JP7113192B2 - High frequency processing device - Google Patents

Description

The present invention relates to a high frequency processing device.

Conventionally, this type of high-frequency processing apparatus has a plurality of rotating antennas, and by radiating high-frequency waves from the plurality of rotating antennas, high-frequency waves are supplied to a wide range of a heating chamber, enabling, for example, cooking without uneven heating ( For example, see Patent Document 1).

In addition, a plurality of radiating portions are provided, and by changing the phase difference of the high frequencies radiated from the plurality of radiating portions to change the interference state, the high frequency distribution can be changed to uniformly heat the object or to concentrate the heat. It is designed so that it can be heated to a certain extent (see, for example, Patent Document 2).

JP-A-2004-47322 JP-A-2008-66292

However, when the conventional rotating antenna is rotated, the radiating part only moves within the range of rotation, and the effect of changing the high-frequency distribution is small.

In addition, in the case of spatially synthesizing high-frequency waves in a heating chamber by radiating high-frequency waves from a plurality of radiating portions, objects to be heated of various shapes, types, and amounts accommodated in the heating chamber are desired. There was a problem that it was difficult to heat-treat to the state.

That is, even if the standing wave is moved by phase difference control, the movement is limited to about half the wavelength, so the effect of changing the high-frequency distribution is small.

Furthermore, even if you try to control the high-frequency distribution in the heating chamber by spatially synthesizing multiple radiations, the high-frequency distribution itself changes due to the influence of the object to be heated, such as food, stored in the heating chamber, so it is difficult to heat as expected at the time of design. could not be reproduced.

Also, turning on/off the multiple radiating portions greatly deviates the radiating positions, which makes it possible to increase the fluctuation of the high-frequency distribution, but the supplied power becomes smaller, and another problem arises that the cooking time becomes longer.

SUMMARY OF THE INVENTION The present invention has been made in view of these points, and it is an object of the present invention to provide a high-frequency generation processing apparatus capable of heating objects of various shapes, types, and amounts to a desired state in a short period of time. is.

In order to achieve the above object, the present invention has two power feed sections that supply high frequencies, a plurality of radiation sections that radiate high frequencies, and a transmission line that transmits high frequencies from the power feed sections to the radiation section. wherein the transmission line comprises a ring transmission line, the two feeding parts transmit high frequencies to the plurality of radiating parts via the ring transmission line, and the ring transmission of the two feeding parts is performed. The coupling positions to the line are arranged at intervals of approximately 1/4 wavelength.

As a result, it is possible to selectively switch and radiate high-frequency waves from a plurality of radiating parts, thereby heating objects having various shapes, types, and amounts to a desired state in a short period of time.

With the above configuration, the high-frequency processing apparatus of the present invention can selectively switch the high-frequency wave from the radiating section to achieve an intended heating distribution, and can heat objects of various shapes, types, and amounts in a short time. can be heated to a state of

1 is a configuration diagram of a high-frequency processing device according to Embodiment 1 of the present invention; FIG. 1 is a line length explanatory diagram of a transmission line according to Embodiment 1 of the present invention; FIG. 1 is a line length explanatory diagram of a transmission line according to Embodiment 1 of the present invention; 1 is a perspective view of a transmission line according to Embodiment 1 of the present invention; FIG. Layout of transmission lines according to Embodiment 2 of the present invention

A first aspect of the present invention has two feeding parts that supply high frequencies, a plurality of radiating parts that radiate high frequencies, and a transmission line that transmits high frequencies from the feeding parts to the radiating parts, and the transmission line comprises a ring-shaped transmission line, the two feeding parts transmit high frequency to the plurality of radiating parts via the ring-shaped transmission line, and the coupling positions of the two feeding parts to the ring-shaped transmission line are arranged at an interval of approximately 1/4 wavelength.

As a result, it is possible to selectively switch and radiate high-frequency waves from a plurality of radiating parts, thereby heating objects having various shapes, types, and amounts to a desired state in a short period of time. More specifically, it is possible to control the transmission direction of the high frequency by controlling the combination at the coupling position of each power supply with the ring-shaped transmission line according to the power supply phase of the high frequency supplied from the two power supply units. Therefore, it is possible to select the radiating part that supplies the high frequency, realize the intended heating distribution, and heat objects of various shapes, types, and amounts to the desired state in a short time. can be done.

In a second aspect of the invention, particularly in the high-frequency processing device of the first aspect, a first branch transmission line is provided at a position that is approximately the same distance from each coupling position of the annular transmission line with the two feeding parts. and second and third branch transmission lines are coupled at a position approximately one-fourth wavelength from the coupling position of the annular transmission line with the first branch transmission line, and the plurality of radiating sections are: It is configured to be installed at any one of the first, second, and third branch transmission lines.

As a result, it is possible to select the radiating portion that supplies the high frequency by controlling the composite phase at the coupling position of the first, second, and third branch transmission lines with the ring-shaped transmission line by the two feed phases. It is possible to realize the intended heating distribution, and it is possible to perform heating suitable for various shapes, types, and amounts of objects to be heated in a short time.

According to a third aspect of the present invention, in the high-frequency processing apparatus according to the first or second aspect, the power feeding portion is coupled in a direction substantially perpendicular to the linear portion of the annular transmission line.

As a result, the coupling from the feeding section to the ring-shaped transmission line can be formed in a T shape, whereby the power transmitted to the loop side and the other feeding section coupling side can be equally distributed, and the coupling of each feeding section can be performed. It is possible to more reliably control the direction of high-frequency transmission by synthesizing at the position, select the radiating part that supplies high-frequency waves, and realize the intended heating distribution. Suitable heating can be performed in a short time.

A fourth invention is the high-frequency processing apparatus according to any one of the first to third inventions, in which phase difference control between the two power supply units is enabled, and power is supplied to the plurality of radiating units by the phase difference control. is configured to select

By controlling the phase difference between the feeding parts, it is possible to select the radiating part that transmits the high frequency and realize the intended heating distribution. can be done with

A fifth aspect of the invention is particularly the high-frequency processing apparatus according to any one of the first to fourth aspects of the invention, wherein branches are further provided at the ends of the first, second, and third branch transmission lines, and the plurality of radiating sections are installed. as a configuration.

By controlling the phase difference between the feeding parts, it is possible to select the power supply to multiple radiating parts, realize the intended heating distribution in a wider range, and perform heating suitable for objects with different shapes, types, and amounts. can be done in a short time.

BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, embodiments of the present invention will be described with reference to the drawings. It should be noted that the present invention is not limited by this embodiment.

(Embodiment 1)
FIG. 1 shows a configuration diagram of a high-frequency processing device according to Embodiment 1 of the present invention. In FIG. 1, an object 2 to be heated housed in a heating chamber 1 is heated by high frequencies radiated from radiating portions 8a, 8b, and 8c. A high frequency wave is oscillated by the oscillating section 3, distributed to a plurality of parts by the distributing section 4, amplified to a large power by the amplifying sections 6a and 6b, and supplied to the radiating sections 8a, 8b and 8c through the transmission line 7. FIG. A plurality of high frequencies distributed by the distribution section 4 can be adjusted to a different phase value from the other by the phase variable section 5 and supplied to the amplification section 6b.

The operation and effect of the high-frequency processing apparatus constructed as described above will be described below.

FIG. 2 is a line length explanatory diagram of the transmission line in the first embodiment of the present invention. High-frequency waves from the amplifiers 6a and 6b are supplied from the feeders 9a and 9b to the transmission line 7 having a loop line structure, are combined on the transmission line 7, and are sent to the radiating section 8a from the branches 10a, 10b and 10c on the transmission line 7. , 8b, 8c. Feeding portions 9a and 9b from the amplifying portions 6a and 6b are provided in substantially linear portions of the transmission line 7 having an approximately elliptical annular line structure through a route 13 of approximately quarter wavelength, and the substantially linear portions of the transmission line 7 are provided. It is configured to feed power from a direction orthogonal to That is, it has a substantially T-shaped coupled line configuration. Thus, the power supply is split evenly in two directions.

Table 1 is a transmission operation explanatory table of the transmission line under the common-mode feeding condition in FIG. It should be noted that the numbers described in the table mean the drawing number used in each figure (in this case, FIG. 2). This also applies to Tables 2 and 3 (in this case, both are shown in FIG. 2) and Table 4 (in this case, FIG. 3) described below.

Since the path length of the path 13 is 90 degrees (approximately 1/4 wavelength), the high frequency transmitted at 0 degrees from the amplifier 6b passes through the path 13 and becomes 90 degrees after advancing 90 degrees at the position of the feeder 9a. In the feeding section 9a, the high frequency of 0 deg phase from the amplifying section 6a and the high frequency of 90 deg phase from the amplifying section 6b are combined and transmitted to the circulation side.

Similarly, in the power feeding section 9b, the high frequency of 0 deg phase from the amplifying section 6b and the high frequency of 90 deg phase from the amplifying section 6a are combined and transmitted to the circulation side. That is, when the amplifiers 6a and 6b are fed with the same 0 deg phase, equal power is transmitted from the power feeders 9a and 9b to the circulating side.

Table 2 is a transmission operation explanatory table of the transmission line under the 90-degree phase difference feeding condition in FIG.

The high frequency transmitted from the amplifying section 6b at 90 degrees passes through the path 13 and advances by 90 degrees at the position of the feeding section 9a to become 180 degrees. In the feeding section 9a, the high frequency of 0deg phase from the amplifying section 6a and the high frequency of 180deg phase from the amplifying section 6b are canceled by anti-phase synthesis and cannot be transmitted to the circulating side.

On the other hand, in the power feeder 9b, the high frequency transmitted from the amplifier 6a at 0deg advances by 90deg at the position of the power feeder 9b through the path 13 and becomes 90deg. They are superimposed and transmitted to the circulation side. That is, when the amplifier 6b supplies power with a 90 degree phase lead from the amplifier 6a, the power supplied by the power supply unit 9a is not transmitted in the circulating direction, and the power in which the two feeds are superimposed is transmitted in the circulating direction from the power feeding unit 9b side. , is selectively supplied mainly to the radiating portion 8c.

Table 3 is a transmission operation explanatory table of the transmission line under the −90 deg phase difference feeding condition in FIG. 2 as well.

The high frequency transmitted from the amplifying section 6b at −90 deg passes through the path 13 and advances by 90 deg at the position of the feeding section 9a to become 0 deg. In the feeding section 9a, the high frequency of 0 deg phase from the amplifying section 6a and the high frequency of 0 deg phase from the amplifying section 6b are superimposed by in-phase synthesis and transmitted to the circulation side.

On the other hand, in the power feeding portion 9b, the high frequency transmitted from the amplifying portion 6a at 0 deg advances by 90 deg at the position of the power feeding portion 9a through the path 13 and becomes 90 deg, and the high frequency of -90 deg phase from the amplifying portion 6b is opposite in phase. It is canceled by synthesis and cannot be transmitted to the circulating side. That is, when the amplifier 6b supplies power with a phase delay of 90 degrees from the amplifier 6a, the power supplied by the power supply unit 9b is not transmitted in the circulating direction, and the power in which the two feeds are superimposed is transmitted in the circulating direction from the power supply unit 9a. , is selectively supplied mainly to the radiating portion 8b.

FIG. 3 is a line length explanatory diagram of the transmission line in the first embodiment. As for the distance of the transmission line 7 having the loop line structure, the phase length 11a from the feeder portion 9a to the branch 10a and the phase length 11b from the feeder portion 9b to the branch 10a are in phase. Also, the phase lengths 12a and 12b from the branch 10a to the branches 10b and 10c are 90 deg (1/4 wavelength) respectively.

Table 4 is a transmission operation explanatory table of the transmission line in FIG.

When the feed phases from the amplifiers 6a and 6b to the feeders 9a and 9b are in phase and both are 0 deg, the phase lengths 11a and 11b are 0 deg, so the transmission phase to the branch 10a is 0 deg. In-phase and superimposed high frequencies are supplied to 8a.

However, the transmission phase to the branching portion 10b is shifted by the phase length 12a, -90deg on the amplifying portion 6a side and 90deg on the amplifying portion 6b side. According to the same principle, the transmission to the branch portion 10c is also canceled by the opposite phase to the radiation portion 8c, and the high frequency is not supplied to the radiation portion 8c.

That is, when the power supply phases from the amplifier units 6a and 6b to the power supply units 9a and 9b are in phase, the high frequency power is selectively supplied only to the radiation unit 8a.

As described above, by controlling the power supply phase to the power supply units 9a and 9b, it is possible to select and switch between the radiating units 8a, 8b, and 8c that radiate the high frequency to the heating chamber 1, and to operate the high frequency distribution. can. That is, it is possible to select the radiating part that supplies the high frequency, to realize the intended heating distribution, and to heat objects of various shapes, types, and amounts to a desired state in a short time. can be done.

FIG. 4 shows a perspective view of a transmission line according to Embodiment 1 of the present invention. A transmission line 7 having a loop line structure is formed of a microstrip line close to one wall surface of the heating chamber 1 . The feeders 9a and 9b are configured by connecting coaxial core wires inserted from the wall surface of the heating chamber 1 to microstrip lines. The branch portions 10a, 10b, and 10c are configured by branched microstrip lines. The radiating sections 8a, 8b, and 8c are composed of antennas composed of microstrip lines.

(Embodiment 2)
FIG. 5 shows a layout diagram of transmission lines in Embodiment 2 of the present invention.

In the high-frequency processing apparatus of the present embodiment, the transmission line is further branched to the tip of the branch 10b on the transmission line 7, and radiating portions 8b and 8d are connected. At the tip of the branch 10c, the transmission line is similarly branched to connect the radiating sections 8c and 8e. For example, when the amplifier 6b in Table 3 supplies power with a phase delay of 90 degrees from the amplifier 6a, power in which two feeds are superimposed is transmitted from the power supply 9a side in the circulating direction. 8d can be selectively supplied to heat the right half extensively. In other words, by increasing the number of radiating parts that supply high frequencies to 8b and 8d, the intended heating distribution can be realized in a wider range, and suitable heating for objects with different shapes, types, and amounts can be achieved in a short time. It can be carried out.

Although the high frequency heating apparatus according to the present invention has been described above using the above embodiment, the present invention is not limited to this. For example, in the present embodiment, an example in which a semiconductor is used as the high-frequency source is shown, but other sources such as a magnetron may be used. Thus, the embodiments disclosed this time should be considered as examples and not restrictive in all respects, and the scope of the present invention is indicated by the scope of claims rather than the above description. , all changes within the meaning and range of equivalence to the claims are intended to be included.

As described above, the high-frequency processing apparatus according to the present invention can select a plurality of radiating portions to radiate, so that the high-frequency processing apparatus can realize an intended heating distribution. Therefore, it can be applied to applications such as a heating device using dielectric heating such as a microwave oven, a garbage disposer, or a high-frequency power source for a plasma power source, which is a semiconductor manufacturing device.

1 heating chamber 2 object to be heated 3 oscillating section 4 distributing section 5 phase varying section 6a-6b amplifying section 7 transmission line 8a-8e radiation section 9a-9b feeding section 10a-10c branch section 11a-11b phase length 12a-12b phase length 13 route

Claims (5)

It has two feeding parts that supply high frequencies, a plurality of radiating parts that radiate high frequencies, and a transmission line that transmits the high frequencies from the feeding parts to the radiating parts, and the transmission lines comprise annular transmission lines. , the two feeding parts transmit high frequencies to the plurality of radiating parts via the ring-shaped transmission line, and the coupling positions of the two feeding parts to the ring-shaped transmission line are substantially 1/4. A high-frequency processing device arranged at wavelength intervals. A first branch transmission line is coupled at a position that is approximately the same distance from each coupling position of the annular transmission line with the two feeding parts, and the first branch transmission line of the annular transmission line and the the second and third branch transmission lines are coupled at a position approximately one-fourth wavelength from the coupling position of the plurality of radiating sections, any one of the first, second and third branch transmission lines 2. The high-frequency processing apparatus according to claim 1, wherein the high-frequency processing apparatus is configured to be installed first. 3. A high-frequency processing apparatus according to claim 1, wherein said feeder is coupled in a direction perpendicular to said straight portion of said annular transmission line. The high frequency according to any one of claims 1 to 3, wherein phase difference control between the two power feeding portions is enabled, and power feeding to the plurality of radiating portions is selected by the phase difference control. processing equipment. 5. The high-frequency processing device according to claim 1, further comprising a plurality of radiating sections provided at the ends of the first, second, and third branched transmission lines.

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