JP6900449B2 - 空冷プラズマトーチのための電極 - Google Patents
空冷プラズマトーチのための電極 Download PDFInfo
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- JP6900449B2 JP6900449B2 JP2019197216A JP2019197216A JP6900449B2 JP 6900449 B2 JP6900449 B2 JP 6900449B2 JP 2019197216 A JP2019197216 A JP 2019197216A JP 2019197216 A JP2019197216 A JP 2019197216A JP 6900449 B2 JP6900449 B2 JP 6900449B2
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- diameter
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- torch
- nozzle
- cylindrical portion
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- 238000005520 cutting process Methods 0.000 claims description 29
- 229910052735 hafnium Inorganic materials 0.000 claims description 12
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 11
- 239000007789 gas Substances 0.000 description 35
- 230000007704 transition Effects 0.000 description 9
- 238000010586 diagram Methods 0.000 description 6
- 238000013459 approach Methods 0.000 description 5
- 239000012212 insulator Substances 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 230000006872 improvement Effects 0.000 description 4
- 238000009434 installation Methods 0.000 description 4
- 238000012546 transfer Methods 0.000 description 3
- 238000003466 welding Methods 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000000112 cooling gas Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 150000002362 hafnium Chemical class 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 230000002459 sustained effect Effects 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
- H05H1/3447—Rod-like cathodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
- H05H1/3423—Connecting means, e.g. electrical connecting means or fluid connections
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
- H05H1/3442—Cathodes with inserted tip
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
- H05H1/3478—Geometrical details
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
- H05H1/3489—Means for contact starting
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Geometry (AREA)
- Plasma Technology (AREA)
- Arc Welding In General (AREA)
Description
12 筐体
14 トーチアセンブリ
18 トーチ端部
20 入力装置
23 コネクタ
24 ホース部
100 システム
200 トーチ
200a トーチヘッド
201 コネクタ
203 陰極体
205 電極
205a ねじ部
205b 部
205c 円筒部
205d 遠位端
207 ハフニウム挿入体
209 絶縁体構造
211 旋回リング
213 ノズル
213a 円筒突出部
311f 空洞
213b のど
215 シールド
215a 円筒突出部
217a リテーナアセンブリ
217b リテーナアセンブリ
217c リテーナアセンブリ
300 トーチヘッド
305 電極
305a ねじ部
305b 固定部
305c 下流円筒部
305d 端部
305e ナット部
305f 据え付け部
305g 平端面
307 ハフニウム挿入体
311 旋回リング
311a 上側領域
311b 下側領域
311c 流路
311d 孔
311e 孔
313 ノズル
313a 端部
313b 円筒部
313c 先端部
313d のど
313e 入口部
313f 幅狭のど部
313g 幅広拡張部
313h 先端面
313z 熱バンド
315 シールドキャップ
315a ねじ付端部
315b 円筒部
315c シールドキャップ先端部
315d 先端面
315e 円形開口
315f 内側傾斜面
Claims (9)
- 空冷プラズマトーチのための電極であって、当該電極は、
当該電極を固定するための固定部と、
前記固定部の下流にある円筒部であって、該円筒部は、該円筒部の最大直径に対する当該電極の最大直径の比の範囲が1.4〜1.8になるような最大外径を有し、該円筒部は円形平端面を有する遠位端を含む、円筒部と、
前記円筒部の遠位端に挿入されるハフニウム挿入体であって、該ハフニウム挿入体は、直径に対する長さの比の範囲が2〜4の円筒形を有する、ハフニウム挿入体と、
を含み、
前記円形平端面は、前記円筒部の最大直径に対する前記円形平端面の直径の比の範囲が0.8〜0.95になるような直径を有する、電極。 - 前記円筒部の最大直径に対する前記電極の最大直径の比の範囲は1.4〜1.6である、請求項1に記載の電極。
- 前記電極は、40〜100アンペアの範囲の切断作業で用いるための空冷電極である、請求項1に記載の電極。
- 前記円筒部の最大外径の範囲は0.508〜1.016cmである、請求項1に記載の電極。
- 前記ハフニウム挿入体の直径に対する長さの比の範囲は2.25〜3.5である、請求項1に記載の電極。
- 前記円形平端面は直径dを有し、該直径dの前記円筒部の最大外径に対する比の範囲は0.8〜0.95である、請求項1に記載の電極。
- 前記円形平端面は直径dを有し、該直径dの前記円筒部の最大外径に対する比の範囲は0.83〜0.91である、請求項1に記載の電極。
- 前記電極は、40〜100アンペアの範囲の切断作業のために用いられる空冷電極であり、
前記円形平端面は直径dを有し、該直径dの前記円筒部の最大外径に対する比の範囲は0.8〜0.95であり、
前記円筒部の最大外径の範囲は0.508〜1.016cmである、請求項1に記載の電極。 - 前記固定部は、前記電極を固定するねじを有するねじ部である、請求項1に記載の電極。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/281,848 | 2014-05-19 | ||
US14/281,848 US9398679B2 (en) | 2014-05-19 | 2014-05-19 | Air cooled plasma torch and components thereof |
JP2016565381A JP6612261B2 (ja) | 2014-05-19 | 2015-05-13 | 空冷プラズマトーチのための電極及びそれを用いる空冷プラズマトーチ |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016565381A Division JP6612261B2 (ja) | 2014-05-19 | 2015-05-13 | 空冷プラズマトーチのための電極及びそれを用いる空冷プラズマトーチ |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020017539A JP2020017539A (ja) | 2020-01-30 |
JP6900449B2 true JP6900449B2 (ja) | 2021-07-07 |
Family
ID=53476921
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016565381A Active JP6612261B2 (ja) | 2014-05-19 | 2015-05-13 | 空冷プラズマトーチのための電極及びそれを用いる空冷プラズマトーチ |
JP2019197216A Active JP6900449B2 (ja) | 2014-05-19 | 2019-10-30 | 空冷プラズマトーチのための電極 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016565381A Active JP6612261B2 (ja) | 2014-05-19 | 2015-05-13 | 空冷プラズマトーチのための電極及びそれを用いる空冷プラズマトーチ |
Country Status (6)
Country | Link |
---|---|
US (1) | US9398679B2 (ja) |
EP (1) | EP3114908B1 (ja) |
JP (2) | JP6612261B2 (ja) |
CN (1) | CN106465527B (ja) |
PL (1) | PL3114908T3 (ja) |
WO (1) | WO2015177616A1 (ja) |
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2014
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CN106465527A (zh) | 2017-02-22 |
JP2017523552A (ja) | 2017-08-17 |
US20150334817A1 (en) | 2015-11-19 |
EP3114908A1 (en) | 2017-01-11 |
JP2020017539A (ja) | 2020-01-30 |
WO2015177616A1 (en) | 2015-11-26 |
CN106465527B (zh) | 2017-12-12 |
EP3114908B1 (en) | 2019-03-06 |
US9398679B2 (en) | 2016-07-19 |
JP6612261B2 (ja) | 2019-11-27 |
PL3114908T3 (pl) | 2019-08-30 |
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