JP7331096B2 - 光ファイバ及びその生産方法 - Google Patents
光ファイバ及びその生産方法 Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C25/00—Surface treatment of fibres or filaments made from glass, minerals or slags
- C03C25/66—Chemical treatment, e.g. leaching, acid or alkali treatment
- C03C25/68—Chemical treatment, e.g. leaching, acid or alkali treatment by etching
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/01205—Manufacture of preforms for drawing fibres or filaments starting from tubes, rods, fibres or filaments
- C03B37/01211—Manufacture of preforms for drawing fibres or filaments starting from tubes, rods, fibres or filaments by inserting one or more rods or tubes into a tube
- C03B37/0122—Manufacture of preforms for drawing fibres or filaments starting from tubes, rods, fibres or filaments by inserting one or more rods or tubes into a tube for making preforms of photonic crystal, microstructured or holey optical fibres
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/01205—Manufacture of preforms for drawing fibres or filaments starting from tubes, rods, fibres or filaments
- C03B37/01225—Means for changing or stabilising the shape, e.g. diameter, of tubes or rods in general, e.g. collapsing
- C03B37/01228—Removal of preform material
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/01205—Manufacture of preforms for drawing fibres or filaments starting from tubes, rods, fibres or filaments
- C03B37/01225—Means for changing or stabilising the shape, e.g. diameter, of tubes or rods in general, e.g. collapsing
- C03B37/0124—Means for reducing the diameter of rods or tubes by drawing, e.g. for preform draw-down
- C03B37/01245—Means for reducing the diameter of rods or tubes by drawing, e.g. for preform draw-down by drawing and collapsing
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/02—Manufacture of glass fibres or filaments by drawing or extruding, e.g. direct drawing of molten glass from nozzles; Cooling fins therefor
- C03B37/025—Manufacture of glass fibres or filaments by drawing or extruding, e.g. direct drawing of molten glass from nozzles; Cooling fins therefor from reheated softened tubes, rods, fibres or filaments, e.g. drawing fibres from preforms
- C03B37/027—Fibres composed of different sorts of glass, e.g. glass optical fibres
- C03B37/02781—Hollow fibres, e.g. holey fibres
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02295—Microstructured optical fibre
- G02B6/02314—Plurality of longitudinal structures extending along optical fibre axis, e.g. holes
- G02B6/02319—Plurality of longitudinal structures extending along optical fibre axis, e.g. holes characterised by core or core-cladding interface features
- G02B6/02323—Core having lower refractive index than cladding, e.g. photonic band gap guiding
- G02B6/02328—Hollow or gas filled core
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/3528—Non-linear optics for producing a supercontinuum
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/365—Non-linear optics in an optical waveguide structure
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2203/00—Fibre product details, e.g. structure, shape
- C03B2203/10—Internal structure or shape details
- C03B2203/14—Non-solid, i.e. hollow products, e.g. hollow clad or with core-clad interface
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2203/00—Fibre product details, e.g. structure, shape
- C03B2203/10—Internal structure or shape details
- C03B2203/14—Non-solid, i.e. hollow products, e.g. hollow clad or with core-clad interface
- C03B2203/16—Hollow core
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2203/00—Fibre product details, e.g. structure, shape
- C03B2203/42—Photonic crystal fibres, e.g. fibres using the photonic bandgap PBG effect, microstructured or holey optical fibres
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
- G01N2021/8809—Adjustment for highlighting flaws
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- Analytical Chemistry (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Health & Medical Sciences (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Description
[0001] 本願は2018年10月24日に提出された欧州出願第18202368.9号及び2018年11月5日に提出された欧州出願第18204375.2号の優先権を主張するものであり、これらの出願は参照によりその全体が本明細書に組み込まれる。
1.光ファイバを形成する方法であって、
細長本体を有し外管と複数の内管とを備える製造用中間体であって、複数の内管は外管の中に配置され、複数の内管は細長本体の軸方向寸法に沿って細長本体を貫通して延伸するアパーチャの周囲に1つ以上のリング構造で配置されると共にアパーチャを少なくとも部分的に定義し、アパーチャの境界は製造用中間体の内部表面を定義する、製造用中間体を提供することと、
エッチング物質を用いて製造用中間体の内部表面をエッチングすることと、
内管から形成された複数の反共振素子を備える中空コア反共振反射ファイバである光ファイバを形成するように軸方向寸法に沿って製造用中間体を引き延ばすことと、
を備える、方法。
2.複数の内管は、内管の各々が他の内管のいずれとも接触しないように中空コアの周囲に単一リング構造で配置される、条項1に記載の方法。
3.軸方向寸法に沿って製造用中間体を引き延ばすことによって、製造用中間体の軸方向寸法に垂直な寸法はある率で縮小され、率は少なくとも10分の1である、条項1又は条項2に記載の方法。
4.製造用中間体の内部表面のエッチングはウェット化学エッチングプロセスを備える、条項1から3のいずれかに記載の方法。
5.製造用中間体の内部表面のエッチングは、液体浸漬、キャピラリ充填、加圧充填、又はスプレーエッチングのうち1つを備える、条項4に記載の方法。
6.エッチング物質は、HF、HFとHNO3との混合物、又はKOHのうち1つを備える、条項1から5のいずれかに記載の方法。
7.方法は室温で実施される、条項1から6のいずれかに記載の方法。
8.製造用中間体の内部表面のエッチングはドライ化学エッチングを備える、条項1から3又は5から7のいずれかに記載の方法。
9.エッチング物質及び/又はエッチングプロセスの何らかの生成物をアパーチャ内から少なくとも部分的に除去するように製造用中間体を洗浄することを更に備える、条項1から8のいずれかに記載の方法。
10.エッチング物質を用いて製造用中間体の内管のうち1つ以上の内部表面をエッチングすることを更に備える、条項1から9のいずれかに記載の方法。
11. 内管の内部表面がエッチング物質によってエッチングされないように内管のうち1つ以上の端部を塞ぐことを更に備える、条項1から10のいずれかに記載の方法。
12.エッチング物質を用いて製造用中間体の内部表面をエッチングすることは製造用中間体の内部表面の1つ以上の部分を優先的にエッチングすることを備え、1つ以上の部分は使用時に光ファイバを伝播する光と主に接触又は相互作用する光ファイバの1つ以上の部分に対応する、条項1から11のいずれかに記載の方法。
13. 製造用中間体の外部表面をエッチングすることを更に備える、条項1から12のいずれかに記載の方法。
14.条項1から13の方法によって形成される光ファイバ。
15.光ファイバを形成するための製造用中間体であって、製造用中間体が光ファイバを形成するように軸方向寸法に沿って引き延ばされる前に、条項1から13のいずれかの方法によって中間体として形成される、製造用中間体。
16.スーパーコンティニウム放射源であって、
放射ビームを生成するように動作可能な放射源と、
条項1から13の方法によって形成される光ファイバであって、放射ビームを受光するように、及びスーパーコンティニウム放射ビームを生成するべくそのパルス放射ビームのスペクトルを拡大するように構成されている光ファイバと、
を備える、スーパーコンティニウム放射源。
17.条項1から13の方法によって形成される光ファイバを備えるリソグラフィ装置。
18.条項1から13の方法によって形成される光ファイバを備えるメトロロジ装置。
Claims (9)
- 光ファイバを形成する方法であって、
細長本体を有し外管と複数の内管とを備える製造用中間体であって、前記複数の内管は前記外管の中に配置され、前記複数の内管は前記細長本体の軸方向寸法に沿って前記細長本体を貫通して延伸するアパーチャの周囲に1つ以上のリング構造で配置されると共に前記アパーチャを少なくとも部分的に定義し、前記アパーチャの境界は前記製造用中間体の内部表面を定義する、製造用中間体を提供することと、
エッチング物質を用いて前記製造用中間体の前記内部表面を構成する前記複数の内管の外面及び前記外管の内面をエッチングすることと、
前記内管から形成された複数の反共振素子を備える中空コア反共振反射ファイバである前記光ファイバを形成するように前記軸方向寸法に沿って前記製造用中間体を引き延ばすことと、
を備え、
前記複数の内管は、前記内管の各々が他の前記内管のいずれとも接触しないように前記中空コアの周囲に単一リング構造で配置される、
方法。 - 軸方向寸法に沿って前記製造用中間体を引き延ばすことによって、前記製造用中間体の前記軸方向寸法に垂直な寸法はある率で縮小され、前記率は少なくとも10分の1である、請求項1に記載の方法。
- 前記製造用中間体の前記内部表面の前記エッチングはウェット化学エッチングプロセスを備える、請求項1又は2に記載の方法。
- 前記製造用中間体の前記内部表面のエッチングは、液体浸漬、キャピラリ充填、加圧充填、又はスプレーエッチングのうち1つを備える、請求項3に記載の方法。
- 前記エッチング物質は、HF、HFとHNO3との混合物、又はKOHのうち1つを備える、請求項1から4のいずれかに記載の方法。
- 前記エッチングは室温で実施される、請求項1から5のいずれかに記載の方法。
- 前記製造用中間体の前記内部表面の前記エッチングはドライ化学エッチングを備える、請求項1又は2に記載の方法。
- 前記エッチング物質を用いて前記製造用中間体の前記内管のうち1つ以上の内部表面をエッチングすることを更に備える、請求項1から7のいずれかに記載の方法。
- エッチング物質を用いて前記製造用中間体の前記内部表面を前記エッチングすることは前記製造用中間体の前記内部表面の1つ以上の部分を優先的にエッチングすることを備え、前記1つ以上の部分は使用時に前記光ファイバを伝播する光と主に接触又は相互作用する前記光ファイバの1つ以上の部分に対応する、請求項1から8のいずれかに記載の方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP18202368.9 | 2018-10-24 | ||
EP18202368 | 2018-10-24 | ||
EP18204375.2A EP3647874A1 (en) | 2018-11-05 | 2018-11-05 | Optical fibers and production methods therefor |
EP18204375.2 | 2018-11-05 | ||
PCT/EP2019/076832 WO2020083624A1 (en) | 2018-10-24 | 2019-10-03 | Optical fibers and production methods therefor |
Publications (2)
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JP2022505074A JP2022505074A (ja) | 2022-01-14 |
JP7331096B2 true JP7331096B2 (ja) | 2023-08-22 |
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JP2021520974A Active JP7331096B2 (ja) | 2018-10-24 | 2019-10-03 | 光ファイバ及びその生産方法 |
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US (1) | US11999645B2 (ja) |
EP (1) | EP3870547A1 (ja) |
JP (1) | JP7331096B2 (ja) |
KR (1) | KR102598600B1 (ja) |
CN (1) | CN112912352B (ja) |
IL (1) | IL282442A (ja) |
SG (1) | SG11202103803QA (ja) |
WO (1) | WO2020083624A1 (ja) |
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WO2021144093A1 (en) * | 2020-01-15 | 2021-07-22 | Asml Netherlands B.V. | Method, assembly, and apparatus for improved control of broadband radiation generation |
CN115769140A (zh) * | 2020-07-08 | 2023-03-07 | Asml荷兰有限公司 | 具有延长的光纤使用寿命的基于空芯光纤的宽带辐射产生器 |
EP3936936A1 (en) * | 2020-07-08 | 2022-01-12 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based broadband radiation generator with extended fiber lifetime |
IL300587A (en) | 2020-09-03 | 2023-04-01 | Asml Netherlands Bv | Photonic crystal radiation generator based on broadband hollow crystal fibers |
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CN112912352A (zh) | 2021-06-04 |
US11999645B2 (en) | 2024-06-04 |
KR102598600B1 (ko) | 2023-11-06 |
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WO2020083624A1 (en) | 2020-04-30 |
IL282442A (en) | 2021-06-30 |
JP2022505074A (ja) | 2022-01-14 |
KR20210071029A (ko) | 2021-06-15 |
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