JP6839243B2 - Bis- (4-haloethylbenzenesulfonyl) imide or a salt thereof, a method for producing the same, and a method for producing bis- (4-styrenesulfonyl) imide or a salt thereof using bis- (4-haloethylbenzenesulfonyl) imide as a precursor. - Google Patents
Bis- (4-haloethylbenzenesulfonyl) imide or a salt thereof, a method for producing the same, and a method for producing bis- (4-styrenesulfonyl) imide or a salt thereof using bis- (4-haloethylbenzenesulfonyl) imide as a precursor. Download PDFInfo
- Publication number
- JP6839243B2 JP6839243B2 JP2019152149A JP2019152149A JP6839243B2 JP 6839243 B2 JP6839243 B2 JP 6839243B2 JP 2019152149 A JP2019152149 A JP 2019152149A JP 2019152149 A JP2019152149 A JP 2019152149A JP 6839243 B2 JP6839243 B2 JP 6839243B2
- Authority
- JP
- Japan
- Prior art keywords
- imide
- bis
- salt
- haloethylbenzenesulfonyl
- styrenesulfonyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 150000003949 imides Chemical class 0.000 title claims description 120
- -1 4-styrenesulfonyl Chemical group 0.000 title claims description 81
- 150000003839 salts Chemical class 0.000 title claims description 72
- 238000004519 manufacturing process Methods 0.000 title claims description 44
- 239000002243 precursor Substances 0.000 title claims description 13
- 239000002585 base Substances 0.000 claims description 34
- 238000006116 polymerization reaction Methods 0.000 claims description 20
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 19
- 229910052739 hydrogen Inorganic materials 0.000 claims description 18
- 239000003112 inhibitor Substances 0.000 claims description 12
- 229910001413 alkali metal ion Inorganic materials 0.000 claims description 11
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 9
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 9
- 229910052794 bromium Inorganic materials 0.000 claims description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 8
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 6
- 229910001420 alkaline earth metal ion Inorganic materials 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 5
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 5
- 239000000460 chlorine Substances 0.000 claims description 5
- 229910052801 chlorine Inorganic materials 0.000 claims description 5
- 239000003795 chemical substances by application Substances 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 description 59
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 35
- 229910052744 lithium Inorganic materials 0.000 description 35
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 32
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- 238000000034 method Methods 0.000 description 9
- 238000000746 purification Methods 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
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- 150000001340 alkali metals Chemical class 0.000 description 8
- 125000000524 functional group Chemical group 0.000 description 8
- VHEKFTULOYIMSU-UHFFFAOYSA-N 4-ethenylbenzenesulfonyl chloride Chemical compound ClS(=O)(=O)C1=CC=C(C=C)C=C1 VHEKFTULOYIMSU-UHFFFAOYSA-N 0.000 description 7
- 238000004458 analytical method Methods 0.000 description 7
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- 239000007787 solid Substances 0.000 description 7
- 238000005160 1H NMR spectroscopy Methods 0.000 description 6
- MDSVZAOASLDVPG-UHFFFAOYSA-N 4-(2-bromoethyl)benzenesulfonamide Chemical compound NS(=O)(=O)C1=CC=C(CCBr)C=C1 MDSVZAOASLDVPG-UHFFFAOYSA-N 0.000 description 6
- ZLQHSSKMRVRVHB-UHFFFAOYSA-N 4-(2-bromoethyl)benzenesulfonyl chloride Chemical compound ClS(=O)(=O)C1=CC=C(CCBr)C=C1 ZLQHSSKMRVRVHB-UHFFFAOYSA-N 0.000 description 6
- GKGOIYMLPJJVQI-UHFFFAOYSA-N 4-ethenylbenzenesulfonamide Chemical compound NS(=O)(=O)C1=CC=C(C=C)C=C1 GKGOIYMLPJJVQI-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
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- 150000001342 alkaline earth metals Chemical class 0.000 description 6
- 238000005342 ion exchange Methods 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 6
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 6
- 239000002002 slurry Substances 0.000 description 6
- 239000011734 sodium Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N acetic acid Substances CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 238000005341 cation exchange Methods 0.000 description 5
- 239000003431 cross linking reagent Substances 0.000 description 5
- 238000001914 filtration Methods 0.000 description 5
- 239000011261 inert gas Substances 0.000 description 5
- 229910017053 inorganic salt Inorganic materials 0.000 description 5
- 229910003002 lithium salt Inorganic materials 0.000 description 5
- 159000000002 lithium salts Chemical class 0.000 description 5
- 239000012299 nitrogen atmosphere Substances 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- XFTALRAZSCGSKN-UHFFFAOYSA-M sodium;4-ethenylbenzenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=C(C=C)C=C1 XFTALRAZSCGSKN-UHFFFAOYSA-M 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 4
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- MAGFQRLKWCCTQJ-UHFFFAOYSA-N 4-ethenylbenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(C=C)C=C1 MAGFQRLKWCCTQJ-UHFFFAOYSA-N 0.000 description 1
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- BGNXCDMCOKJUMV-UHFFFAOYSA-N Tert-Butylhydroquinone Chemical compound CC(C)(C)C1=CC(O)=CC=C1O BGNXCDMCOKJUMV-UHFFFAOYSA-N 0.000 description 1
- BGYHLZZASRKEJE-UHFFFAOYSA-N [3-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]-2,2-bis[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxymethyl]propyl] 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCC(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 BGYHLZZASRKEJE-UHFFFAOYSA-N 0.000 description 1
- OMOVVBIIQSXZSZ-UHFFFAOYSA-N [6-(4-acetyloxy-5,9a-dimethyl-2,7-dioxo-4,5a,6,9-tetrahydro-3h-pyrano[3,4-b]oxepin-5-yl)-5-formyloxy-3-(furan-3-yl)-3a-methyl-7-methylidene-1a,2,3,4,5,6-hexahydroindeno[1,7a-b]oxiren-4-yl] 2-hydroxy-3-methylpentanoate Chemical compound CC12C(OC(=O)C(O)C(C)CC)C(OC=O)C(C3(C)C(CC(=O)OC4(C)COC(=O)CC43)OC(C)=O)C(=C)C32OC3CC1C=1C=COC=1 OMOVVBIIQSXZSZ-UHFFFAOYSA-N 0.000 description 1
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- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- NJVHCUNZAMFQNA-UHFFFAOYSA-N azane;n-hydroxy-n-phenylnitrous amide Chemical compound N.O=NN(O)C1=CC=CC=C1 NJVHCUNZAMFQNA-UHFFFAOYSA-N 0.000 description 1
- 150000001555 benzenes Chemical class 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
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- 239000003317 industrial substance Substances 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
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- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 1
- 229910052808 lithium carbonate Inorganic materials 0.000 description 1
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- ZKIAYSOOCAKOJR-UHFFFAOYSA-M lithium;2-phenylethenesulfonate Chemical compound [Li+].[O-]S(=O)(=O)C=CC1=CC=CC=C1 ZKIAYSOOCAKOJR-UHFFFAOYSA-M 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
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- 238000007670 refining Methods 0.000 description 1
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- 239000013535 sea water Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- MNCGMVDMOKPCSQ-UHFFFAOYSA-M sodium;2-phenylethenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C=CC1=CC=CC=C1 MNCGMVDMOKPCSQ-UHFFFAOYSA-M 0.000 description 1
- 239000007784 solid electrolyte Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 125000005463 sulfonylimide group Chemical group 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- RBTVSNLYYIMMKS-UHFFFAOYSA-N tert-butyl 3-aminoazetidine-1-carboxylate;hydrochloride Chemical compound Cl.CC(C)(C)OC(=O)N1CC(N)C1 RBTVSNLYYIMMKS-UHFFFAOYSA-N 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 229910000404 tripotassium phosphate Inorganic materials 0.000 description 1
- 235000019798 tripotassium phosphate Nutrition 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
Images
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- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
本発明は、ビス-(４-ハロエチルベンゼンスルホニル)イミド又はその塩、４−ハロエチルベンゼンスルホンクロリドと４−ハロエチルベンゼンスルホンアミドを用いたその製造方法、並びにビス-(４-ハロエチルベンゼンスルホニル)イミドを前駆体としたビス-(４-スチレンスルホニル)イミド又はその塩の製造方法に関する。 The present invention relates to bis- (4-haloethylbenzenesulfonyl) imide or a salt thereof, a method for producing the same using 4-haloethylbenzenesulfon chloride and 4-haloethylbenzenesulfonamide, and bis- (4-haloethylbenzenesulfonyl) imide. The present invention relates to a method for producing a bis- (4-styrenesulfonyl) imide as a precursor or a salt thereof.
イオン交換膜は、脱塩および減塩による純水製造または海水淡水化、工業的な物質精製、医薬、食品加工、メッキ溶剤処理、廃液処理などに用いられるほか、最近では、固体高分子型燃料電池や固体高分子型二次電池の電解質にも用いられ、幅広い産業用途で利用されている。 Ion exchange membranes are used for pure water production or seawater desalination by desalting and reducing salt, industrial substance refining, pharmaceuticals, food processing, plating solvent treatment, waste liquid treatment, etc., and recently, polymer electrolyte fuels. It is also used as an electrolyte for batteries and polymer electrolyte secondary batteries, and is used in a wide range of industrial applications.
これらイオン交換膜は、イオン交換性官能基を有するモノマー類と架橋剤の共重合や、イオン交換性官能基を導入可能な膜状ポリマーを形成後、イオン性官能基を導入する方法等により製造されている。この際、架橋剤は、分子内に複数のラジカル重合性不飽和基を有するモノマー（以下、架橋性モノマーということがある）を使用するが、工業的に効率よくイオン交換膜を製造するには、架橋性モノマーの水溶性が極めて重要となる。 These ion-exchange films are manufactured by copolymerizing a monomer having an ion-exchange functional group with a cross-linking agent, forming a film-like polymer into which an ion-exchange functional group can be introduced, and then introducing an ionic functional group. Has been done. At this time, as the cross-linking agent, a monomer having a plurality of radically polymerizable unsaturated groups in the molecule (hereinafter, may be referred to as a cross-linking monomer) is used, but in order to industrially efficiently produce an ion exchange membrane. , The water solubility of the crosslinkable monomer is extremely important.
例えば、特許文献１では、水溶性のスチレンスルホン酸リチウムとイオン性官能基を持たない非水溶性のジビニルベンゼンをラジカル重合させることでカチオン交換膜を製造している。しかしながら、モノマーと架橋剤の溶解度の差異から、反応に特殊な高沸点溶媒を必要とすること、また、共重合分子中のイオン交換性官能基の比率が低いことに起因する、カチオン交換膜のイオン交換容量の低下や、電気抵抗の増大などの課題がある。上記のような課題は、イオン性官能基を有する水溶性架橋性モノマーの使用により改善できるが、カルボキシル基やスルホン酸基など、イオン交換性官能基を有する水溶性の架橋性モノマーは市販されておらず、報告例も殆どない。 For example, in Patent Document 1, a cation exchange film is produced by radical polymerization of water-soluble lithium styrene sulfonate and water-insoluble divinylbenzene having no ionic functional group. However, due to the difference in solubility between the monomer and the cross-linking agent, a special high boiling point solvent is required for the reaction, and the ratio of ion-exchange functional groups in the copolymerized molecule is low. There are problems such as a decrease in ion exchange capacity and an increase in electrical resistance. The above problems can be improved by using a water-soluble crosslinkable monomer having an ionic functional group, but a water-soluble crosslinkable monomer having an ion-exchange functional group such as a carboxyl group or a sulfonic acid group is commercially available. There are no reports, and there are few reports.
また、アルカリ金属イオン電池の電解質のようなアルカリ金属イオン伝導性材料の原料として、アルカリ金属伝導性を持つスルホンイミド型モノマー群は、産業上極めて有用である。これらの分子内に単一あるいは複数のラジカル重合性不飽和基とイオン伝導性を持つスルホンイミド構造を有するモノマー類の有用性はこれまでに数例報告されている。 Further, as a raw material for an alkali metal ion conductive material such as an electrolyte of an alkali metal ion battery, a sulfoneimide type monomer group having alkali metal conductivity is extremely useful industrially. Several examples of the usefulness of monomers having a sulfonimide structure having a single or multiple radically polymerizable unsaturated groups and ionic conductivity in these molecules have been reported so far.
たとえば、ビス-(４-スチレンスルホニル)イミドのアルカリ金属塩は、高分子固体電解質の架橋剤として報告例がある（例えば特許文献２、特許文献３参照）。 For example, an alkali metal salt of bis- (4-styrenesulfonyl) imide has been reported as a cross-linking agent for a polymer solid electrolyte (see, for example, Patent Documents 2 and 3).
特許文献２によれば、リチウムビス（スチレンスルホニル）イミドモノマーによって架橋されたイオン伝導性ポリマーは、液体電解質を有するリチウムイオン電池の課題であった金属リチウムの樹枝状析出を抑制できるため、充放電効率、サイクル寿命、安全性の面で優れている旨記載されている。 According to Patent Document 2, the ionic conductive polymer crosslinked with a lithium bis (styrene sulfonyl) imide monomer can suppress dendritic precipitation of metallic lithium, which has been a problem of lithium ion batteries having a liquid electrolyte, and thus is charged and discharged. It is stated that it is excellent in terms of efficiency, cycle life, and safety.
また、特許文献３によれば、リチウム４−ニトロ−４‘−ビニルビフェニルスルホニルイミドを含む電解質を用いたリチウムイオン電池において、金属リチウムの樹枝状析出を抑制し、安全性が向上することを報告している。
Further, according to
このように、イオン伝導性材料として有用なスルホンイミド構造、特にビニル基を有するスチレンスルホンイミド構造は、ビニル基を有するスチレンスルホン酸誘導体から製造されている。 As described above, the sulfonimide structure useful as an ionic conductive material, particularly the styrene sulfonimide structure having a vinyl group, is produced from a styrene sulfonic acid derivative having a vinyl group.
例えば、特許文献２では、上記スキーム１で示したように、４−ビニルベンゼンスルホンクロリドと、４−ビニルベンゼンスルホンアミドを、塩基存在下、イミド化することでビススチレンスルホンイミド塩を製造している。また、特許文献３においても、４−ビニルベンゼンスルホンクロリドを出発原料に用いている。
For example, in Patent Document 2, as shown in Scheme 1 above, a bisstyrenesulfonimide salt is produced by imidizing 4-vinylbenzenesulfon chloride and 4-vinylbenzenesulfonamide in the presence of a base. There is. Further, also in
しかしながら、反応基質である４−ビニルベンゼンスルホンクロリドの加水分解物であるスチレンスルホン酸またはその塩とビススチレンスルホンイミド塩の分離が困難であること、反応基質や生成したイミド体のポリマー化、アルカリ金属水素化物のような爆発性や腐食性の高い塩基を用いる等の課題があり、実用性に乏しい。特に、反応基質や生成したイミド体のポリマー化は、収率および純度低下の要因になるだけではなく、反応の進行とともに系内の粘度が上昇し、反応継続やろ過操作が困難となるため、製造上大きな課題となる。また、工業的に入手可能な出発原料としてスチレンスルホン酸ナトリウム塩は半水塩であり、この乾燥工程に非常に時間がかかる点や工程（３）総収率が３０％程度と低収率でしか製造できない点に関しても実用性に乏しい。 However, it is difficult to separate styrene sulfonic acid, which is a hydrolyzate of 4-vinylbenzene sulfonic acid, which is a reaction substrate, or a salt thereof and bisstyrene sulfonic acid salt, polymerization of the reaction substrate and the produced imide body, and alkali. There are problems such as using a highly explosive and corrosive base such as metal hydride, and it is not practical. In particular, the polymerization of the reaction substrate and the produced imide compound not only causes a decrease in yield and purity, but also increases the viscosity in the system as the reaction progresses, which makes it difficult to continue the reaction and perform filtration operations. This is a major manufacturing issue. In addition, as an industrially available starting material, sodium styrene sulfonic acid salt is a hemihydrate salt, and this drying process takes a very long time. Step (3) The total yield is as low as about 30%. It is also not practical in that it can only be manufactured.
ビス-(４-スチレンスルホニル)イミド又はその塩は、カチオン交換性官能基であるスルホンイミド又はその塩を有する水溶性モノマーであり、加えてイオン伝導性を有する架橋性モノマーであるため、上記課題を解決する上で産業上極めて有用なモノマーである。また、ビス-(４-ハロエチルベンゼンスルホニル)イミドはスチレンスルホンイミド骨格形成に極めて重要な前駆体であり、製造上の上記課題を解決するうえで、工業的に有用な化合物である。 The bis- (4-styrenesulfonyl) imide or a salt thereof is a water-soluble monomer having a sulfonylimide or a salt thereof which is a cation exchange functional group, and is a crosslinkable monomer having ionic conductivity. It is an extremely useful monomer in the industry to solve the problem. Further, bis- (4-haloethylbenzenesulfonyl) imide is an extremely important precursor for styrene sulfone imide skeleton formation, and is an industrially useful compound for solving the above-mentioned problems in production.
上記スキーム２は、本発明の一部を示した製造方法の簡略図である。本発明によれば、上記スキーム２の（i）〜（iv）工程までラジカル重合性不飽和基を持たない反応化合物により構成されるため、反応化合物の重合による収率、純度低下を回避し、スキーム２の（i）〜（iv）工程における総収率も５０％程度と高く、前述のスキーム１記載の従来法と比較し高収率でビス-(４-スチレンスルホニル)イミド又はその塩、ならびにビス-(４-ハロエチルベンゼンスルホニル)イミド又はその塩を製造できる。 The above scheme 2 is a simplified diagram of a manufacturing method showing a part of the present invention. According to the present invention, since steps (i) to (iv) of the above scheme 2 are composed of a reaction compound having no radically polymerizable unsaturated group, the yield and purity of the reaction compound can be prevented from being lowered due to polymerization. The total yield in steps (i) to (iv) of Scheme 2 is also as high as about 50%, and the yield is higher than that of the conventional method described in Scheme 1 described above, that is, bis- (4-styrenesulfonyl) imide or a salt thereof. In addition, bis- (4-haloethylbenzenesulfonyl) imide or a salt thereof can be produced.
本発明はビス-(４-スチレンスルホニル)イミド又はその塩の実用的な製造方法を提供するものであるが、その前駆体として有用なビス-(４-ハロエチルベンゼンスルホニル)イミド又はその塩とその製造方法に関する報告例はなく、新規な化合物および製造方法と考えられる。 The present invention provides a practical method for producing bis- (4-styrenesulfonyl) imide or a salt thereof, which is useful as a precursor thereof, bis- (4-haloethylbenzenesulfonyl) imide or a salt thereof and a salt thereof. There are no reports on the production method, and it is considered to be a novel compound and production method.
本発明は、上記の経緯及び課題に鑑みてなされたものであり、その目的は、優れたラジカル重合性、カチオン交換能を有する水溶性モノマーであり、架橋剤として産業上極めて有用なビス-(４-スチレンスルホニル)イミド及びその塩（以下「ＢＶＢＳＩ」ということがある）の簡便かつ実用的な製造方法、並びにその前駆体であるビス-(４-ハロエチルベンゼンスルホニル)イミド及びその塩とその製造方法を提供することにある。 The present invention has been made in view of the above circumstances and problems, and an object of the present invention is a water-soluble monomer having excellent radical polymerizable property and cation exchange ability, which is extremely useful industrially as a cross-linking agent. A simple and practical method for producing 4-styrenesulfonyl) imide and its salt (hereinafter sometimes referred to as "BVBSI"), and its precursor, bis- (4-haloethylbenzenesulfonyl) imide and its salt and its production. To provide a method.
本発明者らは、上記課題を解決すべく鋭意研究を行った結果、４−ハロエチルベンゼンスルホニルクロリドと、４−ハロエチルベンゼンスルホニルクロリドから誘導される４−ハロエチルベンゼンスルホンアミドを塩基と反応させることで得られるビス-(４-ハロエチルベンゼンスルホニル)イミド塩が、ビス-(４-スチレンスルホニル)イミド又はその塩の製造における前駆体として有用であること、即ち、ビス-(４-ハロエチルベンゼンスルホニル)イミドと塩基を反応させてビニル化することによって、高収率かつ高純度で簡便に、ポリマー分の生成を抑制し、あるいはポリマー分が低減されたビス-(４-スチレンスルホニル)イミド又はその塩を製造できることを見出し、本発明を完成するに至った。 As a result of diligent research to solve the above problems, the present inventors have made a reaction between 4-haloethylbenzenesulfonyl chloride and 4-haloethylbenzenesulfonamide derived from 4-haloethylbenzenesulfonyl chloride with a base. The resulting bis- (4-haloethylbenzenesulfonyl) imide salt is useful as a precursor in the production of bis- (4-styrenesulfonyl) imide or a salt thereof, i.e. bis- (4-haloethylbenzenesulfonyl) imide. By reacting with a base to vinylize, a bis- (4-styrenesulfonyl) imide or a salt thereof having a high yield, high purity, and simple suppression of polymer content or a reduced polymer content can be obtained. They found that they could be manufactured and completed the present invention.
すなわち本発明は、下記式（１） That is, the present invention has the following equation (1).
〔式（１）中、ＸおよびＹは、各々独立して塩素、臭素またはヨウ素原子を表し、Ｍは水素、アルカリ金属イオン、アルカリ土類金属イオンまたはアンモニウムイオンを表す。〕
で表されるビス-(４-スチレンスルホニル)イミド又はその塩に係る。
[In formula (1), X and Y independently represent chlorine, bromine or iodine atoms, and M represents hydrogen, alkali metal ion, alkaline earth metal ion or ammonium ion, respectively. ]
It relates to bis- (4-styrenesulfonyl) imide represented by (4-styrenesulfonyl) imide or a salt thereof.
さらに上記式（１）中、ＭはＬｉ（リチウム）、Ｎａ（ナトリウム）、Ｋ（カリウム）のようなアルカリ金属のイオン、ＸおよびＹはいずれも臭素であることが好ましく、特にＭはＬｉ（リチウム）イオンであることが好ましい。 Further, in the above formula (1), M is preferably an ion of an alkali metal such as Li (lithium), Na (sodium) and K (potassium), and X and Y are all bromine, and M is particularly Li ( Lithium) ions are preferred.
また本発明は、４−ハロエチルベンゼンスルホニルクロリドと４−ハロエチルベンゼンスルホンアミドを塩基と反応させる、ビス-(４-ハロエチルベンゼンスルホニル)イミド又はその塩の製造方法の製造方法に係る。 The present invention also relates to a method for producing bis- (4-haloethylbenzenesulfonyl) imide or a salt thereof in which 4-haloethylbenzenesulfonyl chloride and 4-haloethylbenzenesulfonamide are reacted with a base.
さらに本発明は、下記式（１） Further, the present invention has the following equation (1).
〔式（１）中、ＸおよびＹは、各々独立して塩素、臭素またはヨウ素原子を表し、Ｍは水素、アルカリ金属イオン、アルカリ土類金属イオンまたはアンモニウムイオンを表す。〕
で表されるビス-(４-ハロエチルベンゼンスルホニル)イミド又はその塩を、重合禁止剤の存在下で、塩基と反応させる、下記式（２）
[In formula (1), X and Y independently represent chlorine, bromine or iodine atoms, and M represents hydrogen, alkali metal ion, alkaline earth metal ion or ammonium ion, respectively. ]
The bis- (4-haloethylbenzenesulfonyl) imide represented by (4-haloethylbenzenesulfonyl) imide or a salt thereof is reacted with a base in the presence of a polymerization inhibitor, according to the following formula (2).
〔式（２）中、Ｍは前記式（１）と同じ。〕
で表されるビス-(４-スチレンスルホニル)イミドまたはその塩の製造方法に係る。ここで、ビス-(４-ハロエチルベンゼンスルホニル)イミド又はその塩は、塩基と反応させることで、ビニル化するものである。
[In the formula (2), M is the same as the above formula (1). ]
The present invention relates to a method for producing a bis- (4-styrenesulfonyl) imide represented by (4-styrenesulfonyl) imide or a salt thereof. Here, bis- (4-haloethylbenzenesulfonyl) imide or a salt thereof is vinylized by reacting with a base.
さらに本発明は、４−ハロエチルベンゼンスルホンクロリドと４−ハロエチルベンゼンスルホンアミドを塩基と反応させてビス-(４-ハロエチルベンゼンスルホニル)イミドを生成させた後、重合禁止剤の存在下で、塩基と反応させる、下記式（２） Further, in the present invention, 4-haloethylbenzenesulfon chloride and 4-haloethylbenzenesulfonamide are reacted with a base to form bis- (4-haloethylbenzenesulfonyl) imide, and then with a base in the presence of a polymerization inhibitor. The following formula (2) to react
〔式（２）中、Ｍは前記式（１）と同じ。〕
で表されるビス-(４-スチレンスルホニル)イミド又はその塩の製造方法に係る。
[In the formula (2), M is the same as the above formula (1). ]
The present invention relates to a method for producing a bis- (4-styrenesulfonyl) imide represented by (4-styrenesulfonyl) imide or a salt thereof.
さらに上記のビス-(４-ハロエチルベンゼンスルホニル)イミド又はその塩の製造方法および、ビス-(４-スチレンスルホニル)イミド又はその塩の製造方法においては、式（１）中、ＭはＬｉ（リチウム）、Ｎａ（ナトリウム）、Ｋ（カリウム）のようなアルカリ金属のイオン、ＸおよびＹはいずれも臭素であることが好ましく、特にＭはＬｉ（リチウム）イオンであることが好ましい。 Further, in the above-mentioned method for producing bis- (4-haloethylbenzenesulfonyl) imide or a salt thereof and the method for producing bis- (4-styrenesulfonyl) imide or a salt thereof, M is Li (lithium) in the formula (1). ), Na (sodium), K (potassium) and other alkali metal ions, X and Y are all preferably bromine, and M is particularly preferably Li (lithium) ion.
なお上記では、４−ハロエチルベンゼンスルホンクロリドと４−ハロエチルベンゼンスルホンアミドから、式（１）を製造し、その後に式（２）を製造するが、パラ体以外にも、オルト体、メタ体が生成することがあり、これらからパラ体以外も製造できる。さらに、反応原料として４−ハロエチルベンゼンスルホンクロリド以外の２−ハロエチルベンゼンスルホンクロリド、３−ハロエチルベンゼンスルホンクロリド、あるいは４−ハロエチルベンゼンスルホンアミド以外の２−ハロエチルベンゼンスルホンアミド、３−ハロエチルベンゼンスルホンアミドを、またこれらクロリドとアミドとの任意の組合せにより、式（１）、式（２）のパラ体以外の、オルト体、メタ体や、パラ体も含めたこれらの任意の組合せの構造を有するイミドを製造することも可能である。 In the above, the formula (1) is produced from 4-haloethylbenzene sulfonamide and 4-haloethylbenzene sulfonamide, and then the formula (2) is produced. It may be produced, and non-paraforms can be produced from these. Further, as a reaction raw material, 2-haloethylbenzenesulfonamide other than 4-haloethylbenzenesulfonamide, 3-haloethylbenzenesulfonamide, or 2-haloethylbenzenesulfonamide and 3-haloethylbenzenesulfonamide other than 4-haloethylbenzenesulfonamide can be used. Also, by any combination of these chlorides and amides, an imide having a structure of any combination thereof including an ortho-form, a meta-form, and a para-form other than the para-forms of the formulas (1) and (2). It is also possible to manufacture.
ビス-(４-ハロエチルベンゼンスルホニル)イミド又はその塩は、ビス-(４-スチレンスルホニル)イミドまたはその塩の前駆体として、さらに、ビス（４−ヒドロキシエチルベンゼンスルホニル）イミドまたはその塩、ビス（４−アミノエチルベンゼンスルホニル）イミドまたはその塩など、ビススルホンイミド構造を持つ機能性ポリマー原料の前駆体として極めて重要な化合物である。 Bis- (4-haloethylbenzenesulfonyl) imide or a salt thereof can be used as a precursor of bis- (4-styrenesulfonyl) imide or a salt thereof, and further, bis (4-hydroxyethylbenzenesulfonyl) imide or a salt thereof, bis (4). -Aminoethylbenzenesulfonyl) It is an extremely important compound as a precursor of a functional polymer raw material having a bissulfonimide structure, such as imide or a salt thereof.
本発明によれば、ビス-(４-ハロエチルベンゼンスルホニル)イミドを高収率かつ高純度で効率よく得ることができるため、本化合物及び製造法は工業的に極めて有用である。 According to the present invention, since bis- (4-haloethylbenzenesulfonyl) imide can be efficiently obtained in high yield and high purity, the present compound and the production method are extremely useful industrially.
また、ビス-(４-スチレンスルホニル)イミドまたはその塩は、優れたラジカル重合性、カチオン交換能、高い水溶性を有する架橋性モノマーであり、イオン交換膜などの機能性膜、アルカリ金属イオン電池のイオン伝導性材料などの有用な原料である。 Further, bis- (4-styrenesulfonyl) imide or a salt thereof is a crosslinkable monomer having excellent radical polymerizable property, cation exchange ability and high water solubility, and is a functional film such as an ion exchange membrane or an alkali metal ion battery. It is a useful raw material such as an ion conductive material of.
本発明のビス-(４-ハロエチルベンゼンスルホニル)イミドまたはその塩は前駆体とする製造方法により、高収率かつ高純度でポリマー分を低減したビス-(４-スチレンスルホニル)イミドを製造でき、産業上極めて有用である。 The bis- (4-haloethylbenzenesulfonyl) imide of the present invention or a salt thereof can be produced as a precursor by a production method using a bis- (4-styrenesulfonyl) imide having a high yield and high purity and a reduced polymer content. Extremely useful industrially.
本発明は、ビス-(４-ハロエチルベンゼンスルホニル)イミド又はその塩及びその製造方法、並びにビス-(４-ハロエチルベンゼンスルホニル)イミド又はその塩を前駆体として用いたビス-(４-スチレンスルホニル)イミドまたはその塩の製造方法に係る。 In the present invention, bis- (4-haloethylbenzenesulfonyl) imide or a salt thereof and a method for producing the same, and bis- (4-styrenesulfonyl) imide using bis- (4-haloethylbenzenesulfonyl) imide or a salt thereof as a precursor. The present invention relates to a method for producing an imide or a salt thereof.
＜ビス-(４-ハロエチルベンゼンスルホニル)イミドまたはその塩の製造方法＞
ビス-(４-ハロエチルベンゼンスルホニル)イミドまたはその塩の原料となる４−ハロエチルベンゼンスルホニルクロリドは、公知の方法より入手できる。例えば、ジクロロメタンに溶解したハロエチルベンゼンにクロロ硫酸を０℃で滴下し、室温で３時間反応させる方法によって製造できる（例えば、Ｃａｎａｄｉａｎ Ｊｏｕｒｎａｌ ｏｆ Ｃｈｅｍｉｓｔｒｙ， １９５４， ｖｏｌ．３２， ｐ．１４３−１４５、国際特許出願公開２０１５／１３８８９５号を参照）。また、４−ハロエチルベンゼンスルホンアミドは、公知の方法より入手できる。例えば、テトラヒドロフランに溶解した４−ハロエチルベンゼンスルホニルクロリドにアンモニア水溶液を０℃で滴下し、１時間室温で反応させることで製造できる（例えば、Ｊｏｕｒｎａｌ ｏｆ Ｍｅｄｉｃｉｎａｌ Ｃｈｅｍｉｓｔｒｙ， １９８９ ， ｖｏｌ．３２， # 5 p. １１０８−１１１８や米国特許第８６８６１４７号明細書を参照）。
<Method for producing bis- (4-haloethylbenzenesulfonyl) imide or a salt thereof>
4-Haloethylbenzenesulfonyl chloride, which is a raw material for bis- (4-haloethylbenzenesulfonyl) imide or a salt thereof, can be obtained by a known method. For example, it can be produced by adding chlorosulfuric acid to haloethylbenzene dissolved in dichloromethane at 0 ° C. and reacting at room temperature for 3 hours (for example, Canadian Journal of Chemistry, 1954, vol.32, p.143-145, International Patent). See Publication 2015/138895). Further, 4-haloethylbenzenesulfonamide can be obtained by a known method. For example, it can be produced by adding an aqueous ammonia solution to 4-haloethylbenzenesulfonyl chloride dissolved in tetrahydrofuran at 0 ° C. and reacting at room temperature for 1 hour (for example, Journal of Medicinal Chemistry, 1989, vol.32, # 5 p. 11081-1118 and US Pat. No. 8,686,147).
本発明の製造方法に用いられる、４−ハロエチルベンゼンスルホニルクロリド、４−ハロエチルベンゼンスルホンアミド、ビス-(４-ハロエチルベンゼンスルホニル)イミドにおいて、ハロエチル基のハロゲンは塩素、臭素、ヨウ素の何れかを用いればよいが、ビニル化反応（アルカリを用いる脱ハロゲン化反応をいう）の反応性の面で臭素が好ましい。 In 4-haloethylbenzenesulfonyl chloride, 4-haloethylbenzenesulfonamide, and bis- (4-haloethylbenzenesulfonyl) imide used in the production method of the present invention, any of chlorine, bromine, and iodine is used as the halogen of the haloethyl group. However, bromine is preferable in terms of the reactivity of the vinylization reaction (referring to the dehalogenation reaction using an alkali).
また、４−ハロエチルベンゼンスルホニルクロリドは（２−ハロエチル）ベンゼンのクロロスルホン化により製造できる。ここで、（２−ハロエチル）ベンゼンの内でも（２−ブロモエチル）ベンゼンは、（２−クロロエチル）ベンゼンや（２−ヨードエチル）ベンゼンと比較して、製造が容易で、工業的な入手が容易であるため、原料の入手容易性の観点からもハロエチル基のハロゲンは臭素が好ましい。 Further, 4-haloethylbenzenesulfonyl chloride can be produced by chlorosulfonated (2-haloethyl) benzene. Here, among the (2-haloethyl) benzenes, (2-bromoethyl) benzene is easier to produce and easier to obtain industrially than (2-chloroethyl) benzene and (2-iodoethyl) benzene. Therefore, bromine is preferable as the halogen of the haloethyl group from the viewpoint of availability of raw materials.
４−ハロエチルベンゼンスルホニルクロリドと４−ハロエチルベンゼンスルホンアミドを塩基で処理し、イミド化することにより、ビス-(４-ハロエチルベンゼンスルホニル)イミドまたはその塩を製造できる。以下、ビス-(４-ハロエチルベンゼンスルホニル)イミドまたはその塩の製造方法について詳しく説明する。 By treating 4-haloethylbenzenesulfonyl chloride and 4-haloethylbenzenesulfonamide with a base and imidizing them, bis- (4-haloethylbenzenesulfonyl) imide or a salt thereof can be produced. Hereinafter, a method for producing bis- (4-haloethylbenzenesulfonyl) imide or a salt thereof will be described in detail.
本発明の製造方法において、まず、撹拌機等の撹拌手段、冷却管等の冷却手段を備えた（取り付けた）反応器に、窒素等の不活性ガスの雰囲気下、上記した４−ハロエチルベンゼンスルホンアミド、塩基、溶媒を仕込み、４−ハロエチルベンゼンスルホニルクロリド又はその溶液を滴下等して、イミド化反応を行い、ビス-(４-ハロエチルベンゼンスルホニル)イミドを製造できる。また、攪拌機等の撹拌手段、冷却管等の冷却手段を備えた（取り付けた）反応器に、窒素等の不活性ガスの雰囲気下、４−ハロエチルベンゼンスルホンアミド、４−ハロエチルベンゼンスルホニルクロリド、溶媒を仕込み、塩基又はその溶液を滴下等して、イミド化反応を行い、ビス-(４-ハロエチルベンゼンスルホニル)イミドを製造してもよい。 In the production method of the present invention, first, the above-mentioned 4-haloethylbenzene sulfonyl is placed in a reactor provided (attached) with a stirring means such as a stirrer and a cooling means such as a cooling tube under an atmosphere of an inert gas such as nitrogen. An imidization reaction can be carried out by adding an amide, a base and a solvent and dropping 4-haloethylbenzenesulfonyl chloride or a solution thereof, or the like to produce a bis- (4-haloethylbenzenesulfonyl) imide. Further, in a reactor equipped (attached) with a stirring means such as a stirrer and a cooling means such as a cooling tube, 4-haloethylbenzenesulfonamide, 4-haloethylbenzenesulfonyl chloride, and a solvent are used in an atmosphere of an inert gas such as nitrogen. , And a base or a solution thereof is added dropwise to carry out an imidization reaction to produce bis- (4-haloethylbenzenesulfonyl) imide.
また本発明の製造方法において、撹拌機等の撹拌手段、冷却管等の冷却手段を備えた（取り付けた）反応器に、窒素等の不活性ガスの雰囲気下、４−ハロエチルベンゼンスルホンアミド、４−ハロエチルベンゼンスルホニルクロリド、塩基、溶媒を仕込み、イミド化反応を行い、ビス-(４-ハロエチルベンゼンスルホニル)イミドを製造してもよい。 Further, in the production method of the present invention, 4-haloethylbenzenesulfonamide, 4 -Haloethylbenzenesulfonyl chloride, a base and a solvent may be charged and an imidization reaction may be carried out to produce bis- (4-haloethylbenzenesulfonyl) imide.
本発明の製造方法において、イミド化反応時に用いる塩基は特に限定されないが、例えば、ナトリウム、カリウム、リチウム、カルシウム、マグネシウムのようなアルカリ金属またはアルカリ土類金属類の水素化物、水酸化物や、炭酸塩、リン酸塩等のアルカリ金属又はアルカリ土類金属の塩や、トリエチルアミン、ヒドロキシエチルアミン、ピリジンのようなアミン類などが挙げられ、アルカリ金属の水酸化物、水素化物、リン酸塩などが好ましく用いられる。また、ビス-(４-スチレンスルホニル)イミド塩に特に高い水溶性が求められる場合は、水酸化リチウム等のリチウム塩基を用いるのが良い。 In the production method of the present invention, the base used in the imidization reaction is not particularly limited, but for example, hydrides and hydroxides of alkali metals or alkaline earth metals such as sodium, potassium, lithium, calcium and magnesium, and the like. Examples include salts of alkali metals or alkaline earth metals such as carbonates and phosphates, amines such as triethylamine, hydroxyethylamine and pyridine, and hydroxides, hydrides and phosphates of alkali metals. It is preferably used. When the bis- (4-styrenesulfonyl) imide salt is required to have particularly high water solubility, it is preferable to use a lithium base such as lithium hydroxide.
塩基の添加量は、特に限定されないが、ビス-(４-ハロエチルベンゼンスルホニル)イミドに対して１．０当量〜１０．０当量であり、ビス-(４-スチレンスルホニル)イミド又はその塩の純度の観点から、好ましくは２．０当量〜４．０当量である。また、反応促進のため、４−（ジメチルアミノ）ピリジン、トリエチルアミン、トリエチルアミン等を触媒として上記の塩基とともに用いることもできる。触媒の添加量は、特に限定しないが、ビス-(４-スチレンスルホニル)イミド又はその塩の純度の観点から、０．０１当量〜１当量が好ましい。 The amount of the base added is not particularly limited, but is 1.0 equivalent to 10.0 equivalent with respect to bis- (4-haloethylbenzenesulfonyl) imide, and the purity of bis- (4-styrenesulfonyl) imide or a salt thereof. From the viewpoint of the above, it is preferably 2.0 equivalents to 4.0 equivalents. Further, in order to promote the reaction, 4- (dimethylamino) pyridine, triethylamine, triethylamine and the like can be used as a catalyst together with the above bases. The amount of the catalyst added is not particularly limited, but is preferably 0.01 equivalent to 1 equivalent from the viewpoint of the purity of bis- (4-styrenesulfonyl) imide or a salt thereof.
本発明の製造方法に用いられる、イミド化反応時の溶媒は特に限定されないが、メタノール、エタノール等のアルコール類、ペンタン、ヘキサン、ヘプタン等の直鎖状脂肪族炭化水素類、２−メチルブタン、２−メチルペンタン、３−メチルペンタン、２−メチルヘキサン、３−メチルヘキサン等の分岐状脂肪族炭化水素類、ベンゼン、トルエン、ｏ−キシレン、ｍ−キシレン、ｐ−キシレン等の芳香族炭化水素類、塩化メチレン、クロロホルム、四塩化炭素、１，２−ジクロロエタン等の脂肪族ハロゲン化合物類、クロロベンゼン、ｏ−ジクロロベンゼン、ｍ−ジクロロベンゼン、ｐ−ジクロロベンゼン、ブロモベンゼン、ｏ−ジブロモベンゼン、ｍ−ジブロモベンゼン、ｐ−ジブロモベンゼン等の芳香族ハロゲン化合物類、テトラヒドロフラン、アセトン、アセトニトリル、酢酸エチル、Ｎ，Ｎ−ジメチルホルムアミド、ジメチルスルホキシド等の非プロトン性の極性の溶剤を用いることができる。その中でも非プロトン性の極性の溶剤を用いるのが好ましく、テトラヒドロフランまたは酢酸エチル、アセトニトリルを用いるのがさらに好ましい。 The solvent used in the production method of the present invention during the imidization reaction is not particularly limited, but alcohols such as methanol and ethanol, linear aliphatic hydrocarbons such as pentane, hexane and heptane, 2-methylbutane, 2 -Branched aliphatic hydrocarbons such as methylpentane, 3-methylpentane, 2-methylhexane and 3-methylhexane, and aromatic hydrocarbons such as benzene, toluene, o-xylene, m-xylene and p-xylene. , Methylene chloride, chloroform, carbon tetrachloride, aliphatic halogen compounds such as 1,2-dichloroethane, chlorobenzene, o-dichlorobenzene, m-dichlorobenzene, p-dichlorobenzene, bromobenzene, o-dibromobenzene, m- Arophilic halogen compounds such as dibromobenzene and p-dibromobenzene, and aprotonic polar solvents such as tetrahydrofuran, acetone, acetonitrile, ethyl acetate, N, N-dimethylformamide and dimethyl sulfoxide can be used. Among them, it is preferable to use an aprotic polar solvent, and it is more preferable to use tetrahydrofuran, ethyl acetate, or acetonitrile.
本発明の製造方法において、ビス-(４-ハロエチルベンゼンスルホニル)イミドの濃度は、仕込全量に対して５重量％〜７９重量％であり、反応促進と副生成物抑制の観点から１０重量％〜７０重量％が好ましい。反応温度は−２０℃〜１２０℃であり、好ましくは２０℃〜１００℃である。 In the production method of the present invention, the concentration of bis- (4-haloethylbenzenesulfonyl) imide is 5% by weight to 79% by weight with respect to the total amount charged, and 10% by weight to 10% by weight from the viewpoint of promoting the reaction and suppressing by-products. 70% by weight is preferable. The reaction temperature is −20 ° C. to 120 ° C., preferably 20 ° C. to 100 ° C.
上記の方法で得たビス-(４-ハロエチルベンゼンスルホニル)イミドまたはその塩は、反応終了後の反応液から、ろ過、抽出、晶析など常法により分離、精製することができる。 The bis- (4-haloethylbenzenesulfonyl) imide or a salt thereof obtained by the above method can be separated and purified from the reaction solution after completion of the reaction by a conventional method such as filtration, extraction and crystallization.
反応基質である４−ハロエチルベンゼンスルホニルクロリドは水洗により加水分解し、４−ハロエチルベンゼンスルホン酸またはその塩となって水層に溶解し、４−ハロエチルベンゼンスルホンアミドは有機層に溶解する。この際、４−ハロエチルベンゼンスルホンアミドは、弱酸を用いた洗浄を行うことで塩を形成し、水層への溶解が可能となる。 The reaction substrate 4-haloethylbenzenesulfonyl chloride is hydrolyzed by washing with water to become 4-haloethylbenzenesulfonic acid or a salt thereof and is dissolved in the aqueous layer, and 4-haloethylbenzenesulfonamide is dissolved in the organic layer. At this time, 4-haloethylbenzenesulfonamide forms a salt by washing with a weak acid and can be dissolved in the aqueous layer.
精製段階において、反応基質の除去が困難となる場合は、水洗、酸洗浄により、反応基質由来の不純物を水層へと除外し、精製を行っても良い。酸洗浄に用いる弱酸は特に限定しないが、１０％塩酸、リン酸、酢酸、シュウ酸等が挙げられる。各種水、有機溶剤、水及び有機溶剤混合溶媒等を用いて、再結晶精製やリパルプ精製を行う際は、有機溶剤は特に限定されるものではないが、メタノール、エタノール、イソプロパノール、ｎ−プロパノール、ブタノール、アセトン、テトラヒドロフラン、アセトニトリル等の水溶性溶剤や、トルエン、キシレン、クロロホルム、ジクロロメタン等の有機溶剤の単一あるいは混合溶媒があげられる。 If it is difficult to remove the reaction substrate in the purification step, impurities derived from the reaction substrate may be removed from the aqueous layer by washing with water or acid, and purification may be performed. The weak acid used for acid cleaning is not particularly limited, and examples thereof include 10% hydrochloric acid, phosphoric acid, acetic acid, and oxalic acid. When performing recrystallization purification or repulp purification using various waters, organic solvents, water, organic solvent mixed solvents, etc., the organic solvent is not particularly limited, but methanol, ethanol, isopropanol, n-propanol, etc. Examples thereof include water-soluble solvents such as butanol, acetone, tetrahydrofuran and acetonitrile, and single or mixed solvents of organic solvents such as toluene, xylene, chloroform and dichloromethane.
＜ビス-(４-スチレンスルホニル)イミドまたはその塩の製造方法＞
次に、ビス-(４-スチレンスルホニル)イミドまたはその塩の製造方法について詳しく説明する。
<Method for producing bis- (4-styrenesulfonyl) imide or a salt thereof>
Next, a method for producing bis- (4-styrenesulfonyl) imide or a salt thereof will be described in detail.
本発明の製造方法において、まず、撹拌機等の撹拌手段、冷却管等の冷却手段を備えた（取付けた）反応器にビス-(４-ハロエチルベンゼンスルホニル)イミドまたはその塩と塩基、ラジカル重合禁止剤を仕込み、十分脱酸素し、所定温度まで昇温することでビニル化反応（アルカリを用いる脱ハロゲン化反応をいう）を行い、ビス-(４-スチレンスルホニル)イミドまたはその塩を製造することができる。 In the production method of the present invention, first, bis- (4-haloethylbenzenesulfonyl) imide or a salt and a base thereof are subjected to radical polymerization in a reactor provided (attached) with a stirring means such as a stirrer and a cooling means such as a cooling tube. A bis- (4-styrenesulfonyl) imide or a salt thereof is produced by carrying out a vinylization reaction (referring to a dehalogenation reaction using an alkali) by adding a banning agent, sufficiently deoxidizing, and raising the temperature to a predetermined temperature. be able to.
また本発明の製造方法において、反応器にビス-(４-ハロエチルベンゼンスルホニル)イミドまたはその塩とラジカル重合禁止剤を先に仕込み、十分脱酸素し、所定温度まで昇温した後に、塩基または有機溶媒に溶解した塩基を連続的に滴下してビニル化を行っても良い。 Further, in the production method of the present invention, the reactor is first charged with bis- (4-haloethylbenzenesulfonyl) imide or a salt thereof and a radical polymerization inhibitor, sufficiently deoxidized, heated to a predetermined temperature, and then base or organic. The base dissolved in the solvent may be continuously added dropwise to vinylize the mixture.
本発明の製造方法に用いられることがある重合禁止剤としては特に限定されるものではなく、水溶性タイプを好適に用いることができる。例えば、亜硝酸アルカリ金属塩、ハイドロキノン、メトキシハイドロキノン、アントラキノンスルホン酸塩、アンモニウムニトロソフェニルヒドロキシルアミン、Ｎ−ニトロソフェニルヒドロキシアミンアルミニウム塩、２−ｔ−ブチルハイドロキノン、４−ｔ−ブチルカテコールなどがあげられる。重合禁止剤の添加量は、ビス-(４-ハロエチルベンゼンスルホニル)イミド又はその塩に対して１０ｐｐｍ〜１重量％である。 The polymerization inhibitor that may be used in the production method of the present invention is not particularly limited, and a water-soluble type can be preferably used. Examples thereof include alkali metal nitrite, hydroquinone, methoxyhydroquinone, anthraquinone sulfonate, ammonium nitrosophenylhydroxylamine, N-nitrosophenylhydroxyamine aluminum salt, 2-t-butylhydroquinone, 4-t-butylcatechol and the like. .. The amount of the polymerization inhibitor added is 10 ppm to 1% by weight based on bis- (4-haloethylbenzenesulfonyl) imide or a salt thereof.
本発明の製造方法に用いられる、塩基としては、ナトリウム、カリウム、リチウム、カルシウム、マグネシウムのようなアルカリ金属またはアルカリ土類金属類の水素化物、水酸化物や、炭酸塩、リン酸塩等のアルカリ金属塩又はアルカリ土類金属の塩や、トリエチルアミン、ヒドロキシエチルアミン、ピリジンのようなアミン類が挙げられる。これらの内でもアルカリ金属の水酸化物が特に好ましい。また、アルカリ金属塩またはアルカリ土類金属を用いる場合、ビス-(４-スチレンスルホニル)イミド塩のアルカリ金属またはアルカリ土類金属と同じ金属種の塩基を用いるのが良い。ビス-(４-スチレンスルホニル)イミド塩に特に高い水溶性が求められる場合は、水酸化リチウム等のリチウム塩基を用いるのが良い。 Bases used in the production method of the present invention include hydrides, hydroxides, carbonates, phosphates and the like of alkali metals or alkaline earth metals such as sodium, potassium, lithium, calcium and magnesium. Examples include salts of alkali metal or alkaline earth metals and amines such as triethylamine, hydroxyethylamine and pyridine. Of these, alkali metal hydroxides are particularly preferred. When an alkali metal salt or an alkaline earth metal is used, it is preferable to use a base of the same metal type as the alkali metal or alkaline earth metal of the bis- (4-styrenesulfonyl) imide salt. When a particularly high water solubility is required for the bis- (4-styrenesulfonyl) imide salt, it is preferable to use a lithium base such as lithium hydroxide.
塩基の添加量は、ビス-(４-ハロエチルベンゼンスルホニル)イミドまたはその塩に対して１．０当量〜１０．０当量であり、ビス-(４-スチレンスルホニル)イミド又はその塩の純度の観点から、好ましくは２．０当量〜４．０当量である。反応温度は２０℃〜１２０℃であり、重合抑制の観点から、好ましくは５０℃〜１００℃である。反応時間は１時間〜１０時間であり、重合抑制の観点から、好ましくは１時間〜５時間である。 The amount of the base added is 1.0 to 10.0 equivalents with respect to the bis- (4-haloethylbenzenesulfonyl) imide or a salt thereof, and from the viewpoint of the purity of the bis- (4-styrenesulfonyl) imide or a salt thereof. Therefore, it is preferably 2.0 equivalents to 4.0 equivalents. The reaction temperature is 20 ° C. to 120 ° C., preferably 50 ° C. to 100 ° C. from the viewpoint of suppressing polymerization. The reaction time is 1 hour to 10 hours, preferably 1 hour to 5 hours from the viewpoint of suppressing polymerization.
さらに本発明の製造方法において、先述の＜ビス-(４-ハロエチルベンゼンスルホニル)イミドまたはその塩の製造方法＞に示したように、撹拌機等の撹拌手段、冷却管等の冷却手段を備えた（取り付けた）反応器に、窒素等の不活性ガスの雰囲気下、４−ハロエチルベンゼンスルホンアミド、４−ハロエチルベンゼンスルホニルクロリド、塩基、溶媒を仕込み、イミド化反応を行い、ビス-(４-ハロエチルベンゼンスルホニル)イミドを生成させたのち、引き続いて、ラジカル重合禁止剤を仕込み、十分脱酸素し、所定温度まで昇温した後に、塩基または有機溶媒に溶解した塩基を連続的に滴下してビニル化を行っても良い。 Further, in the production method of the present invention, as shown in the above-mentioned <Method for producing bis- (4-haloethylbenzenesulfonyl) imide or a salt thereof>, a stirring means such as a stirrer and a cooling means such as a cooling pipe are provided. 4-Haloethylbenzenesulfonamide, 4-haloethylbenzenesulfonyl chloride, base, and solvent were charged into the (attached) reactor in an atmosphere of an inert gas such as nitrogen, and an imidization reaction was carried out to carry out an imidization reaction. After producing ethylbenzenesulfonyl) imide, a radical polymerization inhibitor is subsequently charged, sufficiently deoxidized, the temperature is raised to a predetermined temperature, and then a base or a base dissolved in an organic solvent is continuously added dropwise to vinylize. May be done.
上記反応は、ビス-(４-ハロエチルベンゼンスルホニル)イミドまたはその塩の反応終了後の反応液を単離、精製することなく、一つの工程でイミド化反応とビニル化反応を行い、ビス-(４-スチレンスルホニル)イミドを製造するものである。その際、反応温度、反応時間、添加する重合禁止剤の添加量、ビス-(４-ハロエチルベンゼンスルホニル)イミドの濃度、ビス-(４-ハロエチルベンゼンスルホニル)イミドに対する塩基の当量などの製造条件は、上記に記載のビス-(４-スチレンスルホニル)イミドまたはその塩の製造方法に従い、必要に応じて塩基、重合禁止剤の追加添加、有機溶媒の留去による濃度の調整、反応温度の調整を行っても良い。ただし、塩基の添加量としてはイミド化反応とビニル化反応において各々使用するため多目とするのが良く、例えば４．０当量〜８．０当量とするとよい。 In the above reaction, the imidization reaction and the vinylization reaction are carried out in one step without isolating and purifying the reaction solution after the reaction of bis- (4-haloethylbenzenesulfonyl) imide or a salt thereof is completed, and bis- (4-haloethylbenzenesulfonyl) 4-Styrene sulfonyl) imide is produced. At that time, the production conditions such as the reaction temperature, the reaction time, the amount of the polymerization inhibitor to be added, the concentration of the bis- (4-haloethylbenzenesulfonyl) imide, and the equivalent of the base to the bis- (4-haloethylbenzenesulfonyl) imide were determined. , Add bases and polymerization inhibitors as necessary, adjust the concentration by distilling off the organic solvent, and adjust the reaction temperature according to the method for producing bis- (4-styrenesulfonyl) imide or a salt thereof described above. You may go. However, the amount of the base added is preferably a large amount because it is used in the imidization reaction and the vinylization reaction, respectively, and is preferably 4.0 equivalents to 8.0 equivalents, for example.
また塩基の添加時期としては反応初期に添加してもよいが、反応初期及び重合禁止剤を添加するときの両方に分けて添加してもよい。 The base may be added at the initial stage of the reaction, but may be added separately at the initial stage of the reaction and when the polymerization inhibitor is added.
以上の反応工程において、脱酸素の条件としては特に制限されるものではなく、公知の減圧法や不活性ガスとの置換などを適宜用いればよい。この目的は原料劣化、重合等を抑制するためである。反応容器内（空間）の酸素濃度は、例えば、ガルバニ電池式センサ（JKO-O2LD3, 株式会社JIKCO製）を用い、酸素濃度が１％以下になるように、窒素やアルゴン等の不活性ガスにて置換するとよい。 In the above reaction step, the deoxidizing conditions are not particularly limited, and a known decompression method, substitution with an inert gas, or the like may be appropriately used. The purpose of this is to suppress deterioration of raw materials, polymerization and the like. For the oxygen concentration in the reaction vessel (space), for example, use a galvanic cell sensor (JKO-O2LD3, manufactured by JIKCO Co., Ltd.) and use an inert gas such as nitrogen or argon so that the oxygen concentration is 1% or less. Should be replaced.
上記の方法で得たビス-(４-スチレンスルホニル)イミドまたはその塩は、反応終了後の反応液から、ろ過、抽出、晶析など常法により分離、精製することができる。結晶が含水塩として得られる場合、得られる結晶の含水率を低減するために、水溶性溶剤による洗浄や真空乾燥等によりさらに水分を削減しても良い。水溶性溶剤は特に限定されるものではないが、メタノール、エタノール、イソプロパノール、ｎ−プロパノール、ブタノール、アセトン、テトラヒドロフラン、アセトニトリル等などが挙げられる。 The bis- (4-styrenesulfonyl) imide or a salt thereof obtained by the above method can be separated and purified from the reaction solution after completion of the reaction by a conventional method such as filtration, extraction and crystallization. When the crystals are obtained as a hydrous salt, the water content may be further reduced by washing with a water-soluble solvent, vacuum drying, or the like in order to reduce the water content of the obtained crystals. The water-soluble solvent is not particularly limited, and examples thereof include methanol, ethanol, isopropanol, n-propanol, butanol, acetone, tetrahydrofuran, acetonitrile and the like.
さらに、ビス-(４-スチレンスルホニル)イミド塩に含まれる無機塩等の無機及び有機不純物を取り除くため、水、有機溶剤、水及び有機溶剤混合溶媒等を用いて再結晶精製やリパルプ精製しても良い。ここで、有機溶剤は特に限定されるものではないが、メタノール、エタノール、イソプロパノール、ｎ−プロパノール、ブタノール、アセトン、テトラヒドロフラン、アセトニトリル等の水溶性溶剤や、トルエン、キシレン、クロロホルム、ジクロロメタン等があげられる。精製する場合、ビス-(４-スチレンスルホニル)イミド塩の重合を抑制するため、重合禁止剤を１０ｐｐｍ〜１重量％添加すると良い。 Further, in order to remove inorganic and organic impurities such as inorganic salts contained in the bis- (4-styrenesulfonyl) imide salt, recrystallization purification or repulp purification is performed using water, an organic solvent, a mixed solvent of water and an organic solvent, or the like. Is also good. Here, the organic solvent is not particularly limited, and examples thereof include water-soluble solvents such as methanol, ethanol, isopropanol, n-propanol, butanol, acetone, tetrahydrofuran and acetonitrile, and toluene, xylene, chloroform, dichloromethane and the like. .. In the case of purification, in order to suppress the polymerization of the bis- (4-styrenesulfonyl) imide salt, it is preferable to add 10 ppm to 1% by weight of a polymerization inhibitor.
ビス-(４-スチレンスルホニル)イミドのリチウム塩は、上記の方法により支障なく製造、分離、精製できるが、反応終了後の反応溶液を純水による塩溶解、抽出、分液等の精製工程において、リチウム無機塩を用いた、ビス-(４-スチレンスルホニル)イミドのリチウム塩の塩析による精製も可能である。すなわち、ビス-(４-スチレンスルホニル)イミドのリチウム塩を含んだ反応溶液（有機溶剤溶液または水溶液）に、リチウム無機塩を添加することで、ビス-(４-スチレンスルホニル)イミドのリチウム塩の固体または液体層が溶液から遊離され、続いて、ろ過、濃縮等の分離操作を行うことで、ビス-(４-スチレンスルホニル)イミドのリチウム塩を得ることもできる。 The lithium salt of bis- (4-styrenesulfonyl) imide can be produced, separated and purified without any trouble by the above method, but the reaction solution after completion of the reaction is subjected to a purification step such as salt dissolution with pure water, extraction and liquid separation. , Purification by salting out of the lithium salt of bis- (4-styrenesulfonyl) imide using a lithium inorganic salt is also possible. That is, by adding a lithium inorganic salt to a reaction solution (organic solvent solution or aqueous solution) containing a lithium salt of bis- (4-styrenesulfonyl) imide, the lithium salt of bis- (4-styrenesulfonyl) imide can be obtained. A lithium salt of bis- (4-styrenesulfonyl) imide can also be obtained by releasing the solid or liquid layer from the solution and then performing separation operations such as filtration and concentration.
リチウム無機塩は特に限定されるものではないが、塩化リチウム、水酸化リチウム、硝酸リチウム、硫酸リチウム、炭酸リチウム等が挙げられる。リチウム無機塩の添加により、溶解熱が発生する場合、重合抑制の観点から、リチウム無機塩添加時の温度を２０℃〜５０℃に調整し、重合禁止剤を１０ｐｐｍ〜１重量％添加すると良い。 The lithium inorganic salt is not particularly limited, and examples thereof include lithium chloride, lithium hydroxide, lithium nitrate, lithium sulfate, and lithium carbonate. When heat of solution is generated by the addition of the lithium inorganic salt, the temperature at the time of adding the lithium inorganic salt may be adjusted to 20 ° C. to 50 ° C., and a polymerization inhibitor may be added in an amount of 10 ppm to 1% by weight from the viewpoint of suppressing polymerization.
以下の実施例により、本発明をさらに具体的に説明するが、本発明はこれらの実施例により何らの制限を受けるものではない。 The present invention will be described in more detail with reference to the following examples, but the present invention is not limited by these examples.
＜核磁気共鳴スペクトルによる目的物の同定と純度の測定＞
（１）試料の調製
内部標準物質として約０．０５重量％のテトラメチルシランを含むジメチルスルホキシド−ｄ６（９９．５重量％）約０．７ｍＬに試料を溶解し、ＮＭＲ測定用サンプルを調製した。
<Identification of target object and measurement of purity by nuclear magnetic resonance spectrum>
(1) Preparation of sample A sample for NMR measurement was prepared by dissolving the sample in about 0.7 mL of dimethyl sulfoxide-d6 (99.5% by weight) containing about 0.05% by weight of tetramethylsilane as an internal standard substance. ..
（２）測定機器
機種＝Ｂｒｕｋｅｒ製ＡＶ−４００Ｍ
積算回数＝１６
(2) Measuring equipment Model = Bruker AV-400M
Accumulation number = 16
（３）純度の算出
次式によって生成物の純度を算出した。
純度（ｗｔ％）＝（Ｂ/Ｍｂ）×（ａ／ａＨ）／（ｂ／ｂＨ）×Ｍａ／Ｓ×１００
ａ：任意の目的物ピークの積分値
ｂ：任意の内部標準物質の積分値
ａＨ：ａで選択した任意の生成物ピークの水素数
ｂＨ：ｂで選択した任意の生成物ピークの水素数
Ｍａ：目的物の分子量
Ｍｂ：内部標準物質の分子量
Ｂ：内部標準の採取量（g）
Ｓ：試料の採取量（g）
(3) Calculation of purity The purity of the product was calculated by the following formula.
Purity (wt%) = (B / M b) × (a / a H) / (b / b H) × M a / S × 100
a: Integral value of any target peak b: Integral value of any internal standard substance a H : Number of hydrogens in any product peak selected in a b H: Number of hydrogens in any product peak selected in b M a: molecular weight M b of the object: the molecular weight of the internal standard substance B: amount of collected internal standard (g)
S: Sample collection amount (g)
実施例１
〔４−ブロモエチルベンゼンスルホニルクロリドの合成例〕
還流冷却管、窒素導入管、滴下管を取り付けた１００ｍＬガラスフラスコに、２−ブロモエチルベンゼン（東京化成工業製）１０.０ｇ、ジクロロメタン３０ｇを加え、室温で撹拌、溶解した。この溶液を、０℃に冷却し、クロロ硫酸（東京化成工業製）１０．８ｇを滴下し、滴下終了後、室温で３時間撹拌した。反応終了後、０℃に冷却したイオン交換水２００ｇに投入し、ジクロロメタン３００ｇ×２回で抽出した。続いて、有機層を濃縮し、４−ブロモエチルベンゼンスルホニルクロリドの白色固体９．６ｇ（収率６２.６％）を得た。化合物の同定はプロトンＮＭＲ（１Ｈ−ＮＨＲ）で行った。
Example 1
[Example of Synthesis of 4-Bromoethylbenzenesulfonyl Chloride]
10.0 g of 2-bromoethylbenzene (manufactured by Tokyo Chemical Industry Co., Ltd.) and 30 g of dichloromethane were added to a 100 mL glass flask equipped with a reflux condenser tube, a nitrogen introduction tube, and a dropping tube, and the mixture was stirred and dissolved at room temperature. This solution was cooled to 0 ° C., 10.8 g of chlorosulfuric acid (manufactured by Tokyo Chemical Industry Co., Ltd.) was added dropwise, and after completion of the addition, the mixture was stirred at room temperature for 3 hours. After completion of the reaction, the mixture was poured into 200 g of ion-exchanged water cooled to 0 ° C., and extracted with 300 g of dichloromethane × 2 times. Subsequently, the organic layer was concentrated to obtain 9.6 g (yield 62.6%) of a white solid of 4-bromoethylbenzenesulfonyl chloride. Compounds were identified by proton NMR ( 1 H-NHR).
（分析結果）
１Ｈ−ＮＭＲ（４００ＭＨｚ、ＤＭＳＯ−ｄ６）：δ７．５４（２Ｈ, ｄ）、δ７．２４（２Ｈ, ｄ）、３．７５−３．７１（２Ｈ,ｔ）、３．１４−３．１１（２Ｈ,ｔ）
(result of analysis)
1 1 H-NMR (400 MHz, DMSO-d6): δ7.54 (2H, d), δ7.24 (2H, d), 3.75-3.71 (2H, t), 3.14-3.11 (2H, t)
実施例２
〔４−ブロモエチルベンゼンスルホンアミドの合成例〕
還流冷却管、窒素導入管、滴下管を取り付けた１００ｍＬガラスフラスコに、実施例１で製造した４−ブロモエチルベンゼンスルホニルクロリド５.０ｇ、テトラヒドロフラン１０ｇを加え、室温で撹拌、溶解した。この溶液を０℃に冷却し、２８％アンモニア水溶液（キシダ化学製）５ｇを３０分かけて滴下し、滴下終了後、室温で２時間撹拌した。反応終了後、イオン交換水３０ｇ、酢酸エチル３０ｇを加え、分液操作を行い、４−ブロモエチルベンゼンスルホンアミドを含む有機層を得た。この有機層を濃縮し、４−ブロモエチルベンゼンスルホンアミドの白色固体４．１ｇ（収率８７．０％）を得た。化合物の同定はプロトンＮＭＲで行った。
Example 2
[Example of Synthesis of 4-Bromoethylbenzene Sulfonamide]
5.0 g of 4-bromoethylbenzenesulfonyl chloride and 10 g of tetrahydrofuran prepared in Example 1 were added to a 100 mL glass flask equipped with a reflux condenser tube, a nitrogen introduction tube and a dropping tube, and the mixture was stirred and dissolved at room temperature. This solution was cooled to 0 ° C., 5 g of a 28% aqueous ammonia solution (manufactured by Kishida Chemical Co., Ltd.) was added dropwise over 30 minutes, and after completion of the addition, the mixture was stirred at room temperature for 2 hours. After completion of the reaction, 30 g of ion-exchanged water and 30 g of ethyl acetate were added, and a liquid separation operation was performed to obtain an organic layer containing 4-bromoethylbenzenesulfonamide. The organic layer was concentrated to give 4.1 g (yield 87.0%) of a white solid of 4-bromoethylbenzenesulfonamide. Compounds were identified by proton NMR.
（分析結果）
１Ｈ−ＮＭＲ（４００ＭＨｚ、ＤＭＳＯ−ｄ６）：δ７．７６（２Ｈ, ｄ）、δ７．４７（２Ｈ, ｄ）、δ７．３２（２Ｈ, ｓ）、３．８０−３．７６（２Ｈ,ｔ）、３．２３−３．１９（２Ｈ,ｔ）
(result of analysis)
1 1 H-NMR (400 MHz, DMSO-d6): δ7.76 (2H, d), δ7.47 (2H, d), δ7.32 (2H, s), 3.80-3.76 (2H, t) ), 3.23-3.19 (2H, t)
実施例３
〔カリウムビス-(４-ブロモエチルベンゼンスルホニル)イミドの合成例〕
還流冷却管、窒素導入管を取り付けた１００ｍＬガラスフラスコに、実施例２で製造した４−ブロモエチルベンゼンスルホンアミド１．０ｇ、リン酸三カリウム（和光純薬工業製）１．６ｇ、４−（ジメチルアミノ）ピリジン（和光純薬工業製）４６ｍｇ、酢酸エチル９．５ｇを加え、５０℃で撹拌した。
Example 3
[Synthesis example of potassium bis- (4-bromoethylbenzenesulfonyl) imide]
In a 100 mL glass flask equipped with a reflux condenser and a nitrogen introduction tube, 1.0 g of 4-bromoethylbenzenesulfonamide produced in Example 2, 1.6 g of tripotassium phosphate (manufactured by Wako Pure Chemical Industries, Ltd.), 4- (dimethyl) 46 mg of amino) pyridine (manufactured by Wako Pure Chemical Industries, Ltd.) and 9.5 g of ethyl acetate were added, and the mixture was stirred at 50 ° C.
次に、実施例１で製造した４−ブロモエチルベンゼンスルホニルクロリド１．１ｇをテトラヒドロフラン９．５ｇに溶解し、反応器のスラリー溶液に滴下し、滴下終了後、５０℃で１２時間撹拌した。反応終了後、イオン交換水４０ｇを加え、１時間室温で撹拌し、リパルプ洗浄を行った。リパルプ操作後、スラリー溶液をろ過した。ろ紙上の残渣をイオン交換水１０ｇ、酢酸エチル１０ｇでリンス洗浄し、１時間減圧乾燥を行い、カリウムビス-(４-ブロモエチルベンゼンスルホニル)イミドの白色固体１．９ｇ（収率９４．０％、純度９６．１％）を得た。化合物の同定はプロトンＮＭＲで行った。 Next, 1.1 g of 4-bromoethylbenzenesulfonyl chloride produced in Example 1 was dissolved in 9.5 g of tetrahydrofuran, added dropwise to the slurry solution of the reactor, and after completion of the addition, the mixture was stirred at 50 ° C. for 12 hours. After completion of the reaction, 40 g of ion-exchanged water was added, the mixture was stirred at room temperature for 1 hour, and the repulp was washed. After the repulp operation, the slurry solution was filtered. The residue on the filter paper was rinsed with 10 g of ion-exchanged water and 10 g of ethyl acetate, dried under reduced pressure for 1 hour, and 1.9 g of a white solid of potassium bis- (4-bromoethylbenzenesulfonyl) imide (yield 94.0%, Purity 96.1%) was obtained. Compounds were identified by proton NMR.
（分析結果）
１Ｈ−ＮＭＲ（４００ＭＨｚ、ＤＭＳＯ−ｄ６）：δ７．５８（２Ｈ, ｄ）、δ７．２６（２Ｈ, ｄ）、３．７６−３．７２（２Ｈ,ｔ）、３．１７−３．１３（２Ｈ,ｔ）
(result of analysis)
1 1 H-NMR (400 MHz, DMSO-d6): δ7.58 (2H, d), δ7.26 (2H, d), 3.76-3.72 (2H, t), 3.17-3.13 (2H, t)
実施例４
〔カリウムビス-(４-スチレンスルホニル)イミドの合成例〕
還流冷却管、窒素導入管を取り付けた１００ｍｌガラスフラスコに上記で得たカリウムビス-(４-ブロモエチルベンゼンスルホニル)イミド０．５ｇ、水酸化カリウム０．１ｇ、ハイドロキノン（和光純薬製）１１．６ｍｇ、メタノール１０ｇを仕込んで６０℃で３時間加熱撹拌した。
反応終了後、イオン交換水２０ｇ、酢酸エチル２０ｇを加え、１時間室温で撹拌し、リパルプ洗浄を行った。リパルプ操作後、スラリー溶液をろ過した。ろ紙上の残渣をイオン交換水１０ｇ、酢酸エチル１０ｇでリンス洗浄し、１時間減圧乾燥を行いカリウムビス-(４-スチレンスルホニル)イミド０．３３ｇ（収率９５．９％、純度９７．０％）を得た。化合物の同定は、プロトンＮＭＲで行った。
Example 4
[Example of Synthesis of Potassium Bis- (4-Styrene Sulfonyl) Imide]
0.5 g of potassium bis- (4-bromoethylbenzenesulfonyl) imide obtained above, 0.1 g of potassium hydroxide, 11.6 mg of hydroquinone (manufactured by Wako Pure Chemical Industries, Ltd.) in a 100 ml glass flask equipped with a reflux condenser and a nitrogen introduction tube. , 10 g of methanol was charged, and the mixture was heated and stirred at 60 ° C. for 3 hours.
After completion of the reaction, 20 g of ion-exchanged water and 20 g of ethyl acetate were added, and the mixture was stirred at room temperature for 1 hour to wash the repulp. After the repulp operation, the slurry solution was filtered. The residue on the filter paper was rinsed with 10 g of ion-exchanged water and 10 g of ethyl acetate, dried under reduced pressure for 1 hour, and 0.33 g of potassium bis- (4-styrenesulfonyl) imide (yield 95.9%, purity 97.0%). ) Was obtained. The compounds were identified by proton NMR.
（分析結果）
１Ｈ−ＮＭＲ（４００ＭＨｚ、ＤＭＳＯ−ｄ６）：δ７．６１（４Ｈ, ｄ）、δ７．４５（４Ｈ, ｄ）、δ６．７９−６．７２（２Ｈ, ｄｄ）、５．９０（２Ｈ,ｄ）、５．３４（２Ｈ,ｄ）
(result of analysis)
1 1 H-NMR (400 MHz, DMSO-d6): δ7.61 (4H, d), δ7.45 (4H, d), δ6.79-6.72 (2H, dd), 5.90 (2H, d) ), 5.34 (2H, d)
実施例５
〔リチウムビス-(４-ブロモエチルベンゼンスルホニル)イミドの合成例〕
還流冷却管、窒素導入管を取り付けた１００ｍＬガラスフラスコに、実施例２で製造した４−ブロモエチルベンゼンスルホンアミド１．０ｇ、水酸化リチウム（アルドリッチ製）０．１８ｇ、４−（ジメチルアミノ）ピリジン（和光純薬工業製）４６ｍｇ、テトラヒドロフラン４．５ｇを加え、窒素雰囲気下室温で撹拌した。
Example 5
[Synthesis example of lithium bis- (4-bromoethylbenzenesulfonyl) imide]
In a 100 mL glass flask equipped with a reflux condenser and a nitrogen introduction tube, 1.0 g of 4-bromoethylbenzenesulfonamide produced in Example 2, 0.18 g of lithium hydroxide (manufactured by Aldrich), 4- (dimethylamino) pyridine ( 46 mg (manufactured by Wako Pure Chemical Industries, Ltd.) and 4.5 g of tetrahydrofuran were added, and the mixture was stirred at room temperature in a nitrogen atmosphere.
次に、実施例１で製造した４−ブロモエチルベンゼンスルホニルクロリド１．１ｇをテトラヒドロフラン４．５ｇに溶解し、反応器のスラリー溶液に滴下し、滴下終了後、室温で５時間撹拌した。反応終了後、イオン交換水１０ｇと塩化リチウム２．５ｇを加え、分液操作を行い、リチウムビス-(４-ブロモエチルベンゼンスルホニル)イミドを含む有機層を得た。これを濃縮し、得られたリチウムビス-(４-ブロモエチルベンゼンスルホニル)イミドの粗結晶をトルエンで洗浄することで、リチウムビス-(４-ブロモエチルベンゼンスルホニル)イミドの白色固体１．７ｇ（収率８０．３％、純度９３.１％）を得た。 Next, 1.1 g of 4-bromoethylbenzenesulfonyl chloride produced in Example 1 was dissolved in 4.5 g of tetrahydrofuran, added dropwise to the slurry solution of the reactor, and after completion of the addition, the mixture was stirred at room temperature for 5 hours. After completion of the reaction, 10 g of ion-exchanged water and 2.5 g of lithium chloride were added, and a liquid separation operation was performed to obtain an organic layer containing lithium bis- (4-bromoethylbenzenesulfonyl) imide. By concentrating this and washing the obtained crude crystals of lithium bis- (4-bromoethylbenzenesulfonyl) imide with toluene, 1.7 g (yield) of a white solid of lithium bis- (4-bromoethylbenzenesulfonyl) imide was obtained. 80.3% and purity 93.1%) were obtained.
（分析結果）
１Ｈ−ＮＭＲ（４００ＭＨｚ、ＤＭＳＯ−ｄ６）：δ７．５８（２Ｈ, ｄ）、δ７．２６（２Ｈ, ｄ）、３．７６−３．７２（２Ｈ,ｔ）、３．１７−３．１３（２Ｈ,ｔ）
(result of analysis)
1 1 H-NMR (400 MHz, DMSO-d6): δ7.58 (2H, d), δ7.26 (2H, d), 3.76-3.72 (2H, t), 3.17-3.13 (2H, t)
実施例６
〔リチウムビス-(４-スチレンスルホニル)イミドの合成例〕
還流冷却管、窒素導入管を取り付けた１００ｍｌガラスフラスコに実施例５で製造したリチウムビス-(４-ブロモエチルベンゼンスルホニル)イミド１．０ｇ、水酸化リチウム０．１ｇ、ハイドロキノン（和光純薬製）２３．２ｍｇ、メタノール２０ｇを仕込み、窒素雰囲気下、６０℃で３時間加熱撹拌した。反応終了後、溶媒を留去し、イオン交換水２０ｇ、塩化リチウム５．０ｇ、テトラヒドロフラン２０ｇを加え、分液操作を行い、リチウムビス-(４-スチレンスルホニル)イミドを含む有機層を得た。これを濃縮し、得られたリチウムビス-(４-スチレンスルホニル)イミドの白色固体０．６３ｇ（収率８８．２％、純度９５．４％）を得た。化合物の同定はプロトンＮＭＲで行った。
Example 6
[Example of Synthesis of Lithium Bis- (4-Styrene Sulfonyl) Imide]
1.0 g of lithium bis- (4-bromoethylbenzenesulfonyl) imide produced in Example 5, 0.1 g of lithium hydroxide, hydroquinone (manufactured by Wako Pure Chemical Industries, Ltd.) 23 in a 100 ml glass flask equipped with a reflux cooling tube and a nitrogen introduction tube. .2 mg and 20 g of methanol were charged, and the mixture was heated and stirred at 60 ° C. for 3 hours under a nitrogen atmosphere. After completion of the reaction, the solvent was distilled off, 20 g of ion-exchanged water, 5.0 g of lithium chloride and 20 g of tetrahydrofuran were added, and a liquid separation operation was performed to obtain an organic layer containing lithium bis- (4-styrenesulfonyl) imide. This was concentrated to obtain 0.63 g (yield 88.2%, purity 95.4%) of the obtained white solid of lithium bis- (4-styrenesulfonyl) imide. Compounds were identified by proton NMR.
（分析結果）
１Ｈ−ＮＭＲ（４００ＭＨｚ、ＤＭＳＯ−ｄ６）：δ７．６１（４Ｈ, ｄ）、δ７．４５（４Ｈ, ｄ）、δ６．７９−６．７２（２Ｈ, ｄｄ）、５．９０（２Ｈ,ｄ）、５．３４（２Ｈ,ｄ）
(result of analysis)
1 1 H-NMR (400 MHz, DMSO-d6): δ7.61 (4H, d), δ7.45 (4H, d), δ6.79-6.72 (2H, dd), 5.90 (2H, d) ), 5.34 (2H, d)
実施例７
〔リチウムビス-(４-スチレンスルホニル)イミドの合成例〕
Example 7
[Example of Synthesis of Lithium Bis- (4-Styrene Sulfonyl) Imide]
還流冷却管、窒素導入管を取り付けた１００ｍＬガラスフラスコに、実施例２で製造した４−ブロモエチルベンゼンスルホンアミド１．０ｇ、水酸化リチウム（アルドリッチ製）０．３６ｇ、４−（ジメチルアミノ）ピリジン（和光純薬工業製）４６ｍｇ、テトラヒドロフラン４．５ｇを加え、窒素雰囲気下、室温で撹拌した。 In a 100 mL glass flask equipped with a reflux condenser and a nitrogen introduction tube, 1.0 g of 4-bromoethylbenzenesulfonamide produced in Example 2, 0.36 g of lithium hydroxide (manufactured by Aldrich), 4- (dimethylamino) pyridine ( 46 mg (manufactured by Wako Pure Chemical Industries, Ltd.) and 4.5 g of tetrahydrofuran were added, and the mixture was stirred at room temperature under a nitrogen atmosphere.
次に、実施例１で製造した４−ブロモエチルベンゼンスルホニルクロリド１．１ｇをテトラヒドロフラン４．５ｇに溶解し、反応器のスラリー溶液に滴下し、滴下終了後、室温で５時間撹拌した。プロトンＮＭＲにて、リチウムビス-(４-ブロモエチルベンゼンスルホニル)イミドの生成を確認後、ハイドロキノン（和光純薬製）２３．２ｍｇを加え、６０℃に昇温後、引き続き３時間撹拌した。反応終了後、プロトンＮＭＲにて分析を行うと、反応収率７３％でリチウムビス-(４-スチレンスルホニル)イミドが得られた。 Next, 1.1 g of 4-bromoethylbenzenesulfonyl chloride produced in Example 1 was dissolved in 4.5 g of tetrahydrofuran, added dropwise to the slurry solution of the reactor, and after completion of the addition, the mixture was stirred at room temperature for 5 hours. After confirming the formation of lithium bis- (4-bromoethylbenzenesulfonyl) imide by proton NMR, 23.2 mg of hydroquinone (manufactured by Wako Pure Chemical Industries, Ltd.) was added, the temperature was raised to 60 ° C., and the mixture was continuously stirred for 3 hours. After completion of the reaction, analysis was performed by proton NMR to obtain lithium bis- (4-styrenesulfonyl) imide with a reaction yield of 73%.
比較例１ Comparative Example 1
リチウムビス-(４-スチレンスルホニル)イミドの合成は、上記したスキーム１の方法に従い、上記スキーム４に示される方法にて合成した。
The lithium bis- (4-styrenesulfonyl) imide was synthesized according to the method of Scheme 1 described above by the method shown in
スキーム４：６−Ｉ及び６−ＩＩ （４−ビニルベンゼンスルホニルクロリドの合成）
原料には市販の４-スチレンスルホン酸ナトリウム（東ソー有機化学製）を使用した。本製品は、半水和物であり、白色湿潤状結晶であるため、１０００ｍｌガラスフラスコに４-スチレンスルホン酸ナトリウム５０．０ｇを仕込み、エバポレーターを用いて、ウォーターバス設定温度６０℃、減圧度１０トールの条件で４８時間乾燥させた。乾燥させた４−スチレンスルホン酸ナトリウムの重量は４５．０ｇであった。
Scheme 4: 6-I and 6-II (Synthesis of 4-vinylbenzenesulfonyl chloride)
Commercially available sodium 4-styrene sulfonate (manufactured by Tosoh Organic Chemistry) was used as a raw material. Since this product is a hemihydrate and is a white wet crystal, 50.0 g of sodium 4-styrenesulfonate is charged in a 1000 ml glass flask, and a water bath set temperature of 60 ° C. and a decompression degree of 10 are used using an evaporator. It was dried under Thor conditions for 48 hours. The weight of the dried sodium 4-styrene sulfonate was 45.0 g.
次に、還流冷却管、窒素導入管、滴下管を取り付けた５００ｍｌガラスフラスコに、上記で乾燥させた４-スチレンスルホン酸ナトリウム４５．０ｇ、トルエン９０ｇ、Ｎ，Ｎ−ジメチルホルムアミド１６ｇ、Ｉｒｇａｎｏｘ１０１０（ＢＡＳＦ製）１.０ｇを加え、窒素雰囲気下０℃に冷却し撹拌した。 Next, 45.0 g of sodium 4-styrene sulfonate, 90 g of toluene, 16 g of N, N-dimethylformamide, and Irganox1010 (BASF) dried above were placed in a 500 ml glass flask equipped with a reflux cooling tube, a nitrogen introduction tube, and a dropping tube. (Manufactured) 1.0 g was added, and the mixture was cooled to 0 ° C. under a nitrogen atmosphere and stirred.
次に、塩化チオニル（東京化成工業製）３５．６ｇを０℃で２時間かけて滴下した。滴下終了後、０℃で２時間撹拌し、反応終了後、室温でイオン交換水１１０ｇを加えた。次に、分液操作を行ったが、水層と有機層の間に４-スチレンスルホン酸ナトリウムまたは４−ビニルベンゼンスルホニルクロリドのポリマーが中間層として多量に生成したため、このポリマーをろ過で除去し、再度分液操作を行った。分液操作により得られた有機層を、２０％塩化ナトリウム水溶液１１０ｇで洗浄し、分液操作後、得られた有機層に窒素バブリングを６時間実施し、４−ビニルベンゼンスルホニルクロリドのトルエン溶液７８．５ｇ（収率６５％、純度３６．６％、４−ビニルベンゼンスルホニルクロリド純分換算２８．７ｇ）を得た。 Next, 35.6 g of thionyl chloride (manufactured by Tokyo Chemical Industry Co., Ltd.) was added dropwise at 0 ° C. over 2 hours. After completion of the dropping, the mixture was stirred at 0 ° C. for 2 hours, and after completion of the reaction, 110 g of ion-exchanged water was added at room temperature. Next, a liquid separation operation was performed, but a large amount of a polymer of sodium 4-styrene sulfonate or 4-vinylbenzenesulfonyl chloride was formed as an intermediate layer between the aqueous layer and the organic layer, so this polymer was removed by filtration. , The liquid separation operation was performed again. The organic layer obtained by the liquid separation operation was washed with 110 g of a 20% sodium chloride aqueous solution, and after the liquid separation operation, nitrogen bubbling was carried out on the obtained organic layer for 6 hours to obtain a toluene solution of 4-vinylbenzenesulfonyl chloride 78. 5.5 g (yield 65%, purity 36.6%, 4-vinylbenzenesulfonyl chloride equivalent 28.7 g) was obtained.
スキーム４：６−ＩＩＩ （４−ビニルベンゼンスルホンアミドの合成）
還流冷却管、窒素導入管、滴下管を取り付けた１００ｍＬガラスフラスコに、上記の４−ビニルベンゼンスルホニルクロリド３０.０ｇ、テトラヒドロフラン３０ｇを加え、室温で撹拌、溶解した。この溶液を０℃に冷却し、２８％アンモニア水溶液（キシダ化学製）３０ｇを１時間かけて滴下し、滴下終了後、室温で２時間撹拌した。反応終了後、イオン交換水３０ｇ、酢酸エチル３０ｇを加え、分液操作を行い、４−ビニルベンゼンスルホンアミドを含む有機層を得た。この有機層を濃縮し、４−ビニルベンゼンスルホンアミドの白色固体６．０ｇ（収率６０．９％）を得た。
Scheme 4: 6-III (Synthesis of 4-vinylbenzene sulfonamide)
30.0 g of the above 4-vinylbenzenesulfonyl chloride and 30 g of tetrahydrofuran were added to a 100 mL glass flask equipped with a reflux condenser tube, a nitrogen introduction tube and a dropping tube, and the mixture was stirred and dissolved at room temperature. This solution was cooled to 0 ° C., 30 g of a 28% aqueous ammonia solution (manufactured by Kishida Chemical Co., Ltd.) was added dropwise over 1 hour, and after completion of the addition, the mixture was stirred at room temperature for 2 hours. After completion of the reaction, 30 g of ion-exchanged water and 30 g of ethyl acetate were added, and a liquid separation operation was performed to obtain an organic layer containing 4-vinylbenzene sulfonamide. This organic layer was concentrated to obtain 6.0 g (yield 60.9%) of a white solid of 4-vinylbenzenesulfonamide.
スキーム４：６−ＩＶ （リチウムビス-(４-スチレンスルホニル)イミドの合成）
還流冷却管、窒素導入管、滴下管を取り付けた１００ｍｌガラスフラスコに上記で得た４-ビニルベンゼンスルホンアミド２．０ｇ、水酸化リチウム（アルドリッチ製）０．５ｇ、４−（ジメチルアミノ）ピリジン（和光純薬工業製）６７ｍｇ、テトラヒドロフラン２０ｇを加え、窒素雰囲気下、室温で撹拌した。
Scheme 4: 6-IV (Synthesis of Lithium Bis- (4-Styrene Sulfonyl) Imide)
2.0 g of 4-vinylbenzenesulfonamide obtained above, 0.5 g of lithium hydroxide (manufactured by Aldrich), 4- (dimethylamino) pyridine in a 100 ml glass flask equipped with a reflux cooling tube, a nitrogen introduction tube, and a dropping tube (made by Aldrich). 67 mg (manufactured by Wako Pure Chemical Industries, Ltd.) and 20 g of tetrahydrofuran were added, and the mixture was stirred at room temperature under a nitrogen atmosphere.
次に、上記の４−ビニルベンゼンスルホニルクロリドの３７％トルエン溶液６.０ｇをテトラヒドロフラン３ｇに溶解し、反応器のスラリー溶液に滴下し、滴下終了後、室温で１２時間撹拌した。１２時間撹拌後、反応系の粘度は反応開始時よりも高く、反応系でのポリマー化が進行し、また、原料の４-ビニルベンゼンスルホンアミドまたは４−ビニルベンゼンスルホニルクロリド由来の副生成物と目的物の分離が困難であったため、リチウムビス-(４-スチレンスルホニル)イミドは低収率、低純度でしか得られなかった。 Next, 6.0 g of the above-mentioned 37% toluene solution of 4-vinylbenzenesulfonyl chloride was dissolved in 3 g of tetrahydrofuran, added dropwise to the slurry solution of the reactor, and after completion of the addition, the mixture was stirred at room temperature for 12 hours. After stirring for 12 hours, the viscosity of the reaction system was higher than that at the start of the reaction, polymerization in the reaction system proceeded, and with the by-product derived from the raw material 4-vinylbenzenesulfonamide or 4-vinylbenzenesulfonyl chloride. Since it was difficult to separate the target product, lithium bis- (4-styrenesulfonyl) imide could be obtained only in low yield and low purity.
ビス-(４-ハロエチルベンゼンスルホニル)イミド又はその塩は、ビス-(４-スチレンスルホニル)イミドまたはその塩の前駆体として、さらに、ビス（４−ヒドロキシエチルベンゼンスルホニル）イミドまたはその塩、ビス（４−アミノエチルベンゼンスルホニル）イミドまたはその塩など、スルホンイミド構造を有する機能性ポリマー原料の前駆体として極めて重要である。特に、ビス-(４-スチレンスルホニル)イミドまたはその塩は、優れたラジカル重合性、カチオン交換能を有する水溶性の架橋性モノマーであり、イオン交換膜などの機能性膜、アルカリ金属イオン電池のイオン伝導性材料などの有用な原料であることから、本発明のビス-(４-ハロエチルベンゼンスルホニル)イミドまたはその塩は産業上極めて有用である。 Bis- (4-haloethylbenzenesulfonyl) imide or a salt thereof can be used as a precursor of bis- (4-styrenesulfonyl) imide or a salt thereof, and further, bis (4-hydroxyethylbenzenesulfonyl) imide or a salt thereof, bis (4). -Aminoethylbenzenesulfonyl) It is extremely important as a precursor of a functional polymer raw material having a sulfonimide structure such as imide or a salt thereof. In particular, bis- (4-styrenesulfonyl) imide or a salt thereof is a water-soluble crosslinkable monomer having excellent radical polymerizable and cation exchange ability, and is used for functional membranes such as ion exchange membranes and alkali metal ion batteries. Since it is a useful raw material such as an ionic conductive material, the bis- (4-haloethylbenzenesulfonyl) imide of the present invention or a salt thereof is extremely useful industrially.
Claims (3)
で表されるビス−（４−スチレンスルホニル）イミド又はその塩の製造方法。 4-Haloethylbenzenesulfon chloride and 4-haloethylbenzenesulfonamide are reacted with a base to produce bis- (4-haloethylbenzenesulfonyl) imide, and then the bis- (4-haloethylbenzenesulfonyl) imide is prohibited from polymerization. The following formula (2) is used to react with a base in the presence of an agent.
A method for producing a bis- (4-styrenesulfonyl) imide represented by (4) or a salt thereof.
で表されるビス−（４−ハロエチルベンゼンスルホニル）イミド又はその塩を、重合禁止剤の存在下で、塩基と反応させる、下記式（２）
で表されるビス−（４−スチレンスルホニル）イミド又はその塩の製造方法。 The following formula (1)
The bis- (4-haloethylbenzenesulfonyl) imide represented by (4-haloethylbenzenesulfonyl) imide or a salt thereof is reacted with a base in the presence of a polymerization inhibitor, according to the following formula (2).
A method for producing a bis- (4-styrenesulfonyl) imide represented by (4) or a salt thereof.
で表される、前駆体としてのビス−（４−ハロエチルベンゼンスルホニル）イミド又はその塩。 The following formula (1)
Bis- (4-haloethylbenzenesulfonyl) imide as a precursor or a salt thereof, which is represented by.
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