JP7116871B2 - Coating device and coating/drying/curing method - Google Patents

Description

TECHNICAL FIELD The present invention relates to a coating device and a coating/drying/curing method, and more particularly to a coating device and a coating/drying/curing method capable of coating a film forming liquid on the outer peripheral edge surface of a substrate.

Printed wiring boards using glass epoxy materials, composite materials, paper phenol materials, etc. are widely used as substrates for mounting electronic components. The glass epoxy material is obtained by impregnating a layer of glass fiber cloth with an epoxy resin. The composite material has glass cloth on the surface and cellulose paper or non-woven fabric as the core material. Paper phenolic material is kraft paper impregnated with phenolic resin.
When these glass epoxy materials, composite materials, and paper phenol materials are subjected to a cutting process, fine dust made of epoxy resin, glass fiber, or the like is generated at the cut portion. Such fine dust causes poor contact of the circuit board and degradation of quality. Therefore, it is preferable to remove the dust generated during the cutting of the board when manufacturing the printed wiring board.
Moreover, even if the dust is removed from the end face of the cut portion of the printed wiring board, the end face of the printed wiring board is fragile, and there is a possibility that the end face of the printed wiring board may collapse during use and generate more dust.

Therefore, the applicant of the present application has previously proposed a coating apparatus and a coating method capable of preventing collapse of the edge portion by coating a film forming liquid on the peripheral portion including the edge portion of the substrate to form a film (Patent Reference 1).
In the coating apparatus described in Patent Document 1, a pair of coating rollers arranged opposite to each other so as to sandwich the edge of the substrate are moved along the peripheral edge of the substrate, so that the film-forming liquid is applied to the peripheral edge including the edge of the substrate. applied.
Furthermore, the applicant of the present application has proposed a coating apparatus and a coating method capable of applying a film-forming liquid not only to the end face of the substrate periphery but also to the end face of a hole formed in the substrate by an inkjet method (Patent Document 2). .

In addition, Patent Document 3 discloses a sponge that has a contact surface that contacts the surface to be coated and holds the coating liquid by penetrating it, a dispenser that drops the coating liquid from vertically above the sponge, and a sponge. It has a moving mechanism that moves the sponge at a constant speed while bringing the contact surface into contact with the inner surface of the front substrate along the periphery of the front substrate with a constant contact pressure, and has a high resistance with a constant width and constant thickness. An apparatus is disclosed that can apply a film.

[Problems to be solved by the invention]
Recently, the types of substrates to be coated have increased, and not only substrates such as motherboards, which were targeted by the above-described coating apparatuses, but also substrates after they have been cut into finer pieces have become targets for coating. In other words, substrates to be coated are becoming smaller and more mass-produced. The film-forming liquid is applied along the edge surface of the substrate in the case of the method using the coating roller, the ink-jet method, and the method of moving the sponge. For this reason, there has been a situation in which it is not possible to sufficiently cope with the miniaturization and increase in the number of substrates.

Japanese Patent Application Laid-Open No. 2015-3303 (Patent No. 5735047) Japanese Patent Application Laid-Open No. 2018-8210 Japanese Unexamined Patent Application Publication No. 2006-7101

Means to solve the problem and its effect

SUMMARY OF THE INVENTION It is an object of the present invention to provide a coating apparatus and a coating/drying/curing method capable of efficiently coating the end surface of a substrate with a film forming liquid.

In order to achieve the above object, the coating device (1) according to the present invention comprises:
a porous elastic body having continuous pores whose one end side moves back and forth toward the outer peripheral edge surface of the substrate on the substrate mounting table;
a film-forming liquid supply means positioned at or near the other end of the porous elastic body and supplying the film-forming liquid to the porous elastic body;
The film forming liquid is applied to the outer peripheral edge surface of the substrate by bringing the end surface of the porous elastic body on the one end side into contact with the outer peripheral edge surface of the substrate. there is

According to the coating apparatus (1), since the pores of the porous elastic body are composed of continuous pores, the film-forming liquid permeates the entire porous elastic body quickly and evenly. The film forming liquid is applied to the outer peripheral edge surface of the substrate on the substrate mounting table by contact with the outer peripheral edge surface of the substrate on the substrate mounting table due to contact with the back and forth movement of the porous elastic body accompanied by a slight pressure, thereby forming a film. The liquid is applied evenly and quickly.
Further, even if the outer peripheral edge surface of the substrate has a certain amount of unevenness, the film-forming liquid is evenly applied to each portion of the outer peripheral edge surface because the porous elastic body has elasticity.
Therefore, compared with the conventional coating of the film forming liquid, it is possible to apply a good quality film forming liquid with a uniform thickness and improve the efficiency of applying the film forming liquid. This is particularly effective when the substrate to be coated is small.
In addition, since the structure of the coating device is simple, the cost of coating the film-forming liquid can be reduced by lowering the cost of the coating device, improving the efficiency of the coating work, and facilitating maintenance.

Further, the coating device (2) according to the present invention is the coating device (1) described above,
The porous elastic body and the film-forming liquid supply means are provided on both sides of the substrate mounting table,
It is characterized in that the film forming liquid is applied simultaneously to the outer peripheral edge faces on both sides of the substrate.
According to the coating apparatus (2), since the film-forming liquid coating units including the porous elastic body and the film-forming liquid supply means are provided on both sides of the substrate, one coating operation can be performed. Thus, the film-forming liquid can be simultaneously applied to the outer peripheral edge surfaces on both sides of the substrate. In addition, since the porous elastic body can be brought into contact with the end faces on both sides of the substrate at the same time so that the substrate is lightly pressed from both sides, the position of the substrate when the porous elastic body is in contact with the substrate can be changed. is stabilized, and the application of the film-forming liquid can be made more stable.
Therefore, it is possible to improve the efficiency and speed of application of the film-forming liquid, and to form a better quality coating film.

Further, the coating device (3) according to the present invention is the coating device (1) or (2),
the substrate mounting tables are arranged at a predetermined center-to-center interval in a direction perpendicular to the moving direction of the one end of the porous elastic body;
two adjacent substrates on the substrate mounting table are arranged in a state rotated by a predetermined angle in a range facing the one end side of the porous elastic body;
It is characterized in that the film-forming liquid is simultaneously applied to the outer peripheral edge surfaces of the two substrates.
According to the coating apparatus (3), the substrates positioned side by side are rotated by a predetermined angle with respect to the substrate surface, that is, a substantially horizontal surface, and the film-forming liquid is simultaneously applied to the outer peripheral edge surfaces of the respective substrates. is applied. Therefore, when the substrate is moved to the position of the adjacent substrate and is rotated by a predetermined angle, the film forming liquid is applied again to the two outer peripheral edge surfaces of the substrate which are in a vertical and horizontal relationship. will be
Further, when the film-forming liquid is applied on both sides of the substrate, the film-forming liquid is applied to all the outer peripheral edge surfaces of the substrate by the application before and after one movement.
Therefore, the speed of applying the film-forming liquid to the end face of the substrate can be greatly increased, and the film-forming liquid can be applied with extremely high working efficiency.

Further, the coating device (4) according to the present invention is the coating device (3) described above,
The porous elastic body has a width such that the film-forming liquid can be applied to the outer peripheral edge surfaces of the two substrates positioned side by side with one porous elastic body. there is
According to the coating device (4), since the porous elastic body has a width that allows the film-forming liquid to be applied to the outer peripheral edge surfaces of the two substrates, one porous elastic body can be used. It is possible to simultaneously apply the film-forming liquid to the outer peripheral edge surfaces of the two substrates by a single application by .
Therefore, compared to coating with one porous elastic body for each substrate, the mechanism for advancing and retracting the porous elastic body is simplified, and maintenance of the porous elastic body is facilitated.

Further, the coating device (5) according to the present invention is the coating device (4),
The one end side of the porous elastic body is characterized in that it has a shape corresponding to the size and/or the shape of the outer peripheral end surface of the two adjacent substrates.
According to the coating apparatus (5), the shape of one end of the porous elastic body corresponds to the shape of the outer peripheral edge surfaces of the two adjacent substrates. Even if the shapes of the substrates are different, a single porous elastic body can form a uniform coating film with a uniform thickness on the outer peripheral edge face of each of the substrates.
Therefore, a good coating film is formed on each end surface of the substrate, and the quality of the substrate can be improved.

Further, the coating device (6) according to the present invention is the coating device (1) or (2),
Two sets of the porous elastic body and the film-forming liquid supply means are provided at a predetermined interval,
the substrate mounting tables are arranged at a predetermined center-to-center interval in a direction perpendicular to the moving direction of the one end of the porous elastic body;
two sets of the porous elastic bodies and the two substrates on the substrate mounting table located on the film-forming liquid supply means are arranged in a state rotated by a predetermined angle with respect to each other;
It is characterized in that the film-forming liquid is simultaneously applied to the outer peripheral edge surfaces of the two substrates.
According to the coating apparatus (6), two sets of the porous elastic body and the film-forming liquid supply means are provided at a predetermined interval, and the substrate positioned on each of the two sets is positioned on the substrate surface, that is, approximately The substrates are rotated by a predetermined angle with each other on a horizontal plane, and the film-forming liquid can be simultaneously applied to the outer peripheral edge surfaces of the respective substrates. Therefore, when the substrate is moved by a predetermined distance and is rotated by a predetermined angle, the film forming liquid is applied again. will be
Further, when the film-forming liquid is applied on both sides of the substrate, the film-forming liquid is applied to all the outer peripheral edge surfaces of the substrate by applying the film-forming liquid once or twice before and after the movement. become.
In particular, since two sets of the porous elastic body and the film-forming liquid supply means are provided at a predetermined interval, one porous elastic body can be applied to the outer peripheral edge surface of one substrate. A film-forming liquid can be applied. Therefore, the film-forming liquid can be uniformly and reliably applied to the outer peripheral edge surface of the substrate. Furthermore, even if the shape of each outer peripheral edge of the substrate is different, the shape of the end surface of the porous elastic body can be matched to the shape of each outer peripheral edge of the substrate, so that the film-forming liquid can be applied more uniformly and reliably. can be applied.
Therefore, the application of the film-forming liquid to the end surface of the substrate can be greatly speeded up, the film-forming liquid can be applied with extremely high work efficiency, and a good quality coating film can be obtained.

Further, the coating device (7) according to the present invention is any one of the coating devices (1) to (6),
The film-forming liquid supply means located on the other end side of the porous elastic body is characterized by including a film-forming liquid tank containing the film-forming liquid.
According to the coating apparatus (7), the means for supplying the film-forming liquid to the porous elastic body includes a film-forming liquid tank containing the film-forming liquid located on the other end side of the porous elastic body. By immersing the other end of the substrate in the film-forming liquid contained in the film-forming liquid tank, the porous elastic body can be permeated with the film-forming liquid.
Therefore, the film-forming liquid can be easily and reliably supplied to the porous elastic body. In addition, the structure of the film-forming liquid supply device is simple, and there are advantages in that the cost is low and maintenance is easy.

Further, the coating device (8) according to the present invention is any one of the coating devices (3) to (7),
A plurality of substrate mounting tables are provided side by side on a substrate feeding conveyor that moves in a direction perpendicular to the moving direction of the porous elastic body, and the substrate feeding conveyor moves stepwise at the predetermined center-to-center spacing. It is characterized by being composed of
According to the coating apparatus (8), the substrate mounting table is provided side by side on a substrate feeding conveyor that moves in a direction perpendicular to the moving direction of the porous elastic body. Since it is configured to move stepwise at a center-to-center interval, each time it moves one step, film formation is performed on both sides of the substrate with respect to the outer peripheral edge end surfaces of the substrates positioned in a state of being rotated by a predetermined angle with respect to each other. Liquid application is performed.
Therefore, by applying the film forming liquid twice before and after the movement of each step, the film forming liquid is applied to all the outer peripheral edge surfaces of the substrate. That is, by applying the film-forming liquid in one step movement, a coating film can be formed on all four outer peripheral edge surfaces of one substrate.
Therefore, the efficiency of applying the film-forming liquid to the end surface of the substrate can be significantly improved.

Further, the coating device (9) according to the present invention is the coating device (8),
One of the two adjacent substrates on the substrate mounting table is configured to rotate by a predetermined angle with respect to the step movement direction while the substrate feeding conveyor moves one step. .
According to the coating apparatus (9), one of the two adjacent substrates rotates by a predetermined angle with respect to the step movement direction while the substrate feeding conveyor moves one step. Therefore, when the substrates are placed on the substrate placing table on the substrate feeding conveyor, it is not necessary to transfer the substrates in a state in which the substrates are alternately rotated by a predetermined angle.
Therefore, the substrate can be smoothly placed on the substrate placement table, and erroneous operations such as transfer can be prevented.

Further, the coating device (10) according to the present invention is the coating device (8),
The predetermined spacing is twice the predetermined center-to-center spacing, and one of the two substrates positioned on the substrate mounting table with the predetermined spacing therebetween moves two steps by the substrate feeding conveyor. It is characterized in that it is configured to rotate by a predetermined angle with respect to the direction of step movement while moving.
According to the coating apparatus (10), one of the substrates at both ends of the three substrates positioned side by side is moved at a predetermined angle with respect to the step movement direction while the substrate feeding conveyor moves two steps. Rotate. Therefore, when the substrates are placed on the substrate placing table on the substrate feeding conveyor, it is not necessary to transfer the substrates in a state in which the substrates are alternately rotated by a predetermined angle.
Therefore, the substrate can be smoothly placed on the substrate placement table, and erroneous operations such as transfer can be prevented.

Further, the coating device (11) according to the present invention is the coating device (9) or (10),
The rotation of the substrate is caused by the attractive force of the S pole or N pole of the magnet provided on the rotating shaft of the substrate mounting table and the N pole or S pole of the magnet provided facing and fixed to the substrate mounting table, or It is characterized in that it is configured to be generated by repulsive force.
According to the coating apparatus (11), the rotation of the substrate is caused by the use of the magnet provided on the rotating shaft of the substrate mounting table, so that the configuration of the apparatus is extremely simple and simple. can do.
Therefore, the substrate mounting table can be reliably rotated by an inexpensive device, and the film forming liquid can be coated without malfunction.

Further, the coating device (12) according to the present invention is any one of the coating devices (8) to (11),
In a substrate feeding unit, the substrate is placed on the substrate placing table on the substrate feeding conveyor by a pick-up robot from the substrate tray on the substrate tray carrying conveyor,
The substrate unloading section is characterized in that the substrate is transferred from the substrate mounting table on the substrate feeding conveyor to the substrate tray on the substrate tray transport conveyor by a pick-up robot.
According to the coating apparatus (12), the substrate is transferred from the substrate tray on the substrate tray transport conveyor in the substrate feeding section to the substrate mounting table on the substrate feeding conveyor, and the The pick-up robot transfers the substrate from the substrate mounting table on the substrate feeding conveyor to the substrate tray on the substrate tray transport conveyor.
Therefore, the mounting of the substrate on the substrate mounting table on the substrate feeding conveyor and the removal of the substrate from the substrate mounting table on the substrate feeding conveyor can be performed quickly and accurately.
Therefore, it is possible to greatly speed up the substrate transfer work and improve the efficiency of the handling work.

Further, the coating device (13) according to the present invention is the coating device (12),
A film-forming liquid drying and curing section is provided between the film-forming liquid supply means and the substrate taking-out section.
According to the coating device (13), the film-forming liquid is dried and cured while the substrate is moving along with the movement of the substrate-feeding conveyor. It can be realized with extremely high work efficiency.

Further, the coating/drying and curing method (1) according to the present invention is
Using the coating device (12), after the substrate is transferred to the substrate tray at the substrate take-out part, the substrate tray is taken out from the coating device, and a film is formed at a place outside the coating device or in a drying device. It is characterized by drying and hardening the liquid.

According to the above coating/drying and curing method (1), when the film-forming liquid is thermosetting and requires time for drying and curing, or when the thickness of the coating film is thick and drying and curing requires time, the non-dried state can be used. The substrate tray containing the substrates on which the coating film has been formed can be moved to a place outside the coating device or to the drying device, and a large number of substrates stored in a plurality of substrate trays can be collectively dried and cured. .
Therefore, the efficiency of the drying and curing work can be improved, and the drying and curing of the film-forming liquid can be performed over a long period of time, so that a stable and good-quality coating film can be formed.

BRIEF DESCRIPTION OF THE DRAWINGS It is a perspective view which shows the structure of the whole coating device which concerns on embodiment of this invention. It is a perspective view showing the composition of the principal part of the coating device concerning an embodiment. FIG. 4A is a partially omitted cross-sectional view taken along line XX' shown in FIG. (b) is a partially omitted plan view. FIG. 4 is a diagram showing a state in which a film forming liquid is applied to the outer peripheral edge surface of a substrate by a coating apparatus according to an embodiment, (a) is a partially omitted cross-sectional view taken along line XX' shown in (b); (b) is a partially omitted plan view. It is a perspective view which shows the structure of the principal part of the coating device which concerns on another embodiment. 1 is a perspective view showing an example of a substrate mounting table in a coating apparatus according to an embodiment, showing a state in which the substrate mounting table is fixed to a substrate feeding conveyor; FIG. FIG. 4A is a plan view for explaining that a substrate mounting table is rotated by a magnet by 90° in the coating apparatus according to the embodiment, and FIG. (b) shows a state in which the two substrate mounting tables have reached the coating positions of the film forming liquid coating section. FIG. 8A is a plan view for explaining another method of rotating the substrate mounting table by 90° with a magnet in the coating apparatus according to the embodiment, and FIG. (b) is a state in which one substrate mounting table is positioned in the middle of the film forming liquid applying section, and (c) is a state in which two substrate mounting tables are positioned at the center positions of the film forming liquid applying sections. It shows the state reached. It is a perspective view showing the vicinity of the drying and curing section in the coating device according to the embodiment.

Embodiments of a coating apparatus and a coating/drying/curing method according to the present invention will be described below with reference to the drawings. The embodiments described below show preferred specific examples of the present invention, and are subject to various technically preferable limitations. It is not limited to these forms unless stated otherwise.

FIG. 1 is a perspective view showing the overall configuration of a coating device according to an embodiment of the invention.
The coating apparatus 1 according to the embodiment includes a film-forming liquid coating section 20 that coats a film-forming liquid on the outer peripheral edge surface (hereinafter simply referred to as the end surface) of the substrate 10, feeds the substrate 10 into the film-forming liquid coating section 20, A conveyer-type substrate feeding unit 30 for feeding the substrate 10 coated with the film forming liquid from the film forming liquid coating unit 20, a film forming liquid drying and curing unit 40 for drying and curing the film forming liquid coated on the end face of the substrate 10, and a plurality of The substrate tray transfer section 50 transfers the substrate tray 51 on which the substrate 10 is placed from the substrate setting section 60 to the substrate unloading section 70 .

The substrate setting unit 60 transfers the substrate 10 from the substrate tray 51 on the substrate tray transport conveyor 52 to the substrate placing table 31 (see FIG. 2) of the substrate feeding unit 30 by transfer means 61 such as a pickup robot. , in a line.
In the substrate feeding section 30 , the substrates 10 on the substrate mounting tables 31 arranged in a line are transferred to the substrate unloading section 70 via the film forming liquid applying section 20 and the film forming liquid drying and curing section 40 .
The substrate take-out part 70 is configured such that the substrate 10 is transferred from the substrate mounting table 31 to the substrate tray 51 on the substrate tray transport conveyor 52 by transfer means 71 such as a pickup robot.
The film forming liquid is applied to the edge surface of the substrate 10 by the coating device 1 having the above configuration, and a film is formed by curing the film forming liquid.

FIG. 2 is a perspective view showing the configuration of the main part of the coating device according to the embodiment. In FIG. 2, the feeding direction of the substrate is from left to right, contrary to the case of FIG.
3A and 3B are diagrams showing the state before the film forming liquid is applied to the outer peripheral edge surface of the substrate by the coating apparatus according to the embodiment, and FIG. Partially omitted sectional view, (b) is a partially omitted plan view.
4A and 4B are diagrams showing a state in which the film forming liquid is applied to the end face of the substrate by the coating apparatus according to the embodiment, and FIG. An omitted cross-sectional view, and (b) is a partially omitted plan view.

As shown in FIGS. 2 to 4, the main part of the film-forming liquid applying portion 20 includes a flat porous elastic body 21 for applying the film-forming liquid to the end surfaces 10a and 10b of the substrate 10, and a porous elastic body 21. 21 to contact the end surfaces 10a and 10b of the substrate 10; film formation liquid tank 23.

The advance/retreat driving means 22 supports the porous elastic body 21 , advances the substrate 10 side of the porous elastic body 21 toward the end surfaces 10 a and 10 b of the substrate 10 , and pushes the porous elastic body onto the end surfaces 10 a and 10 b of the substrate 10 . It has a function of bringing the end faces 21aa and 21ab of the one end side 21a of the member 21 into contact with each other and retracting after the contact. It is preferable that the advancing/retreating driving means 22 support the flat porous elastic body 21 in its entirety in the lateral direction and to such an extent that permeation of the film-forming liquid is not hindered. The advance/retreat driving means 22 includes a drive device 22a such as an electric cylinder, a porous elastic body support arm 22b that supports the porous elastic body 21 and transmits the advance/retreat movement of the drive device 22a, and a drive device that supports the drive device 22a. It is configured including a support frame 22c.
The contact of the one end side 21a of the porous elastic body 21 with the end faces 10a and 10b of the substrate 10 is a contact including a light pressing force to the extent that the film forming liquid is applied to the end faces 10a and 10b of the substrate 10. It is preferable that the contact is such that the film-forming liquid contained in the elastic body 21 permeates to the edge surfaces 10 a and 10 b of the substrate 10 .

The porous elastic body 21 has a porous portion containing continuous pores. , the film-forming liquid 23a quickly permeates the porous elastic body 21 from the other end 21b to the one end 21a. Therefore, the end surfaces 21aa and 21ab of the one end side 21a are brought into contact with the end surfaces 10a and 10b of the substrate 10, and after the film forming liquid 23a is applied to the end surfaces 10a and 10b of the substrate 10, the substrate 10 is once retreated, and the one end side 21a is moved again. Before the end faces 21aa and 21ab come into contact with the end faces 10a and 10b of the substrate 10, the one end side 21a of the porous elastic body 21 is sufficiently supplied with the film forming liquid 23a required for coating.

The contact including light pressing of the one end side 21a of the porous elastic body 21 to the end surfaces 10a and 10b of the substrate 10 varies depending on the elasticity of the porous elastic body 21, the properties of pores, the properties of the film-forming liquid 23a, and the like. It is preferable to select appropriate contact conditions according to each condition.
When the one end side 21a of the porous elastic body 21 moves forward and backward toward the end surfaces 10a and 10b of the substrate 10, the length, thickness, hardness, etc. of the porous elastic body 21 are different. The other end side 21b may also move back and forth. Therefore, the size and shape of the film-forming liquid tank 23 for storing the film-forming liquid 23a are preferably set in consideration of the movement of the other end 21b, the properties of the porous elastic body 21, and the like.

The porous elastic body 21 is composed of a spongy material having continuous pores such as urethane, polyethylene, rubber, or the like. In many cases, the thickness of the end surfaces 10a and 10b of the substrate 10 is as thin as 1 mm to several mm. It is preferable to have liquid absorbency and to have as fine a pore as possible.
The thickness of the porous elastic body 21 is preferably thicker than the end surfaces 10a and 10b of the substrate 10. It is preferable to select a thickness such that the film forming liquid 23a is not applied to the lower surface.

FIGS. 2 to 4 show an example in which one porous elastic body 21 applies the film-forming liquid 23a to the end surfaces 10a and 10b of the two substrates 10, respectively.
Also, as shown in the figure, the two substrates positioned side by side are spaced apart from each other so that the outer peripheral edges of the substrates do not come into contact with each other.
The width of the porous elastic body 21 is set so that the end surfaces 10a and 10b of the two substrates 10 can be coated with the film forming liquid 23a at the same time. That is, it is set to a width obtained by adding at least the width of the end faces 10a and 10b of the two substrates 10 and the width d between the substrates 10 spaced apart (see FIGS. 3 and 4).
Moreover, the center axes of the two substrate mounting tables 31 have a predetermined spacing, and the predetermined spacing between the center axes corresponds to the width of the end faces 10a and 10b of the two substrates 10 and the distance between the substrates 10 spaced apart. It is set to a value obtained by adding the width d.

There are various shapes of the substrate 10, such as a case where the length and width are different, and a case where the edges are uneven. Even in such a case, for example, as shown in FIGS. The film forming liquid 23a can be applied to the end surfaces 10a and 10b of the substrate 10 at the same time.

FIGS. 3 and 4 show the case where the film forming liquid applying section 20 is arranged only on the right side of the drawing, but as shown in FIG. 3 and 4, the two substrates 10 are rotated by a predetermined angle, for example, 90° in the main surface of the substrate, that is, the horizontal plane. , the film-forming liquid 23a can be applied to the four end surfaces 10a and 10b of the two substrates 10 by applying the film-forming liquid 23a once.

When the film-forming liquid 23a is applied to both sides of the substrate 10 at the same time, the substrate 10 is lightly pressed from both sides at the same time. There is an advantage that the application of 23a is stable.
2 to 4 show an example in which one porous elastic body 21 applies the film-forming liquid 23a to the end surfaces 10a and 10b of two substrates 10 positioned side by side. 10 may be combined with one porous elastic body 21 , or the film-forming liquid applying section 20 may be arranged only on one side of the substrate 10 .

Regarding the supply of the film-forming liquid 23a to the porous elastic body 21, an example of immersing the other end 21b of the porous elastic body 21 in the film-forming liquid 23a and permeating the film-forming liquid 23a is shown. The film-forming liquid 23a may be supplied to the porous elastic body 21 by a method other than immersing the other end 21b of the porous elastic body 21 in the film-forming liquid 23a.
For example, in the vicinity of the other end 21b of the porous elastic body 21, the film-forming liquid 23a is sprayed onto the porous elastic body 21, or the porous elastic body 21 is passed through the space where the film-forming liquid 23a is sprayed. It may be a method or the like.

In addition, film-forming liquid amount adjusting means for adjusting the absorption amount of the film-forming liquid 23a in the porous elastic body 21 may be provided in the vicinity of the one end side 21a, which is the contact portion of the porous elastic body 21. FIG. For example, when the film-forming liquid 23a is absorbed in a large amount, the porous elastic body 21 may be lightly compressed to squeeze out the film-forming liquid 23a. A method of sucking the film-forming liquid 23a by allowing the film-forming liquid 23a to be absorbed may also be adopted.

The substrate feeding section 30 is a device that moves the substrate 10 placed on the substrate mounting table 31 in the substrate setting section 60 to the substrate unloading section 70 via the film forming liquid applying section 20 and the film forming liquid drying and curing section 40 . The substrate feeding section 30 is constructed by attaching substrate mounting tables 31 in a row at regular intervals to a substrate feeding conveyor 32 (see FIG. 6) that moves in a circular motion in a vertical plane. Further, the substrate feed conveyor 32 is controlled by the control unit (not shown) so that the film forming liquid 23a is applied to the substrate 10 on the substrate mounting table 31 by the film forming liquid applying unit 20 so that the substrate feeding conveyor 32 is stopped for the time required for the application. It is configured to be controlled by That is, the substrate feeding conveyor 32 is of a step movement type that repeats movement and stop.

As will be described later, when the film forming liquid 23a is simultaneously applied to the end surfaces 10a and 10b of the two substrates 10, the movement distance of one step is the distance between the centers of the two substrate mounting tables 31 and 31. FIG.
As described above, the two substrates 10 are coated with the film forming liquid coating units 20 provided on both sides of the substrates 10 with respect to the end surfaces 10a and 10b of the two substrates 10 arranged in a state where the substrates 10 are rotated by 90°. When applying the film-forming liquid 23a to the end faces 10a, 10b on both sides of the substrate 10, the film-forming liquid 23a can be applied to all the end faces 10a, 10b of the two substrates 10 by one-step movement. target.

A method for rotating two adjacent substrates 10 by 90° will be described later with reference to FIGS.

FIG. 5 is a perspective view showing a configuration near a film-forming liquid coating section 20A of a coating device according to another embodiment. In the case of the film-forming liquid applying section 20A shown in FIG. 5, two sets of film-forming liquid supplying means such as the porous elastic body 21 and the film-forming liquid tank 23 are provided at a predetermined interval. This predetermined interval is the interval between the centers of the adjacent substrate mounting tables 31 or twice the interval between the centers. However, the interval may be twice or more. Also, FIG. 5 shows an example in which the film-forming liquid applying sections 20A are provided on both sides of the substrate mounting table 31 .

The two sets of porous elastic bodies 21 and the film-forming liquid supply means such as the film-forming liquid tank 23 have the same configuration. The film-forming liquid 23 a is applied by the porous elastic body 21 . At each position where the film-forming liquid 23a is applied, the two substrates 10 are arranged in a state rotated by 90° relative to each other. Therefore, when the film forming liquid applying units 20A are provided on both sides of the substrate 10, it is possible to simultaneously apply the film forming liquid 23a to all the end surfaces of the substrate 10 by the two sets of film forming liquid applying units 20A. It is possible.

In the case of the film forming liquid application section 20A, the film forming liquid 23a is applied to one end surface 10a, 10b of the substrate 10 by one porous elastic body 21. FIG. Therefore, it is preferable that the end surfaces 21aa and 21ab on the one end side 21a of the porous elastic body 21 have shapes corresponding to the corresponding end surfaces 10a and 10b of the substrate 10, respectively. In this case, the end surfaces 10a and 10b of the substrate 10 can be coated with the film forming liquid 23a more uniformly.

In FIG. 5, the distance between the two sets of porous elastic bodies 21 and the film-forming liquid supply means such as the film-forming liquid tank 23 is twice the distance between the centers of the substrate mounting table 31, and 1 An example in which two substrate mounting tables 31 are positioned is shown. However, if the center-to-center spacing of the substrate mounting table 31 is narrow, or if the size of the substrate 10 is smaller than the center-to-center spacing of the substrate mounting table 31, two sets of the porous elastic bodies 21 and the film The spacing between the film forming liquid supply means such as the forming liquid tank 23 may be the center-to-center spacing of the substrate mounting table 31 . In that case, the substrates 10 on the substrate mounting tables 31 adjacent to each other are rotated by 90°. The film forming liquid 23a is simultaneously applied to the end faces.

Regarding the application of the film-forming liquid 23a, when the distance between the two sets of porous elastic bodies 21 and the film-forming liquid supplying means such as the film-forming liquid tank 23 is the same as the distance between the centers of the substrate mounting table 31, the substrate The film forming liquid 23a is applied every time the feed conveyor 32 moves by one step. Further, when the distance between the two sets of porous elastic bodies 21 and the film-forming liquid supply means such as the film-forming liquid tank 23 is twice the distance between the centers of the substrate placing table 31, the substrate feeding conveyor 32 is arranged in two. The coating of the film forming liquid 23a is performed each time the stepping movement is performed.

The rotation of the substrate 10, that is, the rotation of the substrate holder 31a of the substrate mounting table 31, in both the film forming liquid applying units 20 and 20A is as follows.
In the substrate setting section 60, when the substrate 10 is transferred from the substrate tray 51 on the substrate tray transport conveyor 52 to the substrate placement table 31 on the substrate feeding conveyor 32 by means such as a pick-up robot, the substrates 10 are alternately placed. A method is adopted in which the substrates 10 are arranged in the same direction without being rotated by 90°, and then one of the substrates 10 positioned side by side is rotated by 90°.
For example, the direction of the substrates 10 sent in the same direction to the film forming liquid applying section 20 is rotated by 90° on the main surface of the substrate 10 only at the downstream stage of the film forming liquid applying section 20 . That is, the substrate receiver 31a (see FIG. 6) of the substrate mounting table 31 at the downstream stage is rotated by 90°.
A method using a magnet is simple and effective for rotating the substrate receiver 31a by 90°.

FIG. 6 is a perspective view showing an example of the substrate mounting table in the coating apparatus according to the embodiment, showing a state in which the substrate mounting table is fixed to the substrate feeding conveyor. Note that FIG. 6 shows a state in which a part of the substrate is removed from the substrate mounting table from the state in which the substrate is mounted on the substrate mounting table.
The substrate mounting table 31 has a structure in which a central shaft 36 is fixed to a fixed table 33 that moves along with the movement of the substrate feeding conveyor 32, and a substrate receiver 31a is fixed to a rotary shaft 34 that rotates around the central shaft 36. . Therefore, the substrate receiver 31a of the substrate mounting table 31 rotates about the central axis 36. As shown in FIG. At least one rotating shaft magnet 35 is attached to the outer surface of the rotating shaft 34 .
Furthermore, a fixed magnet 24 (see FIG. 7) is provided at a position facing the rotating shaft magnet 35 of the substrate mounting table 31 at the position where the film forming liquid 23a is applied to the substrate 10 on the substrate mounting table 31. FIG. This fixed magnet 24 is fixed to a frame or the like of the coating apparatus 1 .

FIG. 7 is a plan view for explaining how the substrate receiver of the substrate mounting table is rotated 90° by a magnet in the coating apparatus according to the embodiment, and FIG. FIG. 2(b) shows a state in which the two substrate mounting tables have reached the coating positions of the film forming liquid coating section, respectively. Note that FIG. 7 shows only two adjacent substrates among the plurality of substrates continuously moving side by side.

In the film forming liquid applying section 20, a fixed magnet 24 is provided at a coating center line position P1, which is a position facing the rotating shaft 34a of the substrate mounting table 31 at the center of the coating section on the upstream side where the film forming liquid 23a is applied. is provided. Rotating shaft magnets 35 are fixed to the sides of the rotating shafts 34 a and 34 b of each substrate mounting table 31 . Here, for example, when the surfaces on the surface side (the side of the rotating shafts 34a and 34b) of the fixed magnet 24 are N poles, the surface sides of the rotating shaft magnets 35 of the rotating shafts 34a and 34b are S poles.
In FIG. 7, the cross-sectional shape of the rotating shafts 34a and 34b is shown as a rectangle so that the rotation can be easily understood. good too.

As shown in FIG. 7(a), when the substrate mounting table 31 moves and the center of the rotating shaft 34a reaches the coating center line position P2, an attractive force is almost generated between the fixed magnet 24 and the rotating shaft magnet 35. Therefore, the rotating shaft 34a does not rotate.
Next, when the center of the rotating shaft 34a of the substrate mounting table 31 reaches the coating center line position P1 and the center of the rotating shaft 34b reaches the coating center line position P2, that is, the rotating shaft 34a is fixed. When it reaches the position facing the magnet 24, as shown in FIG. 7B, a large attractive force acts between the fixed magnet 24 and the rotating shaft magnet 35, and by the action of this attractive force, the stationary magnet 24 and the rotating shaft magnet 35 are the closest and face each other.

At this time, the rotary shaft 34a rotates 90° around the central axis from the state in which the substrate mounting table 31 is positioned at the coating center line position P2 of the film forming liquid coating section 20. FIG.
On the other hand, the rotating shaft 34b located at the coating center line position P2 is hardly affected by the fixed magnet 24, and thus is maintained in the conveyed state without rotating.
That is, the substrate 10 on the substrate mounting table 31 is rotated 90° from the transported state at the position of the coating center line position P1, and is transported without being rotated at the position of the coating center line position P2. maintained in condition.

With such a mechanism, the end surfaces 10a and 10b of the outer peripheries of the two substrates 10 positioned side by side in the film forming liquid applying section 20 are rotated 90 degrees with respect to each other.
When the substrate mounting table 31 reaches the coating center line position P1 in each step, the stationary magnet 24 and the rotating shaft magnet 35 stop at the position facing each other. During this stop, the end surfaces 10a and 10b of the two substrates 10 are coated with the film forming liquid 23a.
Therefore, for example, in the case of the substrate 10 on the substrate receiver 31a fixed to the rotating shaft 34a, the film forming liquid 23a is applied to the end surface 10a by the film forming liquid applying portions 20 on both sides of the substrate 10 at the application center line position P2. is applied, and the film forming liquid 23a is applied to both end surfaces 10b of the substrate 10 rotated by 90° at the application center line position P1 moved by one step (see FIGS. 3 and 4). As a result, all the end surfaces 10a and 10b of the substrate 10 are coated with the film forming liquid 23a by moving only one step.
The distance between the centers of the substrate mounting table 31, that is, the distance between the coating center line positions P1 and P2 in FIG. The value is obtained by adding the width d (see FIGS. 3 and 4).

FIG. 8 is a plan view for explaining another example in which the substrate on the substrate mounting table is rotated by a magnet by 90° in the coating apparatus according to the embodiment. (b) is a state in which one substrate mounting table is positioned between the two coating positions of the film forming liquid applying unit; (c) is a state in which two substrates are mounted; The table shows a state in which each has reached the coating position of the film forming liquid coating section.

In the film forming liquid applying unit 20, fixed magnets are provided at positions facing the rotating shafts 34a and 34b of the substrate mounting table 31 at respective application center line positions P1 and P2 of the two applying portions for applying the film forming liquid 23a. 24a, 24b are provided. Two rotating shaft magnets 35a and 35b are fixed to the side portions of the rotating shafts 34a and 34b of two adjacent substrate mounting tables 31 in a relationship of 90° with respect to the center of rotation. Here, for example, when the surfaces of the fixed magnets 24a and 24b on the surface side (the side of the rotating shafts 34a and 34b) are N poles, the surfaces of the rotating shaft magnets 35a and 35b are S poles.
In FIG. 8, the cross-sectional shape of the rotating shafts 34a, 34b, etc. is shown as a rectangle so that the rotation can be easily understood. .

As shown in FIG. 8A, when the substrate mounting table 31 moves and the center of the rotating shaft 34a reaches a position facing the fixed magnet 24b, the fixed magnet 24b and the rotating shaft magnet 35a are fixed by the attractive force between the fixed magnet 24b and the rotating shaft magnet 35a. The magnet 24b and the rotating shaft magnet 35a face each other.
When the substrate mounting table 31 moves further and reaches the middle between the fixed magnet 24a and the fixed magnet 24b, as shown in FIG. Counterclockwise rotation occurs due to the attractive force and the attractive force between the fixed magnet 24b and the rotary shaft magnet 35a, and the rotary shaft 34a is rotated by approximately 45°. Further, when the next substrate mounting table 31 approaches the fixed magnet 24b, the rotary shaft 34b rotates clockwise due to the attractive force between the fixed magnet 24b and the rotary shaft magnet 35a.

Further, when the substrate mounting table 31 moves downstream and reaches the coating center line positions P1 and P2 of the respective substrates 10 of the film forming liquid coating section 20, as shown in FIG. The rotating shaft magnet 35b, the fixed magnet 24b, and the rotating shaft magnet 35a face each other.
At this time, the rotating shaft 34a rotates by 90 degrees, and the rotating shaft 34b does not rotate and is in a state before clockwise rotation.
That is, the substrate 10 on the substrate mounting table 31 is rotated 90° from the transported state at the position of the fixed magnet 24a, and is maintained at the transported state without rotation at the position of the fixed magnet 24b. be.
With such a mechanism, the end surfaces 10a and 10b of the outer peripheral edges of the substrates 10 on the two substrate mounting tables 31 positioned side by side in the film forming liquid applying section 20 are rotated 90 degrees with respect to each other.

As described above, the rotating shaft 34b is not rotated at the position of the fixed magnet 24b and the application center line position P2, and the rotating shaft 34a is rotated by 90° at the position of the fixed magnet 24a and the application center line position P1. .
When the fixed magnets 24a and 24b are provided at the two application center line positions P1 and P2, and the two magnets are provided at the rotation shafts 34a and 34b of the substrate mounting table 31, the application center line positions P1 and P2 are respectively arranged. At this position, the substrate mounting table 31 stops with attractive force acting between both the fixed magnets 24a, 24b and the rotating shaft magnets 35b, 35a, so that a stable stopped state can be obtained.

The substrate mounting table 31 is used by being circularly moved by the substrate feeding section 30 . Therefore, it is preferable that the orientation of the traveling direction of the substrate mounting table 31 is always the same.
On the other hand, as shown in FIG. 8C, the positions of the rotating shaft magnets 35a and 35b on the rotating shafts 34a and 34b rotate counterclockwise before reaching the fixed magnet 24b and after passing through the fixed magnet 24a. They are in a relationship rotated by 90°. After passing through the fixed magnet 24a, in order to correct the rotating shafts 34a and 34b to the state before reaching the fixed magnet 24b, for example, on the downstream side of the fixed magnet 24a or the upstream side of the fixed magnet 24b, A fixed magnet having an N pole on the surface side may be arranged.

However, after correcting the rotation, the rotating shafts 34a and 34b are slightly rotated counterclockwise due to the action of the attractive force. is preferred. In particular, in the substrate setting section 60 , before the substrate 10 is placed on the substrate mounting table 31 , it is preferable that the substrate receivers 31 a of the substrate mounting table 31 are aligned in the advancing direction of the substrate feeding conveyor 32 . For this purpose, it is preferable to align the substrate receptacles 31 a by providing guides for aligning the substrate receptacles before the substrates 10 are mounted on the substrate receptacles 31 a of the substrate mounting table 31 . Further, it is preferable to provide a certain amount of resistance to the rotation of the board receiver 31a so that the board receiver 31a is not out of alignment due to vibration or the like when the board feed conveyor 32 moves stepwise.

Regardless of the distance between the fixed magnet 24a and the rotating shafts 34a and 34b, as is clear from the description with reference to FIG. It can be in a state where

In the example shown in FIG. 8, the rotating shaft magnets 35a and 35b are provided at 90° to the central axis 36 of the rotating shafts 34a and 34b of the substrate mounting table 31. Four magnets may be provided in relation to degrees.
In addition, regarding the use of magnets, it is preferable to select the optimum use conditions in consideration of the use of repulsive force, the magnetic force of the magnet, the distance between the magnets, the size and shape of the substrate, and the like.
The use of magnets for the rotation of the substrate mounting table 31 is extremely effective because it is possible to obtain precise effects with an inexpensive and simple device configuration.

FIG. 9 is a perspective view showing a film forming liquid drying and curing section in the coating device according to the embodiment. The film forming liquid drying and curing section 40 is provided between the film forming liquid applying section 20 , 20</b>A and the substrate unloading section 70 .
A film forming liquid 23a is applied to the end surfaces 10a and 10b of the substrate 10 by the film forming liquid applying portions 20 and 20A. After that, the substrate 10 is sent to the film forming liquid drying and curing section 40 by the substrate feeding conveyor 32 that moves stepwise, and the film forming liquid is applied to the end faces 10a and 10b of the substrate 10 in the film forming liquid drying and curing section 40. 23a is dried and cured. In particular, since the substrate feeding conveyor 32 moves stepwise, the film forming liquid drying and curing unit 40 also has a short time to stop, during which the film forming liquid 23a applied to the end surfaces 10a and 10b of the substrate 10 is stopped. can be effectively dried and cured.
In the film-forming liquid drying and curing section 40, the film-forming liquid 23a is dried and cured by irradiation with UV light, heating, or the like according to the characteristics of the film-forming liquid 23a. In the case of irradiating UV light, an irradiation unit having a lamp for irradiating UV light, a UV light generation adjustment unit, an irradiation position adjustment unit, and the like are provided inside the shielding cover 41 . Note that the irradiation unit is arranged so as to face the end surfaces 10a and 10b of the substrate 10 coated with the film forming liquid 23a.

When the film-forming liquid 23a is of the UV light drying-hardening type, the applied film-forming liquid 23a usually dries and hardens in seconds. Therefore, after the film forming liquid 23a is applied to the substrate 10 and before the film forming liquid 23a is applied to the next substrate 10, that is, after the substrate feeding conveyor 32 of the substrate feeding section 30 moves one step, The film forming liquid 23a can be easily dried and cured by irradiating UV light until the next step.

When the film-forming liquid 23a is of the electron beam curing type, the film-forming liquid drying and curing section 40 is configured so that electron beams are irradiated from an irradiation section provided therein.
When the film-forming liquid 23a is of a heat-drying-hardening type, a method of irradiating heat rays in the film-forming-liquid drying-hardening unit 40 or a method of creating a heated atmosphere in the film-forming-liquid drying-hardening unit 40 is adopted. .

In addition, when the layer thickness of the film-forming liquid 23a is thick and it takes time to dry and harden the film-forming liquid 23a, instead of drying and hardening the film-forming liquid 23a in the coating apparatus 1, another drying place, drying, and curing are performed. It may be dried and cured with a curing device. In this case, in the substrate unloading section 70 , the substrate 10 coated with the film forming liquid 23 a is transferred from the substrate mounting table 31 of the substrate feeding conveyor 32 to the substrate tray 51 . Next, the substrates 10 are moved to another drying place or a drying and curing device other than the coating device 1, and the plurality of substrates 10 in the plurality of substrate trays 51 are collectively dried and cured over a long period of time.
The method of performing drying and curing in a separate place/apparatus is suitable when a thick coating film is to be formed, or when the film forming liquid 23a is of a type that is difficult to dry and cure. It is possible to process the trays 51 collectively and efficiently.

The shielding cover 41 covering the film forming liquid drying and curing section 40 has a function of preventing the substrates positioned in the adjacent film forming liquid applying sections 20 and 20A from being affected by UV light, heat, and the like. there is A good quality film is formed on the end surfaces 10a and 10b of the substrate 10 by the cover having a shielding function.
As a constituent material of the shielding cover 41, a plastic having UV shielding properties and heat resistance is particularly suitable. In addition, in the case of a material having insufficient UV shielding properties, a UV light cut film may be pasted thereon.

The size of the substrate 10 to be coated with the film forming liquid 23a by the coating apparatus 1 according to the embodiment is, for example, 10 to 60 mm in length and width, and the number of substrates 10 accommodated in the substrate tray 51 is, for example, 2 to 50. The time required for applying the film forming liquid 23a in the film forming liquid applying units 20 and 20A is, for example, about 1 to 10 seconds.

The substrate 10 has a substantially rectangular overall shape, and the four sides of the rectangle, ie, the end faces 10a and 10b, may all have the same shape or may have different shapes. In the case of the coating apparatus 1 according to the embodiment of the present invention, the porous elastic body 21 is used for coating the film forming liquid 23a. , 10b are not linear and have a certain degree of unevenness, the film-forming liquid 23a can be applied to the respective end faces 10a, 10b in a substantially uniform thickness.

Substrates to be coated are not limited to printed wiring boards (including single-sided, double-sided, multi-layer, and build-up boards), but also include metal substrates, package substrates (copper-clad laminate substrates), ceramic substrates, flexible substrates, etc. Electronic circuit boards on which various electronic components are mounted are also subject to application.
Furthermore, substrates on which electronic components such as chips are already mounted can also be applied.

According to the coating apparatus 1 according to the above-described embodiment, the porous elastic coating containing the film forming liquid 23a is applied to the four end surfaces 10a and 10b of the substrate 10 on the substrate mounting table 31 on the substrate feeding conveyor 32 that moves stepwise. The film forming liquid 23a can be applied by bringing the end surfaces 21aa and 21ab of the body 21 into contact. Since the porous elastic body 21 having dense pores can be used, the end surfaces 10a and 10b of the substrate 10 can be coated with the film forming liquid 23a in a uniform thickness.
Therefore, generation of dust or the like from the end surfaces 10a and 10b of the substrate 10 can be easily prevented. Therefore, it is possible to improve the quality of substrate products and prevent contamination of manufacturing facilities by dust, thereby greatly reducing the rate of defective products.

In addition, since the film forming liquid 23a can be applied to all the four end surfaces 10a and 10b of the substrate 10 during one or two step movements, the film forming liquid 23a can be applied efficiently and accurately. It is possible. Furthermore, drying and hardening of the coated film-forming liquid 23a can be performed between each step movement, that is, between stops for coating the film-forming liquid 23a. Therefore, a coating film that has been reliably dried and cured can be obtained, and from this point also, it is possible to obtain a high-quality coating film that can prevent the generation of dust from the end surfaces 10a and 10b of the substrate 10. FIG.

When the size of the substrate 10 is further reduced, even if the end surfaces 10a and 10b of the substrate 10 have some unevenness, the porous elastic body 21 containing the film forming liquid 23a is lightly applied to the end surfaces 10a and 10b of the substrate 10. The film-forming liquid 23a can be applied in a short time by contacting to a degree of pressing. It is possible to apply the film forming liquid 23a to the end faces 10a and 10b of the plurality of substrates 10 and to the end faces 10a and 10b on both sides of the plurality of substrates 10 by one contact, in other words, a stamp, so that the size of the substrate 10 can be reduced. is also easy.

In addition, the configuration and operation mechanism of the coating apparatus 1 are simple, the equipment cost is low, and maintenance and operation are easy. Therefore, there is an advantage that stable operation is possible and the coating cost of the film forming liquid 23a can be kept low.

Further, in the case of the coating apparatus 1 according to the above-described embodiment, the substrate 10 is transferred from the substrate tray 51 onto the substrate tray conveyer 52 to the substrate placing table 31 on the substrate conveyer 32 of the substrate conveying unit 30, and the film is transferred. Feeding the substrate 10 to the forming liquid applying units 20 and 20A, applying the film forming liquid 23a in the film forming liquid applying units 20 and 20A, drying and curing the film forming liquid 23a in the film forming liquid drying and curing unit 40, and removing the substrate. Since the transfer of the substrate 10 on the substrate placing table 31 to the substrate tray 51 on the substrate tray transport conveyor 52 in the unit 70 is completed in a series of steps, the working efficiency is extremely high. be able to.

INDUSTRIAL APPLICABILITY The present invention can be widely used in fields such as the electronic equipment industry that handles various substrates such as printed wiring boards, metal substrates, package substrates, and glass substrates.

1 Coating device 10 Substrates 10a, 10b End faces 20, 20A Film forming liquid coating part 21 Porous elastic body 21a One end side 21aa, 21ab End face 21b Other end side 22 Retraction driving means 22a Driving device 22b Porous elastic body support arm 22c Driving device Support frame 23 Film-forming liquid tank 23a Film-forming liquids 24, 24a, 24b Fixed magnet 30 Substrate feeding part 31 Substrate mounting table 31a Substrate receiver 32 Substrate feeding conveyor 33 Fixing tables 34, 34a, 34b Rotating shafts 35, 35a, 35b Rotating shafts Magnet 36 Central axis 40 Film forming liquid drying and curing unit 41 Shielding cover 50 Substrate tray transfer unit 51 Substrate tray 52 Substrate tray transfer conveyor 60 Substrate setting units 61, 71 Transfer means 70 Substrate removal units P1, P2 Application center line position

Claims (14)

a porous elastic body having continuous pores whose one end side moves back and forth toward the outer peripheral edge surface of the substrate on the substrate mounting table;
a film-forming liquid supplying means positioned at or near the other end of the porous elastic body and supplying the film-forming liquid to the porous elastic body;
the width of the end face on the one end side of the porous elastic body is larger than the width of the outer peripheral edge face of the substrate;
The film forming liquid is applied to the outer peripheral edge surface of the substrate by bringing the end surface of the porous elastic body on the one end side into contact with the outer peripheral edge surface of the substrate. ,
the substrate mounting tables are arranged at a predetermined center-to-center interval in a direction perpendicular to the moving direction of the one end of the porous elastic body;
two adjacent substrates on the substrate mounting table are arranged in a state rotated by a predetermined angle in a range facing the one end side of the porous elastic body;
The film-forming liquid is applied to the outer peripheral edge surfaces of the two substrates at the same time. A coating device, characterized in that: The porous elastic body has a width such that the film-forming liquid can be applied to the outer peripheral edge surfaces of the two substrates positioned side by side with one porous elastic body. The coating device according to claim 1 . 3. The coating apparatus according to claim 2 , wherein said one end side of said porous elastic body has a shape corresponding to the size and/or the shape of said outer peripheral edge face of said two adjacent substrates. a porous elastic body having continuous pores whose one end side moves back and forth toward the outer peripheral edge surface of the substrate on the substrate mounting table;
a film-forming liquid supplying means positioned at or near the other end of the porous elastic body and supplying the film-forming liquid to the porous elastic body;
the width of the end face on the one end side of the porous elastic body is larger than the width of the outer peripheral edge face of the substrate;
The film forming liquid is applied to the outer peripheral edge surface of the substrate by bringing the end surface of the porous elastic body on the one end side into contact with the outer peripheral edge surface of the substrate,
two sets of the porous elastic body and the film-forming liquid supply means are provided at a predetermined interval,
the substrate mounting tables are arranged at a predetermined center-to-center interval in a direction perpendicular to the moving direction of the one end of the porous elastic body;
two sets of the porous elastic bodies and the two substrates on the substrate mounting table located on the film-forming liquid supply means are arranged in a state rotated by a predetermined angle with respect to each other;
It is characterized in that the film-forming liquid is simultaneously applied to the outer peripheral edge surfaces of the two substrates.RuCoating equipment. The porous elastic body and the film-forming liquid supply means are provided on both sides of the substrate mounting table,
The coating apparatus according to any one of claims 1 to 4, characterized in that the film forming liquid is applied simultaneously to the outer edge surfaces on both sides of the substrate. 6. The film-forming liquid supply means located at the other end of the porous elastic body includes a film-forming liquid tank containing the film - forming liquid. The coating device according to any one of the above items. A plurality of substrate mounting tables are provided side by side on a substrate feeding conveyor that moves in a direction perpendicular to the moving direction of the porous elastic body, and the substrate feeding conveyor moves stepwise at the predetermined center-to-center spacing. The coating device according to any one of claims 1 to 3 , characterized in that it is configured as follows. One of the two adjacent substrates on the substrate mounting table is configured to rotate by a predetermined angle with respect to the step movement direction while the substrate feeding conveyor moves one step. The coating device according to claim 7 . A plurality of substrate mounting tables are provided side by side on a substrate feeding conveyor that moves in a direction perpendicular to the moving direction of the porous elastic body, and the substrate feeding conveyor moves stepwise at the predetermined center-to-center spacing. 5. The coating apparatus according to claim 4 , characterized in that it is constructed as follows. The predetermined spacing is twice the predetermined center-to-center spacing, and one of the two substrates positioned on the substrate mounting table with the predetermined spacing therebetween moves two steps by the substrate feeding conveyor. 10. The coating device according to claim 9 , wherein the coating device is configured to rotate by a predetermined angle with respect to the step movement direction while the coating device is moving. The rotation of the substrate is caused by the attractive force of the S pole or N pole of the magnet provided on the rotating shaft of the substrate mounting table and the N pole or S pole of the magnet provided facing and fixed to the substrate mounting table, or 11. The coating device according to claim 8 , wherein the coating device is configured to be generated by a repulsive force. In a substrate feeding unit, the substrate is placed on the substrate placing table on the substrate feeding conveyor by a pick-up robot from the substrate tray on the substrate tray carrying conveyor,
A pickup robot transfers the substrate from the substrate placing table on the substrate feeding conveyor to the substrate tray on the substrate tray transport conveyor in the substrate unloading section. Item 12. The coating device according to any one of items 7 to 11 . 13. The coating apparatus according to claim 12 , further comprising a film-forming liquid drying and curing section provided between said film-forming liquid supply means and said substrate taking-out section. 13. Using the coating apparatus according to claim 12 , after the substrate is transferred to the substrate tray at the substrate unloading section, the substrate tray is taken out from the coating apparatus, and the film is removed at a place outside the coating apparatus or in a drying apparatus. A coating/drying/curing method characterized by drying and curing a forming liquid.

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