JP7198008B2 - Ｕｖオゾン－プラズマ複合処理方法及び処理装置 - Google Patents

Ｕｖオゾン－プラズマ複合処理方法及び処理装置 Download PDF

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JP7198008B2
JP7198008B2 JP2018131485A JP2018131485A JP7198008B2 JP 7198008 B2 JP7198008 B2 JP 7198008B2 JP 2018131485 A JP2018131485 A JP 2018131485A JP 2018131485 A JP2018131485 A JP 2018131485A JP 7198008 B2 JP7198008 B2 JP 7198008B2
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cell
cells
plasma
substrate
irradiation
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JP2019017387A (ja
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秀一 高橋
美智男 大平
英夫 中田
隼人 鈴木
昌悟 宮田
周吾 遠山
淳 藤田
恵一 福田
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Keio University
Ebara Jitsugyo Co Ltd
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Ebara Jitsugyo Co Ltd
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JP2018131485A 2017-07-11 2018-07-11 Ｕｖオゾン－プラズマ複合処理方法及び処理装置 Active JP7198008B2 (ja)

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JP7335595B2 (ja) * 2019-08-28 2023-08-30 公立大学法人大阪 多孔質体の改質方法および改質装置
JP7618197B2 (ja) * 2020-08-21 2025-01-21 公立大学法人大阪 骨再生促進方法
JP2023158436A (ja) * 2022-04-18 2023-10-30 エステック株式会社 培養器具及びその製造方法
JP2025074535A (ja) * 2023-10-30 2025-05-14 ウシオ電機株式会社 紫外線処理装置及び紫外線処理方法

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WO2016136251A1 (ja) 2015-02-25 2016-09-01 荏原実業株式会社 細胞担持用基材及びその製造方法

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JPS63198976A (ja) * 1987-02-13 1988-08-17 Sumitomo Electric Ind Ltd 細胞培養用基材

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WO2016136251A1 (ja) 2015-02-25 2016-09-01 荏原実業株式会社 細胞担持用基材及びその製造方法

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