JP7113781B2 - 二酸化炭素還元反応に用いられる新規窒素ドープ銅ナノ触媒 - Google Patents
二酸化炭素還元反応に用いられる新規窒素ドープ銅ナノ触媒 Download PDFInfo
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- JP7113781B2 JP7113781B2 JP2019076149A JP2019076149A JP7113781B2 JP 7113781 B2 JP7113781 B2 JP 7113781B2 JP 2019076149 A JP2019076149 A JP 2019076149A JP 2019076149 A JP2019076149 A JP 2019076149A JP 7113781 B2 JP7113781 B2 JP 7113781B2
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- copper
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- alkylamine
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- 239000010949 copper Substances 0.000 title claims description 87
- 239000011943 nanocatalyst Substances 0.000 title claims description 40
- 229910052802 copper Inorganic materials 0.000 title claims description 35
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims description 30
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 title description 52
- 229910002092 carbon dioxide Inorganic materials 0.000 title description 26
- 239000001569 carbon dioxide Substances 0.000 title description 22
- 238000006722 reduction reaction Methods 0.000 title description 5
- 239000002105 nanoparticle Substances 0.000 claims description 126
- 239000002243 precursor Substances 0.000 claims description 62
- 238000000034 method Methods 0.000 claims description 32
- PLZVEHJLHYMBBY-UHFFFAOYSA-N Tetradecylamine Chemical compound CCCCCCCCCCCCCCN PLZVEHJLHYMBBY-UHFFFAOYSA-N 0.000 claims description 24
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 22
- 239000000203 mixture Substances 0.000 claims description 14
- 229910052757 nitrogen Inorganic materials 0.000 claims description 11
- FJLUATLTXUNBOT-UHFFFAOYSA-N 1-Hexadecylamine Chemical compound CCCCCCCCCCCCCCCCN FJLUATLTXUNBOT-UHFFFAOYSA-N 0.000 claims description 10
- NWFNSTOSIVLCJA-UHFFFAOYSA-L copper;diacetate;hydrate Chemical compound O.[Cu+2].CC([O-])=O.CC([O-])=O NWFNSTOSIVLCJA-UHFFFAOYSA-L 0.000 claims description 9
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical compound CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 claims description 8
- 150000003973 alkyl amines Chemical class 0.000 claims description 8
- -1 copper-copper nitride Chemical class 0.000 claims description 8
- RFKZUAOAYVHBOY-UHFFFAOYSA-M copper(1+);acetate Chemical compound [Cu+].CC([O-])=O RFKZUAOAYVHBOY-UHFFFAOYSA-M 0.000 claims description 7
- ZKXWKVVCCTZOLD-UHFFFAOYSA-N copper;4-hydroxypent-3-en-2-one Chemical compound [Cu].CC(O)=CC(C)=O.CC(O)=CC(C)=O ZKXWKVVCCTZOLD-UHFFFAOYSA-N 0.000 claims description 5
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 3
- 229910001431 copper ion Inorganic materials 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- 230000007017 scission Effects 0.000 claims description 3
- 238000001016 Ostwald ripening Methods 0.000 claims description 2
- 238000003776 cleavage reaction Methods 0.000 claims description 2
- 230000008569 process Effects 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims 16
- 238000006243 chemical reaction Methods 0.000 description 35
- 239000000243 solution Substances 0.000 description 34
- 229910014291 N—Cu Inorganic materials 0.000 description 28
- 239000000047 product Substances 0.000 description 27
- 230000000052 comparative effect Effects 0.000 description 26
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 24
- 238000002360 preparation method Methods 0.000 description 19
- 239000002904 solvent Substances 0.000 description 16
- 238000002441 X-ray diffraction Methods 0.000 description 13
- 150000003839 salts Chemical class 0.000 description 13
- 239000003054 catalyst Substances 0.000 description 12
- 150000004677 hydrates Chemical class 0.000 description 12
- 239000002245 particle Substances 0.000 description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 11
- 125000004433 nitrogen atom Chemical group N* 0.000 description 9
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000012512 characterization method Methods 0.000 description 6
- 238000001878 scanning electron micrograph Methods 0.000 description 6
- 238000013507 mapping Methods 0.000 description 5
- CCCMONHAUSKTEQ-UHFFFAOYSA-N octadec-1-ene Chemical compound CCCCCCCCCCCCCCCCC=C CCCMONHAUSKTEQ-UHFFFAOYSA-N 0.000 description 5
- 210000004027 cell Anatomy 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 239000011550 stock solution Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
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- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- 239000006228 supernatant Substances 0.000 description 3
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 229910018069 Cu3N Inorganic materials 0.000 description 2
- 229910021607 Silver chloride Inorganic materials 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000010504 bond cleavage reaction Methods 0.000 description 2
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- 235000019253 formic acid Nutrition 0.000 description 2
- 238000004128 high performance liquid chromatography Methods 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 229910000765 intermetallic Inorganic materials 0.000 description 2
- 239000012263 liquid product Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 229910052976 metal sulfide Inorganic materials 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- HNSDLXPSAYFUHK-UHFFFAOYSA-N 1,4-bis(2-ethylhexyl) sulfosuccinate Chemical compound CCCCC(CC)COC(=O)CC(S(O)(=O)=O)C(=O)OCC(CC)CCCC HNSDLXPSAYFUHK-UHFFFAOYSA-N 0.000 description 1
- WVXRAFOPTSTNLL-NKWVEPMBSA-N 2',3'-dideoxyadenosine Chemical compound C1=NC=2C(N)=NC=NC=2N1[C@H]1CC[C@@H](CO)O1 WVXRAFOPTSTNLL-NKWVEPMBSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 208000012868 Overgrowth Diseases 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 125000005595 acetylacetonate group Chemical group 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 150000001412 amines Chemical group 0.000 description 1
- 239000003011 anion exchange membrane Substances 0.000 description 1
- DOIHHHHNLGDDRE-UHFFFAOYSA-N azanide;copper;copper(1+) Chemical compound [NH2-].[Cu].[Cu].[Cu+] DOIHHHHNLGDDRE-UHFFFAOYSA-N 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 238000000970 chrono-amperometry Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- MHDVGSVTJDSBDK-UHFFFAOYSA-N dibenzyl ether Chemical class C=1C=CC=CC=1COCC1=CC=CC=C1 MHDVGSVTJDSBDK-UHFFFAOYSA-N 0.000 description 1
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical class C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 1
- 150000002019 disulfides Chemical class 0.000 description 1
- JRBPAEWTRLWTQC-UHFFFAOYSA-N dodecylamine Chemical group CCCCCCCCCCCCN JRBPAEWTRLWTQC-UHFFFAOYSA-N 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000002803 fossil fuel Substances 0.000 description 1
- 229910021397 glassy carbon Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
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- 239000003446 ligand Substances 0.000 description 1
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- 230000007774 longterm Effects 0.000 description 1
- 239000002075 main ingredient Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 239000002159 nanocrystal Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 150000002843 nonmetals Chemical class 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- JMANVNJQNLATNU-UHFFFAOYSA-N oxalonitrile Chemical compound N#CC#N JMANVNJQNLATNU-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 235000015320 potassium carbonate Nutrition 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 150000003139 primary aliphatic amines Chemical class 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
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- 230000027756 respiratory electron transport chain Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
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- 229910052717 sulfur Inorganic materials 0.000 description 1
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- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000001195 ultra high performance liquid chromatography Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
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Description
実施例I:Cu3N-Cuナノ粒子の2段階調製
ホットプレート上で180℃で30分間、60mgの酢酸銅水和物(99.99%)及び200mgのテトラデシルアミン(TDA、>96%)を2mLの1-オクタデセン(98%)に溶解させ、イオン溶液を調製した。この加熱中、TDAは(約38℃~40℃で)溶融し、銅原子に配位した。これにより青色のCu-TDA錯体を含む原液が得られた。このイオン溶液の銅濃度は約0.03mol/Lであった。
TDAに替えてヘキサデシルアミン(HDA、98%)を用いたこと以外は実施例Iと同様の手順を行った。
TDAに替えてオクタデシルアミン(ODA、98%)を用いたこと以外は実施例Iと同様の手順を行った。
フラスコを200℃ではなく220℃まで加熱したこと以外は実施例Iと同様の手順を行った。
フラスコを200℃まで加熱し、この温度で60分間ではなく40分間保持したこと以外は実施例Iと同様の手順を行った。
フラスコを200℃まで加熱し、この温度で60分間ではなく120分間保持したこと以外は実施例Iと同様の手順を行った。
酢酸銅水和物の量を原液が0.06mol/Lの銅を含有するように変更したこと以外は実施例Iと同様の手順を行った。
酢酸銅水和物の量を原液が0.12mol/Lの銅を含有するように変更したこと以外は実施例Iと同様の手順を行った。
アルゴン気流下、25mL三ツ口フラスコに5.0gのTDA(TDA、>96%)、60mgの酢酸銅水和物(99.99%)、及び2mLのODE(98%)を入れ、脱気した。20分間脱気した後、フラスコを約200℃まで加熱し、この温度で60分間保持し、100℃まで自然冷却した。5mLのエタノールをフラスコに注入し、反応混合物を5mLのヘキサン中に分散させ、2000rpmで2分間遠心分離して、ナノ粒子を精製した。上清を除去した後、計5mLのヘキサンを沈殿物に添加し、混合物を3000rpmで5分間遠心分離した。この洗浄を2回繰り返して、未反応の前駆体及び界面活性剤を除去した。特性評価を行うまで、得られたCu3N-Cuナノ粒子をヘキサン中で保存した。
フラスコを200℃ではなく約220℃まで加熱したこと以外は実施例IXと同様の手順を行った。
酢酸銅水和物に替えて酢酸銅(I)(97%)を用いたこと以外は実施例IXと同様の手順を行った。
酢酸銅水和物に替えて酢酸銅(I)(97%)と銅アセチルアセトナート(99%)の混合物を用いたこと以外は実施例IXと同様の手順を行った。
フラスコを200℃ではなく240℃まで加熱したこと以外は実施例Iと同様の手順を行った。
フラスコを200℃ではなく280℃まで加熱したこと以外は実施例Iと同様の手順を行った。
フラスコを200℃まで加熱し、この温度で60分間ではなく20分間保持したこと以外は実施例Iと同様の手順を行った。
TDAに替えてドデシルアミン(DDA、98%)を用いたこと以外は実施例Iと同様の手順を行った。
フラスコを200℃ではなく約240℃まで加熱したこと以外は実施例IXと同様の手順を行った。
電子源として電界エミッターを使用し、走査型電子顕微鏡(SEM、FEI製QUANTA FEG 650)を用いてナノ粒子の表面モルホロジーを調べた。SEM上にエネルギー分散分光(EDS)システムを設け元素分析を行った。管電圧40kV及び電流40mAの条件でCuKα線を使用し、Bruker D8 アドバンスX線回折装置を用いてX線回折(XRD)パターンを得た。
実施例I及び比較例Iでそれぞれ調製したCu3N-Cuナノ粒子及びCuナノ粒子の構造的特性評価及び組成的特性評価を図4に示す。具体的には、実施例Iで調製した約80nmの平均直径を有する枝状ナノ粒子のSEM像を図4Dに示す。この枝状ナノ粒子のEDXマッピング像を図4Fに示す。図4Fから分かるように、このEDXマッピング像は、銅が多いものの、枝状構造に沿って銅と窒素の両方が存在することを明確に示している。反応系にはTDA以外に窒素源が存在しなかったことから、TDA分子が唯一の窒素原子源であったと言える。窒素原子は容易に銅ナノ結晶表面に配位するため、TDA分子のアミン官能基は粒子の過成長を制限するリガンドとして作用すると考えられる。
実施例I、実施例IV、比較例I、及び比較例IIで調製したナノ粒子のXRDの比較を図5に示す。図5から分かるように、反応温度は生成物の相特性に有意な影響を及ぼす。
CO2から生成物への変換の触媒として実施例I及び比較例Iで得たナノ粒子をそれぞれ使用し、これらナノ粒子の電気化学的特性を比較した。
Claims (8)
- 銅-窒化銅ナノ触媒ナノ粒子の製造方法であって、該方法は、
銅-アルキルアミン前駆体錯体を調製する工程であって、アルキルアミンと、酢酸銅水和物、酢酸銅(I)、銅アセチルアセトナート、又はこれらの混合物とを混合して前記銅-アルキルアミン前駆体錯体を調製する工程と、
前記銅-アルキルアミン前駆体錯体のC-N結合を切断して、銅成分及び窒化銅成分を含む銅-窒化銅ナノ触媒ナノ粒子を生成する工程と、
前記銅-窒化銅ナノ触媒ナノ粒子を回収する工程と、を有し、
前記C-N結合の切断は、前記銅-アルキルアミン前駆体錯体を所定期間にわたって高温にさらす工程を含み、
前記高温は、160℃~240℃の温度であり、
前記銅成分は、前記銅-アルキルアミン前駆体錯体からの銅を含み、
前記窒化銅成分は前記銅-アルキルアミン前駆体錯体からの銅及び窒素を含む、
製造方法。 - 請求項1記載の製造方法であって、
前記アルキルアミンは、テトラデシルアミン(TDA)、ヘキサデシルアミン(HDA)、オクタデシルアミン(ODA)、及びこれらの組み合わせからなる群から選択される、
製造方法。 - 請求項1又は2記載の製造方法であって、
該方法は、オストワルド熟成工程をさらに含む、
製造方法。 - 請求項1~3のいずれか1項に記載の製造方法において、
前記高温は、160℃~220℃の温度である、
製造方法。 - 請求項1~4のいずれか1項に記載の製造方法において、
前記所定期間は、約20分~120分である、
製造方法。 - 請求項1~5のいずれか1項に記載の製造方法において、
前記アルキルアミンと、前記酢酸銅水和物、前記酢酸銅(I)、前記銅アセチルアセトナート、又はこれらの混合物との混合は、前記銅のイオン及び前記アルキルアミンのイオンを含有するイオン溶液を調製する工程をさらに含み、前記銅のイオンは、前記イオン溶液中に約0.03~0.12mol/Lの濃度で存在する、
製造方法。 - 請求項1~6のいずれか1項に記載の製造方法において、
該方法は、1段階の合成工程を含む、
製造方法。 - 請求項1~6のいずれか1項に記載の製造方法において、
該方法は、少なくとも2段階の合成工程を含む、
製造方法。
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