaust gas is supplied, and a recovery unit that processes the exhaust gas and provides the liquid that has absorbed the heat of the exhaust gas to one or more heat utilization devices. and.

The reaction column may have a gas inlet opening for introducing exhaust gas. The recovery section may include a low temperature recovery section and a high temperature recovery section. The temperature of the liquid provided by the high temperature recovery section may be higher than the temperature of the liquid provided by the low temperature recovery section. The high temperature recovery section may be placed closer to the gas introduction opening than the low temperature recovery section.

The exhaust gas treatment device may further include a plurality of ejection parts that are provided inside the reaction tower and eject liquid inside the reaction tower. In the direction from the exhaust gas introduction side to the exhaust side, the low-temperature recovery section is located on the exhaust gas introduction side from the center of the jetting part located closest to the exhaust gas introduction side and the jetting part located closest to the exhaust gas discharge side. may be placed in

The exhaust gas treatment device may further include a plurality of ejection parts that are provided inside the reaction tower and eject liquid inside the reaction tower. The low-temperature recovery section may be arranged between the gas introduction opening and the ejection section disposed closest to the introduction side in the direction from the introduction side to the discharge side of the exhaust gas.

The exhaust gas treatment device may further include a plurality of ejection parts that are provided inside the reaction tower and eject liquid inside the reaction tower. The low-temperature recovery section may be disposed closer to the discharge side than the ejection section that is closest to the introduction side in the direction from the introduction side to the discharge side of the exhaust gas.

The exhaust gas treatment device may further include a main pipe that is provided inside the reaction tower, is supplied with a liquid, extends from the exhaust gas introduction side to the exhaust side, and is connected to a plurality of ejection parts. The main pipe may include a first main pipe provided on the exhaust gas introduction side and a second main pipe provided on the exhaust gas discharge side of the first main pipe. In the direction perpendicular to the direction in which the main pipe extends, the cross-sectional area of the first main pipe may be larger than the cross-sectional area of the second main pipe. The area of the opening for spouting liquid in the spouting part connected to the first main pipe may be larger than the area of the opening for spouting liquid in the spouting part connected to the second trunk pipe.

The exhaust gas treatment device may further include a liquid mixing section. The cold recovery section may provide the liquid to one heat utilization device. The high temperature recovery section may provide the liquid to other heat utilization equipment. The liquid mixing section may mix the liquid provided to one heat utilization device and the liquid provided to another heat utilization device, and discharge the mixture to the outside of the exhaust gas treatment device.

The exhaust gas treatment device may further include a power unit that discharges exhaust gas, and a temperature control unit that controls the temperature of the liquid mixed in the liquid mixing unit. The temperature control section controls the temperature of one heat utilization device and the other heat utilization device based on at least one of the temperature of the exhaust gas, the flow rate of the exhaust gas, the temperature of the liquid discharged from the liquid mixing section, or the operating status of the power unit. At least one of the temperatures of the equipment used may be controlled.

The exhaust gas treatment device may further include a power unit that discharges exhaust gas, and a temperature control unit that controls the temperature of the liquid mixed in the liquid mixing unit. The temperature control unit controls the temperature of the liquid provided to the one heat utilization device based on at least one of the temperature of the exhaust gas, the flow rate of the exhaust gas, the temperature of the liquid discharged from the liquid mixing unit, or the operating status of the power unit. By adjusting the volume and the amount of liquid provided to other heat utilization equipment, the temperature of the mixed liquid may be controlled.

The exhaust gas treatment device may further include a power unit that discharges exhaust gas and a flow rate control unit that controls the flow rate of the liquid. The flow rate control unit may control the flow rate of the liquid based on at least one of the amount of sulfur contained in the fuel input to the power plant and the operating status of the power plant.

The reaction tower may be supplied with a chemical equivalent or more of liquid capable of neutralizing the sulfur component contained in the exhaust gas.

The exhaust gas treatment device may further include a spraying section that is provided outside the reaction tower and sprays a liquid for treating exhaust gas. The spraying section may spray the liquid into the exhaust gas introduced into the reaction tower.

The exhaust gas treatment device may further include a heat insulating material covering at least a portion of the side wall of the reaction tower. The thermal conductivity of the insulation may be lower than the thermal conductivity of the sidewalls. The heat insulating material may be provided closer to the inlet side than the center from the inlet end to the outlet end of the side wall in the direction from the inlet side to the outlet side of the exhaust gas in the reaction tower.

The exhaust gas treatment device may further include an economizer that heats fluid with exhaust gas, and a heat utilization device to which fluid heated by the economizer is provided.

In a second aspect of the invention, an exhaust gas treatment system is provided. The exhaust gas treatment system may include an exhaust gas treatment device and a heat utilization device.

Note that the above summary of the invention does not list all the necessary features of the invention. Furthermore, subcombinations of these features may also constitute inventions.

1 is a diagram showing an example of an exhaust gas treatment system 300 according to one embodiment of the present invention. FIG. 2 is a diagram showing an example of a top surface of the exhaust gas treatment device 100 shown in FIG. 1. FIG. It is a figure showing another example of exhaust gas treatment system 300 concerning one embodiment of the present invention. 4 is a diagram showing an example of a top surface of the exhaust gas treatment device 100 shown in FIG. 3. FIG. FIG. 3 is a diagram showing an example of an opening 110-1 in a spouting part 14-1A. 5 is a diagram showing an example of an opening 110-2 in a spouting portion 14-5A. FIG. FIG. 7 is a diagram showing an example of an opening 110-3 in a spouting part 14-9A. It is a figure showing another example of exhaust gas treatment system 300 concerning one embodiment of the present invention. It is a figure showing another example of exhaust gas treatment system 300 concerning one embodiment of the present invention. It is a figure showing another example of exhaust gas treatment system 300 concerning one embodiment of the present invention. It is a figure showing another example of exhaust gas treatment system 300 concerning one embodiment of the present invention. It is a figure showing another example of exhaust gas treatment system 300 concerning one embodiment of the present invention. It is a figure showing another example of exhaust gas treatment system 300 concerning one embodiment of the present invention.

Hereinafter, the present invention will be described through embodiments of the invention, but the following embodiments do not limit the invention according to the claims. Furthermore, not all combinations of features described in the embodiments are essential to the solution of the invention.

FIG. 1 is a diagram showing an example of an exhaust gas treatment system 300 according to one embodiment of the present invention. The exhaust gas treatment system 300 includes an exhaust gas treatment device 100 and a heat utilization device 200. The heat utilization equipment 200 may be placed outside the exhaust gas treatment device 100. The exhaust gas treatment device 100 provides the heat utilization equipment 200 with the heat discharged from the exhaust gas treatment device 100 .

The exhaust gas treatment device 100 includes a reaction tower 10 and a recovery section 20. The exhaust gas treatment device 100 may include an exhaust gas introduction pipe 32, a power device 50, and a pump 60. The power device 50 is, for example, an engine, a boiler, or the like. The exhaust gas introduction pipe 32 in this example connects the power plant 50 and the reaction tower 10. In this example, exhaust gas 30 discharged from the power plant 50 is introduced into the reaction tower 10 through the exhaust gas introduction pipe 32. The pump 60 of this example supplies the liquid 40 to the reaction tower 10. Liquid 40 treats exhaust gas 30. Processing the exhaust gas 30 refers to removing harmful substances (described later) contained in the exhaust gas 30.

When the exhaust gas treatment device 100 is a scrubber for ships, the scrubber may be of a cyclone type. Details of the cyclone scrubber will be described later. When the exhaust gas treatment device 100 is a scrubber for a ship, the power unit 50 is, for example, an engine, a boiler, etc. of the ship, the exhaust gas 30 is, for example, exhaust gas discharged from the power unit 50, and a liquid 40 for treating the exhaust gas 30 is used. is seawater, for example. The liquid 40 may be alkaline water to which at least one of sodium hydroxide (NaOH) and sodium hydrogen carbonate (Na ₂ CO ₃ ) is added.

The exhaust gas 30 contains harmful substances such as sulfur oxides (SO _x ). Sulfur oxide (SO _x ) is, for example, sulfur dioxide gas (SO ₂ ). In this example, the liquid 40 removes the harmful substances contained in the exhaust gas 30. Exhaust gas 30 discharged from power plant 50 has a predetermined amount of heat. The temperature of the exhaust gas 30 is, for example, 250°C or more and 400°C or less.

The liquid 40 absorbs heat from the exhaust gas 30 by treating the exhaust gas 30. In this example, the liquid 40 absorbs the heat of the exhaust gas 30 through heat exchange. The liquid after absorbing the heat of the exhaust gas 30 through heat exchange is referred to as a waste liquid 45. The temperature of the waste liquid 45 is, for example, 30° C. or more and 95° C. or less.

The recovery unit 20 provides the waste liquid 45 to the heat utilization equipment 200. The recovery unit 20 is, for example, a pipe that provides the waste liquid 45 to the heat utilization equipment 200. The recovery unit 20 may include a heat exchanger.

In the exhaust gas treatment device 100 of this example, the recovery unit 20 provides the heat utilization equipment 200 with the liquid 40 (that is, the waste liquid 45) that has absorbed the heat of the exhaust gas 30, so the heat utilization equipment 200 utilizes the heat of the exhaust gas 30. can. Furthermore, in the exhaust gas treatment device 100 of this example, since the liquid 40 absorbs the heat of the exhaust gas 30, there is no need to separately provide an exhaust gas heat exchanger for exhaust heat recovery in the exhaust gas treatment device 100.

When the exhaust gas treatment device 100 is separately provided with an exhaust gas heat exchanger for exhaust heat recovery, if the heat of the exhaust gas 30 is recovered up to the sulfuric acid dew point of the exhaust gas 30, the exhaust gas heat exchanger is likely to be corroded by the sulfuric acid. For this reason, when the exhaust gas treatment device 100 is separately provided with an exhaust gas heat exchanger for exhaust heat recovery, desulfurization of the exhaust gas 30 is difficult. In contrast, in the exhaust gas treatment apparatus 100 of this example, the liquid 40 absorbs the heat of the exhaust gas 30. Therefore, the exhaust gas treatment device 100 of this example can recover the heat of the exhaust gas 30 until the temperature of the exhaust gas 30 reaches a temperature close to the temperature of the liquid 40 (for example, the temperature of the liquid 40 +1 to 5° C.). When the liquid 40 is seawater, the exhaust gas treatment device 100 of this example can recover the heat of the exhaust gas 30 until the temperature of the exhaust gas 30 reaches the temperature of seawater (for example, 5 to 30° C.). That is, the exhaust gas treatment apparatus 100 of this example can recover the heat of the exhaust gas 30 while desulfurizing the exhaust gas 30.

In addition, when the exhaust gas treatment device 100 is separately provided with an exhaust gas heat exchanger for exhaust heat recovery, in order to recover the heat of the exhaust gas 30 to a level below the sulfuric acid dew point of the exhaust gas 30, it is necessary to reduce the heat of the exhaust gas 30 to a temperature above the sulfuric acid dew point. It is necessary to make the heat transfer area of the exhaust gas heat exchanger larger than in the case of recovery. For this reason, when the exhaust gas treatment device 100 is separately provided with an exhaust gas heat exchanger for exhaust heat recovery, the exhaust gas treatment device 100 tends to be larger and more expensive.

Further, in the exhaust gas treatment device 100 of this example, the liquid 40 desulfurizes the exhaust gas 30 and recovers the heat of the exhaust gas 30, so that the temperature of the exhaust gas 30 can be easily lowered to, for example, the temperature of seawater. Therefore, in the exhaust gas treatment device 100 of this example, the gas exhaust port 17 (described later) does not need to be made of a heat-resistant material. Therefore, the exhaust gas treatment device 100 of this example can easily reduce the cost of materials used for the gas exhaust port 17 (described later).

The reaction tower 10 of this example has a side wall 15, a bottom surface 16, a gas outlet 17, and a gas processing section 18. The reaction tower 10 in this example has a cylindrical shape. In this example, the side wall 15 and the bottom surface 16 are the side surface and bottom surface of the cylindrical reaction tower 10, respectively.

The gas processing section 18 of this example is a space surrounded by a side wall 15, a bottom surface 16, and a gas exhaust port 17. The exhaust gas 30 introduced into the reaction tower 10 is treated with a liquid 40 in the gas treatment section 18 . The inner wall of the gas processing section 18 is made of a material that is durable against the exhaust gas 30, the liquid 40 (seawater or alkaline liquid), and the waste liquid 45. The material may be an iron material such as SS400, a copper alloy such as Nevervar brass, an aluminum alloy such as aluminum brass, a nickel alloy such as cupronickel, or a stainless steel such as SUS316L.

The exhaust gas 30 treated with the liquid 40 is discharged from the gas discharge port 17. In this example, the liquid 40 (that is, the waste liquid 45) that has processed the exhaust gas 30 is discharged from the liquid discharge port 19. The drained liquid 45 may remain on the bottom surface 16. A liquid outlet 19 may be provided on the bottom surface 16. The liquid outlet 19 may be provided near the bottom surface 16 of the side wall 15.

The temperature of the liquid 40 provided to the heat utilization equipment 200 is, for example, 30° C. or higher and 95° C. or lower. The heat utilization equipment 200 is, for example, at least one of a fuel oil tank, an adsorption type water cooler/heater, an absorption type water cooler/heater, a heat pump, a binary generator, a desiccant air conditioner, and a Stirling engine. When the heat utilization equipment 200 is a fuel oil tank, the waste liquid 45 may heat the fuel (for example, C heavy oil) stored in the fuel oil tank. When the heat utilization device 200 is an adsorption type water cooler/heater or an absorption type water cooler/heater, the water cooler/heater may obtain cold energy using the waste liquid 45 as a heat source. When the heat utilization device 200 is a heat pump, the heat pump may absorb heat from the waste liquid 45. When the heat utilization equipment 200 is a desiccant air conditioner, the desiccant air conditioner may dry the air using the waste liquid 45 as a heat source. When the heat utilization device 200 is a Stirling engine, the Stirling engine may acquire motive energy from the heat of the exhaust gas 30 using the waste liquid 45 as a heat source.

In this specification, technical matters may be explained using orthogonal coordinate axes of the X-axis, Y-axis, and Z-axis. In this specification, a plane parallel to the bottom surface 16 of the reaction tower 10 is defined as an XY plane, and a direction from the bottom surface 16 toward the gas discharge port 17 (direction perpendicular to the bottom surface 16) is defined as a Z axis. In this specification, a predetermined direction within the XY plane is referred to as the X-axis direction, and a direction perpendicular to the X-axis within the XY plane is referred to as the Y-axis direction.

In this specification, the side of the gas discharge port 17 is referred to as "upper", and the side of bottom surface 16 is referred to as "lower". In this example, the Z-axis direction is the direction of gravity, but the "up" and "down" directions are not limited to the direction of gravity. In this specification, a top view refers to a case where the exhaust gas treatment device 100 is viewed from the gas exhaust port 17 toward the bottom surface 16 in the Z-axis direction.

In this example, the bottom surface 16 (XY plane) may be a horizontal surface, and the direction perpendicular to the bottom surface 16 (Z-axis direction) may be the height direction. When the exhaust gas treatment device 100 is mounted on a ship or the like, the bottom surface 16 may be placed on the ship.

The reaction tower 10 of this example has a gas introduction opening 11 through which exhaust gas 30 is introduced. In this example, the exhaust gas 30 is introduced into the gas processing section 18 from outside the reaction tower 10 through the gas introduction opening 11 . Gas introduction openings 11 may be provided in the side wall 15 .

The exhaust gas treatment device 100 of this example further includes a main pipe 12, a branch pipe 13, and a spout section 14. The spout 14 may be connected to the main pipe 12 . In this example, the branch pipe 13 is connected to the main pipe 12, and the spout part 14 is connected to the branch pipe 13. A liquid 40 is supplied to the main pipe 12 from outside the reaction tower 10 by a pump 60 . The liquid 40 supplied to the main pipe 12 flows inside the main pipe 12 from the bottom surface 16 toward the gas discharge port 17 in the Z-axis direction. The liquid 40 flowing inside the main pipe 12 flows into the branch pipe 13, and the liquid 40 flowing through the branch pipe 13 is ejected from the ejection part 14 to the gas processing part 18.

The main pipe 12 and the branch pipes 13 are made of a material that is durable against exhaust gas 30 and liquid 40 (seawater or alkaline liquid). The material is, for example, iron such as SS400, copper alloy such as Nevervar brass, aluminum alloy such as aluminum brass, nickel alloy such as cupronickel, or stainless steel such as SUS316L.

The main pipe 12 is provided inside the reaction tower 10 (gas processing section 18). The main pipe 12 extends from the exhaust gas 30 introduction side (bottom 16 side) to the discharge side (gas exhaust port 17 side). That is, the main pipe 12 in this example extends in the Z-axis direction.

The branch pipe 13 may be fixed to the main pipe 12. The reaction tower 10 may have a plurality of branch pipes 13. In this example, the branch pipe 13-1 is the branch pipe 13 provided closest to the bottom surface 16, and the branch pipe 13-12 is the branch pipe 13 provided closest to the gas discharge port 17 side. In this example, branch pipe 13-2, branch pipe 13-4, branch pipe 13-6, branch pipe 13-8, branch pipe 13-10, and branch pipe 13-12 extend in the X-axis direction, and -1, branch pipe 13-3, branch pipe 13-5, branch pipe 13-7, branch pipe 13-9, and branch pipe 13-11 extend in the Y-axis direction.

Branch pipe 13-2, branch pipe 13-4, branch pipe 13-6, branch pipe 13-8, branch pipe 13-10, and branch pipe 13-12 are arranged on both sides of main pipe 12 in the X-axis direction. good. Taking the branch pipe 13-2 as an example, the branch pipe 13-2A and the branch pipe 13-2B are the branch pipes 13-2 on one side and the other side of the main pipe 12 in the X-axis direction, respectively. The branch pipe 13-2A and the branch pipe 13-2B may be provided so as to sandwich the main pipe 12 in the X-axis direction.

Branch pipe 13-1, branch pipe 13-3, branch pipe 13-5, branch pipe 13-7, branch pipe 13-9, and branch pipe 13-11 are arranged on both sides of main pipe 12 in the Y-axis direction. good. Taking the branch pipe 13-1 as an example, the branch pipe 13-1A and the branch pipe 13-1B are the branch pipes 13-1 on one side and the other side of the main pipe 12 in the Y-axis direction, respectively. In the Y-axis direction, the branch pipe 13-1A and the branch pipe 13-1B may be provided to sandwich the main pipe 12. In addition, in FIG. 1, branch pipe 13-1A, branch pipe 13-3A, branch pipe 13-5A, branch pipe 13-7A, branch pipe 13-9A, and branch pipe 13-11A are arranged at positions overlapping with main pipe 12. , so it is not shown.

The spout 14 may be fixed to the branch pipe 13. The reaction tower 10 may have a plurality of ejection sections 14. In this example, each of the branch pipes 13-1 to 13-12 has two spouts 14. The two ejection parts 14 may be provided at both ends in the direction in which each branch pipe 13 extends. In this example, the ejection part 14-1 and the ejection part 14-12 are arranged in the direction (Z-axis direction) from the introduction side (bottom 16 side) of the exhaust gas 30 in the reaction tower 10 to the discharge side (gas outlet 17 side). , respectively, are arranged at the most exhaust gas 30 introduction side and the most exhaust gas 30 discharge side.

In this example, the spout section 14-2A, the spout section 14-4A, the spout section 14-6A, the spout section 14-8A, the spout section 14-10A, and the spout section 14-12A are connected to the branch pipe 13-2A, the branch pipe 13 -4A, branch pipe 13-6A, branch pipe 13-8A, branch pipe 13-10A, and branch pipe 13-12A. In this example, the spout section 14-2B, the spout section 14-4B, the spout section 14-6B, the spout section 14-8B, the spout section 14-10B, and the spout section 14-12B are connected to the branch pipe 13-2B, the branch pipe 13 -4B, branch pipe 13-6B, branch pipe 13-8B, branch pipe 13-10B, and branch pipe 13-12B.

In this example, the spout section 14-1A, the spout section 14-3A, the spout section 14-5A, the spout section 14-7A, the spout section 14-9A, and the spout section 14-11A are connected to the branch pipe 13-1A, the branch pipe 13 -3A, branch pipe 13-5A, branch pipe 13-7A, branch pipe 13-9A, and branch pipe 13-11A. In this example, the spout section 14-1B, the spout section 14-3B, the spout section 14-5B, the spout section 14-7B, the spout section 14-9B, and the spout section 14-11B are connected to the branch pipe 13-1B, the branch pipe 13 -3B, branch pipe 13-5B, branch pipe 13-7B, branch pipe 13-9B, and branch pipe 13-11B. In addition, in FIG. 1, the spouting part 14-1A, the spouting part 14-3A, the spouting part 14-5A, the spouting part 14-7A, the spouting part 14-9A, and the spouting part 14-11A are arranged at positions overlapping with the main pipe 12. , so it is not shown.

The spouting section 14 of this example has an opening surface that spouts the liquid 40. In FIG. 1, the opening plane is indicated by an "x" mark. In one branch pipe 13, the respective opening surfaces of the two ejection parts 14 may point in one direction and the other direction perpendicular to the extending direction of the branch pipe 13. The direction in which the opening surface points refers to the direction in which the liquid 40 is ejected from the ejection part 14. That is, the spouting section 14-2A, the spouting section 14-4A, the spouting section 14-6A, the spouting section 14-8A, the spouting section 14-10A, and the spouting section 14-12A spout the liquid 40 in one direction in the Y-axis direction. The spouting section 14-2B, the spouting section 14-4B, the spouting section 14-6B, the spouting section 14-8B, the spouting section 14-10B and the spouting section 14-12B may direct the liquid 40 in the other direction in the Y-axis direction. You can gush about it. Further, the spouting portion 14-1A, spouting portion 14-3A, spouting portion 14-5A, spouting portion 14-7A, spouting portion 14-9A, and spouting portion 14-11A spout the liquid 40 in one direction in the X-axis direction. The spouting portions 14-1B, 14-3B, 14-5B, 14-7B, 14-9B, and 14-11B may direct the liquid 40 in the other direction in the X-axis direction. You can gush about it. The ejection part 14 ejects the liquid 40 in the X-axis direction and the Y-axis direction not only when the liquid 40 is ejected parallel to the X-axis direction and the Y-axis direction, but also when the liquid 40 has an X-axis component and a This may also include a case where the ejection is performed in a direction including a Y-axis direction component.

The liquid 40 supplied to the main pipe 12 flows inside the main pipe 12 from the bottom surface 16 toward the gas discharge port 17 in the Z-axis direction. The liquid 40 flowing inside the main pipe 12 flows into the branch pipes 13-1 and 13-12, and is ejected from the spouting portions 14-1 and 14-12 to the gas processing section 18, respectively.

When the liquid 40 is a sodium hydroxide (NaOH) aqueous solution, the reaction between sulfur dioxide gas (SO ₂ ) contained in the exhaust gas 30 and sodium hydroxide (NaOH) is represented by Chemical Formula 1 below.
[Chemical formula 1]
SO ₂ +Na ⁺ +OH ^- →Na+HSO ₃ ^-

As shown in Chemical Formula 1, sulfur dioxide gas (SO ₂ ) becomes sulfite ions (HSO ₃ ⁻ ) through a chemical reaction. Sulfite ions (HSO ₃ ⁻ ) are contained in the waste liquid 45 after the chemical reaction shown in Chemical Formula 1, and are discharged from the recovery section 20 installed at the bottom 16 of the reaction tower 10 .

The exhaust gas treatment device 100 may further include a flow rate control section 70. The flow rate control unit 70 controls the flow rate of the liquid 40. The flow rate control section 70 may include a valve 72. The flow rate control unit 70 of this example controls the flow rate of the liquid 40 supplied from the pump 60 to the main pipe 12 using a valve 72.

The flow rate control unit 70 may control the flow rate of the liquid 40 based on at least one of the amount of sulfur components contained in the fuel input to the power plant 50 and the operating status of the power plant 50. The amount of sulfur components contained in fuel may vary depending on the fuel. When fuel A containing a first amount of sulfur component per unit volume or unit weight and fuel B containing a second amount larger than the first amount are respectively input to the power plant 50, the flow rate control unit 70 , the flow rate of the liquid 40 when the fuel B is input to the power plant 50 may be made larger than the flow rate of the liquid 40 when the fuel A is input.

When the power plant 50 is an engine, the operating status of the power plant 50 is, for example, the number of rotations per unit time of the engine, the rate of increase in the number of rotations of the engine per unit time, and the like. The flow rate control unit 70 may control the flow rate of the liquid 40 based on at least one of the engine rotation speed per unit time and the rate of increase in the engine rotation speed. Control of the flow rate of the liquid 40 based on the operating status of the power plant 50 will be described later. The flow rate control unit 70 may control the flow rate of the liquid 40 based on both the sulfur component contained in the fuel input to the power plant 50 and the operating status of the power plant 50.

The reaction tower 10 may be supplied with a chemical equivalent or more of the liquid 40 capable of neutralizing the sulfur component contained in the exhaust gas 30. The exhaust gas treatment system 300 determines the amount of sulfur components contained in the exhaust gas 30 per unit volume based on the amount of sulfur components per unit volume or unit weight contained in the fuel input to the power plant 50 and the operating status of the power plant 50. Able to calculate quantity. The flow rate control unit 70 can calculate the amount of the chemically equivalent liquid 40 that can neutralize the sulfur component. The flow rate control unit 70 may control the flow rate of the liquid 40 so that the liquid 40 in an amount equal to or more than the above amount is supplied to the reaction tower 10.

The pH of the waste liquid 45 tends to be 4 or more because the liquid 40 having a chemical equivalent or more that can neutralize the sulfur component contained in the exhaust gas 30 is supplied to the reaction tower 10 . When the recovery unit 20 provides the waste liquid 45 with a pH of 4 or more to the heat utilization equipment 200, sulfur oxides (SO _x ) are less likely to be generated from the waste liquid 45. When the amount of liquid 40 supplied to reaction tower 10 is less than the chemical equivalent that can neutralize the sulfur component contained in waste gas 30, the pH of waste liquid 45 tends to be less than 4. When the recovery unit 20 provides the waste liquid 45 with a pH of less than 4 to the heat utilization equipment 200, harmful substances such as sulfur oxides ( _SOx ) are likely to be generated from the waste liquid 45.

FIG. 2 is a diagram showing an example of the top surface of the exhaust gas treatment device 100 shown in FIG. 1. In FIG. 2, the power unit 50, pump 60, flow rate control section 70, and gas discharge port 17 are omitted. FIG. 2 is an example of a top view of the interior of the reaction tower 10.

The reaction tower 10 of this example has a circular shape when viewed from above. A main pipe 12 is provided inside the reaction tower 10 . The main pipe 12 of this example has a cylindrical shape having a central axis in the Z-axis direction. The central axis of the main pipe 12 may coincide with the central axis of the reaction tower 10. That is, the main pipe 12 and the reaction tower 10 may be arranged concentrically when viewed from above.

The exhaust gas treatment device 100 may be a cyclone type scrubber in which the exhaust gas 30 spirals inside the reaction tower 10 from the introduction side of the exhaust gas 30 to the discharge side of the reaction tower 10 . The exhaust gas introduction pipe 32 is connected to the side wall 15 of the reaction tower 10. The exhaust gas introduction pipe 32 may be provided at a position where the extension line of the exhaust gas introduction pipe 32 in the extending direction does not overlap with the center of the reaction tower 10 when viewed from above. The extending direction of the exhaust gas introduction pipe 32 refers to the direction in which the exhaust gas 30 passes through the gas introduction opening 11. By providing the exhaust gas introduction pipe 32 at such a position, the exhaust gas 30 spirals around the gas processing unit 18 (cyclone-like), and the exhaust gas 30 flows from the introduction side (bottom 16 side) to the exhaust side (gas exhaust port). 17 side).

The liquid 40 supplied from the outside of the reaction tower 10 to the main pipe 12 flows inside the main pipe 12 from the bottom surface 16 side toward the gas outlet 17 side in the Z-axis direction. The liquid 40 flowing inside the main pipe 12 flows into the branch pipes 13-1 and 13-12, and is ejected from the spouting portions 14-1 and 14-12 to the gas processing section 18, respectively. In FIG. 2, the direction of the liquid 40 ejected from the ejection part 14 to the gas processing part 18 is indicated by a broken line arrow. In this example, the spouting section 14-11A, the spouting section 14-9A, the spouting section 14-7A, the spouting section 14-5A, the spouting section 14-3A, and the spouting section 14 arranged below the spouting section 14-11A. -1A, the liquid 40 is ejected in one direction in the X-axis direction. In this example, the spouting part 14-11B, the spouting part 14-9B, the spouting part 14-7B, the spouting part 14-5B, the spouting part 14-3B, and the spouting part 14 arranged below the spouting part 14-11B, -1B, the liquid 40 is ejected in the other direction in the X-axis direction. In addition, in this example, the spouting section 14-12A, the spouting section 14-10A, the spouting section 14-8A, the spouting section 14-6A, the spouting section 14-4A, and the spouting section disposed below the spouting section 14-12A. Liquid 40 is ejected from 14-2A in one direction in the Y-axis direction. In addition, in this example, the spouting section 14-12B, the spouting section 14-10B, the spouting section 14-8B, the spouting section 14-6B, the spouting section 14-4B, and the spouting section disposed below the spouting section 14-12B. The liquid 40 is ejected from 14-2B in the other direction in the Y-axis direction.

FIG. 3 is a diagram showing another example of the exhaust gas treatment system 300 according to one embodiment of the present invention. The exhaust gas treatment system 300 includes an exhaust gas treatment device 100 and a heat utilization device 200. The exhaust gas treatment system 300 of this example differs from the exhaust gas treatment system 300 shown in FIG. 1 in that it includes a heat utilization device 200-1 and a heat utilization device 200-2. Furthermore, the exhaust gas treatment apparatus 100 of this example differs from the exhaust gas treatment apparatus 100 shown in FIG. 1 in that it includes a low temperature recovery section 20-1 and a high temperature recovery section 20-2.

The waste liquid provided by the high-temperature recovery section 20-2 and the waste liquid provided by the low-temperature recovery section 20-1 are referred to as a high-temperature waste liquid 46 and a low-temperature waste liquid 47, respectively. The high temperature waste liquid 46 and the low temperature waste liquid 47 are liquids that have absorbed the heat of the waste gas 30. The temperature of the high temperature waste liquid 46 is higher than the temperature of the low temperature waste liquid 47. Note that the high-temperature waste liquid 46 is equivalent to the waste liquid 45 in the example of FIG.

The low temperature recovery section 20-1 provides the low temperature waste liquid 47 to the heat utilization equipment 200-1. High temperature recovery section 20-2 provides high temperature waste liquid 46 to heat utilization equipment 200-2. The low temperature recovery section 20-1 of this example is provided on the side wall 15 of the reaction tower 10. Further, the high temperature recovery section 20-2 of this example is provided on the bottom surface 16 of the reaction tower 10.

An introduction section 22 may be provided inside the reaction tower 10 . The introduction section 22 introduces a part of the liquid 40 ejected from the ejection section 14 into the low temperature recovery section 20-1. The introduction section 22 introduces a part of the liquid 40 ejected from the ejection section 14 disposed closer to the gas outlet 17 than the low temperature recovery section 20-1 in the Z-axis direction to the low temperature recovery section 20-1. good. In this example, the introduction section 22 introduces the liquid 40 ejected from the ejection sections 14-5 to 14-12 into the low temperature recovery section 20-1.

Introductory portion 22 may have a bottom surface 24 and side surfaces 26 . The bottom surface 24 may be parallel to the XY plane. In the XZ plane, the side surface 26 may extend in a direction having a predetermined angle with respect to the Z-axis direction, or may extend in the Z-axis direction. The side surface 26 in this example extends in a direction having a predetermined angle with respect to the Z-axis direction within the XZ plane. Since the side surface 26 extends within the XZ plane in a direction having a predetermined angle with respect to the Z-axis direction, the liquid 40 that has fallen from above the introduction section 22 tends to fall onto the side surface 26 . Therefore, the liquid 40 that has fallen onto the side surface 26 is easily introduced into the low temperature recovery section 20-1.

The introduction section 22 may be provided in at least a portion of the side wall 15, which includes the inlet of the liquid 40 to the low-temperature recovery section 20-1, in the interior of the reaction tower 10 when viewed from above. The introduction section 22 may be provided on the entire surface of the side wall 15, including the inlet of the liquid 40 to the low-temperature recovery section 20-1, inside the reaction tower 10 when viewed from above. In other words, the introduction part 22 may be provided inside the reaction tower 10 so as to go around the side wall 15 when viewed from above. Since the introduction part 22 is provided so as to go around the side wall 15 in a top view, the introduction part 22 collects the liquid 40 that has fallen from above the introduction part 22 over the entire surface of the side wall 15 inside the reaction tower 10. can. Therefore, the introduction section 22 can easily recover the liquid 40 efficiently.

Further, the exhaust gas treatment device 100 of this example differs from the exhaust gas treatment device 100 shown in FIG. 1 in that it includes one pump 60 and three valves 72. Pump 60 supplies liquid 40 to main pipes 12-1, 12-2, and 12-3. In addition, the flow rate control unit 70 of this example supplies water from the pump 60 to the main pipe 12-1, main pipe 12-2, and main pipe 12-3 through valves 72-1, 72-2, and 72-3, respectively. The flow rate of liquid 40 is controlled.

The main pipe 12 includes a first main pipe provided on the introduction side (bottom 16 side) of the exhaust gas 30 and a second main pipe provided on the exhaust gas 30 discharge side (gas exhaust port 17 side) than the first main pipe. It may contain the main pipe. In this example, the main pipe 12 includes a main pipe 12-1 provided on the introduction side of the exhaust gas 30, a main pipe 12-2 provided on the exhaust gas 30 discharge side from the main pipe 12-1, and a main pipe 12-2 provided on the exhaust gas 30 discharge side from the main pipe 12-1. It includes a main pipe 12-3 provided on the exhaust gas 30 discharge side than 12-2. In this example, the first trunk pipe and the second trunk pipe described above may be the trunk pipe 12-1 and the trunk pipe 12-2, respectively, and may be the trunk pipe 12-2 and the trunk pipe 12-3, respectively. It's okay.

In the direction (in the XY plane) perpendicular to the direction in which the main pipe 12 extends (Z-axis direction), the cross-sectional area of the first main pipe may be larger than the cross-sectional area of the second main pipe. In this example, the cross-sectional area of the main pipe 12-1 is larger than that of the main pipe 12-2, and the cross-sectional area of the main pipe 12-2 is larger than the cross-sectional area of the main pipe 12-3. In this example, the branch pipes 13-1 to 13-4 are fixed to the main pipe 12-1, the branch pipes 13-5 to 13-8 are fixed to the main pipe 12-2, and the branch pipes 13-9 to 13- 12 is fixed to the main pipe 12-3.

The liquid 40 supplied to the main pipe 12 flows in the Z-axis direction from the bottom surface 16 toward the gas discharge port 17 inside the main pipes 12-1, 12-2, and 12-3, respectively. The liquid 40 flowing inside the main pipe 12-1 flows into the branch pipes 13-1 to 13-4, and is ejected to the gas processing unit 18 from the spouting portions 14-1 to 14-4, respectively. The liquid 40 flowing inside the main pipe 12-2 flows into the branch pipes 13-5 to 13-8, and is ejected to the gas processing unit 18 from the spouting portions 14-5 to 14-8, respectively. The liquid 40 flowing inside the main pipe 12-3 flows to the branch pipes 13-9 to 13-12, and is ejected to the gas processing unit 18 from the spouting portions 14-9 to 14-12, respectively.

In the Z-axis direction, the position of the jetting part 14-1 located closest to the bottom surface 16 and the position of the jetting part 14-12 located closest to the gas discharge port 17 are defined as positions P1 and P2, respectively. . In the Z-axis direction, the distance between position P1 and position P2 is defined as distance L. In the Z-axis direction, the center position between position P1 and position P2 is defined as position P3. In the Z-axis direction, the positions of the gas introduction opening 11, the low temperature recovery section 20-1, and the bottom surface 16 are defined as a position P4, a position P5, and a position P6, respectively. Note that the position of the low-temperature recovery section 20-1 in the Z-axis direction may be the center of the low-temperature recovery section 20-1 in the Z-axis direction, the upper end, or the lower end. The position of the gas introduction opening 11 in the Z-axis direction may be the center of the gas introduction opening 11 in the Z-axis direction, the upper end, or the lower end.

In this example, the high temperature recovery section 20-2 is located closer to the gas introduction opening 11 than the low temperature recovery section 20-1. In other words, in this example, the distance between position P4 and position P6 is smaller than the distance between position P4 and position P5.

The low temperature recovery section 20-1 provides the low temperature waste liquid 47 to the heat utilization equipment 200-1. High temperature recovery section 20-2 provides high temperature waste liquid 46 to heat utilization equipment 200-2. In the exhaust gas treatment device 100 of this example, the high temperature recovery section 20-2 is arranged at a position closer to the gas introduction opening 11 than the low temperature recovery section 20-1. Therefore, the heat of the exhaust gas 30 introduced from the exhaust gas introduction pipe 32 into the gas processing section 18 and proceeding on the bottom surface 16 side is more easily recovered by the high temperature recovery section 20-2 than the low temperature recovery section 20-1. Therefore, in the exhaust gas treatment device 100 of this example, the high-temperature recovery section 20-2 is located closer to the gas introduction opening 11 than the high-temperature recovery section 20-2. The heat of the exhaust gas 30 can be recovered more efficiently.

The high-temperature waste liquid 46 recovers a part of the heat of the exhaust gas 30 in the high-temperature recovery section 20-2. The low-temperature waste liquid 47 recovers another part of the heat of the exhaust gas 30 in the low-temperature recovery section 20-1. The heat of the exhaust gas 30 is recovered in the high temperature recovery section 20-2 and then recovered in the low temperature recovery section 20-1. Therefore, the temperature of the low-temperature waste liquid 47 provided by the low-temperature recovery section 20-1 tends to be lower than the temperature of the high-temperature waste liquid 46 provided by the high-temperature recovery section 20-2. The temperature of the high-temperature waste liquid 46 provided by the high-temperature recovery section 20-2 is, for example, 40° C. or higher and 95° C. or lower. The temperature of the low-temperature waste liquid 47 provided by the low-temperature recovery section 20-1 is, for example, 10° C. or higher and 50° C. or lower.

The low-temperature recovery section 20-1 may be arranged closer to the introduction side of the exhaust gas 30 than the center of the ejection section 14-1 and the ejection section 14-12 in the Z-axis direction. That is, in the Z-axis direction, the position P5 of the low temperature recovery section 20-1 may be closer to the position P1 than the central position P3 between the positions P1 and P2.

In this example, the exhaust gas 30 advances through the gas processing section 18 from the position P1 side toward the position P2 side. On the position P1 side in the Z-axis direction, a portion of the heat of the exhaust gas 30 is absorbed by the high-temperature waste liquid 46. Another part of the heat of the exhaust gas 30 is absorbed by the low-temperature waste liquid 47 closer to the position P2 than the position P1. In this example, since the position P5 of the low-temperature recovery section 20-1 is closer to the position P1 than the position P3 in the Z-axis direction, the low-temperature recovery section 20-1 recovers the other part of the heat of the exhaust gas 30. It becomes easier.

The low temperature recovery section 20-1 may be arranged closer to the gas outlet 17 than the ejection section 14-1 in the Z-axis direction. That is, the position P5 of the low temperature recovery section 20-1 may be closer to the position P2 than the position P1 in the Z-axis direction. Thereby, the high-temperature recovery section 20-2 can increase the proportion of heat recovered by the high-temperature waste liquid 46 to the total amount of heat of the exhaust gas 30.

FIG. 4 is a diagram showing an example of the top surface of the exhaust gas treatment device 100 shown in FIG. 3. In FIG. 2, the power unit 50, pump 60, flow rate control section 70, and gas discharge port 17 are omitted. FIG. 4 is an example of the interior of the reaction tower 10 viewed from above.

Inside the reaction tower 10, a main pipe 12-1, a main pipe 12-2, and a main pipe 12-3 are provided. The main pipe 12-1, the main pipe 12-2, and the main pipe 12-3 may have a cylindrical shape having a central axis in the Z-axis direction. The central axes of main pipe 12-1, main pipe 12-2, and main pipe 12-3 may coincide with the central axis of reaction column 10. That is, the main pipe 12-1, the main pipe 12-2, the main pipe 12-3, and the reaction tower 10 may be arranged concentrically when viewed from above. In this example, the main pipe 12-2 is arranged below the main pipe 12-3, and the main pipe 12-1 is arranged below the main pipe 12-2.

The main pipe 12 in this example extends in the Z-axis direction. In the XY plane orthogonal to the extending direction of the main pipe 12, the cross-sectional area of the first main pipe 12 on the exhaust gas 30 introduction side is larger than the cross-sectional area of the second main pipe 12 on the exhaust gas 30 discharge side. good. In this example, the main pipe 12-1 is disposed closest to the exhaust gas 30 introduction side, and the main pipe 12-3 is disposed closest to the exhaust gas 30 discharge side. In this example, the cross-sectional area of the main pipe 12-1 is larger than that of the main pipe 12-2, and the cross-sectional area of the main pipe 12-2 is larger than the cross-sectional area of the main pipe 12-3.

The liquid 40 supplied from the outside of the reaction tower 10 to the main pipe 12 is distributed in the Z-axis direction from the bottom surface 16 side to the gas discharge port 17 side through main pipes 12-1, 12-2, and 12-3. flows in sequence inside the. A part of the liquid 40 flowing inside the main pipe 12-1 flows into the branch pipes 13-1 to 13-4, and is ejected to the gas processing unit 18 from the spouting parts 14-1 to 14-4, respectively. . In FIG. 4, the direction of the liquid 40 ejected from the ejection part 14 to the gas processing part 18 is indicated by a broken line arrow.

5 to 7 are diagrams showing examples of the opening 110 in the ejection part 14. FIG. 5 is a diagram showing an example of the opening 110-1 in the spouting part 14-1A. FIG. 6 is a diagram showing an example of the opening 110-2 in the spouting part 14-5A. FIG. 7 is a diagram showing an example of the opening 110-3 in the spouting part 14-9A.

The opening 110-1 is an opening 110 provided in the spouting part 14-1A. FIG. 5 is a view of the ejection part 14-1A viewed from a direction (X-axis direction) perpendicular to the extending direction (Y-axis direction) of the branch pipe 13-1A in the YZ plane. The opening 110-2 is an opening 110 provided in the spouting section 14-5A. FIG. 6 is a view of the jetting portion 14-5A viewed from a direction perpendicular to the extending direction of the branch pipe 13-5A in the YZ plane. The opening 110-3 is an opening 110 provided in the spouting section 14-9A. FIG. 7 is a view of the jetting portion 14-9A viewed from a direction perpendicular to the extending direction of the branch pipe 13-9A in the YZ plane. In this example, the shapes of the jetting part 14-3A, the jetting part 14-7A, and the jetting part 14-11A are the same as those shown in FIGS. 5, 6, and 7, respectively.

The spout part 14 is connected to the branch pipe 13. In the example shown in FIGS. 3 and 4, the spouting part 14-1A and the spouting part 14-3A are connected to the branch pipe 13-1A and the branch pipe 13-3A, respectively, and 2A is connected to main pipe 12-1. Further, the spouting part 14-5A and the spouting part 14-7A are connected to the branch pipe 13-5A and the branch pipe 13-7A, respectively, and the branch pipe 13-5A and the branch pipe 13-7A are connected to the main pipe 12-2. be done. Further, the spouting part 14-9A and the spouting part 14-11A are connected to the branch pipe 13-9A and the branch pipe 13-11A, respectively, and the branch pipe 13-9A and the branch pipe 13-11A are connected to the main pipe 12-3. be done.

The opening 110 in this example is circular. The spouting section 14 spouts the liquid 40 from the opening 110. FIG. 5 shows an example of the opening 110-1 in the ejection part 14-1A. FIG. 6 shows an example of the opening 110-2 in the spout section 14-5A. FIG. 7 shows an example of the opening 110-3 in the spout section 14-9A.

The area of the opening 110 in the ejection part 14 connected to the first main pipe may be larger than the area of the opening 110 in the ejection part 14 connected to the second main pipe. In this example, the area of the opening 110-1 in the spouting part 14-1 connected to the main pipe 12-1 is larger than the area of the opening 110-2 in the spouting part 14-5 connected to the main pipe 12-2. It's also big. In addition, in this example, the area of the opening 110-2 in the spouting part 14-5 connected to the main pipe 12-2 is the area of the opening 110-3 in the spouting part 14-9 connected to the main pipe 12-3. larger than

The area of the opening 110-2 may be 1/4 or more and 3/4 or less of the area of the opening 110-1. In this example, the area of opening 110-2 is 1/2 of the area of opening 110-1. The area of the opening 110-3 may be 1/8 or more and 1/4 or less of the area of the opening 110-1. In this example, the area of opening 110-3 is 1/6 of the area of opening 110-1.

As shown in Chemical Formula 1, the reaction between sulfur dioxide gas (SO ₂ ) and liquid 40 is proportional to the concentration of sulfur dioxide gas (SO ₂ ). Therefore, in the gas processing section 18, the concentration of sulfur dioxide gas ( _SO2 ) on the bottom surface 16 side tends to be higher than the concentration of sulfur dioxide gas ( _SO2 ) on the gas discharge port 17 side. In this example, the area of the opening 110-1 is larger than the area of the opening 110-2, and the area of the opening 110-2 is larger than the area of the opening 110-3, so the amount of liquid 40 ejected from the opening 110 tends to increase in the order of opening 110-3, opening 110-2, and opening 110-1. That is, the exhaust gas treatment device 100 of this example reduces the amount of liquid 40 that is ejected from the opening 110 of the ejection part 14 provided on the bottom surface 16 side to the amount of liquid 40 ejected from the opening 110 of the ejection part 14 provided on the gas discharge port 17 side. It is easy to increase the amount of liquid 40. Therefore, the exhaust gas treatment device 100 of this example easily supplies a sufficient amount of liquid 40 to cause a chemical reaction between the sulfur dioxide gas (SO ₂ ) and the liquid 40 on the bottom surface 16 side.

FIG. 8 is a diagram showing another example of the exhaust gas treatment system 300 according to one embodiment of the present invention. The exhaust gas treatment system 300 includes an exhaust gas treatment device 100 and a heat utilization device 200. In the exhaust gas treatment device 100 of this example, the low temperature recovery section 20-1 is arranged between the gas introduction opening 11 and the ejection section 14-1 in the Z-axis direction.

The position of the low-temperature recovery section 20-1 in this example in the Z-axis direction is defined as position P5'. In the exhaust gas treatment device 100 of this example, the position P5' of the low temperature recovery section 20-1 is located between the position P4 and the position P1 in the Z-axis direction. The exhaust gas treatment device 100 of this example differs from the exhaust gas treatment device 100 shown in FIG. 3 in this respect. In this example, since the position P5' of the low-temperature recovery section 20-1 is located between the positions P4 and P1 in the Z-axis direction, the low-temperature recovery section 20-1 collects heat other than the heat of the exhaust gas 30 described above. It becomes easier to recover the portion than in the example shown in FIG.

FIG. 9 is a diagram showing another example of the exhaust gas treatment system 300 according to one embodiment of the present invention. The exhaust gas treatment system 300 includes an exhaust gas treatment device 100 and a heat utilization device 200. In the exhaust gas treatment device 100 of this example, the low temperature recovery section 20-1 is arranged between the position P3 and the position P2 in the Z-axis direction. The exhaust gas treatment device 100 of this example differs from the exhaust gas treatment device 100 shown in FIG. 3 in this respect. The position P1 is the position of the spouting part 14-1 located closest to the bottom surface 16 in the Z-axis direction. Position P2 is the position of the ejection part 14-12 located closest to the gas discharge port 17 in the Z-axis direction. Position P3 is a central position between position P1 and position P2 in the Z-axis direction.

The position of the low temperature recovery section 20-1 in this example in the Z-axis direction is defined as position P5''. In the exhaust gas treatment device 100 of this example, the position P5'' of the low temperature recovery section 20-1 is located between the positions P2 and P3 in the Z-axis direction. Therefore, the low-temperature recovery section 20-1 of this example can easily recover the heat of the exhaust gas 30 rotating between the position P3 and the position P2 in the Z-axis direction. Furthermore, the high temperature recovery unit 20-2 of this example can increase the proportion of heat recovered by the high temperature waste liquid 46 to the total amount of heat of the exhaust gas 30, compared to the example shown in FIG.

FIG. 10 is a diagram showing another example of the exhaust gas treatment system 300 according to one embodiment of the present invention. The exhaust gas treatment system 300 includes an exhaust gas treatment device 100 and a heat utilization device 200. The exhaust gas treatment device 100 of this example differs from the exhaust gas treatment device 100 shown in FIG. 3 in that it further includes a liquid mixing section 80 and a temperature control section 90. Further, the exhaust gas treatment apparatus 100 of this example is further provided with a thermometer 34, a flow meter 36, a thermometer 42-1, a thermometer 42-2, a thermometer 42-3, and an operating status measuring section 52, as shown in FIG. This is different from the exhaust gas treatment device 100 shown in FIG.

The thermometer 34 measures the temperature of the exhaust gas 30 introduced from the gas introduction opening 11. The flow meter 36 measures the flow rate of the exhaust gas 30 introduced from the gas introduction opening 11. The flow meter 36 may measure the flow rate of the exhaust gas 30 by measuring the pressure of the exhaust gas 30.

Thermometer 42-1 measures the temperature of heat utilization equipment 200-1. Thermometer 42-2 measures the temperature of heat utilization equipment 200-2. Thermometer 42-3 measures the temperature of waste liquid 54.

The operating status measuring unit 52 measures the operating status of the power plant 50. When the power device 50 is an engine, the operating status of the power plant 50 includes, for example, the number of revolutions of the engine per unit time, the rate of increase in the number of revolutions of the engine per unit time, and the like. The operating status measurement unit 52 may measure the rotational speed, the increase rate, and the like.

The low-temperature recovery section 20-1 of this example provides the low-temperature waste liquid 47-1 to one heat utilization device 200-1. The high temperature recovery unit 20-2 of this example provides the high temperature waste liquid 46-1 to other heat utilization equipment 200-2. In FIG. 9, low-temperature waste liquid 47-2 and high-temperature waste liquid 46-2 are waste liquids that have been provided to low-temperature recovery section 20-1 and high-temperature recovery section 20-2, respectively.

The liquid mixing section 80 mixes the low temperature waste liquid 47-2 and the high temperature waste liquid 46-2. In FIG. 10, the waste liquid 54 is a liquid obtained by mixing the low temperature waste liquid 47-2 and the high temperature waste liquid 46-2 in the liquid mixing section 80.

The temperature control unit 90 controls the temperature of the waste liquid 54 based on the temperature of the heat utilization device 200-1 measured by the thermometer 42-1 and the temperature of the heat utilization device 200-2 measured by the thermometer 42-2. Temperature may be controlled. The liquid mixing section 80 may discharge the waste liquid 54 to the outside of the exhaust gas treatment device 100.

Since the exhaust gas 30 introduced from the gas introduction opening 11 advances through the gas processing section 18 from the bottom surface 16 side to the gas discharge port 17 side, the amount of heat of the exhaust gas 30 absorbed by the high temperature recovery section 20-2 is reduced by the amount of heat absorbed by the low temperature recovery section 20-2. 1 tends to be larger than the amount of heat absorbed by the exhaust gas 30. Therefore, the temperature of the high-temperature waste liquid 46-2 tends to be higher than the temperature of the low-temperature waste liquid 47-2. If the temperature of the high-temperature waste liquid 46-2 is higher than a predetermined publicly defined temperature at which discharge is possible, the exhaust gas treatment device 100 may not be able to discharge the high-temperature waste liquid 46-2 to the outside. In this example, since the liquid mixing section 80 mixes the high-temperature waste liquid 46-2 and the low-temperature waste liquid 47-2, the temperature of the mixed waste liquid 54 tends to be lower than the predetermined temperature. In the exhaust gas treatment device 100 of this example, the temperature control section 90 may control the temperature of the waste liquid 54 to be lower than the predetermined temperature.

The temperature control unit 90 controls the temperature of the exhaust gas 30 measured by the thermometer 34, the flow rate of the exhaust gas 30 measured by the flow meter 36, and the temperature of the waste liquid 54 discharged from the liquid mixing unit 80 and measured by the thermometer 42-3. By adjusting the amount of high-temperature waste liquid 46-2 and the amount of low-temperature waste liquid 47-2 based on at least one of the temperature and the operating status of power plant 50 measured by operating status measurement unit 52. , the temperature of the waste liquid 54 may be controlled.

Further, the flow rate control unit 70 may control the flow rate of the liquid 40 based on the operating status of the power plant 50 measured by the operating status measuring unit 52. When the power plant 50 is an engine, the operating status of the power plant 50 is, for example, the number of rotations per unit time of the engine, the rate of increase in the number of rotations of the engine per unit time, and the like. For example, when the engine is operated at a first rotation speed and a second rotation speed that is larger than the first rotation speed, the flow rate control unit 70 The flow rate of the liquid 40 may be greater than the flow rate of the liquid 40 when operating at the first rotation speed.

Further, the flow rate control unit 70 may control the degree of opening and closing of the valve 72 based on at least one piece of data input to the temperature control unit 90. The at least one data includes the temperature of the exhaust gas 30 measured by the thermometer 34, the flow rate of the exhaust gas 30 measured by the flow meter 36, and the waste liquid discharged from the liquid mixing section 80 and measured by the thermometer 42-3. 54 and the operating status of the power plant 50 measured by the operating status measuring unit 52.

FIG. 11 is a diagram showing another example of the exhaust gas treatment system 300 according to one embodiment of the present invention. The exhaust gas treatment system 300 includes an exhaust gas treatment device 100 and a heat utilization device 200. The exhaust gas treatment device 100 of this example differs from the exhaust gas treatment device 100 shown in FIG. 1 in that it further includes a spraying section 38 that sprays a liquid 40 for treating the exhaust gas 30. The spray section 38 in this example is provided outside the reaction tower 10. In FIG. 11 , liquid 41 is liquid 40 that is sprayed by spraying section 38 . The spraying section 38 may be provided at a position where it can spray the liquid 41 onto the exhaust gas 30 flowing from the power plant 50 to the gas introduction opening 11 . The spray section 38 may be provided in the exhaust gas introduction pipe 32. The spraying section 38 may spray the liquid 41 in a direction from the outside to the inside of the reaction tower 10 .

Since the exhaust gas treatment apparatus 100 of this example further includes a spraying section 38 provided outside the reaction tower 10, the liquid 41 can be sprayed onto the exhaust gas 30 before being introduced into the reaction tower 10. The temperature of the exhaust gas 30 before being introduced into the reaction tower 10 tends to be higher than the temperature of the exhaust gas 30 after being introduced into the reaction tower 10 and having heat absorbed by the liquid 40 . Therefore, the exhaust gas treatment apparatus 100 of this example can neutralize the sulfur component contained in the exhaust gas 30 with the liquid 41, and introduce the exhaust gas 30 in which a part of the heat of the exhaust gas 30 has been absorbed into the reaction tower 10.

FIG. 12 is a diagram showing another example of the exhaust gas treatment system 300 according to one embodiment of the present invention. The exhaust gas treatment system 300 includes an exhaust gas treatment device 100 and a heat utilization device 200. The exhaust gas treatment apparatus 100 of this example differs from the exhaust gas treatment apparatus 100 shown in FIG. 1 in that it further includes a heat insulating material 120 that covers at least a portion of the side wall 15 of the reaction tower 10.

The heat insulating material 120 may cover at least a portion of the side wall 15 of the reaction tower 10 in the Z-axis direction. The heat insulating material 120 of this example covers the entire side wall 15 of the reaction tower 10 in the Z-axis direction. The heat insulating material 120 may cover at least a portion of the side wall 15 of the reaction tower 10 in the XY plane. The heat insulating material 120 of this example covers the entire side wall 15 of the reaction tower 10 within the XY plane. That is, the heat insulating material 120 of this example covers the side wall 15 of the reaction tower 10 in a circumferential manner within the XY plane.

The insulation material 120 may be glass wool, rock wool, or the like. Glass wool is a cotton-like material made of glass fibers. Rock wool is a man-made mineral fiber produced by melting a mixture of basalt and lime, for example.

Since the exhaust gas treatment device 100 of this example further includes the heat insulating material 120, it is possible to suppress the heat of the exhaust gas 30 from being released from the inside of the reaction tower 10 to the outside of the reaction tower 10 through the side wall 15. Therefore, in the exhaust gas treatment apparatus 100 of this example, the liquid 40 can absorb heat of the exhaust gas 30 more efficiently than in the case where the heat insulating material 120 is not provided. Therefore, the exhaust gas treatment device 100 of the present example can provide the heat utilization equipment 200 with the waste liquid 45 that has absorbed more heat from the exhaust gas 30 than in the case where the heat insulating material 120 is not provided.

Preferably, the thermal conductivity of the heat insulating material 120 is lower than that of the side wall 15. When the thermal conductivity of the heat insulating material 120 is lower than the thermal conductivity of the side wall 15, the exhaust gas treatment device 100 of this example has a higher thermal conductivity than the side wall 15. Heat released from the inside of the reaction tower 10 to the outside of the reaction tower 10 through the side wall 15 can be suppressed more efficiently.

The lower end position (the position of the bottom surface 16 of the reaction tower 10) and the upper end position in the Z-axis direction of the side wall 15 are defined as a position P6 and a position P7, respectively. Furthermore, the center position between position P6 and position P7 in the Z-axis direction is defined as position P8. The distance Li is the distance in the Z-axis direction between the position P6 and the position P7.

The heat insulating material 120 extends from the end of the side wall 15 on the introduction side in the direction (Z-axis direction) from the introduction side (bottom 16 side) to the discharge side (gas outlet 17 side) of the exhaust gas 30 in the reaction tower 10. It may be provided on the introduction side rather than in the middle up to the end on the discharge side. That is, the heat insulating material 120 may be provided between the position P6 and the position P8 in the Z-axis direction. In this example, the gas introduction opening 11 is provided on the bottom surface 16 side (between position P6 and position P8) in the Z-axis direction. Therefore, by providing the heat insulating material 120 between the position P6 and the position P8 in the Z-axis direction, the exhaust gas treatment apparatus 100 of this example can prevent the heat of the exhaust gas 30 introduced from the gas introduction opening 11 from reaching the side wall 15. It is possible to efficiently prevent the gas from passing through the reaction tower 10 and being released to the outside of the reaction tower 10.

FIG. 13 is a diagram showing another example of the exhaust gas treatment system 300 according to one embodiment of the present invention. The exhaust gas treatment system 300 includes an exhaust gas treatment device 100 and a heat utilization device 200. The exhaust gas treatment device 100 of this example differs from the exhaust gas treatment device 100 shown in FIG. 1 in that it further includes an economizer 130 and a heat utilization device 210. In this example, the economizer 130 and the heat utilization equipment 210 are provided outside the reaction tower 10.

Exhaust gas 30-1 is exhaust gas 30 discharged from power plant 50 and introduced into economizer 130. The exhaust gas 30-2 is the exhaust gas 30 discharged from the economizer 130 and introduced into the reaction tower 10.

Economizer 130 is supplied with fluid 48 . The economizer 130 heats the fluid 48-1 with the exhaust gas 30-1 and discharges the heated fluid 49. Fluid 49 is provided to heat utilization equipment 210 . The fluid 48 may be fresh water, a heat medium, or seawater. When the fluid 48 is seawater, the temperature of the fluid 48 is, for example, 5° C. or more and 30° C. or less, and the temperature of the fluid 49 is, for example, 70° C. or more and 400° C. or less. When the fluid 49 is in a liquid phase, the temperature is such that it does not evaporate. Since the exhaust gas treatment device 100 of this example further includes an economizer 130, the heat of the exhaust gas 30-1 discharged from the power plant 50 can be further recovered.

Although the present invention has been described above using the embodiments, the technical scope of the present invention is not limited to the range described in the above embodiments. It will be apparent to those skilled in the art that various changes or improvements can be made to the embodiments described above. It is clear from the claims that such modifications or improvements may be included within the technical scope of the present invention.

The order of execution of each process, such as the operation, procedure, step, and stage in the apparatus, system, program, and method shown in the claims, specification, and drawings, is specifically defined as "before" or "before". It should be noted that they can be implemented in any order unless the output of the previous process is used in the subsequent process. Even if the claims, specifications, and operational flows in the drawings are explained using "first,""next," etc. for convenience, this does not mean that it is essential to carry out the operations in this order. It's not a thing.
[Item 1]
a reaction tower into which exhaust gas is introduced and a liquid for treating the exhaust gas is supplied;
a recovery unit that provides the liquid that has absorbed the heat of the exhaust gas by treating the exhaust gas to one or more heat utilization devices;
An exhaust gas treatment device equipped with.
[Item 2]
The reaction tower has a gas introduction opening for introducing the exhaust gas,
The recovery section has a low temperature recovery section and a high temperature recovery section,
The temperature of the liquid provided by the high temperature recovery unit is higher than the temperature of the liquid provided by the low temperature recovery unit,
The high temperature recovery section is located closer to the gas introduction opening than the low temperature recovery section.
The exhaust gas treatment device according to item 1.
[Item 3]
Further comprising a plurality of ejection parts provided inside the reaction tower and ejecting the liquid inside the reaction tower,
The low-temperature recovery section is located at the center of the jetting section located closest to the exhaust gas introduction side and the jetting section located closest to the exhaust gas discharge side in the direction from the exhaust gas introduction side to the exhaust gas exhaust side. located on the inlet side of the exhaust gas,
The exhaust gas treatment device according to item 2.
[Item 4]
Further comprising a plurality of ejection parts provided inside the reaction tower and ejecting the liquid inside the reaction tower,
The exhaust gas according to item 2, wherein the low-temperature recovery section is disposed between the gas introduction opening and the ejection section that is disposed closest to the introduction side in the direction from the introduction side to the discharge side of the exhaust gas. Processing equipment.
[Item 5]
Further comprising a plurality of ejection parts provided inside the reaction tower and ejecting the liquid inside the reaction tower,
The exhaust gas treatment device according to item 2, wherein the low-temperature recovery section is disposed closer to the discharge side than the ejection section that is disposed closest to the introduction side in a direction from the introduction side to the discharge side of the exhaust gas.
[Item 6]
Further comprising a main pipe provided inside the reaction tower, supplied with the liquid, extending from the introduction side of the exhaust gas to the discharge side, and connected to the plurality of ejection parts,
The trunk pipe includes a first trunk pipe provided on the introduction side of the exhaust gas and a second trunk pipe provided on the discharge side of the exhaust gas than the first trunk pipe,
In the direction perpendicular to the direction in which the main pipe extends, the cross-sectional area of the first main pipe is larger than the cross-sectional area of the second main pipe,
The area of the opening for spouting the liquid in the spouting part connected to the first main pipe is larger than the area of the opening for spouting the liquid in the spouting part connected to the second main pipe. big,
The exhaust gas treatment device according to any one of items 3 to 5.
[Item 7]
Further comprising a liquid mixing section,
The low temperature recovery unit provides the liquid to one of the heat utilization devices,
The high temperature recovery unit provides the liquid to the other heat utilization equipment,
The liquid mixing unit mixes the liquid provided to the one heat utilization device and the liquid provided to the other heat utilization device, and discharges the mixture to the outside of the exhaust gas treatment device.
The exhaust gas treatment device according to any one of items 2 to 6.
[Item 8]
a power device that discharges the exhaust gas;
a temperature control unit that controls the temperature of the liquid mixed in the liquid mixing unit;
Furthermore,
The temperature control section controls the temperature of the one heat source based on at least one of the temperature of the exhaust gas, the flow rate of the exhaust gas, the temperature of the liquid discharged from the liquid mixing section, or the operating status of the power plant. controlling at least one of the temperature of the utilization equipment and the temperature of the other heat utilization equipment;
The exhaust gas treatment device according to item 7.
[Item 9]
a power device that discharges the exhaust gas;
a temperature control unit that controls the temperature of the liquid mixed in the liquid mixing unit;
Furthermore,
The temperature control section controls the temperature of the one heat source based on at least one of the temperature of the exhaust gas, the flow rate of the exhaust gas, the temperature of the liquid discharged from the liquid mixing section, or the operating status of the power plant. controlling the temperature of the mixed liquid by adjusting the amount of the liquid provided to the utilization device and the amount of the liquid provided to the other heat utilization device;
The exhaust gas treatment device according to item 7.
[Item 10]
a power device that discharges the exhaust gas;
a flow rate control unit that controls the flow rate of the liquid;
Furthermore,
The flow rate control unit controls the flow rate of the liquid based on at least one of the amount of sulfur contained in the fuel input to the power plant and the operating status of the power plant.
The exhaust gas treatment device according to any one of items 1 to 9.
[Item 11]
The exhaust gas treatment device according to any one of items 1 to 10, wherein the reaction tower is supplied with the liquid in an amount equal to or more than a chemical equivalent capable of neutralizing the sulfur component contained in the exhaust gas.
[Item 12]
Further comprising a spraying section provided outside the reaction tower and spraying the liquid for treating the exhaust gas,
The spraying section sprays the liquid onto the exhaust gas introduced into the reaction tower.
The exhaust gas treatment device according to any one of items 1 to 11.
[Item 13]
further comprising a heat insulating material covering at least a portion of the side wall of the reaction tower,
The thermal conductivity of the heat insulating material is lower than the thermal conductivity of the side wall,
The heat insulating material is provided closer to the introduction side than the center of the side wall from the introduction side end to the discharge side end in the direction from the introduction side to the discharge side of the exhaust gas in the reaction tower.
The exhaust gas treatment device according to any one of items 1 to 12.
[Item 14]
an economizer that heats a fluid with the exhaust gas;
a heat utilization device to which the fluid heated by the economizer is provided;
The exhaust gas treatment device according to any one of items 1 to 13, further comprising:
[Item 15]
An exhaust gas treatment system comprising the exhaust gas treatment device according to any one of items 1 to 14 and the heat utilization equipment.

DESCRIPTION OF SYMBOLS 10... Reaction tower, 11... Gas introduction opening, 12... Main pipe, 13... Branch pipe, 14... Spout part, 15... Side wall, 16... Bottom surface, 17... ...Gas exhaust port, 18...Gas processing section, 19...Liquid discharge port, 20...Recovery section, 22...Introduction section, 24...Bottom surface, 26...Side surface, 30. ...Exhaust gas, 32...Exhaust gas introduction pipe, 34...Thermometer, 36...Flow meter, 38...Spraying section, 40...Liquid, 41...Liquid, 42...Temperature Total, 45...Drained liquid, 46...High temperature drained liquid, 47...Low temperature drained liquid, 48...Fluid, 49...Fluid, 50...Power unit, 52...Operating status Measuring section, 54...Drainage, 60...Pump, 70...Flow rate control section, 72...Valve, 80...Liquid mixing section, 90...Temperature control section, 100... Exhaust gas treatment device, 110...Opening, 120...Insulating material, 130...Economizer, 200...Heat utilization equipment, 210...Heat utilization equipment, 300...Exhaust gas treatment system

Claims (17)

a reaction tower into which exhaust gas is introduced and a liquid for treating the exhaust gas is supplied;
a recovery unit that provides the liquid that has absorbed the heat of the exhaust gas by treating the exhaust gas to one or more heat utilization devices;
Equipped with
The recovery section has a low temperature recovery section and a high temperature recovery section,
The temperature of the liquid provided by the high temperature recovery unit is higher than the temperature of the liquid provided by the low temperature recovery unit,
The low temperature recovery unit provides the liquid to one of the heat utilization devices,
The high temperature recovery unit provides the liquid to the other heat utilization equipment,
further comprising a liquid mixing unit that mixes the liquid provided to the one heat utilization device and the liquid provided to the other heat utilization device ;
Exhaust gas treatment equipment. The reaction tower has a gas introduction opening for introducing the exhaust gas,
The high temperature recovery section is located closer to the gas introduction opening than the low temperature recovery section.
The exhaust gas treatment device according to claim 1. a reaction tower into which exhaust gas is introduced and a liquid for treating the exhaust gas is supplied;
a recovery unit that provides the liquid that has absorbed the heat of the exhaust gas by treating the exhaust gas to one or more heat utilization devices;
Equipped with
The recovery section has a low temperature recovery section and a high temperature recovery section,
The reaction tower has a gas introduction opening for introducing the exhaust gas,
The high temperature recovery section is located closer to the gas introduction opening than the low temperature recovery section,
The low temperature recovery unit provides the liquid to one of the heat utilization devices,
The high temperature recovery unit provides the liquid to the other heat utilization equipment,
further comprising a liquid mixing unit that mixes the liquid provided to the one heat utilization device and the liquid provided to the other heat utilization device;
Exhaust gas treatment equipment. The exhaust gas treatment device according to claim 3, wherein the temperature of the liquid provided by the high temperature recovery section is higher than the temperature of the liquid provided by the low temperature recovery section. Further comprising a plurality of ejection parts provided inside the reaction tower and ejecting the liquid inside the reaction tower,
The low-temperature recovery section is located at the center of the jetting section located closest to the exhaust gas introduction side and the jetting section located closest to the exhaust gas discharge side in the direction from the exhaust gas introduction side to the exhaust gas exhaust side. located on the inlet side of the exhaust gas,
The exhaust gas treatment device according to any one of claims 2 to 4 . Further comprising a plurality of ejection parts provided inside the reaction tower and ejecting the liquid inside the reaction tower,
The low-temperature recovery section is arranged between the gas introduction opening and the ejection section disposed closest to the introduction side in the direction from the introduction side to the discharge side of the exhaust gas.
The exhaust gas treatment device according to any one of claims 2 to 4 . Further comprising a plurality of ejection parts provided inside the reaction tower and ejecting the liquid inside the reaction tower,
The low-temperature recovery section is disposed closer to the discharge side than the ejection section which is disposed closest to the introduction side in the direction from the introduction side to the discharge side of the exhaust gas.
The exhaust gas treatment device according to any one of claims 2 to 4 . Further comprising a main pipe provided inside the reaction tower, supplied with the liquid, extending from the introduction side of the exhaust gas to the discharge side, and connected to the plurality of ejection parts,
The trunk pipe includes a first trunk pipe provided on the introduction side of the exhaust gas and a second trunk pipe provided on the discharge side of the exhaust gas than the first trunk pipe,
In the direction perpendicular to the direction in which the main pipe extends, the cross-sectional area of the first main pipe is larger than the cross-sectional area of the second main pipe,
The area of the opening for spouting the liquid in the spouting part connected to the first main pipe is larger than the area of the opening for spouting the liquid in the spouting part connected to the second main pipe. big,
The exhaust gas treatment device according to any one of claims 5 to 7 . The exhaust gas treatment device according to any one of claims 1 to 8 , wherein the liquid mixing section discharges the liquid mixed by the liquid mixing section to the outside of the exhaust gas treatment device. further comprising a temperature control section that controls the temperature of the liquid mixed in the liquid mixing section based on the temperature of the one heat utilization device and the temperature of the other heat utilization device ;
The exhaust gas treatment device according to any one of claims 1 to 9 . Mixing in the liquid mixing section based on at least one of the temperature of the exhaust gas, the flow rate of the exhaust gas, the temperature of the liquid discharged from the liquid mixing section, or the operating status of the power device that discharges the exhaust gas. The exhaust gas treatment device according to any one of claims 1 to 9 , further comprising a temperature control section that controls the temperature of the liquid. From claim 1, further comprising a flow rate control unit that controls the flow rate of the liquid based on at least one of the amount of sulfur components contained in the fuel input to the power unit that discharges the exhaust gas and the operating status of the power unit. 12. The exhaust gas treatment device according to any one of 11 . The exhaust gas treatment device according to any one of claims 1 to 12 , wherein the reaction tower is supplied with a chemical equivalent or more of the liquid capable of neutralizing the sulfur component contained in the exhaust gas. Further comprising a spraying section provided outside the reaction tower and spraying the liquid for treating the exhaust gas,
The spraying section sprays the liquid onto the exhaust gas introduced into the reaction tower.
The exhaust gas treatment device according to any one of claims 1 to 13 . further comprising a heat insulating material covering at least a portion of the side wall of the reaction tower,
The thermal conductivity of the heat insulating material is lower than the thermal conductivity of the side wall,
The heat insulating material is provided closer to the introduction side than the center of the side wall from the introduction side end to the discharge side end in the direction from the introduction side to the discharge side of the exhaust gas in the reaction tower.
The exhaust gas treatment device according to any one of claims 1 to 14 . an economizer that heats a fluid with the exhaust gas;
a heat utilization device to which the fluid heated by the economizer is provided;
further comprising,
The exhaust gas treatment device according to any one of claims 1 to 15 . An exhaust gas treatment system comprising the exhaust gas treatment apparatus according to any one of claims 1 to 16 and the heat utilization equipment.

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