JP7228572B2 - 構造化光投射 - Google Patents

構造化光投射 Download PDF

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Publication number
JP7228572B2
JP7228572B2 JP2020511922A JP2020511922A JP7228572B2 JP 7228572 B2 JP7228572 B2 JP 7228572B2 JP 2020511922 A JP2020511922 A JP 2020511922A JP 2020511922 A JP2020511922 A JP 2020511922A JP 7228572 B2 JP7228572 B2 JP 7228572B2
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Japan
Prior art keywords
pattern
light
emitting elements
light emitting
array
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JP2020511922A
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Japanese (ja)
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JP2020531851A5 (enExample
JP2020531851A (ja
Inventor
ロッシ，マルクス
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Ams Sensors Singapore Pte Ltd
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Heptagon Micro Optics Pte Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G02B27/20—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective for imaging minute objects, e.g. light-pointer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
    • G01B11/2536—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object using several gratings with variable grating pitch, projected on the object with the same angle of incidence
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
    • G02B27/425—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4272—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having plural diffractive elements positioned sequentially along the optical path
    • G02B27/4277—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having plural diffractive elements positioned sequentially along the optical path being separated by an air space
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B30/00—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/20—Lamp housings
    • G03B21/2006—Lamp housings characterised by the light source
    • G03B21/2013—Plural light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/20—Lamp housings
    • G03B21/208—Homogenising, shaping of the illumination light
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/005—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
    • H01S5/042—Electrical excitation ; Circuits therefor
    • H01S5/0425—Electrodes, e.g. characterised by the structure
    • H01S5/04256—Electrodes, e.g. characterised by the structure characterised by the configuration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/42—Arrays of surface emitting lasers
    • H01S5/423—Arrays of surface emitting lasers having a vertical cavity

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Stroboscope Apparatuses (AREA)
JP2020511922A 2017-08-28 2018-08-28 構造化光投射 Active JP7228572B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201762551012P 2017-08-28 2017-08-28
US62/551,012 2017-08-28
PCT/SG2018/050433 WO2019045645A1 (en) 2017-08-28 2018-08-28 STRUCTURED LIGHT PROJECTION

Publications (3)

Publication Number Publication Date
JP2020531851A JP2020531851A (ja) 2020-11-05
JP2020531851A5 JP2020531851A5 (enExample) 2021-10-07
JP7228572B2 true JP7228572B2 (ja) 2023-02-24

Family

ID=65527877

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020511922A Active JP7228572B2 (ja) 2017-08-28 2018-08-28 構造化光投射

Country Status (6)

Country Link
US (1) US20200355494A1 (enExample)
EP (1) EP3676655A4 (enExample)
JP (1) JP7228572B2 (enExample)
KR (1) KR20210020858A (enExample)
CN (1) CN111295614A (enExample)
WO (1) WO2019045645A1 (enExample)

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* Cited by examiner, † Cited by third party
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US10607064B2 (en) * 2018-05-21 2020-03-31 Himax Technologies Limited Optical projection system and optical projection method
CN113169522B (zh) * 2018-09-25 2022-12-30 瑞识科技（深圳）有限公司 垂直腔面发射激光器(vcsel)阵列
JP7273249B2 (ja) * 2019-09-04 2023-05-12 エイエムエス－オスラム エイジア パシフィック プライヴェット リミテッド ３次元センサモジュールのためのドットプロジェクタの設計および作製
CN110966961A (zh) * 2019-12-06 2020-04-07 上海创波光电科技有限公司 超高速相位偏移固定光栅顺序投影装置
US11195291B1 (en) * 2020-02-19 2021-12-07 Facebook Technologies, Llc Dynamic illumination control for depth determination
EP3913754A1 (en) * 2020-05-19 2021-11-24 Prophesee Light source for structured light, structured light projection apparatus and system
CN114079709B (zh) * 2020-08-07 2024-04-12 安霸国际有限合伙企业 用于卷帘式快门传感器的驱动器机构以获取结构光图案
KR102698086B1 (ko) * 2021-10-07 2024-08-22 심휘경 자동차 라이팅 그릴용 광학회절소자 표면을 갖는 고 개구율 프로젝션 광학계
US20230133647A1 (en) * 2021-10-28 2023-05-04 Lumentum Operations Llc Non-zero angle orientation of an emitter array relative to a rectilinear axis of a submount
CN114371554B (zh) 2021-12-31 2024-08-13 嘉兴驭光光电科技有限公司 用于分束的衍射光学元件及其设计方法、结构光投射器
WO2023242191A1 (en) * 2022-06-15 2023-12-21 Nil Technology Aps Generating and projecting a pseudo-random optical pattern of dots

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130038881A1 (en) 2011-08-09 2013-02-14 Primesense Ltd. Projectors of Structured Light
CN106990660A (zh) 2017-05-09 2017-07-28 深圳奥比中光科技有限公司 结构光投影模组
CN107026392A (zh) 2017-05-15 2017-08-08 深圳奥比中光科技有限公司 Vcsel阵列光源

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US20160025993A1 (en) * 2014-07-28 2016-01-28 Apple Inc. Overlapping pattern projector
CN103309137B (zh) * 2012-03-15 2015-05-20 苹果公司 光电设备及用于制造光电设备的方法
CN103941402B (zh) * 2014-03-22 2016-03-16 中南大学 产生具有旋转角动量的涡旋光线和涡旋光线阵列的方法
CN104111539B (zh) * 2014-07-25 2016-04-13 鲁东大学 一种阵列光斑产生器及产生方法
US20160377414A1 (en) * 2015-06-23 2016-12-29 Hand Held Products, Inc. Optical pattern projector
CN205318033U (zh) * 2016-01-08 2016-06-15 京东方科技集团股份有限公司 一种双视裸眼3d显示器件及液晶显示装置
CN106569382B (zh) * 2016-10-26 2018-07-06 深圳奥比中光科技有限公司 激光投影仪及其深度相机
CN107063124B (zh) * 2017-06-01 2020-10-27 南京华捷艾米软件科技有限公司 光学组件和3d测量设备

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130038881A1 (en) 2011-08-09 2013-02-14 Primesense Ltd. Projectors of Structured Light
CN106990660A (zh) 2017-05-09 2017-07-28 深圳奥比中光科技有限公司 结构光投影模组
CN107026392A (zh) 2017-05-15 2017-08-08 深圳奥比中光科技有限公司 Vcsel阵列光源

Also Published As

Publication number Publication date
KR20210020858A (ko) 2021-02-24
EP3676655A1 (en) 2020-07-08
EP3676655A4 (en) 2021-06-02
US20200355494A1 (en) 2020-11-12
WO2019045645A1 (en) 2019-03-07
CN111295614A (zh) 2020-06-16
JP2020531851A (ja) 2020-11-05

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