JP6989709B2 - 電極構造体、その製造方法、およびこれを含む電気化学素子 - Google Patents
電極構造体、その製造方法、およびこれを含む電気化学素子 Download PDFInfo
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Description
以下、本発明を具体的に説明するために実施例を挙げて詳しく説明する。しかし、本発明に係る実施例は種々の異なる形態に変形可能であり、本発明の範囲が以下に述べる実施例に限定されると解釈されない。本明細書の実施例は、当業界における平均的な知識を有する者に本発明をより完全に説明するために提供されるものである。
銅箔(Alfa Aesar、99.999%)を用意し、FUJI XEROX社のCP405dおよびそのレーザプリンタトナーカートリッジを用いて、前記銅箔上に直接レーザプリンティングして電極パターンの印刷層を形成した。
純度99.9%のニッケル箔を用いたことを除き、前記実施例1と同様の方法で電極構造体を製造した。
本発明の製造方法で製造された電極構造体に、レーザプリンタトナーに含まれた顔料および有機バインダーなどが残留するか否かを測定するために、ラマン分光法およびFT−IR(fourier transform infrared spectroscopy)分光法を利用して、前記実施例1で電極パターンに形成された印刷層(アニーリング前)およびグラフェン−黒鉛質炭素複合層(アニーリング後)を分析した。
本発明の製造方法で製造された電極構造体のグラフェン−黒鉛質炭素複合層の炭素結合形態を確認するために、前記実施例1で電極パターンに形成された印刷層(アニーリング前)およびグラフェン−黒鉛質炭素複合層(アニーリング後)に対するXPS(X−ray photoelectron spectroscopy)分析を実施した。XPS分析は、Research Institute of Advanced MaterialsのKRATOS AXIS−hisモデルを用いて測定した。
前記実施例1で製造された電極構造体のグラフェン−黒鉛質炭素複合層の電気的物性を測定するために、前記実施例1で製造された電極構造体上にポリマー支持層をコーティングし、銅箔をエッチング液を用いて除去した。さらに、ポリマー支持層上に付着したグラフェン−黒鉛質炭素複合層をSiO2/Siウエハに転写した後、前記ポリマー支持層をアセトンを用いて除去した。さらに、前記グラフェン−黒鉛質炭素複合層上に金属電極を備えてFET(Filed effect transistor)素子を作製した後、電圧を調節して伝導度を測定した。
付着力テストのために、前記実施例1と同様の方法で製造された電極構造体サンプルに対して、商用のテープ(3M社)を前記サンプルの表面に手で圧着して付着させた後、これを手で剥がす方法を利用してピールオフ(peel−off)テストを行った。
耐薬品性テストのために、前記実施例1と同様の方法で製造された電極構造体サンプルを多様な溶液(浸漬液)に浸漬させた後、損失する質量を測定した。
前記実施例1により製造された電極構造体の電気的特性を評価するために、グローブボックス内にリチウム金属を対電極として、前記電極構造体を作用電極として配置し、1MのLiPF6がエチレンカーボネート/ジメチルカーボネート(EC/DMC;1:1vol%)に溶解した電解質が備えられた実験用リチウムイオン電池を製造した。さらに、GF/F等級の分離膜(Whatman、U.S.A.)をアセトンで超音波処理をした後、180℃で乾燥して使用した。
200:グラフェン層
300:黒鉛質炭素ナノ粒子
400:パターニングされたグラフェン−黒鉛質炭素複合層
Claims (16)
- 金属薄膜と、
前記金属薄膜上に位置したパターニングされたグラフェン−黒鉛質炭素複合層とを含み、
前記パターニングされたグラフェン−黒鉛質炭素複合層は、グラフェン層および黒鉛質炭素ナノ粒子を含む電極構造体。 - 前記グラフェン層は、1層〜10層のグラフェンシートを含む、請求項1に記載の電極構造体。
- 前記グラフェン層は、前記金属薄膜上に直接接して、前記パターニングされたグラフェン−黒鉛質炭素複合層に含まれる、請求項1に記載の電極構造体。
- 前記黒鉛質炭素ナノ粒子は、1nm以上500nm以下の直径を有する、請求項1に記載の電極構造体。
- 前記金属薄膜は、銅薄膜またはニッケル薄膜である、請求項1に記載の電極構造体。
- 前記パターニングされたグラフェン−黒鉛質炭素複合層の厚さは、1nm以上50μm以下である、請求項1に記載の電極構造体。
- 前記黒鉛質炭素ナノ粒子は、黒鉛(graphite)および高配向性熱分解黒鉛(highly oriented pyrolytic graphite;HOPG)の少なくとも1種を含む、請求項1に記載の電極構造体。
- 炭素粉末を含むレーザプリンタトナーを用いて、レーザプリンティングによって金属薄膜上にパターニングされた印刷層を形成するステップと、
前記パターニングされた印刷層が形成された金属薄膜をアニーリングして、前記金属薄膜上にパターニングされたグラフェン−黒鉛質炭素複合層を形成するステップとを含む、
請求項1に記載の電極構造体の製造方法。 - 前記ステップをロールツーロールの連続工程で順次に繰り返し行う、請求項8に記載の電極構造体の製造方法。
- 前記アニーリングは、700℃〜1,000℃の温度で加熱するステップと、
常温に冷却するステップとを含む、請求項8に記載の電極構造体の製造方法。 - 前記アニーリングは、水素ガス雰囲気下で行われる、請求項10に記載の電極構造体の製造方法。
- 前記金属薄膜は、銅薄膜またはニッケル薄膜である、請求項8に記載の電極構造体の製造方法。
- 前記パターニングされた印刷層は、1.5nm以上75μm以下の厚さに形成される、請求項8に記載の電極構造体の製造方法。
- 前記パターニングされた印刷層は、前記金属薄膜上に複数形成される、請求項8に記載の電極構造体の製造方法。
- 請求項1に記載の電極構造体を含む電気化学素子。
- 前記電気化学素子は、スーパーキャパシタ、リチウム二次電池、燃料電池、またはガス発生装置である、請求項15に記載の電気化学素子。
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