JP7146798B2 - 段階的多孔性構造体を備える流体の通過流のためのデバイス - Google Patents
段階的多孔性構造体を備える流体の通過流のためのデバイス Download PDFInfo
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Description
図6に示された段階的な構造体(平均(マクロ)気孔率66%で、式1から計算されるように、中心における72%から周辺における64%までの気孔率変化)が、CO2メタン化反応において、均一の(マクロ)気孔率と充填床の従来の触媒粉末とを伴う3DFD一体構造体(それぞれ70%および74%)と実験的に比較された。触媒粉末は、レーザー回折法によって測定されるD90粒径=25μm(つまり、25μm以下の大きさを有する粒子の体積で90%)を有する。メタンへの二酸化炭素のメタン化または触媒変換(水素化)は、サバチエ反応とも呼ばれる。この反応は、よく知られている触媒の高度に発熱の処理(ΔH298K=-165kJ/mol)である。74%の気孔率を有する3DFD構造体は、ステンレス鋼粉末を含む繊維を0.4mmの直径のノズル(繊維直径aに等しい)で押し出し、層内の隣接する繊維同士の間に1mmの一定の間隔nを有する図2にあるような繊維を積み重ねることによって製造された。70%の気孔率を有する構造体は、n=0.8mmを除いて、74%の構造体と同じ処理パラメータで製造された。ステンレス鋼構造体は、浸漬被覆によって12wt%のNi/Al2O3で被覆された。石英管型反応器(直径24mm、長さ100mm)が使用され、連続した温度測定のために石英管の入口側および出口側に設置されたK型熱電対が搭載された。触媒は、反応器の真ん中に充填され、石英ウールで固定された。反応器は炉の真ん中に置かれた。異なるマクロ気孔率を有する試料の公平な比較を行うために、同じ量の触媒が各々の実験に対して使用された。反応試験の前に、触媒が、100ml/minの全速度および450℃の温度(10℃/minの加熱速度)において、大気圧の下で2時間にわたってH2/He(80/20%)の連続流れの下で活性化された。還元の後、炉の温度がヘリウムの連続流れの下で反応温度まで調節された。メタン化反応が、大気圧の下で250℃から450℃の間の温度で実施された。二酸化炭素および水素が、ヘリウム搬送ガスと共に、C02:H2:He=1:4:15の送り込み組成において、100ml/minの全速度で反応器に連続的に送り込まれた。
異なる種類の多孔性構造体を通じての圧力損失Δpが、電子マイクロマノメータを使用して空塔速度の関数として測定された。3つの構造体、すなわち、3mmの直径のアルミナビーズが充填されたもの、実施例1のものと同一の段階的な構造体、実施例1のものと同一の74%の均一な気孔率を有する構造体が調べられた。
11 容器
12 流体入口
13 流体出口
14 全体の流体の流れの方向
15 多孔性構造体
16 繊維
17 流れの方向14に対して直交する方向
31、32、33、34 層
51、52 繊維
81、82 繊維
90 単位細孔セル
111 壁
112 冷却または加熱の通路
151、152、153 層
154 入口端
155 出口端
156 中心領域
157 中間領域
158 周辺領域
P1、P2、P3 気孔率
Claims (17)
- 流体の通過流のためのデバイス(10)であって、
壁(111)、流体入口(12)および流体出口(13)を備える容器(11)であって、前記流体入口および前記流体出口は、全体的な流れ方向(14)を定める、容器(11)と、
前記容器において前記流体入口と前記流体出口との間に配置される相互に連結された細孔を有する一体の多孔性構造体(15)であって、前記多孔性構造体は、前記多孔性構造体と前記壁との間に熱伝導を提供するために前記壁(111)に結合され、前記多孔性構造体は、前記全体的な流れ方向に対して交差する第1の方向(17)に沿って気孔率勾配を備える、多孔性構造体(15)と、
を備えるデバイス(10)において、
前記気孔率勾配は、前記壁に近接した第1の場所(158)における第1の気孔率(P3)と、前記第1の場所に対して前記壁から離れた第2の場所(156)における、前記第1の気孔率より大きい第2の気孔率(P1)との間で、前記第1の方向に沿って発達し、前記第2の気孔率と前記第1の気孔率との間の差は、少なくとも4%であることを特徴とするデバイス(10)。 - 前記第1の方向は、前記全体的な流れ方向に対して垂直な平面において延びる、請求項1に記載のデバイス。
- 前記第2の気孔率と前記第1の気孔率との間の差は、少なくとも6%である、請求項1または2に記載のデバイス。
- 前記多孔性構造体は、50%から80%の間の平均気孔率を有する、請求項1から3のいずれか一項に記載のデバイス。
- 前記第1の気孔率は、40%から85%の間であり、前記第2の気孔率は、45%から90%の間である、請求項1から4のいずれか一項に記載のデバイス。
- 前記多孔性構造体は、前記全体的な流れ方向に沿って均一な気孔率を有する、請求項1から5のいずれか一項に記載のデバイス。
- 前記多孔性構造体は、前記全体的な流れ方向に沿って第2の気孔率勾配を備える、請求項1から5のいずれか一項に記載のデバイス。
- 前記第2の気孔率勾配は、前記流体入口(12)から前記流体出口(13)に向かって減少する気孔率を備える、請求項7に記載のデバイス。
- 前記多孔性構造体は、互いに付着させられる繊維(16)の配置を備え、前記繊維は、平行な層(151、152、153)で配置され、前記層同士は積み重ねられる、請求項1から8のいずれか一項に記載のデバイス。
- 前記繊維は、20μmから20mmの間の直径を有する、請求項9に記載のデバイス。
- 連続した層の繊維が互いに侵入し、前記連続した層の前記繊維の間の侵入深さ(c)と前記繊維の直径(a)との間の比率が、0.1から0.5の間である、請求項9または10に記載のデバイス。
- 同じ層の隣接する繊維同士の間の間隔(n)が、10μmから50mmの間である、請
求項9から11のいずれか一項に記載のデバイス。 - 少なくとも1つの層における前記繊維同士の間の前記間隔は、前記気孔率勾配を得るために前記第1の場所と前記第2の場所との間で変化する、請求項12に記載のデバイス。
- 熱交換器である、請求項1から13のいずれか一項に記載のデバイス。
- 化学反応器である、請求項1から13のいずれか一項に記載のデバイス。
- 前記多孔性構造体は、触媒を備える、請求項15に記載のデバイス。
- メタンへの二酸化炭素の変換のための、請求項15または16に記載のデバイスの使用。
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EP17163707.7 | 2017-03-29 | ||
EP17163707.7A EP3381546A1 (en) | 2017-03-29 | 2017-03-29 | Devices for through-flow of fluids comprising graded porous structures |
PCT/EP2018/058243 WO2018178312A1 (en) | 2017-03-29 | 2018-03-29 | Devices for through-flow of fluids comprising graded porous structures |
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KR (1) | KR102525748B1 (ja) |
CN (1) | CN110650793B (ja) |
WO (1) | WO2018178312A1 (ja) |
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EP3613505A1 (de) * | 2018-08-24 | 2020-02-26 | Basf Se | Verfahren zur mikroextrusion von formkörpern durch mehrere mikroextrusionsdüsen |
EP3647020A1 (en) * | 2018-11-05 | 2020-05-06 | Basf Se | Catalyst, catalyst carrier or absorbent monolith of stacked strands |
CN111434377B (zh) * | 2019-01-11 | 2022-07-15 | 中国石油化工股份有限公司 | 一种盘管微反应器和一种微反应器系统 |
US20200409398A1 (en) * | 2019-06-25 | 2020-12-31 | Intel Corporation | Device, system and method for providing microchannels with porous sidewall structures |
WO2021013652A1 (en) | 2019-07-19 | 2021-01-28 | Basf Se | Catalyst, catalyst carrier or absorbent monolith of stacked strands having zig-zag or helical longitudinal channels |
US20220314209A1 (en) * | 2019-07-19 | 2022-10-06 | Basf Se | Three-dimensional porous catalyst, catalyst carrier or absorbent structure of stacked strands |
CN115517828A (zh) * | 2022-09-06 | 2022-12-27 | 深圳先进技术研究院 | 组织工程支架的打印方法、打印系统、终端及存储介质 |
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JP3229595B2 (ja) * | 1998-12-18 | 2001-11-19 | 日本碍子株式会社 | 排ガス浄化装置 |
CA2386107C (en) * | 2000-08-03 | 2005-07-05 | Ngk Insulators, Ltd. | Ceramic honeycomb structure |
DE60336824D1 (de) * | 2002-09-05 | 2011-06-01 | Ngk Insulators Ltd | Wabenstruktur |
JP2009011921A (ja) * | 2007-07-04 | 2009-01-22 | Tanaka Kikinzoku Kogyo Kk | ディーゼル排ガス浄化用フィルター |
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JP2012245511A (ja) | 2011-05-31 | 2012-12-13 | Masashige Kimura | 高付価物質変換方法および高付価物質変換装置 |
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US20200101435A1 (en) | 2020-04-02 |
US10695743B2 (en) | 2020-06-30 |
CN110650793B (zh) | 2021-10-15 |
CN110650793A (zh) | 2020-01-03 |
KR20190139906A (ko) | 2019-12-18 |
EP3600644A1 (en) | 2020-02-05 |
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WO2018178312A1 (en) | 2018-10-04 |
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