JP6924661B2 - 露光装置、基板処理装置、露光方法および基板処理方法 - Google Patents

露光装置、基板処理装置、露光方法および基板処理方法 Download PDF

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JP6924661B2
JP6924661B2 JP2017181527A JP2017181527A JP6924661B2 JP 6924661 B2 JP6924661 B2 JP 6924661B2 JP 2017181527 A JP2017181527 A JP 2017181527A JP 2017181527 A JP2017181527 A JP 2017181527A JP 6924661 B2 JP6924661 B2 JP 6924661B2
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unit
substrate
processing chamber
gas
exhaust
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JP2017181527A
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JP2019057640A5 (enExample
JP2019057640A (ja
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知佐世 中山
知佐世 中山
田中　裕二
裕二 田中
将彦 春本
将彦 春本
正也 浅井
正也 浅井
靖博 福本
靖博 福本
幸司 金山
幸司 金山
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Screen Holdings Co Ltd
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Screen Holdings Co Ltd
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Priority to JP2017181527A priority Critical patent/JP6924661B2/ja
Priority to TW107128728A priority patent/TWI712865B/zh
Priority to US16/124,331 priority patent/US10955745B2/en
Priority to KR1020180109652A priority patent/KR102153174B1/ko
Priority to CN201811072678.5A priority patent/CN109541890B/zh
Publication of JP2019057640A publication Critical patent/JP2019057640A/ja
Publication of JP2019057640A5 publication Critical patent/JP2019057640A5/ja
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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2017181527A 2017-09-21 2017-09-21 露光装置、基板処理装置、露光方法および基板処理方法 Active JP6924661B2 (ja)

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Application Number Priority Date Filing Date Title
JP2017181527A JP6924661B2 (ja) 2017-09-21 2017-09-21 露光装置、基板処理装置、露光方法および基板処理方法
TW107128728A TWI712865B (zh) 2017-09-21 2018-08-17 曝光裝置、基板處理裝置、曝光方法及基板處理方法
US16/124,331 US10955745B2 (en) 2017-09-21 2018-09-07 Exposure device, substrate processing apparatus, exposure method and substrate processing method
KR1020180109652A KR102153174B1 (ko) 2017-09-21 2018-09-13 노광 장치, 기판 처리 장치, 노광 방법 및 기판 처리 방법
CN201811072678.5A CN109541890B (zh) 2017-09-21 2018-09-14 曝光装置、基板处理装置、曝光方法以及基板处理方法

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JP2017181527A JP6924661B2 (ja) 2017-09-21 2017-09-21 露光装置、基板処理装置、露光方法および基板処理方法

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JP2019057640A JP2019057640A (ja) 2019-04-11
JP2019057640A5 JP2019057640A5 (enExample) 2021-02-25
JP6924661B2 true JP6924661B2 (ja) 2021-08-25

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI747490B (zh) * 2019-09-19 2021-11-21 日商斯庫林集團股份有限公司 曝光裝置
JP7335763B2 (ja) * 2019-09-19 2023-08-30 株式会社Ｓｃｒｅｅｎホールディングス 露光装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3315843B2 (ja) * 1995-09-01 2002-08-19 大日本スクリーン製造株式会社 基板処理装置
JPH10270333A (ja) * 1997-03-27 1998-10-09 Nikon Corp 露光装置
JP3585215B2 (ja) * 1999-05-24 2004-11-04 東京エレクトロン株式会社 基板処理装置
US6524389B1 (en) * 1999-05-24 2003-02-25 Tokyo Electron Limited Substrate processing apparatus
JP6543064B2 (ja) * 2015-03-25 2019-07-10 株式会社Ｓｃｒｅｅｎホールディングス 露光装置、基板処理装置、基板の露光方法および基板処理方法

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