JP7025744B2 - Joining device and joining method - Google Patents

Joining device and joining method Download PDF

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JP7025744B2
JP7025744B2 JP2017186416A JP2017186416A JP7025744B2 JP 7025744 B2 JP7025744 B2 JP 7025744B2 JP 2017186416 A JP2017186416 A JP 2017186416A JP 2017186416 A JP2017186416 A JP 2017186416A JP 7025744 B2 JP7025744 B2 JP 7025744B2
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holding portion
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shaped portion
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JP2019062106A (en
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拓範 平等
聖彦 近藤
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Inter University Research Institute Corp National Institute of Natural Sciences
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Description

本発明は、2つの基板を接合する接合装置および接合方法に関する。 The present invention relates to a joining device and a joining method for joining two substrates.

従来、2つの基板を接合する技術として比較的高温かつ高圧で接合する拡散接合が広く用いられている。拡散接合の場合、接合時に接合体に加わる温度は、この接合体の使用時の温度よりも高くなる。そのため、接合体は、接合時と大きく異なる温度環境下で用いられることとなり、使用時における歪みや特性の変化が避けられない。例えばパワーレーザの発振装置のように光学的な装置に用いる場合、温度環境の変化にともなうわずかな歪みが性能の大幅な低下を招くおそれがある。 Conventionally, as a technique for joining two substrates, diffusion joining for joining at a relatively high temperature and high pressure is widely used. In the case of diffusion bonding, the temperature applied to the bonded body at the time of bonding is higher than the temperature at the time of using this bonded body. Therefore, the bonded body is used in a temperature environment that is significantly different from that at the time of bonding, and distortion and changes in characteristics during use are unavoidable. For example, when used in an optical device such as a power laser oscillator, a slight distortion due to a change in the temperature environment may cause a significant deterioration in performance.

近年では、このような拡散接合の問題を解決するために、被接合体の表面をイオンビームなどで活性化することにより接合する表面活性化による接合が実用化されている。この表面活性化による接合は、拡散接合に比較して常温に近い温度や使用条件にあわせた任意の温度での接合が可能となる。これにより、接合体は、接合時と使用時との温度差が小さくなり、歪みや特性の変化が低減される。このような表面活性化による接合を用いた接合装置は、広く提案されている。 In recent years, in order to solve such a problem of diffusion bonding, bonding by surface activation of bonding by activating the surface of the object to be bonded with an ion beam or the like has been put into practical use. This surface activation bonding enables bonding at a temperature closer to normal temperature or at an arbitrary temperature according to the usage conditions as compared with diffusion bonding. As a result, in the bonded body, the temperature difference between the time of joining and the time of use becomes small, and distortion and changes in characteristics are reduced. A joining device using such joining by surface activation has been widely proposed.

しかしながら、これら従来の提案は、微小な2つの被接合体を接合する技術の提案に留まっている。ところで、2つの被接合体を接合する場合、接合する被接合体は接合時において互いの面の間で高精度な平行を確保する必要がある。つまり、接合される2つの被接合体の表面は、平行度を高精度で維持しつつ接することが求められる。従来のような微小な被接合体の場合、表面の平行度が接合に与える影響は小さい。ところが、被接合体が大型化するほど、被接合体の表面の平行度は、接合体の接合性能に与える影響が大きくなる。そのため、被接合体が大きくなるほど表面の高度な平行度が要求され、接合体の大型化を妨げているという問題がある。 However, these conventional proposals are limited to the proposal of a technique for joining two minute objects to be joined. By the way, when two objects to be joined are joined, it is necessary to ensure high-precision parallelism between the surfaces of the joined bodies to be joined at the time of joining. That is, the surfaces of the two objects to be joined are required to be in contact with each other while maintaining parallelism with high accuracy. In the case of a conventional minute object to be joined, the effect of surface parallelism on the joining is small. However, as the size of the bonded body increases, the parallelism of the surface of the bonded body has a greater influence on the bonding performance of the bonded body. Therefore, there is a problem that the larger the object to be joined, the higher the parallelism of the surface is required, which hinders the increase in size of the bonded body.

特許第2791429号明細書Japanese Patent No. 2791429 特開2002-313688号公報Japanese Unexamined Patent Publication No. 2002-313688 特開2006-337619号公報Japanese Unexamined Patent Publication No. 2006-337619 特許第5549108号明細書Japanese Patent No. 5549108 特許第6045972号明細書Japanese Patent No. 6045972

勝俣、市川、庄司「界面に無反射コーティングを有する常温接合Nd:YAG/ダイアモンド複合構造レーザーの高効率・高出力動作」第64回応用物理学会春季学術講演会 15p-213-8(2017.3)Katsumata, Ichikawa, Shoji "High-efficiency, high-power operation of room-temperature bonding Nd: YAG / diamond composite structure laser with anti-reflective coating on the interface" 64th JSAP Spring Meeting 15p-213-8 (2017.3) )

そこで、本発明の目的は、対向する一対の基板の平行度が高められ、大型の基板でも安定した接合を達成する接合装置および接合方法を提供することにある。 Therefore, an object of the present invention is to provide a joining device and a joining method in which the parallelism of a pair of opposing substrates is enhanced and stable bonding is achieved even with a large substrate.

請求項1記載の発明では、第一基板を保持する第一保持部は、自在継手部を挟んで接続保持部と接続している。これにより、第一保持部は、接続保持部に対する姿勢が変化する。また、第一保持部に設けられている鍔形状部は、接続保持部に設けられている押付部材と支持部材との間に挟み込まれている。そのため、第一保持部に設けられている鍔形状部は、押付部材の押付力を調整することにより、押付部材と支持部材との間に固定される。鍔形状部を固定することにより、第一基板を保持する第一保持部は、接続保持部に対する姿勢が固定される。 In the invention according to claim 1 , the first holding portion that holds the first substrate is connected to the connection holding portion with a universal joint portion interposed therebetween. As a result, the posture of the first holding portion with respect to the connection holding portion changes. Further, the collar-shaped portion provided in the first holding portion is sandwiched between the pressing member provided in the connection holding portion and the support member. Therefore, the collar-shaped portion provided in the first holding portion is fixed between the pressing member and the support member by adjusting the pressing force of the pressing member. By fixing the collar-shaped portion, the posture of the first holding portion that holds the first substrate is fixed with respect to the connection holding portion.

第一基板と第二基板との接合に先立って、第一保持部に保持されている第一基板は第二保持部に保持されている接合対象となる第二基板に押し当てられる。このとき、第一基板と第二基板とが接することにより、第一基板を保持する第一保持部は、自在継手部を支点として旋回し、第二基板にあわせた姿勢となる。すなわち、第一基板と第二基板とが接することにより、第一基板と第二基板とは平行が確保される。そして、第一基板を保持する第一保持部は、接続保持部に対する姿勢が第二基板にあわせて変化している。このように第一保持部の姿勢が変化した状態で鍔形状部を挟み込む押付部材の押付力を調整することにより、接続保持部に対する第一保持部の姿勢は固定される。接続保持部に対する第一保持部の姿勢を固定することにより、第一基板と第二基板とが一旦離間した後に再び接する場合でも、第一基板を保持する第一保持部は、第二基板の姿勢に合わせた姿勢が維持される。その結果、第一保持部に保持されている第一基板は、第二基板との間の平行度が維持されている。したがって、対向する一対の第一基板と第二基板との平行度を高めることができ、大型の基板でも平行度を容易に確保して安定した接合を達成することができる。 Prior to joining the first substrate and the second substrate, the first substrate held in the first holding portion is pressed against the second substrate to be joined held in the second holding portion. At this time, when the first substrate and the second substrate come into contact with each other, the first holding portion that holds the first substrate swivels around the universal joint portion as a fulcrum, and is in a posture that matches the second substrate. That is, the contact between the first substrate and the second substrate ensures that the first substrate and the second substrate are parallel to each other. The posture of the first holding portion that holds the first substrate with respect to the connection holding portion changes according to the second substrate. By adjusting the pressing force of the pressing member that sandwiches the collar-shaped portion while the posture of the first holding portion is changed in this way, the posture of the first holding portion with respect to the connection holding portion is fixed. By fixing the posture of the first holding portion with respect to the connection holding portion, even if the first substrate and the second substrate are once separated and then brought into contact with each other again, the first holding portion that holds the first substrate is the second substrate. The posture that matches the posture is maintained. As a result, the first substrate held by the first holding portion maintains parallelism with the second substrate. Therefore, it is possible to increase the parallelism between the pair of first and second substrates facing each other, and it is possible to easily secure the parallelism even with a large substrate and achieve stable bonding.

一実施形態による接合装置の要部を示す概略図Schematic diagram showing the main part of the joining device according to one embodiment 一実施形態による接合装置の概略的な構成を示す模式図Schematic diagram showing a schematic configuration of a joining device according to an embodiment 一実施形態による接合装置の要部を示す模式的な断面図Schematic sectional view showing a main part of a joining device according to an embodiment. 一実施形態による接合装置による接合体の接合手順を示す模式図Schematic diagram showing a joining procedure of a joined body by a joining device according to one embodiment. 一実施形態による接合装置による接合体の接合手順を示す模式図Schematic diagram showing a joining procedure of a joined body by a joining device according to one embodiment. 一実施形態による接合装置による接合体の接合手順を示す模式図Schematic diagram showing a joining procedure of a joined body by a joining device according to one embodiment. 一実施形態による接合装置による接合体の接合手順の他の実施形態を示す模式図Schematic diagram showing another embodiment of the joining procedure of the joined body by the joining device according to one embodiment.

以下、接合装置の一実施形態を図面に基づいて説明する。
図2に示す接合装置10は、チャンバ11、真空ポンプ12およびターボ分子ポンプ13を備えている。チャンバ11は、気密の容器であり、真空ポンプ12およびターボ分子ポンプ13によって内部が減圧される。チャンバ11の内部は、ターボ分子ポンプ13を用いることにより、10-6Pa程度の超高真空状態まで減圧される。チャンバ11は、図示しない建物などの設備に固定されている。真空ポンプ12およびターボ分子ポンプ13は、減圧機構部に相当する。
Hereinafter, an embodiment of the joining device will be described with reference to the drawings.
The joining device 10 shown in FIG. 2 includes a chamber 11, a vacuum pump 12, and a turbo molecular pump 13. The chamber 11 is an airtight container, and the inside is depressurized by the vacuum pump 12 and the turbo molecular pump 13. The inside of the chamber 11 is depressurized to an ultra-high vacuum state of about 10-6 Pa by using the turbo molecular pump 13. The chamber 11 is fixed to equipment such as a building (not shown). The vacuum pump 12 and the turbo molecular pump 13 correspond to the decompression mechanism unit.

接合装置10は、上記に加え、第一保持部21、第二保持部22、接続保持部23、駆動機構部24、ビーム照射部25およびビーム照射部26を備えている。第一保持部21は、軸方向の一方の端部に第一基板31を保持する。第二保持部22は、第一保持部21と対向して設けられており、第二基板32を保持する。第二保持部22は、チャンバ11に対して固定されている。接続保持部23は、第一保持部21と接続している。駆動機構部24は、接続している第一保持部21および接続保持部23を一体に駆動する。本実施形態の場合、駆動機構部24は、一体の第一保持部21および接続保持部23を、第一保持部21の軸方向へ往復駆動する。すなわち、駆動機構部24は、第一保持部21を、第二保持部22に対して接近または離間する方向へ駆動する。これにより、第一保持部21に保持されている第一基板31と第二保持部22に保持されている第二基板32との間の距離は、駆動機構部24による第一保持部21および接続保持部23の駆動によって変化する。 In addition to the above, the joining device 10 includes a first holding unit 21, a second holding unit 22, a connection holding unit 23, a drive mechanism unit 24, a beam irradiation unit 25, and a beam irradiation unit 26. The first holding portion 21 holds the first substrate 31 at one end in the axial direction. The second holding portion 22 is provided so as to face the first holding portion 21 and holds the second substrate 32. The second holding portion 22 is fixed to the chamber 11. The connection holding unit 23 is connected to the first holding unit 21. The drive mechanism unit 24 integrally drives the connected first holding unit 21 and the connection holding unit 23. In the case of the present embodiment, the drive mechanism unit 24 reciprocates the integrated first holding unit 21 and the connection holding unit 23 in the axial direction of the first holding unit 21. That is, the drive mechanism unit 24 drives the first holding unit 21 in a direction approaching or separating from the second holding unit 22. As a result, the distance between the first substrate 31 held by the first holding portion 21 and the second substrate 32 held by the second holding portion 22 is the distance between the first holding portion 21 and the second holding portion 24 by the drive mechanism portion 24. It changes depending on the drive of the connection holding unit 23.

ビーム照射部25およびビーム照射部26は、例えばFAB(Fast Atom Bombardment、またはFast Atom Beam)法などによりイオンビームを発生する。ビーム照射部25は、第一保持部21に保持された第一基板31にビームを照射する。ビーム照射部25から第一基板31にビームを照射することにより、第一基板31は表面処理が施される。同様に、ビーム照射部26は、第二保持部22に保持された第二基板32にビームを照射する。ビーム照射部26から第二基板32にビームを照射することにより、第二基板32は表面処理が施される。 The beam irradiation unit 25 and the beam irradiation unit 26 generate an ion beam by, for example, a FAB (Fast Atom Bombardment or Fast Atom Beam) method. The beam irradiation unit 25 irradiates the first substrate 31 held by the first holding unit 21 with a beam. By irradiating the first substrate 31 with a beam from the beam irradiation unit 25, the first substrate 31 is surface-treated. Similarly, the beam irradiation unit 26 irradiates the second substrate 32 held by the second holding unit 22 with a beam. By irradiating the second substrate 32 with a beam from the beam irradiation unit 26, the second substrate 32 is surface-treated.

第一基板31および第二基板32は、異種の材料または同種の材料とすることができる。例えばレーザー発振素子の接合を行なう場合、第一基板31はNd:YAGなどのレーザー発振材料であり、第二基板32はダイアモンドやサファイアなどの放熱材料である。なお、第一基板31を放熱材料とし、第二基板32を発振材料としてもよい。また、例えば非線形光学材料として用いられる結晶面が異なる水晶のように、同種の材料を第一基板31および第二基板32としてもよい。このように、第一基板31および第二基板32の材料は、任意に選択することができる。 The first substrate 31 and the second substrate 32 can be made of different materials or the same kind of material. For example, when joining laser oscillating elements, the first substrate 31 is a laser oscillating material such as Nd: YAG, and the second substrate 32 is a heat radiating material such as diamond or sapphire. The first substrate 31 may be used as a heat dissipation material, and the second substrate 32 may be used as an oscillation material. Further, the same kind of material may be used as the first substrate 31 and the second substrate 32, for example, a crystal having a different crystal plane used as a nonlinear optical material. As described above, the materials of the first substrate 31 and the second substrate 32 can be arbitrarily selected.

次に、接合装置10の要部について図1、図3に基づいて説明する。
接合装置10は、鍔形状部41、収容部42、押付部材43および支持部材44をさらに備えている。鍔形状部41は、第一保持部21に設けられている。鍔形状部41は、第一保持部21から径方向外側へ突出している。鍔形状部41は、第一保持部21の周方向の全周にわたり連続する円環状に設けてもよく、周方向へ不連続に設けてもよい。また、本実施形態の場合、鍔形状部41は、第一保持部21の端部、すなわち軸方向において第二保持部22とは反対側の端部に円環状に突出して設けられている。つまり、本実施形態の場合、第一保持部21は、軸方向において一方の端部に第一基板31を保持し、他方の端部に鍔形状部41を有している。なお、鍔形状部41は、第一保持部21の軸方向の端部に限らず、軸方向の途中に設けてもよい。
Next, the main part of the joining device 10 will be described with reference to FIGS. 1 and 3.
The joining device 10 further includes a flange-shaped portion 41, an accommodating portion 42, a pressing member 43, and a support member 44. The collar-shaped portion 41 is provided in the first holding portion 21. The flange-shaped portion 41 projects radially outward from the first holding portion 21. The flange-shaped portion 41 may be provided in a continuous annular shape over the entire circumference of the first holding portion 21 in the circumferential direction, or may be provided discontinuously in the circumferential direction. Further, in the case of the present embodiment, the flange-shaped portion 41 is provided so as to project in an annular shape at the end of the first holding portion 21, that is, the end opposite to the second holding portion 22 in the axial direction. That is, in the case of the present embodiment, the first holding portion 21 holds the first substrate 31 at one end in the axial direction, and has a collar-shaped portion 41 at the other end. The flange-shaped portion 41 is not limited to the axial end of the first holding portion 21, and may be provided in the middle of the axial direction.

第一保持部21は、自在継手部45を挟んで接続保持部23と一体に接続されている。第一保持部21は、接続保持部23との間に自在継手部45が配置されることにより、自在継手部45を支点として旋回することができる。これにより、第一保持部21と接続保持部23とは、自在継手部45を支点として相対的な姿勢が変化する。接続保持部23は、駆動機構部24によって軸方向すなわち図1および図2の上下に駆動される。そのため、接続保持部23は、第一保持部21と一体になって軸方向へ移動する。接続保持部23は、図2に示すようにチャンバ11に設けられている案内部46に沿って移動する。そのため、接続保持部23は、チャンバ11に対する姿勢は変化しない。これにより、接続保持部23は、チャンバ11に固定されている第二保持部22との間にも、姿勢の変化が生じない。すなわち、接続保持部23は、第二保持部22に保持されている第二基板32に対する姿勢を維持したまま軸方向へ移動する。なお、自在継手部45は、図1に示す構成に限らず、第一保持部21と接続保持部23との姿勢を変更可能であれば任意の構成とすることができる。 The first holding portion 21 is integrally connected to the connection holding portion 23 with the universal joint portion 45 interposed therebetween. The first holding portion 21 can rotate with the universal joint portion 45 as a fulcrum by arranging the universal joint portion 45 between the first holding portion 21 and the connection holding portion 23. As a result, the relative postures of the first holding portion 21 and the connection holding portion 23 change with the universal joint portion 45 as a fulcrum. The connection holding unit 23 is driven in the axial direction, that is, up and down in FIGS. 1 and 2 by the drive mechanism unit 24. Therefore, the connection holding portion 23 moves in the axial direction integrally with the first holding portion 21. The connection holding portion 23 moves along the guide portion 46 provided in the chamber 11 as shown in FIG. Therefore, the posture of the connection holding portion 23 with respect to the chamber 11 does not change. As a result, the posture of the connection holding portion 23 does not change with the second holding portion 22 fixed to the chamber 11. That is, the connection holding portion 23 moves in the axial direction while maintaining the posture with respect to the second substrate 32 held by the second holding portion 22. The universal joint portion 45 is not limited to the configuration shown in FIG. 1, and may have any configuration as long as the postures of the first holding portion 21 and the connection holding portion 23 can be changed.

接続保持部23は、収容部42を有している。収容部42は、接続保持部23の第二保持部22側の端部に設けられている。本実施形態の場合、収容部42は、軸方向において鍔形状部41を挟み込む第一壁部421および第二壁部422を有している。第一壁部421は、接続保持部23から径方向外側へ突出している。第二壁部422は、第一壁部421の第二保持部22側に第一壁部421と平行に設けられている。鍔形状部41は、これら第一壁部421と第二壁部422との間に挟み込まれている。鍔形状部41は、図3に示すように第一壁部421と対向する第一面411と、第二壁部422と対向する第二面412を有している。第一壁部421と第二壁部422とは、接続壁部423によって接続されている。これにより、収容部42は、第一壁部421、第二壁部422および接続壁部423によって一体に形成されている。鍔形状部41の軸方向の厚さは、第一壁部421と第二壁部422との間の距離よりも小さい。また、鍔形状部41の外径は、収容部42の内径よりも小さい。そのため、収容部42に収容された鍔形状部41は、収容部42の内部において姿勢を変化させることができる。なお、第一壁部421および第二壁部422は、接続保持部23の周方向へ連続していてもよく、不連続であってもよい。 The connection holding unit 23 has an accommodating unit 42. The accommodating portion 42 is provided at the end of the connection holding portion 23 on the second holding portion 22 side. In the case of the present embodiment, the accommodating portion 42 has a first wall portion 421 and a second wall portion 422 that sandwich the flange-shaped portion 41 in the axial direction. The first wall portion 421 projects radially outward from the connection holding portion 23. The second wall portion 422 is provided on the second holding portion 22 side of the first wall portion 421 in parallel with the first wall portion 421. The flange-shaped portion 41 is sandwiched between the first wall portion 421 and the second wall portion 422. As shown in FIG. 3, the collar-shaped portion 41 has a first surface 411 facing the first wall portion 421 and a second surface 412 facing the second wall portion 422. The first wall portion 421 and the second wall portion 422 are connected by a connecting wall portion 423. As a result, the accommodating portion 42 is integrally formed by the first wall portion 421, the second wall portion 422, and the connecting wall portion 423. The axial thickness of the flange-shaped portion 41 is smaller than the distance between the first wall portion 421 and the second wall portion 422. Further, the outer diameter of the flange-shaped portion 41 is smaller than the inner diameter of the accommodating portion 42. Therefore, the collar-shaped portion 41 accommodated in the accommodating portion 42 can change its posture inside the accommodating portion 42. The first wall portion 421 and the second wall portion 422 may be continuous or discontinuous in the circumferential direction of the connection holding portion 23.

押付部材43は、接続保持部23に設けられている。具体的には、押付部材43は、第一壁部421を貫いて設けられており、先端が鍔形状部41の第一面411に接する。押付部材43は、鍔形状部41に接することにより、収容部42に収容されている鍔形状部41を軸方向へ押し付ける。すなわち、本実施形態の場合、押付部材43は、鍔形状部41を第二保持部22側に押し付ける。 The pressing member 43 is provided on the connection holding portion 23. Specifically, the pressing member 43 is provided so as to penetrate the first wall portion 421, and its tip is in contact with the first surface 411 of the flange-shaped portion 41. By contacting the flange-shaped portion 41, the pressing member 43 presses the flange-shaped portion 41 housed in the accommodating portion 42 in the axial direction. That is, in the case of the present embodiment, the pressing member 43 presses the collar-shaped portion 41 toward the second holding portion 22 side.

本実施形態の場合、押付部材43は、本体431および接触部材432を有している。本体431は、外壁に雄ねじを有している。押付部材43の雄ねじが第一壁部421に形成された雌ねじと噛み合うことにより、押付部材43は第一壁部421を軸方向へ移動可能である。これにより、押付部材43は、ねじを締め込むことにより鍔形状部41側へ移動し、鍔形状部41を第二保持部22側に押し付ける。押付部材43は、収容部42の周方向において2つ以上設けられている。押付部材43は、収容部42の周方向へ3つ以上設けることが好ましい。押付部材43を収容部42の周方向へ3つ設けることにより、押付部材43で押し付けられる鍔形状部41の位置が安定する。 In the case of the present embodiment, the pressing member 43 has a main body 431 and a contact member 432. The main body 431 has a male screw on the outer wall. By engaging the male screw of the pressing member 43 with the female screw formed on the first wall portion 421, the pressing member 43 can move the first wall portion 421 in the axial direction. As a result, the pressing member 43 moves toward the flange-shaped portion 41 by tightening the screw, and presses the flange-shaped portion 41 against the second holding portion 22 side. Two or more pressing members 43 are provided in the circumferential direction of the accommodating portion 42. It is preferable that three or more pressing members 43 are provided in the circumferential direction of the accommodating portion 42. By providing three pressing members 43 in the circumferential direction of the accommodating portion 42, the position of the flange-shaped portion 41 pressed by the pressing member 43 is stabilized.

接触部材432は、本体431の鍔形状部41側の端部に設けられている。これにより、接触部材432は、鍔形状部41の第一面411に接触可能である。接触部材432は、外壁の一部が球面状に形成されており、本体431の内側で旋回可能である。接触部材432は、先端つまり鍔形状部41側に平坦面433を有しており、この平坦面433が鍔形状部41の第一面411に接することにより、姿勢が安定する。なお、図3に示す押付部材43は、本実施形態の一例であり、例えばボルトや圧入部材などのように鍔形状部41を軸方向へ押し付け可能な構成であれば、この例に限らず任意の構成とすることができる。 The contact member 432 is provided at the end of the main body 431 on the flange-shaped portion 41 side. As a result, the contact member 432 can come into contact with the first surface 411 of the flange-shaped portion 41. A part of the outer wall of the contact member 432 is formed in a spherical shape, and the contact member 432 can be swiveled inside the main body 431. The contact member 432 has a flat surface 433 at the tip, that is, on the side of the collar-shaped portion 41, and the flat surface 433 comes into contact with the first surface 411 of the flange-shaped portion 41 to stabilize the posture. The pressing member 43 shown in FIG. 3 is an example of the present embodiment, and is not limited to this example as long as the flange-shaped portion 41 can be pressed in the axial direction, such as a bolt or a press-fitting member. Can be configured as.

支持部材44は、鍔形状部41を挟んで押付部材43と反対側に設けられている。すなわち、支持部材44は、第二壁部422を貫いて設けられており、先端が鍔形状部41の第二面412に接している。これにより、支持部材44は、押付部材43によって押し付けられている鍔形状部41を押付部材43と反対側から支持している。支持部材44は、その中心軸が押付部材43の中心軸と一致することが好ましい。支持部材44と押付部材43の中心軸が一致することにより、鍔形状部41に加わる力が安定し、鍔形状部41の予期しない傾きなどを低減することができる。 The support member 44 is provided on the side opposite to the pressing member 43 with the flange-shaped portion 41 interposed therebetween. That is, the support member 44 is provided so as to penetrate the second wall portion 422, and the tip thereof is in contact with the second surface 412 of the flange-shaped portion 41. As a result, the support member 44 supports the collar-shaped portion 41 pressed by the pressing member 43 from the side opposite to the pressing member 43. It is preferable that the central axis of the support member 44 coincides with the central axis of the pressing member 43. By aligning the central axes of the support member 44 and the pressing member 43, the force applied to the flange-shaped portion 41 is stabilized, and unexpected inclination of the flange-shaped portion 41 can be reduced.

本実施形態の場合、支持部材44は、本体441、弾性部材442および接触部材443を有している。本体441は、第二壁部422にねじ止めされている。弾性部材442は、軸方向すなわち第一保持部21の軸方向へ伸縮可能である。弾性部材442は、コイルばね、皿ばね、ゴムなど、弾性力を生じるものであれば適用することができる。接触部材443は、弾性部材442の鍔形状部41側の端部に設けられている。これにより、接触部材443は、鍔形状部41の第二面412に接触可能である。接触部材443は、鍔形状部41つまり第二面412と接する部分が球面状に形成されている。本実施形態の場合、接触部材443は球状に形成されている。なお、図3に示す支持部材44は、本実施形態の一例であり、押付部材43の押し付け力に抗して鍔形状部41を反対側から支持可能であれば、この例に限らず任意の構成とすることができる。例えば、支持部材44は、接触部材443を廃して、弾性部材442のみで構成してもよい。また、ゴムなどの弾性体で接触部材443および弾性部材442を一体化した支持部材44としてもよい。さらに、支持部材44は、弾性部材442を廃して接続保持部23と一体に第二壁部422から突出する形状としてもよい。 In the case of the present embodiment, the support member 44 has a main body 441, an elastic member 442, and a contact member 443. The main body 441 is screwed to the second wall portion 422. The elastic member 442 can be expanded and contracted in the axial direction, that is, in the axial direction of the first holding portion 21. The elastic member 442 can be applied as long as it generates an elastic force, such as a coil spring, a disc spring, and rubber. The contact member 443 is provided at the end of the elastic member 442 on the flange-shaped portion 41 side. As a result, the contact member 443 can come into contact with the second surface 412 of the flange-shaped portion 41. In the contact member 443, the flange-shaped portion 41, that is, the portion in contact with the second surface 412 is formed in a spherical shape. In the case of this embodiment, the contact member 443 is formed in a spherical shape. The support member 44 shown in FIG. 3 is an example of the present embodiment, and is not limited to this example as long as the flange-shaped portion 41 can be supported from the opposite side against the pressing force of the pressing member 43. It can be configured. For example, the support member 44 may be composed of only the elastic member 442 by eliminating the contact member 443. Further, the support member 44 may be formed by integrating the contact member 443 and the elastic member 442 with an elastic body such as rubber. Further, the support member 44 may have a shape in which the elastic member 442 is eliminated and the support member 44 protrudes from the second wall portion 422 integrally with the connection holding portion 23.

次に、上記の構成による接合装置10による第一基板31と第二基板32との接合方法について説明する。
(基板保持工程)
図4に示すように第一基板31は、第一保持部21に保持される。同様に、第二基板32は、第二保持部22に保持される。第一基板31および第二基板32は、チャックや吸引などによってそれぞれ第一保持部21および第二保持部22に保持される。第一基板31および第二基板32が保持されると、駆動機構部24は、一体となった第一保持部21および接続保持部23を第二保持部22側へ駆動する。これにより、第一保持部21に保持されている第一基板31は、第二保持部22に保持されている第二基板32に接近する。
Next, a method of joining the first substrate 31 and the second substrate 32 by the joining device 10 having the above configuration will be described.
(Substrate holding process)
As shown in FIG. 4, the first substrate 31 is held by the first holding portion 21. Similarly, the second substrate 32 is held by the second holding portion 22. The first substrate 31 and the second substrate 32 are held by the first holding portion 21 and the second holding portion 22, respectively, by chucking, suction, or the like. When the first substrate 31 and the second substrate 32 are held, the drive mechanism unit 24 drives the integrated first holding unit 21 and the connection holding unit 23 toward the second holding unit 22. As a result, the first substrate 31 held by the first holding portion 21 approaches the second substrate 32 held by the second holding portion 22.

(位置決め工程)
図5に示すように位置決め工程では、駆動機構部24は、一体となった第一保持部21および接続保持部23を第二保持部22側に駆動する。これにより、第一保持部21に保持された第一基板31と、第二保持部22に保持された第二基板32とは、互いに接する。すなわち、第一基板31は、第二基板32に押し当てられる。このとき、第一基板31が第二基板32に接する力は、実際の接合時に比較して小さく設定されている。また、押付部材43は緩められている。そのため、第一保持部21は、自在継手部45を支点として自由に旋回可能である。
(Positioning process)
As shown in FIG. 5, in the positioning step, the drive mechanism unit 24 drives the integrated first holding unit 21 and the connection holding unit 23 toward the second holding unit 22. As a result, the first substrate 31 held by the first holding portion 21 and the second substrate 32 held by the second holding portion 22 are in contact with each other. That is, the first substrate 31 is pressed against the second substrate 32. At this time, the force of the first substrate 31 in contact with the second substrate 32 is set to be smaller than that at the time of actual joining. Further, the pressing member 43 is loosened. Therefore, the first holding portion 21 can freely rotate with the universal joint portion 45 as a fulcrum.

第二保持部22に保持されている第二基板32は、接合装置10の寸法的な公差や第二基板32自身の個体差などによって微小な傾斜を含んでいる。第一基板31を第二基板32に軽く押し当てることにより、第一保持部21に保持されている第一基板31は、この微小な傾斜を含む第二基板32の姿勢にあわせて姿勢が変化する。すなわち、上述のように第一基板31を保持する第一保持部21は自在継手部45を支点として旋回可能であることから、第一保持部21は保持する第一基板31の姿勢にあわせて姿勢が変化する。そして、第一基板31と第二基板32とが軽く押し当てられ、第一保持部21に保持された第一基板31の姿勢が第二基板32に合致している状態、つまり第一基板31と第二基板32との面平行が確保されているとき、押付部材43は鍔形状部41側へ進められる。周方向へ複数設けられている押付部材43は、すべて鍔形状部41側へ進められる。本実施形態の場合、雄ねじが形成されている押付部材43を回転することにより、押付部材43は鍔形状部41側へ移動する。鍔形状部41は、押付部材43と反対側が支持部材44で支持される。これにより、鍔形状部41は、押付部材43と支持部材44との間に挟み込まれる。 The second substrate 32 held by the second holding portion 22 includes a slight inclination due to a dimensional tolerance of the joining device 10 or an individual difference of the second substrate 32 itself. By lightly pressing the first substrate 31 against the second substrate 32, the posture of the first substrate 31 held by the first holding portion 21 changes according to the posture of the second substrate 32 including this slight inclination. do. That is, since the first holding portion 21 that holds the first substrate 31 can be swiveled with the universal joint portion 45 as a fulcrum as described above, the first holding portion 21 is adjusted to the posture of the first substrate 31 to be held. Posture changes. Then, the first substrate 31 and the second substrate 32 are lightly pressed against each other, and the posture of the first substrate 31 held by the first holding portion 21 matches the second substrate 32, that is, the first substrate 31. When the plane parallelism between the surface and the second substrate 32 is ensured, the pressing member 43 is advanced toward the flange-shaped portion 41. A plurality of pressing members 43 provided in the circumferential direction are all advanced toward the flange-shaped portion 41. In the case of the present embodiment, the pressing member 43 moves toward the flange-shaped portion 41 by rotating the pressing member 43 on which the male screw is formed. The flange-shaped portion 41 is supported by the support member 44 on the side opposite to the pressing member 43. As a result, the flange-shaped portion 41 is sandwiched between the pressing member 43 and the support member 44.

このように、押付部材43を鍔形状部41へ押し付けることにより、第一保持部21と接続保持部23とは姿勢が固定される。すなわち、自在継手部45を支点として旋回する第一保持部21と接続保持部23とは、鍔形状部41を押付部材43と支持部材44とで挟み込むことにより、その位置関係が固定される。ここで、第二基板32を保持する第二保持部22は、チャンバ11および駆動機構部24を通して接続保持部23との姿勢が一定に維持されている。そのため、第一保持部21と接続保持部23との姿勢を固定することにより、第一基板31の姿勢は、第二保持部22に保持されている第二基板32に対して固定される。すなわち、第一基板31の位置は、第二基板32に対し、平行が確保される位置として決定される。そして、第一保持部21と接続保持部23との間の姿勢は、押付部材43によって固定される。 By pressing the pressing member 43 against the collar-shaped portion 41 in this way, the postures of the first holding portion 21 and the connection holding portion 23 are fixed. That is, the positional relationship between the first holding portion 21 and the connection holding portion 23 that swivels around the universal joint portion 45 as a fulcrum is fixed by sandwiching the flange-shaped portion 41 between the pressing member 43 and the support member 44. Here, the posture of the second holding portion 22 that holds the second substrate 32 is maintained constant with the connection holding portion 23 through the chamber 11 and the drive mechanism portion 24. Therefore, by fixing the postures of the first holding portion 21 and the connection holding portion 23, the posture of the first substrate 31 is fixed with respect to the second substrate 32 held by the second holding portion 22. That is, the position of the first substrate 31 is determined as a position where parallelism is ensured with respect to the second substrate 32. Then, the posture between the first holding portion 21 and the connection holding portion 23 is fixed by the pressing member 43.

(ビーム照射工程)
押付部材43による第一保持部21と接続保持部23との姿勢の固定が完了すると、図6に示すように駆動機構部24は一体となった第一保持部21および接続保持部23を図6の上方へ駆動する。これにより、第一基板31は、第二基板32から離間する。第一保持部21および接続保持部23が予め設定された位置まで移動してからチャンバ11内を減圧した後、ビーム照射部25およびビーム照射部26はビームを照射する、すなわち、ビーム照射部25は第一基板31にビーム51を照射し、ビーム照射部26は第二基板32にビーム52を照射する。これにより、第一基板31および第二基板32の表面は、ビーム51またはビーム52によって表面処理が施される。
(Beam irradiation process)
When the posture of the first holding portion 21 and the connection holding portion 23 is fixed by the pressing member 43, the drive mechanism portion 24 has the first holding portion 21 and the connection holding portion 23 integrated as shown in FIG. Drive upward of 6. As a result, the first substrate 31 is separated from the second substrate 32. After the first holding unit 21 and the connection holding unit 23 move to the preset positions and then the inside of the chamber 11 is depressurized, the beam irradiation unit 25 and the beam irradiation unit 26 irradiate the beam, that is, the beam irradiation unit 25. Irradiates the first substrate 31 with the beam 51, and the beam irradiating unit 26 irradiates the second substrate 32 with the beam 52. As a result, the surfaces of the first substrate 31 and the second substrate 32 are surface-treated by the beam 51 or the beam 52.

(接合工程)
ビーム照射部25によるビーム51の照射およびビーム照射部26によるビーム52の照射が完了すると、再び図5に示すように駆動機構部24は一体となった第一保持部21および接続保持部23を下方へ駆動する。これにより、第一基板31は、第二基板32に接近し、接触する。そして、駆動機構部24は、第一基板31と第二基板32との接触力が予め設定された設定値となるように第一保持部21および接続保持部23を下方の第二保持部22側へ押し付ける。これにより、第一保持部21に保持されている第一基板31は、設定値で第二基板32に押し付けられる。このとき、上述の位置決め工程で説明したように第一保持部21と接続保持部23との姿勢を固定しているため、第一保持部21に保持されている第一基板31は、第二基板32との平行度が維持されている。そのため、第一基板31と第二基板32とは、精度の高い平行度で接する。
(Joining process)
When the irradiation of the beam 51 by the beam irradiation unit 25 and the irradiation of the beam 52 by the beam irradiation unit 26 are completed, the drive mechanism unit 24 again has the integrated first holding unit 21 and the connection holding unit 23 as shown in FIG. Drive downwards. As a result, the first substrate 31 approaches and contacts the second substrate 32. Then, the drive mechanism unit 24 lowers the first holding unit 21 and the connection holding unit 23 so that the contact force between the first substrate 31 and the second substrate 32 becomes a preset set value. Push it to the side. As a result, the first substrate 31 held by the first holding portion 21 is pressed against the second substrate 32 at the set value. At this time, since the postures of the first holding portion 21 and the connection holding portion 23 are fixed as described in the positioning step described above, the first substrate 31 held by the first holding portion 21 is second. The parallelism with the substrate 32 is maintained. Therefore, the first substrate 31 and the second substrate 32 are in contact with each other with high-precision parallelism.

駆動機構部24は、予め設定された時間、第二基板32に対して設定値を維持して第一基板31を押し付け、第一基板31と第二基板32とを接合する。第一基板31と第二基板32との接合が完了すると、駆動機構部24は再び第一保持部21および接続保持部23を一体に上方へ移動する。これにより、第一保持部21に保持されている第一基板31と第二保持部22に保持されている第二基板32との接合は終了する。 The drive mechanism unit 24 maintains the set value against the second substrate 32 for a preset time and presses the first substrate 31 to join the first substrate 31 and the second substrate 32. When the joining between the first substrate 31 and the second substrate 32 is completed, the drive mechanism portion 24 moves the first holding portion 21 and the connection holding portion 23 integrally upward again. As a result, the joining between the first substrate 31 held by the first holding portion 21 and the second substrate 32 held by the second holding portion 22 is completed.

(変形例)
上記による接合手順の変形例について説明する。
上記の実施形態では、第一基板31と第二基板32とから2層の接合体を形成した。変形例では、2層以上の多層の基板を積層する例を図7に基づいて説明する。
図7に示す変形例の場合、(A)に示すように第一基板に相当する基板61と第二基板に相当する基板62とが接合体63として接合された後、(B)に示すように接合体63はそのまま第二保持部22に保持される。すなわち、第一保持部21による基板61の保持を解除することにより、第一保持部21および接続保持部23が第二保持部22から離れるとき、基板61と基板62とが接合された接合体63はそのまま第二保持部22に保持された状態となる。このように、第二保持部22に接合体63を保持した状態で第一保持部21は図7の上方へ移動する。そして、(C)に示すように、この第一保持部21に新たに被接合体64が保持される。この場合、第二保持部22に保持された接合体63は第二基板に相当し、第一保持部21に新たに保持された被接合体64は第一基板に相当する。
(Modification example)
An example of modification of the joining procedure according to the above will be described.
In the above embodiment, a two-layer bonded body is formed from the first substrate 31 and the second substrate 32. In the modified example, an example of laminating two or more multi-layered substrates will be described with reference to FIG. 7.
In the case of the modification shown in FIG. 7, as shown in (A), after the substrate 61 corresponding to the first substrate and the substrate 62 corresponding to the second substrate are joined as the bonded body 63, as shown in (B). The bonded body 63 is held as it is in the second holding portion 22. That is, by releasing the holding of the substrate 61 by the first holding portion 21, when the first holding portion 21 and the connection holding portion 23 are separated from the second holding portion 22, the substrate 61 and the substrate 62 are joined to each other. 63 is in a state of being held by the second holding portion 22 as it is. In this way, the first holding portion 21 moves upward in FIG. 7 while the bonded body 63 is held by the second holding portion 22. Then, as shown in (C), the joined body 64 is newly held in the first holding portion 21. In this case, the bonded body 63 held by the second holding portion 22 corresponds to the second substrate, and the bonded body 64 newly held by the first holding portion 21 corresponds to the first substrate.

第一保持部21に新たに被接合体64が保持されると、この被接合体64および第二保持部22に保持された接合体63は、ビーム照射部25およびビーム照射部26からビームが照射される。これにより、被接合体64および接合体63の表面処理が施される。そして、被接合体64を保持している第一保持部21および接続保持部23は、(D)に示すように第二保持部22側へ移動する。これにより、第一保持部21に保持されている被接合体64は、第二保持部22に保持されている接合体63に接合される。 When the bonded body 64 is newly held by the first holding portion 21, the bonded body 63 held by the bonded body 64 and the second holding portion 22 receives a beam from the beam irradiation unit 25 and the beam irradiation unit 26. Be irradiated. As a result, the surface treatment of the bonded body 64 and the bonded body 63 is performed. Then, the first holding portion 21 and the connection holding portion 23 holding the joined body 64 move to the second holding portion 22 side as shown in (D). As a result, the bonded body 64 held by the first holding portion 21 is joined to the bonded body 63 held by the second holding portion 22.

(A)に示すように最初に基板61と基板62とを接合する際、上述の実施形態のように基板61と基板62との平行度は接合に先立って調整されている。すなわち、接続保持部23に対する第一保持部21の姿勢は、基板61と基板62との接合に先立つ位置決め工程ですでに固定されている。つまり、ロットが共通する各基板を用いる場合、接合装置10の寸法的な公差や各基板の公差など平行度の確保に影響を与える要素は、最初に基板61と基板62とを接合する際に調整される。そのため、第二段階として(D)において接合体63に新たな被接合体64を接合する場合、接続保持部23に対する第一保持部21の姿勢を調整することなく、接合体63と被接合体64とが接合される。(E)に示すように、接合体63と被接合体64との接合体65も、第二保持部22に保持される。この(A)~(E)の工程を繰り返すことにより、3層以上の多層の接合体を連続的に形成することができる。また、(A)の工程に先立って位置決め工程を実施することにより、3層以上の多層の接合体を形成する場合、高精度に平行度を確保しつつ確実な接合が達成されるとともに、処理工数の低減が図られる。 As shown in (A), when the substrate 61 and the substrate 62 are first joined, the parallelism between the substrate 61 and the substrate 62 is adjusted prior to the joining as in the above-described embodiment. That is, the posture of the first holding portion 21 with respect to the connection holding portion 23 is already fixed in the positioning step prior to joining the substrate 61 and the substrate 62. That is, when each board having a common lot is used, factors that affect the securing of parallelism such as the dimensional tolerance of the joining device 10 and the tolerance of each board are the factors that affect the securing of parallelism when the board 61 and the board 62 are first joined. Be adjusted. Therefore, when a new joined body 64 is joined to the joined body 63 in (D) as the second step, the joined body 63 and the joined body do not have to adjust the posture of the first holding portion 21 with respect to the connection holding portion 23. 64 is joined. As shown in (E), the bonded body 65 of the bonded body 63 and the bonded body 64 is also held by the second holding portion 22. By repeating the steps (A) to (E), a multi-layered bonded body having three or more layers can be continuously formed. Further, when the positioning step is carried out prior to the step (A) to form a multi-layered bonded body having three or more layers, reliable bonding is achieved while ensuring parallelism with high accuracy, and processing is performed. The number of man-hours can be reduced.

当然ながら接合体の層の数が増加するにつれて微小な誤差が蓄積され、平行度の維持が困難になることも考えられる。このように誤差の蓄積が予想される場合、当初の実施形態の通り、ビーム照射部25、26からビームの照射を行なう前に、2つの被接合体を仮に押し当てて第一保持部21と接続保持部23との姿勢を調整する構成としてもよい。 As a matter of course, as the number of layers of the bonded body increases, a small error may be accumulated and it may become difficult to maintain parallelism. When the accumulation of errors is expected in this way, as in the initial embodiment, the two objects to be joined are tentatively pressed against the first holding portion 21 before irradiating the beam from the beam irradiating portions 25 and 26. It may be configured to adjust the posture with the connection holding portion 23.

以上説明した一実施形態では、第一基板31を保持する第一保持部21は、自在継手部45を挟んで接続保持部23と接続している。これにより、第一保持部21は、接続保持部23に対する姿勢を変更可能である。また、第一保持部21に設けられている鍔形状部41は、接続保持部23に設けられている押付部材43と支持部材44との間に挟み込まれている。そのため、第一保持部21に設けられている鍔形状部41は、押付部材43の押付力を調整することにより、押付部材43と支持部材44との間に固定される。鍔形状部41を固定することにより、第一基板31を保持する第一保持部21は、接続保持部23に対する姿勢が固定される。 In one embodiment described above, the first holding portion 21 that holds the first substrate 31 is connected to the connection holding portion 23 with the universal joint portion 45 interposed therebetween. As a result, the first holding portion 21 can change its posture with respect to the connection holding portion 23. Further, the collar-shaped portion 41 provided in the first holding portion 21 is sandwiched between the pressing member 43 provided in the connection holding portion 23 and the support member 44. Therefore, the collar-shaped portion 41 provided in the first holding portion 21 is fixed between the pressing member 43 and the support member 44 by adjusting the pressing force of the pressing member 43. By fixing the flange-shaped portion 41, the posture of the first holding portion 21 that holds the first substrate 31 with respect to the connection holding portion 23 is fixed.

第一基板31と第二基板32との接合に先立って、第一保持部21に保持されている第一基板31は第二保持部22に保持されている接合対象となる第二基板32に押し当てられる。このとき、第一基板31と第二基板32とが接することにより、第一基板31を保持する第一保持部21は、自在継手部45を支点として旋回し、第二基板32にあわせた姿勢となる。すなわち、第一基板31と第二基板32とが接することにより、第一基板31と第二基板32とは面平行が確保される。そして、第一基板31を保持する第一保持部21は、接続保持部23に対する姿勢が第二基板32にあわせて変化している。このように第一保持部21の姿勢が変化した状態で鍔形状部41を挟み込む押付部材43の押付力を調整することにより、接続保持部23に対する第一保持部21の姿勢は固定される。接続保持部23に対する第一保持部21の姿勢を固定することにより、第一基板31と第二基板32とが一旦離間した後に再び接する場合でも、第一基板31を保持する第一保持部21は、第二基板32に合わせた姿勢が維持される。その結果、第一保持部21に保持されている第一基板31は、第二基板32との間の面の平行度が維持されている。したがって、対向する一対の第一基板31と第二基板32との平行度を高めることができ、第一基板31および第二基板32が大型化しても平行度を容易に確保して安定した接合を達成することができる。 Prior to joining the first substrate 31 and the second substrate 32, the first substrate 31 held by the first holding portion 21 is attached to the second substrate 32 to be joined held by the second holding portion 22. Pressed. At this time, when the first substrate 31 and the second substrate 32 are in contact with each other, the first holding portion 21 that holds the first substrate 31 swivels around the universal joint portion 45 as a fulcrum, and has a posture that matches the second substrate 32. It becomes. That is, when the first substrate 31 and the second substrate 32 are in contact with each other, the plane parallelism between the first substrate 31 and the second substrate 32 is ensured. The posture of the first holding portion 21 that holds the first substrate 31 with respect to the connection holding portion 23 changes according to the second substrate 32. By adjusting the pressing force of the pressing member 43 that sandwiches the flange-shaped portion 41 in the state where the posture of the first holding portion 21 is changed in this way, the posture of the first holding portion 21 with respect to the connection holding portion 23 is fixed. By fixing the posture of the first holding portion 21 with respect to the connection holding portion 23, the first holding portion 21 that holds the first substrate 31 even when the first substrate 31 and the second substrate 32 are once separated and then brought into contact with each other again. Maintains a posture that matches the second substrate 32. As a result, the surface parallelism of the first substrate 31 held by the first holding portion 21 with the second substrate 32 is maintained. Therefore, the parallelism between the pair of the first substrate 31 and the second substrate 32 facing each other can be increased, and even if the first substrate 31 and the second substrate 32 are increased in size, the parallelism is easily secured and stable bonding is performed. Can be achieved.

一実施形態では、ビーム照射部25から第一基板31へ、およびビーム照射部26から第二基板32へイオンビームなどのビームを照射することにより、第一基板31および第二基板32の表面処理を施している。これにより、第一基板31および第二基板32が大型化しても、表面活性化による接合が可能となる。そのため、第一基板31と第二基板32とは、任意の温度環境下において接合される。その結果、接合時の温度条件を第一基板31と第二基板32との接合体の使用時に合わせることができる。このように接合時の温度条件を接合体の使用時の温度条件に合わせることにより、使用時において接合体に生じる歪みや特性の変化が低減される。したがって、接合によって得られた接合体の特性が安定し、光学的および物理的な精度の高い接合体を得ることができる。特に、レーザー発振素子などのように使用時の温度条件によって効率の変化が大きな材料などの場合、温度環境によって性能に与える影響を大きく抑えることができる。そして、本実施形態のようにビームの照射に先立って第一基板31と第二基板32とを軽く接触させつつ第一保持部21の位置を決定する構成を利用することにより、寸法の大きなレーザー発振素子が得られる。その結果、レーザー発振素子から照射されるレーザー光の高出力化を図ることができる。 In one embodiment, the surface treatment of the first substrate 31 and the second substrate 32 is performed by irradiating the beam irradiation unit 25 to the first substrate 31 and the beam irradiation unit 26 to the second substrate 32 with a beam such as an ion beam. Is given. As a result, even if the first substrate 31 and the second substrate 32 are increased in size, they can be joined by surface activation. Therefore, the first substrate 31 and the second substrate 32 are joined under an arbitrary temperature environment. As a result, the temperature conditions at the time of joining can be adjusted when the bonded body of the first substrate 31 and the second substrate 32 is used. By matching the temperature conditions at the time of joining to the temperature conditions at the time of using the joined body in this way, distortions and changes in characteristics that occur in the joined body during use can be reduced. Therefore, the characteristics of the joined body obtained by joining are stable, and a joined body with high optical and physical accuracy can be obtained. In particular, in the case of a material such as a laser oscillator whose efficiency changes greatly depending on the temperature conditions at the time of use, the influence on the performance due to the temperature environment can be greatly suppressed. Then, by using a configuration as in the present embodiment in which the position of the first holding portion 21 is determined while lightly contacting the first substrate 31 and the second substrate 32 prior to the irradiation of the beam, a laser having a large size is used. An oscillating element is obtained. As a result, it is possible to increase the output of the laser light emitted from the laser oscillation element.

一実施形態では、押付部材43は、本体431の先端に旋回可能な接触部材432を有している。また、支持部材44は、鍔形状部41に接する接触部材443が球面状に形成されている。これにより、収容部42に収容されている鍔形状部41は、第一保持部21と接続保持部23との姿勢が固定されている状態でも、極めて微小な姿勢の変化が許容される。また、支持部材44が弾性部材442などの弾性部分を有することによっても、鍔形状部41の微小な姿勢の変化が許容される。そのため、接合装置10の公差に比較して十分に小さな寸法誤差が第一基板31および第二基板32に生じていても、その誤差は収容部42における鍔形状部41の姿勢の変化によって吸収される。すなわち、第一基板31および第二基板32の微小な寸法誤差にともなう第一保持部21と接続保持部23との微小な姿勢の変化は、収容部42における鍔形状部41の姿勢の変化によって吸収される。その結果、第一基板31と第二基板32を連続的に接合する場合、第一保持部21と接続保持部23との姿勢を固定した状態でも、接合ごとに第一保持部21と接続保持部23との姿勢を調整することなく、第一基板31と第二基板32との平行度が確保される。したがって、複数の第一基板31と第二基板32とを繰り返し接合するとき、あるいは多層の基板を連続的に接合するとき、接合ごとに調整を行なうことなく、高精度な平行度を確保することができ、工数の低減を図ることができる。 In one embodiment, the pressing member 43 has a swivel contact member 432 at the tip of the main body 431. Further, in the support member 44, the contact member 443 in contact with the flange-shaped portion 41 is formed in a spherical shape. As a result, the collar-shaped portion 41 housed in the accommodating portion 42 is allowed to change in an extremely small posture even when the postures of the first holding portion 21 and the connection holding portion 23 are fixed. Further, even if the support member 44 has an elastic portion such as an elastic member 442, a slight change in the posture of the flange-shaped portion 41 is allowed. Therefore, even if a dimensional error sufficiently small compared to the tolerance of the joining device 10 occurs in the first substrate 31 and the second substrate 32, the error is absorbed by the change in the posture of the flange-shaped portion 41 in the accommodating portion 42. Tolerance. That is, the slight change in posture between the first holding portion 21 and the connection holding portion 23 due to the minute dimensional error of the first substrate 31 and the second substrate 32 is due to the change in the posture of the flange-shaped portion 41 in the accommodating portion 42. Be absorbed. As a result, when the first substrate 31 and the second substrate 32 are continuously joined, the connection is held with the first holding portion 21 for each joining even when the postures of the first holding portion 21 and the connection holding portion 23 are fixed. The parallelism between the first substrate 31 and the second substrate 32 is ensured without adjusting the posture with the portion 23. Therefore, when the plurality of first substrates 31 and the second substrate 32 are repeatedly bonded, or when a plurality of substrates are continuously bonded, high-precision parallelism is ensured without making adjustments for each bonding. It is possible to reduce the man-hours.

以上説明した本発明は、上記実施形態に限定されるものではなく、その要旨を逸脱しない範囲で種々の実施形態に適用可能である。
上述の一実施形態では、第一保持部21と第二保持部22とが重力方向つまり垂直方向に配置される例について説明した。しかし、第一保持部21と第二保持部22とは、垂直方向に限らず、水平方向に配置してもよい。
The present invention described above is not limited to the above embodiment, and can be applied to various embodiments without departing from the gist thereof.
In one embodiment described above, an example in which the first holding portion 21 and the second holding portion 22 are arranged in the direction of gravity, that is, in the vertical direction has been described. However, the first holding portion 21 and the second holding portion 22 may be arranged not only in the vertical direction but also in the horizontal direction.

本開示は、実施例に準拠して記述されたが、本開示は当該実施例や構造に限定されるものではないと理解される。本開示は、様々な変形例や均等範囲内の変形をも包含する。加えて、様々な組み合わせや形態、さらには、それらに一要素のみ、それ以上、あるいはそれ以下、を含む他の組み合わせや形態をも、本開示の範疇や思想範囲に入るものである。 The present disclosure has been described in accordance with the examples, but it is understood that the present disclosure is not limited to the examples and structures. The present disclosure also includes various variations and variations within a uniform range. In addition, various combinations and forms, as well as other combinations and forms that include only one element, more, or less, are within the scope and scope of the present disclosure.

図面中、10は接合装置、11はチャンバ、12は真空ポンプ(減圧機構部)、13はターボ分子ポンプ(減圧機構部)、21は第一保持部、22は第二保持部、23は接続保持部、24は駆動機構部、25、26はビーム照射部、31は第一基板、32は第二基板、41は鍔形状部、42は収容部、43は押付部材、44は支持部材、45は自在継手部、431は本体、432は接触部材、442は弾性部材、443は接触部材を示す。 In the drawing, 10 is a joining device, 11 is a chamber, 12 is a vacuum pump (decompression mechanism), 13 is a turbo molecular pump (decompression mechanism), 21 is a first holding part, 22 is a second holding part, and 23 is a connection. The holding part, 24 is the drive mechanism part, 25 and 26 are the beam irradiation parts, 31 is the first substrate, 32 is the second substrate, 41 is the flange-shaped part, 42 is the accommodating part, 43 is the pressing member, and 44 is the support member. 45 is a universal joint portion, 431 is a main body, 432 is a contact member, 442 is an elastic member, and 443 is a contact member.

Claims (6)

第一基板と、前記第一基板と別体の第二基板とを、前記第一基板および前記第二基板の表面を活性化することにより接合する接合装置であって、
軸方向の一方の端部に前記第一基板を保持する第一保持部と、
前記第一保持部と対向して設けられ、前記第二基板を保持する第二保持部と、
自在継手部を挟んで前記第一保持部と一体に接続されている接続保持部と、
前記第一保持部および前記接続保持部を一体に、前記第二保持部に対して接近または離間する方向へ駆動する駆動機構部と、
前記第一保持部に設けられ、前記第一保持部から径方向外側へ突出している鍔形状部と、
前記接続保持部に設けられ、軸方向において両側から前記鍔形状部を挟み込み、前記鍔形状部を収容する収容部と、
前記接続保持部に設けられ、前記第一保持部の軸方向において前記鍔形状部の一方の面に接し、前記鍔形状部を軸方向へ押し付ける押付部材と、
前記接続保持部において前記鍔形状部を挟んで前記押付部材と反対側に設けられ、前記第一保持部の軸方向において前記鍔形状部の他方の面に接し、前記押付部材によって押し付けられる前記鍔形状部を支持する支持部材と、
を備える接合装置。
A joining device that joins a first substrate and a second substrate that is separate from the first substrate by activating the surfaces of the first substrate and the second substrate.
A first holding portion that holds the first substrate at one end in the axial direction,
A second holding portion provided so as to face the first holding portion and holding the second substrate, and a second holding portion.
A connection holding portion that is integrally connected to the first holding portion with a universal joint portion sandwiched between them.
A drive mechanism unit that integrally drives the first holding portion and the connection holding portion in a direction approaching or separating from the second holding portion.
A collar-shaped portion provided in the first holding portion and protruding radially outward from the first holding portion, and a collar-shaped portion.
An accommodating portion provided in the connection holding portion, sandwiching the brim-shaped portion from both sides in the axial direction, and accommodating the brim-shaped portion.
A pressing member provided in the connection holding portion, which is in contact with one surface of the flange-shaped portion in the axial direction of the first holding portion and presses the flange-shaped portion in the axial direction.
The collar that is provided on the side opposite to the pressing member across the collar-shaped portion in the connection holding portion, is in contact with the other surface of the collar-shaped portion in the axial direction of the first holding portion, and is pressed by the pressing member. A support member that supports the shape and
A joining device equipped with.
前記押付部材の中心軸と前記支持部材の中心軸とは一致している請求項1記載の接合装置。 The joining device according to claim 1, wherein the central axis of the pressing member and the central axis of the support member coincide with each other. 前記第一保持部および前記第二保持部を収容するチャンバと、
前記チャンバの内部を減圧する減圧機構部と、
をさらに備える請求項1または2記載の接合装置。
A chamber accommodating the first holding portion and the second holding portion,
A decompression mechanism that depressurizes the inside of the chamber,
The joining device according to claim 1 or 2, further comprising.
前記チャンバの内部に設けられ、前記第一基板の表面および前記第二基板の表面を処理するビームを発するビーム照射部をさらに備える請求項3記載の接合装置。 The joining device according to claim 3, further comprising a beam irradiating unit that is provided inside the chamber and emits a beam that processes the surface of the first substrate and the surface of the second substrate. 前記押付部材は、
前記収容部を形成する前記接続保持部に移動可能に設けられている本体と、
前記本体の前記鍔形状部側の端部に旋回可能に設けられ、前記鍔形状部と接する接触部材と、
を有する請求項1から4のいずれか一項記載の接合装置。
The pressing member is
A main body movably provided in the connection holding portion forming the accommodating portion,
A contact member that is rotatably provided at the end of the main body on the collar-shaped portion side and is in contact with the collar-shaped portion.
The joining device according to any one of claims 1 to 4.
前記支持部材は、
前記第一保持部の軸方向へ伸縮可能な弾性部材と、
前記弾性部材の前記鍔形状部側の端部に設けられ、前記鍔形状部と接する部分が球面状に形成されている接触部材と、
を有する請求項1から5のいずれか一項記載の接合装置
The support member is
An elastic member that can expand and contract in the axial direction of the first holding portion, and
A contact member provided at the end of the elastic member on the collar-shaped portion side and having a spherically formed portion in contact with the collar-shaped portion.
The joining device according to any one of claims 1 to 5 .
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