JP7298468B2 - Thermosetting resin composition and its use - Google Patents

Description

The present invention relates to thermosetting resin compositions containing cyclopentadiene compounds and uses thereof.

2. Description of the Related Art In recent years, as electronic devices have become smaller and have higher performance, miniaturization and higher density of wiring are required in multilayer printed wiring boards. In the next generation, materials for high-frequency bands will be required, and transmission loss reduction will be essential as a countermeasure against noise. Therefore, insulating materials with excellent dielectric properties are required for the insulating layers of multilayer printed wiring boards.

Epoxy resin compositions disclosed in Patent Documents 1 to 3 are known as insulating materials for multilayer printed wiring boards.
This patent document 1 discloses that an epoxy resin composition containing an epoxy resin, an active ester compound, and a triazine-containing cresol novolak resin is effective in reducing the dielectric loss tangent. Further, Patent Documents 2 and 3 disclose that a resin composition containing an epoxy resin and an active ester compound as essential components is a cured product having a low dielectric loss tangent and is useful as an insulating material. However, it has been found that these epoxy resin compositions are unsatisfactory for high frequency applications.

On the other hand, in Patent Document 4, a resin film made of a resin composition containing a bismaleimide resin having a long-chain alkyl group as a non-epoxy material and a curing agent has excellent dielectric properties (low dielectric constant and low dielectric loss tangent). ) has been reported. However, since the long-chain alkyl group of the bismaleimide resin has low heat resistance, the resin film itself has a problem of low heat resistance.

JP 2011-132507 A JP 2015-101626 A JP 2017-210527 A International publication WO2016/114287

An object of the present invention is to provide a thermosetting resin composition having a high glass transition temperature, excellent dielectric properties, heat resistance and low water absorption, and giving a cured product useful for high frequency applications, and the thermosetting resin composition. To provide electronic components, thermosetting adhesives, adhesive films, prepregs and multilayer printed wiring boards manufactured using

The inventors of the present invention have made intensive studies to solve the above problems, and as a result, have found that the following thermosetting resin composition can achieve the above objects, and completed the present invention. That is, the present invention provides the following thermosetting resin composition and a sealing material for electronic components, a thermosetting adhesive, an adhesive film, a prepreg and a multilayer printed wiring board produced using the composition. is.

（式（１）中、Ｒは炭素数１～６のアルキル基、炭素数２～６のアルケニル基、及び炭素数６～１０のアリール基から選ばれる基を示し、ｎは１～４の整数であり、ｘ１及びｘ２は独立して０、１又は２であり、ただし、Ｒがアルキル基又はアリール基を示す場合は、ｘ１は１又は２であり、かつ、１≦ｘ１＋ｘ２≦４である）
で示されるシクロペンタジエン化合物及び／又はそのオリゴマー
（Ｂ）硬化促進剤 及び
（Ｃ）無機充填材
を含む熱硬化性樹脂組成物。 <1>
(A) the following formula (1)

(In formula (1), R represents a group selected from an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, and an aryl group having 6 to 10 carbon atoms, and n is an integer of 1 to 4 and x1 and x2 are independently 0, 1 or 2, provided that when R represents an alkyl group or an aryl group, x1 is 1 or 2 and 1 ≤ x1 + x2 ≤ 4)
A thermosetting resin composition comprising a cyclopentadiene compound represented by and/or an oligomer thereof, (B) a curing accelerator, and (C) an inorganic filler.

<2>
(A) The thermosetting resin composition according to <1>, wherein the oligomer of the compound represented by the formula (1) of the component contains a dimer and/or a trimer of the compound represented by the formula (1). thing.

<3>
The thermosetting resin composition according to <1> or <2>, wherein the oligomer of the compound (A) represented by formula (1) has a dicyclopentadiene ring.

<4>
The thermosetting resin composition according to any one of <1> to <3>, wherein the proportion of the oligomer of the compound represented by formula (1) in component (A) is 10 to 90% by mass.

<5>
In addition to the components (A) to (C),
(D) The thermosetting resin composition according to any one of <1> to <4>, which contains an adhesion aid having one or more epoxy groups in one molecule.

<6>
The thermosetting resin composition according to any one of <1> to <5>, wherein the component (C) is surface-treated with a silane coupling agent having an amino group, a methacryl group, a vinyl group, or a styryl group. .

<7>
A sealing material for electronic parts, comprising the thermosetting resin composition according to any one of <1> to <6>.

<8>
The sealing material according to <7>, wherein the electronic component is a semiconductor device.

<9>
A thermosetting adhesive comprising the thermosetting resin composition according to any one of <1> to <6>.

<10>
An adhesive film in which the thermosetting resin composition according to any one of <1> to <6> is layered on a support film.

<11>
A prepreg in which a sheet-like fiber base material is impregnated with the thermosetting resin composition according to any one of <1> to <6>.

<12>
A multilayer printed wiring board having an insulating layer formed of a cured product of the thermosetting resin composition according to any one of <1> to <6>.

The cured product of the thermosetting resin composition of the present invention has a high glass transition temperature and is excellent in dielectric properties, heat resistance and low water absorption, and is therefore useful for high frequency applications. In particular, sealing materials, thermosetting adhesives, adhesive films, prepregs and multilayer printed wiring boards produced using the thermosetting resin composition are useful for high frequency applications.

The present invention will be described in more detail below.

[(A) Cyclopentadiene compound and/or oligomer thereof]
Component (A) contained in the thermosetting resin composition of the present invention is a cyclopentadiene compound represented by the following formula (1) and/or an oligomer having a cyclopentadiene compound represented by the following formula (1) as a monomer. .

式（１）中、Ｒは炭素数１～６のアルキル基、炭素数２～６のアルケニル基、及び炭素数６～１０のアリール基から選ばれる基を示し、ｎは１～４の整数であり、ｘ１及びｘ２は独立して０、１又は２であり、ただし、Ｒがアルキル基又はアリール基を示す場合は、ｘ１は１又は２であり、かつ、１≦ｘ１＋ｘ２≦４である。

In formula (1), R represents a group selected from an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, and an aryl group having 6 to 10 carbon atoms, and n is an integer of 1 to 4. and x1 and x2 are independently 0, 1 or 2, provided that when R represents an alkyl group or an aryl group, x1 is 1 or 2 and 1≤x1+x2≤4.

In formula (1), n is an integer of 1 to 4, preferably 1 to 2, and particularly preferably 1. x1 is 0, 1 or 2, preferably 0 or 1; x2 is 0, 1 or 2, preferably 1 or 2;

R represents a group selected from an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, and an aryl group having 6 to 10 carbon atoms. Examples of alkyl groups include methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, t-butyl, n-pentyl, isopentyl, neopentyl, t-pentyl, n- Examples include hexyl group, isohexyl group, cyclopentyl group, cyclohexyl group and the like.

Examples of alkenyl groups include vinyl, allyl, isopropenyl, butenyl, pentenyl, and hexenyl groups.

Furthermore, examples of aryl groups include phenyl, tolyl, xylyl, mesityl, benzyl, biphenyl, naphthyl and the like.

Among them, R is preferably an alkenyl group, particularly preferably a vinyl group or an allyl group.

When R represents an alkyl group or an aryl group, x1 is 1 or 2, preferably 1, and 1≤x1+x2≤4, preferably 1≤x1+x2≤2.

Since the cyclopentadiene ring of the compound represented by the formula (1) is highly reactive, the compound represented by the formula (1) is easily dimerized and/or trimerized by the Diels-Alder reaction, and dimerized. form isomers and/or trimers. The dimerization or trimerization reaction may be a reaction of cyclopentadiene compounds having the same structure or a reaction of cyclopentadiene compounds having different structures.
Component (A) preferably contains 10 to 90% by mass, more preferably 15 to 85% by mass, of the oligomer of the compound represented by formula (1).
Furthermore, component (A) preferably contains 3 to 80% by mass, more preferably 5 to 70% by mass, of the dimer of the compound represented by formula (1).
The dimer ratio and oligomer ratio of the compound represented by formula (1) are calculated from the peak area ratios measured by gel permeation chromatography (GPC).

Moreover, the oligomer of the compound represented by formula (1) preferably has a dicyclopentadiene ring structure.
The reaction in which the cyclopentadiene rings of the compound of formula (1) react to form a dicyclopentadiene ring, that is, the Diels-Alder reaction between the cyclopentadiene rings in two molecules of the compound of formula (1) is It is believed that the compound having the dicyclopentadiene ring is contained in a large amount in the component (A) because the reaction is more likely to occur than the reaction between the ring and other carbon-carbon double bonds capable of Diels-Alder reaction.

Further, since the compound represented by the formula (1) has a reactive double bond other than the cyclopentadiene ring, the reactive double bonds and/or the reactive double bond and the cyclopentadiene ring Reaction also produces oligomers.

（式中、Ｒ、ｎ、ｘ１、及びｘ２はそれぞれ前記と同じである。）

（式中、Ｒ、ｎ、ｘ１、及びｘ２はそれぞれ前記と同じである。）

（式中、Ｒ、ｎ、ｘ１、及びｘ２はそれぞれ前記と同じである。） Examples of the structure of the oligomer include those represented by the following formulas.

(Wherein, R, n, x1, and x2 are the same as above.)

(Wherein, R, n, x1, and x2 are the same as above.)

(Wherein, R, n, x1, and x2 are the same as above.)

The oligomer is prepared by treating the compound represented by formula (1) at 50 to 200° C., preferably 60 to 180° C., more preferably 70 to 160° C. for 20 minutes to 180 minutes, preferably 40 minutes to 150 minutes, more It is preferably obtained by heating for 60 to 120 minutes. This reaction is preferably carried out under vacuum.
The compound represented by formula (1) may be heated without a solvent, and if necessary, it can be heated in a high-boiling solvent such as toluene, xylene, or anisole.
In order to make the dimer of the cyclopentadiene compound represented by formula (1) 3% by mass or more in component (A), the compound represented by formula (1) is heated at 70 to 160° C. for 1 hour to Heating under vacuum for 2 hours is preferred.

The weight-average molecular weight (Mw) of the cyclopentadiene compound of component (A) is not particularly limited, including the properties at room temperature (25°C), but the weight-average molecular weight (Mw) is measured by gel permeation chromatography (GPC) and converted to a polystyrene standard. More preferably, the molecular weight is 10,000 or less, and particularly preferably 100 or more and 5,000 or less. When the molecular weight is 10,000 or less, there is no risk that the viscosity of the resulting composition will be too high and fluidity will be reduced, and moldability such as laminate molding will be good.
The weight-average molecular weight (Mw) referred to in this specification refers to the weight-average molecular weight measured by GPC using polystyrene as a standard material under the following conditions.
[Measurement condition]
Developing solvent: tetrahydrofuran Flow rate: 0.35 mL/min
Detector: RI
Column: TSK-GEL SuperHZ type (manufactured by Tosoh Corporation)
SuperHZ4000 (4.6mm I.D. x 15cm x 1)
SuperHZ3000 (4.6mm I.D. x 15cm x 1)
SuperHZ2000 (4.6mm I.D. x 15cm x 1)
Column temperature: 40°C
Sample injection volume: 5 μL (THF solution with a concentration of 0.1% by weight)

The (A) component cyclopentadiene compound and/or its oligomer may be used singly or in combination of two or more.

[(B) Curing accelerator]
The curing accelerator used in the present invention is for promoting the reaction between components (A) or between components (A) and other components. In general, radical reaction initiators are often used to promote the reaction of cyclopentadienyl groups. Examples of radical reaction initiators include radical initiators such as photoradical initiators and thermal radical initiators. The radical initiator is preferably a thermal radical initiator. More preferred thermal radical initiators are organic peroxides. Among organic peroxides, organic peroxides having a 10-hour half-life temperature of 100 to 170° C. are more preferred. Specifically, dicumyl peroxide, 2,5-dimethyl-2,5-di(tert-butylperoxy)hexane, tert-butylcumyl peroxide, di-tert-butyl peroxide, 1,1,3, 3-tetramethylbutyl hydroperoxide, cumene hydroperoxide and the like.

These curing accelerators may be used singly or in combination of two or more regardless of the type. The amount of the curing accelerator used is preferably 0.1 to 5 parts by mass, more preferably 0.3 to 4 parts by mass, and still more preferably 0.5 to 5 parts by mass based on 100 parts by mass of component (A). 3 parts by mass. When the amount of the curing accelerator used is 0.1 parts by mass or more, the curing reaction proceeds sufficiently, and when it is 5 parts by mass or less, the storage stability of the thermosetting resin composition is good.

[(C) inorganic filler]
The thermosetting resin composition of the present invention is characterized by containing (C) an inorganic filler. The inorganic filler of component (C) is blended to reduce the coefficient of thermal expansion and improve the mechanical properties of the cured product of the thermosetting resin composition of the present invention. In particular, in the resin composition according to the present invention, even if only the resin components (A) and (B) are used, the cured resin becomes very brittle. , it is very difficult to use it as a sealing material. Examples of inorganic fillers include spherical silica, fused silica, crystalline silica, silicas such as cristobalite, alumina, silicon nitride, aluminum nitride, boron nitride, titanium oxide, glass fiber, and magnesium oxide. Furthermore, fluororesin-containing fillers or fluororesin-coated fillers may also be used to improve dielectric properties. The average particle size and shape of these inorganic fillers can be selected according to the application.

The amount of the inorganic filler compounded is preferably 10 to 2,000 parts by mass, more preferably 20 to 1,200 parts by mass, and still more preferably 40 to 1,000 parts by mass based on 100 parts by mass of component (A). part by mass. In addition, the amount of the inorganic filler in the composition is preferably 30 to 95% by mass, more preferably 40 to 90% by mass, and still more preferably 50 to 85%, based on the total composition as 100% by mass. be.

The inorganic filler may be previously surface-treated with a coupling agent such as a silane coupling agent or a titanate coupling agent in order to strengthen the bonding strength between the resin component and the inorganic filler. Such coupling agents include epoxysilanes such as 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane; -2(aminoethyl)-3-aminopropyltrimethoxysilane, reaction product of imidazole and 3-glycidoxypropyltrimethoxysilane, 3-aminopropyltrimethoxysilane, N-phenyl-3-aminopropyltrimethoxysilane, etc. mercaptosilanes such as 3-mercaptosilane and 3-episulfidoxypropyltrimethoxysilane; vinylsilanes such as vinyltrimethoxysilane and vinyltriethoxysilane; styrylsilanes such as p-styryltrimethoxysilane; 3-methacryloxypropyl Epoxy group, amino group, mercapto group, vinyl group such as methacrylsilane such as methyldimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropylmethyldiethoxysilane, 3-methacryloxypropyltriethoxysilane, etc. A styryl group- or methacryl group-containing silane coupling agent can be mentioned. A silane coupling agent having an amino group, a methacryl group, a vinyl group or a styryl group is particularly preferred from the viewpoint of improving strength. The amount of the coupling agent used for surface treatment and the surface treatment method are not particularly limited.

[(D) Adhesion Aid Having One or More Epoxy Groups in One Molecule]
The thermosetting resin composition of the present invention may optionally contain (D) an adhesion aid having one or more epoxy groups per molecule. The (D) component epoxy group-containing adhesive aid is used to improve the adhesive strength of the thermosetting resin composition of the present invention with Si, Cu, Ni and the like. Component (D) is not particularly limited as long as it has one or more epoxy groups in one molecule, but specific examples include isocyanuric acid-type epoxy resins such as triglycidyl isocyanurate, triglycidyl p-aminophenol, and the like. aromatic amine type epoxy resins, bisphenol A type epoxy resins such as bisphenol A diglycidyl ether, dicyclopentadiene type epoxy resins such as dicyclopentadiene/phenol addition type glycidyl ether, 3-glycidoxypropyltrimethoxysilane, 2 A silane coupling agent having an epoxy group such as -(3,4-epoxycyclohexyl)ethyltrimethoxysilane can be mentioned. These adhesion promoters having one or more epoxy groups in one molecule may be used singly or in combination of two or more regardless of their types.

The amount of the adhesion aid having one or more epoxy groups in one molecule is 0.1 to 20 parts by weight, preferably 0.3 to 15 parts by weight, per 100 parts by weight of component (A). Yes, more preferably 0.5 to 10 parts by mass.

When the component (D) is added, a curing accelerator that accelerates the reaction of epoxy groups may be added as the component (B') in addition to the curing accelerator (B). The (B') curing accelerator is not particularly limited as long as it accelerates the curing reaction of a general epoxy resin composition. For example, amine compounds such as 1,8-diazabicyclo[5.4.0]-7-undecene, organic phosphorus compounds such as triphenylphosphine and tetraphenylphosphonium tetraborate salts, and 2-methylimidazole. imidazole compounds and the like.

These (B') curing accelerators may be used singly or in combination of two or more regardless of their types. The amount of the curing accelerator (B') when blending the component (D) is preferably 0.1 to 5 parts by mass with respect to the total 100 parts by mass of the components (A) and (D), and more It is preferably 0.3 to 4 parts by mass, more preferably 0.5 to 3 parts by mass. When the amount of the curing accelerator (B') used is 0.1 parts by mass or more, the curing reaction proceeds sufficiently, and when it is 5 parts by mass or less, the storage stability of the thermosetting resin composition is good.

<Other additives>
Various additives can be added to the thermosetting resin composition of the present invention, if necessary. Other thermosetting resins such as organopolysiloxanes, silicone oils, epoxy resins other than the component (D), cyanate resins, etc. for improving the resin properties as long as the additives do not impair the effects of the present invention; thermoplastic resins; ; thermoplastic elastomer; organic synthetic rubber; light stabilizer; polymerization inhibitor; pigment; An ion trapping agent for improving electrical properties and a non-halogen flame retardant such as a phosphorus compound or a metal hydrate for imparting flame retardancy may be blended. Furthermore, a fluorine-containing material such as PTFE powder may be blended in order to improve dielectric properties.

Method for Producing Thermosetting Resin Composition The method for producing the thermosetting resin composition of the present invention is not particularly limited. For example, components (A), (B), (C), and optionally other components including (D) are blended in a predetermined composition ratio, and sufficiently uniformly mixed and stirred by a mixer or the like. Methods of dissolving, dispersing and/or melt-kneading are included. Each component may be blended simultaneously or separately, and may be mixed while being heated as necessary.

The device for mixing, etc. is not particularly limited, but specific examples include a lykai machine equipped with a stirring and heating device, a two-roll mill, a three-roll mill, a ball mill, a planetary mixer and a masscolloider. Appropriate combinations of devices may be used.

The thermosetting resin composition of the present invention is cured at a temperature of 120 to 250° C. for 1 to 24 hours to give a cured product with high heat resistance, low dielectric constant and low dielectric loss tangent. In addition, the composition may be cured by a method described later as appropriate depending on the application or form of the composition described in detail below.

The thermosetting resin composition of the present invention can be used as sealing materials for electronic component devices, thermosetting adhesives, adhesive films, circuit boards such as prepregs and multilayer printed wiring boards, solder resists, underfill materials, die bonding agents, and the like. It can be used for a wide range of applications, and can be particularly suitably used as a sealing material for electronic component devices.

The thermosetting resin composition of the present invention may be used as a resin composition produced by the above-described method as it is, may be used as a varnish, or may be formed into a film (i.e., a film as a laminated material). When a film-like laminate material is used, the softening point of the thermosetting resin composition is preferably 40 to 140° C. from the viewpoint of laminate molding.

[varnish]
The varnish contains the thermosetting resin composition of the present invention and an organic solvent, and the above-described component (A), the organic solvent and, if necessary, other components are blended, for example, in a predetermined composition ratio, It can be produced by kneading with a three-roll mill, ball mill, bead mill, sand mill, etc., if necessary, or by stirring with a planetary mixer, etc., if necessary.

Organic solvents used when the thermosetting resin composition of the present invention is used as a varnish include ethyl acetate, butyl acetate, cellosolve acetate, propylene glycol monomethyl ether acetate, acetic acid esters such as carbitol acetate; cellosolve, butyl carbitol. aromatic hydrocarbons such as toluene and xylene; amide solvents such as dimethylformamide, dimethylacetamide and N-methylpyrrolidone; ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone. In addition, you may use an organic solvent individually by 1 type or in combination of 2 or more types.

In addition, the solid component concentration (nonvolatile component concentration) of the thermosetting resin composition of the present invention in the varnish may be appropriately adjusted according to the intended use or form, for example, so that the solid component concentration is 30 to 90% by mass. It is preferable to blend an organic solvent, more preferably 40 to 80% by mass.

[Electronic parts]
The thermosetting resin composition of the present invention is particularly useful as a sealing resin material for semiconductor devices such as transistor type, module type, DIP type, SO type, flat pack type, and ball grid array type semiconductor devices. The method for sealing electronic components with the thermosetting resin composition of the present invention is not particularly limited, and conventional molding methods such as transfer molding, injection molding, and cast molding may be used.

[Thermosetting adhesive]
The thermosetting resin of the present invention can also be used as a thermosetting adhesive. For example, it is used as an adhesive for flexible printed circuit boards, an adhesive for semiconductor elements, and an adhesive for housings.

[Film-like laminated material]
A film-like laminate material has a resin composition layer comprising the thermosetting resin composition of the present invention on a support. As a method for producing the film-like laminate material, the thermosetting resin composition may be directly coated on the support, or may be coated as a varnish using a die coater or the like. When the varnish is applied, the organic solvent can be dried by heating or hot air blowing to form a resin composition layer on the support.

Examples of the support (support film) include polyolefin films such as polyethylene, polypropylene, and polyvinyl chloride; polyester films such as polyethylene terephthalate (PET) and polyethylene naphthalate; various plastic films such as polycarbonate films and polyimide films; ; metal foils such as copper foil and aluminum foil; Among them, from the viewpoint of versatility, a plastic film is preferable, and a PET film is more preferable. The support and the protective film described later may be subjected to surface treatment such as mud treatment and corona treatment. In addition, a mold release treatment may be performed with a mold release agent such as a silicone resin mold release agent, an alkyd resin mold release agent, or a fluororesin mold release agent.

[Adhesive film]
A specific embodiment of the film-like laminate material is an adhesive film.
As a method for producing an adhesive film, a varnish is prepared by the method described above, and this varnish is applied to a support using a die coater or the like, and the organic solvent is dried by heating or blowing hot air to obtain a resin. A method of forming a composition layer may be mentioned. The drying conditions are not particularly limited, but it is preferable to dry so that the content of the organic solvent in the resin composition layer is 10% by mass or less, preferably 5% by mass or less. Depending on the amount of organic solvent in the varnish and the boiling point of the organic solvent, for example, in the case of a varnish containing 30 to 60% by mass of organic solvent, the resin composition layer is dried at 50 to 150° C. for about 3 to 10 minutes. can be formed. If the composition is dried at a higher temperature for a long time, the curing reaction of the composition may progress and the composition may be cured.

Another method of producing an adhesive film is a method of producing it using an extruder equipped with a T-die. In this manufacturing method, a thermosetting resin composition prepared by melting and mixing each component is used instead of varnish.

The thickness of the resin composition layer of the adhesive film is preferably in the range of 10-120 μm. In particular, when the adhesive film is used for a circuit board, which will be described later, the thickness of the resin composition layer of the adhesive film is preferably equal to or greater than the thickness of the conductor layer of the circuit board. Since the thickness of the conductor layer of the circuit board is usually in the range of 5 to 70 μm, the thickness of the resin composition layer is preferably in the range of 10 to 100 μm. More preferably it is in the range of 80 μm.

A protective film conforming to the support may be further laminated on the surface of the resin composition layer that is not in contact with the support. In this case, the adhesive film includes a support, a resin composition layer formed on the support, and a protective film formed on the resin composition layer. Although the thickness of the protective film is not particularly limited, it can be, for example, 1 to 40 μm. By laminating the protective film, it is possible to prevent dust from adhering to the surface of the resin composition layer and scratches on the surface of the resin composition layer. The adhesive film can be wound into a roll and stored.

[Prepreg]
The prepreg contains the thermosetting resin composition of the present invention. It can be produced by curing.

As the reinforcing base material, for example, those commonly used as prepreg base materials such as glass cloth, quartz glass, aramid nonwoven fabric, and liquid crystal polymer nonwoven fabric can be used.

A method of impregnation or coating includes a hot melt method or a solvent method.
The hot-melt method is a method in which the thermosetting resin composition of the present invention in a molten state is directly applied to a reinforcing substrate using a die coater, or a film-like laminate material prepared by the method described above is laminated on the reinforcing substrate. The method.
The solvent method is a method in which the reinforcing substrate is immersed in the varnish produced by the method described above and then dried.
Further, the prepreg may be prepared by continuously thermally laminating the adhesive films produced by the above-described method from both sides of the reinforcing substrate under heating and pressure conditions. The support and protective film may be the same as those described above for the adhesive film.

By heating the reinforcing substrate impregnated or coated with the thermosetting resin composition of the present invention, for example, at 60 to 150 ° C. for 5 to 60 minutes, the thermosetting resin composition is half It becomes hardened. The prepreg of the present invention preferably contains 25 to 75% by mass of the thermosetting resin composition of the present invention with respect to the reinforcing substrate.

[Circuit board (multilayer printed wiring board)]
The circuit board of the present invention has an insulating layer that is a cured product of the thermosetting resin composition of the present invention. In addition, the circuit board refers to a board having a patterned conductor layer (circuit) formed on one side or both sides of the board as described above. Alternatively, a multilayer printed wiring board having patterned conductor layers (circuits) formed on both sides is also included. The surface of the conductor layer may be previously subjected to roughening treatment such as blackening treatment or copper etching.

As a method of forming an insulating layer on a circuit board, there is a method of applying the varnish prepared by the method described above to the circuit board, drying it, and curing it by heating. Specifically, a method of applying using a dispenser, drying at 60 to 150° C. for 0.5 to 2 hours, and curing by heating at 120 to 250° C. for 1 to 12 hours can be mentioned. Moreover, you may vacuum-dry as needed.

Another method of forming an insulating layer on a circuit board includes a method of laminating the film-like laminate material produced by the above method on one side or both sides of the circuit board using a vacuum laminator. When the film-like laminate material has a protective film, after removing the protective film, the film-like laminate material and the circuit board are preheated as necessary, and the film-like laminate material is pressurized and heated. Laminate on circuit board. In vacuum lamination, the thermocompression bonding temperature is preferably 60 to 160° C., the thermocompression pressure is preferably 0.1 to 1.8 MPa, and the thermocompression bonding time is preferably 20 to 400 seconds. After lamination, it is preferable to smoothen the laminated film-like laminate material by, for example, hot-pressing the film-like laminate material under normal pressure. The conditions for the smoothing treatment may be the same as the conditions for the thermocompression bonding of the laminate. Smoothing treatment can be performed with a commercially available laminator. The laminating treatment and the smoothing treatment may be performed continuously using the above-mentioned commercially available vacuum laminator.

After the film-like laminate material is laminated on the circuit board, the insulating layer can be formed by cooling to around room temperature, peeling off the support if necessary, and heating and curing the resin composition. The order of peeling off can be appropriately changed. Thereby, an insulating layer can be formed on the circuit board. The conditions for heat curing may be appropriately selected according to the type and content of the resin component in the resin composition, preferably 150° C. to 220° C. for 20 to 180 minutes, more preferably 160° C. to 210° C. is selected in the range of 30 to 120 minutes.

Still another method of forming an insulating layer on a circuit board includes a method of laminating the film-like laminate material produced by the above-described method on one side or both sides of the circuit board using a vacuum press. In this method, a general vacuum hot press is used to apply heat and pressure under reduced pressure to heat and cure the resin composition on the circuit board to form an insulating layer.

Moreover, the method of manufacturing a circuit board (multilayer printed wiring board) using the prepreg manufactured by the method mentioned above is also mentioned. It can be produced by laminating one or more prepregs of the present invention on an interior circuit board, sandwiching a metal plate with a release film interposed therebetween, and press-laminating under pressure and heating conditions.

After manufacturing the circuit board, the insulating layer formed on the circuit board is drilled to form via holes and through holes, the surface of the insulating layer is roughened, and plating is formed on the insulating layer. and a conductor layer can be produced. These steps can be performed according to a general method for manufacturing a circuit board or a multilayer printed wiring board.

EXAMPLES The present invention will be specifically described below by showing examples and comparative examples, but the present invention is not limited to the following examples.

Components used in Examples and Comparative Examples are shown below. In addition, in the following description, the part of compounding amount shows a mass part.
In addition, the composition ratio of the monomer and oligomer of the component (A) is a value calculated from the peak area ratio by GPC measurement.

(A) Cyclopentadiene Compound (A-1) Monosubstituted Cyclopentadiene Compound [Synthesis Example 1]
Add 17.6 g of sodium hydride (1.1 equivalents, 60%, dispersed in liquid paraffin) to a 500 mL four-necked glass flask equipped with a stirrer, cooling condenser and thermometer, then wash with hexane. to remove the liquid paraffin in which sodium hydride is dispersed from the system. After that, 250 mL of tetrahydrofuran was added to the four-necked flask, and the atmosphere in the system was changed to a nitrogen atmosphere. 26.4 g (1.0 equivalent) of cyclopentadiene was added dropwise at 0° C. while stirring vigorously, and the generated hydrogen gas was discharged out of the system. After dropping all the cyclopentadiene, the inside of the system was heated to 60° C., 54.9 g (0.9 equivalent) of 4-(chloromethyl)styrene was dropped, and the mixture was stirred at 60° C. for 30 minutes. Then, 50 g of water was added to stop the reaction, and tetrahydrofuran was distilled off under reduced pressure. A mixed solvent of xylene and hexane (50% by volume) was added to dilute the organic layer, and the organic layer was washed several times with hydrochloric acid (10% by mass) and water. After separating the aqueous layer, the organic layer was dried by adding anhydrous sodium sulfate, and the solvent was distilled off under reduced pressure to obtain a product (A'-1). Table 1 shows the composition of the product (A'-1). The monomer (4-(cyclopentadienylmethyl)styrene) contained in the product (A'-1) readily oligomerizes at room temperature, and the product (A'-1) uses the monomer as a monomer. Oligomers (oligomers of 4-(cyclopentadienylmethyl)styrene) were included.

Subsequently, the obtained product (A'-1) was added to a 500 mL four-neck glass flask equipped with a stirrer, a cooling condenser and a thermometer, and stirred at 80°C for 1 hour under vacuum. Oligomerization accompanied by dimerization of some cyclopentadienyl groups was carried out to obtain the product (A-1). The composition of the product (A-1) is shown in Table 1, and the structure of the dimer of the monomer contained in the product (A-1) is shown in the formula below. Also, the weight average molecular weight (Mw) of the product (A-1) was 2,400.

(A-2) Disubstituted Cyclopentadiene Compound [Synthesis Example 2]
Add 33.6 g of sodium hydride (2.1 equivalents, 60%, dispersed in liquid paraffin) to a 500 mL four-necked glass flask equipped with a stirrer, cooling condenser and thermometer, then wash with hexane. to remove the liquid paraffin in which sodium hydride is dispersed from the system. After that, 250 mL of tetrahydrofuran was added to the four-necked flask, and the atmosphere in the system was changed to a nitrogen atmosphere. 26.4 g (1.0 equivalent) of cyclopentadiene was added dropwise at 0° C. while stirring vigorously, and the generated hydrogen gas was discharged out of the system. After dropping all the cyclopentadiene, the inside of the system was heated to 60° C. and a mixture of 45.8 g (0.75 equivalent) of 4-(chloromethyl)styrene and 12.7 g (0.25 equivalent) of benzyl chloride was added dropwise. and stirred at 60° C. for 30 minutes. After that, 30.6 g (1.0 equivalent) of allyl chloride was added dropwise, and the mixture was stirred at 60°C for 30 minutes. 50 g of water was added to terminate the reaction, and tetrahydrofuran was distilled off under reduced pressure. A mixed solvent of xylene and hexane (50% by volume) was added to dilute the organic layer, and the organic layer was washed several times with hydrochloric acid (10% by mass) and water. After separating the aqueous layer, the organic layer was dried by adding anhydrous sodium sulfate, and the solvent was distilled off under reduced pressure to obtain a product (A'-2). Table 1 shows the composition of the product (A'-2). The monomers (4-(allylcyclopentadienylmethyl)styrene and 4-(allylcyclopentadienylmethyl)benzene) contained in product (A'-2) readily oligomerize at room temperature to give product (A' -2) includes oligomers (4-(allylcyclopentadienylmethyl)styrene oligomers, 4-(allylcyclopentadienylmethyl)benzene oligomers and 4-(allylcyclopentadienylmethyl) benzene oligomers containing the above monomers. enylmethyl)styrene and 4-(allylcyclopentadienylmethyl)benzene).

Subsequently, the obtained product (A'-2) was added to a 500 mL four-necked glass flask equipped with a stirrer, a cooling condenser and a thermometer, and stirred at 80°C for 1 hour under vacuum. Oligomerization accompanied by dimerization of some cyclopentadienyl groups was carried out to obtain the product (A-2). The composition of the product (A-2) is shown in Table 1, and the structure of the dimer of the monomer contained in the product (A-2) is shown in the following formula. The weight average molecular weight (Mw) of product (A-2) was 3,000.

表１の生成物（Ａ－１）及び生成物（Ａ－２）のオリゴマー割合のうち、かっこ書で表記した値は、生成物中の二量体の割合を示す。

Among the oligomer ratios of product (A-1) and product (A-2) in Table 1, the values in parentheses indicate the ratio of dimers in the product.

(B) Curing accelerator (B-1) dicumyl peroxide (Percumyl D: manufactured by NOF Corporation)

(C) Inorganic filler (C-1) Fused spherical silica (RS-8225/53C: manufactured by Tatsumori Co., Ltd.)
(C-2) Dry surface-treated silica (C- 3) Dry surface-treated silica (C -4) Silica (C-5) dry surface-treated with 0.3 parts of 3-methacryloxypropyltrimethoxysilane (KBM-503: manufactured by Shin-Etsu Chemical Co., Ltd.) per 100 parts of (C-1) ) Dry surface-treated silica (C-6) (C-1) with 0.3 parts of vinyltrimethoxysilane (KBM-1003: manufactured by Shin-Etsu Chemical Co., Ltd.) per 100 parts of (C-1) Dry surface-treated silica with 0.3 parts of p-styryltrimethoxysilane (KBM-1403: manufactured by Shin-Etsu Chemical Co., Ltd.) per 100 parts

(D) Adhesion aid having one or more epoxy groups in one molecule (D-1) Isocyanuric acid-type epoxy resin (TEPIC-S: manufactured by Nissan Chemical Industries, Ltd.)
(D-2) 3-glycidoxypropyltrimethoxysilane (KBM-403: manufactured by Shin-Etsu Chemical Co., Ltd.)

[Examples 1-10, Comparative Examples 1-2]
A resin composition was obtained by mixing each component with a blending (parts by mass) shown in Table 2 with a mixer and then further mixing with a three-roll mill.

<Glass transition temperature>
The resin composition was cast into a mold and cured by performing step curing at 150° C. for 1 hour and further at 180° C. for 2 hours to obtain a cured product of 5 mm×5 mm×15 mm. These cured products were set in a thermal dilatometer (TMA8140C, manufactured by Rigaku Corporation). After setting the temperature increase program to a temperature increase rate of 5 ° C./min and setting a constant load of 49 mN to be applied to the test piece of the cured product, measure the dimensional change of the test piece between -60 ° C. and 300 ° C. It was measured. The relationship between this dimensional change and temperature was plotted on a graph. The glass transition temperature was obtained from the thus obtained graph of dimensional change and temperature.

<Relative permittivity, dielectric loss tangent>
After applying the resin composition on a PET film with a thickness of 38 μm with a roller coater so that the thickness after drying is 50 μm, step curing is performed at 150 ° C. for 1 hour and further at 180 ° C. for 2 hours. Hardened. After that, a network analyzer (E5063-2D5 manufactured by Keysight Co., Ltd.) and a stripline (manufactured by Keycom Co., Ltd.) were connected to measure the dielectric constant and dielectric loss tangent of the film at a frequency of 10 GHz.

<Long-term heat resistance>
The resin composition was cast into a mold and cured by performing step curing at 150° C. for 1 hour and further at 180° C. for 2 hours to obtain a cured product of 50 mmφ×3 mmt. The cured product was stored in a thermostat at 250° C. for 1,000 hours, and the mass after storage was measured. [Mass of cured product after storage/Mass of cured product before storage]×100 (%) was evaluated as mass retention.

<Water absorption rate>
The resin composition was cast into a mold and cured by performing step curing at 150° C. for 1 hour and further at 180° C. for 2 hours to obtain a cured product of 50 mmφ×3 mmt. The weight of the cured product was measured before and after it was treated under saturated steam at 121° C. and 2.1 atm for 24 hours, and the water absorption was calculated from the weight increase rate.

<Adhesion test with silicon>
A resin composition was applied to a silicon chip having a size of 10 mm x 10 mm so that the adhesion area was 4 mm 2 , and after placing the silicon chip on it, it was heated at 150 ° C. for 1 hour and further at 180 ° C. for 2 hours. It was cured by step curing to prepare a test piece. Using this test piece, the bond tester DAGE-SERIES-4000PXY (manufactured by DAGE) was used to measure the shear adhesive strength at room temperature (25° C.) as an evaluation of the adhesive strength.

<Adhesion test with copper>
A resin composition was applied to a copper frame having a size of 10 mm x 10 mm so that the area to be adhered was 4 mm 2 , and a silicon chip was placed thereon. It was cured by step curing to prepare a test piece. Using this test piece, the bond tester DAGE-SERIES-4000PXY (manufactured by DAGE) was used to measure the shear adhesive strength at room temperature (25° C.) as an evaluation of the adhesive strength.

<Bending strength, bending elastic modulus>
The resin composition was cast into a mold conforming to JIS K 6911:2006, and subjected to step curing at 150° C. for 1 hour and then at 180° C. for 2 hours to prepare a test piece. The obtained test piece was measured for flexural strength and flexural modulus at room temperature (25° C.) according to JIS K 6911:2006.

As shown in Table 2, the cured product of the resin composition of the present invention has a high glass transition temperature (Tg), small dielectric constant and dielectric loss tangent values, and excellent long-term heat resistance. Furthermore, the water absorption rate is low. Therefore, the resin composition of the present invention is suitable as a material for high frequency devices.

Claims (11)

(A) the following formula (1)

(In formula (1), R represents a group selected from an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, and an aryl group having 6 to 10 carbon atoms, and n is an integer of 1 to 4 and x1 and x2 are independently 0, 1 or 2, provided that when R represents an alkyl group or an aryl group, x1 is 1 or 2 and 1 ≤ x1 + x2 ≤ 4)
A cyclopentadiene compound and/or oligomer thereof represented by (B) a curing accelerator and (C) a thermosetting inorganic filler surface-treated with a silane coupling agent having an amino group, a methacrylic group, a vinyl group, or a styryl group. elastic resin composition. The thermosetting resin composition according to claim 1, wherein the oligomer of the compound represented by formula (1) of component (A) contains a dimer and/or trimer of the compound represented by formula (1). . 3. The thermosetting resin composition according to claim 1, wherein the oligomer of the compound represented by formula (1) as component (A) has a dicyclopentadiene ring. 4. The thermosetting resin composition according to any one of claims 1 to 3, wherein the proportion of the oligomer of the compound represented by formula (1) in component (A) is 10 to 90% by mass. In addition to components (A) to (C),
5. The thermosetting resin composition according to any one of claims 1 to 4, further comprising (D) an adhesion promoter having one or more epoxy groups in one molecule. A sealing material for electronic parts, comprising the thermosetting resin composition according to any one of claims 1 to 5 . 7. The sealing material according to claim 6 , wherein the electronic component is a semiconductor device. A thermosetting adhesive comprising the thermosetting resin composition according to any one of claims 1 to 5 . An adhesive film in which the thermosetting resin composition according to any one of claims 1 to 5 is layer-formed on a support film. A prepreg in which a sheet-like fiber base material is impregnated with the thermosetting resin composition according to any one of claims 1 to 5 . A multilayer printed wiring board having an insulating layer formed from a cured product of the thermosetting resin composition according to any one of claims 1 to 5 .