JP6975430B2 - Work surface treatment device and work surface treatment method - Google Patents

Work surface treatment device and work surface treatment method Download PDF

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JP6975430B2
JP6975430B2 JP2019021359A JP2019021359A JP6975430B2 JP 6975430 B2 JP6975430 B2 JP 6975430B2 JP 2019021359 A JP2019021359 A JP 2019021359A JP 2019021359 A JP2019021359 A JP 2019021359A JP 6975430 B2 JP6975430 B2 JP 6975430B2
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work
slurry
surface treatment
substrate
moving
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JP2020127981A (en
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文泰 齋藤
敏一 古澤
剛士 阿部
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JTEKT Corp
Macoho Co Ltd
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JTEKT Corp
Macoho Co Ltd
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Priority to JP2019021359A priority Critical patent/JP6975430B2/en
Priority to CN201980047699.8A priority patent/CN112437711B/en
Priority to PCT/JP2019/051251 priority patent/WO2020162078A1/en
Priority to DE112019006842.3T priority patent/DE112019006842T5/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C3/00Abrasive blasting machines or devices; Plants
    • B24C3/08Abrasive blasting machines or devices; Plants essentially adapted for abrasive blasting of travelling stock or travelling workpieces
    • B24C3/085Abrasive blasting machines or devices; Plants essentially adapted for abrasive blasting of travelling stock or travelling workpieces the travelling workpieces being moved into different working positions during travelling
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21JFORGING; HAMMERING; PRESSING METAL; RIVETING; FORGE FURNACES
    • B21J3/00Lubricating during forging or pressing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C3/00Abrasive blasting machines or devices; Plants
    • B24C3/08Abrasive blasting machines or devices; Plants essentially adapted for abrasive blasting of travelling stock or travelling workpieces
    • B24C3/083Transfer or feeding devices; Accessories therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C3/00Abrasive blasting machines or devices; Plants
    • B24C3/08Abrasive blasting machines or devices; Plants essentially adapted for abrasive blasting of travelling stock or travelling workpieces
    • B24C3/10Abrasive blasting machines or devices; Plants essentially adapted for abrasive blasting of travelling stock or travelling workpieces for treating external surfaces
    • B24C3/12Apparatus using nozzles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C5/00Devices or accessories for generating abrasive blasts
    • B24C5/02Blast guns, e.g. for generating high velocity abrasive fluid jets for cutting materials
    • B24C5/04Nozzles therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C9/00Appurtenances of abrasive blasting machines or devices, e.g. working chambers, arrangements for handling used abrasive material

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Spray Control Apparatus (AREA)
  • Forging (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Description

本発明は、ワーク表面処理装置及びこのワーク表面処理装置を用いたワーク表面処理方法に関するものである。 The present invention relates to a work surface treatment apparatus and a work surface treatment method using the work surface treatment apparatus.

機械部品の製造方法として採用される冷間鍛造は、切削による製造に比べて製造できる形状が制約されるというデメリットはあるものの、材料ロスが殆どなく材料費を大幅に削減することができる点、加工時間が短く量産性に優れる点、強度・耐摩耗性に優れた製品製造が可能となる点など、数多くのメリットを有する。 Cold forging, which is used as a manufacturing method for machine parts, has the disadvantage that the shape that can be manufactured is restricted compared to manufacturing by cutting, but there is almost no material loss and material costs can be significantly reduced. It has many merits such as short processing time, excellent mass productivity, and the ability to manufacture products with excellent strength and wear resistance.

ところで、この冷間鍛造を用いる場合、被鍛造部材の型離れを良くしたり、加工時に生じる熱や接触圧力による金型や被鍛造部材そのものの破損を防止するため、表面に潤滑剤を付与する処理(表面に潤滑皮膜を形成するボンデ処理)が施された被鍛造部材を用いることが多い。 By the way, when this cold forging is used, a lubricant is applied to the surface in order to improve the mold release of the forged member and prevent damage to the die and the forged member itself due to heat and contact pressure generated during processing. In many cases, a member to be forged that has been treated (bonded to form a lubricating film on the surface) is used.

このボンデ処理に関しては、従来処理では処理工程が非常に多く、そのため処理施設(設備)も大掛かりなものとなり、更に薬品とワークの化学反応により生じる廃棄物や汚染された廃液の処理が極めて厄介であるなど、環境面を含め種々の問題点を有するものであり、近年は環境負荷の少ないシャワーや浸漬によりワーク表面に潤滑剤を付与する塗布型潤滑剤の需要が増加している。 Regarding this bonde treatment, the conventional treatment has a large number of treatment steps, which makes the treatment facility (equipment) large-scale, and further, it is extremely troublesome to treat the waste and contaminated waste liquid generated by the chemical reaction between the chemical and the work. It has various problems including environmental aspects, and in recent years, there has been an increase in demand for a coating type lubricant that lubricates the work surface by showering or dipping with a small environmental load.

しかしながら、この塗布型潤滑剤は、塗布量が多すぎると成形金型を汚してしまい、また少な過ぎると十分な潤滑効果が得られない不具合が生じるため、塗布量管理が極めて重要なものとなっているが、その管理が非常に厄介なものであった。 However, if the coating amount of this coating type lubricant is too large, the molding die will be soiled, and if the coating amount is too small, a sufficient lubricating effect will not be obtained. Therefore, it is extremely important to control the coating amount. However, its management was very troublesome.

このような従来処理における問題点を解決すべく、本出願人は、被鍛造部材へのボンデ処理に関し、特許第5523507号(以下、従来例という。)に開示されるワーク表面処理装置を提案し、塗布量の適正化を図っている。 In order to solve such problems in the conventional treatment, the applicant proposes a work surface treatment apparatus disclosed in Japanese Patent No. 5523507 (hereinafter referred to as a conventional example) regarding the bonding treatment to the forged member. , We are trying to optimize the coating amount.

従来例に開示されるワーク表面処理装置は、ワーク(被鍛造部材)に対して液体と砥粒との混合物であるスラリを噴射するスラリ噴射部を備え、回転するワークの表面に潤滑剤を付与する(付着させる)前に、このスラリ噴射部から噴射されるスラリでワークの表面をウェットブラスト処理し、ワークの表面に付着している酸化膜や油などの汚れを除去すると共にこのワークの表面に細かい凹凸を形成し、このワークの表面への潤滑剤(潤滑皮膜)の付着性を向上させるための前処理を行うように構成されている。 The work surface treatment apparatus disclosed in the prior art includes a slurry injection portion that injects a slurry, which is a mixture of liquid and abrasive grains, to the work (member to be forged), and lubricates the surface of the rotating work. The surface of the work is wet-blasted with the slurry ejected from this slurry injection part to remove stains such as oxide film and oil adhering to the surface of the work and the surface of this work. It is configured to form fine irregularities on the surface and perform pretreatment to improve the adhesion of the lubricant (lubricating film) to the surface of the work.

特許第5523507号公報Japanese Patent No. 5523507

ところで、従来例は、スラリ噴射部に丸ガンタイプのものが採用されており、この丸ガンタイプのスラリ噴射部から噴射されるスラリは射出圧が高く、ワークへの当射圧が高くなり、ワークによっては、ワークの回転を阻害してしまうことがある。 By the way, in the conventional example, a round gun type is adopted for the slurry injection part, and the slurry injected from this round gun type slurry injection part has a high injection pressure and a high impact pressure on the work. Depending on the work, the rotation of the work may be hindered.

このワークの回転を阻害しないようにスラリの射出圧を下げた場合、ウェットブラスト処理不足となって潤滑剤の付着性(密着性)が低下するという不具合が生じ、また、スラリの射出圧を下げて低い当射圧で十分なウェットブラスト処理を行うために搬送速度を遅くして処理時間を長くした場合、スループットが低下し処理性が低下するという問題が生じてしまう。 If the injection pressure of the slurry is lowered so as not to hinder the rotation of the work, there is a problem that the wet blast treatment is insufficient and the adhesiveness (adhesion) of the lubricant is lowered, and the injection pressure of the slurry is lowered. If the transport speed is slowed down and the treatment time is lengthened in order to perform sufficient wet blasting treatment with a low exposure pressure, there arises a problem that the throughput is lowered and the processability is lowered.

また、この丸ガンタイプのスラリ噴射部から噴射されるスラリは、ワークに対する噴射領域が円形状となる。したがって、ワークの移動に伴いスラリ当射位置がワーク上側からワーク下側に移動し、そのため、例えばワークが倒れ易い円板状(扁平円柱状)の場合、スラリ当射位置がワークの端面の中心(ワーク軸心)からずれた位置では、ワークの端面に均等に当射圧が作用せずワークが傾いたり倒れたりし、搬送トラブルや処理ムラなどの不具合が生じることがある。 Further, the slurry injected from this round gun type slurry injection unit has a circular injection region for the work. Therefore, as the work moves, the slurry hitting position moves from the upper side of the work to the lower side of the work. At a position deviated from the (work axis), the applied pressure may not be evenly applied to the end face of the work, and the work may tilt or fall, resulting in problems such as transfer trouble and uneven processing.

本発明は、上述のような現状に鑑みなされたものであり、ワークの回転を阻害したり、ワークを傾かせたり倒したりすることなく安定的にワークを搬送しながらこのワークに対して表面処理を行う画期的なワーク表面処理装置及びこのワーク表面処理装置を用いたワーク表面処理方法を提供することを目的とする。 The present invention has been made in view of the current situation as described above, and surface treatment is applied to the work while stably transporting the work without hindering the rotation of the work or tilting or tilting the work. It is an object of the present invention to provide an epoch-making work surface treatment apparatus and a work surface treatment method using the work surface treatment apparatus.

添付図面を参照して本発明の要旨を説明する。 The gist of the present invention will be described with reference to the accompanying drawings.

円柱若しくは円板状のワークWを軸心を回転軸として回転させながらワーク長さ方向に搬送するワーク搬送部1と、搬送途次の前記ワークWに対してスラリを噴射するスラリ噴射部2とを備えたワーク表面処理装置であって、前記スラリ噴射部2は、スラリ射出口部がスリット状に構成されたものであり、このスラリ射出口部は、長手方向が前記ワークWの搬送方向に向けられると共に、前記ワークWに対して所定角度の傾斜状態で配設され、前記ワークWに対して前記スラリが傾斜帯状に噴射されるように構成され、前記ワーク搬送部1は、前記ワークWに当接して該ワークWを回転させる回転部3と、前記ワークWを挟持移動させる挟持移動部4とで構成されていることを特徴とするワーク表面処理装置に係るものである。 A work transfer unit 1 that conveys a cylindrical or disk-shaped work W in the work length direction while rotating the work W with its axis as a rotation axis, and a slurry injection unit 2 that injects slurry onto the work W in the process of transfer. The slurry injection portion 2 is a work surface treatment apparatus comprising the above, wherein the slurry injection port portion is configured in a slit shape, and the longitudinal direction of the slurry injection port portion is in the transport direction of the work W. Along with being directed, the work W is arranged in an inclined state at a predetermined angle, and the slurry is configured to be ejected in an inclined band shape with respect to the work W. The present invention relates to a work surface treatment apparatus comprising a rotating portion 3 for rotating the work W in contact with the work W and a pinching moving portion 4 for pinching and moving the work W.

また、請求項1記載のワーク表面処理装置において、前記スラリ噴射部2は、前記ワーク搬送部1の上方に配設され、前記ワークWに対して斜め上方から前記スラリを噴射するように構成されていることを特徴とするワーク表面処理装置に係るものである。 Further, in the work surface treatment apparatus according to claim 1, the slurry injection unit 2 is arranged above the work transfer unit 1 and is configured to inject the slurry from diagonally above the work W. The present invention relates to a work surface treatment apparatus characterized by the above.

また、請求項1,2いずれか1項に記載のワーク表面処理装置において、前記回転部3は、間隔をおいて対向状態に配設され、前記ワークWに下側から当接して該ワークWを支持且つ回転させる一対の回転ローラ3aで構成され、前記スラリ噴射部2は、前記スラリ射出口部のスリット幅が前記一対の回転ローラ3aの対向間隔よりも幅狭に設定されていることを特徴とするワーク表面処理装置に係るものである。 Further, in the work surface treatment apparatus according to any one of claims 1 and 2, the rotating portions 3 are arranged in a facing state at intervals, and abut against the work W from below to the work W. It is composed of a pair of rotating rollers 3a that support and rotate the slurry injection portion 2, and the slit width of the slurry injection port portion is set to be narrower than the facing distance of the pair of rotating rollers 3a. It relates to a featured work surface treatment apparatus.

また、請求項記載のワーク表面処理装置において、前記スラリ噴射部2は、搬送途次の複数の前記ワークWに対してスラリを同時に噴射するように構成されていることを特徴とするワーク表面処理装置に係るものである。 Further, in the work surface treatment apparatus according to claim 3 , the slurry injection unit 2 is configured to simultaneously inject slurry to a plurality of the work W in the process of being conveyed. It relates to a processing device.

また、請求項1〜4いずれか1項に記載のワーク表面処理装置において、前記挟持移動部4は、対向状態に配設され前記ワークWの搬送方向及び搬送逆方向に往復移動可能な一対の基体4a,4bからなり、この一対の基体4a,4bは、夫々内外方向に移動可能に構成され、更に、前記一対の基体4a,4bには、夫々、内方に突出する突体5a,5bが所定間隔をおいて設けられ、更に、前記一対の基体4a,4bには、夫々前記突体5a,5bに対して接離移動する移動爪6a,6bが設けられていることを特徴とするワーク表面処理装置に係るものである。 Further, in the work surface treatment apparatus according to any one of claims 1 to 4 , the sandwiching moving portion 4 is arranged in a facing state and is capable of reciprocating in the transport direction and the reverse direction of the work W. The pair of bases 4a and 4b are composed of the bases 4a and 4b, and the pair of bases 4a and 4b are configured to be movable inward and outward, respectively. Further, the pair of bases 4a and 4b have protrusions 5a and 5b protruding inward, respectively. Are provided at predetermined intervals, and further, the pair of substrates 4a, 4b are provided with moving claws 6a, 6b that move in contact with the projecting bodies 5a, 5b, respectively. It relates to a work surface treatment device.

また、請求項1〜いずれか1項に記載のワーク表面処理装置において、前記ワークWに潤滑処理を行う潤滑処理部10が設けられていることを特徴とするワーク表面処理装置に係るものである。 Further, the work surface treatment apparatus according to any one of claims 1 to 5 , wherein the work W is provided with a lubrication treatment unit 10 for performing lubrication treatment. be.

また、円柱若しくは円板状のワークWに当接して該ワークWを軸心を回転軸として回転させる回転部3及び前記ワークWを挟持移動させる挟持移動部4からなるワーク搬送部1と、前記ワークWにスラリを噴射するスラリ噴射部2とを備えたワーク表面処理装置により前記ワークWの表面処理を行うワーク表面処理方法であって、前記スラリ噴射部2としてスラリ射出口部がスリット状に構成されたものを採用し、このスラリ射出口部は、長手方向が前記ワークWの搬送方向に向けられると共に、前記ワークWに対して所定角度の傾斜状態で配設され、また、前記挟持移動部4は、対向状態に配設され前記ワークWの搬送方向及び搬送逆方向に往復移動可能な一対の基体4a,4bからなり、この一対の基体4a,4bは、夫々内外方向に移動可能に構成され、更に、前記一対の基体4a,4bには、夫々、内方に突出する突体5a,5bが所定間隔をおいて設けられ、更に、前記一対の基体4a,4bには、夫々前記突体5a,5bに対して接離移動する移動爪6a,6bが設けられ、軸心を回転軸として回転しながら下記のように搬送される前記ワークWに対して上方から前記スラリ噴射部2により前記スラリを傾斜帯状に噴射して該ワークWの表面をウェットブラスト処理することを特徴とするワーク表面処理方法に係るものである。

一方の前記基体4aの前記突体5aと前記移動爪6aとの間に前記ワークWが位置した状態において、この一方の基体4aの前記移動爪6aが前記突体5aに接近移動して前記ワークWを挟持し、他方の前記基体4bが外方に移動すると共にこの他方の基体4bの前記移動爪6bが前記突体5bから離反移動し、続いて、前記一方の基体4aが搬送方向に移動して前記ワークWを搬送し、同時に前記他方の基体4bが搬送逆方向に移動し、続いて、前記他方の基体4bが内方に移動して該他方の基体4bの前記突体5bと前記移動爪6bとの間にワークWを位置させ、前記一方の基体4aの前記移動爪6aが前記突体5aから離反移動し前記ワークWの挟持を解除すると共に該一方の基体4aが外方に移動し、続いて、前記他方の基体4bの前記突体5bと前記移動爪6bとの間に前記ワークWが位置した状態において、この他方の基体4bの前記移動爪6bが前記突体5bに接近移動して前記ワークWを挟持し、前記一方の基体4aが外方に移動すると共に該一方の基体4aの前記移動爪6aが前記突体5aから離反移動し、続いて、前記他方の基体4bが搬送方向に移動して前記ワークWを搬送し、同時に前記一方の基体4aが搬送逆方向に移動し、続いて、前記一方の基体4aが内方に移動して該一方の基体4aの前記突体5aと前記移動爪6aとの間にワークWを位置させ、前記他方の基体4bの前記移動爪6bが前記突体5bから離反移動し前記ワークWの挟持を解除すると共に該他方の基体4bが外方に移動し、以後、これらの動作を繰り返して前記ワークWを搬送するに係るものである。
Further, a work transport unit 1 including a rotating portion 3 that abuts on a cylindrical or disk-shaped work W and rotates the work W with the axis as a rotation axis and a pinching moving portion 4 that pinches and moves the work W, and the above. It is a work surface treatment method in which the surface treatment of the work W is performed by a work surface treatment device provided with a slurry injection unit 2 for injecting slurry into the work W, and the slurry injection port portion is formed into a slit shape as the slurry injection portion 2. The structure is adopted, and the slurry injection port portion is arranged in a state of being inclined at a predetermined angle with respect to the work W while the longitudinal direction is directed to the transport direction of the work W, and the pinching movement is performed. The portion 4 is composed of a pair of substrates 4a and 4b that are arranged in a facing state and can reciprocate in the transport direction and the reverse direction of the work W, and the pair of substrates 4a and 4b can be moved in and out respectively. Further, the pair of substrates 4a and 4b are provided with projecting bodies 5a and 5b protruding inward at predetermined intervals, and the pair of substrates 4a and 4b are provided with the above-mentioned protrusions 5a and 5b, respectively. The slurry injection unit 2 is provided with moving claws 6a and 6b that move in contact with and separate from the protrusions 5a and 5b, and is conveyed from above with respect to the work W that is conveyed as follows while rotating around the axis of rotation. The present invention relates to a work surface treatment method, which comprises jetting the slurry in an inclined band shape to wet blast the surface of the work W.
In a state where the work W is located between the projecting body 5a of the one substrate 4a and the moving claw 6a, the moving claw 6a of the one substrate 4a moves closer to the projecting body 5a and said. The work W is sandwiched, the other substrate 4b moves outward, the moving claw 6b of the other substrate 4b moves away from the projecting body 5b, and then the one substrate 4a moves in the transport direction. The work W is moved to convey the work W, and at the same time, the other substrate 4b moves in the opposite direction of the transfer, and then the other substrate 4b moves inward with the projecting body 5b of the other substrate 4b. The work W is positioned between the moving claw 6b and the moving claw 6a of the one substrate 4a moves away from the projecting body 5a to release the holding of the work W and the one substrate 4a is outward. Then, in a state where the work W is located between the projecting body 5b of the other substrate 4b and the moving claw 6b, the moving claw 6b of the other substrate 4b is the projecting body 5b. The work W is sandwiched by the work W, the one substrate 4a moves outward, and the moving claw 6a of the one substrate 4a moves away from the projecting body 5a, and then the other substrate 4a. The substrate 4b moves in the transport direction to transport the work W, and at the same time, the one substrate 4a moves in the opposite direction of the transport, and then the one substrate 4a moves inward and the one substrate 4a The work W is positioned between the projecting body 5a and the moving claw 6a, and the moving claw 6b of the other substrate 4b moves away from the projecting body 5b to release the pinching of the work W and the other. The substrate 4b of the above moves outward, and thereafter, these operations are repeated to convey the work W.

また、請求項記載のワーク表面処理方法において、搬送途次の複数の前記ワークWに対して前記スラリを同時に噴射することを特徴とするワーク表面処理方法に係るものである。 Further, the work surface treatment method according to claim 7 , wherein the slurry is simultaneously injected onto a plurality of the work Ws in the process of being transported.

また、請求項7,8いずれか1項に記載のワーク表面処理方法において、前記ウェットブラスト処理後に前記ワークWの表面に潤滑剤を付与する潤滑処理を行うことを特徴とするワーク表面処理方法に係るものである。 Further, in the work surface treatment method according to any one of claims 7 and 8, the work surface treatment method is characterized in that a lubrication treatment for applying a lubricant to the surface of the work W is performed after the wet blast treatment. It is related.

本発明は上述のように構成したから、ワークのタイプに関わらずワークの回転を阻害したり、ワークを傾かせたり倒したりすることなく安定的にワークを搬送しながら、確実にこのワークに対して表面処理を行うことができる画期的なワーク表面処理装置及びワーク表面処理方法となる。 Since the present invention is configured as described above, the work can be reliably conveyed to the work while stably transporting the work without hindering the rotation of the work or tilting or tilting the work regardless of the type of the work. This is an epoch-making work surface treatment device and work surface treatment method capable of performing surface treatment.

本実施例を示す使用状態説明図である。It is a usage state explanatory drawing which shows this Example. 本実施例の回転部を示す動作説明図である。It is operation explanatory drawing which shows the rotating part of this Example. 本実施例のワーク搬送部を示す説明斜視図である。It is explanatory perspective view which shows the work transport part of this Example. 本実施例の挟持移動部を示す説明平面図である。It is explanatory plan view which shows the holding movement part of this Example. 本実施例の挟持移動部の動作説明図である。It is operation | movement explanatory drawing of the pinching movement part of this embodiment. 本実施例の挟持移動部の動作説明図である。It is operation | movement explanatory drawing of the pinching movement part of this embodiment. 本実施例の挟持移動部によるワーク搬送状態説明図である。It is explanatory drawing of the work transfer state by the pinching movement part of this Example. 本実施例のスラリ噴射部から噴射されるスラリの噴射状態説明図である。It is an injection state explanatory drawing of the slurry injected from the slurry injection part of this Example.

好適と考える本発明の実施形態を、図面に基づいて本発明の作用を示して簡単に説明する。 Embodiments of the present invention which are considered to be suitable will be briefly described by showing the operation of the present invention based on the drawings.

本発明のスラリ噴射部2は、円柱若しくは円板状の回転搬送されるワークWに対して傾斜帯状にスラリを噴射するから、当射領域が従来の丸ガンタイプのように円形状とはならず、可及的にワークWの端面を横断する状態となり、よって、ワークWの回転が阻害されたり、また、ワークWを傾かせたり倒したりすることなく安定的にワークWを搬送しながら、確実にこのワークWに対して表面処理を行うことができる。 Since the slurry injection unit 2 of the present invention injects slurry in an inclined band shape to the work W which is rotationally conveyed in the shape of a cylinder or a disk, the irradiation region does not have a circular shape like the conventional round gun type. Instead, the work W is crossed as much as possible, so that the rotation of the work W is not hindered, and the work W is stably conveyed without being tilted or tilted. Surface treatment can be reliably performed on this work W.

本発明の具体的な実施例について図面に基づいて説明する。 Specific examples of the present invention will be described with reference to the drawings.

本実施例は、本発明のワーク表面処理装置を、冷間鍛造用の円柱若しくは円板状の被鍛造部材をワークWとし、このワークWに潤滑剤を付与してワーク表面に潤滑皮膜を形成させる表面処理を行うためのワーク表面処理装置として構成した場合である。 In this embodiment, the work surface treatment apparatus of the present invention uses a columnar or disk-shaped forged member for cold forging as a work W, and a lubricant is applied to the work W to form a lubricating film on the work surface. This is a case where it is configured as a work surface treatment device for performing surface treatment.

具体的には、本実施例のワーク表面処理装置は、図1に示すように、ワークWをワーク搬送部1に投入するワーク投入部7、このワーク投入部7から投入されたワークWを各処理部に搬送するワーク搬送部1、ワーク搬送部1により搬送されるワークWにウェットブラスト処理を行うウェットブラスト処理部8、このウェットブラスト処理部8でウェットブラスト処理されたワークWを洗浄処理する洗浄処理部9、この洗浄処理部9で洗浄処理されたワークWを潤滑処理する潤滑処理部10及びこの潤滑処理部10で潤滑処理されたワークWを回収する若しくは次処理装置へ搬送するアンローダー部11とを備えている。 Specifically, in the work surface treatment apparatus of this embodiment, as shown in FIG. 1, the work loading section 7 for feeding the work W into the work transport section 1 and the work W loaded from the work loading section 7 are respectively. The work transfer unit 1 conveyed to the processing unit, the wet blast processing unit 8 that performs wet blast processing on the work W conveyed by the work transfer unit 1, and the work W that has been wet blasted by the wet blast processing unit 8 are cleaned. An unloader that collects or transports the work W lubricated by the cleaning processing unit 9, the lubrication processing unit 10 that lubricates the work W that has been cleaned by the cleaning processing unit 9, and the work W that has been lubricated by the lubrication processing unit 10. It has a part 11 and.

以下、本実施例に係る構成各部について詳述する。 Hereinafter, each component of the present embodiment will be described in detail.

ワーク投入部7は、円板状(扁平円柱状)のワークW(以下、単にワークWと称す。)を収容するワーク収容部が複数設けられた回転体7aを備え、図1に示すように、回転する回転体7aの最頂部に位置するワーク収容部に水平状態(ワークWの端面が上下方向に配されている状態)で収容されたワークWを、90°回転してこのワークWが立直状態(ワークWの端面が前後方向に配されている状態)となったところでワーク搬送部1にリリースし、ワークWをワーク搬送部1に立直状態にセットするように構成されている。 The work loading portion 7 includes a rotating body 7a provided with a plurality of work accommodating portions for accommodating a disk-shaped (flat columnar) work W (hereinafter, simply referred to as a work W), as shown in FIG. , The work W housed horizontally (in a state where the end faces of the work W are arranged in the vertical direction) in the work housing portion located at the top of the rotating rotating body 7a is rotated by 90 °, and this work W is rotated. When the work W is in an upright state (a state in which the end faces of the work W are arranged in the front-rear direction), the work W is released to the work transfer unit 1 and the work W is set in the work transfer unit 1 in an upright state.

尚、ワーク収容部へのワークWの投入は、作業者が投入しても良いし、別途投入装置を設けても良い。 The work W may be loaded into the work accommodating portion by an operator, or a separate loading device may be provided.

また、前記円板状(扁平円柱状)のワークWとは、ワークWの端面の直径がワークWの長さよりも長径な円柱状のワークWのことを意味する。 Further, the disk-shaped (flat columnar) work W means a columnar work W in which the diameter of the end face of the work W is longer than the length of the work W.

また、上述したワーク投入部7から投入されたワークWを各処理部に搬送するワーク搬送部1は、ワークWに当接してこのワークWを回転させる回転部3と、ワークWを挟持移動させる挟持移動部4とで構成され、この回転部3と挟持移動部4とでワークWを回転させながらワークWをワーク回転軸方向に搬送するように構成されている。 Further, the work transfer unit 1 that conveys the work W input from the work input unit 7 described above to each processing unit sandwiches and moves the work W with the rotating unit 3 that abuts on the work W and rotates the work W. It is composed of a pinching moving portion 4, and is configured to convey the work W in the work rotation axis direction while rotating the work W by the rotating portion 3 and the pinching moving portion 4.

具体的には、回転部3は、図2に示すように、間隔をおいて対向配設される一対の回転ローラ3aからなり、ワークWに下側から当接してこのワークWを支持し且つワークWを回転させるように構成されている。 Specifically, as shown in FIG. 2, the rotating portion 3 is composed of a pair of rotating rollers 3a arranged to face each other at intervals, and abuts on the work W from below to support the work W. It is configured to rotate the work W.

より具体的には、各回転ローラ3aは、モータ等の駆動源(図示省略)により同一方向に回転するように構成され、更に、各回転ローラ3aは、この回転ローラ3a上で回転しながら摺動するワークWにキズが付かないようにすると共にワークWとの密着性を向上しワークWを良好に回転させることができるように、ワークWに当接する周面に合成樹脂製部材が被覆されている。 More specifically, each rotating roller 3a is configured to rotate in the same direction by a drive source (not shown) such as a motor, and each rotating roller 3a slides while rotating on the rotating roller 3a. A synthetic resin member is coated on the peripheral surface in contact with the work W so that the moving work W is not scratched, the adhesion with the work W is improved, and the work W can be rotated satisfactorily. ing.

尚、本実施例の回転ローラ3aは、図1に示すように、ウェットブラスト処理部8から洗浄処理部9の前半部分(具体的には、後述する洗浄処理部9の粗洗浄処理部9a)に掛かる部位には耐摩耗性に優れた合成樹脂部材(例えばウレタン樹脂製部材)が被覆され、洗浄処理部9の後半部分(具体的には、洗浄処理部9の湯洗処理部9b)から潤滑処理部10に掛かる部位には耐熱性に優れた合成樹脂部材(例えばナイロン樹脂製部材)が被覆されている。 As shown in FIG. 1, the rotary roller 3a of this embodiment has a wet blast processing unit 8 to a first half portion of the cleaning processing unit 9 (specifically, a rough cleaning processing unit 9a of the cleaning processing unit 9 described later). A synthetic resin member having excellent wear resistance (for example, a member made of urethane resin) is coated on the portion to be hung on the surface, and from the latter half of the cleaning treatment section 9 (specifically, the hot water washing treatment section 9b of the cleaning treatment section 9). A synthetic resin member having excellent heat resistance (for example, a nylon resin member) is coated on the portion of the lubrication treatment section 10.

また、挟持移動部4は、図3に示すように、前下がり傾斜状態で対向状態に配設されワークWの搬送方向・搬送逆方向に往復移動可能な一対の基体4a,4bからなり、この一対の基体4a,4bは、夫々内外方向に移動可能に構成され、更に、この一対の基体4a,4bは、夫々、所定間隔をおいて内方に突出する突体5a,5bと、この突体5a,5bに対して接離移動する移動爪6a,6bが設けられている。 Further, as shown in FIG. 3, the pinching moving portion 4 is composed of a pair of substrates 4a and 4b which are arranged in a facing state in a forward-down inclined state and can be reciprocated in the transport direction and the reverse direction of the work W. The pair of substrates 4a and 4b are configured to be movable inward and outward, respectively, and the pair of substrates 4a and 4b are each projecting inward at predetermined intervals and the protrusions 5a and 5b. Moving claws 6a and 6b that move in contact with and detach from the bodies 5a and 5b are provided.

具体的には、各基体4a,4bは、図4に示すように、夫々、ワークWの搬送方向・搬送逆方向に往復移動可能で且つ内外方向にも移動可能な移動機構(図示省略)に設けられた第一基体部12a,12bと、この第一基体部12a,12b上に重ね合わせ状態に設けられこの第一基体部12a,12bに対してワークWの搬送方向・搬送逆方向に移動自在に設けられた第二基体部13a,13bを備え、第一基体部12a,12bの内側端面に突体5a,5bが間隔をおいて内方に突設され、第二基体部13a,13bの内側端面に移動爪6a,6bが間隔をおいて内方に突設され、第一基体部12a,12bに対して第二基体部13a,13bがワークWの搬送方向・搬送逆方向に相対移動することにより各突体5a,5bと各移動爪6a,6bとの間隔が広狭してこの突体5a,5bと移動爪6a,6bとの間に配置されたワークWを挟持、解除する構成とされている。 Specifically, as shown in FIG. 4, each of the substrates 4a and 4b has a moving mechanism (not shown) that can reciprocate in the transport direction and the reverse direction of the work W and can also move in and out. The first base portions 12a and 12b provided and the first base portions 12a and 12b are superposed on the first base portions 12a and 12b and move in the transport direction and the reverse direction of the work W with respect to the first base portions 12a and 12b. The second base portions 13a and 13b are freely provided, and the protrusions 5a and 5b are projected inward at intervals on the inner end faces of the first base portions 12a and 12b, and the second base portions 13a and 13b are provided. The moving claws 6a and 6b are projected inward at intervals on the inner end surface of the work W, and the second base portions 13a and 13b are relative to the first base portion 12a and 12b in the transport direction and the reverse direction of the work W. By moving, the distance between the projecting bodies 5a and 5b and the moving claws 6a and 6b becomes wide and narrow, and the work W arranged between the projecting bodies 5a and 5b and the moving claws 6a and 6b is sandwiched and released. It is said to be composed.

より具体的には、本実施例の挟持移動部4は、以下の(a)〜(f)の動作を順次繰り返しながらワークWを搬送するように構成されている(図5,6参照)。 More specifically, the pinching moving unit 4 of the present embodiment is configured to convey the work W while sequentially repeating the following operations (a) to (f) (see FIGS. 5 and 6).

(a)ワーク投入部7からワーク搬送部1にワークWが投入されると、基体4a(図中上側)が内方に移動してこの基体4aの突体5aと移動爪6aとの間にワークWが配置される。 (A) When the work W is loaded from the work loading unit 7 to the work transport unit 1, the substrate 4a (upper side in the figure) moves inward and is between the projecting body 5a of the substrate 4a and the moving claw 6a. Work W is placed.

(b)この基体4aの突体5aと移動爪6aとの間にワークWが位置した状態において、基体4aの第二基体部13aがワークWの搬送逆方向(以下、ワーク搬送逆方向と称す。)に移動し移動爪6aが突体5aに接近移動してワークWを挟持すると共に、基体4b(図中下側)が第二基体部13bをワークWの搬送方向(以下、ワーク搬送方向と称す。)に移動させて移動爪6bを突体5bに対して離反移動させ突体5bと移動爪6bとの間隔を広げながら外方に移動する。 (B) In a state where the work W is positioned between the projecting body 5a of the base 4a and the moving claw 6a, the second base portion 13a of the base 4a is in the reverse direction of transporting the work W (hereinafter referred to as the reverse direction of transporting the work). The moving claw 6a moves closer to the projecting body 5a to sandwich the work W, and the base 4b (lower side in the figure) moves the second base portion 13b to the work W in the transport direction (hereinafter, work transport direction). The moving claw 6b is moved away from the projecting body 5b and moved outward while widening the distance between the projecting body 5b and the moving claw 6b.

(c)ワークWを挟持している基体4aがワーク搬送方向に移動してワークWを所定距離移動させ、同時に、基体4bがワーク搬送逆方向に移動し、その後、ワーク投入部7からワーク搬送部1に新たなワークWが投入される。 (C) The substrate 4a holding the work W moves in the work transfer direction to move the work W by a predetermined distance, and at the same time, the substrate 4b moves in the opposite direction of the work transfer, and then the work is transferred from the work loading section 7. A new work W is put into the part 1.

(d)このワーク投入部7からワーク搬送部1に新たなワークWが投入されると、基体4bが内方に移動して、この基体4bの突体5bと移動爪6bとの間にこの新たに投入されたワークW及び既に投入済みの他のワークWが配置される。 (D) When a new work W is loaded from the work loading unit 7 into the work transport unit 1, the substrate 4b moves inward, and the substrate 4b is between the projecting body 5b and the moving claw 6b. A newly loaded work W and another work W that has already been loaded are placed.

(e)この基体4bの突体5bと移動爪6bとの間に各ワークWが位置した状態において、基体4bの第二基体部13bがワーク搬送逆方向に移動し移動爪6bが突体5bに接近移動して各ワークWを挟持すると共に、基体4aが第二基体部13aをワーク搬送方向に移動させて移動爪6aを突体5aに対して離反移動させ突体5aと移動爪6aとの間隔を広げてワークWの挟持を解除しながら外方に移動する。 (E) In a state where each work W is positioned between the projecting body 5b of the substrate 4b and the moving claw 6b, the second substrate portion 13b of the substrate 4b moves in the opposite direction of the work transfer, and the moving claw 6b moves the projecting claw 5b. The substrate 4a moves the second substrate portion 13a in the work transport direction to move the moving claw 6a away from the projecting body 5a, and the projecting body 5a and the moving claw 6a are moved closer to each other to sandwich each work W. Move outward while widening the space between the two and releasing the pinching of the work W.

(f)各ワークWを挟持している基体4bがワーク搬送方向に移動して各ワークWを所定距離移動させ、同時に、基体4aがワーク搬送逆方向に移動し、その後、ワーク投入部7からワーク搬送部1に再び新たなワークWが投入される。 (F) The substrate 4b holding each work W moves in the work transfer direction to move each work W by a predetermined distance, and at the same time, the substrate 4a moves in the work transfer reverse direction, and then from the work loading section 7. A new work W is put into the work transfer unit 1 again.

即ち、本実施例の挟持移動部4は、例えば、図7(a)〜(h)に示すように、最初に投入されたワークW1の第1搬送ポジションから第2搬送ポジションへの移動を基体4aが行った場合、このワークW1の第2搬送ポジションから第3搬送ポジションへの移動及び次に投入されたワークW2の第1搬送ポジションから第2搬送ポジションへの移動は基体4bが行い、そして、この基体4bがワークW1,W2を搬送中に基体4aが戻り移動して、搬送担当が基体4aに切り替えられ、ワークW1の第3搬送ポジションから第4搬送ポジションへの移動、ワークW2の第2搬送ポジションから第3搬送ポジションへの移動及び次に投入されたワークW3の第1搬送ポジションから第2搬送ポジションへの移動は基体4aが行い、更に次のワークW4が投入されると、再び搬送担当が基体4bに切り替えられ、ワークW1の第4搬送ポジションから第5搬送ポジションへの移動、ワークW2の第3搬送ポジションから第4搬送ポジションへの移動、ワークW3の第2搬送ポジションから第3搬送ポジションへの移動及び次に投入されたワークW4の第1搬送ポジションから第2搬送ポジションへの移動は基体4bが行う、といった具合に基体4aと基体4bとが交互にワークWを所定量ずつ直線的に搬送する構成とされている。 That is, as shown in FIGS. 7 (a) to 7 (h), for example, the pinching and moving unit 4 of the present embodiment bases the movement of the work W1 initially loaded from the first transport position to the second transport position. When 4a is performed, the base 4b performs the movement of the work W1 from the second transfer position to the third transfer position and the subsequent transfer of the loaded work W2 from the first transfer position to the second transfer position, and then While the substrate 4b is transporting the works W1 and W2, the substrate 4a returns and moves, the transfer charge is switched to the substrate 4a, the work W1 is moved from the third transport position to the fourth transport position, and the work W2 is the first. 2 The transfer from the transfer position to the third transfer position and the movement of the work W3 loaded next from the first transfer position to the second transfer position are performed by the substrate 4a, and when the next work W4 is further loaded, the work W4 is moved again. The transfer charge is switched to the substrate 4b, the work W1 is moved from the 4th transfer position to the 5th transfer position, the work W2 is moved from the 3rd transfer position to the 4th transfer position, and the work W3 is moved from the 2nd transfer position to the 5th transfer position. 3 The substrate 4a and the substrate 4b alternately move the work W to a predetermined amount, such that the substrate 4b performs the movement to the transfer position and the transfer of the work W4 loaded next from the first transfer position to the second transfer position. It is configured to be transported linearly one by one.

尚、本実施例において、突体5a,5bと移動爪6a,6bとでワークWを挟持する場合の挟持とは、ワークWの回転を阻害しない程度の接触状態で挟持する以外に、突体5a,5b及び移動爪6a,6bがワークWに対して僅かにクリアランスを設けた非接触状態にある場合を含むものとする。 In this embodiment, when the work W is sandwiched between the projecting bodies 5a and 5b and the moving claws 6a and 6b, the pinching is not limited to holding the work W in a contact state that does not hinder the rotation of the work W. This includes the case where the 5a, 5b and the moving claws 6a, 6b are in a non-contact state with a slight clearance with respect to the work W.

また、ウェットブラスト処理部8は、上述したワーク搬送部1の上流側、具体的には、ワーク投入部7の下流側に連設状態に設けられ、ワーク搬送部1により回転搬送される搬送途次のワークWに対してスラリを噴射するスラリ噴射部2を備え、このスラリ噴射部2から噴射するスラリでワークWの表面をウェットブラスト処理するように構成されている。 Further, the wet blast processing unit 8 is provided in a continuous state on the upstream side of the work transfer unit 1 described above, specifically, on the downstream side of the work loading unit 7, and is rotationally conveyed by the work transfer unit 1. A slurry injection unit 2 for injecting a slurry to the next work W is provided, and the surface of the work W is wet-blasted with the slurry injected from the slurry injection unit 2.

具体的には、本実施例のウェットブラスト処理部8は、図1に示すように、ワーク搬送部1の上方側に設けられる一対のスラリ噴射部2と、ワーク搬送部1の下方側に設けられスラリ噴射部2から噴射されたスラリを回収・貯留するスラリ回収タンク部14と、このスラリ回収タンク部14に回収されたスラリを再度スラリ噴射部2に供給するためのポンプ15とが備えられている。 Specifically, as shown in FIG. 1, the wet blast processing unit 8 of the present embodiment is provided on the pair of slurry injection units 2 provided on the upper side of the work transfer unit 1 and on the lower side of the work transfer unit 1. A slurry recovery tank section 14 for collecting and storing the slurry injected from the slurry injection section 2 and a pump 15 for supplying the slurry collected in the slurry recovery tank section 14 to the slurry injection section 2 again are provided. ing.

より具体的には、各スラリ噴射部2には、スラリが射出されるスラリ射出口部がスリット状に形成されるスリットノズルタイプ(いわゆる巾広ガン)が採用され、図1に示すように、ワークWの搬送方向に沿って縦列配置、言い換えると、このワーク搬送方向に間隔をおいて縦列状態で設けられている。 More specifically, a slit nozzle type (so-called wide gun) in which the slurry injection port portion into which the slurry is ejected is formed in a slit shape is adopted for each slurry injection portion 2, and as shown in FIG. 1, The work W is arranged in parallel along the transport direction, in other words, it is provided in a parallel state with an interval in the work transport direction.

更に具体的に説明すると、本実施例の各スラリ噴射部2は、特開2001−300363号公報に開示されるノズル体とほぼ同構造のものであり、更に、各スラリ噴射部2は、スラリ射出口部のスリット幅(スラリ射出口部の短手方向の幅)が上述したワーク搬送部1の一対の回転ローラ3aの対向間隔よりも幅狭な寸法に設定され、また、スラリ射出口部のスリット長(スラリ射出口部の長手方向の長さ)が、図8(b)に示すように、搬送途次の複数のワークW、具体的には、本実施例においては連続する五体のワークWに対してスラリを同時に噴射する(当射させる)ことができる長さに設定されている。 More specifically, each slurry injection unit 2 of this embodiment has substantially the same structure as the nozzle body disclosed in Japanese Patent Application Laid-Open No. 2001-300363, and each slurry injection unit 2 is a slurry. The slit width of the ejection port (width in the lateral direction of the slurry ejection port) is set to a dimension narrower than the facing distance between the pair of rotating rollers 3a of the work transport section 1 described above, and the slurry ejection port is also set. As shown in FIG. 8 (b), the slit length (length in the longitudinal direction of the slurry injection port portion) is a plurality of work Ws in the process of being transported, specifically, in the present embodiment, five continuous bodies. The length is set so that the slurry can be simultaneously injected (fired) on the work W.

また更に、ワークWの搬送方向上流側に位置するスラリ噴射部2は、スラリ射出口部の長手方向がワークWの搬送方向に向けられると共にワーク回転軸に対して25°〜35°(本実施例では30°)の角度でワーク搬送方向に上り傾斜状態に設けられワークWに対してワーク背面側から上下方向(縦方向)に延びる直線状のスラリ(細い傾斜帯状のスラリ)を噴射するように構成され、また、ワークWの搬送方向下流側に位置するスラリ噴射部2は、スラリ射出口部の長手方向がワークWの搬送方向に向けられると共にワーク回転軸に対して25°〜35°(本実施例では30°)の角度でワーク搬送方向に下り傾斜状態に設けられワークWに対してワークWの正面側から上下方向(縦方向)に延びる直線状のスラリ(細い傾斜帯状のスラリ)を噴射するように構成されている。 Further, in the slurry injection portion 2 located on the upstream side in the transport direction of the work W, the longitudinal direction of the slurry injection port portion is directed to the transport direction of the work W and 25 ° to 35 ° with respect to the work rotation axis (this implementation). In the example, it is provided in an ascending and inclined state in the work transport direction at an angle of 30 °), and a linear slurry (thin inclined band-shaped slurry) extending in the vertical direction (vertical direction) from the back surface side of the work is injected to the work W. In the slurry injection section 2 located on the downstream side in the transport direction of the work W, the longitudinal direction of the slurry injection port is directed to the transport direction of the work W and 25 ° to 35 ° with respect to the work rotation axis. A linear slurry (thin inclined band-shaped slurry) that is provided in a downward inclined state in the work transport direction at an angle of (30 ° in this embodiment) and extends in the vertical direction (vertical direction) from the front side of the work W with respect to the work W. ) Is configured to be jetted.

即ち、本実施例のスラリ噴射部2は、上記構成により、従来の丸ガンタイプのものに比べてスラリ射出口部の開口面積が広がり、これにより射出圧が低下しワークWに対する当射圧が低下して、このスラリ当射圧によるワークWに対する回転阻害が低減されると共に、スラリ噴射部2から噴射されるスラリがワークWの端面の中心を通りこのワークWの端面を上下方向に横断する直線状に当射され、これによりワークWの端面に対して上下バランスよく(均一に)当射圧が掛かることになり、従来の丸ガンタイプの場合に生じるようなワークWのバランスが崩れてワークWが倒れるなどの不具合が生じず、ワークWが安定的に搬送され搬送トラブルや処理ムラなどの不具合を生じることなく、確実にウェットブラスト処理が行われるように構成されている。 That is, in the slurry injection section 2 of the present embodiment, due to the above configuration, the opening area of the slurry injection port portion is widened as compared with the conventional round gun type, whereby the injection pressure is lowered and the impact pressure on the work W is increased. It is lowered to reduce the rotation inhibition of the work W due to the irradiation pressure of the slurry, and the slurry injected from the slurry injection unit 2 passes through the center of the end face of the work W and crosses the end face of the work W in the vertical direction. It is hit in a straight line, and as a result, the hit pressure is applied to the end face of the work W in a well-balanced manner (uniformly), and the balance of the work W that occurs in the case of the conventional round gun type is lost. The work W is configured so that the wet blasting process is surely performed without causing problems such as the work W to fall down, to stably convey the work W, and to cause problems such as transfer trouble and processing unevenness.

また、図8(a)に示すように、スラリ噴射部2から噴射されるスラリが回転ローラ3aに当射されず、スラリによる回転ローラ3aの早期摩耗が防止され、更に、一体のワークWに対するスラリ当射量が丸ガンタイプの場合に比べて増加し(ウェットブラスト処理時間が長くなり)、これにより、従来の丸ガンタイプのものに比べてスラリ射出口部の開口面積が広がりスラリ射出圧が低下しワークWに対する当射圧が低下した場合でも、搬送速度を低下させて処理時間を遅くするなどの対応をせずとも所定量のウェットブラスト処理を行うことができ、ウェットブラスト処理不足やスループットの低下を招くなどの問題が生じることなく、適正なウェットブラスト処理を確実に行うことができるように構成されている。 Further, as shown in FIG. 8A, the slurry injected from the slurry injection unit 2 is not hit by the rotary roller 3a, the premature wear of the rotary roller 3a due to the slurry is prevented, and further, with respect to the integrated work W. The amount of slurry shot is increased compared to the case of the round gun type (wet blast processing time is longer), which increases the opening area of the slurry injection port and the slurry injection pressure compared to the conventional round gun type. Even if the pressure applied to the work W is reduced, the wet blasting process can be performed in a predetermined amount without taking measures such as reducing the transport speed to slow down the processing time, resulting in insufficient wet blasting process. It is configured to ensure proper wet blasting without causing problems such as a decrease in throughput.

尚、このウェットブラスト処理部8におけるウェットブラスト処理に用いられるスラリの種類(砥粒材料や砥粒径等)はワークWの材質等により適宜なものを採用するものとするが、本実施例では鋼材製のワークWの表面処理に適したウェットブラスト処理が行われるように、特許第6101668号に開示される被鍛造部材の表面処理方法に用いられている液体(水)と平均粒径が約150μmのステンレス砥粒との混合物からなるスラリが採用され、適宜な処理条件でワークWの表面に深さ0.5μm〜2μm,開口巾75μm〜150μm(開口面積では0.006mm〜0.023mm)の凹所を無数に形成するように構成されている。 The type of slurry (abrasive grain material, abrasive particle size, etc.) used for the wet blasting in the wet blasting unit 8 shall be an appropriate one depending on the material of the work W, etc., but in this embodiment, it is assumed that an appropriate one is adopted. The liquid (water) and the average particle size used in the surface treatment method of the forged member disclosed in Japanese Patent No. 6101668 so that the wet blast treatment suitable for the surface treatment of the work W made of steel material is performed, have an average particle size of about. A slurry consisting of a mixture of 150 μm stainless abrasive grains is adopted, and the surface of the work W has a depth of 0.5 μm to 2 μm and an opening width of 75 μm to 150 μm (0.006 mm 2 to 0.023 mm in the opening area) under appropriate treatment conditions. It is configured to form innumerable recesses in 2).

また、図中符号16は、スラリ噴射部2に圧縮空気を供給する圧縮空気供給部16であり、符号17は、ポンプ15から噴出されるスラリ噴出流をスラリ回収タンク部14内に戻してこのスラリ回収タンク部14内に貯留されるスラリを撹拌するためのスラリ噴出流導入部17である。 Further, reference numeral 16 in the figure is a compressed air supply unit 16 that supplies compressed air to the slurry injection unit 2, and reference numeral 17 is a reference numeral 17 for returning the slurry ejection flow ejected from the pump 15 to the inside of the slurry recovery tank unit 14. It is a slurry ejection flow introduction section 17 for stirring the slurry stored in the slurry recovery tank section 14.

また、洗浄処理部9は、粗洗浄処理部9aと湯洗処理部9bの二種類の処理部を備え、上述したウェットブラスト処理部8でワークWに付着したスラリを除去するスラリ除去処理を行うように構成されている。 Further, the cleaning processing unit 9 includes two types of processing units, a rough cleaning processing unit 9a and a hot water washing processing unit 9b, and the wet blasting processing unit 8 described above performs a slurry removing process for removing slurry adhering to the work W. It is configured as follows.

具体的には、本実施例の洗浄処理部9は、図1に示すように、ワークWの搬送方向上流側(ウェットブラスト処理部8側)にワークWを粗洗浄処理する粗洗浄処理部9aが設けられ、この粗洗浄処理部9aの下流側にワークWを本洗浄である湯先で洗浄処理する湯洗処理部9bが設けられている。 Specifically, as shown in FIG. 1, the cleaning processing unit 9 of this embodiment is a rough cleaning processing unit 9a that roughly cleans the work W on the upstream side (wet blast processing unit 8 side) in the transport direction of the work W. Is provided, and a hot water washing treatment unit 9b for cleaning the work W with a hot water tip, which is the main cleaning, is provided on the downstream side of the rough cleaning processing unit 9a.

より具体的には、粗洗浄処理部9aには、洗浄水を噴出する洗浄水噴出ノズル18が設けられ、また、湯洗処理部9bには、高温水(60℃〜90℃程度)を噴出する高温水噴出ノズル19が設けられており、前半の粗洗浄処理部9aでウェットブラスト処理直後のスラリが多く付着したワークWに対して粗洗浄を行い、その後、湯洗処理部9bでスラリを完全に除去する本洗浄を行うように構成されている。 More specifically, the rough cleaning treatment unit 9a is provided with a cleaning water ejection nozzle 18 for ejecting cleaning water, and the hot water washing treatment unit 9b ejects high-temperature water (about 60 ° C. to 90 ° C.). A high-temperature water ejection nozzle 19 is provided, and the rough cleaning processing section 9a in the first half performs rough cleaning on the work W to which a large amount of slurry has adhered immediately after the wet blast treatment, and then the hot water washing treatment section 9b cleans the slurry. It is configured to perform a main wash that completely removes it.

尚、本実施例においては、粗洗浄処理部9aの洗浄水噴出ノズル18から噴出される洗浄水として、ウェットブラスト処理部8でスラリ貯留部14に回収されたスラリを洗浄水作出装置20により分離・再生した再生水を使用するように構成されている。 In this embodiment, as the cleaning water ejected from the cleaning water ejection nozzle 18 of the rough cleaning processing unit 9a, the slurry collected in the slurry storage unit 14 by the wet blast processing unit 8 is separated by the cleaning water producing device 20. -It is configured to use reclaimed water.

また、湯洗処理部9bは、高温水噴出ノズル19の下方に高温水回収タンク部21を備え、この高温水回収タンク部21に回収・貯留された高温水を再度所定の温度に加熱して、ポンプ22を介して、再度、高温水噴出ノズル19に供給して高温水を再利用するように構成されている。 Further, the hot water washing treatment unit 9b is provided with a high temperature water recovery tank unit 21 below the high temperature water ejection nozzle 19, and the high temperature water collected and stored in the high temperature water recovery tank unit 21 is heated again to a predetermined temperature. , It is configured to be supplied to the high temperature water ejection nozzle 19 again via the pump 22 to reuse the high temperature water.

また、潤滑処理部10は、上述した洗浄処理部9で洗浄されたワークWに潤滑剤を付与してこのワークWの表面に潤滑皮膜を形成させるように構成されている。 Further, the lubrication treatment unit 10 is configured to apply a lubricant to the work W washed by the above-mentioned cleaning treatment unit 9 to form a lubricating film on the surface of the work W.

具体的には、本実施例の潤滑処理部10は、図1に示すように、ワーク搬送方向上流側より、乾燥用温風送出ノズル23、潤滑剤噴射ノズル24及び加熱用温風送出部25が順に設けられており、乾燥用温風送出ノズル23から送出される温風で洗浄処理の際にワークWの表面に付着した水分を乾燥除去し、潤滑剤噴射ノズル24から潤滑剤を噴出してワークWの表面にこの潤滑剤を付与し、加熱用温風送出部25から送出される温風でワークWの表面に付与された潤滑剤を加熱してこの潤滑剤をワークWの表面に定着させ皮膜化させるように構成されている。 Specifically, as shown in FIG. 1, the lubrication processing unit 10 of the present embodiment has a drying hot air delivery nozzle 23, a lubricant injection nozzle 24, and a heating hot air delivery unit 25 from the upstream side in the work transport direction. Are provided in order, and the hot air sent from the hot air sending nozzle 23 for drying dries and removes the moisture adhering to the surface of the work W during the cleaning process, and the lubricant is ejected from the lubricant injection nozzle 24. This lubricant is applied to the surface of the work W, and the lubricant applied to the surface of the work W is heated by the warm air sent from the heating hot air sending unit 25 to apply this lubricant to the surface of the work W. It is configured to be fixed and filmed.

尚、乾燥用温風送出ノズル23及び加熱用温風送出部25は、共通の温風供給部26から供給される温風を送出するように構成されている。 The drying hot air sending nozzle 23 and the heating hot air sending unit 25 are configured to send out the hot air supplied from the common hot air supply unit 26.

また、本実施例の潤滑処理部10には、潤滑剤噴射ノズル25から噴射される潤滑剤を回収・貯留する潤滑剤回収タンク部27が設けられており、この潤滑剤回収タンク部27に回収・貯留された潤滑剤を、ポンプ28を介して再度、潤滑剤噴射ノズル24に供給して潤滑剤を再利用するように構成されている。 Further, the lubrication processing unit 10 of the present embodiment is provided with a lubricant recovery tank unit 27 that collects and stores the lubricant injected from the lubricant injection nozzle 25, and the lubricant recovery tank unit 27 collects the lubricant. -The stored lubricant is supplied to the lubricant injection nozzle 24 again via the pump 28, and the lubricant is reused.

また、アンローダー部11は、図1に示すように、ベルトコンベア部11aと、エレベータ部11bとを備え、上述した潤滑処理部10で表面に潤滑皮膜が形成されたワークWを次処理装置(例えば冷間鍛造処理を行うプレス装置)へ搬送するように構成されている。 Further, as shown in FIG. 1, the unloader unit 11 includes a belt conveyor unit 11a and an elevator unit 11b, and a work W having a lubricating film formed on the surface of the lubrication processing unit 10 described above is used as a next processing device ( For example, it is configured to be transported to a press device that performs cold forging processing).

このように、本実施例は、搬送状態が不安定な円板状(扁平円柱状)のワークWを処理する場合でも、ワークWを挟持移動部4で挟持搬送することで安定的に搬送することができ、更に、スラリ噴射部2にスリットノズルタイプ(巾広ガン)を採用したことで、スラリがワークWの端面に対して上下方向に横断するように直線状に当射され、スラリ当射圧がワークWの端面に均等に掛かり、ワークWのバランスの崩れが可及的に低減され、ウェットブラスト処理部8において、ワークWを良好に回転搬送し、適正なウェットブラスト処理が確実に行われ、これにより潤滑処理部10で付与される潤滑剤がワークWの表面に良好に付着し密着性に優れた潤滑皮膜を形成することができる画期的なワーク表面処理装置となる。 As described above, in this embodiment, even when the disk-shaped (flat columnar) work W whose transport state is unstable is processed, the work W is stably transported by being sandwiched and transported by the sandwiching and moving unit 4. Furthermore, by adopting a slit nozzle type (wide gun) for the slurry injection unit 2, the slurry is hit in a straight line so as to cross the end face of the work W in the vertical direction, and the slurry is hit. The firing pressure is evenly applied to the end face of the work W, the imbalance of the work W is reduced as much as possible, and the work W is satisfactorily rotated and conveyed in the wet blast processing unit 8 to ensure proper wet blast processing. This is an epoch-making work surface treatment device capable of forming a lubricating film having excellent adhesion by satisfactorily adhering the lubricant applied by the lubrication treatment unit 10 to the surface of the work W.

また、本実施例のワーク表面処理装置を用いることで、ワークWに密着性の良い潤滑皮膜を形成することができる画期的なワーク表面処理方法を確立することができる。 Further, by using the work surface treatment apparatus of this embodiment, it is possible to establish an epoch-making work surface treatment method capable of forming a lubricating film having good adhesion to the work W.

尚、本発明における円柱若しくは円板状のワークWは、断面円形状の長さを有するものであって、内部が中空の円筒状のものを含むものである。 The cylindrical or disc-shaped work W in the present invention has a length having a circular cross section, and includes a cylindrical one having a hollow inside.

また、本発明は、本実施例に限られるものではなく、各構成要件の具体的構成は適宜設計し得るものである。 Further, the present invention is not limited to the present embodiment, and the specific configuration of each constituent requirement can be appropriately designed.

1 ワーク搬送部
2 スラリ噴射部
3 回転部
3a 回転ローラ
4 挟持移動部
4a 基体
4b 基体
5a 突体
5b 突体
6a 移動爪
6b 移動爪
10 潤滑処理部
W ワーク
1 Work transfer part 2 Slurry injection part 3 Rotating part 3a Rotating roller 4 Holding moving part 4a Base 4b Base 5a Projection 5b Projection 6a Moving claw 6b Moving claw
10 Lubrication processing unit W work

Claims (9)

円柱若しくは円板状のワークを軸心を回転軸として回転させながらワーク長さ方向に搬送するワーク搬送部と、搬送途次の前記ワークに対してスラリを噴射するスラリ噴射部とを備えたワーク表面処理装置であって、前記スラリ噴射部は、スラリ射出口部がスリット状に構成されたものであり、このスラリ射出口部は、長手方向が前記ワークの搬送方向に向けられると共に、前記ワークに対して所定角度の傾斜状態で配設され、前記ワークに対して前記スラリが傾斜帯状に噴射されるように構成され、前記ワーク搬送部は、前記ワークに当接して該ワークを回転させる回転部と、前記ワークを挟持移動させる挟持移動部とで構成されていることを特徴とするワーク表面処理装置。 A work provided with a work transport section that transports a cylindrical or disk-shaped work in the work length direction while rotating the work center as a rotation axis, and a slurry injection section that injects slurry to the work in the process of transport. In the surface treatment device, the slurry injection port portion has a slurry injection port portion configured in a slit shape, and the slurry injection port portion has a longitudinal direction directed to the transport direction of the work and the work. It is arranged in an inclined state of a predetermined angle with respect to the rotation, wherein the slurry with respect to the workpiece is adapted to be injected into the inclined belt, the workpiece transfer unit, for rotating the workpiece in contact with the workpiece A work surface treatment device comprising a portion and a pinching moving portion for pinching and moving the work. 請求項1記載のワーク表面処理装置において、前記スラリ噴射部は、前記ワーク搬送部の上方に配設され、前記ワークに対して斜め上方から前記スラリを噴射するように構成されていることを特徴とするワーク表面処理装置。 The work surface treatment apparatus according to claim 1 is characterized in that the slurry injection unit is arranged above the work transfer unit and is configured to inject the slurry from diagonally above the work. Work surface treatment equipment. 請求項1,2いずれか1項に記載のワーク表面処理装置において、前記回転部は、間隔をおいて対向状態に配設され、前記ワークに下側から当接して該ワークを支持且つ回転させる一対の回転ローラで構成され、前記スラリ噴射部は、前記スラリ射出口部のスリット幅が前記一対の回転ローラの対向間隔よりも幅狭に設定されていることを特徴とするワーク表面処理装置。 In the work surface treatment apparatus according to any one of claims 1 and 2, the rotating portions are arranged in a facing state at intervals, and abut on the work from below to support and rotate the work. A work surface treatment apparatus composed of a pair of rotating rollers, wherein the slit width of the slurry injection port portion is set to be narrower than the facing interval of the pair of rotating rollers. 請求項記載のワーク表面処理装置において、前記スラリ噴射部は、搬送途次の複数の前記ワークに対してスラリを同時に噴射するように構成されていることを特徴とするワーク表面処理装置。 The work surface treatment apparatus according to claim 3 , wherein the slurry injection unit is configured to simultaneously inject slurry onto a plurality of the workpieces in the process of being conveyed. 請求項1〜4いずれか1項に記載のワーク表面処理装置において、前記挟持移動部は、対向状態に配設され前記ワークの搬送方向及び搬送逆方向に往復移動可能な一対の基体からなり、この一対の基体は、夫々内外方向に移動可能に構成され、更に、前記一対の基体には、夫々、内方に突出する突体が所定間隔をおいて設けられ、更に、前記一対の基体には、夫々前記突体に対して接離移動する移動爪が設けられていることを特徴とするワーク表面処理装置。 In the work surface treatment apparatus according to any one of claims 1 to 4 , the sandwiching moving portion is composed of a pair of substrates which are arranged in a facing state and can be reciprocated in the transport direction and the reverse direction of the work. Each of the pair of substrates is configured to be movable inward and outward, and each of the pair of substrates is provided with protrusions protruding inward at predetermined intervals, and the pair of substrates is further provided with protrusions protruding inward at predetermined intervals. Is a work surface treatment device, each of which is provided with a moving claw that moves in contact with the projecting body. 請求項1〜いずれか1項に記載のワーク表面処理装置において、前記ワークに潤滑処理を行う潤滑処理部が設けられていることを特徴とするワーク表面処理装置。 The work surface treatment apparatus according to any one of claims 1 to 5 , wherein the work is provided with a lubrication treatment unit for performing lubrication treatment. 円柱若しくは円板状のワークに当接して該ワークを軸心を回転軸として回転させる回転部及び前記ワークを挟持移動させる挟持移動部からなるワーク搬送部と、前記ワークにスラリを噴射するスラリ噴射部とを備えたワーク表面処理装置により前記ワークの表面処理を行うワーク表面処理方法であって、前記スラリ噴射部としてスラリ射出口部がスリット状に構成されたものを採用し、このスラリ射出口部は、長手方向が前記ワークの搬送方向に向けられると共に、前記ワークに対して所定角度の傾斜状態で配設され、また、前記挟持移動部は、対向状態に配設され前記ワークの搬送方向及び搬送逆方向に往復移動可能な一対の基体からなり、この一対の基体は、夫々内外方向に移動可能に構成され、更に、前記一対の基体には、夫々、内方に突出する突体が所定間隔をおいて設けられ、更に、前記一対の基体には、夫々前記突体に対して接離移動する移動爪が設けられ、軸心を回転軸として回転しながら下記のように搬送される前記ワークに対して上方から前記スラリ噴射部により前記スラリを傾斜帯状に噴射して該ワークの表面をウェットブラスト処理することを特徴とするワーク表面処理方法。

一方の前記基体の前記突体と前記移動爪との間に前記ワークが位置した状態において、この一方の基体の前記移動爪が前記突体に接近移動して前記ワークを挟持し、他方の前記基体が外方に移動すると共にこの他方の基体の前記移動爪が前記突体から離反移動し、続いて、前記一方の基体が搬送方向に移動して前記ワークを搬送し、同時に前記他方の基体が搬送逆方向に移動し、続いて、前記他方の基体が内方に移動して該他方の基体の前記突体と前記移動爪との間にワークを位置させ、前記一方の基体の前記移動爪が前記突体から離反移動し前記ワークの挟持を解除すると共に該一方の基体が外方に移動し、続いて、前記他方の基体の前記突体と前記移動爪との間に前記ワークが位置した状態において、この他方の基体の前記移動爪が前記突体に接近移動して前記ワークを挟持し、前記一方の基体が外方に移動すると共に該一方の基体の前記移動爪が前記突体から離反移動し、続いて、前記他方の基体が搬送方向に移動して前記ワークを搬送し、同時に前記一方の基体が搬送逆方向に移動し、続いて、前記一方の基体が内方に移動して該一方の基体の前記突体と前記移動爪との間にワークを位置させ、前記他方の基体の前記移動爪が前記突体から離反移動し前記ワークの挟持を解除すると共に該他方の基体が外方に移動し、以後、これらの動作を繰り返して前記ワークを搬送する。
A work transfer part consisting of a rotating part that abuts on a cylindrical or disk-shaped work and rotates the work around the axis of rotation, a holding moving part that holds and moves the work, and a slurry injection that injects slurry onto the work. A work surface treatment method for surface-treating the work by a work surface treatment device provided with a portion, wherein a slurry injection port having a slit-shaped slurry injection port is adopted as the slurry injection port. The portions are arranged in a state of being inclined at a predetermined angle with respect to the work while the longitudinal direction is directed to the transport direction of the work, and the sandwiching and moving portions are arranged in an opposed state and the transport direction of the work. The pair of substrates is composed of a pair of substrates that can be reciprocated in the reverse direction of transportation, and the pair of substrates is configured to be movable in and out of each direction. The pair of substrates are provided at predetermined intervals, and each of the pair of substrates is provided with moving claws that move in contact with the projecting body, and is conveyed as described below while rotating around the axis of rotation. A work surface treatment method comprising spraying the slurry from above on the work in an inclined band shape by the slurry injection portion to perform a wet blast treatment on the surface of the work.
Note: In a state where the work is positioned between the projectile and the moving claw of one of the substrates, the moving claw of the one substrate moves closer to the projectile to sandwich the work, and the other As the substrate moves outward, the moving claws of the other substrate move away from the projecting body, and then the one substrate moves in the transport direction to transport the work, and at the same time, the other substrate. The substrate moves in the opposite direction of transport, and then the other substrate moves inward to position the workpiece between the projectile and the moving claw of the other substrate, and the said one of the substrates. The moving claw moves away from the projecting body to release the holding of the work, and at the same time, the one substrate moves outward, and then the work is between the projecting body and the moving claw of the other substrate. The moving claw of the other substrate moves closer to the projecting body to sandwich the work, the one substrate moves outward, and the moving claw of the one substrate moves to the outside. The other substrate moves away from the projectile and subsequently moves in the transport direction to transport the work, and at the same time, the one substrate moves in the opposite direction of transport, and then the one substrate moves inward. The work is positioned between the projecting body of the one substrate and the moving claw, and the moving claw of the other substrate moves away from the projecting body to release the pinching of the work. The other substrate moves outward, and thereafter, these operations are repeated to convey the work.
請求項記載のワーク表面処理方法において、搬送途次の複数の前記ワークに対して前記スラリを同時に噴射することを特徴とするワーク表面処理方法。 The work surface treatment method according to claim 7 , wherein the slurry is simultaneously injected onto a plurality of the workpieces in the process of being transported. 請求項7,8いずれか1項に記載のワーク表面処理方法において、前記ウェットブラスト処理後に前記ワークの表面に潤滑剤を付与する潤滑処理を行うことを特徴とするワーク表面処理方法。 The work surface treatment method according to any one of claims 7 and 8 , wherein a lubrication treatment for applying a lubricant to the surface of the work is performed after the wet blast treatment.
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